CN105074917A - 用于射频多芯片集成电路封装的电磁干扰外壳 - Google Patents

用于射频多芯片集成电路封装的电磁干扰外壳 Download PDF

Info

Publication number
CN105074917A
CN105074917A CN201480010118.0A CN201480010118A CN105074917A CN 105074917 A CN105074917 A CN 105074917A CN 201480010118 A CN201480010118 A CN 201480010118A CN 105074917 A CN105074917 A CN 105074917A
Authority
CN
China
Prior art keywords
coupled
substrate
metal
circuit
encapsulate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201480010118.0A
Other languages
English (en)
Inventor
K-P·黄
Y·K·宋
D·W·金
C·尹
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Qualcomm Inc
Original Assignee
Qualcomm Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Qualcomm Inc filed Critical Qualcomm Inc
Publication of CN105074917A publication Critical patent/CN105074917A/zh
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/552Protection against radiation, e.g. light or electromagnetic waves
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • H01L21/82Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/03Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
    • H01L25/04Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
    • H01L25/065Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L27/00
    • H01L25/0652Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L27/00 the devices being arranged next and on each other, i.e. mixed assemblies
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K9/00Screening of apparatus or components against electric or magnetic fields
    • H05K9/0007Casings
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/12Structure, shape, material or disposition of the bump connectors prior to the connecting process
    • H01L2224/13Structure, shape, material or disposition of the bump connectors prior to the connecting process of an individual bump connector
    • H01L2224/13001Core members of the bump connector
    • H01L2224/13099Material
    • H01L2224/131Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/16235Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation the bump connector connecting to a via metallisation of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16245Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/17Structure, shape, material or disposition of the bump connectors after the connecting process of a plurality of bump connectors
    • H01L2224/1751Function
    • H01L2224/17515Bump connectors having different functions
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2225/00Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
    • H01L2225/03All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00
    • H01L2225/04All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices not having separate containers
    • H01L2225/065All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices not having separate containers the devices being of a type provided for in group H01L27/00
    • H01L2225/06503Stacked arrangements of devices
    • H01L2225/06517Bump or bump-like direct electrical connections from device to substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2225/00Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
    • H01L2225/03All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00
    • H01L2225/04All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices not having separate containers
    • H01L2225/065All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices not having separate containers the devices being of a type provided for in group H01L27/00
    • H01L2225/06503Stacked arrangements of devices
    • H01L2225/06527Special adaptation of electrical connections, e.g. rewiring, engineering changes, pressure contacts, layout
    • H01L2225/06537Electromagnetic shielding
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/58Structural electrical arrangements for semiconductor devices not otherwise provided for, e.g. in combination with batteries
    • H01L23/64Impedance arrangements
    • H01L23/66High-frequency adaptations
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/10Bump connectors ; Manufacturing methods related thereto
    • H01L24/12Structure, shape, material or disposition of the bump connectors prior to the connecting process
    • H01L24/13Structure, shape, material or disposition of the bump connectors prior to the connecting process of an individual bump connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/10Bump connectors ; Manufacturing methods related thereto
    • H01L24/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L24/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/10Bump connectors ; Manufacturing methods related thereto
    • H01L24/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L24/17Structure, shape, material or disposition of the bump connectors after the connecting process of a plurality of bump connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/42Wire connectors; Manufacturing methods related thereto
    • H01L24/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L24/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/00014Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/14Integrated circuits
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/1517Multilayer substrate
    • H01L2924/15192Resurf arrangement of the internal vias
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/153Connection portion
    • H01L2924/1531Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
    • H01L2924/15311Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/153Connection portion
    • H01L2924/1532Connection portion the connection portion being formed on the die mounting surface of the substrate
    • H01L2924/1533Connection portion the connection portion being formed on the die mounting surface of the substrate the connection portion being formed both on the die mounting surface of the substrate and outside the die mounting surface of the substrate
    • H01L2924/15331Connection portion the connection portion being formed on the die mounting surface of the substrate the connection portion being formed both on the die mounting surface of the substrate and outside the die mounting surface of the substrate being a ball array, e.g. BGA
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/19Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
    • H01L2924/1901Structure
    • H01L2924/1904Component type
    • H01L2924/19041Component type being a capacitor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/19Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
    • H01L2924/1901Structure
    • H01L2924/1904Component type
    • H01L2924/19042Component type being an inductor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/19Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
    • H01L2924/1901Structure
    • H01L2924/1904Component type
    • H01L2924/19043Component type being a resistor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/19Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
    • H01L2924/191Disposition
    • H01L2924/19101Disposition of discrete passive components
    • H01L2924/19105Disposition of discrete passive components in a side-by-side arrangement on a common die mounting substrate

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Toxicology (AREA)
  • Electromagnetism (AREA)
  • Health & Medical Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)
  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)

Abstract

一种特征涉及多芯片封装,该多芯片封装包括基板以及耦合至该基板的电磁干扰(EMI)屏蔽。至少一个集成电路被耦合至该基板的第一表面。EMI屏蔽包括配置成屏蔽该封装不受射频辐射影响的金属壳、耦合至该金属壳的内表面的至少一部分的介电层、以及多条信号线。这些信号线被耦合至介电层并通过介电层与金属壳电绝缘。至少一个其他集成电路被耦合至EMI屏蔽的内表面,并且EMI屏蔽的内表面的至少一部分面对该基板的第一表面。这些信号线被配置成将电信号提供给第二电路组件。

Description

用于射频多芯片集成电路封装的电磁干扰外壳
背景技术
领域
各个特征涉及电磁干扰(EMI)罩壳的方法,尤其涉及用于层叠封装(PoP)射频(RF)集成电路设备的EMI罩壳。
背景
层叠封装(PoP)是将分立的逻辑和存储器球栅阵列(BGA)封装纵向地组合成一个单元的集成电路封装方法。两个或更多个封装安装在彼此顶上(即,堆叠),且具有在它们之间路由信号的标准接口。这允许在诸如移动电话、膝上型计算机、和数码相机之类的设备中有更高组件密度。
包含射频(RF)组件(诸如RF放大器以及其他RF有源和/或无源组件(例如,滤波器,双工器等))的PoP可能需要电磁干扰(EMI)屏蔽(也常常称为RF屏蔽)以便于将RF组件与周围环境隔离开来。该屏蔽防止PoP的RF组件泄漏出RF能量到周围环境,并且还防止该环境中不想要的外来RF信号噪声被注入到RFPoP中。
图1和2解说了现有技术中所见的EMI屏蔽100。具体而言,图1解说了EMI屏蔽100的顶部立体视图,并且图2解说了该屏蔽100的底部立体视图。EMI屏蔽100通常由金属(诸如铝、铜等)制成。屏蔽100的大小被制定为配合在一个或多个RF集成电路(诸如RFPoP电路)上。一旦就位,屏蔽100就充当法拉第笼并隔绝其内的RF电路系统,以防止RF辐射泄漏进受保护的电路系统中或从受保护的电路系统泄漏出来。EMI屏蔽100可以多个孔102为特征,这些孔102的大小被制定成小到足以仍够阻隔具有显著大于这些孔的直径的波长的RF辐射。
图3解说了现有技术中所见的PoP电路300的示意框图,该PoP电路300用EMI屏蔽302覆盖。PoP电路300包括第一封装基板304和第二封装基板306。第二封装基板306堆叠在第一封装基板304的顶上。第一基板304可包括至少一个集成电路(IC),诸如RF功率放大器IC308。第二基板306可包括多个IC310,诸如一个或多个无源双工器和/或滤波器(例如,表面声波(SAW)滤波器)。IC308、310各自通过多个焊接凸块312电耦合并物理耦合至它们相应的基板304、306。第二基板306通过一个或多个焊球314或者导电柱被电耦合并物理耦合至第一基板304。
PoP电路300具有几个显著缺点。第一,耦合至第二基板306的多个IC310具有不良的热传导路径,这使得由IC310产生的热聚集在PoP电路300中并使性能降级。例如,由第二基板的IC310产生的大部分热仅通过焊球/柱314来消散,而焊球/柱314位于接近第二基板306的边缘并且在数目上相对较少。因此,即使第二基板的IC310可能是产生的热只是高功率有源RF功率放大器IC308的热的一小部分(例如1/8)的无源IC(例如,无源滤波器),但耦合至第二基板的IC310的不良的热传导路径314使得这些IC310达到高到不可取的温度。作为对比,第一基板的IC308具有相对良好的热传导路径,其允许RF功率放大器308产生的相对较大量的热能消散掉。这些热传导路径包括位于第一基板304内的热通孔316,这些热通孔316将RF功率放大器308电耦合且热耦合至焊球318和/或帮助消散热的热散布器。
第二,将第二基板的IC310电耦合至第一基板304(例如,地和电力网)的焊球314的位置和有限数目也限制了PoP电路300的电性能。焊球314导致瓶颈,该瓶颈尤其增加第二基板的IC310与地/电力网之间的寄生电感。该电感降低了IC310(例如,SAW滤波器)的电性能。
EMI屏蔽302由金属制成并被设计成充当配合在多个RF器件308、310上的法拉第笼。虽然EMI屏蔽302防止相当大量的非期望RF辐射泄漏出或泄漏进PoP电路,但它对于减轻以上两个前述问题无所作为。因此,存在对于以EMI屏蔽为特征的改善层叠封装设计的需要,该EMI屏蔽除了提供针对RF辐射的保护以外,还帮助改善此层叠封装设备内底下的集成电路的热和电性能。
概述
一个特征提供一种封装,该封装包括基板,该基板具有耦合至该基板的第一表面的至少一个第一电路组件,该封装还包括耦合至该基板的电磁干扰(EMI)屏蔽,EMI屏蔽包括配置成屏蔽该封装不受射频辐射影响的金属壳,耦合至该金属壳的内表面的至少一部分的介电层,耦合至该介电层并通过该介电层与金属壳电绝缘的多条信号线,以及耦合至EMI屏蔽的内表面的至少一个第二电路组件,EMI屏蔽的内表面的至少一部分面对基板的第一表面,并且这多条信号线配置成向第二电路组件提供电信号。根据一方面,该金属壳进一步配置成向第二电路组件提供电接地。根据另一方面,第二电路组件进一步耦合至金属壳的内表面。根据又一方面,该金属壳热耦合至第二电路组件并配置成消散由第二电路组件产生的热能。根据另一方面,第一和第二电路组件各自是有源和/或无源RF电路组件中的至少一者。
根据一方面,该金属壳包括将EMI屏蔽耦合至基板的多个侧壁。根据另一方面,一个或多个槽形成在该多个侧壁之间,该一个或多个槽允许气流穿过由具有该多个侧壁的金属壳和基板形成的腔。根据又一方面,该多个侧壁包括内侧壁表面,其包括介电层以及该多条信号线的至少一部分。
根据一方面,该内侧壁表面使用该多条信号线的该部分将第二电路组件电耦合至基板。根据另一方面,该EMI屏蔽和基板形成包含第一和第二电路组件的腔。根据又一方面,此封装被纳入音乐播放器、视频播放器、娱乐单元、导航设备、通信设备、移动电话、智能电话、个人数字助理、固定位置终端、平板计算机、和/或膝上型计算机中的至少一者中。
另一特征提供一种制造封装的方法,其中该方法包括:提供基板以及至少一个第一电路组件,将第一电路组件耦合至基板的第一表面,提供具有金属壳的电磁干扰(EMI)屏蔽,该金属壳配置成屏蔽此封装不受射频辐射影响,在该金属壳的内表面的至少一部分之上沉积介电层,在介电层处形成多条信号线,从而该多条信号线通过该介电层与金属壳电绝缘,将至少一个第二电路组件耦合至EMI屏蔽的内表面,该多条信号线配置成向第二电路组件提供电信号,以及将该EMI屏蔽耦合至基板,从而该EMI屏蔽的内表面的至少一部分面对基板的第一表面。根据一方面,该方法进一步包括将第二电路组件耦合至金属壳的内表面。根据另一方面,该方法进一步包括将该金属壳热耦合至第二电路组件,从而该金属壳配置成消散由第二电路组件产生的热能。
根据一方面,该方法进一步包括在EMI屏蔽和基板之间形成包含第一和第二电路组件的腔。根据另一方面,该金属壳包括多个侧壁,该方法进一步包括将EMI屏蔽的该多个侧壁耦合至基板。根据又一方面,该方法进一步包括形成由该金属壳、该多个侧壁、和基板限界的腔,以及在该多个侧壁之间形成允许气流穿过该腔的一个或多个槽。根据另一方面,该方法进一步包括使用该内侧壁表面上所包括的该多条信号线的该部分将第二电路组件电耦合至基板。
另一特征提供一种封装,该封装包括基板,该基板具有耦合至该基板的第一表面的至少一个第一电路组件,该封装还包括用于覆盖该基板的至少一部分的装置,该用于覆盖的装置包括用于屏蔽该封装不受射频辐射影响的装置,耦合至该用于屏蔽的装置的内表面的至少一部分的用于绝缘的装置,耦合至该用于绝缘的装置并通过该用于绝缘的装置与该用于屏蔽的装置电绝缘的多个用于携带电信号的装置,以及耦合至该用于覆盖的装置的内表面的至少一个第二电路组件,该用于覆盖的装置的内表面的至少一部分面对基板的第一表面,并且该多个用于携带电信号的装置配置成向第二电路组件提供电信号。根据一方面,该用于屏蔽的装置进一步配置成向第二电路组件提供电接地。根据另一方面,第二电路组件进一步耦合至该用于屏蔽的装置的内表面。
根据一方面,该用于屏蔽的装置热耦合至第二电路组件并配置成消散由第二电路组件产生的热能。根据另一方面,该用于屏蔽的装置包括将该用于覆盖的装置耦合至基板的多个侧壁。根据又一方面,一个或多个用于通风的装置形成在这多个侧壁之间,该一个或多个用于通风的装置允许气流穿过由具有该多个侧壁的该用于屏蔽的装置和基板形成的腔。
根据一方面,该多个侧壁包括内侧壁表面,其包括该用于绝缘的装置以及该多个用于携带电信号的装置的至少一部分。根据另一方面,该内侧壁表面使用该多个用于携带电信号的装置的该部分将第二电路组件电耦合至基板。根据又一方面,该用于覆盖的装置和基板形成包含第一和第二电路组件的腔。
附图简述
图1和2解说了现有技术中所见的EMI屏蔽。
图3解说了现有技术中所见的用EMI屏蔽覆盖的PoP电路的示意框图。
图4解说了EMI屏蔽的底部立体视图。
图5解说了该屏蔽的顶部立体视图。
图6解说了该屏蔽的一部分的顶视图。
图7解说了该EMI屏蔽的横截面视图。
图8解说了模块基板(例如,第一基板)。
图9解说了多芯片封装。
图10解说了多芯片封装的横截面示意框图。
图11-15解说了EMI屏蔽的制造工艺流。
图16解说了用于制造多芯片封装的方法的流程图。
图17解说了可与多芯片封装集成的各个电子设备。
详细描述
在以下描述中,给出了具体细节以提供对本公开的各方面的透彻理解。但是,本领域普通技术人员将理解,没有这些具体细节也可实践这些方面。例如,电路可能用框图示出以避免使这些方面湮没在不必要的细节中。在其他实例中,公知的电路、结构和技术可能不被详细示出以免使本公开的这些方面不明朗。
措辞“示例性”在本文中用于表示“用作示例、实例或解说”。本文中描述为“示例性”的任何实现或方面不必被解释为优于或胜过本公开的其他方面。
综览
一种实现提供多芯片封装,该多芯片封装包括基板以及耦合至该基板的电磁干扰(EMI)屏蔽。至少一个集成电路被耦合至该基板的第一表面。EMI屏蔽包括配置成屏蔽该封装不受射频辐射影响的金属壳、耦合至该金属壳的内表面的至少一部分的介电层、以及多条信号线。这些信号线被耦合至该介电层并通过该介电层与金属壳电绝缘。至少一个其他集成电路被耦合至该EMI屏蔽的内表面,并且该EMI屏蔽的内表面的至少一部分面对该基板的第一表面。这些信号线被配置成将电信号提供给第二电路组件。
示例性EMI屏蔽
图4-7解说了根据本公开一方面的EMI屏蔽400的各个视图。具体而言,图4解说了EMI屏蔽400的底部立体视图,并且图5解说了屏蔽400的顶部立体视图。图6解说了屏蔽400的一部分的顶视图,并且图7解说了沿着线7’–7’取的EMI屏蔽400的横截面视图。如以下将更详细描述的,EMI屏蔽400提供了热传导路径以将热从耦合至该EMI屏蔽400的电路组件消散掉。它还用于减小寄生电感和电阻,并由此改善耦合至该EMI屏蔽400的电路组件的电性能。
参照图4、5和6,EMI屏蔽400包括内表面402和外表面502。一个或多个电路组件410(例如,第二电路组件)可被耦合和/或安装到EMI屏蔽400的内表面402上。这些电路组件410可包括无源和/或有源电路组件,诸如无源和/或有源RF电路组件。此类组件的示例包括但不限于电阻器、电容器、电感器、无源RF滤波器、有源RF滤波器、表面声波(SAW)滤波器、处理电路、RF放大器电路、双工器、上变频器、下变频器,等等。根据一方面,电路组件410可使用球栅阵列(BGA)以芯片倒装方式耦合至EMI屏蔽400的内表面402。
图7解说了沿线7’–7’取的该EMI屏蔽400的横截面视图。在所解说的示例中,屏蔽400包括金属壳702、介电层704、以及多条信号线706。金属壳702可由金属或金属合金构成,诸如但不限于铝、铜、金、钯、锌等。金属壳702被适配成屏蔽EMI屏蔽400的腔708内的电路组件不受RF辐射影响。根据一方面,金属壳702的外金属表面710是EMI屏蔽400的外表面502(参见图5)。参照图7,金属壳702还包括内金属表面712,其位于EMI屏蔽400的腔708内。
介电层704由一种或多种材料制成,该(些)材料基本上是电绝缘体。介电层704被耦合至金属壳702的内金属表面712。多条信号线706被耦合至介电层704并通过介电层704与金属壳702电绝缘。信号线706是电导体,其向耦合至EMI屏蔽400的一个或多个电路组件410(参见图4和6)提供电信号。介电层704可以是用于绝缘的装置,并且信号线706可以是用于携带电信号的装置。
参照图4和7,金属壳702包括背板714以及多个侧壁404。侧壁404包括内侧壁表面406,内侧壁表面406包括介电层704以及还有多条信号线706的一部分。多条信号线706的该部分继续沿着内侧壁表面406延伸。根据一方面,这多条信号线706可延伸直至侧壁404的边缘408。内侧壁表面406使用这多条信号线706的该部分将电路组件410耦合至模块基板(图8中示出)。侧壁404还包括槽412,其提供穿过腔708的气流。槽412还允许模塑料(未示出)被注入到腔708中。这些槽可以是用于通风的装置。
示例性模块基板
图8解说了根据本公开一方面的模块基板800(例如,第一基板)。模块基板800可以是具有第一表面802的多层层压基板。一个或多个电路组件804(例如,第一电路组件)可被耦合至模块基板800的第一表面802。这些电路组件可包括但不限于电阻器、电容器、电感器、无源RF滤波器、有源RF滤波器、表面声波(SAW)滤波器、处理电路、RF放大器电路、双工器、上变频器、下变频器,等等。根据一方面,电路组件804可按芯片倒装BGA方式(例如使用焊接凸块806)来耦合至模块基板800的第一表面802。在其他方面,电路组件804可使用引线接合来耦合。模块基板800还可具有与第一表面802相对的第二表面。根据一个示例,第二表面可具有耦合至该第二表面的多个焊球808,这多个焊球808接合到印刷电路板(未示出)上的对应电触点。根据另一示例,取代焊球808,第二表面可具有平面形状的金属焊盘。平面金属焊盘耦合至位于印刷电路板(未示出)上的对应金属焊接区焊盘。还可以在平面金属焊盘和金属焊接区焊盘之间涂布电和热传导糊剂以使热消散最大化。
示例性的以EMI屏蔽为特征的多芯片封装
图9解说了根据本公开一方面的多芯片封装(MCP)900。值得注意的是,MCP900包括EMI屏蔽400和模块基板800。具体而言,MCP900是通过将EMI屏蔽400耦合至模块基板800从而EMI屏蔽400的内表面402面对模块基板(参见图4、8和9)的第一表面802的方式来形成的。参照图7和9,腔708可以通过模块基板800和EMI屏蔽400的组合来形成,更具体而言,通过模块基板800、以及金属壳的侧壁404和背板714来形成。EMI屏蔽400可以是用于覆盖模块基板800的装置,并且金属壳702(参见图7)可以是用于屏蔽多芯片封装900不受RF辐射影响的装置。
图10解说了根据本公开一方面的多芯片封装(MCP)900的横截面示意框图。如上所述,MCP900包括EMI屏蔽400和模块基板800。模块基板800包括第一电路组件804,其耦合至模块基板800的第一表面802。第一电路组件804可以例如是RF信号放大器电路。第一电路组件804可通过多个电连接1004(例如焊接凸块)电耦合至位于模块基板800上的信号线1002。类似地,第一电路组件804可通过多个其他电连接1008(例如焊接凸块)电耦合至位于模块基板800上的信号接地1006。信号接地1006还可耦合至焊球808,焊球808电耦合且热耦合至印刷电路板(未示出)上的对应金属触点,这帮助消散由第一电路组件804产生的热。根据一个示例,取代焊球808,信号接地1006可耦合至平面形状的金属焊盘。平面金属焊盘耦合至位于印刷电路板(未示出)上的对应金属焊接区焊盘。还可以在平面金属焊盘和金属焊接区焊盘之间涂布电和热传导糊剂以使第一电路组件804的热消散最大化。
EMI屏蔽400包括金属壳702、介电层704、以及多条信号线706。EMI屏蔽400还包括被耦合至EMI屏蔽400的内表面402的一个或多个第二电路组件410(例如,RF滤波器,双工器等)。第二电路组件410可通过多个电连接1012(例如焊接凸块)电耦合至位于EMI屏蔽400上的多条信号线706。类似地,第二电路组件410可通过多个电连接1014(例如焊接凸块)电耦合至金属壳702。这多条信号线706通过介电层704与金属壳702电绝缘。
EMI屏蔽400和/或金属壳702还包括侧壁404,侧壁404将EMI屏蔽400电耦合且物理耦合至模块基板800。具体而言,金属壳的侧壁404被电耦合至模块基板800的信号接地1002,并且由此整个金属壳702充当用于第二电路组件410的信号接地。由于这些第二电路组件410在众多位置通过这些电连接1014被耦合至金属壳702,因此金属壳702为这些第二电路组件410提供了强的电接地接触表面,这降低了与这些第二电路组件410相关联的寄生电感和电阻。此外,由于第二电路组件410与金属壳702之间的直接热传导物理接触,因此金属壳702如同热散布器那样吸收并消散由这些第二电路组件产生的热能。
侧壁404进一步将EMI屏蔽400电耦合且物理耦合至模块基板800,这是因为多条信号线706沿着内侧壁表面404走的那部分被电耦合至模块基板800的信号线1002。EMI屏蔽400的介电层704可耦合至模块基板800的绝缘材料1016。
示例性方法
图11-15解说了根据一方面的EMI屏蔽400的制造工艺流。
图11解说了第一步骤1100,其中提供金属壳702。如上所述,金属壳702充当EMI屏蔽400的外金属层和电接地。它包括侧壁404、背板714、以及内金属表面712。
图12解说了第二步骤1200,其中将介电层704沉积到金属壳702的内金属表面712上。介电层704由绝缘材料制成。介电层704具有内介电表面1202和内侧壁表面406。
图13解说了第三步骤1300,其中移除(例如,蚀刻掉)介电层704的一些部分并且通过在剩余的空间中进行填充来形成纵向的互连通道(通孔)1302。这些通孔1302由电和热传导材料(诸如铜、铝等)制成。由此,这些通孔1302电接地。
图14解说了第四步骤1400,其中在介电层704的顶上和/或内部形成信号线706,并在通孔1302之上形成接地线1402。接地线1402和信号线706由导电材料(诸如金属,包括但不限于铝、铜、金等)制成。由于接地线1402被耦合至通孔1302,因此它们也电接地。相反,信号线706与接地的金属壳702电绝缘且物理绝缘并携带信号(例如,RF信号)。
图15解说了第五步骤1500,其中电路组件410(诸如RFIC(例如,滤波器、双工器、放大器等))被物理耦合、电耦合、且热耦合至接地线1402和信号线706。根据一个示例,焊接凸块1012、1014(参见图10)可被用来将组件410耦合至地和信号线1402、706。信号线706将电RF信号提供给电路组件410,同时接地线1402将电接地提供给组件410。值得注意的是,电路组件410可通过接地线1402、通孔1302、和金属壳702来消散热。
以上参照图11-15的步骤1100、1200、1300、1400、1500仅描述和解说了制造EMI屏蔽400的一种一般性方法。在实践中,EMI屏蔽400可使用与步骤1100、1200、1300、1400、和/或1500有关的各种子步骤和子工艺来制造。例如,执行这些步骤1100、1200、1300、1400、1500中的一个或多个步骤可包括以下工艺中的一个或多个(未按任何特定次序列出):接地线和/或信号线蚀刻;通孔电镀;晶种层沉积;光致蚀抗蚀沉积;金属层沉积;光致蚀抗蚀移除;晶种层移除;晶种层蚀刻;和/或介电层蚀刻。例如,图13和14的步骤1300、1400可通过以下操作来执行:蚀刻掉介电层704的一些部分以形成通孔洞;电镀这些通孔洞;在介电层704和/或经电镀通孔之上沉积晶种层;施加掩模和光致抗蚀剂以界定信号线和接地线;沉积金属层(例如,电镀);移除光致抗蚀剂层;以及蚀刻掉晶种层。
根据一方面,可与形成信号线无关地并在其形成之前形成接地线。根据另一方面,可与形成接地线无关地并在形成其之前形成信号线。例如,根据一方面,在金属壳702的内金属表面1202和内侧壁表面406上沉积介电层704之后,可应用掩模和光致抗蚀工艺来选择性地蚀刻掉介电层704的一些部分以暴露金属壳702的内金属表面1202。被暴露的内金属表面1202部分将用作接地线。随后,可沉积晶种层以用于信号线沉积,之后接着是信号线金属层沉积步骤。接下来,可蚀刻掉晶种层的一些部分。
作为另一示例,在金属壳702的内金属表面1202和内侧壁表面406上沉积介电层704之后,可沉积晶种层以用于信号线沉积随后,可应用掩模和光致抗蚀工艺以界定信号线,之后接着是信号线金属层沉积。接下来,可蚀刻掉晶种层的一些部分。随后,可应用另一掩模和光致抗蚀工艺以界定接地线。接下来,蚀刻掉介电层704的将是接地线所在之处的部分以暴露金属壳702的内金属表面1202,其将用作接地。
图16解说了根据本公开一方面的用于制造多芯片封装的方法的流程图1600。首先,提供模块基板以及至少一个第一电路组件(1602)。接下来,将第一电路组件耦合至模块基板的第一表面(1604)。随后,提供具有金属壳的电磁干扰(EMI)屏蔽,该金属壳适配成屏蔽多芯片封装不受射频辐射影响(1606)。接下来,在金属壳的内表面的至少一部分之上沉积介电层(1608)。随后,在介电层处形成多条信号线,从而这多条信号线通过介电层与金属壳电绝缘(1610)。接下来,将至少一个第二电路组件耦合至EMI屏蔽的内表面,其中这多条信号线被适配成向第二电路组件提供电信号(1612)。最后,将EMI屏蔽耦合至模块基板,从而EMI屏蔽的内表面的至少一部分面对模块基板的第一表面(1614)。
示例性设备
图17解说了可与前述MCP900集成的各种电子设备。例如,移动电话1702、膝上型计算机1704以及固定位置终端1706可包括以EMI屏蔽400为特征的MCP900。图17中所解说的设备1702、1704、1706仅是示例性的。其它电子设备也可以MCP900为其特征,此类电子设备包括但不限于手持式个人通信系统(PCS)单元、便携式数据单元(诸如个人数据助理)、有GPS能力的设备、导航设备、机顶盒、音乐播放器、视频播放器、娱乐单元、固定位置数据单位(诸如仪表读数装备)、或存储或检索数据或计算机指令的任何其它设备,或者其任何组合。
图4、5、6、7、8、9、10、11、12、13、14、15、16和/或17中解说的组件、步骤、特征和/或功能之中的一个或多个可以被重新编排和/或组合成单个组件、步骤、特征或功能,或实施在数个组件、步骤、或功能中。也可添加额外的元件、组件、步骤、和/或功能而不会脱离本发明。图4、5、6、7、8、9、10、11、12、13、14、15和/或17中所解说的装置、设备、和/或组件可以被配置成执行图16中所描述的方法、特征、或步骤中的一个或多个。
还应注意,本公开的各方面可作为被描绘为流程图、流图、结构图、或框图的过程来描述。尽管流程图可能会把诸操作描述为顺序过程,但是这些操作中有许多能够并行或并发地执行。另外,这些操作的次序可以被重新安排。
本文所述的本发明的各种特征可实现于不同系统中而不脱离本发明。应注意,本公开的以上各方面仅是示例,且不应被解释成限定本发明。对本公开的各方面的描述旨在是解说性的,而非限定所附权利要求的范围。由此,本发明的教导可以现成地应用于其他类型的装置,并且许多替换、修改、和变形对于本领域技术人员将是显而易见的。

Claims (32)

1.一种封装,包括:
基板,其具有耦合至所述基板的第一表面的至少一个第一电路组件;以及
电磁干扰(EMI)屏蔽,其耦合至所述基板,所述EMI屏蔽包括:
金属壳,其配置成屏蔽所述封装不受射频辐射影响,
介电层,其耦合至所述金属壳的内表面的至少一部分,
多条信号线,其耦合至所述介电层并通过所述介电层与所述金属壳电绝缘,以及
至少一个第二电路组件,其耦合至所述EMI屏蔽的内表面,所述EMI屏蔽的所述内表面的至少一部分面对所述基板的第一表面,并且所述多条信号线配置成向所述第二电路组件提供电信号。
2.如权利要求1所述的封装,其特征在于,所述金属壳进一步配置成向所述第二电路组件提供电接地。
3.如权利要求2所述的封装,其特征在于,所述第二电路组件进一步耦合至所述金属壳的所述内表面。
4.如权利要求1所述的封装,其特征在于,所述金属壳热耦合至所述第二电路组件并配置成消散由所述第二电路组件产生的热能。
5.如权利要求1所述的封装,其特征在于,所述第一和第二电路组件各自是有源和/或无源RF电路组件中的至少一者。
6.如权利要求1所述的封装,其特征在于,所述金属壳包括将所述EMI屏蔽耦合至所述基板的多个侧壁。
7.如权利要求6所述的封装,其特征在于,一个或多个槽形成在所述多个侧壁之间,所述一个或多个槽允许气流穿过由具有所述多个侧壁的所述金属壳和所述基板形成的腔。
8.如权利要求6所述的封装,其特征在于,所述多个侧壁包括内侧壁表面,所述内侧壁表面包括所述介电层以及所述多条信号线的至少一部分。
9.如权利要求8所述的封装,其特征在于,所述内侧壁表面使用所述多条信号线的所述部分将所述第二电路组件电耦合至所述基板。
10.如权利要求1所述的封装,其特征在于,所述EMI屏蔽和所述基板形成包含所述第一和第二电路组件的腔。
11.如权利要求1所述的封装,其特征在于,所述封装被纳入音乐播放器、视频播放器、娱乐单元、导航设备、通信设备、移动电话、智能电话、个人数字助理、固定位置终端、平板计算机、和/或膝上型计算机中的至少一者中。
12.一种制造封装的方法,所述方法包括:
提供基板以及至少一个第一电路组件;
将所述第一电路组件耦合至所述基板的第一表面;
提供具有金属壳的电磁干扰(EMI)屏蔽,所述金属壳配置成屏蔽所述封装不受射频辐射影响;
在所述金属壳的内表面的至少一部分之上沉积介电层;
在所述介电层处形成多条信号线,从而所述多条信号线通过所述介电层与所述金属壳电绝缘;
将至少一个第二电路组件耦合至所述EMI屏蔽的内表面,所述多条信号线配置成向所述第二电路组件提供电信号;以及
将所述EMI屏蔽耦合至所述基板,从而所述EMI屏蔽的所述内表面的至少一部分面对所述基板的所述第一表面。
13.如权利要求12所述的方法,其特征在于,所述金属壳配置成向所述第二电路组件提供电接地。
14.如权利要求13所述的方法,其特征在于,进一步包括:
将所述第二电路组件耦合至所述金属壳的所述内表面。
15.如权利要求12所述的方法,其特征在于,进一步包括:
将所述金属壳热耦合至所述第二电路组件,从而所述金属壳配置成消散由所述第二电路组件产生的热能。
16.如权利要求12所述的方法,其特征在于,所述第一和第二电路组件各自是有源和/或无源RF电路组件中的至少一者。
17.如权利要求12所述的方法,其特征在于,进一步包括:
在所述EMI屏蔽和所述基板之间形成包含所述第一和第二电路组件的腔。
18.如权利要求12所述的方法,其特征在于,所述金属壳包括多个侧壁,所述方法进一步包括:
将所述EMI屏蔽的所述多个侧壁耦合至所述基板。
19.如权利要求18所述的方法,其特征在于,进一步包括:
形成由所述金属壳、所述多个侧壁、和所述基板限界的腔;以及
在所述多个侧壁之间形成允许气流穿过所述腔的一个或多个槽。
20.如权利要求18所述的方法,其特征在于,所述多个侧壁包括内侧壁表面,其包括所述介电层以及所述多条信号线的至少一部分。
21.如权利要求20所述的方法,其特征在于,进一步包括:
使用所述内侧壁表面上所包括的所述多条信号线的所述部分将所述第二电路组件电耦合至所述基板。
22.一种封装,包括:
基板,其具有耦合至所述基板的第一表面的至少一个第一电路组件;以及
用于覆盖所述基板的至少一部分的装置,所述用于覆盖的装置包括:
用于屏蔽所述封装不受射频辐射影响的装置,
用于绝缘的装置,其耦合至所述用于屏蔽的装置的内表面的至少一部分,
多个用于携带电信号的装置,其耦合至所述用于绝缘的装置并通过所述用于绝缘的装置与所述用于屏蔽的装置电绝缘,以及
至少一个第二电路组件,其耦合至所述用于覆盖的装置的内表面,所述用于覆盖的装置的所述内表面的至少一部分面对所述基板的第一表面,并且所述多个用于携带电信号的装置配置成向所述第二电路组件提供电信号。
23.如权利要求22所述的封装,其特征在于,所述用于屏蔽的装置进一步配置成向所述第二电路组件提供电接地。
24.如权利要求23所述的封装,其特征在于,所述第二电路组件进一步耦合至所述用于屏蔽的装置的所述内表面。
25.如权利要求22所述的封装,其特征在于,所述用于屏蔽的装置热耦合至所述第二电路组件并配置成消散由所述第二电路组件产生的热能。
26.如权利要求22所述的封装,其特征在于,所述第一和第二电路组件各自是有源和/或无源RF电路组件中的至少一者。
27.如权利要求22所述的封装,其特征在于,所述用于屏蔽的装置包括将所述用于覆盖的装置耦合至所述基板的多个侧壁。
28.如权利要求27所述的封装,其特征在于,一个或多个用于通风的装置形成在所述多个侧壁之间,所述一个或多个用于通风的装置允许气流穿过由具有所述多个侧壁的所述用于屏蔽的装置和所述基板形成的腔。
29.如权利要求27所述的封装,其特征在于,所述多个侧壁包括内侧壁表面,所述内侧壁表面包括所述用于绝缘的装置以及所述多个用于携带电信号的装置的至少一部分。
30.如权利要求29所述的封装,其特征在于,所述内侧壁表面使用所述多个用于携带电信号的装置的所述部分将所述第二电路组件电耦合至所述基板。
31.如权利要求22所述的封装,其特征在于,所述用于覆盖的装置和所述基板形成包含所述第一和第二电路组件的腔。
32.如权利要求22所述的封装,其特征在于,所述封装被纳入音乐播放器、视频播放器、娱乐单元、导航设备、通信设备、移动电话、智能电话、个人数字助理、固定位置终端、平板计算机、和/或膝上型计算机中的至少一者中。
CN201480010118.0A 2013-03-11 2014-03-06 用于射频多芯片集成电路封装的电磁干扰外壳 Pending CN105074917A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/794,487 2013-03-11
US13/794,487 US8987872B2 (en) 2013-03-11 2013-03-11 Electromagnetic interference enclosure for radio frequency multi-chip integrated circuit packages
PCT/US2014/021078 WO2014164186A1 (en) 2013-03-11 2014-03-06 Electromagnetic interference enclosure for radio frequency multi-chip integrated circuit packages

Publications (1)

Publication Number Publication Date
CN105074917A true CN105074917A (zh) 2015-11-18

Family

ID=50434272

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201480010118.0A Pending CN105074917A (zh) 2013-03-11 2014-03-06 用于射频多芯片集成电路封装的电磁干扰外壳

Country Status (7)

Country Link
US (1) US8987872B2 (zh)
EP (1) EP2973696B1 (zh)
JP (2) JP2016514368A (zh)
KR (1) KR101657622B1 (zh)
CN (1) CN105074917A (zh)
TW (1) TWI534979B (zh)
WO (1) WO2014164186A1 (zh)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106252339A (zh) * 2016-08-11 2016-12-21 国网辽宁省电力有限公司电力科学研究院 一种高密度射频多芯片封装结构
CN106298741A (zh) * 2016-08-11 2017-01-04 国网辽宁省电力有限公司电力科学研究院 一种射频多芯片电路电磁屏蔽结构
CN106783805A (zh) * 2017-03-13 2017-05-31 中国科学院微电子研究所 射频多芯片封装及屏蔽电路
CN110072375A (zh) * 2016-09-02 2019-07-30 船井电机株式会社 显示装置
CN111710668A (zh) * 2020-08-24 2020-09-25 甬矽电子(宁波)股份有限公司 半导体封装结构、其制作方法和电子设备
CN112151509A (zh) * 2020-09-24 2020-12-29 维沃移动通信有限公司 封装器件、电子设备及器件封装方法

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9484313B2 (en) * 2013-02-27 2016-11-01 Advanced Semiconductor Engineering, Inc. Semiconductor packages with thermal-enhanced conformal shielding and related methods
JP6273182B2 (ja) * 2014-08-25 2018-01-31 株式会社東芝 電子機器
US9437576B1 (en) * 2015-03-23 2016-09-06 Advanced Semiconductor Engineering, Inc. Semiconductor device package and method of manufacturing the same
US10368442B2 (en) * 2015-03-30 2019-07-30 Taiwan Semiconductor Manufacturing Company, Ltd. Integrated circuit structure and method of forming
US10594355B2 (en) 2015-06-30 2020-03-17 Skyworks Solutions, Inc. Devices and methods related to radio-frequency filters on silicon-on-insulator substrate
US9781819B2 (en) 2015-07-31 2017-10-03 Laird Technologies, Inc. Multifunctional components for electronic devices and related methods of providing thermal management and board level shielding
CN105070699B (zh) * 2015-07-31 2018-03-27 中国电子科技集团公司第二十六研究所 一种异构集成无源射频滤波器的射频前端模拟集成芯片
WO2017033564A1 (ja) * 2015-08-27 2017-03-02 株式会社村田製作所 高周波モジュール
CN106816431B (zh) * 2015-11-30 2019-08-30 讯芯电子科技(中山)有限公司 一种电磁屏蔽封装结构及其制造方法
CN108701680B (zh) * 2016-03-31 2023-05-30 英特尔公司 带有使用金属层和通孔的电磁干扰屏蔽的半导体封装
US11178768B2 (en) * 2016-04-01 2021-11-16 Intel Corporation Flexible printed circuit EMI enclosure
US10271421B2 (en) * 2016-09-30 2019-04-23 Avago Technologies International Sales Pte. Limited Systems and methods for providing electromagnetic interference (EMI) shielding between inductors of a radio frequency (RF) module
CN107342279A (zh) * 2017-06-08 2017-11-10 唯捷创芯(天津)电子技术股份有限公司 一种防电磁干扰的射频模块及其实现方法
WO2019133195A1 (en) * 2017-12-29 2019-07-04 Commscope Technologies Llc Compact phased array millimeter wave communications systems suitable for fixed wireless access applications
KR102488875B1 (ko) 2018-01-30 2023-01-17 삼성전자주식회사 전자파 차폐구조 및 그 제조방법
KR20190119819A (ko) * 2018-04-13 2019-10-23 삼성전자주식회사 차폐 공간을 형성하는 커넥터 및 이를 구비하는 전자 장치
US10701796B2 (en) * 2018-06-25 2020-06-30 Intel Corporation Electromagnetic interference (EMI) shield
TW202104656A (zh) * 2019-03-28 2021-02-01 美商蘭姆研究公司 噴淋頭護罩
CN115066750A (zh) * 2020-03-26 2022-09-16 株式会社村田制作所 高频模块及通信装置
US11646715B2 (en) * 2020-06-22 2023-05-09 Shenzhen Sunway Communication Co., Ltd. Filter device, RF front-end device and wireless communication device
US11721639B2 (en) * 2020-06-29 2023-08-08 Qualcomm Incorporated Multi-component modules (MCMs) including configurable electro-magnetic isolation (EMI) shield structures, and related methods
JP2022096837A (ja) * 2020-12-18 2022-06-30 株式会社村田製作所 半導体装置、及び半導体モジュール

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1197820A (ja) * 1997-09-17 1999-04-09 Toyota Autom Loom Works Ltd 電磁シールド用導体パターンが形成された回路基板
WO2008059643A1 (fr) * 2006-11-16 2008-05-22 Panasonic Corporation Appareil de circuit électronique tridimensionnel
TW200945541A (en) * 2008-04-21 2009-11-01 Advanced Semiconductor Eng Electronic element packaging module by using a cap
CN102342194A (zh) * 2009-04-28 2012-02-01 欧姆龙株式会社 电子部件安装装置及其制造方法
US20120147571A1 (en) * 2010-12-14 2012-06-14 Just Andrew B Printed circuit board radio-frequency shielding structures
US20120228751A1 (en) * 2011-03-07 2012-09-13 Samsung Electronics Co., Ltd. Semiconductor package and method of manufacturing the same

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0361393U (zh) * 1989-10-20 1991-06-17
JP2598344B2 (ja) * 1991-03-27 1997-04-09 国際電気株式会社 両面実装基板用リードレスパッケージケース
JPH05243775A (ja) * 1992-02-27 1993-09-21 Fujitsu Ltd 電子回路モジュールの電磁シールド構造及びその組立方法
JPH1167947A (ja) * 1997-08-20 1999-03-09 Sony Corp ハイブリッド集積回路装置の表面実装方法及びハイブリッド集積回路装置及びハイブリッド集積回路装置の実装体
JP2001237586A (ja) * 2000-02-25 2001-08-31 Matsushita Electric Ind Co Ltd 回路基板、回路部品内蔵モジュールおよびそれらの製造方法
JP2005183410A (ja) * 2003-12-15 2005-07-07 Nec Saitama Ltd 無線回路モジュールおよび無線回路基板
US7071556B2 (en) 2004-09-10 2006-07-04 Jinghui Mu Tape ball grid array package with electromagnetic interference protection and method for fabricating the package
FR2877537B1 (fr) 2004-10-29 2007-05-18 Thales Sa Boitier microelectronique multiplans
JP4677991B2 (ja) 2004-12-02 2011-04-27 株式会社村田製作所 電子部品及びその製造方法
JP2006202870A (ja) * 2005-01-19 2006-08-03 Matsushita Electric Ind Co Ltd 立体的電子回路モジュールとその製造方法およびそれらを用いた電子装置
JP4889359B2 (ja) * 2006-04-14 2012-03-07 ルネサスエレクトロニクス株式会社 電子装置
US7514774B2 (en) 2006-09-15 2009-04-07 Hong Kong Applied Science Technology Research Institute Company Limited Stacked multi-chip package with EMI shielding
US7709915B2 (en) 2008-05-07 2010-05-04 Aptina Imaging Corporation Microelectronic devices having an EMI shield and associated systems and methods
JP2009290141A (ja) * 2008-05-30 2009-12-10 Sanyo Electric Co Ltd 半導体モジュールおよびその製造方法、ならびに携帯機器
US8362598B2 (en) 2009-08-26 2013-01-29 Amkor Technology Inc Semiconductor device with electromagnetic interference shielding
JP4947169B2 (ja) * 2010-03-10 2012-06-06 オムロン株式会社 半導体装置及びマイクロフォン
US9484279B2 (en) 2010-06-02 2016-11-01 STATS ChipPAC Pte. Ltd. Semiconductor device and method of forming EMI shielding layer with conductive material around semiconductor die
JP2012060019A (ja) * 2010-09-10 2012-03-22 Alps Electric Co Ltd 電子回路モジュール
JP5581933B2 (ja) * 2010-09-22 2014-09-03 ソニー株式会社 パッケージ基板及びこれを用いたモジュール並びに電気・電子機器

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1197820A (ja) * 1997-09-17 1999-04-09 Toyota Autom Loom Works Ltd 電磁シールド用導体パターンが形成された回路基板
WO2008059643A1 (fr) * 2006-11-16 2008-05-22 Panasonic Corporation Appareil de circuit électronique tridimensionnel
TW200945541A (en) * 2008-04-21 2009-11-01 Advanced Semiconductor Eng Electronic element packaging module by using a cap
CN102342194A (zh) * 2009-04-28 2012-02-01 欧姆龙株式会社 电子部件安装装置及其制造方法
US20120147571A1 (en) * 2010-12-14 2012-06-14 Just Andrew B Printed circuit board radio-frequency shielding structures
US20120228751A1 (en) * 2011-03-07 2012-09-13 Samsung Electronics Co., Ltd. Semiconductor package and method of manufacturing the same

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106252339A (zh) * 2016-08-11 2016-12-21 国网辽宁省电力有限公司电力科学研究院 一种高密度射频多芯片封装结构
CN106298741A (zh) * 2016-08-11 2017-01-04 国网辽宁省电力有限公司电力科学研究院 一种射频多芯片电路电磁屏蔽结构
CN106252339B (zh) * 2016-08-11 2019-01-25 国网辽宁省电力有限公司电力科学研究院 一种高密度射频多芯片封装结构
CN110072375A (zh) * 2016-09-02 2019-07-30 船井电机株式会社 显示装置
CN110072375B (zh) * 2016-09-02 2021-01-08 船井电机株式会社 显示装置
CN106783805A (zh) * 2017-03-13 2017-05-31 中国科学院微电子研究所 射频多芯片封装及屏蔽电路
CN111710668A (zh) * 2020-08-24 2020-09-25 甬矽电子(宁波)股份有限公司 半导体封装结构、其制作方法和电子设备
CN112151509A (zh) * 2020-09-24 2020-12-29 维沃移动通信有限公司 封装器件、电子设备及器件封装方法
CN112151509B (zh) * 2020-09-24 2022-11-25 维沃移动通信有限公司 封装器件、电子设备及器件封装方法

Also Published As

Publication number Publication date
US20140252568A1 (en) 2014-09-11
EP2973696B1 (en) 2019-11-13
KR101657622B1 (ko) 2016-09-30
TW201448157A (zh) 2014-12-16
WO2014164186A1 (en) 2014-10-09
JP2017143313A (ja) 2017-08-17
KR20150121244A (ko) 2015-10-28
US8987872B2 (en) 2015-03-24
JP2016514368A (ja) 2016-05-19
TWI534979B (zh) 2016-05-21
EP2973696A1 (en) 2016-01-20

Similar Documents

Publication Publication Date Title
CN105074917A (zh) 用于射频多芯片集成电路封装的电磁干扰外壳
CN108987378B (zh) 微电子装置
US7321166B2 (en) Wiring board having connecting wiring between electrode plane and connecting pad
TWI475660B (zh) 在多晶片模組中用於電磁干擾屏蔽之方法及裝置
US10319685B2 (en) EMI shielded integrated circuit packages and methods of making the same
US20080067656A1 (en) Stacked multi-chip package with EMI shielding
US20080315396A1 (en) Mold compound circuit structure for enhanced electrical and thermal performance
US10128194B1 (en) Trace stacking structure and method
CN107924907A (zh) 具有无源器件的低剖面封装
WO2017171813A1 (en) Electromagnetic interference shielding for semiconductor packages using bond wires
US10453774B1 (en) Thermally enhanced substrate
CN100472780C (zh) 电子零部件及其制造方法
US20150115443A1 (en) Semiconductor package
US6355978B1 (en) Package for accommodating electronic parts, semiconductor device and method for manufacturing package
KR102038602B1 (ko) 고방열 팬아웃 패키지 및 그 제조방법
CN205232575U (zh) 电子装置、电子系统和电子设施
US20080272468A1 (en) Grounded shield for blocking electromagnetic interference in an integrated circuit package
EP4312471A1 (en) Component carrier with signal conductive element and shielding conductive structure
US20240178154A1 (en) Electronic device package emi shielding with grounded mold interconnect
KR101212794B1 (ko) 반도체 패키지 및 이의 제조 방법
JP2024078453A (ja) 接地された成型相互接続を用いる電子デバイスパッケージemiシールディング
WO2024022699A1 (en) Component carrier with signal conductive element and shielding conductive structure
KR101225193B1 (ko) 반도체 패키지 및 이의 제조 방법
TW202245204A (zh) 用於模組內之電磁干擾(emi)屏蔽之導電通孔或溝槽之應用
CN118116895A (zh) 利用接地模具互连件的电子装置封装emi屏蔽

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
RJ01 Rejection of invention patent application after publication

Application publication date: 20151118

RJ01 Rejection of invention patent application after publication