ATE497028T1 - Vorrichtung und verfahren zum vakuum-ausdampfen - Google Patents

Vorrichtung und verfahren zum vakuum-ausdampfen

Info

Publication number
ATE497028T1
ATE497028T1 AT01114632T AT01114632T ATE497028T1 AT E497028 T1 ATE497028 T1 AT E497028T1 AT 01114632 T AT01114632 T AT 01114632T AT 01114632 T AT01114632 T AT 01114632T AT E497028 T1 ATE497028 T1 AT E497028T1
Authority
AT
Austria
Prior art keywords
vapor
substrate
vapor sources
sources
organic material
Prior art date
Application number
AT01114632T
Other languages
English (en)
Inventor
Kenji Tsubaki
Junji Kido
Yasuhisa Kishigami
Yukihiro Kondo
Original Assignee
Panasonic Elec Works Co Ltd
Junji Kido
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Panasonic Elec Works Co Ltd, Junji Kido filed Critical Panasonic Elec Works Co Ltd
Application granted granted Critical
Publication of ATE497028T1 publication Critical patent/ATE497028T1/de

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
AT01114632T 2000-06-22 2001-06-19 Vorrichtung und verfahren zum vakuum-ausdampfen ATE497028T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000187582 2000-06-22

Publications (1)

Publication Number Publication Date
ATE497028T1 true ATE497028T1 (de) 2011-02-15

Family

ID=18687537

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01114632T ATE497028T1 (de) 2000-06-22 2001-06-19 Vorrichtung und verfahren zum vakuum-ausdampfen

Country Status (8)

Country Link
US (1) US6696096B2 (de)
EP (1) EP1167566B1 (de)
KR (1) KR100483487B1 (de)
CN (1) CN100422380C (de)
AT (1) ATE497028T1 (de)
DE (1) DE60143926D1 (de)
SG (1) SG90254A1 (de)
TW (1) TW534926B (de)

Families Citing this family (113)

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EP1167566B1 (de) 2011-01-26
US20020017245A1 (en) 2002-02-14
KR100483487B1 (ko) 2005-04-15
CN100422380C (zh) 2008-10-01
US6696096B2 (en) 2004-02-24
CN1333385A (zh) 2002-01-30
EP1167566A1 (de) 2002-01-02
TW534926B (en) 2003-06-01
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