CN113957392B - 一种采用混匀缓冲结构均匀分配金属蒸汽的真空镀膜装置 - Google Patents

一种采用混匀缓冲结构均匀分配金属蒸汽的真空镀膜装置 Download PDF

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CN113957392B
CN113957392B CN202010702653.XA CN202010702653A CN113957392B CN 113957392 B CN113957392 B CN 113957392B CN 202010702653 A CN202010702653 A CN 202010702653A CN 113957392 B CN113957392 B CN 113957392B
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metal vapor
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crucible
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CN113957392A (zh
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任三兵
熊斐
樊俊飞
周月明
李山青
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Baoshan Iron and Steel Co Ltd
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Abstract

本发明公开了一种采用混匀缓冲结构均匀分配金属蒸汽的真空镀膜装置,包括坩埚,所述坩埚的外侧设有用以将所述坩埚内的金属液加热形成金属蒸汽的感应加热器,所述坩埚顶部通过金属蒸汽管道连有布流箱体,所述布流箱体内设有水平向的芯棒和稳压板,所述芯棒位于所述稳压板的下方,所述布流箱体的顶部设有镀膜喷嘴,所述布流箱体的外侧设有感应线圈,所述金属蒸汽管道上设有调压阀;所述芯棒的内部开有数个轴向的加热孔,所述加热孔内设有电阻丝,所述芯棒的表面上设有一级导流板、二级导流板和三级导流板;所述布流箱体的内壁上开有缓冲槽,所述缓冲槽与所述芯棒的位置相对应。本发明使高温蒸汽和低温钢板接触时,在钢板表面形成均匀镀层。

Description

一种采用混匀缓冲结构均匀分配金属蒸汽的真空镀膜装置
技术领域
本发明涉及真空镀膜技术领域,更具体地说,涉及一种采用混匀缓冲结构均匀分配金属蒸汽的真空镀膜装置。
背景技术
物理蒸发镀(PVD)是指在真空条件下加热被镀金属,使之以气态的方式沉积到基材上形成镀膜的工艺技术。根据加热方式的不同又分为电加热(电阻或感应式)和电子束枪加热(EBPVD)等。真空镀膜作为表面改性和镀膜工艺,已经在电子、玻璃、塑料等行业得到了广泛的应用,真空镀膜技术主要优点在于其环保、良好的镀膜性能和可镀物质的多样性。连续带钢运用真空镀膜技术的关键在于镀膜生产连续化、大面积、高速率、大规模生产等几个方面,从上世纪八十年代开始,世界各大钢铁公司都对此技术进行了大量的研究,随着热镀锌和电镀锌技术的成熟,该技术正在受到空前的重视,并被人为是创新型的表面镀膜工艺。
而在真空镀膜的过程中关键点就是如何通过喷嘴的布置得到厚度均匀一致的镀层。国外目前公开的资料中,主要包含以下几个方面:
1)蒸发坩埚与布流喷嘴一体式结构
欧洲专利BE1009321A6、BE1009317A61分别公开了如图1、图2的坩埚喷嘴结构,在图1的结构中,坩埚1上部加上盖2,使得上盖2和炉壁之间形成喷嘴结构,用于蒸发金属的直接喷射。在图2的结构中,则在蒸发坩埚中添加过滤板3,而后由顶部的狭缝喷嘴用于金属蒸汽的喷射。在这两个装置喷嘴的设计过程中,一个采用了拉瓦尔喷嘴结构,另一个采用了收缩喷嘴,而喷嘴的朝向位置一个是侧向喷射,另一个是垂直喷射。
在专利JPS59177370A、US4552092A中亦公开了相关蒸发坩埚及喷嘴结构,图3给出了一种带自动补充金属液的坩埚喷嘴结构,喷嘴4采用较宽的出口,在坩埚上部也布置了加热器5用于蒸汽等的加热。图4给出的坩埚喷嘴结构中其结构由一侧弧形6展开,侧向喷射,在坩埚壁的外侧同样布置了加热管7用于壁面的加热。
2)蒸发坩埚与布流喷嘴分体式结构
在专利WO2018/020311A1公布了一种分体式坩埚喷嘴结构,如图5所示,在该装置中,坩埚在底部连接一个金属液供给槽8,其上部通过分体式管道9将金属蒸汽送至管状的分配器和前端的蒸汽喷嘴中,而后金属蒸汽通过喷嘴以高速将蒸汽喷射至金属板材。
在专利CN103249860A公开了一种分体式布流器及喷嘴结构,如图6所示,通过一个管道将蒸汽送至上部水平管道10中,水平管道10顶部具有多孔喷嘴,用以将金属蒸汽均匀的喷涂在金属板材表面。
在专利CN101175866A公开了一种金属蒸汽布流器及喷嘴形式,如图7所示了喷嘴的截面形式,布流器管道11外部缠绕导线从而实现对管道的加热,喷嘴部分为方形外壳,如图8所示,方形外壳12内部嵌套了另一种材质的环形管道,用于金属蒸汽的喷射,喷嘴使用的蒸汽出口形式为多孔式。
上述这些专利都涉及到了在镀膜过程中喷嘴的具体形式,但是并不能表明利用这些喷嘴进行的镀膜都能达到均匀的程度,而钢板表面镀层的均匀度对于其后续折弯及冲压等使用过程中具有很关键的因素。
发明内容
针对现有技术中存在的上述缺陷,本发明的目的是提供一种采用混匀缓冲结构均匀分配金属蒸汽的真空镀膜装置,利用混匀槽使金属蒸汽得到均匀分配和导向,利用稳压板使金属蒸汽得到二次缓冲分配,金属蒸汽再由镀膜喷嘴喷出,最终在钢板表面形成均匀镀层。
为实现上述目的,本发明采用如下技术方案:
一种采用混匀缓冲结构均匀分配金属蒸汽的真空镀膜装置,包括坩埚,所述坩埚的外侧设有用以将所述坩埚内的金属液加热形成金属蒸汽的感应加热器,所述坩埚顶部通过金属蒸汽管道连有布流箱体,所述布流箱体内设有水平向的混匀槽和稳压板,所述混匀槽位于所述稳压板的下方,所述布流箱体的顶部设有镀膜喷嘴,所述布流箱体的外侧设有感应线圈,所述金属蒸汽管道上设有调压阀;
所述混匀槽设置为圆弧板形状,其凹弧面朝所述金属蒸汽管道设置,所述混匀槽内开设有数个轴向的加热孔,所述加热孔内设有电阻丝,所述混匀槽上开设有径向的溢流口;
所述布流箱体的内壁上开有缓冲槽,所述缓冲槽与所述混匀槽的位置相对应,所述缓冲槽内还设有数个减速墙。
较佳的,所述溢流口设置为圆形、椭圆形、梯形或矩形中的一种和/或多种组合的孔形状。
较佳的,所述溢流口设置为连续的溢流狭缝形状。
较佳的,所述缓冲槽的横向截面设置为矩形或梯形。
较佳的,所述减速墙设置为多孔结构的矩形条状或梯形条状。
较佳的,所述减速墙设有1~10个。
较佳的,所述混匀槽上的所述溢流口的总面积S、所述混匀槽的进口总面积S、所述减速墙的顶部距离所述混匀槽的外表面的距离D2、所述减速墙的数量、所述减速墙的孔隙率P1、相邻两个所述减速墙之间的距离DW、所述电阻丝的总功率W1设置时,与所述金属蒸汽管道内所述金属蒸汽压力之间的关系如下:
当所述金属蒸汽管道内所述金属蒸汽压力在50000~100000Pa时,S/S=2~4,D2=7~10mm,DW=20~30mm,所述减速墙的数量设置在6~10个之间,所述减速墙设置为连续的长条形,所述减速墙的孔隙率设置在0.2~0.3之间,所述电阻丝的总功率W1=7~10KW/m;
当所述金属蒸汽管道内所述金属蒸汽压力在10000~50000Pa时,S/S=1~2,D2=5~7mm,DW=15~20mm,所述减速墙的数量设置在4~6个之间,所述减速墙设置为连续的长条形,所述减速墙的孔隙率设置在0.3~0.5之间,所述电阻丝的总功率W1=5~7KW/m;
当所述金属蒸汽管道内所述金属蒸汽压力在5000~10000Pa时,S/S=0.5~1,D2=3~5mm,DW=10~15mm,所述减速墙的数量设置在1~4个之间,所述减速墙设置为连续的长条形,所述减速墙的孔隙率设置在0.5~0.7之间,所述电阻丝的总功率W1=1~5KW/m。
较佳的,所述稳压板设置为多孔结构,所述稳压板的孔隙总面积S孔隙总面积与所述镀膜喷嘴的出口位置面积S出口之比大于等于0.1,即:
S孔隙总面积/S出口≥0.1。
较佳的,所述稳压板上的孔型为圆孔、方孔或三角孔。
较佳的,所述稳压板上的孔隙走向为直线或曲线。
较佳的,所述镀膜喷嘴的出口设置为狭缝型或多孔型,且所述镀膜喷嘴出口位置面积S出口与所述坩埚顶部和所述金属蒸汽管道连接位置S入口之比大于等于0.05~5,即:
S出口/S入口≥0.05~5。
较佳的,所述镀膜喷嘴设置为狭缝型时,其线形为直线形或曲线形,所述镀膜喷嘴设置为多孔型时,其线形为矩形、圆形或梯形。
较佳的,所述混匀槽与所述布流箱体之间采用螺纹方式或镶嵌方式连接。
本发明所提供的一种采用混匀缓冲结构均匀分配金属蒸汽的真空镀膜装置,金属蒸汽由感应加热器感应加热坩埚熔化蒸发金属液获得,金属蒸汽通过金属蒸汽管道进入到布流箱体,布流箱体外侧布置感应线圈进行加热,布流箱体内布置带有混匀槽,混匀槽通过螺纹或镶嵌方式固定在布流箱体内部,混匀槽内部开设有轴向的加热孔,用于通入电阻丝进行加热。根据金属蒸汽蒸发的温度,镀膜喷嘴和混匀槽加热到需要温度以后,打开调压阀,金属蒸汽进入到布流箱体,并冲击至混匀槽。一部分金属蒸汽流至混匀槽边缘后进入到布流箱体,另一部分金属蒸汽进入混匀槽后进行分配,混匀槽上开有溢流口,并和布流箱体内壁上的缓冲槽进行配合布流,用于将混匀槽内部的金属蒸汽分配至混匀槽边缘,汇合直接进入此处的金属蒸汽进入至布流箱体中。而布流箱体中布置有稳压板,用于将进入分配腔中的金属蒸汽进行二次缓冲分配,紧接着金属蒸汽从镀膜喷嘴中喷出,高速接触至预处理金属板并形成均匀金属镀膜。
附图说明
图1是欧洲专利BE1009321A6的示意图;
图2是欧洲专利BE1009317A61的示意图;
图3是专利JPS59177370A的示意图;
图4是专利US4552092A的示意图;
图5是专利WO2018/020311A1的示意图;
图6是专利CN103249860A的示意图;
图7是专利CN101175866A的示意图;
图8是图7中方形外壳的示意图;
图9是本发明真空镀膜装置的结构示意图;
图10是本发明真空镀膜装置中混匀槽上的溢流口的总面积S、混匀槽的进口总面积S、减速墙的顶部距离混匀槽的外表面的距离D2、减速墙的孔隙率P1、相邻两个减速墙之间的距离DW的位置参数示意图;
图11是图9真空镀膜装置中参数面积分类示意图。
具体实施方式
下面结合附图和实施例进一步说明本发明的技术方案。
请结合图9所示,本发明所提供的一种采用混匀缓冲结构均匀分配金属蒸汽的真空镀膜装置,包括坩埚13,坩埚13的外侧设有用以将坩埚13内的金属液14加热形成金属蒸汽15的感应加热器16,坩埚13的顶部通过金属蒸汽管道17连有布流箱体18,布流箱体18内设有水平向的混匀槽19和稳压板20,混匀槽19位于稳压板20的下方,混匀槽19与布流箱体18之间采用螺纹方式或镶嵌方式连接,布流箱体18的顶部设有镀膜喷嘴21,布流箱体18的外侧设有感应线圈22,金属蒸汽管道17上设有调压阀23。
混匀槽19设置为圆弧板形状,其凹弧面朝金属蒸汽管道17方向设置,混匀槽19内开设有数个轴向的加热孔24,加热孔24内设有电阻丝,混匀槽19上开设有径向的溢流口25,混匀槽19的主要作用就是对从金属蒸汽管道17进入布流箱体18的金属蒸汽15进行第一次混匀分配,使得金属蒸汽15沿混匀槽19的长度方向进行流动。
溢流口25可以设置为圆形、椭圆形、梯形或矩形等各种形状中的一种和/或多种组合的孔形状。
溢流口25也可以设置为连续的溢流狭缝形状。
溢流口25主要就是将进入到混匀槽19的金属蒸汽均匀的分配流出。
布流箱体18的内壁上开有缓冲槽26,缓冲槽26与混匀槽19的位置相对应,缓冲槽26内还设有1~10个减速墙27。
缓冲槽26为在布流箱体18的内壁上形成的凹型槽,该凹型槽的横向截面可以是梯形、矩形等各种形状。
减速墙27为在缓冲槽26内壁上布置的凸出形体,其形状可以为矩形、梯形等各种形状,主要是对进入到缓冲槽26流向布流箱体18的金属蒸汽15进行缓冲分配。
本发明真空镀膜装置的工作流程具体如下:
1)金属块体在坩埚13中受到感应加热器16的作用熔化成金属液14,金属液14在更高的过热度和低压下开始汽化,逐步形成金属蒸汽15;
2)开始阶段,与坩埚13相连的金属蒸汽管道17上的调压阀23处于关闭状态,随着金属液14不断地汽化,坩埚13内腔的金属蒸汽15不断增大,当坩埚13内腔的压力达到一定值时,开启调压阀23,使其保持一定的压力流出;
3)此时需同时增大感应加热器16从而使得调压阀23开启减小的压力得到补充,调整感应加热器16的功率范围,使得坩埚13内腔金属蒸汽15的压力保持恒定的范围;
4)调压阀23开启后,金属蒸汽15沿金属蒸汽管道17向前流动,当进入到布流箱体18时,金属蒸汽15的一部分直接进入混匀槽19,金属蒸汽15的另一部分绕过混匀槽19,由混匀槽19的外表面与缓冲槽26之间的缝隙中流出;
5)混匀槽19上开有径向的溢流口25,进入混匀槽19的金属蒸汽15沿着混匀槽19的长度方向进行扩散,通过又通过溢流口25流出,冲击至布流箱体18内,形成对金属蒸汽15的第一次混匀缓冲分配;
6)布流箱体18内壁对应混匀槽19的位置上设有缓冲槽26,缓冲槽26内设置减速墙27,沿混匀槽19绕流的金属蒸汽15和由溢流口25流出的金属蒸汽15在缓冲槽26内混合,抵消了相互之间的速度,并沿着缓冲槽26内的减速墙27流出,进入布流箱体18,形成对金属蒸汽15的第二次缓冲;
7)混匀槽19内部设置有放置电阻丝的加热孔24,用以在工作过程中加热混匀槽19,从而不使流入的金属蒸汽15发生凝固现象,布流箱体18外侧设置有感应线圈22,用以加热整个布流箱体18,保持布流箱体18自身的温度恒定,从而不使其内部的金属蒸汽15流程过程中发生凝固;
8)布流箱体18中安装有稳压板20,用于将对进入分配腔的金属蒸汽15气流进行二次缓冲分配,随后均匀金属蒸汽15从布流箱体18顶部的镀膜喷嘴21均匀的流出;
9)由于镀膜喷嘴21出口狭小,使得金属蒸汽15流出时形成了较大的速度,此时在其上方布置了运动的钢板28,由于金属蒸汽15的温度较高,遇到温度较低的钢板28时,迅速凝固,形成了金属镀膜29。
金属液14可包含的范围:锌、镁、铝、锡、镍、铜、铁等金属,此外还包含这些元素的低熔点(低于2000℃)氧化物。
钢板28在真空镀膜前经过等离子等装置清洗,预热温度达到80~300℃。
再请结合图10所示,混匀槽19上的溢流口25的总面积S、混匀槽19的进口总面积S、减速墙27的顶部距离混匀槽19的外表面的距离D2、减速墙27的数量、减速墙27的孔隙率P1、相邻两个减速墙27之间的距离DW、以及电阻丝的总功率W1设置时,与金属蒸汽管道17内金属蒸汽15压力之间的关系如下:
当金属蒸汽管道17内金属蒸汽15压力在50000~100000Pa时,S/S=2~4,D2=7~10mm,DW=20~30mm,减速墙27的数量设置在6~10个之间,减速墙27设置为连续的长条形,减速墙27的孔隙率设置在0.2~0.3之间,电阻丝的总功率W1=7~10KW/m;
当金属蒸汽管道17内金属蒸汽15压力在10000~50000Pa时,S/S=1~2,D2=5~7mm,DW=15~20mm,减速墙27的数量设置在4~6个之间,减速墙27设置为连续的长条形,减速墙27的孔隙率设置在0.3~0.5之间,电阻丝的总功率W1=5~7KW/m;
当金属蒸汽管道17内金属蒸汽15压力在5000~10000Pa时,S/S=0.5~1,D2=3~5mm,DW=10~15mm,减速墙27的数量设置在1~4个之间,减速墙27设置为连续的长条形,减速墙27的孔隙率设置在0.5~0.7之间,电阻丝的总功率W1=1~5KW/m。
请结合图11所示,稳压板20设置为多孔结构,稳压板20的孔隙总面积S孔隙总面积与镀膜喷嘴21的出口位置面积S出口之比大于等于0.1,即:
S孔隙总面积/S出口≥0.1。
稳压板20上的孔型为圆孔、方孔或三角孔等各种形状。
稳压板20上的孔隙走向为直线、曲线或者多层结构等各种形式。
镀膜喷嘴21的出口设置为狭缝型或多孔型,且镀膜喷嘴21出口位置面积S出口与坩埚13顶部和金属蒸汽管道17连接位置S入口之比大于等于0.05~5,即:
S出口/S入口≥0.05~5。
当镀膜喷嘴21设置为狭缝型时,其线形为直线形或曲线形,当镀膜喷嘴21设置为多孔型时,其线形为矩形、圆形或梯形等各种形状。
镀膜喷嘴21的材质可以为:石墨、陶瓷或金属,以及其他可以进行加工的材料。
实施例
采用钢板28表面蒸镀锌,钢板28宽度为1000mm,钢板28进行清洗干燥后,钢板28加热至120℃。坩埚13采用感应加热器16加热将锌蒸发,并通过控制功率使得坩埚13内的锌蒸汽压力达到60000Pa压力,此时调压阀23处于关闭状态。当坩埚13内气体压力到60000Pa后,打开调压阀23,金属蒸汽15通过金属蒸汽管道17进入到布流箱体18,布流箱体18中布置混匀槽19和稳压板20。
一部分金属蒸汽15进入到混匀槽19,另一部分金属蒸汽15绕过混匀槽19进入到布流箱体18内部的缓冲槽26中。S/S=3,减速墙27的顶部距离混匀槽19的外表面的距离D2=8mm,减速墙27的数量布置有8个,减速墙27为连续的长条形,其孔隙率P1为0.3,相邻两个减速墙27之间的距离DW=25mm,电阻丝的总功率W1=8KW/m。
稳压板20为一有一定厚度的多孔结构隔板,S孔隙总面积/S出口=2.8。
镀膜喷嘴21内部的工作压力为55000Pa,镀膜喷嘴21材质为石墨,镀膜喷嘴21的出口采用狭缝型,为长方形,其中S出口/S入口=0.93。
本技术领域中的普通技术人员应当认识到,以上的实施例仅是用来说明本发明,而并非用作为对本发明的限定,只要在本发明的实质精神范围内,对以上所述实施例的变化、变型都将落在本发明的权利要求书范围内。

Claims (11)

1.一种采用混匀缓冲结构均匀分配金属蒸汽的真空镀膜装置,其特征在于:包括坩埚,所述坩埚的外侧设有用以将所述坩埚内的金属液加热形成金属蒸汽的感应加热器,所述坩埚顶部通过金属蒸汽管道连有布流箱体,所述布流箱体内设有水平向的混匀槽和稳压板,所述混匀槽位于所述稳压板的下方,所述布流箱体的顶部设有镀膜喷嘴,所述布流箱体的外侧设有感应线圈,所述金属蒸汽管道上设有调压阀;
所述混匀槽设置为圆弧板形状,其凹弧面朝所述金属蒸汽管道设置,所述混匀槽内开设有数个轴向的加热孔,所述加热孔内设有电阻丝,所述混匀槽上开设有径向的溢流口;
所述布流箱体的内壁上开有缓冲槽,所述缓冲槽与所述混匀槽的位置相对应,所述缓冲槽内还设有数个减速墙,所述减速墙设置为多孔结构;
所述混匀槽上的所述溢流口的总面积S、所述混匀槽的进口总面积S、所述减速墙的顶部距离所述混匀槽的外表面的距离D2、所述减速墙的数量、所述减速墙的孔隙率P1、相邻两个所述减速墙之间的距离DW、所述电阻丝的总功率W1设置时,与所述金属蒸汽管道内所述金属蒸汽压力之间的关系如下:
当所述金属蒸汽管道内所述金属蒸汽压力在50000~100000Pa时,S/S=2~4,D2=7~10mm,DW=20~30mm,所述减速墙的数量设置在6~10个之间,所述减速墙设置为连续的长条形,所述减速墙的孔隙率设置在0.2~0.3之间,所述电阻丝的总功率W1=7~10KW/m;
当所述金属蒸汽管道内所述金属蒸汽压力在10000~50000Pa时,S/S=1~2,D2=5~7mm,DW=15~20mm,所述减速墙的数量设置在4~6个之间,所述减速墙设置为连续的长条形,所述减速墙的孔隙率设置在0.3~0.5之间,所述电阻丝的总功率W1=5~7KW/m;
当所述金属蒸汽管道内所述金属蒸汽压力在5000~10000Pa时,S/S=0.5~1,D2=3~5mm,DW=10~15mm,所述减速墙的数量设置在1~4个之间,所述减速墙设置为连续的长条形,所述减速墙的孔隙率设置在0.5~0.7之间,所述电阻丝的总功率W1=1~5KW/m。
2.如权利要求1所述的采用混匀缓冲结构均匀分配金属蒸汽的真空镀膜装置,其特征在于:所述溢流口设置为圆形、椭圆形、梯形或矩形中的一种和/或多种组合的孔形状。
3.如权利要求1所述的采用混匀缓冲结构均匀分配金属蒸汽的真空镀膜装置,其特征在于:所述溢流口设置为连续的溢流狭缝形状。
4.如权利要求1所述的采用混匀缓冲结构均匀分配金属蒸汽的真空镀膜装置,其特征在于:所述缓冲槽的横向截面设置为矩形或梯形。
5.如权利要求1所述的采用混匀缓冲结构均匀分配金属蒸汽的真空镀膜装置,其特征在于:所述减速墙设置为多孔结构的矩形条状或梯形条状。
6.如权利要求1所述的采用混匀缓冲结构均匀分配金属蒸汽的真空镀膜装置,其特征在于:所述稳压板设置为多孔结构,所述稳压板的孔隙总面积S孔隙总面积与所述镀膜喷嘴的出口位置面积S出口之比大于等于0.1,即:
S孔隙总面积/S出口≥0.1。
7.如权利要求6所述的采用混匀缓冲结构均匀分配金属蒸汽的真空镀膜装置,其特征在于:所述稳压板上的孔型为圆孔、方孔或三角孔。
8.如权利要求7所述的采用混匀缓冲结构均匀分配金属蒸汽的真空镀膜装置,其特征在于:所述稳压板上的孔隙走向为直线或曲线。
9.如权利要求1所述的采用混匀缓冲结构均匀分配金属蒸汽的真空镀膜装置,其特征在于:所述镀膜喷嘴的出口设置为狭缝型或多孔型,且所述镀膜喷嘴出口位置面积S出口与所述坩埚顶部和所述金属蒸汽管道连接位置S入口之比大于等于0.05~5,即:
S出口/S入口≥0.05~5。
10.如权利要求9所述的采用混匀缓冲结构均匀分配金属蒸汽的真空镀膜装置,其特征在于:所述镀膜喷嘴设置为狭缝型时,其线形为直线形或曲线形,所述镀膜喷嘴设置为多孔型时,其线形为矩形、圆形或梯形。
11.如权利要求1所述的采用混匀缓冲结构均匀分配金属蒸汽的真空镀膜装置,其特征在于:所述混匀槽与所述布流箱体之间采用螺纹方式或镶嵌方式连接。
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Families Citing this family (1)

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Publication number Priority date Publication date Assignee Title
CN115821215B (zh) * 2023-02-20 2023-04-28 成都富林达新材料有限公司 一种用于悬浮蒸镀氧化铝的喷射装置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014168352A1 (ko) * 2013-04-11 2014-10-16 한국표준과학연구원 증발 증착 장치
CN206289295U (zh) * 2016-11-30 2017-06-30 信利(惠州)智能显示有限公司 一种线性蒸发源
CN107815648A (zh) * 2017-09-26 2018-03-20 上海升翕光电科技有限公司 一种线性蒸发源装置及蒸镀设备
CN109487216A (zh) * 2018-12-29 2019-03-19 深圳市华星光电半导体显示技术有限公司 线源装置和oled蒸镀机
CN210765480U (zh) * 2019-06-24 2020-06-16 北京铂阳顶荣光伏科技有限公司 蒸发源分配装置及蒸镀装置

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59177370A (ja) 1983-03-29 1984-10-08 Mitsubishi Heavy Ind Ltd 真空蒸着装置
US4552092A (en) 1984-09-19 1985-11-12 Mitsubishi Jukogyo Kabushiki Kaisha Vacuum vapor deposition system
BE1009317A6 (fr) 1995-05-10 1997-02-04 Centre Rech Metallurgique Dispositif et installation pour revetir une bande d'acier.
BE1009321A6 (fr) 1995-05-17 1997-02-04 Centre Rech Metallurgique Dispositif de revetement d'une bande d'acier galvanisee.
JP5394061B2 (ja) 2005-05-31 2014-01-22 タタ、スティール、ネダーランド、テクノロジー、ベスローテン、フェンノートシャップ 基材を被覆する装置および方法
JP5063969B2 (ja) * 2006-09-29 2012-10-31 東京エレクトロン株式会社 蒸着装置、蒸着装置の制御装置、蒸着装置の制御方法および蒸着装置の使用方法
EP1967605A1 (en) * 2007-03-08 2008-09-10 Applied Materials, Inc. Evaporation tube and evaporation apparatus with adapted evaporation characteristic
JP2011127137A (ja) * 2009-12-15 2011-06-30 Seiko Epson Corp 蒸着坩堝及び蒸着装置
US9267203B2 (en) 2010-12-13 2016-02-23 Posco Continuous coating apparatus
JP2015010257A (ja) * 2013-06-28 2015-01-19 株式会社日立ハイテクファインシステムズ 真空蒸着装置の蒸発源並びにそれを用いた真空蒸着装置及び真空蒸着方法
KR102201598B1 (ko) * 2013-09-26 2021-01-12 (주)선익시스템 혼합영역이 포함된 선형 증발원
WO2018020296A1 (en) 2016-07-27 2018-02-01 Arcelormittal Apparatus and method for vacuum deposition

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014168352A1 (ko) * 2013-04-11 2014-10-16 한국표준과학연구원 증발 증착 장치
CN206289295U (zh) * 2016-11-30 2017-06-30 信利(惠州)智能显示有限公司 一种线性蒸发源
CN107815648A (zh) * 2017-09-26 2018-03-20 上海升翕光电科技有限公司 一种线性蒸发源装置及蒸镀设备
CN109487216A (zh) * 2018-12-29 2019-03-19 深圳市华星光电半导体显示技术有限公司 线源装置和oled蒸镀机
CN210765480U (zh) * 2019-06-24 2020-06-16 北京铂阳顶荣光伏科技有限公司 蒸发源分配装置及蒸镀装置

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