CN1947871B - 基板处理装置 - Google Patents
基板处理装置 Download PDFInfo
- Publication number
- CN1947871B CN1947871B CN2006101257687A CN200610125768A CN1947871B CN 1947871 B CN1947871 B CN 1947871B CN 2006101257687 A CN2006101257687 A CN 2006101257687A CN 200610125768 A CN200610125768 A CN 200610125768A CN 1947871 B CN1947871 B CN 1947871B
- Authority
- CN
- China
- Prior art keywords
- mentioned
- substrate
- curtain
- liquid
- handling part
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67046—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly scrubbing means, e.g. brushes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
Abstract
Description
Claims (6)
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005-300616 | 2005-10-14 | ||
JP2005300616 | 2005-10-14 | ||
JP2005300616 | 2005-10-14 | ||
JP2006054644 | 2006-03-01 | ||
JP2006-054644 | 2006-03-01 | ||
JP2006054644A JP4668088B2 (ja) | 2005-10-14 | 2006-03-01 | 基板処理装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1947871A CN1947871A (zh) | 2007-04-18 |
CN1947871B true CN1947871B (zh) | 2010-12-08 |
Family
ID=38156040
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2006101257687A Expired - Fee Related CN1947871B (zh) | 2005-10-14 | 2006-08-28 | 基板处理装置 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4668088B2 (zh) |
KR (1) | KR100817980B1 (zh) |
CN (1) | CN1947871B (zh) |
TW (1) | TW200715389A (zh) |
Families Citing this family (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100883298B1 (ko) * | 2007-06-08 | 2009-02-11 | 아프로시스템 주식회사 | 상하 분리가능한 평판 디스플레이 세정장치 |
JP2009147260A (ja) * | 2007-12-18 | 2009-07-02 | Dainippon Screen Mfg Co Ltd | 基板処理装置 |
KR101296659B1 (ko) * | 2008-11-14 | 2013-08-14 | 엘지디스플레이 주식회사 | 세정 장치 |
KR101034374B1 (ko) * | 2008-11-28 | 2011-05-16 | 세메스 주식회사 | 기판 세정 장치 및 방법 |
KR200451730Y1 (ko) | 2008-12-29 | 2011-01-11 | 주식회사 케이씨텍 | 세정장치의 오토셔터 |
CN101847567B (zh) * | 2009-03-26 | 2012-02-29 | 北京京东方光电科技有限公司 | 清洗基板的装置 |
CN101954358B (zh) * | 2010-05-06 | 2012-07-04 | 东莞宏威数码机械有限公司 | 平移式基板清洗装置 |
DE102010024840B4 (de) * | 2010-06-23 | 2016-09-22 | Eisenmann Se | Trockner |
CN102357479A (zh) * | 2011-07-19 | 2012-02-22 | 廖启明 | 应用于线路板生产的环保节水处理系统、装置及处理方法 |
CN102626695B (zh) * | 2011-09-28 | 2015-04-08 | 北京京东方光电科技有限公司 | 基板清洗系统 |
TWI612568B (zh) * | 2012-05-17 | 2018-01-21 | Ebara Corp | 基板洗淨裝置 |
JP6133120B2 (ja) | 2012-05-17 | 2017-05-24 | 株式会社荏原製作所 | 基板洗浄装置 |
CN103406302B (zh) | 2013-08-23 | 2015-08-12 | 深圳市华星光电技术有限公司 | 基于紫外线的清洗方法及清洗装置 |
CN105665397A (zh) * | 2016-03-17 | 2016-06-15 | 东旭科技集团有限公司 | 液晶玻璃基板清洗设备和方法 |
CN205692805U (zh) * | 2016-05-09 | 2016-11-16 | 合肥鑫晟光电科技有限公司 | 基板处理设备 |
CN108239736B (zh) * | 2016-12-23 | 2024-02-23 | 无锡市斯威克科技有限公司 | 一种光伏用反光焊带的脉冲风刀 |
CN108993960A (zh) * | 2017-06-07 | 2018-12-14 | 丁保粮 | 一种气液喷淋清洗机 |
CN108325900B (zh) * | 2017-09-19 | 2021-02-02 | 福建晟哲自动化科技有限公司 | 一种液晶面板清洗设备 |
CN207793414U (zh) * | 2017-12-06 | 2018-08-31 | 北京铂阳顶荣光伏科技有限公司 | 具有防气体飘逸功能的板材镀膜设备 |
CN109047074B (zh) * | 2018-08-26 | 2021-02-26 | 东莞市金盘模具配件有限公司 | 一种精密模具加工用表面清洗装置 |
CN109248878B (zh) * | 2018-08-31 | 2020-10-13 | 深圳市华星光电技术有限公司 | 一种清洗平台以及清洗方法 |
CN110681666A (zh) * | 2019-08-09 | 2020-01-14 | 江苏迪佳电子有限公司 | 一种电容触摸屏加工装置 |
JP7312738B2 (ja) * | 2020-12-11 | 2023-07-21 | 芝浦メカトロニクス株式会社 | 基板処理装置 |
CN113154862B (zh) * | 2021-02-26 | 2022-07-15 | 东莞汇和电子有限公司 | 一种电子线路板装配活塞干燥风刀 |
CN113020080A (zh) * | 2021-03-30 | 2021-06-25 | 苏州阿洛斯环境发生器有限公司 | 一种定向线性双流体清洗方法及装置 |
CN113020079A (zh) * | 2021-03-30 | 2021-06-25 | 苏州阿洛斯环境发生器有限公司 | 一种定向双流体清洗方法 |
CN115947119B (zh) * | 2023-03-14 | 2023-05-23 | 合肥光微光电科技有限公司 | 一种光学玻璃生产自动化输送设备 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5564159A (en) * | 1994-05-26 | 1996-10-15 | The John Treiber Company | Closed-loop multistage system for cleaning printed circuit boards |
CN1194454A (zh) * | 1997-01-24 | 1998-09-30 | 东京电子株式会社 | 清洗装置及清洗方法 |
CN1485150A (zh) * | 2002-08-19 | 2004-03-31 | 大日本屏影象制造株式会社 | 基板处理装置及基板清洗设备 |
CN1531029A (zh) * | 2003-03-12 | 2004-09-22 | 大日本屏影象制造株式会社 | 基板处理方法和基板处理装置 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100232593B1 (ko) * | 1997-01-24 | 1999-12-01 | 구자홍 | Pdp용박리장치및그방법 |
KR100237210B1 (ko) * | 1997-07-22 | 2000-01-15 | 구자홍 | 플라스마 디스플레이 패널용 세정 시스템 |
JPH11121427A (ja) * | 1997-10-13 | 1999-04-30 | Dainippon Screen Mfg Co Ltd | 基板処理装置 |
KR100542299B1 (ko) * | 1998-04-23 | 2006-04-14 | 비오이 하이디스 테크놀로지 주식회사 | 포토레지스트의 에지부 제거 장치 |
DE10130999A1 (de) * | 2000-06-29 | 2002-04-18 | D M S Co | Multifunktions-Reinigungsmodul einer Herstellungseinrichtung für Flachbildschirme und Reinigungsgerät mit Verwendung desselben |
JP2004335838A (ja) * | 2003-05-09 | 2004-11-25 | Shin Etsu Handotai Co Ltd | 洗浄装置、洗浄システム及び洗浄方法 |
-
2006
- 2006-03-01 JP JP2006054644A patent/JP4668088B2/ja not_active Expired - Fee Related
- 2006-07-31 TW TW095127955A patent/TW200715389A/zh not_active IP Right Cessation
- 2006-08-28 CN CN2006101257687A patent/CN1947871B/zh not_active Expired - Fee Related
- 2006-08-31 KR KR1020060083495A patent/KR100817980B1/ko not_active IP Right Cessation
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5564159A (en) * | 1994-05-26 | 1996-10-15 | The John Treiber Company | Closed-loop multistage system for cleaning printed circuit boards |
CN1194454A (zh) * | 1997-01-24 | 1998-09-30 | 东京电子株式会社 | 清洗装置及清洗方法 |
CN1485150A (zh) * | 2002-08-19 | 2004-03-31 | 大日本屏影象制造株式会社 | 基板处理装置及基板清洗设备 |
CN1531029A (zh) * | 2003-03-12 | 2004-09-22 | 大日本屏影象制造株式会社 | 基板处理方法和基板处理装置 |
Non-Patent Citations (3)
Title |
---|
JP特开2000-31112A 2000.01.28 |
JP特开2002-172369A 2002.06.18 |
JP特开平11-16871A 1999.01.22 |
Also Published As
Publication number | Publication date |
---|---|
KR100817980B1 (ko) | 2008-03-31 |
KR20070041320A (ko) | 2007-04-18 |
TWI303849B (zh) | 2008-12-01 |
TW200715389A (en) | 2007-04-16 |
JP2007134665A (ja) | 2007-05-31 |
JP4668088B2 (ja) | 2011-04-13 |
CN1947871A (zh) | 2007-04-18 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C56 | Change in the name or address of the patentee |
Owner name: SCREEN GROUP CO., LTD. Free format text: FORMER NAME: DAINIPPON SCREEN MFG. CO., LTD. Owner name: DAINIPPON SCREEN MFG. CO., LTD. Free format text: FORMER NAME: DAINIPPON MESH PLATE MFR. CO., LTD. |
|
CP01 | Change in the name or title of a patent holder |
Address after: Kyoto City, Kyoto, Japan Patentee after: Skilling Group Address before: Kyoto City, Kyoto, Japan Patentee before: DAINIPPON SCREEN MFG Co.,Ltd. Address after: Kyoto City, Kyoto, Japan Patentee after: DAINIPPON SCREEN MFG Co.,Ltd. Address before: Kyoto City, Kyoto, Japan Patentee before: Dainippon Screen Mfg. Co.,Ltd. |
|
CF01 | Termination of patent right due to non-payment of annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20101208 Termination date: 20160828 |