NO20041965L - Avleiringskontrollsammensetning for hoyavleiringsmiljo. - Google Patents

Avleiringskontrollsammensetning for hoyavleiringsmiljo.

Info

Publication number
NO20041965L
NO20041965L NO20041965A NO20041965A NO20041965L NO 20041965 L NO20041965 L NO 20041965L NO 20041965 A NO20041965 A NO 20041965A NO 20041965 A NO20041965 A NO 20041965A NO 20041965 L NO20041965 L NO 20041965L
Authority
NO
Norway
Prior art keywords
deposition
control composition
environment
high deposition
deposition control
Prior art date
Application number
NO20041965A
Other languages
English (en)
Inventor
Martin Crossman
Stuart Peter Robert Holt
Original Assignee
Nat Starch Chem Invest
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nat Starch Chem Invest filed Critical Nat Starch Chem Invest
Publication of NO20041965L publication Critical patent/NO20041965L/no

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F228/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a bond to sulfur or by a heterocyclic ring containing sulfur
    • C08F228/02—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a bond to sulfur or by a heterocyclic ring containing sulfur by a bond to sulfur
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F5/00—Softening water; Preventing scale; Adding scale preventatives or scale removers to water, e.g. adding sequestering agents
    • C02F5/02—Softening water by precipitation of the hardness
    • C02F5/04—Softening water by precipitation of the hardness using phosphates
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F5/00—Softening water; Preventing scale; Adding scale preventatives or scale removers to water, e.g. adding sequestering agents
    • C02F5/08—Treatment of water with complexing chemicals or other solubilising agents for softening, scale prevention or scale removal, e.g. adding sequestering agents
    • C02F5/10—Treatment of water with complexing chemicals or other solubilising agents for softening, scale prevention or scale removal, e.g. adding sequestering agents using organic substances
    • C02F5/14—Treatment of water with complexing chemicals or other solubilising agents for softening, scale prevention or scale removal, e.g. adding sequestering agents using organic substances containing phosphorus
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/04—Acids; Metal salts or ammonium salts thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/04—Acids; Metal salts or ammonium salts thereof
    • C08F220/06—Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F230/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal
    • C08F230/02—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing phosphorus
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K8/00—Compositions for drilling of boreholes or wells; Compositions for treating boreholes or wells, e.g. for completion or for remedial operations
    • C09K8/52—Compositions for preventing, limiting or eliminating depositions, e.g. for cleaning
    • C09K8/528—Compositions for preventing, limiting or eliminating depositions, e.g. for cleaning inorganic depositions, e.g. sulfates or carbonates
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2303/00—Specific treatment goals
    • C02F2303/22—Eliminating or preventing deposits, scale removal, scale prevention
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/52—Amides or imides
    • C08F220/54—Amides, e.g. N,N-dimethylacrylamide or N-isopropylacrylamide
    • C08F220/58—Amides, e.g. N,N-dimethylacrylamide or N-isopropylacrylamide containing oxygen in addition to the carbonamido oxygen, e.g. N-methylolacrylamide, N-(meth)acryloylmorpholine
    • C08F220/585—Amides, e.g. N,N-dimethylacrylamide or N-isopropylacrylamide containing oxygen in addition to the carbonamido oxygen, e.g. N-methylolacrylamide, N-(meth)acryloylmorpholine and containing other heteroatoms, e.g. 2-acrylamido-2-methylpropane sulfonic acid [AMPS]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S507/00—Earth boring, well treating, and oil field chemistry
    • Y10S507/927—Well cleaning fluid
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S507/00—Earth boring, well treating, and oil field chemistry
    • Y10S507/927—Well cleaning fluid
    • Y10S507/932—Cleaning sulfur deposits
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S507/00—Earth boring, well treating, and oil field chemistry
    • Y10S507/939—Corrosion inhibitor
NO20041965A 2001-10-03 2004-04-27 Avleiringskontrollsammensetning for hoyavleiringsmiljo. NO20041965L (no)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/969,740 US20030073586A1 (en) 2001-10-03 2001-10-03 Scale control composition for high scaling environments
PCT/US2002/031007 WO2003029153A2 (en) 2001-10-03 2002-09-30 Scale control composition

Publications (1)

Publication Number Publication Date
NO20041965L true NO20041965L (no) 2004-04-27

Family

ID=25515921

Family Applications (1)

Application Number Title Priority Date Filing Date
NO20041965A NO20041965L (no) 2001-10-03 2004-04-27 Avleiringskontrollsammensetning for hoyavleiringsmiljo.

Country Status (7)

Country Link
US (2) US20030073586A1 (no)
EP (2) EP1432653A2 (no)
AU (1) AU2002327780A1 (no)
CA (1) CA2462417C (no)
MX (1) MXPA04003038A (no)
NO (1) NO20041965L (no)
WO (1) WO2003029153A2 (no)

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US6812309B2 (en) * 2002-01-08 2004-11-02 Rohm And Haas Company Digitally encoded polymers
GB0317208D0 (en) * 2003-07-23 2003-08-27 Rhodia Cons Spec Ltd Scale inhibition in water systems
US20050203263A1 (en) * 2004-03-15 2005-09-15 Rodrigues Klein A. Aqueous treatment compositions and polymers for use therein
US20100171070A1 (en) 2006-12-21 2010-07-08 Basf Se Patents, Trademarks And Licenses PROCESS AND POLYMER FOR PREVENTING Ba/Sr SCALE WITH A DETECTABLE PHOSPHORUS FUNCTIONALITY
AU2008322980A1 (en) * 2007-11-13 2009-05-22 Akzo Nobel N.V. Methods of minimizing sulfate scale in oil field
US9115236B2 (en) 2009-01-16 2015-08-25 IFP Energies Nouvelles Copolymer for inhibiting inorganic deposits
CA2817745A1 (en) * 2010-11-12 2012-05-18 Kemira Oyj Thermally stable scale inhibitor compositions
BR112013018336B1 (pt) 2011-01-19 2020-11-17 Rhodia Operations famílias de inibidores de crosta com diferentes perfis de absorção e suas aplicações em campo petrolífero
CN102897927A (zh) * 2012-09-27 2013-01-30 启东市华亚工业配套有限公司 一种环保型阻垢剂
MX342993B (es) 2013-04-25 2016-10-13 Inst Mexicano Del Petróleo Proceso de obtencion de copolimeros aleatorios derivados del acido itaconico y/o sus isomeros y alquenil sulfonatos de sodio y uso del producto obtenido.
MX2014003577A (es) * 2014-03-25 2015-09-25 Inst Mexicano Del Petróleo Proceso de obtencion de terpolimeros aleatorios derivados del acido itaconico y acido aconitico, y/o sus isomeros, y alquenil sulfonatos de sodio y uso del producto obtenido.
US10287865B2 (en) 2014-05-19 2019-05-14 Baker Hughes, A Ge Company, Llc Use of an acid soluble or degradable solid particulate and an acid liberating or acid generating composite in the stimulation of a subterranean formation
US20160115051A1 (en) * 2014-10-28 2016-04-28 Michael Lee Standish Treatment of Aqueous Systems
WO2016070097A2 (en) * 2014-10-31 2016-05-06 Schlumberger Canada Limited HIGH pH METAL HYDROXIDE CONTROL AGENT COMPOSITIONS AND METHODS OF USE
US10633573B2 (en) * 2015-04-02 2020-04-28 Clariant International Ltd. Composition and method for inhibition of sulfide scales
CN105036364B (zh) * 2015-06-14 2017-09-26 铜仁学院 一种采用固体超强酸催化制备磺酸基型绿色阻垢剂的方法
CN114539463B (zh) * 2020-11-24 2023-12-26 中国石油天然气集团有限公司 重晶石螯合剂解堵材料及其制备方法
CN115180867B (zh) * 2022-07-15 2023-04-11 安徽建筑大学 一种具有球壳结构的靶向抗硫酸盐侵蚀防腐剂及其制备方法和应用

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Also Published As

Publication number Publication date
AU2002327780A1 (en) 2003-04-14
CA2462417A1 (en) 2003-04-10
CA2462417C (en) 2011-01-18
US6995120B2 (en) 2006-02-07
EP1432653A2 (en) 2004-06-30
WO2003029153A2 (en) 2003-04-10
MXPA04003038A (es) 2004-07-05
US20050282712A1 (en) 2005-12-22
EP1947158A1 (en) 2008-07-23
WO2003029153A3 (en) 2003-06-19
US20030073586A1 (en) 2003-04-17

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FC2A Withdrawal, rejection or dismissal of laid open patent application