ATE547399T1 - Oximesterverbindung und photopolymerisationsinitiator, der diese verbindung enthält - Google Patents

Oximesterverbindung und photopolymerisationsinitiator, der diese verbindung enthält

Info

Publication number
ATE547399T1
ATE547399T1 AT10015054T AT10015054T ATE547399T1 AT E547399 T1 ATE547399 T1 AT E547399T1 AT 10015054 T AT10015054 T AT 10015054T AT 10015054 T AT10015054 T AT 10015054T AT E547399 T1 ATE547399 T1 AT E547399T1
Authority
AT
Austria
Prior art keywords
photopolymerization initiator
compound
represent
conr
cor
Prior art date
Application number
AT10015054T
Other languages
German (de)
English (en)
Inventor
Kiyoshi Murata
Takeo Oishi
Koichi Kimijima
Original Assignee
Adeka Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Adeka Corp filed Critical Adeka Corp
Application granted granted Critical
Publication of ATE547399T1 publication Critical patent/ATE547399T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C251/00—Compounds containing nitrogen atoms doubly-bound to a carbon skeleton
    • C07C251/32—Oximes
    • C07C251/62—Oximes having oxygen atoms of oxyimino groups esterified
    • C07C251/64—Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids
    • C07C251/66—Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids with the esterifying carboxyl groups bound to hydrogen atoms, to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/23—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton
    • C07C323/46—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having at least one of the nitrogen atoms, not being part of nitro or nitroso groups, further bound to other hetero atoms
    • C07C323/47—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having at least one of the nitrogen atoms, not being part of nitro or nitroso groups, further bound to other hetero atoms to oxygen atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/64—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and sulfur atoms, not being part of thio groups, bound to the same carbon skeleton
    • C07C323/65—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and sulfur atoms, not being part of thio groups, bound to the same carbon skeleton containing sulfur atoms of sulfone or sulfoxide groups bound to the carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C391/00—Compounds containing selenium
    • C07C391/02—Compounds containing selenium having selenium atoms bound to carbon atoms of six-membered aromatic rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02—Phosphorus compounds
    • C07F9/28—Phosphorus compounds with one or more P—C bonds
    • C07F9/50—Organo-phosphines
    • C07F9/5022—Aromatic phosphines (P-C aromatic linkage)
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2601/00—Systems containing only non-condensed rings
    • C07C2601/12—Systems containing only non-condensed rings with a six-membered ring
    • C07C2601/14—The ring being saturated
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Biochemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Molecular Biology (AREA)
  • General Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Optical Filters (AREA)
  • Polymerisation Methods In General (AREA)
AT10015054T 2009-11-27 2010-11-26 Oximesterverbindung und photopolymerisationsinitiator, der diese verbindung enthält ATE547399T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2009269801 2009-11-27
JP2010225063A JP4818458B2 (ja) 2009-11-27 2010-10-04 オキシムエステル化合物及び該化合物を含有する光重合開始剤

Publications (1)

Publication Number Publication Date
ATE547399T1 true ATE547399T1 (de) 2012-03-15

Family

ID=43662254

Family Applications (1)

Application Number Title Priority Date Filing Date
AT10015054T ATE547399T1 (de) 2009-11-27 2010-11-26 Oximesterverbindung und photopolymerisationsinitiator, der diese verbindung enthält

Country Status (7)

Country Link
US (1) US8148045B2 (https=)
EP (1) EP2327689B1 (https=)
JP (1) JP4818458B2 (https=)
KR (1) KR101153575B1 (https=)
CN (1) CN102086171B (https=)
AT (1) ATE547399T1 (https=)
TW (1) TW201132618A (https=)

Families Citing this family (70)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011045916A1 (ja) * 2009-10-15 2011-04-21 キヤノン株式会社 帯電部材及び電子写真装置
EP2586827B1 (en) * 2010-06-28 2017-12-27 Adeka Corporation Curable resin composition
CN103298782B (zh) * 2011-03-25 2016-04-06 株式会社艾迪科 肟酯化合物以及含有该化合物的光聚合引发剂
JP6149353B2 (ja) * 2011-07-08 2017-06-21 住友化学株式会社 着色感光性樹脂組成物
JP6060539B2 (ja) * 2011-07-08 2017-01-18 住友化学株式会社 感光性樹脂組成物
JP5825963B2 (ja) * 2011-09-30 2015-12-02 太陽ホールディングス株式会社 感光性導電性樹脂組成物、感光性導電性ペーストおよび導電体パターン
CN103130833B (zh) * 2011-11-28 2017-02-08 深圳市有为化学技术有限公司 可溶性肟酯和芳香酮光聚合引发剂
JP6058890B2 (ja) * 2012-01-11 2017-01-11 株式会社Adeka 硬化性樹脂組成物
JP5360285B2 (ja) * 2012-01-26 2013-12-04 東レ株式会社 感光性導電ペースト
CN104080822B (zh) * 2012-01-31 2016-01-06 旭硝子株式会社 化合物、聚合物、固化性组合物、涂布用组合物、以及具有固化膜的物品、具有亲液性区域和拒液性区域的图案的物品及其制造方法
JP6208119B2 (ja) * 2012-03-22 2017-10-04 株式会社Adeka 新規化合物及び感光性樹脂組成物
KR101489067B1 (ko) * 2012-05-30 2015-02-04 주식회사 엘지화학 광활성 화합물 및 이를 포함하는 감광성 수지 조성물
WO2013180419A1 (ko) * 2012-05-30 2013-12-05 주식회사 엘지화학 광활성 화합물 및 이를 포함하는 감광성 수지 조성물
JP5337318B1 (ja) * 2012-11-22 2013-11-06 積水化学工業株式会社 液晶滴下工法用シール剤、上下導通材料、及び、液晶表示素子
KR101961219B1 (ko) * 2013-01-08 2019-03-22 동우 화인켐 주식회사 착색 감광성 수지 조성물
JP5828851B2 (ja) * 2013-03-01 2015-12-09 株式会社ノリタケカンパニーリミテド 感光性ペースト
KR101569333B1 (ko) * 2013-03-06 2015-11-13 세키스이가가쿠 고교가부시키가이샤 액정 적하 공법용 시일제, 상하 도통 재료, 및, 액정 표시 소자
JP6233271B2 (ja) 2013-12-27 2017-11-22 Jsr株式会社 感光性樹脂組成物およびレジストパターンの製造方法
KR101435652B1 (ko) * 2014-01-17 2014-08-28 주식회사 삼양사 신규한 β-옥심에스테르 플루오렌 화합물, 이를 포함하는 광중합 개시제 및 포토레지스트 조성물
JP6583258B2 (ja) * 2014-02-19 2019-10-02 日立化成デュポンマイクロシステムズ株式会社 樹脂組成物、それによって形成される硬化膜及びパターン硬化膜、及びそれらの製造方法
JP6408802B2 (ja) * 2014-06-27 2018-10-17 東京応化工業株式会社 感エネルギー性樹脂組成物
WO2016017701A1 (ja) * 2014-07-31 2016-02-04 富士フイルム株式会社 紫外線感知シート、紫外線感知セットおよび紫外線感知方法
KR101525460B1 (ko) * 2014-08-25 2015-06-04 애경화학 주식회사 신규한 구조를 갖는 옥심에스테르 광개시제 및 이를 포함하는 반응성 액정 조성물 및 감광성 조성물
EP3085661B1 (en) 2015-04-21 2017-12-27 JSR Corporation Method of producing microfluidic device
CN106278966B (zh) * 2015-06-03 2019-11-05 江苏和成新材料有限公司 肟酯类化合物及其合成方法及应用
KR102466525B1 (ko) * 2015-09-23 2022-11-11 주식회사 삼양사 신규한 비페닐 옥심 에스테르 유도체 화합물 및 이를 포함하는 광중합 개시제 및 포토레지스트 조성물
JP6621643B2 (ja) * 2015-10-22 2019-12-18 株式会社Adeka オキシムエステル化合物及び該化合物を含有する重合開始剤
CN105206570B (zh) * 2015-10-27 2018-11-23 深圳市华星光电技术有限公司 一种显示面板及其制造方法
US10095110B2 (en) 2015-11-26 2018-10-09 Jsr Corporation Photosensitive resin composition, method for forming resist pattern, and method for producing metallic pattern
JP2017116659A (ja) * 2015-12-22 2017-06-29 三菱ケミカル株式会社 保護膜用硬化性組成物、保護膜、ｔｆｔアクティブマトリックス基板、及び画像表示装置
JP6688087B2 (ja) * 2016-01-15 2020-04-28 株式会社Adeka 化合物、組成物及び光重合開始剤
JP2017146429A (ja) * 2016-02-16 2017-08-24 株式会社Adeka ブラックカラムスペーサ用感光性組成物
CN108475019B (zh) * 2016-03-29 2022-02-11 株式会社艾迪科 黑色感光性树脂组合物
TWI742060B (zh) * 2016-03-30 2021-10-11 日商艾迪科股份有限公司 聚合性組合物、硬化物及顯示用光學膜及製造硬化物之方法
PL3315316T3 (pl) * 2016-10-27 2021-06-14 Akzenta Paneele + Profile Gmbh Sposób wytwarzania dekorowanego panelu ściennego lub podłogowego
WO2018155547A1 (ja) * 2017-02-23 2018-08-30 日立化成デュポンマイクロシステムズ株式会社 感光性樹脂組成物、硬化パターンの製造方法、硬化物、層間絶縁膜、カバーコート層、表面保護膜、及び電子部品
KR20180135370A (ko) * 2017-06-12 2018-12-20 롬엔드하스전자재료코리아유한회사 착색 감광성 수지 조성물 및 이로부터 제조된 차광성 스페이서
CN110546134B (zh) * 2017-07-13 2024-12-20 株式会社艾迪科 肟酯化合物及含有该化合物的光聚合引发剂
KR102140763B1 (ko) * 2017-11-22 2020-08-04 홍익대학교 산학협력단 광 활성제와 이의 제조 방법 및 이를 포함하는 액정 배향제 제조 방법
CN109957351B (zh) * 2017-12-14 2021-11-26 常州强力电子新材料股份有限公司 各向异性导电膜、用于形成其的组合物及其应用
WO2019207081A1 (en) 2018-04-27 2019-10-31 Merck Patent Gmbh Polymerisable liquid crystal material and polymerised liquid crystal film
WO2019206925A1 (en) * 2018-04-27 2019-10-31 Merck Patent Gmbh Polymerisable liquid crystal material and polymerised liquid crystal film
EP3578384B1 (de) 2018-06-05 2021-10-20 Akzenta Paneele + Profile GmbH Trägermaterial auf basis einer kunststoffzusammensetzung und einer feststoffzusammensetzung auf mineralbasis für dekorierte wand- oder bodenpaneele
KR20200012739A (ko) * 2018-07-27 2020-02-05 닛뽄 가야쿠 가부시키가이샤 전자 부품용 봉지제, 전자 부품 및 액정 표시 셀
WO2020031240A1 (ja) 2018-08-06 2020-02-13 日立化成デュポンマイクロシステムズ株式会社 感光性樹脂組成物、パターン硬化膜の製造方法、硬化膜、層間絶縁膜、カバーコート層、表面保護膜及び電子部品
JP7701147B2 (ja) 2019-12-26 2025-07-01 住友化学株式会社 表示装置
JP7406983B2 (ja) 2019-12-26 2023-12-28 住友化学株式会社 組成物および表示装置
JP7659390B2 (ja) 2019-12-26 2025-04-09 住友化学株式会社 硬化性樹脂組成物および表示装置
WO2021200815A1 (ja) 2020-03-30 2021-10-07 株式会社Adeka ラジカル重合開始剤、組成物、硬化物及び硬化物の製造方法
JP7773859B2 (ja) 2020-03-31 2025-11-20 住友化学株式会社 硬化性樹脂組成物及び表示装置
JP7773858B2 (ja) 2020-03-31 2025-11-20 住友化学株式会社 硬化性樹脂組成物及び表示装置
JP7788218B2 (ja) 2020-03-31 2025-12-18 住友化学株式会社 硬化性樹脂組成物及び表示装置
JP7592979B2 (ja) * 2020-04-17 2024-12-03 ａｒｔｉｅｎｃｅ株式会社 感光性緑色組成物、カラーフィルタおよび液晶表示装置
JP2022041899A (ja) 2020-08-31 2022-03-11 住友化学株式会社 樹脂組成物、樹脂膜及び表示装置
JP2022041900A (ja) 2020-08-31 2022-03-11 住友化学株式会社 積層体及び表示装置
JP2022041901A (ja) 2020-08-31 2022-03-11 住友化学株式会社 積層体及び表示装置
EP4265614A4 (en) 2020-12-17 2024-11-20 Adeka Corporation COMPOUND AND COMPOSITION
KR20240004521A (ko) 2021-04-28 2024-01-11 스미또모 가가꾸 가부시키가이샤 경화막 및 표시 장치
JP2022170674A (ja) 2021-04-28 2022-11-10 住友化学株式会社 硬化膜及び表示装置
KR20240035990A (ko) 2021-07-20 2024-03-19 가부시키가이샤 아데카 반도체용 막 형성 재료, 반도체용 부재 형성 재료, 반도체용 공정 부재 형성 재료, 하층막 형성 재료, 하층막 및 반도체 디바이스
JP2023070646A (ja) 2021-11-09 2023-05-19 住友化学株式会社 樹脂組成物、樹脂膜及び表示装置
JP2023070648A (ja) 2021-11-09 2023-05-19 住友化学株式会社 樹脂膜及び表示装置
JP2023070645A (ja) 2021-11-09 2023-05-19 住友化学株式会社 樹脂組成物、樹脂膜及び表示装置
JP2023070647A (ja) 2021-11-09 2023-05-19 住友化学株式会社 樹脂組成物、樹脂膜及び表示装置
JP2023152724A (ja) 2022-03-31 2023-10-17 住友化学株式会社 組成物、膜及び表示装置
JP2023152726A (ja) 2022-03-31 2023-10-17 住友化学株式会社 組成物、膜及び表示装置
JP2023152725A (ja) 2022-03-31 2023-10-17 住友化学株式会社 組成物、膜及び表示装置
JP2024013852A (ja) 2022-07-21 2024-02-01 住友化学株式会社 組成物、膜及び表示装置
WO2024090369A1 (ja) 2022-10-26 2024-05-02 株式会社Adeka 化合物、組成物、硬化物、硬化物の製造方法及び電子部品の製造方法
JP2024123965A (ja) * 2023-03-02 2024-09-12 株式会社村田製作所 感光性ペースト

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG77689A1 (en) 1998-06-26 2001-01-16 Ciba Sc Holding Ag New o-acyloxime photoinitiators
NL1016815C2 (nl) 1999-12-15 2002-05-14 Ciba Sc Holding Ag Oximester-fotoinitiatoren.
JP2001302871A (ja) 2000-04-25 2001-10-31 Taiyo Ink Mfg Ltd 光硬化性・熱硬化性樹脂組成物とこれを用いて形成したソルダーレジスト皮膜や樹脂絶縁層を有するプリント配線板
EP1395615B1 (en) * 2001-06-11 2009-10-21 Basf Se Oxime ester photoinitiators having a combined structure
TW200714651A (en) 2002-10-28 2007-04-16 Mitsubishi Chem Corp Photopolymerization composition and color filter using the same
JP2004264414A (ja) 2003-02-28 2004-09-24 Konica Minolta Holdings Inc 感光性平版印刷版材料の現像処理方法、感光性平版印刷版材料用固形状のアルカリ現像剤及び平版印刷版
JP2004300108A (ja) * 2003-04-01 2004-10-28 Toyo Ink Mfg Co Ltd オキシムスルホニウム錯体
JP2005242280A (ja) 2003-04-24 2005-09-08 Sumitomo Chemical Co Ltd 黒色感光性樹脂組成物
JP4595374B2 (ja) 2003-04-24 2010-12-08 住友化学株式会社 黒色感光性樹脂組成物
JP4442292B2 (ja) 2003-06-10 2010-03-31 三菱化学株式会社 光重合性組成物、カラーフィルター及び液晶表示装置
JP3754065B2 (ja) 2003-06-10 2006-03-08 三菱化学株式会社 光重合性組成物及びこれを用いたカラーフィルター
JP5140903B2 (ja) 2004-07-02 2013-02-13 三菱化学株式会社 着色樹脂組成物、カラーフィルタ及び液晶表示装置
DK1801145T3 (da) * 2004-09-13 2009-02-16 Asahi Kasei Chemicals Corp Fremgangsmåde til fremstilling af et hærdet produkt af lysfölsomt resin
JP2007219362A (ja) * 2006-02-20 2007-08-30 Toyo Ink Mfg Co Ltd 重合性組成物およびそれを用いたネガ型レジストおよびそれを用いた画像パターン形成方法。
TWI406840B (zh) * 2006-02-24 2013-09-01 Fujifilm Corp 肟衍生物、光聚合性組成物、彩色濾光片及其製法
JP5354863B2 (ja) * 2006-02-24 2013-11-27 富士フイルム株式会社 オキシム誘導体、光重合性組成物、カラーフィルタおよびその製造方法
JP4884853B2 (ja) * 2006-06-20 2012-02-29 富士フイルム株式会社 染料含有ネガ型硬化性組成物、カラーフィルタ及びその製造方法
CN101528682B (zh) * 2006-12-27 2012-08-08 株式会社艾迪科 肟酯化合物和含有该化合物的光聚合引发剂
JP2008292903A (ja) * 2007-05-28 2008-12-04 Fujifilm Corp カラーフィルタ用インクジェットインク
JP2009251392A (ja) * 2008-04-08 2009-10-29 Fujifilm Corp ネガ型レジスト組成物及びパターン形成方法
JP5494479B2 (ja) * 2008-04-25 2014-05-14 三菱化学株式会社 ケトオキシムエステル系化合物及びその利用

Also Published As

Publication number Publication date
TW201132618A (en) 2011-10-01
US20110129778A1 (en) 2011-06-02
US8148045B2 (en) 2012-04-03
CN102086171A (zh) 2011-06-08
JP2011132215A (ja) 2011-07-07
EP2327689B1 (en) 2012-02-29
CN102086171B (zh) 2014-05-14
EP2327689A1 (en) 2011-06-01
TWI374129B (https=) 2012-10-11
KR101153575B1 (ko) 2012-06-11
KR20110059525A (ko) 2011-06-02
JP4818458B2 (ja) 2011-11-16

Similar Documents

Publication Publication Date Title
ATE547399T1 (de) Oximesterverbindung und photopolymerisationsinitiator, der diese verbindung enthält
NI201000022A (es) Nuevos derivados de 6-triazolopiridacina-sulfanil benzotiazol y bencimidazol, su procedimiento de preparación, su aplicación como medicamentos, composiciones farmacéuticas y nueva utilización principalmente como inhibidores de met.
UY30387A1 (es) Nuevos compuestos
EA200970868A1 (ru) Производные плевромутилина для лечения заболеваний, опосредуемых микробами
CU23926B1 (es) Derivado de oxopirazina y herbicida
ATE526321T1 (de) Neue epoxidverbindung, alkalisch entwickelbare harzzusammensetzung und alkalisch entwickelbare lichtempfindliche harzzusammensetzung
TNSN07471A1 (en) Novel 2,4 - dianilinopyrimidine derivatives, the preparation thereof, their use as medicaments, pharmaceutical compositions and, in particular, as ikk inhibitors
CR10383A (es) Derivados triazolopirazina.
NO20083435L (no) Formuleringer
AR077413A1 (es) Derivados piridin-4-ilo
ATE427932T1 (de) 11beta-hsd1-inhibitoren
EA200801417A1 (ru) Соединение бициклического циннамида
ATE487162T1 (de) Neue sulfoniumverbindung, diese enthaltende lichtempfindliche zusammensetzung und strukturbildungsverfahren unter verwendung der lichtempfindlichen zusammensetzung
CY1105994T1 (el) Aναδιαταγμενες πεντανολες, μεθοδος για την παραγωγη αυτων και η χρηση αυτων ως αντιφλεγμονωδων
CO6430453A2 (es) Terapia de combinacion para el tratamiento de la diabetes
ATE553076T1 (de) Aminosubstituierte hydroxyphenylbenzophenonderivate
ATE528689T1 (de) Gefärbte lichtempfindliche zusammensetzung, farbfilter und verfahren zur herstellung des farbfilters
WO2008107502A8 (es) Composicion para el tratamiento de enfermedades infecciosas
TW201129552A (en) Salt and photoresist composition containing the same
ECSP088689A (es) NOVEDOSAS 11ß-HIDROXIANDROSTA-4-EN-3-ONAS
CO6341610A2 (es) Compuesto heterociclilo aromatico que contiene nitrogeno.
AR078142A1 (es) Compuestos inhibidores heteroarilicos biciclicos de pde4, las composiciones farmaceuticas que los contienen y el uso de los mismos para la preparacion de medicamentos.
UY30787A1 (es) "inhibidores benzoimidazolicos de trpv1"
ATE461185T1 (de) Sulfoniumsalze als photoinitiatoren
BRPI0506477A (pt) compostos farmaceuticamente úteis e inovadores