ATE471997T1 - Vorrichtung und verfahren zum beschichten eines substrats - Google Patents

Vorrichtung und verfahren zum beschichten eines substrats

Info

Publication number
ATE471997T1
ATE471997T1 AT06724611T AT06724611T ATE471997T1 AT E471997 T1 ATE471997 T1 AT E471997T1 AT 06724611 T AT06724611 T AT 06724611T AT 06724611 T AT06724611 T AT 06724611T AT E471997 T1 ATE471997 T1 AT E471997T1
Authority
AT
Austria
Prior art keywords
coating
substrate
Prior art date
Application number
AT06724611T
Other languages
English (en)
Inventor
Van Westrum Johannes Alphonsus Schade
Laurent Christophe Bernard Baptiste
Gerardus Gleijm
Original Assignee
Corus Technology Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Corus Technology Bv filed Critical Corus Technology Bv
Application granted granted Critical
Publication of ATE471997T1 publication Critical patent/ATE471997T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
AT06724611T 2005-05-31 2006-04-27 Vorrichtung und verfahren zum beschichten eines substrats ATE471997T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP05076265 2005-05-31
PCT/EP2006/003924 WO2006128532A1 (en) 2005-05-31 2006-04-27 Apparatus and method for coating a substrate

Publications (1)

Publication Number Publication Date
ATE471997T1 true ATE471997T1 (de) 2010-07-15

Family

ID=34981132

Family Applications (1)

Application Number Title Priority Date Filing Date
AT06724611T ATE471997T1 (de) 2005-05-31 2006-04-27 Vorrichtung und verfahren zum beschichten eines substrats

Country Status (20)

Country Link
US (1) US8435352B2 (de)
EP (1) EP1902152B1 (de)
JP (1) JP5394061B2 (de)
KR (1) KR101235457B1 (de)
CN (1) CN101175866B (de)
AR (1) AR053487A1 (de)
AT (1) ATE471997T1 (de)
AU (1) AU2006254452B2 (de)
BR (1) BRPI0610874A2 (de)
CA (1) CA2605147C (de)
DE (1) DE602006015055D1 (de)
ES (1) ES2346902T3 (de)
MX (1) MX2007014483A (de)
MY (1) MY141409A (de)
NZ (1) NZ562697A (de)
RU (1) RU2388846C2 (de)
TW (1) TWI461553B (de)
UA (1) UA87916C2 (de)
WO (1) WO2006128532A1 (de)
ZA (1) ZA200709026B (de)

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US20060226003A1 (en) * 2003-01-22 2006-10-12 John Mize Apparatus and methods for ionized deposition of a film or thin layer
US9659758B2 (en) 2005-03-22 2017-05-23 Honeywell International Inc. Coils utilized in vapor deposition applications and methods of production
DE102009042972A1 (de) 2009-09-16 2011-03-24 Technische Universität Ilmenau Vorrichtung und Verfahren zum Manipulieren einer levitierten elektrisch leitfähigen Substanz
WO2012081738A1 (en) * 2010-12-13 2012-06-21 Posco Continuous coating apparatus
KR101207719B1 (ko) 2010-12-27 2012-12-03 주식회사 포스코 건식 코팅 장치
DE102011018675A1 (de) 2011-04-18 2012-10-18 Technische Universität Ilmenau Vorrichtung und Verfahren zum aktiven Manipulieren einer elektrisch leitfähigen Substanz
US20190136364A1 (en) * 2016-04-27 2019-05-09 Essilor International Substrate holder for coating equiped with moveable shutters and method for using the same
US11183373B2 (en) 2017-10-11 2021-11-23 Honeywell International Inc. Multi-patterned sputter traps and methods of making
WO2019116082A1 (en) * 2017-12-14 2019-06-20 Arcelormittal Vacuum deposition facility and method for coating a substrate
WO2019116081A1 (en) 2017-12-14 2019-06-20 Arcelormittal Vacuum deposition facility and method for coating a substrate
CN112553577A (zh) 2019-09-26 2021-03-26 宝山钢铁股份有限公司 一种提高真空镀膜收得率的真空镀膜装置
CN112553578B (zh) 2019-09-26 2022-01-14 宝山钢铁股份有限公司 一种具有抑流式喷嘴的真空镀膜装置
CN112575308B (zh) 2019-09-29 2023-03-24 宝山钢铁股份有限公司 一种能在真空下带钢高效镀膜的真空镀膜装置
CN113957390B (zh) * 2020-07-21 2024-03-08 宝山钢铁股份有限公司 一种具有气垫缓冲腔的真空镀膜装置
CN113957389B (zh) * 2020-07-21 2023-08-11 宝山钢铁股份有限公司 一种具有多孔降噪及均匀化分配金属蒸汽的真空镀膜装置
CN113957388B (zh) 2020-07-21 2022-08-16 宝山钢铁股份有限公司 一种采用导流板式结构均匀分配金属蒸汽的真空镀膜装置
CN113957391B (zh) * 2020-07-21 2023-09-12 宝山钢铁股份有限公司 一种采用芯棒加热结构均匀分配金属蒸汽的真空镀膜装置
CN113957392B (zh) 2020-07-21 2022-09-20 宝山钢铁股份有限公司 一种采用混匀缓冲结构均匀分配金属蒸汽的真空镀膜装置
KR102547666B1 (ko) * 2021-01-21 2023-06-27 울산대학교 산학협력단 진공 박막 증착용 분자빔 증발원

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DE2934011A1 (de) * 1979-08-22 1981-03-26 André Etienne de Dr. Lausanne Rudnay Vorrichtung zum aufdampfen von elektrisch leitenden stoffen (metallen) im hochvakuum
JPS5740758A (en) * 1980-08-22 1982-03-06 Sekisui Chem Co Ltd Method and device for manufacturing magnetic recording medium
DE3632027C1 (de) * 1986-09-20 1988-02-18 Rudnay Andre Dr De Verfahren und Vakuumbedampfungsanlage zum Metallisieren von Folienoberflaechen
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RU2198241C2 (ru) * 1999-08-31 2003-02-10 Нитусов Юрий Евгеньевич Левитирующее транспортное устройство для перемещения изделий внутри вакуумного объема
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JP2004099961A (ja) * 2002-09-09 2004-04-02 Nippon Steel Corp 金属箔コート設備及びコーティング金属箔の製造方法
DE10256038A1 (de) * 2002-11-30 2004-06-17 Applied Films Gmbh & Co. Kg Bedampfungsvorrichtung
JP2007500794A (ja) * 2003-05-16 2007-01-18 エスブイティー アソーシエイツ インコーポレイテッド 薄膜蒸着エバポレーター

Also Published As

Publication number Publication date
US8435352B2 (en) 2013-05-07
CA2605147A1 (en) 2006-12-07
UA87916C2 (ru) 2009-08-25
MX2007014483A (es) 2008-02-05
AR053487A1 (es) 2007-05-09
CN101175866A (zh) 2008-05-07
BRPI0610874A2 (pt) 2010-08-03
HK1118871A1 (en) 2009-02-20
AU2006254452B2 (en) 2010-11-18
EP1902152B1 (de) 2010-06-23
ZA200709026B (en) 2009-01-28
WO2006128532A1 (en) 2006-12-07
TW200730648A (en) 2007-08-16
US20080280066A1 (en) 2008-11-13
DE602006015055D1 (de) 2010-08-05
RU2007148502A (ru) 2009-07-20
CN101175866B (zh) 2010-12-15
KR20080016642A (ko) 2008-02-21
JP2008542537A (ja) 2008-11-27
RU2388846C2 (ru) 2010-05-10
JP5394061B2 (ja) 2014-01-22
NZ562697A (en) 2009-12-24
EP1902152A1 (de) 2008-03-26
TWI461553B (zh) 2014-11-21
KR101235457B1 (ko) 2013-02-20
AU2006254452A1 (en) 2006-12-07
CA2605147C (en) 2011-12-13
MY141409A (en) 2010-04-30
ES2346902T3 (es) 2010-10-21

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