CN1853142B - 光刻投影装置、气体净化方法、器件制造方法以及净化气体供应系统 - Google Patents

光刻投影装置、气体净化方法、器件制造方法以及净化气体供应系统 Download PDF

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Publication number
CN1853142B
CN1853142B CN2004800266052A CN200480026605A CN1853142B CN 1853142 B CN1853142 B CN 1853142B CN 2004800266052 A CN2004800266052 A CN 2004800266052A CN 200480026605 A CN200480026605 A CN 200480026605A CN 1853142 B CN1853142 B CN 1853142B
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China
Prior art keywords
purge gas
gas
moisture
gas mixture
projection apparatus
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Chinese (zh)
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CN1853142A (zh
Inventor
A·J·范德内特
J·斯佩格尔曼
J·J·范布拉格特
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ASML Holding NV
Entegris Inc
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ASML Holding NV
Entegris Inc
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0006—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means to keep optical surfaces clean, e.g. by preventing or removing dirt, stains, contamination, condensation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants

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  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Toxicology (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Fuel Cell (AREA)
  • Air Humidification (AREA)
  • Electron Beam Exposure (AREA)
CN2004800266052A 2003-07-21 2004-07-20 光刻投影装置、气体净化方法、器件制造方法以及净化气体供应系统 Expired - Lifetime CN1853142B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/623,180 2003-07-21
US10/623,180 US7384149B2 (en) 2003-07-21 2003-07-21 Lithographic projection apparatus, gas purging method and device manufacturing method and purge gas supply system
PCT/NL2004/000519 WO2005008339A2 (en) 2003-07-21 2004-07-20 Lithographic projection apparatus, purge gas supply system and gas purging method

Publications (2)

Publication Number Publication Date
CN1853142A CN1853142A (zh) 2006-10-25
CN1853142B true CN1853142B (zh) 2012-03-07

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CN2004800266052A Expired - Lifetime CN1853142B (zh) 2003-07-21 2004-07-20 光刻投影装置、气体净化方法、器件制造方法以及净化气体供应系统
CN2007101812213A Expired - Fee Related CN101144986B (zh) 2003-07-21 2004-07-21 光刻投影设备、气体吹扫方法、设备制造方法和吹扫气体提供系统
CN200480021018A Expired - Fee Related CN100590530C (zh) 2003-07-21 2004-07-21 光刻投影设备、气体吹扫方法、设备制造方法和吹扫气体提供系统

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CN2007101812213A Expired - Fee Related CN101144986B (zh) 2003-07-21 2004-07-21 光刻投影设备、气体吹扫方法、设备制造方法和吹扫气体提供系统
CN200480021018A Expired - Fee Related CN100590530C (zh) 2003-07-21 2004-07-21 光刻投影设备、气体吹扫方法、设备制造方法和吹扫气体提供系统

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US (4) US7384149B2 (cg-RX-API-DMAC7.html)
EP (3) EP1649325B1 (cg-RX-API-DMAC7.html)
JP (4) JP4487108B2 (cg-RX-API-DMAC7.html)
KR (3) KR100846184B1 (cg-RX-API-DMAC7.html)
CN (3) CN1853142B (cg-RX-API-DMAC7.html)
DE (1) DE602004027497D1 (cg-RX-API-DMAC7.html)
SG (1) SG141460A1 (cg-RX-API-DMAC7.html)
TW (3) TWI251130B (cg-RX-API-DMAC7.html)
WO (2) WO2005008339A2 (cg-RX-API-DMAC7.html)

Families Citing this family (123)

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Publication number Priority date Publication date Assignee Title
US9482966B2 (en) 2002-11-12 2016-11-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10503084B2 (en) 2002-11-12 2019-12-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
TWI232357B (en) 2002-11-12 2005-05-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
JP3953460B2 (ja) 2002-11-12 2007-08-08 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ投影装置
US7372541B2 (en) 2002-11-12 2008-05-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
CN101424883B (zh) 2002-12-10 2013-05-15 株式会社尼康 曝光设备和器件制造法
KR101036114B1 (ko) 2002-12-10 2011-05-23 가부시키가이샤 니콘 노광장치 및 노광방법, 디바이스 제조방법
US7242455B2 (en) 2002-12-10 2007-07-10 Nikon Corporation Exposure apparatus and method for producing device
SG158745A1 (en) 2002-12-10 2010-02-26 Nikon Corp Exposure apparatus and method for producing device
US7948604B2 (en) 2002-12-10 2011-05-24 Nikon Corporation Exposure apparatus and method for producing device
JP4352874B2 (ja) 2002-12-10 2009-10-28 株式会社ニコン 露光装置及びデバイス製造方法
SG171468A1 (en) 2002-12-10 2011-06-29 Nikon Corp Exposure apparatus and method for producing device
DE10261775A1 (de) 2002-12-20 2004-07-01 Carl Zeiss Smt Ag Vorrichtung zur optischen Vermessung eines Abbildungssystems
TWI591445B (zh) 2003-02-26 2017-07-11 尼康股份有限公司 Exposure apparatus, exposure method, and device manufacturing method
EP1610361B1 (en) 2003-03-25 2014-05-21 Nikon Corporation Exposure system and device production method
EP1612850B1 (en) 2003-04-07 2009-03-25 Nikon Corporation Exposure apparatus and method for manufacturing a device
KR20110104084A (ko) 2003-04-09 2011-09-21 가부시키가이샤 니콘 액침 리소그래피 유체 제어 시스템
CN101813892B (zh) 2003-04-10 2013-09-25 株式会社尼康 沉浸式光刻装置及使用光刻工艺制造微器件的方法
EP2950148B1 (en) 2003-04-10 2016-09-21 Nikon Corporation Environmental system including vaccum scavenge for an immersion lithography apparatus
CN1771463A (zh) 2003-04-10 2006-05-10 株式会社尼康 用于沉浸光刻装置收集液体的溢出通道
EP2618213B1 (en) 2003-04-11 2016-03-09 Nikon Corporation Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine
KR101525335B1 (ko) 2003-04-11 2015-06-03 가부시키가이샤 니콘 액침 리소그래피에 의한 광학기기의 세정방법
WO2004092830A2 (en) 2003-04-11 2004-10-28 Nikon Corporation Liquid jet and recovery system for immersion lithography
JP2006523958A (ja) 2003-04-17 2006-10-19 株式会社ニコン 液浸リソグラフィで使用するためのオートフォーカス素子の光学的構造
TWI295414B (en) 2003-05-13 2008-04-01 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
EP1624481A4 (en) 2003-05-15 2008-01-30 Nikon Corp EXPOSURE DEVICE AND METHOD FOR MANUFACTURING COMPONENTS
TWI424470B (zh) 2003-05-23 2014-01-21 尼康股份有限公司 A method of manufacturing an exposure apparatus and an element
TWI421906B (zh) 2003-05-23 2014-01-01 尼康股份有限公司 An exposure method, an exposure apparatus, and an element manufacturing method
KR101728664B1 (ko) 2003-05-28 2017-05-02 가부시키가이샤 니콘 노광 방법, 노광 장치, 및 디바이스 제조 방법
US6913654B2 (en) * 2003-06-02 2005-07-05 Mykrolis Corporation Method for the removal of airborne molecular contaminants using water gas mixtures
US7213963B2 (en) 2003-06-09 2007-05-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7317504B2 (en) 2004-04-08 2008-01-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1486827B1 (en) 2003-06-11 2011-11-02 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4415939B2 (ja) 2003-06-13 2010-02-17 株式会社ニコン 露光方法、基板ステージ、露光装置、及びデバイス製造方法
TWI564933B (zh) 2003-06-19 2017-01-01 尼康股份有限公司 An exposure apparatus, an exposure method, and an element manufacturing method
KR20060027832A (ko) 2003-07-01 2006-03-28 가부시키가이샤 니콘 광학 엘리먼트로서 동위원소적으로 특정된 유체를 사용하는방법
WO2005010611A2 (en) 2003-07-08 2005-02-03 Nikon Corporation Wafer table for immersion lithography
EP1646075B1 (en) 2003-07-09 2011-06-15 Nikon Corporation Exposure apparatus and device manufacturing method
KR101296501B1 (ko) 2003-07-09 2013-08-13 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
DE602004030247D1 (de) 2003-07-09 2011-01-05 Nippon Kogaku Kk Belichtungsvorrichtung und verfahren zur bauelementherstellung
US20060285091A1 (en) * 2003-07-21 2006-12-21 Parekh Bipin S Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system related application
US7384149B2 (en) * 2003-07-21 2008-06-10 Asml Netherlands B.V. Lithographic projection apparatus, gas purging method and device manufacturing method and purge gas supply system
JP4524669B2 (ja) 2003-07-25 2010-08-18 株式会社ニコン 投影光学系の検査方法および検査装置
KR101403117B1 (ko) 2003-07-28 2014-06-03 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법, 그리고 노광 장치의 제어 방법
US7326522B2 (en) 2004-02-11 2008-02-05 Asml Netherlands B.V. Device manufacturing method and a substrate
US7175968B2 (en) 2003-07-28 2007-02-13 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and a substrate
EP1503244A1 (en) 2003-07-28 2005-02-02 ASML Netherlands B.V. Lithographic projection apparatus and device manufacturing method
US7779781B2 (en) 2003-07-31 2010-08-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR101380989B1 (ko) 2003-08-29 2014-04-04 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
TWI263859B (en) 2003-08-29 2006-10-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
CN101430508B (zh) 2003-09-03 2011-08-10 株式会社尼康 为浸没光刻提供流体的装置和方法
JP4444920B2 (ja) 2003-09-19 2010-03-31 株式会社ニコン 露光装置及びデバイス製造方法
KR101323396B1 (ko) 2003-09-29 2013-10-29 가부시키가이샤 니콘 노광장치, 노광방법 및 디바이스 제조방법
JP2005136364A (ja) 2003-10-08 2005-05-26 Zao Nikon Co Ltd 基板搬送装置、露光装置、並びにデバイス製造方法
JP4319188B2 (ja) 2003-10-08 2009-08-26 株式会社蔵王ニコン 基板搬送装置及び基板搬送方法、露光装置及び露光方法、デバイス製造装置及びデバイス製造方法
KR20060126949A (ko) 2003-10-08 2006-12-11 가부시키가이샤 니콘 기판 반송 장치와 기판 반송 방법, 노광 장치와 노광 방법,및 디바이스 제조 방법
TWI598934B (zh) 2003-10-09 2017-09-11 Nippon Kogaku Kk Exposure apparatus, exposure method, and device manufacturing method
US7411653B2 (en) 2003-10-28 2008-08-12 Asml Netherlands B.V. Lithographic apparatus
US7352433B2 (en) 2003-10-28 2008-04-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7528929B2 (en) 2003-11-14 2009-05-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
CN102163005B (zh) 2003-12-03 2014-05-21 株式会社尼康 投影曝光装置、器件制造方法以及光学部件
WO2005057636A1 (ja) 2003-12-15 2005-06-23 Nikon Corporation ステージ装置、露光装置、及び露光方法
US7394521B2 (en) 2003-12-23 2008-07-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4843503B2 (ja) 2004-01-20 2011-12-21 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置および投影レンズのための測定装置
US7589822B2 (en) 2004-02-02 2009-09-15 Nikon Corporation Stage drive method and stage unit, exposure apparatus, and device manufacturing method
KR101377815B1 (ko) 2004-02-03 2014-03-26 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
KR101851511B1 (ko) 2004-03-25 2018-04-23 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
US7898642B2 (en) 2004-04-14 2011-03-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1747499A2 (en) 2004-05-04 2007-01-31 Nikon Corporation Apparatus and method for providing fluid for immersion lithography
US7616383B2 (en) 2004-05-18 2009-11-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
CN101833247B (zh) 2004-06-04 2013-11-06 卡尔蔡司Smt有限责任公司 微光刻投影曝光系统的投影物镜的光学测量的测量系统
CN105467775B (zh) 2004-06-09 2018-04-10 株式会社尼康 曝光装置及元件制造方法
US7463330B2 (en) 2004-07-07 2008-12-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
ATE441937T1 (de) 2004-07-12 2009-09-15 Nikon Corp Belichtungsgerät und bauelemente- herstellungsverfahren
US8305553B2 (en) 2004-08-18 2012-11-06 Nikon Corporation Exposure apparatus and device manufacturing method
US7701550B2 (en) 2004-08-19 2010-04-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7397533B2 (en) 2004-12-07 2008-07-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7880860B2 (en) 2004-12-20 2011-02-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
DE602006012746D1 (de) 2005-01-14 2010-04-22 Asml Netherlands Bv Lithografische Vorrichtung und Herstellungsverfahren
SG124351A1 (en) 2005-01-14 2006-08-30 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US8692973B2 (en) 2005-01-31 2014-04-08 Nikon Corporation Exposure apparatus and method for producing device
WO2006080516A1 (ja) 2005-01-31 2006-08-03 Nikon Corporation 露光装置及びデバイス製造方法
US7282701B2 (en) 2005-02-28 2007-10-16 Asml Netherlands B.V. Sensor for use in a lithographic apparatus
US20060199274A1 (en) * 2005-03-01 2006-09-07 Canon Kabushiki Kaisha Atmosphere conditioning method, exposure apparatus, and device manufacturing method
JP4072543B2 (ja) * 2005-03-18 2008-04-09 キヤノン株式会社 液浸露光装置及びデバイス製造方法
USRE43576E1 (en) 2005-04-08 2012-08-14 Asml Netherlands B.V. Dual stage lithographic apparatus and device manufacturing method
US20090272461A1 (en) * 2005-08-03 2009-11-05 Alvarez Jr Daniel Transfer container
US7986395B2 (en) * 2005-10-24 2011-07-26 Taiwan Semiconductor Manufacturing Company, Ltd. Immersion lithography apparatus and methods
US7420194B2 (en) 2005-12-27 2008-09-02 Asml Netherlands B.V. Lithographic apparatus and substrate edge seal
US7528387B2 (en) * 2005-12-29 2009-05-05 Interuniversitair Microelektronica Centrum (Imec) Methods and systems for characterising and optimising immersion lithographic processing
US7649611B2 (en) 2005-12-30 2010-01-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7253875B1 (en) * 2006-03-03 2007-08-07 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
WO2007126967A2 (en) 2006-04-03 2007-11-08 Entegris, Inc. Atmospheric pressure microwave plasma treated porous membranes
DE102006021797A1 (de) 2006-05-09 2007-11-15 Carl Zeiss Smt Ag Optische Abbildungseinrichtung mit thermischer Dämpfung
EP2453310B1 (en) 2006-06-19 2015-12-09 Entegris, Inc. System for purging reticle storage
US8564759B2 (en) * 2006-06-29 2013-10-22 Taiwan Semiconductor Manufacturing Company, Ltd. Apparatus and method for immersion lithography
US7933000B2 (en) * 2006-11-16 2011-04-26 Asml Netherlands B.V. Device manufacturing method, method for holding a patterning device and lithographic apparatus including an applicator for applying molecules onto a clamp area of a patterning device
US7866637B2 (en) * 2007-01-26 2011-01-11 Asml Netherlands B.V. Humidifying apparatus, lithographic apparatus and humidifying method
US8654305B2 (en) 2007-02-15 2014-02-18 Asml Holding N.V. Systems and methods for insitu lens cleaning in immersion lithography
US8817226B2 (en) 2007-02-15 2014-08-26 Asml Holding N.V. Systems and methods for insitu lens cleaning using ozone in immersion lithography
US8237911B2 (en) 2007-03-15 2012-08-07 Nikon Corporation Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine
NL1036181A1 (nl) * 2007-11-30 2009-06-04 Asml Netherlands Bv A lithographic apparatus, a projection system and a device manufacturing method.
US9176393B2 (en) 2008-05-28 2015-11-03 Asml Netherlands B.V. Lithographic apparatus and a method of operating the apparatus
WO2011021300A1 (ja) * 2009-08-21 2011-02-24 東レ株式会社 水蒸気透過膜、中空糸膜および中空糸膜モジュール
TWI450324B (zh) * 2010-01-25 2014-08-21 Gudeng Prec Ind Co Ltd 微影設備之光罩清潔方法及微影設備之光罩清潔系統
EP2381310B1 (en) 2010-04-22 2015-05-06 ASML Netherlands BV Fluid handling structure and lithographic apparatus
EP2659914B1 (en) * 2010-12-28 2020-06-24 Toray Industries, Inc. Hollow fiber membrane module
GB2502476A (en) * 2011-02-15 2013-11-27 Schlumberger Holdings Method and apparatus for protecting downhole components with inert atmosphere
CN103782238B (zh) * 2011-08-31 2016-08-17 Asml荷兰有限公司 确定聚焦位置修正的方法、光刻处理元和器件制造方法
KR102227564B1 (ko) * 2014-01-20 2021-03-15 삼성디스플레이 주식회사 포토레지스트 조성물
US10005018B2 (en) * 2016-09-02 2018-06-26 Battelle Memorial Institute Xenon collection method and system
JP6767257B2 (ja) * 2016-12-22 2020-10-14 東京エレクトロン株式会社 基板処理装置及び基板処理方法
JP7193459B2 (ja) * 2017-01-06 2022-12-20 エーエスエムエル ネザーランズ ビー．ブイ． 極端紫外線源（ｅｕｖ源）
DE102017207030A1 (de) * 2017-04-26 2018-10-31 Carl Zeiss Smt Gmbh Verfahren zur Reinigung von optischen Elementen für den ultravioletten Wellenlängenbereich
WO2019228710A1 (en) * 2018-05-28 2019-12-05 Asml Netherlands B.V. Lithographic apparatus
US12025919B2 (en) * 2018-11-30 2024-07-02 Taiwan Semiconductor Manufacturing Co., Ltd. Method of storing photoresist coated substrates and semiconductor substrate container arrangement
US11626285B2 (en) 2019-09-10 2023-04-11 Taiwan Semiconductor Manufacturing Co., Ltd. Method of manufacturing a semiconductor device
KR102868514B1 (ko) * 2019-11-04 2025-10-02 허니웰 인터내셔널 인코포레이티드 가스 감지에서 잘못된 알람 이벤트를 검출하기 위한 방법 및 시스템
EP3832391A1 (en) 2019-12-03 2021-06-09 ASML Netherlands B.V. Clamp assembly
WO2021126594A1 (en) * 2019-12-20 2021-06-24 Cymer, Llc Gas purge systems for a laser source
DE102020204545A1 (de) * 2020-04-08 2021-10-14 Carl Zeiss Smt Gmbh Verfahren und vorrichtung zum trocknen eines bauteilinnenraums
DE102023200132A1 (de) 2022-05-04 2023-11-09 Carl Zeiss Smt Gmbh Einrichtung zur Entfernung von gasförmigen Kontaminationen und Vorrichtung, insbesondere Lithographiesystem, mit einer solchen Einrichtung
WO2024170178A1 (en) 2023-02-13 2024-08-22 Asml Netherlands B.V. Gas supply module, fluid handling system, lithographic apparatus and device manufacturing method

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4704348A (en) * 1981-04-24 1987-11-03 Hitachi, Ltd. Exposure of uniform fine pattern on photoresist
US5892572A (en) * 1993-10-28 1999-04-06 Nikon Corporation Projection exposure apparatus and method

Family Cites Families (74)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19910441C1 (de) 1999-03-10 2000-06-21 Fraunhofer Ges Forschung Luftbefeuchtung
EP0009543B1 (en) * 1978-07-12 1982-12-08 Richard R. Dr. Jackson Nested hollow fiber humidifier
JPS62130321U (cg-RX-API-DMAC7.html) 1986-02-07 1987-08-18
US4902456A (en) 1988-05-04 1990-02-20 Millipore Corporation Fluorocarbon membranes and process for making fluorocarbon membranes
US5523193A (en) 1988-05-31 1996-06-04 Texas Instruments Incorporated Method and apparatus for patterning and imaging member
US5116396A (en) * 1989-05-12 1992-05-26 Union Carbide Industrial Gases Technology Corporation Hybrid prepurifier for cryogenic air separation plants
ATE123885T1 (de) 1990-05-02 1995-06-15 Fraunhofer Ges Forschung Belichtungsvorrichtung.
US5229872A (en) 1992-01-21 1993-07-20 Hughes Aircraft Company Exposure device including an electrically aligned electronic mask for micropatterning
JPH0636993A (ja) 1992-05-21 1994-02-10 Canon Inc 露光装置及び半導体素子の製造方法
US5240472A (en) 1992-05-29 1993-08-31 Air Products And Chemicls, Inc. Moisture removal from a wet gas
US5348691A (en) * 1993-06-11 1994-09-20 United Technologies Corporation Atmosphere membrane humidifier and method and system for producing humidified air
IT1264661B1 (it) 1993-07-05 1996-10-04 Ausimont Spa Copolimeri termoprocessabilin del tetrafluoroetilene
US5996976A (en) * 1993-07-13 1999-12-07 Lynntech, Inc. Gas humidification system using water permeable membranes
US5528905A (en) 1994-03-25 1996-06-25 Essex Invention S.A. Contactor, particularly a vapour exchanger for the control of the air hygrometric content, and a device for air handling
WO1995035153A2 (en) 1994-06-22 1995-12-28 Fls Miljø A/S Mass transfer method and apparatus
JPH08266631A (ja) * 1995-03-31 1996-10-15 Asahi Glass Co Ltd 呼吸用気体の加湿装置
US6545746B1 (en) * 1996-03-04 2003-04-08 Nikon Corporation Projection exposure apparatus
JP4075966B2 (ja) 1996-03-06 2008-04-16 エーエスエムエル ネザーランズ ビー．ブイ． 差分干渉計システム及びこのシステムを具えたリソグラフステップアンドスキャン装置
KR100542414B1 (ko) 1996-03-27 2006-05-10 가부시키가이샤 니콘 노광장치및공조장치
JPH09275054A (ja) * 1996-04-03 1997-10-21 Nikon Corp 半導体製造装置
KR100512450B1 (ko) 1996-12-24 2006-01-27 에이에스엠엘 네델란즈 비.브이. 두개의물체홀더를가진이차원적으로안정화된위치설정장치와이런위치설정장치를구비한리소그래픽장치
EP0956516B1 (en) 1997-01-29 2002-04-10 Micronic Laser Systems Ab Method and apparatus for the production of a structure by focused laser radiation on a photosensitively coated substrate
SE509062C2 (sv) 1997-02-28 1998-11-30 Micronic Laser Systems Ab Dataomvandlingsmetod för en laserskrivare med flera strålar för mycket komplexa mikrokolitografiska mönster
EP0900412B1 (en) 1997-03-10 2005-04-06 ASML Netherlands B.V. Lithographic apparatus comprising a positioning device having two object holders
TW463238B (en) * 1997-04-18 2001-11-11 Nippon Kogaku Kk Method and device for exposure control, method and device for exposure, and method of manufacturing the device
US5910292A (en) 1997-08-19 1999-06-08 Aeronex, Inc. Method for water removal from corrosive gas streams
US6059859A (en) 1997-09-19 2000-05-09 Aeronex, Inc. Method, composition and apparatus for water removal from non-corrosive gas streams
NL1008352C2 (nl) 1998-02-19 1999-08-20 Stichting Tech Wetenschapp Inrichting, geschikt voor extreem ultraviolet lithografie, omvattende een stralingsbron en een verwerkingsorgaan voor het verwerken van de van de stralingsbron afkomstige straling, alsmede een filter voor het onderdrukken van ongewenste atomaire en microscopische deeltjes welke door een stralingsbron zijn uitgezonden.
US6089282A (en) 1998-05-08 2000-07-18 Aeronex, Inc. Method for recovery and reuse of gas
AU6138199A (en) 1998-09-09 2000-03-27 Pall Corporation Fluid treatment elements, methods for cleaning fluid treatment elements and methods for treating fluids
US6254936B1 (en) 1998-09-14 2001-07-03 Silicon Valley Group, Inc. Environment exchange control for material on a wafer surface
US6235641B1 (en) 1998-10-30 2001-05-22 Fsi International Inc. Method and system to control the concentration of dissolved gas in a liquid
EP1148931B1 (en) * 1999-01-29 2006-06-28 Entegris, Inc. Hollow fiber membrane contactor
US6582496B1 (en) 2000-01-28 2003-06-24 Mykrolis Corporation Hollow fiber membrane contactor
US6802972B1 (en) 1999-01-29 2004-10-12 Mykrolis Corporation Microporous hollow fiber membranes from perfluorinated thermoplastic polymers
KR100637987B1 (ko) 1999-01-29 2006-10-23 엔테그리스, 아이엔씨. 중공 섬유 막의 제조 방법
US6149817A (en) 1999-03-08 2000-11-21 Celgard Inc. Shell-less hollow fiber membrane fluid contactor
JP2000262997A (ja) * 1999-03-17 2000-09-26 Sumitomo Heavy Ind Ltd エアロゾル洗浄装置
US6394109B1 (en) * 1999-04-13 2002-05-28 Applied Materials, Inc. Method and apparatus for removing carbon contamination in a sub-atmospheric charged particle beam lithography system
WO2000074120A1 (en) 1999-05-28 2000-12-07 Nikon Corporation Exposure method and apparatus
JP3927344B2 (ja) * 2000-01-19 2007-06-06 本田技研工業株式会社 加湿装置
JP2001308003A (ja) * 2000-02-15 2001-11-02 Nikon Corp 露光方法及び装置、並びにデバイス製造方法
JP3869999B2 (ja) 2000-03-30 2007-01-17 キヤノン株式会社 露光装置および半導体デバイス製造方法
US6558475B1 (en) * 2000-04-10 2003-05-06 International Business Machines Corporation Process for cleaning a workpiece using supercritical carbon dioxide
US6740147B2 (en) * 2000-05-05 2004-05-25 Extraction Systems, Inc. Filters employing both acidic polymers and physical-adsorption media
US6432204B1 (en) * 2000-05-17 2002-08-13 Tokyo Electron Limited Temperature and humidity controlled processing system
US6402818B1 (en) 2000-06-02 2002-06-11 Celgard Inc. Degassing a liquid with a membrane contactor
JP2001349585A (ja) 2000-06-07 2001-12-21 Orion Mach Co Ltd 吸湿性中空繊維を使用する高分子膜加湿器
JP2001358055A (ja) 2000-06-15 2001-12-26 Nikon Corp 露光装置及びデバイス製造方法
US6305097B1 (en) * 2000-06-29 2001-10-23 Texas Instruments Incorporated Apparatus for in-situ reticle cleaning at photolithography tool
JP2002158170A (ja) 2000-09-08 2002-05-31 Nikon Corp 露光装置及びデバイス製造方法
JP4610715B2 (ja) * 2000-11-06 2011-01-12 Ｎｏｋ株式会社 加湿装置
JP2002158154A (ja) 2000-11-16 2002-05-31 Canon Inc 露光装置
DE10059910C2 (de) 2000-12-01 2003-01-16 Daimler Chrysler Ag Vorrichtung zur kontinuierlichen Befeuchtung und Entfeuchtung der Zuluft von Fertigungsprozessen oder Raumlufttechnik-Anlagen
US20020136939A1 (en) 2001-02-15 2002-09-26 Grieve M. James Fuel cell and battery voltage controlling method and system
JP3765531B2 (ja) 2001-03-30 2006-04-12 本田技研工業株式会社 加湿モジュール
US6391090B1 (en) 2001-04-02 2002-05-21 Aeronex, Inc. Method for purification of lens gases used in photolithography
US6842998B2 (en) * 2001-04-06 2005-01-18 Akrion Llc Membrane dryer
US6616841B2 (en) 2001-06-21 2003-09-09 Celgard Inc. Hollow fiber membrane contactor
US6514313B1 (en) 2001-06-22 2003-02-04 Aeronex, Inc. Gas purification system and method
US6724460B2 (en) * 2001-11-19 2004-04-20 Asml Netherlands B.V. Lithographic projection apparatus, device manufacturing method, device manufactured thereby, cleaning unit and method of cleaning contaminated objects
US6828569B2 (en) * 2001-11-19 2004-12-07 Asml Netherlands B.V. Lithographic projection apparatus, device manufacturing method and device manufactured thereby
US20030162305A1 (en) 2002-02-25 2003-08-28 Daniel Alvarez Gas contaminant detection and quantification method
US6638341B1 (en) 2002-06-14 2003-10-28 Aeronex, Inc. Method for rapid activation or preconditioning of porous gas purification substrates
JP4541889B2 (ja) * 2002-07-18 2010-09-08 ダイムラー・アクチェンゲゼルシャフト ガス流の加湿装置及び方法
KR101036114B1 (ko) 2002-12-10 2011-05-23 가부시키가이샤 니콘 노광장치 및 노광방법, 디바이스 제조방법
TW200506334A (en) 2003-02-21 2005-02-16 Mykrolis Corp Purifier information retrieval system
US6913654B2 (en) 2003-06-02 2005-07-05 Mykrolis Corporation Method for the removal of airborne molecular contaminants using water gas mixtures
US6867844B2 (en) 2003-06-19 2005-03-15 Asml Holding N.V. Immersion photolithography system and method using microchannel nozzles
US20060285091A1 (en) 2003-07-21 2006-12-21 Parekh Bipin S Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system related application
US7384149B2 (en) 2003-07-21 2008-06-10 Asml Netherlands B.V. Lithographic projection apparatus, gas purging method and device manufacturing method and purge gas supply system
US7779781B2 (en) 2003-07-31 2010-08-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7701550B2 (en) 2004-08-19 2010-04-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US11206499B2 (en) 2016-08-18 2021-12-21 Qualcomm Incorporated Hearable device comprising integrated device and wireless functionality

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4704348A (en) * 1981-04-24 1987-11-03 Hitachi, Ltd. Exposure of uniform fine pattern on photoresist
US5892572A (en) * 1993-10-28 1999-04-06 Nikon Corporation Projection exposure apparatus and method

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