MXPA03000438A - Deposicion de vapor. - Google Patents
Deposicion de vapor.Info
- Publication number
- MXPA03000438A MXPA03000438A MXPA03000438A MXPA03000438A MXPA03000438A MX PA03000438 A MXPA03000438 A MX PA03000438A MX PA03000438 A MXPA03000438 A MX PA03000438A MX PA03000438 A MXPA03000438 A MX PA03000438A MX PA03000438 A MXPA03000438 A MX PA03000438A
- Authority
- MX
- Mexico
- Prior art keywords
- vapour deposition
- coating
- metals
- applying
- substrate
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
Abstract
La invencion es concerniente con un proceso para aplicar un recubrimiento a un sustrato, en donde el recubrimiento es formado de por lo menos dos componentes o elementos. En una modalidad preferida, el recubrimiento es formado de por lo menos dos metales. De acuerdo con la invencion, el recubrimiento es aplicado mediante deposicion de vapor bajo condiciones de regulacion.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP00202559A EP1174526A1 (en) | 2000-07-17 | 2000-07-17 | Continuous vapour deposition |
PCT/NL2001/000546 WO2002006558A1 (en) | 2000-07-17 | 2001-07-17 | Vapour deposition |
Publications (1)
Publication Number | Publication Date |
---|---|
MXPA03000438A true MXPA03000438A (es) | 2004-09-10 |
Family
ID=8171819
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MXPA03000438A MXPA03000438A (es) | 2000-07-17 | 2001-07-17 | Deposicion de vapor. |
Country Status (13)
Country | Link |
---|---|
US (1) | US7220450B2 (es) |
EP (2) | EP1174526A1 (es) |
JP (1) | JP5049446B2 (es) |
KR (1) | KR100819892B1 (es) |
CN (1) | CN1213162C (es) |
AT (1) | ATE450630T1 (es) |
AU (2) | AU2001275831B2 (es) |
BR (1) | BR0112552B1 (es) |
CA (1) | CA2416093C (es) |
DE (1) | DE60140673D1 (es) |
ES (1) | ES2337552T3 (es) |
MX (1) | MXPA03000438A (es) |
WO (1) | WO2002006558A1 (es) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NZ562697A (en) * | 2005-05-31 | 2009-12-24 | Corus Technology Bv | Vacuum evaporation coating of a substrate where the evaporating material is isolated from the induction coil |
EP1972699A1 (fr) * | 2007-03-20 | 2008-09-24 | ArcelorMittal France | Procede de revetement d'un substrat et installation de depot sous vide d'alliage metallique |
EP2048261A1 (fr) | 2007-10-12 | 2009-04-15 | ArcelorMittal France | Générateur de vapeur industriel pour le dépôt d'un revêtement d'alliage sur une bande métallique |
EP2199425A1 (fr) * | 2008-12-18 | 2010-06-23 | ArcelorMittal France | Générateur de vapeur industriel pour le dépôt d'un revêtement d'alliage sur une bande métallique (II) |
WO2011082179A1 (en) * | 2009-12-28 | 2011-07-07 | Global Solar Energy, Inc. | Apparatus and methods of mixing and depositing thin film photovoltaic compositions |
CN103249860B (zh) * | 2010-12-13 | 2016-03-16 | Posco公司 | 连续涂布设备 |
KR101439694B1 (ko) | 2012-12-26 | 2014-09-12 | 주식회사 포스코 | Zn-Mg 합금도금강판 및 그의 제조방법 |
UA117592C2 (uk) | 2013-08-01 | 2018-08-27 | Арселорміттал | Пофарбований оцинкований сталевий лист та спосіб його виготовлення |
UA116262C2 (uk) * | 2013-08-01 | 2018-02-26 | Арселорміттал | Сталевий лист з цинковим покриттям |
ES2817842T3 (es) * | 2013-11-05 | 2021-04-08 | Tata Steel Nederland Tech Bv | Método para controlar la composición de metal líquido en un dispositivo evaporador |
TWI523962B (zh) * | 2014-10-03 | 2016-03-01 | Nat Inst Chung Shan Science & Technology | Method and apparatus for stabilizing vapor deposition uniformity film |
TWI582251B (zh) * | 2014-10-31 | 2017-05-11 | 財團法人工業技術研究院 | 蒸鍍系統以及蒸鍍方法 |
ES2663507T3 (es) * | 2015-07-13 | 2018-04-13 | Hec High End Coating Gmbh | Procedimiento para la fabricación de sustratos recubiertos |
EP3228727A3 (de) | 2016-03-30 | 2018-01-24 | HEC High End Coating GmbH | Verfahren zur herstellung beschichteter substrate, beschichtete substrate und deren verwendung |
KR102098455B1 (ko) | 2017-12-26 | 2020-04-07 | 주식회사 포스코 | 연속 증착 장치 및 연속 증착 방법 |
WO2019239184A1 (en) * | 2018-06-13 | 2019-12-19 | Arcelormittal | Vacuum deposition facility and method for coating a substrate |
JP2019060022A (ja) * | 2018-11-09 | 2019-04-18 | アルセロルミタル・インベステイガシオン・イ・デサロジヨ・エセ・エレ | 亜鉛コーティングを備えた鋼板 |
JP2019060021A (ja) * | 2018-11-09 | 2019-04-18 | アルセロルミタル・インベステイガシオン・イ・デサロジヨ・エセ・エレ | 亜鉛コーティングを備えた塗装鋼板 |
CN112553578B (zh) * | 2019-09-26 | 2022-01-14 | 宝山钢铁股份有限公司 | 一种具有抑流式喷嘴的真空镀膜装置 |
CN113432775B (zh) * | 2020-03-23 | 2023-04-18 | 核工业理化工程研究院 | 一种标定设备内部气体滞止压力与悬臂梁部件温度关系曲线的方法 |
WO2023062410A1 (en) * | 2021-10-14 | 2023-04-20 | Arcelormittal | Vapour nozzle for pvd |
Family Cites Families (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53110973A (en) * | 1977-03-10 | 1978-09-28 | Futaba Denshi Kogyo Kk | Method and apparatus for manufacturing compounds |
JPS59208006A (ja) * | 1983-05-10 | 1984-11-26 | Toyota Motor Corp | 合金微粉末の製造方法 |
JPH0627329B2 (ja) * | 1984-02-13 | 1994-04-13 | シュミット,ジェロウム・ジェイ・ザ・サ−ド | 導電および誘電性固体薄膜のガスジェット付着方法および装置とそれによって製造される生産物 |
CA1235808A (en) * | 1984-03-22 | 1988-04-26 | Tetsuo Oka | Vertical magnetic recording medium and process for preparation thereof |
JPS60251273A (ja) * | 1984-05-28 | 1985-12-11 | Mitsubishi Heavy Ind Ltd | 真空蒸発装置の蒸発量制御方法 |
JPH02125866A (ja) * | 1988-11-04 | 1990-05-14 | Kobe Steel Ltd | 合金蒸着めっき装置 |
US5104634A (en) * | 1989-04-20 | 1992-04-14 | Hercules Incorporated | Process for forming diamond coating using a silent discharge plasma jet process |
US5256205A (en) * | 1990-05-09 | 1993-10-26 | Jet Process Corporation | Microwave plasma assisted supersonic gas jet deposition of thin film materials |
US5919310A (en) * | 1991-10-07 | 1999-07-06 | Canon Kabushiki Kaisha | Continuously film-forming apparatus provided with improved gas gate means |
CA2146369C (en) * | 1992-11-13 | 1999-06-15 | Masatsugu Izu | Microwave apparatus for depositing thin films |
JPH08269696A (ja) * | 1995-03-28 | 1996-10-15 | Nisshin Steel Co Ltd | Mgの蒸発方法 |
JPH0953173A (ja) * | 1995-08-18 | 1997-02-25 | Nisshin Steel Co Ltd | 蒸発材料の安定供給方法 |
US5728224A (en) * | 1995-09-13 | 1998-03-17 | Tetra Laval Holdings & Finance S.A. | Apparatus and method for manufacturing a packaging material using gaseous phase atmospheric photo chemical vapor deposition to apply a barrier layer to a moving web substrate |
JPH09143682A (ja) * | 1995-11-22 | 1997-06-03 | Nisshin Steel Co Ltd | 多重ダクトを用いたZn−Mg蒸着法及び蒸着めっき設備 |
BE1010351A6 (fr) * | 1996-06-13 | 1998-06-02 | Centre Rech Metallurgique | Procede et dispositif pour revetir en continu un substrat en mouvement au moyen d'une vapeur metallique. |
US5874131A (en) * | 1996-10-02 | 1999-02-23 | Micron Technology, Inc. | CVD method for forming metal-containing films |
BE1010720A3 (fr) * | 1996-10-30 | 1998-12-01 | Centre Rech Metallurgique | Procede et dispositif pour revetir en continu un substrat en mouvement au moyen d'un alliage metallique en phase vapeur. |
US6062256A (en) * | 1997-02-11 | 2000-05-16 | Engineering Measurements Company | Micro mass flow control apparatus and method |
US6165554A (en) * | 1997-11-12 | 2000-12-26 | Jet Process Corporation | Method for hydrogen atom assisted jet vapor deposition for parylene N and other polymeric thin films |
US6309508B1 (en) * | 1998-01-15 | 2001-10-30 | 3M Innovative Properties Company | Spinning disk evaporator |
US6190732B1 (en) * | 1998-09-03 | 2001-02-20 | Cvc Products, Inc. | Method and system for dispensing process gas for fabricating a device on a substrate |
US6804285B2 (en) * | 1998-10-29 | 2004-10-12 | Canon Kabushiki Kaisha | Gas supply path structure for a gas laser |
US6576061B1 (en) * | 1998-12-22 | 2003-06-10 | Canon Kabushiki Kaisha | Apparatus and method for processing a substrate |
US6409837B1 (en) * | 1999-01-13 | 2002-06-25 | Tokyo Electron Limited | Processing system and method for chemical vapor deposition of a metal layer using a liquid precursor |
-
2000
- 2000-07-17 EP EP00202559A patent/EP1174526A1/en not_active Withdrawn
-
2001
- 2001-07-17 AU AU2001275831A patent/AU2001275831B2/en not_active Ceased
- 2001-07-17 CN CNB018157629A patent/CN1213162C/zh not_active Expired - Fee Related
- 2001-07-17 AT AT01953374T patent/ATE450630T1/de active
- 2001-07-17 JP JP2002512445A patent/JP5049446B2/ja not_active Expired - Fee Related
- 2001-07-17 BR BRPI0112552-4B1A patent/BR0112552B1/pt not_active IP Right Cessation
- 2001-07-17 MX MXPA03000438A patent/MXPA03000438A/es active IP Right Grant
- 2001-07-17 AU AU7583101A patent/AU7583101A/xx active Pending
- 2001-07-17 CA CA002416093A patent/CA2416093C/en not_active Expired - Lifetime
- 2001-07-17 US US10/333,039 patent/US7220450B2/en not_active Expired - Lifetime
- 2001-07-17 ES ES01953374T patent/ES2337552T3/es not_active Expired - Lifetime
- 2001-07-17 WO PCT/NL2001/000546 patent/WO2002006558A1/en active IP Right Grant
- 2001-07-17 EP EP01953374A patent/EP1301649B1/en not_active Expired - Lifetime
- 2001-07-17 KR KR1020037000767A patent/KR100819892B1/ko active IP Right Grant
- 2001-07-17 DE DE60140673T patent/DE60140673D1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
ES2337552T3 (es) | 2010-04-27 |
DE60140673D1 (de) | 2010-01-14 |
CA2416093A1 (en) | 2002-01-24 |
KR100819892B1 (ko) | 2008-04-07 |
BR0112552B1 (pt) | 2013-07-16 |
US7220450B2 (en) | 2007-05-22 |
US20040022942A1 (en) | 2004-02-05 |
KR20030032999A (ko) | 2003-04-26 |
AU7583101A (en) | 2002-01-30 |
ATE450630T1 (de) | 2009-12-15 |
CN1213162C (zh) | 2005-08-03 |
BR0112552A (pt) | 2003-06-24 |
JP2004504487A (ja) | 2004-02-12 |
AU2001275831B2 (en) | 2006-09-07 |
CA2416093C (en) | 2009-06-30 |
CN1458985A (zh) | 2003-11-26 |
EP1174526A1 (en) | 2002-01-23 |
JP5049446B2 (ja) | 2012-10-17 |
WO2002006558A1 (en) | 2002-01-24 |
EP1301649B1 (en) | 2009-12-02 |
EP1301649A1 (en) | 2003-04-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
MXPA03000438A (es) | Deposicion de vapor. | |
PL369603A1 (en) | Coating method and coating | |
SG166794A1 (en) | Layer arrangement for the formation of a coating on a surface of a substrate,coating method,and substrate with a layer arrangement | |
AU2001231753A1 (en) | Condensation coating method | |
MXPA03010489A (es) | Sustrato con revestimiento fotocatalitico. | |
WO2003095701A8 (en) | Volatile copper(ii) complexes for deposition of copper films by atomic layer deposition | |
AU2003266489A1 (en) | Corrosion protection on metals | |
WO2006073435A3 (en) | Multi-layered superhard nanocomposite coatings | |
WO2005043623A3 (de) | Verfahren zum ausbilden eines dielektrikums auf einer kupferhaltigen metallisierung und kondensatoranordnung | |
MXPA01012578A (es) | Proceso para la produccion de revestimientos fotocataliticos sobre substratos. | |
CA2373996A1 (en) | Process and solution for providing a conversion coating on a metallic surface i | |
WO2001046495A3 (en) | Coated metal substrates and methods for preparing and inhibiting corrosion of the same | |
AU2003224129A1 (en) | Substrates having a biofilm-inhibiting coating | |
DE50212291D1 (de) | Beschichtungsverfahren und beschichtungsmittel | |
PL1809792T3 (pl) | Wspólny wieszak do operacji powlekania elektrolitycznego i PVD | |
MXPA03002344A (es) | Composicion de revestimiento para substratos metalicos. | |
EP1313744A4 (en) | REAGENT COMPOSITION AND METHOD FOR FORMING METAL LAYERS ON SUBSTRATES BY MEANS OF CHEMICAL GAS PHASE DEPOSITION | |
BR9909962A (pt) | Processo para a preparação de revestimentos protetores de uv por deposição realçada de plasma | |
TW200617198A (en) | Copper(Ⅱ) complexes for deposition of copper films by atomic layer deposition | |
AU2002322029A1 (en) | Inoculants for intermetallic layer | |
WO2004094689A3 (en) | Volatile copper(i) complexes for deposition of copper films by atomic layer deposition | |
IL164300A0 (en) | Method for coating metal surfaces and substrate having a coated metal surface | |
DE60203382D1 (de) | Beschichtung eines glas-substrates mit einer siliziumhaltigen schicht | |
AU2003253028A1 (en) | Composition for producing a thermal insulation coating | |
AU2002304877A1 (en) | Construction-material body or coating containing glass |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
FG | Grant or registration |