DE60016771D1 - Verfahren und vorrichtung zur herstellung von siliziumkarbid-kristallen - Google Patents

Verfahren und vorrichtung zur herstellung von siliziumkarbid-kristallen

Info

Publication number
DE60016771D1
DE60016771D1 DE60016771T DE60016771T DE60016771D1 DE 60016771 D1 DE60016771 D1 DE 60016771D1 DE 60016771 T DE60016771 T DE 60016771T DE 60016771 T DE60016771 T DE 60016771T DE 60016771 D1 DE60016771 D1 DE 60016771D1
Authority
DE
Germany
Prior art keywords
carbide
silicon carbide
preparing silicon
carbide crystals
boules
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60016771T
Other languages
English (en)
Other versions
DE60016771T2 (de
Inventor
Claes Kordina
James Paisley
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Wolfspeed Inc
Original Assignee
Cree Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cree Inc filed Critical Cree Inc
Application granted granted Critical
Publication of DE60016771D1 publication Critical patent/DE60016771D1/de
Publication of DE60016771T2 publication Critical patent/DE60016771T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10—Inorganic compounds or compositions
    • C30B29/36—Carbides
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10S117/90—Apparatus characterized by composition or treatment thereof, e.g. surface finish, surface coating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10S117/901—Levitation, reduced gravity, microgravity, space
    • Y10S117/902—Specified orientation, shape, crystallography, or size of seed or substrate

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Carbon And Carbon Compounds (AREA)
DE60016771T 1999-10-08 2000-10-05 Verfahren und vorrichtung zur herstellung von siliciumcarbid-kristallen Expired - Lifetime DE60016771T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US415402 1999-10-08
US09/415,402 US6824611B1 (en) 1999-10-08 1999-10-08 Method and apparatus for growing silicon carbide crystals
PCT/US2000/041076 WO2001027361A1 (en) 1999-10-08 2000-10-05 Method and apparatus for growing silicon carbide crystals

Publications (2)

Publication Number Publication Date
DE60016771D1 true DE60016771D1 (de) 2005-01-20
DE60016771T2 DE60016771T2 (de) 2006-02-23

Family

ID=23645557

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60016771T Expired - Lifetime DE60016771T2 (de) 1999-10-08 2000-10-05 Verfahren und vorrichtung zur herstellung von siliciumcarbid-kristallen

Country Status (12)

Country Link
US (2) US6824611B1 (de)
EP (1) EP1218572B1 (de)
JP (1) JP2003511337A (de)
KR (1) KR100855650B1 (de)
CN (2) CN1384892A (de)
AT (1) ATE284986T1 (de)
AU (1) AU1631601A (de)
CA (1) CA2385621C (de)
DE (1) DE60016771T2 (de)
ES (1) ES2233478T3 (de)
TW (1) TW552325B (de)
WO (1) WO2001027361A1 (de)

Families Citing this family (48)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7601441B2 (en) * 2002-06-24 2009-10-13 Cree, Inc. One hundred millimeter high purity semi-insulating single crystal silicon carbide wafer
US6814801B2 (en) * 2002-06-24 2004-11-09 Cree, Inc. Method for producing semi-insulating resistivity in high purity silicon carbide crystals
ATE335872T1 (de) * 2003-04-24 2006-09-15 Norstel Ab Vorrichtung und verfahren zur herstellung von einkristallen durch dampfphasenabscheidung
US7147713B2 (en) 2003-04-30 2006-12-12 Cree, Inc. Phase controlled sublimation
US7247513B2 (en) 2003-05-08 2007-07-24 Caracal, Inc. Dissociation of silicon clusters in a gas phase during chemical vapor deposition homo-epitaxial growth of silicon carbide
ITMI20031196A1 (it) * 2003-06-13 2004-12-14 Lpe Spa Sistema per crescere cristalli di carburo di silicio
KR100561701B1 (ko) * 2004-01-30 2006-03-17 한국과학기술연구원 탄화규소 나노로드 및 나노와이어의 제조 방법
JP2006001786A (ja) * 2004-06-17 2006-01-05 Hitachi Chem Co Ltd フッ化カルシウム結晶育成ルツボ、フッ化カルシウム結晶の製造方法及びフッ化カルシウム結晶
JP4609003B2 (ja) * 2004-08-30 2011-01-12 株式会社デンソー 炭化珪素単結晶の製造装置
US7314520B2 (en) 2004-10-04 2008-01-01 Cree, Inc. Low 1c screw dislocation 3 inch silicon carbide wafer
JP5068423B2 (ja) * 2004-10-13 2012-11-07 新日本製鐵株式会社 炭化珪素単結晶インゴット、炭化珪素単結晶ウェハ及びその製造方法
KR20060094769A (ko) * 2005-02-26 2006-08-30 네오세미테크 주식회사 대구경 탄화규소 단결정 성장 장치
JP4522898B2 (ja) * 2005-03-25 2010-08-11 日本碍子株式会社 単結晶製造装置
US7608524B2 (en) * 2005-04-19 2009-10-27 Ii-Vi Incorporated Method of and system for forming SiC crystals having spatially uniform doping impurities
US7615801B2 (en) * 2005-05-18 2009-11-10 Cree, Inc. High voltage silicon carbide devices having bi-directional blocking capabilities
US20060267043A1 (en) 2005-05-27 2006-11-30 Emerson David T Deep ultraviolet light emitting devices and methods of fabricating deep ultraviolet light emitting devices
NO326797B1 (no) * 2005-06-10 2009-02-16 Elkem As Fremgangsmate og apparat for raffinering av smeltet materiale
US8052794B2 (en) * 2005-09-12 2011-11-08 The United States Of America As Represented By The Secretary Of The Navy Directed reagents to improve material uniformity
US20070169687A1 (en) * 2006-01-26 2007-07-26 Caracal, Inc. Silicon carbide formation by alternating pulses
US8044567B2 (en) * 2006-03-31 2011-10-25 General Electric Company Light source incorporating a high temperature ceramic composite and gas phase for selective emission
KR100760336B1 (ko) * 2006-06-22 2007-09-20 (주)글로벌코센테크 화학적 기상 반응 방법을 이용하여 흑연의 표면 특성을개질하는 방법
ITMI20062213A1 (it) * 2006-11-20 2008-05-21 Lpe Spa Reattore per crescere cristalli
JP4735622B2 (ja) * 2007-08-28 2011-07-27 株式会社デンソー 炭化珪素単結晶の製造装置
CN100523315C (zh) * 2007-09-28 2009-08-05 中国科学院物理研究所 分体式钽坩埚及其制造方法
JP4547031B2 (ja) * 2009-03-06 2010-09-22 新日本製鐵株式会社 炭化珪素単結晶製造用坩堝、並びに炭化珪素単結晶の製造装置及び製造方法
WO2011010394A1 (ja) * 2009-07-21 2011-01-27 トヨタ自動車株式会社 溶液法による単結晶成長用種結晶軸
JP5500953B2 (ja) * 2009-11-19 2014-05-21 株式会社ニューフレアテクノロジー 成膜装置および成膜方法
EP2657373A1 (de) 2012-04-23 2013-10-30 Chung-Shan Institute of Science and Technology, Armaments, Bureau, Ministry of National Defense Tiegel zum Züchten von Kristallen
KR101458183B1 (ko) * 2013-03-07 2014-11-05 에스케이씨 주식회사 탄화규소 단결정 성장 장치 및 방법
EP2823703A1 (de) 2013-07-10 2015-01-14 Heliospectra AB Verfahren und Vorrichtung zur Steuerung von Pflanzenwachstum
US9580837B2 (en) * 2014-09-03 2017-02-28 Ii-Vi Incorporated Method for silicon carbide crystal growth by reacting elemental silicon vapor with a porous carbon solid source material
CN105702561B (zh) * 2014-12-12 2018-09-18 韩国东海炭素株式会社 半导体处理组件再生方法
CN104514034B (zh) * 2015-01-08 2017-10-27 中国科学院半导体研究所 用于碳化硅生长的高温装置及方法
CN114000197A (zh) 2015-09-24 2022-02-01 帕里杜斯有限公司 气相沉积装置以及使用高纯度聚合物衍生的碳化硅的技术
CN106929919A (zh) * 2015-12-29 2017-07-07 中国科学院上海硅酸盐研究所 一种碳化硅晶体生长用坩埚
CN105525352B (zh) * 2016-01-12 2018-07-10 台州市一能科技有限公司 一种采用升华法高速制造碳化硅晶体的装置及方法
JP6390628B2 (ja) * 2016-01-12 2018-09-19 トヨタ自動車株式会社 ＳｉＣ単結晶の製造方法及び製造装置
CN105543964A (zh) * 2016-02-02 2016-05-04 北京华进创威电子有限公司 消除碳化硅单晶生长过程中硅对石墨体腐蚀的方法和装置
CN108070908A (zh) * 2016-11-17 2018-05-25 上海新昇半导体科技有限公司 4H-SiC晶体生长设备及方法
JP7068914B2 (ja) * 2018-04-26 2022-05-17 昭和電工株式会社 断熱性遮蔽部材及びそれを備えた単結晶製造装置
CN109234798B (zh) * 2018-11-02 2019-07-23 山东天岳先进材料科技有限公司 碳化硅单晶的连续长晶方法
KR102233751B1 (ko) * 2019-03-12 2021-03-30 주식회사 카보넥스 탄화규소 제조장치 및 그를 이용한 탄화규소의 제조방법
CN111732448A (zh) * 2020-06-16 2020-10-02 璨隆科技发展有限公司 一种石墨坩埚及其制备方法
JP2023537503A (ja) * 2020-08-06 2023-09-01 エスジーエル・カーボン・エスイー 耐火性炭化物多層
CN113026099A (zh) * 2021-03-05 2021-06-25 广州爱思威科技股份有限公司 碳化硅单晶生长控制装置及控制方法
CN113463197A (zh) * 2021-06-18 2021-10-01 广州爱思威科技股份有限公司 一种碳化硅晶体的制备方法、碳化硅晶片、碳化硅衬底及半导体器件
CN114045558B (zh) * 2021-10-19 2023-06-09 江苏超芯星半导体有限公司 一种以单一气体为源气体制备碳化硅晶体的方法
CN115287760A (zh) * 2022-08-04 2022-11-04 顾赢速科技(合肥)有限公司 高温化学气相沉积法生长碳化硅晶体的方法及其装置

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3230727A1 (de) 1982-08-18 1984-02-23 Siemens AG, 1000 Berlin und 8000 München Verfahren zum herstellen von siliziumkarbid
US4664944A (en) * 1986-01-31 1987-05-12 The United States Of America As Represented By The United States Department Of Energy Deposition method for producing silicon carbide high-temperature semiconductors
US4866005A (en) 1987-10-26 1989-09-12 North Carolina State University Sublimation of silicon carbide to produce large, device quality single crystals of silicon carbide
AU2250392A (en) * 1991-06-12 1993-01-12 Case Western Reserve University Process for the controlled growth of single-crystal films of silicon carbide polytypes on silicon carbide wafers
JPH05208900A (ja) * 1992-01-28 1993-08-20 Nisshin Steel Co Ltd 炭化ケイ素単結晶の成長装置
JP3491402B2 (ja) 1995-08-07 2004-01-26 株式会社デンソー 単結晶製造方法及びその単結晶製造装置
SE9503426D0 (sv) * 1995-10-04 1995-10-04 Abb Research Ltd A device for heat treatment of objects and a method for producing a susceptor
US5746827A (en) 1995-12-27 1998-05-05 Northrop Grumman Corporation Method of producing large diameter silicon carbide crystals
RU2094547C1 (ru) 1996-01-22 1997-10-27 Юрий Александрович Водаков Сублимационный способ выращивания монокристаллов карбида кремния и источник карбида кремния для осуществления способа
JP3384242B2 (ja) * 1996-03-29 2003-03-10 株式会社豊田中央研究所 炭化珪素単結晶の製造方法
US5873937A (en) 1997-05-05 1999-02-23 Northrop Grumman Corporation Method of growing 4H silicon carbide crystal
US5915194A (en) * 1997-07-03 1999-06-22 The United States Of America As Represented By The Administrator Of National Aeronautics And Space Administration Method for growth of crystal surfaces and growth of heteroepitaxial single crystal films thereon
JP4122548B2 (ja) * 1997-10-15 2008-07-23 昭和電工株式会社 炭化珪素単結晶の製造方法
JPH11116399A (ja) * 1997-10-16 1999-04-27 Denso Corp 炭化タンタルのコーティング方法及びこの方法を用いて製造した単結晶製造装置
US5985024A (en) * 1997-12-11 1999-11-16 Northrop Grumman Corporation Method and apparatus for growing high purity single crystal silicon carbide
RU2162117C2 (ru) * 1999-01-21 2001-01-20 Макаров Юрий Николаевич Способ эпитаксиального выращивания карбида кремния и реактор для его осуществления

Also Published As

Publication number Publication date
EP1218572A1 (de) 2002-07-03
KR20020042682A (ko) 2002-06-05
US20050120943A1 (en) 2005-06-09
ATE284986T1 (de) 2005-01-15
CN1384892A (zh) 2002-12-11
WO2001027361A1 (en) 2001-04-19
US6824611B1 (en) 2004-11-30
ES2233478T3 (es) 2005-06-16
TW552325B (en) 2003-09-11
CA2385621A1 (en) 2001-04-19
DE60016771T2 (de) 2006-02-23
CN101220504A (zh) 2008-07-16
KR100855650B1 (ko) 2008-09-03
JP2003511337A (ja) 2003-03-25
AU1631601A (en) 2001-04-23
EP1218572B1 (de) 2004-12-15
CA2385621C (en) 2009-12-22

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