DE602004005888D1 - Herstellung von selbstorganisierten monoschichten - Google Patents

Herstellung von selbstorganisierten monoschichten

Info

Publication number
DE602004005888D1
DE602004005888D1 DE602004005888T DE602004005888T DE602004005888D1 DE 602004005888 D1 DE602004005888 D1 DE 602004005888D1 DE 602004005888 T DE602004005888 T DE 602004005888T DE 602004005888 T DE602004005888 T DE 602004005888T DE 602004005888 D1 DE602004005888 D1 DE 602004005888D1
Authority
DE
Germany
Prior art keywords
monoslays
organized
self
manufacture
sam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE602004005888T
Other languages
English (en)
Other versions
DE602004005888T2 (de
Inventor
Dirk Burdinski
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Koninklijke Philips Electronics NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninklijke Philips Electronics NV filed Critical Koninklijke Philips Electronics NV
Publication of DE602004005888D1 publication Critical patent/DE602004005888D1/de
Application granted granted Critical
Publication of DE602004005888T2 publication Critical patent/DE602004005888T2/de
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D339/00—Heterocyclic compounds containing rings having two sulfur atoms as the only ring hetero atoms
    • C07D339/02—Five-membered rings
    • C07D339/06—Five-membered rings having the hetero atoms in positions 1 and 3, e.g. cyclic dithiocarbonates
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
    • G01N33/48—Biological material, e.g. blood, urine; Haemocytometers
    • G01N33/50—Chemical analysis of biological material, e.g. blood, urine; Testing involving biospecific ligand binding methods; Immunological testing
    • G01N33/53—Immunoassay; Biospecific binding assay; Materials therefor
    • G01N33/543—Immunoassay; Biospecific binding assay; Materials therefor with an insoluble carrier for immobilising immunochemicals
    • G01N33/54353—Immunoassay; Biospecific binding assay; Materials therefor with an insoluble carrier for immobilising immunochemicals with ligand attached to the carrier via a chemical coupling agent
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
    • G01N33/48—Biological material, e.g. blood, urine; Haemocytometers
    • G01N33/50—Chemical analysis of biological material, e.g. blood, urine; Testing involving biospecific ligand binding methods; Immunological testing
    • G01N33/53—Immunoassay; Biospecific binding assay; Materials therefor
    • G01N33/543—Immunoassay; Biospecific binding assay; Materials therefor with an insoluble carrier for immobilising immunochemicals
    • G01N33/544—Immunoassay; Biospecific binding assay; Materials therefor with an insoluble carrier for immobilising immunochemicals the carrier being organic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/28—Processes for applying liquids or other fluent materials performed by transfer from the surfaces of elements carrying the liquid or other fluent material, e.g. brushes, pads, rollers
    • B05D1/283—Transferring monomolecular layers or solutions of molecules adapted for forming monomolecular layers from carrying elements
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2610/00—Assays involving self-assembled monolayers [SAMs]
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H05K3/061—Etching masks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/20—Changing the shape of the active layer in the devices, e.g. patterning
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/60—Forming conductive regions or layers, e.g. electrodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/701—Langmuir Blodgett films

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Urology & Nephrology (AREA)
  • Molecular Biology (AREA)
  • Hematology (AREA)
  • Biomedical Technology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Pathology (AREA)
  • Analytical Chemistry (AREA)
  • Biotechnology (AREA)
  • Cell Biology (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Microbiology (AREA)
  • General Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • Food Science & Technology (AREA)
  • Medicinal Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Theoretical Computer Science (AREA)
  • Composite Materials (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Control Of Vending Devices And Auxiliary Devices For Vending Devices (AREA)
  • Diaphragms For Electromechanical Transducers (AREA)
  • Thin Magnetic Films (AREA)
  • Tents Or Canopies (AREA)
DE602004005888T 2003-11-19 2004-11-16 Herstellung von selbstorganisierten monoschichten Expired - Fee Related DE602004005888T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GBGB0326904.0A GB0326904D0 (en) 2003-11-19 2003-11-19 Formation of self-assembled monolayers
GB0326904 2003-11-19
PCT/IB2004/052448 WO2005049741A1 (en) 2003-11-19 2004-11-16 Formation of self-assembled monolayers

Publications (2)

Publication Number Publication Date
DE602004005888D1 true DE602004005888D1 (de) 2007-05-24
DE602004005888T2 DE602004005888T2 (de) 2008-01-17

Family

ID=29764055

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602004005888T Expired - Fee Related DE602004005888T2 (de) 2003-11-19 2004-11-16 Herstellung von selbstorganisierten monoschichten

Country Status (9)

Country Link
US (1) US20070095469A1 (de)
EP (1) EP1687381B1 (de)
JP (1) JP2007515510A (de)
CN (1) CN100537676C (de)
AT (1) ATE359334T1 (de)
DE (1) DE602004005888T2 (de)
GB (1) GB0326904D0 (de)
TW (1) TW200540228A (de)
WO (1) WO2005049741A1 (de)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8133534B2 (en) 2004-11-22 2012-03-13 Wisconsin Alumni Research Foundation Methods and compositions for forming patterns with isolated or discrete features using block copolymer materials
US8287957B2 (en) * 2004-11-22 2012-10-16 Wisconsin Alumni Research Foundation Methods and compositions for forming aperiodic patterned copolymer films
WO2007013007A2 (en) * 2005-07-28 2007-02-01 Koninklijke Philips Electronics N.V. Composition and use thereof
US8168284B2 (en) 2005-10-06 2012-05-01 Wisconsin Alumni Research Foundation Fabrication of complex three-dimensional structures based on directed assembly of self-assembling materials on activated two-dimensional templates
US8618221B2 (en) * 2005-10-14 2013-12-31 Wisconsin Alumni Research Foundation Directed assembly of triblock copolymers
US7871933B2 (en) 2005-12-01 2011-01-18 International Business Machines Corporation Combined stepper and deposition tool
US8500985B2 (en) * 2006-07-21 2013-08-06 Novellus Systems, Inc. Photoresist-free metal deposition
US8764996B2 (en) * 2006-10-18 2014-07-01 3M Innovative Properties Company Methods of patterning a material on polymeric substrates
US20080095988A1 (en) * 2006-10-18 2008-04-24 3M Innovative Properties Company Methods of patterning a deposit metal on a polymeric substrate
US7968804B2 (en) 2006-12-20 2011-06-28 3M Innovative Properties Company Methods of patterning a deposit metal on a substrate
WO2009079241A2 (en) 2007-12-07 2009-06-25 Wisconsin Alumni Research Foundation Density multiplication and improved lithography by directed block copolymer assembly
JP5543367B2 (ja) * 2007-12-19 2014-07-09 スリーエム イノベイティブ プロパティズ カンパニー マイクロコンタクトプリンティング用のインク溶液
WO2009108771A2 (en) * 2008-02-28 2009-09-03 3M Innovative Properties Company Methods of patterning a conductor on a substrate
US8133341B2 (en) * 2008-04-01 2012-03-13 Wisconsin Alumni Research Foundation Molecular transfer printing using block copolymers
US20100084081A1 (en) * 2008-08-06 2010-04-08 Academia Sinica Method for Fabricating Organic Optoelectronic Multi-Layer Devices
WO2010098102A1 (ja) 2009-02-27 2010-09-02 三井化学株式会社 転写体およびその製造方法
US9299381B2 (en) 2011-02-07 2016-03-29 Wisconsin Alumni Research Foundation Solvent annealing block copolymers on patterned substrates
WO2013040483A1 (en) 2011-09-15 2013-03-21 Wisconsin Alumni Research Foundation Directed assembly of block copolymer films between a chemically patterned surface and a second surface
US9372398B2 (en) 2012-03-02 2016-06-21 Wisconsin Alumni Research Foundation Patterning in the directed assembly of block copolymers using triblock or multiblock copolymers
US20130304739A1 (en) * 2012-05-10 2013-11-14 Samsung Electronics Co., Ltd. Computing system with domain independence orientation mechanism and method of operation thereof
DE102012112030A1 (de) 2012-12-10 2014-06-12 Ev Group E. Thallner Gmbh Verfahren zum Mikrokontaktprägen
FR3002165B1 (fr) * 2013-02-21 2015-11-06 Univ Lyon 1 Claude Bernard Procede de transfert localise, sur un substrat, d'une espece palladiee par tamponnage
FR3002164B1 (fr) * 2013-02-21 2015-02-20 Univ Lyon 1 Claude Bernard Procede de tamponnage par preparation d'une couche auto-assemblee
CN114959715B (zh) * 2022-05-17 2024-02-06 中北大学 硫醚类铜基自组装膜的制备及缓蚀应用

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4096155A (en) * 1976-09-02 1978-06-20 American Cyanamid Company 1,3-Dithiolane compounds and method of preparation thereof
US4075228A (en) * 1977-05-23 1978-02-21 American Cyanamid Company 1,3-Dithiolane compounds and method of preparation thereof
US5512131A (en) * 1993-10-04 1996-04-30 President And Fellows Of Harvard College Formation of microstamped patterns on surfaces and derivative articles
US6817293B2 (en) * 2001-03-28 2004-11-16 Dainippon Printing Co., Ltd. Patterning method with micro-contact printing and its printed product

Also Published As

Publication number Publication date
WO2005049741A1 (en) 2005-06-02
TW200540228A (en) 2005-12-16
JP2007515510A (ja) 2007-06-14
GB0326904D0 (en) 2003-12-24
CN100537676C (zh) 2009-09-09
EP1687381A1 (de) 2006-08-09
DE602004005888T2 (de) 2008-01-17
ATE359334T1 (de) 2007-05-15
US20070095469A1 (en) 2007-05-03
CN1882664A (zh) 2006-12-20
EP1687381B1 (de) 2007-04-11

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee