CN101685818B - 半导体器件 - Google Patents

半导体器件 Download PDF

Info

Publication number
CN101685818B
CN101685818B CN2009102052584A CN200910205258A CN101685818B CN 101685818 B CN101685818 B CN 101685818B CN 2009102052584 A CN2009102052584 A CN 2009102052584A CN 200910205258 A CN200910205258 A CN 200910205258A CN 101685818 B CN101685818 B CN 101685818B
Authority
CN
China
Prior art keywords
wiring
formation region
misfet
bonding pad
region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN2009102052584A
Other languages
English (en)
Chinese (zh)
Other versions
CN101685818A (zh
Inventor
林崇弘
丰岛俊辅
坂本和夫
森野直纯
田中一雄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Renesas Electronics Corp
Original Assignee
Renesas Electronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Renesas Electronics Corp filed Critical Renesas Electronics Corp
Publication of CN101685818A publication Critical patent/CN101685818A/zh
Application granted granted Critical
Publication of CN101685818B publication Critical patent/CN101685818B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00Interconnections in chips, wafers or substrates
    • H10W20/40Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes
    • H10W20/41Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes characterised by their conductive parts
    • H10W20/427Power or ground buses
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60Insulating or insulated package substrates; Interposers; Redistribution layers
    • H10W70/62Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their interconnections
    • H10W70/65Shapes or dispositions of interconnections
    • H10W70/658Shapes or dispositions of interconnections for devices provided for in groups H10D8/00 - H10D48/00
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D89/00Aspects of integrated devices not covered by groups H10D84/00 - H10D88/00
    • H10D89/60Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD]
    • H10D89/601Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD] for devices having insulated gate electrodes, e.g. for IGFETs or IGBTs
    • H10D89/611Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD] for devices having insulated gate electrodes, e.g. for IGFETs or IGBTs using diodes as protective elements
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00Interconnections in chips, wafers or substrates
    • H10W20/40Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes
    • H10W20/41Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes characterised by their conductive parts
    • H10W20/44Conductive materials thereof
    • H10W20/4403Conductive materials thereof based on metals, e.g. alloys, metal silicides
    • H10W20/4421Conductive materials thereof based on metals, e.g. alloys, metal silicides the principal metal being copper
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W42/00Arrangements for protection of devices
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/90Bond pads, in general
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • H10W90/701Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/80Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
    • H10D84/82Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
    • H10D84/83Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
    • H10D84/85Complementary IGFETs, e.g. CMOS
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00Interconnections in chips, wafers or substrates
    • H10W20/40Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes
    • H10W20/41Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes characterised by their conductive parts
    • H10W20/42Vias, e.g. via plugs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60Insulating or insulated package substrates; Interposers; Redistribution layers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/071Connecting or disconnecting
    • H10W72/075Connecting or disconnecting of bond wires
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/071Connecting or disconnecting
    • H10W72/075Connecting or disconnecting of bond wires
    • H10W72/07541Controlling the environment, e.g. atmosphere composition or temperature
    • H10W72/07554Controlling the environment, e.g. atmosphere composition or temperature changes in dispositions
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/50Bond wires
    • H10W72/541Dispositions of bond wires
    • H10W72/547Dispositions of multiple bond wires
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/90Bond pads, in general
    • H10W72/921Structures or relative sizes of bond pads
    • H10W72/923Bond pads having multiple stacked layers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/90Bond pads, in general
    • H10W72/921Structures or relative sizes of bond pads
    • H10W72/923Bond pads having multiple stacked layers
    • H10W72/9232Bond pads having multiple stacked layers with additional elements interposed between layers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/90Bond pads, in general
    • H10W72/941Dispositions of bond pads
    • H10W72/942Dispositions of bond pads relative to underlying supporting features, e.g. bond pads, RDLs or vias
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/90Bond pads, in general
    • H10W72/941Dispositions of bond pads
    • H10W72/944Dispositions of multiple bond pads
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/90Bond pads, in general
    • H10W72/941Dispositions of bond pads
    • H10W72/944Dispositions of multiple bond pads
    • H10W72/9445Top-view layouts, e.g. mirror arrays
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/90Bond pads, in general
    • H10W72/951Materials of bond pads
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/90Bond pads, in general
    • H10W72/951Materials of bond pads
    • H10W72/952Materials of bond pads comprising metals or metalloids, e.g. PbSn, Ag or Cu
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/90Bond pads, in general
    • H10W72/981Auxiliary members, e.g. spacers
    • H10W72/983Reinforcing structures, e.g. collars

Landscapes

  • Semiconductor Integrated Circuits (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Design And Manufacture Of Integrated Circuits (AREA)
CN2009102052584A 2005-11-30 2006-11-29 半导体器件 Active CN101685818B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005345347A JP4995455B2 (ja) 2005-11-30 2005-11-30 半導体装置
JP345347/2005 2005-11-30

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
CN2006101629073A Division CN1976032B (zh) 2005-11-30 2006-11-29 半导体器件

Publications (2)

Publication Number Publication Date
CN101685818A CN101685818A (zh) 2010-03-31
CN101685818B true CN101685818B (zh) 2013-08-28

Family

ID=38086651

Family Applications (3)

Application Number Title Priority Date Filing Date
CN2009102052584A Active CN101685818B (zh) 2005-11-30 2006-11-29 半导体器件
CN2010102550934A Active CN101937916B (zh) 2005-11-30 2006-11-29 半导体设备
CN2006101629073A Active CN1976032B (zh) 2005-11-30 2006-11-29 半导体器件

Family Applications After (2)

Application Number Title Priority Date Filing Date
CN2010102550934A Active CN101937916B (zh) 2005-11-30 2006-11-29 半导体设备
CN2006101629073A Active CN1976032B (zh) 2005-11-30 2006-11-29 半导体器件

Country Status (5)

Country Link
US (7) US20070120258A1 (enExample)
JP (1) JP4995455B2 (enExample)
KR (1) KR101336355B1 (enExample)
CN (3) CN101685818B (enExample)
TW (3) TWI496245B (enExample)

Families Citing this family (65)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5879666A (en) * 1996-10-24 1999-03-09 The Procter & Gamble Company Methods and compositions for reducing body odor
JP4517843B2 (ja) * 2004-12-10 2010-08-04 エルピーダメモリ株式会社 半導体装置
JP4995455B2 (ja) 2005-11-30 2012-08-08 ルネサスエレクトロニクス株式会社 半導体装置
JP4975398B2 (ja) * 2006-08-30 2012-07-11 ルネサスエレクトロニクス株式会社 半導体装置及びその製造方法
JP5190913B2 (ja) * 2007-01-15 2013-04-24 ルネサスエレクトロニクス株式会社 半導体集積回路装置
US20080296758A1 (en) * 2007-05-30 2008-12-04 Texas Instruments Incorporated Protection and Connection of Devices Underneath Bondpads
JP2009054702A (ja) * 2007-08-24 2009-03-12 Panasonic Corp 半導体集積回路
JP5222509B2 (ja) 2007-09-12 2013-06-26 ルネサスエレクトロニクス株式会社 半導体装置
JP2009141064A (ja) * 2007-12-05 2009-06-25 Renesas Technology Corp 半導体装置
JP5342154B2 (ja) * 2008-02-25 2013-11-13 ルネサスエレクトロニクス株式会社 半導体装置の製造方法
US8363365B2 (en) * 2008-06-17 2013-01-29 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device
JP5362296B2 (ja) * 2008-09-03 2013-12-11 矢崎総業株式会社 端子金具
US8581423B2 (en) * 2008-11-17 2013-11-12 Taiwan Semiconductor Manufacturing Company, Ltd. Double solid metal pad with reduced area
JP2010147282A (ja) * 2008-12-19 2010-07-01 Renesas Technology Corp 半導体集積回路装置
US8222698B2 (en) * 2009-06-29 2012-07-17 Analog Devices, Inc. Bond pad with integrated transient over-voltage protection
US8384214B2 (en) * 2009-10-13 2013-02-26 United Microelectronics Corp. Semiconductor structure, pad structure and protection structure
JP5585366B2 (ja) * 2009-10-22 2014-09-10 セイコーエプソン株式会社 集積回路装置及び電子機器
US9520486B2 (en) 2009-11-04 2016-12-13 Analog Devices, Inc. Electrostatic protection device
KR20110056005A (ko) * 2009-11-20 2011-05-26 삼성전자주식회사 반도체 장치의 배선 구조체
US8432651B2 (en) 2010-06-09 2013-04-30 Analog Devices, Inc. Apparatus and method for electronic systems reliability
US8665571B2 (en) 2011-05-18 2014-03-04 Analog Devices, Inc. Apparatus and method for integrated circuit protection
US8368116B2 (en) 2010-06-09 2013-02-05 Analog Devices, Inc. Apparatus and method for protecting electronic circuits
US8416543B2 (en) 2010-07-08 2013-04-09 Analog Devices, Inc. Apparatus and method for electronic circuit protection
US8553380B2 (en) 2010-07-08 2013-10-08 Analog Devices, Inc. Apparatus and method for electronic circuit protection
US10199482B2 (en) 2010-11-29 2019-02-05 Analog Devices, Inc. Apparatus for electrostatic discharge protection
US8466489B2 (en) 2011-02-04 2013-06-18 Analog Devices, Inc. Apparatus and method for transient electrical overstress protection
US8592860B2 (en) 2011-02-11 2013-11-26 Analog Devices, Inc. Apparatus and method for protection of electronic circuits operating under high stress conditions
US8680620B2 (en) 2011-08-04 2014-03-25 Analog Devices, Inc. Bi-directional blocking voltage protection devices and methods of forming the same
US8947841B2 (en) 2012-02-13 2015-02-03 Analog Devices, Inc. Protection systems for integrated circuits and methods of forming the same
US8829570B2 (en) 2012-03-09 2014-09-09 Analog Devices, Inc. Switching device for heterojunction integrated circuits and methods of forming the same
US8946822B2 (en) 2012-03-19 2015-02-03 Analog Devices, Inc. Apparatus and method for protection of precision mixed-signal electronic circuits
US8610251B1 (en) 2012-06-01 2013-12-17 Analog Devices, Inc. Low voltage protection devices for precision transceivers and methods of forming the same
US8637899B2 (en) 2012-06-08 2014-01-28 Analog Devices, Inc. Method and apparatus for protection and high voltage isolation of low voltage communication interface terminals
US8796729B2 (en) 2012-11-20 2014-08-05 Analog Devices, Inc. Junction-isolated blocking voltage devices with integrated protection structures and methods of forming the same
US9123540B2 (en) 2013-01-30 2015-09-01 Analog Devices, Inc. Apparatus for high speed signal processing interface
US8860080B2 (en) 2012-12-19 2014-10-14 Analog Devices, Inc. Interface protection device with integrated supply clamp and method of forming the same
US9006781B2 (en) 2012-12-19 2015-04-14 Analog Devices, Inc. Devices for monolithic data conversion interface protection and methods of forming the same
US9275991B2 (en) 2013-02-13 2016-03-01 Analog Devices, Inc. Apparatus for transceiver signal isolation and voltage clamp
US9773732B2 (en) * 2013-03-06 2017-09-26 Taiwan Semiconductor Manufacturing Company, Ltd. Method and apparatus for packaging pad structure
US9147677B2 (en) 2013-05-16 2015-09-29 Analog Devices Global Dual-tub junction-isolated voltage clamp devices for protecting low voltage circuitry connected between high voltage interface pins and methods of forming the same
US9171832B2 (en) 2013-05-24 2015-10-27 Analog Devices, Inc. Analog switch with high bipolar blocking voltage in low voltage CMOS process
JP5604602B2 (ja) * 2014-01-07 2014-10-08 ルネサスエレクトロニクス株式会社 半導体集積回路装置
JP6347685B2 (ja) * 2014-07-08 2018-06-27 ルネサスエレクトロニクス株式会社 半導体装置
JP5916820B2 (ja) * 2014-08-25 2016-05-11 ルネサスエレクトロニクス株式会社 半導体集積回路装置
US9484739B2 (en) 2014-09-25 2016-11-01 Analog Devices Global Overvoltage protection device and method
US9478608B2 (en) 2014-11-18 2016-10-25 Analog Devices, Inc. Apparatus and methods for transceiver interface overvoltage clamping
US10068894B2 (en) 2015-01-12 2018-09-04 Analog Devices, Inc. Low leakage bidirectional clamps and methods of forming the same
US10181719B2 (en) 2015-03-16 2019-01-15 Analog Devices Global Overvoltage blocking protection device
US9673187B2 (en) 2015-04-07 2017-06-06 Analog Devices, Inc. High speed interface protection apparatus
CN108886020B (zh) * 2016-03-28 2022-09-09 株式会社索思未来 半导体集成电路装置
US9831233B2 (en) 2016-04-29 2017-11-28 Analog Devices Global Apparatuses for communication systems transceiver interfaces
US10734806B2 (en) 2016-07-21 2020-08-04 Analog Devices, Inc. High voltage clamps with transient activation and activation release control
JP6790705B2 (ja) * 2016-10-13 2020-11-25 セイコーエプソン株式会社 回路装置、発振器、電子機器及び移動体
US10249609B2 (en) 2017-08-10 2019-04-02 Analog Devices, Inc. Apparatuses for communication systems transceiver interfaces
US10700056B2 (en) 2018-09-07 2020-06-30 Analog Devices, Inc. Apparatus for automotive and communication systems transceiver interfaces
US10784212B2 (en) 2018-12-28 2020-09-22 Micron Technology, Inc. Semiconductor devices having crack-inhibiting structures
US10811365B2 (en) * 2018-12-28 2020-10-20 Micron Technology, Inc. Semiconductor devices having crack-inhibiting structures
US11387648B2 (en) 2019-01-10 2022-07-12 Analog Devices International Unlimited Company Electrical overstress protection with low leakage current for high voltage tolerant high speed interfaces
JP7613029B2 (ja) * 2020-09-09 2025-01-15 株式会社ソシオネクスト 半導体装置
US11973075B2 (en) * 2021-02-22 2024-04-30 Taiwan Semiconductor Manufacturing Company, Ltd. Dual substrate side ESD diode for high speed circuit
JPWO2022215485A1 (enExample) 2021-04-08 2022-10-13
JP7727216B2 (ja) * 2021-09-09 2025-08-21 株式会社ソシオネクスト 半導体集積回路装置
WO2024029040A1 (ja) * 2022-08-04 2024-02-08 株式会社ソシオネクスト 半導体集積回路装置
WO2024047820A1 (ja) * 2022-08-31 2024-03-07 株式会社ソシオネクスト 半導体集積回路装置
WO2024241869A1 (ja) * 2023-05-24 2024-11-28 株式会社ソシオネクスト 半導体集積回路装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003163267A (ja) * 2001-11-29 2003-06-06 Mitsubishi Electric Corp 半導体装置

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3989038B2 (ja) * 1996-04-17 2007-10-10 株式会社ルネサステクノロジ 半導体集積回路装置
JPH113984A (ja) * 1997-06-13 1999-01-06 Hitachi Ltd 半導体集積回路装置
US6803302B2 (en) * 1999-11-22 2004-10-12 Freescale Semiconductor, Inc. Method for forming a semiconductor device having a mechanically robust pad interface
JP2001185552A (ja) * 1999-12-27 2001-07-06 Hitachi Ltd 半導体集積回路装置およびその製造方法
JP3727220B2 (ja) * 2000-04-03 2005-12-14 Necエレクトロニクス株式会社 半導体装置
JP2001358297A (ja) * 2000-06-14 2001-12-26 Nec Corp 静電保護回路
JP2002016069A (ja) * 2000-06-29 2002-01-18 Matsushita Electric Ind Co Ltd 半導体装置およびその製造方法
JP3386042B2 (ja) * 2000-08-02 2003-03-10 日本電気株式会社 半導体装置
JP3861669B2 (ja) * 2001-11-22 2006-12-20 ソニー株式会社 マルチチップ回路モジュールの製造方法
JP3932896B2 (ja) * 2002-01-09 2007-06-20 ソニー株式会社 半導体装置
JP2003289104A (ja) * 2002-03-28 2003-10-10 Ricoh Co Ltd 半導体装置の保護回路及び半導体装置
US6717270B1 (en) * 2003-04-09 2004-04-06 Motorola, Inc. Integrated circuit die I/O cells
WO2004097916A1 (ja) * 2003-04-30 2004-11-11 Fujitsu Limited 半導体装置の製造方法、半導体ウエハおよび半導体装置
JP2005045016A (ja) * 2003-07-22 2005-02-17 Nec Electronics Corp 半導体集積回路
JP4483231B2 (ja) * 2003-08-27 2010-06-16 ソニー株式会社 磁気メモリ装置の製造方法
CN1617312A (zh) * 2003-11-10 2005-05-18 松下电器产业株式会社 半导体器件及其制造方法
JP2005150248A (ja) * 2003-11-12 2005-06-09 Matsushita Electric Ind Co Ltd 半導体集積回路装置
JP4913329B2 (ja) * 2004-02-09 2012-04-11 ルネサスエレクトロニクス株式会社 半導体装置
US6953997B1 (en) * 2004-06-04 2005-10-11 Taiwan Semiconductor Manufacturing Company, Ltd. Semiconductor device with improved bonding pad connection and placement
JP2006202866A (ja) * 2005-01-19 2006-08-03 Nec Electronics Corp 半導体装置
JP4995455B2 (ja) * 2005-11-30 2012-08-08 ルネサスエレクトロニクス株式会社 半導体装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003163267A (ja) * 2001-11-29 2003-06-06 Mitsubishi Electric Corp 半導体装置

Also Published As

Publication number Publication date
CN1976032B (zh) 2010-09-29
US9093283B2 (en) 2015-07-28
KR101336355B1 (ko) 2013-12-04
TWI496245B (zh) 2015-08-11
US20150108579A1 (en) 2015-04-23
US7714357B2 (en) 2010-05-11
CN1976032A (zh) 2007-06-06
TWI570844B (zh) 2017-02-11
US20070120258A1 (en) 2007-05-31
TW201330176A (zh) 2013-07-16
TW200735277A (en) 2007-09-16
CN101937916B (zh) 2012-07-25
TWI396256B (zh) 2013-05-11
US9343460B2 (en) 2016-05-17
KR20070057053A (ko) 2007-06-04
US20130341728A1 (en) 2013-12-26
JP4995455B2 (ja) 2012-08-08
US20150287724A1 (en) 2015-10-08
US8552561B2 (en) 2013-10-08
US20090050940A1 (en) 2009-02-26
CN101937916A (zh) 2011-01-05
US8946770B2 (en) 2015-02-03
US9515019B2 (en) 2016-12-06
CN101685818A (zh) 2010-03-31
TW201539662A (zh) 2015-10-16
JP2007150150A (ja) 2007-06-14
US20100171177A1 (en) 2010-07-08
US20160233154A1 (en) 2016-08-11

Similar Documents

Publication Publication Date Title
CN101685818B (zh) 半导体器件
US8067789B2 (en) Semiconductor integrated circuit device
CN101308846B (zh) 半导体器件
CN1319171C (zh) 具有改进的静电放电耐压的半导体装置
JP7268728B2 (ja) 半導体装置
US7595561B2 (en) Semiconductor device including multiple rows of peripheral circuit units
CN121149114A (zh) 半导体装置

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
ASS Succession or assignment of patent right

Owner name: RENESAS ELECTRONICS

Free format text: FORMER OWNER: RENESAS TECHNOLOGY CORP.

Effective date: 20100919

C41 Transfer of patent application or patent right or utility model
COR Change of bibliographic data

Free format text: CORRECT: ADDRESS; FROM: TOKYO, JAPAN TO: KANAGAWA PREFECTURE, JAPAN

TA01 Transfer of patent application right

Effective date of registration: 20100919

Address after: Kanagawa

Applicant after: Renesas Electronics Corporation

Address before: Tokyo, Japan, Japan

Applicant before: Renesas Technology Corp.

C14 Grant of patent or utility model
GR01 Patent grant
CP02 Change in the address of a patent holder
CP02 Change in the address of a patent holder

Address after: Tokyo, Japan, Japan

Patentee after: Renesas Electronics Corporation

Address before: Kanagawa

Patentee before: Renesas Electronics Corporation