CN101466649A - 具有低维护性能的光催化涂层 - Google Patents
具有低维护性能的光催化涂层 Download PDFInfo
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Abstract
本发明提供承载光催化涂层的基底。在一些实施方案中,所述涂层包括沉积在含有氧化钨、氧化铝、氧化铌或氧化锆的层之上的光催化膜,该光催化膜含有二氧化钛。或者,该光催化膜可以含有二氧化钛和选自氮、钽、铜和二氧化硅的材料。本发明还提供了沉积该涂层的方法。
Description
技术领域
本发明提供用于诸如玻璃等基底的光催化涂层。特别是,本发明提供包括含一种或多种特定材料的底层膜的光催化涂层,并且将一种或多种其它材料引入到含二氧化钛膜中。本发明还提供将这种涂层沉积到玻璃板或其它基底上的方法。
背景技术
光催化涂层在本领域内是已知的。这些涂层通常包括在基底上的二氧化钛膜。为了提供具有期望的低维护性能的光催化涂层已经进行了大量的研究。期望的低维护性能包括自清洁性能、亲水性能等。特别是,寻求低维护窗户涂层已经成为探索的活跃领域。
期望的是提供具有会增强涂层低维护性能的下层的光催化涂层。另外,期望的是将会增强涂层的低维护性能的附加材料引入到光催化膜本身中。
发明内容
在透明基底上提供光催化涂层。在一些实施方案中,所述涂层包括直接沉积在含有选自氧化钨和氧化铌的材料的下层膜上的光催化膜。所述光催化膜优选含有二氧化钛和选自氮、铜、钽、硅、二氧化硅、钯、锡、钨、铌和钼的附加材料。在一些情况下,所述附加材料仅是掺杂剂。这种掺杂剂存在的量可以至多5%,例如2%。在一种情况中,光催化膜含有二氧化钛和钨掺杂剂。下层膜的厚度小于约250埃,更优选小于约75埃。在一些情况中,该涂层还包括沉积在下层膜之下的基膜,其中该基膜含有二氧化硅和/或二氧化钛。
在其它的实施方案中,光催化涂层包括直接位于含有氧化钨的膜上的含有二氧化钛的光催化膜。在一些情况中,所述含有氧化钨的膜基本上由氧化钨组成。在其它情况中,含有氧化钨的膜为含有二氧化硅、硅、二氧化钛、钛和/或不足化学计量的氧化钛的混合膜。含有氧化物的膜优选具有约15埃-约150埃的厚度。该膜还优选直接位于含有二氧化硅和/或二氧化钛的膜上。所述含有二氧化硅和/或二氧化钛的膜具有的厚度优选小于约300埃,更优选小于100埃。在一些情况中,光催化膜含有二氧化钛和选自氮、钽、铜和二氧化硅的材料。在某些情况中,光催化膜含有钛和氮。
在其它实施方案中,光催化涂层从基底往外包括沉积在基底上且厚度小于约300埃的基膜、沉积在该基膜上且厚度小于约100埃的含有氧化钨的膜、和直接沉积在该含有氧化钨的膜上的含有二氧化钛的光催化膜。该含有氧化钨的膜优选具有小于约75埃的厚度。
在一些情况中,光催化涂层包括沉积在下层膜上的光催化膜,该下层膜含有选自氧化钨、氧化铌、氧化铝和氧化锆的材料,其中,将含有氧化锆或氧化铌的膜沉积在下层膜之上或之下,所述含有氧化锆或氧化铌的膜是不同于下层膜的材料。下层膜具有的厚度优选小于约250埃,更优选小于约75埃。含有氧化锆或氧化铌的膜具有的厚度优选为约10埃-约20埃。在一些情况中,将该含有氧化锆或氧化铌的膜沉积在下层膜之上。在其它情况中,将含有氧化锆或氧化铌的膜沉积在下层膜之下。在另外的情况中,将含有氧化锆或氧化铌的膜沉积在下层膜之下,且将第二个含有氧化锆或氧化铌的膜沉积在下层膜之上。在某些情况中,所述涂层还包括沉积在下层膜之下的基膜,其中,该基膜含有二氧化硅和/或二氧化钛。
本发明还提供沉积光催化涂层的方法。在一些实施方案中,所述方法包括在玻璃板的主要表面上沉积含有氧化钨的膜,并直接在该含有氧化钨的膜上沉积含有二氧化钛的光催化膜。优选以约15埃-约150埃的厚度来沉积含有氧化钨的膜。在一些情况中,该含有氧化钨的膜是通过提供含有可溅射材料的溅射钯来沉积,所述可溅射的材料包括钨,基本上选自纯钨、氧化钨和钨合金。该含有氧化钨的膜可以为含有二氧化硅的混合膜,该混合膜通过共溅射含有钨的钯和含有硅、钛和/或不足化学计量的氧化钛的钯来沉积。在一些情况下,光催化膜含有氮,该光催化膜通过在含有氮的气氛中溅射含有钛的钯来沉积。
附图说明
图1为根据本发明的实施方案,具有承载光催化涂层的表面的基底的示意截面图;
图2为根据本发明的另一个实施方案,具有承载光催化涂层的表面的基底的示意截面图;
图3为根据本发明的另一个实施方案,具有承载光催化涂层的表面的基底的示意截面图;
图4为根据本发明的另一个实施方案,具有承载光催化涂层的表面的基底的示意截面图;
图5为根据本发明的另一个实施方案,一个表面承载光催化涂层和另一个表面承载另外的涂层的基底的示意截面图;
图6为根据本发明的某些实施方案,包括具有两个涂覆表面的窗玻璃的多窗格绝缘玻璃装置的部分断开的示意截面图;
图7为根据本发明的某些实施方案,带有光催化涂层的窗玻璃的部分断开透视图,该窗玻璃安装在建筑物的外墙上;和
图8为适用于本发明的某些方法中的溅射室的示意侧视图。
具体实施方式
参考附图对本发明进行详细描述,其中,不同附图中的相同部件具有相同的附图标记。不一定按比例绘制的附图描述了所选的实施方案且并不欲限制本发明的范围。本领域的技术人员可以理解,所给出的实施例具有很多变型方式在本发明的范围内。
本发明的许多实施方案涉及涂覆的基底。很多类型的基底都适用于本发明。在一些实施方案中,基底10是具有通常相对的第一主表面12和第二主表面14的板状基底。例如,该基底可以为透明材料板(即透明板)。然而,不要求基底是板,也不要求基底是透明的。
该基底可以任选为任何建筑材料的组分。预期应用的实例包括基底为窗框(如窗扇或车门窗框)、插板(如铝插板)、搭帐篷用的板、油布(如氟碳聚合物油布)、塑料膜(如氟碳塑料膜)、屋顶板、百叶窗(如金属、塑料或纸百页窗)、纸屏风(如障子)、栏杆、栏杆柱、或孔罩的实施方案。在一个实施方案中,基底为瓷砖,如墙面砖、天花板瓷砖或地面砖。在另一个实施方案中,基底为玻璃垫块。各种合适的玻璃垫块可以从Saint-Gobain Oberland(Koblenz,Germany)商购获得。在另一个实施方案中,基底为聚酯膜、聚乙烯膜、对苯二酸酯膜等。这种性质的合适的膜可以从Nippon Soda Co.,Ltd.(Tokyo,Japan)商购获得。在其它实施方案中,基底为围墙或墙壁,如降低噪声的围墙或墙壁。
对于很多应用,基底将包括透明(或者至少半透明)材料,如玻璃或透明塑料。例如,在某些实施方案中基底为玻璃板(例如窗玻璃)。可以使用各种已知的玻璃种类,通常优选钠钙玻璃。在某些优选的实施方案中,基底为窗户、天窗、门、浴室门或其它玻璃窗的部分。在一些情况中,基底为汽车挡风玻璃、汽车侧面玻璃、外部或内部后视镜、保险杠、毂盖、风挡刮水器、或汽车引擎罩板、侧板、行李箱板或顶板的部分。在其它实施方案中,基底为一块鱼缸玻璃、塑料鱼缸窗、或者一块温室玻璃。在其它实施方案中,基底为冰箱板,如冰箱门或窗的部分。
在本发明中可以使用各种尺寸的基底。通常,使用大面积的基底。某些实施方案涉及的基底10的主要尺寸(如长度和宽度)至少约0.5米,优选至少约1米,可能更优选至少约1.5米(如约2米-约4米),且在一些情况中至少约3米。在一些实施方案中,基底为长度和/或宽度为约3米-约10米的巨大玻璃板,如宽度为约3.5米、长度为约6.5米的玻璃板。还预期使用长度和/或宽度大于约10米的基底。
在一些实施方案中,基底10通常为正方形或长方形玻璃板。在这些实施方案中的基底可以具有前面段落和/或下面段落中描述的任何尺寸。在一个特定的实施方案中,基底通常为宽度为约3米-5米如约3.5米和长度为约6米-约10米如约6.5米的长方形玻璃板。
在本发明中可以使用各种厚度的基底。在一些实施方案中,基底10(可以任选为玻璃板)的厚度为约1-5mm。某些实施方案包括厚度为约2.3mm-约4.8mm,可能更优选约2.5mm-约4.8mm的基底10。在特定的实施方案中,使用厚度约3mm的玻璃板(如钠钙玻璃)。在一组实施方案中,基底(可以为玻璃、塑料或其它材料)的厚度为约4mm-约20mm。例如,在此范围内的厚度可以用于鱼缸槽(在该情况中,基底可以任选为玻璃的或丙烯酸的)。当基底为浮法玻璃时,其厚度通常为约4mm-约19mm。在另一组实施方案中,基底为厚度约0.35mm-约1.9mm的薄板(如玻璃)。此性质的实施方案可以任选包括为橱窗玻璃板等的基底10。
参考图1,显示了具有承载光催化涂层50的主表面12的透明基底10。该涂层50包括含有二氧化钛的光催化膜30和下层膜20。优选的是,所述光催化膜30直接沉积在下层膜20上,并与下层膜20邻接。
光催化膜30可以含有氧化钛和/或不足化学计量的氧化钛。在一些实施方案中,膜30基本上由二氧化钛组成。在其它实施方案中,膜30包含钛(如二氧化钛或不足化学计量的氧化钛)和选自氮、钽、铜、二氧化硅、钯、锡、钨、铌和钼的材料。在一些实施方案中,所述氮、铜、钽、硅、二氧化硅、钯、锡、钨、铌或钼还可以仅是掺杂剂。这种掺杂基存在的量可以至多5%,例如约2%。
在一些情况中,膜30含有二氧化钛和氮、二氧化钛和二氧化硅、二氧化钛和铜、二氧化钛和钽、二氧化钛和钯、二氧化钛和锡、二氧化钛和钨、二氧化钛和铌、或者二氧化钛和钼。在其它情况中,膜30含有不足化学计量的氧化钛和氮、不足化学计量的氧化钛和二氧化硅、不足化学计量的氧化钛和铜、不足化学计量的氧化钛和钽、不足化学计量的氧化钛和钯、不足化学计量的氧化钛和锡、不足化学计量的氧化钛和钨、不足化学计量的氧化钛和铌、或者不足化学计量的氧化钛和钼。另一个实施方案提供了含有二氧化钛、二氧化硅和氮的膜30。当存在铜时,铜可以任选被氧化。当膜30含有至少一种所述的另外的物质时,下层可以由任何需要的物质形成,或者完全省略。
当提供时,下层膜20可以任选含有下列物质中的一种或多种:氧化钨、氧化铝、氧化铌和/或氧化锆。在某些实施方案中,该膜含有选自氧化钨或氧化铌的物质。在一些情况中,膜20基本上由氧化钨或氧化铌组成。在其它的实施方案中,该膜含有选自氧化铝或氧化锆的物质。在一些情况下,膜20基本上由氧化铝或氧化锆组成。
在一些实施方案中,膜20为含有氧化钨和/或氧化铝和/或氧化铌和/或氧化锆和/或另一种物质的混合膜。在某些情况中,膜20为含有二氧化硅、硅、二氧化钛、钛、和/或不足化学计量的氧化钛的混合膜。例如,这种混合膜可以含有氧化钨和二氧化硅、硅、二氧化钛、钛、和/或不足化学计量的氧化钛的混合物,或者氧化铝与二氧化硅、硅、二氧化钛、钛、和/或不足化学计量的氧化钛的混合物,或者氧化铌与二氧化硅、硅、二氧化钛、钛、和/或不足化学计量的氧化钛的混合物,或者氧化锆与二氧化硅、硅、二氧化钛、钛、和/或不足化学计量的氧化钛的混合物。
当提供时,该混合膜可以为均质膜,或者可以为分级膜。在一些实施方案中,所提供的分级膜从基底表面往外具有浓度基本上连续降低的二氧化硅、硅、二氧化钛、钛、和/或不足化学计量的氧化钛和浓度基本上连续增加的氧化钨。在其它实施方案中,所提供的分级膜从基底表面往外具有浓度基本上连续降低的二氧化硅、硅、二氧化钛、钛、和/或不足化学计量的氧化钛和浓度基本上连续增加的氧化铝。在其它实施方案中,所提供的分级膜从基底表面往外具有浓度基本上连续降低的二氧化硅、硅、二氧化钛、钛、和/或不足化学计量的氧化钛和浓度基本上连续增加的氧化铌。在其它实施方案中,所提供的分级膜从基底表面往外具有浓度基本上连续降低的二氧化硅、硅、二氧化钛、钛、和/或不足化学计量的氧化钛和浓度基本上连续增加的氧化锆。
下层膜20任选具有小于约250埃、小于约200埃、小于约150埃、小于约125埃、小于约100埃、或者甚至小于75埃的厚度。一个特别的实施方案提供了厚度小于65埃(例如50埃以下)的膜20。在一些情况中,膜20的厚度为约5-约200埃,如约15-约150埃。在某些情况中,膜20的厚度为25-40埃。
在一些实施方案中,可以在膜20之下或之上提供薄膜,以改善膜20的附着性和耐久性。在某些实施方案中,在膜20之下提供薄膜,且在膜20之上提供另一个薄膜。在图2中,在膜20之上提供膜25a,且在膜20之下提供膜25b。在一些情况中,所述膜25a和25b的厚度均为约10-约20埃。膜25a和25b可以含有氧化锆,且在一些情况中基本上由氧化锆组成。膜25a和25b还可以含有氧化铌,且在一些情况中基本上由氧化铌组成。在一些情况中,仅提供膜25a和25b中的一个。
参考图3,在一些实施方案中,光催化涂层50包括沉积在任选的膜20和基底10之间的膜15。所述膜15可以为含有二氧化硅的基膜,且在一些情况中基本上由二氧化硅组成。膜15还可以是含有二氧化钛的基膜,且在一些情况中基本上由二氧化钛组成。膜15甚至还可以为含有二氧化硅和二氧化钛的基膜,且在一些情况中基本上由二氧化硅和钛组成。膜15优选直接位于膜20之下并与膜20邻接。在一些情况中,膜15直接沉积在基底上,且膜20直接沉积在膜15上。膜15可以任选具有小于约300埃的厚度。在某些实施方案中,膜15的厚度小于100埃。参考图4,在一些情况中,在膜20的上面和下面提供膜25a和25b,使得膜25a与膜15邻接。所述膜25a和25b也优选含有氧化锆,并具有约10埃-约20埃的厚度。而且,在一些情况中,也仅提供膜25a和25b中的一个。
在一个特别的实施方案中,光催化涂层从基底表面向外包括厚度为约75埃的二氧化硅膜(任选直接沉积在基底上)、直接沉积在所述二氧化硅膜上且厚度为约25埃的氧化钨膜、和直接沉积在所述氧化钨膜上且厚度为约25-约40埃的二氧化钛膜。
在另一个特别的实施方案中,光催化涂层从基底表面向外包括厚度为约75埃的二氧化硅膜(任选直接沉积在基底上)、直接沉积在所述二氧化硅膜上且厚度为约10埃-20埃的第一氧化锆膜、直接沉积在所述第一氧化锆膜上且厚度为约25埃的氧化钨膜、直接沉积在所述氧化钨膜上且厚度为约10埃-约20埃的第二氧化锆膜、和直接沉积在氧化钨膜上且厚度为约25埃-约40埃的二氧化钛膜。
在另一个特别的实施方案中,光催化涂层从基底表面向外包括直接沉积在基底表面上且厚度为约10埃-约20埃的氧化铌膜、直接沉积在所述氧化铌膜上且厚度为约25埃的氧化钨膜、和直接沉积在所述氧化钨膜上且厚度为约25埃-约40埃的二氧化钛膜。同样地,在另一个实施方案中,光催化涂层从基底表面向外包括直接沉积在基底表面上且厚度为约25埃的氧化钨膜、直接沉积在所述氧化钨膜上且厚度为约10埃-约20埃的氧化铌膜、和直接沉积在所述氧化铌膜上且厚度为约25埃-约40埃的二氧化钛膜。
在一些情况中,在基底的第一主表面上提供光催化涂层50,并在该基底的相对的主表面上提供另一功能涂层。图5说明了基底10具有承载光催化涂层50的第一表面12和承载功能涂层80的第二表面14的实施方案。所述功能涂层80可以包括单层膜或多层膜。可以使用本领域中已知的任何功能涂层。在一些情况中,功能涂层80是低辐射率膜。在某些情况中,涂层80包括具有三层或更多层红外反射层的低辐射率膜。具有三层或更多层红外反射层的合适的低辐射率涂层在美国专利60/725,891中有描述,该专利的全部教导在本文中并入作为参考。在其它情况中,功能涂层可以为“单层银”或“双层银”低辐射率涂层。
参考图6,基底10可以为部分绝缘玻璃装置110。通常,绝缘玻璃装置110具有由窗玻璃空间800分隔的外窗玻璃10和内窗玻璃10'。通常提供隔离物900(可以任选为部分窗框)来分隔窗玻璃10和10'。可以使用粘合剂700将隔离物固定到每个窗玻璃的内表面上。在一些情况中,还提供端部密封物600。在示例性实施方案中,外窗玻璃10具有外表面12和内表面14。内窗玻璃10'具有内表面16和外表面18。窗玻璃10可以固定在框架(如窗框)中,使得外表面12暴露于室外环境。内表面14和16都暴露于中空玻璃装置的窗玻璃空间800之间的空气。在一些情况中,在图6所示的IG装置中基底10的外表面12具有光催化涂层50。该涂层50可以为已经描述的任何实施方案。相同基底10的内表面14可以包括功能涂层80,例如低辐射率涂层。
图7示例了基底10(可以为玻璃窗)为固定在窗框95上(如在建筑物99的外墙98中)的窗玻璃。在某些应用中,根据任何期望的实施方案,这种窗的涂覆的第一表面(即表面12)承载光催化涂层50。在这种性质的一些实施方案中,涂覆的表面12可以暴露于室外的环境(和/或可能不定期接触雨)。
本发明还提供制备涂覆基底的方法。可以通过各种已知的涂覆技术来沉积光催化涂层50的每层膜。合适的涂覆技术包括,但不限于,化学气相沉积(CVD)、等离子增强化学气相沉积、热解沉积、溶胶凝胶沉积和溅射。在某些实施方案中,任选在低温下(例如将基底保持在约250℃以下,可能更优选低于200℃时)通过溅射来沉积膜。溅射是本领域公知的。
本发明还提供制备涂覆基底的设备。图8描述了可用于沉积本发明的光催化涂层的示例性磁控溅射室200。磁控溅射室和有关的设备可以从各种来源(例如Leybold)商购得到。有用的磁控溅射技术和设备在授予Chapin的美国专利4,166,018中有描述,该专利的全部教导在本文中并入作为参考。在图8中描述的溅射室200包括基板(或“底板”)220、多个侧壁202、和顶板(或者“顶盖”或“盖子”)230,它们一起围成溅射空腔202。两个上部靶280a和280b固定在基底行程路线45之上。在膜沉积的过程中将基底10沿着基底行程路线45输送,任选在多个间隔分离的输送辊210上。在图8中,提供了两个上部靶,不过这不是必需的。例如,这些靶或者可以为位于基底行程路线下方的下部靶,并适用于在基底的底部表面上沉积光催化涂层。在一些实施方案中,在溅射沉积光催化涂层的至少一层膜的同时,将另一层膜溅射在基底的另一侧上,即使用双向溅射室。双向溅射室在美国专利09/868,542、10/911,155和10/922,719中有描述,这些专利的全部教导在本文中并入作为参考。或者,在各室中可以使用单个上部靶或下部靶。此外,该室可以包括一个或多个上部平面靶和/或下部平面靶,不过这里显示的是圆筒形靶。
通过溅射来进行涂覆时,可以任选在进行溅射的同时保持基底的温度低于约250℃,更优选低于200℃(例如不对基底补充加热)。在这种情况下,可以任选溅射沉积涂层而没有任何用于传送能量给生长中的膜的补充手段(例如没有任何对基底的加热,除了常规溅射的等离子和离子轰击通常发生的之外)。在其它情况下,通过包括补充加热(或其它补充能量传送)的溅射沉积技术来沉积涂层50的一层或多层膜。或者,可以通过对涂层操作离子枪并加速离子对沉积的涂层50进行离子处理(例如以增强涂层的低维护性能)。在一些情况下,这是在光催化膜包含二氧化钛和一种或多种上述材料的实施方案中进行的。
在某些实施方案中,提供了沉积光催化涂层50的方法,该方法包括在基底(如玻璃板)的主表面上沉积下层膜,然后直接在所述下层膜上沉积含有二氧化钛的光催化膜。在光催化膜基本上由二氧化钛组成的情况中,可使用如图8所示的溅射室,且靶280a和280b均可以含有钛。在一些情况下,靶为金属钛靶,并使用氧化气氛(任选包括一些氮)来溅射含有二氧化钛的膜。在其它情况下,靶为氧化钛靶,并在室中使用惰性气氛(任选含有少量氧和/或氮)。在其它情况中,靶为不足化学计量的氧化钛靶,并在室中使用惰性气氛(任选含有少量氧和/或氮)。
在光催化膜为含有二氧化钛和另一种材料的膜的情况下,可以任选使用共溅射方法。例如,其中一个靶280a或280b可以任选含有钛而另一个靶含有另一种材料。在一些情况中,所述另一个靶含有铜,因此所得到的膜含有二氧化钛和铜(该铜任选被氧化)。在其它情况中,另一个靶含有硅,因此所得到的膜含有二氧化钛和二氧化硅。含有硅的靶可以为纯硅靶,并将氧化气氛(任选还含有一些氮)引入室中。含有硅的靶或者可以为氧化硅靶,使得该靶可以在惰性(或微氧化和/或微氮化)气氛中溅射。在其它情况中,另一个靶含有钯,因此得到的膜含有二氧化钛和钯。在其它情况中,另一个靶含有锡,因此所得到的膜含有二氧化钛和锡。在其它情况中,另一个靶含有钨,因此所得到的膜含有二氧化钛和钨。在其它情况中,另一个靶含有铌,因此所得到的膜含有二氧化钛和铌。在其它情况中,另一个靶含有钼,因此所得到的膜含有二氧化钛和钼。
在光催化膜为包含二氧化钛、二氧化硅和氮的混合膜的情况下,其中一个靶280或280b可以含有钛(和/或氧化钛)而另一个靶可以含有硅(和/或氧化硅)。接着可以在室中使用含氮的气氛。不使用用于混合膜实施方案的共溅射方法,每个靶可以含有钛和至少一种选自硅和铜的另外的材料。另外,在将氮引入膜30中的任何实施方案中,沉积气氛可以含有氮。
而且,在光催化涂层为混合膜的情况中,可以使用溅射合金靶的方法。例如,靶280a和280b中的一个或两个可以为合金靶。合金靶可以为选自以下的合金:钛和铜、钛和钽、钛和硅、钛和钯、钛和锡、钛和钨、钛和铌、钛和钼、不足化学计量的氧化钛和铜、不足化学计量的氧化钛和钽、不足化学计量的氧化钛和硅、不足化学计量的氧化钛和钯、不足化学计量的氧化钛和锡、不足化学计量的氧化钛和钨、不足化学计量的氧化钛和铌、或不足化学计量的氧化钛和钼。在一些情况中,在靶中钛或不足化学计量的氧化钛的量比另一种材料的量高。在一些情况中,在靶中的钛或不足化学计量的氧化钛与另一种材料简单掺杂。还可在反应性气氛如氧化或氮化气氛中溅射合金靶。在合金靶含有不足化学计量的氧化钛的情况下,可以在惰性气氛、微氧化气氛或微氮化气氛中溅射该靶。
在某些实施方案中,提供了沉积下层膜20的方法。该方法包括在基底(例如玻璃板)的主表面上沉积下层膜。可以使用如图8中所示的溅射室。在下层膜20基本上由氧化钨、氧化铝、氧化铌或氧化锆组成的情况下,靶280a和280b可以各自含有钨、铝、铌或锆。在一些情况下,在氧化气氛(任选含有一些氮)中使用金属钨靶、金属铝靶、金属铌靶或金属锆靶。在其它情况中,在惰性气氛(任选在室中使用含有少量氧和/或氮的惰性气氛)中靶为氧化钨靶、氧化铝靶、氧化铌靶或氧化锆靶。
在下层膜为混合膜的情况下,可以任选使用共溅射方法。例如,其中一个靶280a或280b可以任选含有钨、铝、铌或锆,同时另一个靶含有另一种材料。在一些情况中,一个靶含有金属钨、金属铝、金属铌、或金属锆,而另一个靶含有硅、钛、或不足化学计量的氧化钛,并且两个靶都在氧化气氛(任选含有一些氮)中共溅射。在其它情况中,一个靶含有氧化钨、氧化铝、氧化铌或氧化锆,而另一个靶含有氧化硅、氧化钛或不足化学计量的氧化钛,且两个靶都在惰性气氛(任选在室中使用含有少量氧或氮的惰性气氛)中共溅射。
此外,在下层膜为混合膜的情况中,可以使用溅射合金靶的方法。例如,靶280a和280b中的一个或两个可以为合金靶。该合金靶可以为选自以下的合金:钨和钛、钨和硅、钨和不足化学计量的氧化钛、铝和钛、铝和硅、铝和不足化学计量的氧化钛、铌和钛、铌和硅、铌和不足化学计量的氧化钛、锆和钛、锆和硅、以及锆和不足化学计量的氧化钛。在氧化气氛(任选含有一些氮)中溅射合金靶。
已经描述了本发明的优选实施方案的同时,还应该理解的是在不背离本发明的精神和所附权利要求的范围的情况下可以对本发明作出各种变化、适应和修改。
Claims (32)
1、一种透明基底,在该基底上提供有光催化涂层,所述涂层包括直接沉积在下层膜上的光催化膜,所述下层膜含有选自氧化钨和氧化铌的材料。
2、根据权利要求1所述的基底,其中,所述光催化膜含有二氧化钛和选自氮、铜、钽、二氧化硅、钯、锡、钽、铌和钼的材料。
3、根据权利要求2所述的基底,其中,所述选自氮、铜、钽、二氧化硅、钯、锡、钨、铌和钼的材料为掺杂剂。
4、根据权利要求3所述的基底,其中,所述光催化膜含有二氧化钛和钨掺杂剂。
5、根据权利要求1所述的基底,其中,所述下层膜的厚度小于约250埃。
6、根据权利要求1所述的基底,其中,所述下层膜的厚度小于约75埃。
7、根据权利要求1所述的基底,其还包括沉积在所述下层膜之下的基膜,其中该基膜含有二氧化硅和/或二氧化钛。
8、一种透明基底,在该基底上提供有光催化涂层,所述涂层包括直接位于含有氧化钨的膜之上的光催化膜,所述光催化膜含有二氧化钛。
9、根据权利要求8所述的基底,其中,所述含有氧化钨的膜基本上由氧化钨组成。
10、根据权利要求8所述的基底,其中,所述含有氧化钨的膜为含有二氧化硅、硅、二氧化钛、钛和/或不足化学计量的氧化钛的混合膜。
11、根据权利要求8所述的基底,其中,所述含有氧化钨的膜的厚度为约15埃-约150埃。
12、根据权利要求8所述的基底,其中,所述含有氧化钨的膜直接位于含有二氧化硅和/或二氧化钛的膜之上。
13、根据权利要求12所述的基底,其中,所述含有二氧化硅和/或二氧化钛的膜的厚度小于约300埃。
14、根据权利要求13所述的基底,其中,所述含有二氧化硅和/或二氧化钛的膜的厚度小于约100埃。
15、根据权利要求8所述的基底,其中,所述光催化膜含有二氧化钛和选自氮、铜、钽、二氧化硅、钯、锡、钨、铌和钼的材料。
16、根据权利要求15所述的基底,其中,所述选自氮、铜、钽、二氧化硅、钯、锡、钨、铌和钼的材料为掺杂剂。
17、根据权利要求8所述的基底,其中,所述光催化膜含有钛和氮。
18、一种透明基底,在该基底上提供有光催化涂层,所述涂层从基底向外包括沉积在该基底之上且厚度小于约300埃的基膜、沉积在所述基膜之上且厚度小于约100埃的含有氧化钨的膜、和直接沉积在所述含有氧化钨的膜之上的含有二氧化钛的光催化膜。
19、根据权利要求18所述的基底,其中,所述含有氧化钨的膜的厚度小于约75埃。
20、一种沉积光催化涂层的方法,所述方法包括在玻璃板的主表面上沉积含有氧化钨的膜,并直接在所述含有氧化钨的膜之上沉积含有二氧化钛的光催化膜。
21、根据权利要求20所述的方法,其中,以约15埃-约150埃的厚度来沉积所述含有氧化钨的膜。
22、根据权利要求20所述的方法,其中,所述含有氧化钨的膜通过提供含有可溅射材料的溅射靶来沉积,所述可溅射材料含有钨,并选自纯钨、氧化钨和钨合金。
23、根据权利要求20所述的方法,其中,所述含有氧化钨的膜为含有二氧化硅的混合膜,所述混合膜通过共溅射含有钨的靶和含有硅的靶来沉积。
24、根据权利要求20所述的方法,其中,所述光催化膜含有氮,该光催化膜通过在含有氮的气氛中溅射含有钛的靶来沉积。
25、一种透明基底,在该基底上提供有光催化涂层,所述涂层包括在下层膜上沉积的光催化膜,所述下层膜包含选自氧化钨、氧化铌、氧化铝和氧化锆的材料,其中,将含有氧化锆或氧化铌的膜沉积在所述下层膜之上或之下,所述含有氧化锆或氧化铌的膜为与下层膜不同的材料。
26、根据权利要求22所述的基底,其中,所述下层膜的厚度小于约250埃。
27、根据权利要求25所述的基底,其中,所述下层膜的厚度小于约75埃。
28、根据权利要求25所述的基底,其中,所述含有氧化锆或氧化铌的膜的厚度为约10埃-约20埃。
29、根据权利要求25所述的基底,其中,所述含有氧化锆或氧化铌的膜沉积在所述下层膜之上。
30、根据权利要求25所述的基底,其中,所述含有氧化锆或氧化铌的膜沉积在所述下层膜之下。
31、根据权利要求25所述的基底,其中,所述含有氧化锆或氧化铌的膜沉积在所述下层膜之下,并且其中将含有氧化锆或氧化铌的第二膜沉积在所述下层膜之上。
32、根据权利要求25所述的基底,其还包括沉积在所述下层膜之下的基膜,其中所述基膜含有二氧化硅和/或二氧化钛。
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- 2007-04-11 CA CA2648686A patent/CA2648686C/en active Active
- 2007-04-11 KR KR1020087026848A patent/KR101431230B1/ko active IP Right Grant
- 2007-04-11 WO PCT/US2007/066390 patent/WO2007121215A1/en active Application Filing
- 2007-04-11 JP JP2007104167A patent/JP5129975B2/ja active Active
- 2007-04-11 EP EP07760450.2A patent/EP2013150B1/en active Active
- 2007-04-11 US US11/733,979 patent/US7862910B2/en active Active
- 2007-04-11 CN CN2007800214598A patent/CN101466649B/zh active Active
- 2007-04-11 WO PCT/US2007/066380 patent/WO2007121211A2/en not_active Application Discontinuation
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
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CN102111969A (zh) * | 2009-12-25 | 2011-06-29 | 深圳富泰宏精密工业有限公司 | 电子装置壳体 |
CN103796755A (zh) * | 2012-06-01 | 2014-05-14 | 株式会社东芝 | 水系分散液、使用水系分散液的涂料、光催化膜及制品 |
CN103796755B (zh) * | 2012-06-01 | 2016-08-24 | 株式会社东芝 | 水系分散液、使用水系分散液的涂料、光催化膜及制品 |
CN114308123A (zh) * | 2021-12-29 | 2022-04-12 | 中欧电子材料国际创新中心(合肥)有限公司 | 一种光催化涂层材料及其制备方法 |
Also Published As
Publication number | Publication date |
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WO2007121215A1 (en) | 2007-10-25 |
EP2013150B1 (en) | 2018-02-28 |
US7862910B2 (en) | 2011-01-04 |
WO2007121211A3 (en) | 2007-12-13 |
CA2648686A1 (en) | 2007-10-25 |
EP2013150A1 (en) | 2009-01-14 |
KR20080110885A (ko) | 2008-12-19 |
WO2007121211A2 (en) | 2007-10-25 |
JP5129975B2 (ja) | 2013-01-30 |
JP2007301988A (ja) | 2007-11-22 |
CA2648686C (en) | 2016-08-09 |
KR101431230B1 (ko) | 2014-08-18 |
US20070264494A1 (en) | 2007-11-15 |
CN101466649B (zh) | 2013-12-11 |
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