CN1306224A - 用作潜在酸供体的碘鎓盐 - Google Patents
用作潜在酸供体的碘鎓盐 Download PDFInfo
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- CN1306224A CN1306224A CN00135494A CN00135494A CN1306224A CN 1306224 A CN1306224 A CN 1306224A CN 00135494 A CN00135494 A CN 00135494A CN 00135494 A CN00135494 A CN 00135494A CN 1306224 A CN1306224 A CN 1306224A
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- acid
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0382—Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C17/00—Preparation of halogenated hydrocarbons
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C25/00—Compounds containing at least one halogen atom bound to a six-membered aromatic ring
- C07C25/18—Polycyclic aromatic halogenated hydrocarbons
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
- C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
- C08G65/06—Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
- C08G65/08—Saturated oxiranes
- C08G65/10—Saturated oxiranes characterised by the catalysts used
- C08G65/105—Onium compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C2601/00—Systems containing only non-condensed rings
- C07C2601/12—Systems containing only non-condensed rings with a six-membered ring
- C07C2601/14—The ring being saturated
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/115—Cationic or anionic
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Materials For Photolithography (AREA)
- Epoxy Resins (AREA)
- Polymerization Catalysts (AREA)
- Medicinal Preparation (AREA)
Abstract
Description
EX. | X/X1 | Y | A | 物理性质 | 元素分析理论值[%]实测值[%] | ||
C | H | F | |||||
2 | 4-C(CH3)3/H | 4-CH3 | PF6 | 白色粉末m.p.105-108℃ | 41.1541.27 | 4.064.23 | 22.9722.81 |
3 | 4-C(CH3)2C2H5/H | 4-CH3 | PF6 | 发白粉末m.p.94-98℃ | 42.3742.73 | 4.354.59 | 22.3420.44 |
4 | 4-环己基/H | 4-CH3 | PF6 | 玻璃,棕色树脂 | 43.7046.41 | 4.254.66 | 21.8319.84 |
5 | 4-CH2-CH(CH3)2/H | 2-CH3 | PF6 | 发白粉末m.p.120℃ | 41.1540.99 | 4.064.00 | 22.9722.80 |
6 | 4-CH2-CH(CH3)2/H | 3-CH3 | PF6 | 玻璃,棕色树脂 | 41.1541.66 | 4.063.87 | 22.9722.64 |
7 | 4-C(CH3)3/H | 3-CH3 | PF6 | 黄色结晶m.p.104-106℃ | 41.1541.53 | 4.064.27 | 22.9722.07 |
8 | 4-CH2-CH(CH3)2/H | 4-C2H5 | PF6 | 玻璃,棕色树脂 | 42.3743.02 | 4.354.32 | 22.3421.70 |
9 | 4-CH2-CH(CH3)2/H | 4-CH3 | SbF6 | 粘性油 | 34.7934.75 | 3.433.47 | 19.4219.29 |
10 | 4-CH2-CH(CH3)2/H | 4-CH-(CH3)2 | PF6 | 黄色树脂 | 43.5343.55 | 4.614.77 | 21.7420.63 |
11 | 4-CH2-CH(CH3)2/H | 4-CH3 | 4-CH3-Ph-SO3 | 玻璃,棕色树脂 | 55.1854.75 | 5.215.43 | -- |
12 | 4-CH2-CH(CH3)2/H | 4-CH3 | (±)camphorsulfonate | 玻璃,棕色树脂 | 55.6755.71 | 6.066.21 | -- |
13 | 4-CH(CH3)2/2-CH(CH3)2 | 4-CH3 | PF6 | 米色粉末m.p.137-141℃ | 43.5343.68 | 4.614.71 | 21.7421.24 |
Claims (19)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH234399 | 1999-12-21 | ||
CH2343/1999 | 1999-12-21 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1306224A true CN1306224A (zh) | 2001-08-01 |
CN1213343C CN1213343C (zh) | 2005-08-03 |
Family
ID=4231594
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB001354949A Expired - Lifetime CN1213343C (zh) | 1999-12-21 | 2000-12-20 | 用作潜在酸供体的碘鎓盐及其用途、包含它的光致抗蚀剂和辐射致敏组合物 |
Country Status (22)
Country | Link |
---|---|
US (1) | US6306555B1 (zh) |
JP (1) | JP4966446B2 (zh) |
KR (1) | KR100753350B1 (zh) |
CN (1) | CN1213343C (zh) |
AT (1) | AT413103B (zh) |
AU (1) | AU778995B2 (zh) |
BE (1) | BE1013871A3 (zh) |
BR (1) | BR0006227B1 (zh) |
CA (1) | CA2328819C (zh) |
CZ (1) | CZ299309B6 (zh) |
DE (1) | DE10063066B4 (zh) |
DK (1) | DK176764B1 (zh) |
ES (1) | ES2181563B1 (zh) |
FI (1) | FI20002767A (zh) |
FR (1) | FR2802539B1 (zh) |
GB (1) | GB2357759B (zh) |
IT (1) | IT1319694B1 (zh) |
MY (1) | MY120646A (zh) |
NL (1) | NL1016959C2 (zh) |
SE (1) | SE522682C2 (zh) |
SG (1) | SG98433A1 (zh) |
TW (1) | TWI225183B (zh) |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
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CN100523102C (zh) * | 2003-10-28 | 2009-08-05 | 东芝泰格有限公司 | 喷墨油墨 |
CN101547895A (zh) * | 2006-12-04 | 2009-09-30 | Az电子材料美国公司 | 光活性化合物 |
CN102081304A (zh) * | 2009-12-01 | 2011-06-01 | 信越化学工业株式会社 | 负型光阻组合物及图案形成方法 |
CN102241562A (zh) * | 2011-05-18 | 2011-11-16 | 常州大学 | 对称性芳基碘鎓盐酸盐的制备方法 |
US8168367B2 (en) | 2008-07-11 | 2012-05-01 | Shin-Etsu Chemical Co., Ltd. | Resist composition and patterning process |
CN104199255A (zh) * | 2010-02-16 | 2014-12-10 | 信越化学工业株式会社 | 用于eb或euv平版印刷的化学放大负性抗蚀剂组合物和图案化方法 |
CN104628517A (zh) * | 2013-11-08 | 2015-05-20 | 上海予利化学科技有限公司 | 阳离子光引发剂4-异丙基苯基-4’-甲基苯基碘鎓对甲苯磺酸盐的制备方法 |
CN105884570A (zh) * | 2016-04-20 | 2016-08-24 | 华东理工大学 | 含氟二芳基碘盐及其用途 |
CN114315584A (zh) * | 2021-12-30 | 2022-04-12 | 宁波南大光电材料有限公司 | 一种光敏剂及其制备方法 |
Families Citing this family (151)
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US6677390B1 (en) * | 1999-08-02 | 2004-01-13 | Nippon Soda Co., Ltd. | Photocurable composition containing iodonium salt compound |
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JP4156784B2 (ja) | 2000-07-25 | 2008-09-24 | 富士フイルム株式会社 | ネガ型画像記録材料及び画像形成方法 |
JP2002082429A (ja) * | 2000-09-08 | 2002-03-22 | Fuji Photo Film Co Ltd | ネガ型画像記録材料 |
US6749987B2 (en) * | 2000-10-20 | 2004-06-15 | Fuji Photo Film Co., Ltd. | Positive photosensitive composition |
US6641971B2 (en) * | 2001-06-15 | 2003-11-04 | International Business Machines Corporation | Resist compositions comprising silyl ketals and methods of use thereof |
JP2003064135A (ja) * | 2001-08-30 | 2003-03-05 | Idemitsu Kosan Co Ltd | 色変換材料組成物及びそれを用いた色変換膜 |
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