ATE326555T1 - Quelle zur thermischen pvd-beschichtung für organische elektrolumineszente schichten - Google Patents

Quelle zur thermischen pvd-beschichtung für organische elektrolumineszente schichten

Info

Publication number
ATE326555T1
ATE326555T1 AT03016305T AT03016305T ATE326555T1 AT E326555 T1 ATE326555 T1 AT E326555T1 AT 03016305 T AT03016305 T AT 03016305T AT 03016305 T AT03016305 T AT 03016305T AT E326555 T1 ATE326555 T1 AT E326555T1
Authority
AT
Austria
Prior art keywords
organic electroluminescent
electroluminescent layers
source
substrate
deposition
Prior art date
Application number
AT03016305T
Other languages
English (en)
Inventor
Ki Beom Kim
Sang Dae Kim
Yoon Soo Han
Yoon Heung Tak
Seok Joo Kim
Original Assignee
Lg Electronics Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR10-2002-0042271A external-priority patent/KR100471358B1/ko
Priority claimed from KR10-2002-0058116A external-priority patent/KR100471361B1/ko
Priority claimed from KR1020020059786A external-priority patent/KR100669194B1/ko
Application filed by Lg Electronics Inc filed Critical Lg Electronics Inc
Application granted granted Critical
Publication of ATE326555T1 publication Critical patent/ATE326555T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/543—Controlling the film thickness or evaporation rate using measurement on the vapor source
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/40—Thermal treatment, e.g. annealing in the presence of a solvent vapour
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
AT03016305T 2002-07-19 2003-07-18 Quelle zur thermischen pvd-beschichtung für organische elektrolumineszente schichten ATE326555T1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
KR10-2002-0042271A KR100471358B1 (ko) 2002-07-19 2002-07-19 유기 전자 발광층의 증착 장치
KR10-2002-0058116A KR100471361B1 (ko) 2002-09-25 2002-09-25 유기 전계 발광 소자 증착 장치
KR1020020059786A KR100669194B1 (ko) 2002-10-01 2002-10-01 유기 전계 발광 소자 증발원

Publications (1)

Publication Number Publication Date
ATE326555T1 true ATE326555T1 (de) 2006-06-15

Family

ID=36571445

Family Applications (1)

Application Number Title Priority Date Filing Date
AT03016305T ATE326555T1 (de) 2002-07-19 2003-07-18 Quelle zur thermischen pvd-beschichtung für organische elektrolumineszente schichten

Country Status (6)

Country Link
US (3) US7025832B2 (de)
EP (3) EP1560468B1 (de)
JP (3) JP3924751B2 (de)
CN (1) CN1226448C (de)
AT (1) ATE326555T1 (de)
DE (1) DE60305246T2 (de)

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KR101252756B1 (ko) * 2011-08-08 2013-04-09 공주대학교 산학협력단 복수의 증발특성을 갖는 점증발원의 노즐
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KR102098619B1 (ko) * 2013-05-31 2020-05-25 삼성디스플레이 주식회사 도가니 장치 및 이를 포함하는 증착 장치
CN105177510B (zh) * 2015-10-21 2018-04-03 京东方科技集团股份有限公司 蒸镀设备及蒸镀方法
US10876205B2 (en) 2016-09-30 2020-12-29 Asm Ip Holding B.V. Reactant vaporizer and related systems and methods
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CN106906445B (zh) * 2017-03-29 2019-02-12 武汉华星光电技术有限公司 一种蒸发源
CN107805782B (zh) * 2017-11-27 2019-09-20 深圳市华星光电半导体显示技术有限公司 一种蒸镀装置
WO2019239192A1 (en) * 2018-06-15 2019-12-19 Arcelormittal Vacuum deposition facility and method for coating a substrate
KR20200020608A (ko) 2018-08-16 2020-02-26 에이에스엠 아이피 홀딩 비.브이. 고체 소스 승화기
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KR102221960B1 (ko) * 2019-03-25 2021-03-04 엘지전자 주식회사 증착 장치
JP7303031B2 (ja) * 2019-06-07 2023-07-04 株式会社アルバック 真空蒸着装置用の蒸着源
CN110344004A (zh) * 2019-08-29 2019-10-18 上海天马有机发光显示技术有限公司 一种蒸镀坩埚和蒸镀设备
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Also Published As

Publication number Publication date
US20060070576A1 (en) 2006-04-06
CN1487116A (zh) 2004-04-07
EP1382713B1 (de) 2006-05-17
DE60305246D1 (de) 2006-06-22
US7815737B2 (en) 2010-10-19
US20060054089A1 (en) 2006-03-16
EP1560468B1 (de) 2018-03-21
JP3924751B2 (ja) 2007-06-06
JP2004095542A (ja) 2004-03-25
DE60305246T2 (de) 2006-09-14
US20040016400A1 (en) 2004-01-29
JP4429305B2 (ja) 2010-03-10
EP1560468A1 (de) 2005-08-03
CN1226448C (zh) 2005-11-09
JP2007123285A (ja) 2007-05-17
EP1382713A2 (de) 2004-01-21
JP2007128898A (ja) 2007-05-24
EP1560467A1 (de) 2005-08-03
US7025832B2 (en) 2006-04-11
EP1382713A3 (de) 2004-06-02
EP1560467B1 (de) 2014-02-26

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