CN207483840U - 板材镀膜设备 - Google Patents

板材镀膜设备 Download PDF

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CN207483840U
CN207483840U CN201721563337.9U CN201721563337U CN207483840U CN 207483840 U CN207483840 U CN 207483840U CN 201721563337 U CN201721563337 U CN 201721563337U CN 207483840 U CN207483840 U CN 207483840U
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施栓林
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Shanghai zuqiang Energy Co.,Ltd.
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Beijing Apollo Ding Rong Solar Technology Co Ltd
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    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3464—Sputtering using more than one target
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    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/228—Gas flow assisted PVD deposition
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    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
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    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations
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    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
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Abstract

本实用新型公开了一种板材镀膜设备，包括第一靶材镀膜腔(1)和第二靶材镀膜腔(2)，所述第一靶材镀膜腔(1)与所述第二靶材镀膜腔(2)之间设有隔离腔(3)，所述隔离腔(3)内设有分子泵(4)，所述隔离腔(3)通过第一隔板(5)与所述第一靶材镀膜腔(1)分隔，通过第二隔板(6)与所述第二靶材镀膜腔(2)分隔，所述第一隔板(5)和所述第二隔板(6)上均具有供玻璃通过的狭缝(7)；所述第一隔板(5)上设有吹扫装置(8)。本实用新型能够有效隔离镀膜设备的各个腔室，保证玻璃镀膜质量，具有结构简单和制造成本低的优点。

Description

板材镀膜设备
技术领域
本实用新型涉及一种镀膜设备，特别是一种板材镀膜设备。
背景技术
在板材镀膜设备中，根据不同的制程工艺，需要不同种类的靶材同时溅射沉积镀膜，每种靶材都有相应的工艺要求，在有主溅射气体的同时，还需要加入辅助溅射气体，如O2，H2，N2等，多种靶材的溅射过程是在同一个真空腔室发生的，为了在制程工艺中不同靶材之间反应气体互不影响，需要将不同靶材溅射工艺分隔开，来保证镀膜质量。
如图1所示，现有的隔离方式通常是在根据不同靶材溅射工艺分别设置工艺腔室100，工艺腔室100之间添加一个隔离腔200，隔离腔200内配有分子泵300来抽气，前后隔离腔200各安装一个翻板阀400来代替腔体间的门板，以实现不同工艺腔室气体的隔离，其造价贵，要求高，必须要有自动化控制。
实用新型内容
本实用新型的目的是提供一种板材镀膜设备，以解决现有技术中的技术问题，它能够有效隔离镀膜设备的各个腔室，保证玻璃镀膜质量，具有结构简单和制造成本低的优点。
本实用新型提供了一种板材镀膜设备，包括第一靶材镀膜腔和第二靶材镀膜腔，所述第一靶材镀膜腔与所述第二靶材镀膜腔之间设有隔离腔，所述隔离腔内设有分子泵，所述隔离腔通过第一隔板与所述第一靶材镀膜腔分隔，通过第二隔板与所述第二靶材镀膜腔分隔，所述第一隔板和所述第二隔板上均具有狭缝；所述第一隔板上设有吹扫装置。
前述的板材镀膜设备中，优选地，所述吹扫装置位于所述第一隔板上靠近所述隔离腔的一侧。
前述的板材镀膜设备中，优选地，所述吹扫装置包括气管、端板和流量控制阀，所述端板为2个，分别固定在所述狭缝长度方向上的两端，所述气管固定在2个所述端板上，所述气管的进气端与所述流量控制阀的出气端连接，所述流量控制阀的进气端通过管路与气源连接，所述气管上具有喷嘴。
前述的板材镀膜设备中，优选地，所述气管为环形结构。
前述的板材镀膜设备中，优选地，所述喷嘴的喷气方向朝向所述狭缝，所述喷嘴与所述狭缝的夹角为30°-60°度。
前述的板材镀膜设备中，优选地，所述喷嘴与所述狭缝的夹角为45°。
前述的板材镀膜设备中，优选地，所述狭缝的内壁面为粗糙面。
前述的板材镀膜设备中，优选地，所述分子泵为4个。
与现有技术相比，本实用新型在隔离腔内设置了分子泵，分子泵可以将隔离腔内的气体抽出隔离腔，以防止气体经过狭缝进入其它镀膜腔内；为了保证各个靶材镀膜腔内的镀膜质量，除了在靶材镀膜腔内设置分子泵外，还在第一隔板上设置了吹扫装置，通过吹扫装置的吹扫可以将进入到狭缝内的气体吹回到第一靶材镀膜腔内，再通过第一靶材镀膜腔内的分子泵抽出，解决气体飘逸的问题。
附图说明
图1是现有技术中板材镀膜设备的俯视图；
图2是本实用新型其中一种实施方式的俯视图；
图3是第一隔板和吹扫装置的轴测图。
附图标记说明：
图1中：100-工艺腔室，200-隔离腔，300-分子泵，400-翻板阀；
图2-图3中：1-第一靶材镀膜腔，2-第二靶材镀膜腔，3-隔离腔，4-分子泵，5-第一隔板，6-第二隔板，7-狭缝，8-吹扫装置，9-气管，10-端板，11-流量控制阀，12-喷嘴。
具体实施方式
下面详细描述本实用新型的实施例，所述实施例的示例在附图中示出，其中自始至终相同或类似的标号表示相同或类似的元件或具有相同或类似功能的元件。下面通过参考附图描述的实施例是示例性的，仅用于解释本实用新型，而不能解释为对本实用新型的限制。
本实用新型的实施例：如图2和图3所示，一种板材镀膜设备，包括第一靶材镀膜腔1和第二靶材镀膜腔2，第一靶材镀膜腔1与第二靶材镀膜腔2内的靶材不同，相应地二者通入的主溅射气体和辅助溅射气体也不同，为了防止气氛飘逸对镀膜工艺造成影响，在第一靶材镀膜腔1与第二靶材镀膜腔2之间设有隔离腔3，隔离腔3内设有分子泵4，分子泵4优选为4个，分子泵4用于将隔离腔3内的气体抽出，隔离腔3通过第一隔板5与第一靶材镀膜腔1分隔，隔离腔3通过第二隔板6与第二靶材镀膜腔2分隔，第一隔板5和第二隔板6上均具有供板材通过的狭缝7；为了提高隔离效果，还设置了吹扫装置8，通过吹扫装置8的设置可以将狭缝7内的气体吹回至原镀膜腔内。
优选地，吹扫装置8设置在第一隔板5上，且吹扫装置8位于隔离腔3内，吹扫装置8的吹气方向朝向第一靶材镀膜腔1的一侧。这种结构方式具有制造成本低和隔离效果好的优点。
上述实施例中，吹扫装置8可采用任意带有吹气功能的装置，但为了保证隔离效果，本实施例提供一种优选方案，如图3所示，吹扫装置8包括气管9、端板10和流量控制阀11，端板10为2个，分别通过螺丝固定在狭缝7长度方向上的两端，气管9固定在2个端板10上，气管9的进气端与流量控制阀11的出气端连接，流量控制阀11的进气端通过管路与气源连接，气管9上具有喷嘴12。
工作时，通过流量控制阀11控制气管9的供气量，气源中的气体与第一靶材镀膜腔1的主溅射气体相同，为了保证效果，气管9优选为环形结构，该环形结构与狭缝7仿形设计，且环绕狭缝7安装。喷嘴12的喷气方向朝向狭缝7，喷嘴12与狭缝7的夹角采用30°-60°，优选为45°。
此外，将狭缝7的内壁面通过喷砂工艺制成粗糙面也可以在一定程度上起到缓解气氛飘逸的作用。
以上依据图式所示的实施例详细说明了本实用新型的构造、特征及作用效果，以上所述仅为本实用新型的较佳实施例，但本实用新型不以图面所示限定实施范围，凡是依照本实用新型的构想所作的改变，或修改为等同变化的等效实施例，仍未超出说明书与图示所涵盖的精神时，均应在本实用新型的保护范围内。

Claims (8)

1.一种板材镀膜设备，包括第一靶材镀膜腔(1)和第二靶材镀膜腔(2)，所述第一靶材镀膜腔(1)与所述第二靶材镀膜腔(2)之间设有隔离腔(3)，所述隔离腔(3)内设有分子泵(4)，其特征在于：所述隔离腔(3)通过第一隔板(5)与所述第一靶材镀膜腔(1)分隔，通过第二隔板(6)与所述第二靶材镀膜腔(2)分隔，所述第一隔板(5)和所述第二隔板(6)上均具有狭缝(7)；所述第一隔板(5)上设有吹扫装置(8)。
2.根据权利要求1所述的板材镀膜设备，其特征在于：所述吹扫装置(8)位于所述第一隔板(5)上靠近所述隔离腔(3)的一侧。
3.根据权利要求1或2所述的板材镀膜设备，其特征在于：所述吹扫装置(8)包括气管(9)、端板(10)和流量控制阀(11)，所述端板(10)为2个，分别固定在所述狭缝(7)长度方向上的两端，所述气管(9)固定在2个所述端板(10)上，所述气管(9)的进气端与所述流量控制阀(11)的出气端连接，所述流量控制阀(11)的进气端通过管路与气源连接，所述气管(9)上具有喷嘴(12)。
4.根据权利要求3所述的板材镀膜设备，其特征在于：所述气管(9)为环形结构。
5.根据权利要求3所述的板材镀膜设备，其特征在于：所述喷嘴(12)的喷气方向朝向所述狭缝(7)，所述喷嘴(12)与所述狭缝(7)的夹角为30°-60°度。
6.根据权利要求5所述的板材镀膜设备，其特征在于：所述喷嘴(12)与所述狭缝(7)的夹角为45°。
7.根据权利要求1所述的板材镀膜设备，其特征在于：所述狭缝(7)的内壁面为粗糙面。
8.根据权利要求1所述的板材镀膜设备，其特征在于：所述分子泵(4)为4个。
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PCT/CN2017/117925 WO2019100506A1 (zh) 2017-11-21 2017-12-22 板材镀膜设备
EP17905005.9A EP3715498A1 (en) 2017-11-21 2017-12-22 Plate coating device
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CN111621755A (zh) * 2019-02-28 2020-09-04 广东汉能薄膜太阳能有限公司 气幕隔离装置及气幕隔离腔

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KR20190077244A (ko) 2019-07-03

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