CN207793414U - 具有防气体飘逸功能的板材镀膜设备 - Google Patents
具有防气体飘逸功能的板材镀膜设备 Download PDFInfo
- Publication number
- CN207793414U CN207793414U CN201721687021.0U CN201721687021U CN207793414U CN 207793414 U CN207793414 U CN 207793414U CN 201721687021 U CN201721687021 U CN 201721687021U CN 207793414 U CN207793414 U CN 207793414U
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- CN
- China
- Prior art keywords
- partition
- gas
- elegant
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- plank
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B16/00—Spray booths
- B05B16/60—Ventilation arrangements specially adapted therefor
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B16/00—Spray booths
- B05B16/40—Construction elements specially adapted therefor, e.g. floors, walls or ceilings
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/568—Transferring the substrates through a series of coating stations
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67126—Apparatus for sealing, encapsulating, glassing, decapsulating or the like
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B12/00—Arrangements for controlling delivery; Arrangements for controlling the spray area
- B05B12/16—Arrangements for controlling delivery; Arrangements for controlling the spray area for controlling the spray area
- B05B12/18—Arrangements for controlling delivery; Arrangements for controlling the spray area for controlling the spray area using fluids, e.g. gas streams
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B12/00—Arrangements for controlling delivery; Arrangements for controlling the spray area
- B05B12/16—Arrangements for controlling delivery; Arrangements for controlling the spray area for controlling the spray area
- B05B12/32—Shielding elements, i.e. elements preventing overspray from reaching areas other than the object to be sprayed
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
- B05C11/11—Vats or other containers for liquids or other fluent materials
- B05C11/115—Sealing means for work inlet or outlet
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
- Details Or Accessories Of Spraying Plant Or Apparatus (AREA)
- Spray Control Apparatus (AREA)
- Reciprocating Pumps (AREA)
Abstract
Description
Claims (9)
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201721687021.0U CN207793414U (zh) | 2017-12-06 | 2017-12-06 | 具有防气体飘逸功能的板材镀膜设备 |
PCT/CN2017/117929 WO2019109406A1 (zh) | 2017-12-06 | 2017-12-22 | 具有防气体飘逸功能的板材镀膜设备 |
EP18209249.4A EP3495535A1 (en) | 2017-12-06 | 2018-11-29 | Coating apparatus |
KR1020180152999A KR20190067096A (ko) | 2017-12-06 | 2018-11-30 | 코팅설비 |
US16/206,307 US20190168249A1 (en) | 2017-12-06 | 2018-11-30 | Coating apparatus |
JP2018226050A JP2019098332A (ja) | 2017-12-06 | 2018-11-30 | コーティング設備 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201721687021.0U CN207793414U (zh) | 2017-12-06 | 2017-12-06 | 具有防气体飘逸功能的板材镀膜设备 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN207793414U true CN207793414U (zh) | 2018-08-31 |
Family
ID=63283209
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201721687021.0U Active CN207793414U (zh) | 2017-12-06 | 2017-12-06 | 具有防气体飘逸功能的板材镀膜设备 |
Country Status (6)
Country | Link |
---|---|
US (1) | US20190168249A1 (zh) |
EP (1) | EP3495535A1 (zh) |
JP (1) | JP2019098332A (zh) |
KR (1) | KR20190067096A (zh) |
CN (1) | CN207793414U (zh) |
WO (1) | WO2019109406A1 (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112746260A (zh) * | 2020-12-30 | 2021-05-04 | 湖南柯盛新材料有限公司 | 一种冷喷涂制造旋转靶材的工艺及其生产设备 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102020130209A1 (de) * | 2020-11-16 | 2022-05-19 | Applied Materials, Inc. | Vakuumprozesssystem, Stützstruktur und Verfahren zum Transportieren eines Substrats |
CN115254482B (zh) * | 2022-08-11 | 2023-08-04 | 重庆科技学院 | 一种用于检测sf6吸附剂浸出液的喷雾装置和喷雾调控方法 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4545136A (en) * | 1981-03-16 | 1985-10-08 | Sovonics Solar Systems | Isolation valve |
JPH02148715A (ja) * | 1988-11-29 | 1990-06-07 | Canon Inc | 半導体デバイスの連続形成装置 |
CN2067711U (zh) * | 1989-05-06 | 1990-12-19 | 中科院上海硅酸盐研究所 | 多室连续处理设备的空间气体隔离装置 |
JP2975151B2 (ja) * | 1991-03-28 | 1999-11-10 | キヤノン株式会社 | 半導体素子の連続的製造装置 |
US5374313A (en) * | 1992-06-24 | 1994-12-20 | Energy Conversion Devices, Inc. | Magnetic roller gas gate employing transonic sweep gas flow to isolate regions of differing gaseous composition or pressure |
US5946587A (en) * | 1992-08-06 | 1999-08-31 | Canon Kabushiki Kaisha | Continuous forming method for functional deposited films |
DE4313284A1 (de) * | 1993-04-23 | 1994-10-27 | Leybold Ag | Spaltschleuse für das Ein- oder Ausbringen von Substraten von der einen in eine benachbarte Behandlungskammer |
JP4668088B2 (ja) * | 2005-10-14 | 2011-04-13 | 大日本スクリーン製造株式会社 | 基板処理装置 |
DE102010022277A1 (de) * | 2010-05-31 | 2011-12-01 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Vorrichtung und Verfahren zur Reaktivgastrennung in in-line-Beschichtungsanlagen |
CN102534538A (zh) * | 2010-12-17 | 2012-07-04 | 上海空间电源研究所 | 一种真空腔室间气氛隔离装置 |
CN102506570B (zh) * | 2011-11-03 | 2013-10-23 | 北京太阳能电力研究院有限公司 | 气刀 |
DE102014106451B4 (de) * | 2014-05-08 | 2018-09-20 | VON ARDENNE Asset GmbH & Co. KG | Vakuumkammergehäuse |
DE102014116696B4 (de) * | 2014-11-14 | 2016-10-20 | Von Ardenne Gmbh | Vakuumkammer und Verfahren zum Betreiben einer Vakuumprozessieranlage |
KR102648936B1 (ko) * | 2015-08-18 | 2024-03-18 | 타타 스틸 네덜란드 테크날러지 베.뷔. | 금속 스트립을 세정 및 코팅하는 방법 및 장치 |
-
2017
- 2017-12-06 CN CN201721687021.0U patent/CN207793414U/zh active Active
- 2017-12-22 WO PCT/CN2017/117929 patent/WO2019109406A1/zh active Application Filing
-
2018
- 2018-11-29 EP EP18209249.4A patent/EP3495535A1/en not_active Withdrawn
- 2018-11-30 KR KR1020180152999A patent/KR20190067096A/ko unknown
- 2018-11-30 JP JP2018226050A patent/JP2019098332A/ja active Pending
- 2018-11-30 US US16/206,307 patent/US20190168249A1/en not_active Abandoned
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112746260A (zh) * | 2020-12-30 | 2021-05-04 | 湖南柯盛新材料有限公司 | 一种冷喷涂制造旋转靶材的工艺及其生产设备 |
CN112746260B (zh) * | 2020-12-30 | 2023-02-28 | 湖南柯盛新材料有限公司 | 一种冷喷涂制造旋转靶材的工艺及其生产设备 |
Also Published As
Publication number | Publication date |
---|---|
JP2019098332A (ja) | 2019-06-24 |
EP3495535A1 (en) | 2019-06-12 |
WO2019109406A1 (zh) | 2019-06-13 |
KR20190067096A (ko) | 2019-06-14 |
US20190168249A1 (en) | 2019-06-06 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
GR01 | Patent grant | ||
GR01 | Patent grant | ||
CP01 | Change in the name or title of a patent holder | ||
CP01 | Change in the name or title of a patent holder |
Address after: 100176 Beijing Daxing District Beijing economic and Technological Development Zone Rongchang East Street 7 hospital 6 Building 3001 room. Patentee after: Beijing Dingrong Photovoltaic Technology Co.,Ltd. Address before: 100176 Beijing Daxing District Beijing economic and Technological Development Zone Rongchang East Street 7 hospital 6 Building 3001 room. Patentee before: BEIJING APOLLO DING RONG SOLAR TECHNOLOGY Co.,Ltd. |
|
TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20210406 Address after: Room 201, Building A, 1 Qianwan Road, Qianhai Shenzhen-Hong Kong Cooperation Zone, Shenzhen, Guangdong Province Patentee after: Shenzhen Zhengyue development and Construction Co.,Ltd. Address before: 100176 Beijing Daxing District Beijing economic and Technological Development Zone Rongchang East Street 7 hospital 6 Building 3001 room. Patentee before: Beijing Dingrong Photovoltaic Technology Co.,Ltd. |
|
TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20210901 Address after: No.66210, 3rd floor, Pudong Free Trade Zone, Shanghai, China Patentee after: Shanghai zuqiang Energy Co.,Ltd. Address before: Room 201, Building A, 1 Qianwan Road, Qianhai Shenzhen-Hong Kong Cooperation Zone, Shenzhen, Guangdong Province Patentee before: Shenzhen Zhengyue development and Construction Co.,Ltd. |