ATE528689T1 - Gefärbte lichtempfindliche zusammensetzung, farbfilter und verfahren zur herstellung des farbfilters - Google Patents

Gefärbte lichtempfindliche zusammensetzung, farbfilter und verfahren zur herstellung des farbfilters

Info

Publication number
ATE528689T1
ATE528689T1 AT08161988T AT08161988T ATE528689T1 AT E528689 T1 ATE528689 T1 AT E528689T1 AT 08161988 T AT08161988 T AT 08161988T AT 08161988 T AT08161988 T AT 08161988T AT E528689 T1 ATE528689 T1 AT E528689T1
Authority
AT
Austria
Prior art keywords
color filter
weight
structural unit
producing
light sensitive
Prior art date
Application number
AT08161988T
Other languages
English (en)
Inventor
Hideki Takakuwa
Kazuto Shimada
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Application granted granted Critical
Publication of ATE528689T1 publication Critical patent/ATE528689T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
AT08161988T 2007-08-22 2008-08-07 Gefärbte lichtempfindliche zusammensetzung, farbfilter und verfahren zur herstellung des farbfilters ATE528689T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007216356A JP4890388B2 (ja) 2007-08-22 2007-08-22 着色感光性組成物、カラーフィルタ及びその製造方法

Publications (1)

Publication Number Publication Date
ATE528689T1 true ATE528689T1 (de) 2011-10-15

Family

ID=40090458

Family Applications (1)

Application Number Title Priority Date Filing Date
AT08161988T ATE528689T1 (de) 2007-08-22 2008-08-07 Gefärbte lichtempfindliche zusammensetzung, farbfilter und verfahren zur herstellung des farbfilters

Country Status (6)

Country Link
US (1) US8137890B2 (de)
EP (1) EP2028544B1 (de)
JP (1) JP4890388B2 (de)
KR (1) KR101451204B1 (de)
AT (1) ATE528689T1 (de)
TW (1) TWI418932B (de)

Families Citing this family (17)

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JP5344790B2 (ja) * 2006-12-28 2013-11-20 富士フイルム株式会社 硬化性組成物、カラーフィルタ及びその製造方法
EP1975702B1 (de) * 2007-03-29 2013-07-24 FUJIFILM Corporation Farbige lichthärtbare Zusammensetzung für eine Festkörperbildaufnahmevorrichtung, Farbfilter und Verfahren zur Herstellung davon, sowie Festkörperbildaufnahmevorrichtung
JP5288756B2 (ja) * 2007-09-20 2013-09-11 富士フイルム株式会社 アゾ顔料及び顔料分散体
ATE526366T1 (de) * 2007-10-31 2011-10-15 Fujifilm Corp Farbige härtbare zusammensetzung, farbfilter, herstellungsverfahren dafür und festzustand- bildaufnahmevorrichtung
JP5189404B2 (ja) * 2008-05-09 2013-04-24 住友化学株式会社 感光性組成物
JP5444747B2 (ja) * 2009-02-17 2014-03-19 ソニー株式会社 カラー撮像素子およびその製造方法ならびに光センサーおよびその製造方法ならびに光電変換素子およびその製造方法ならびに電子機器
JP5642402B2 (ja) * 2009-03-17 2014-12-17 富士フイルム株式会社 カラーフィルタ及びその製造方法、並びに固体撮像素子
JP5535692B2 (ja) * 2009-03-17 2014-07-02 富士フイルム株式会社 着色硬化性組成物、カラーフィルタ、及びカラーフィルタの製造方法
JP5622564B2 (ja) * 2010-06-30 2014-11-12 富士フイルム株式会社 感光性組成物、パターン形成材料、並びに、これを用いた感光性膜、パターン形成方法、パターン膜、低屈折率膜、光学デバイス、及び、固体撮像素子
JP5283747B2 (ja) * 2011-02-09 2013-09-04 富士フイルム株式会社 着色感放射線性組成物、カラーフィルタ、その製造方法、固体撮像素子、及び液晶表示装置
JP2015068962A (ja) * 2013-09-27 2015-04-13 富士フイルム株式会社 着色硬化性組成物、カラーフィルタ、カラーフィルタの製造方法、及び、表示装置
TWI647005B (zh) * 2017-11-07 2019-01-11 漢科系統科技股份有限公司 用於濕式蝕刻清洗台的排氣的高吸附洗滌裝置
JP7122819B2 (ja) * 2017-12-06 2022-08-22 富士フイルム株式会社 感光性組成物、転写フィルム、硬化膜、並びに、タッチパネル及びその製造方法
CN114902091A (zh) * 2019-12-26 2022-08-12 富士胶片株式会社 光吸收滤波器、滤光器、有机电致发光显示装置及液晶显示装置
CN115298268A (zh) * 2020-02-20 2022-11-04 富士胶片株式会社 着色组合物、膜、红色像素、滤色器、固体摄像元件、图像显示装置及试剂盒
CN113759661A (zh) * 2020-06-03 2021-12-07 新应材股份有限公司 感光性树脂组合物、隔壁、光转换层以及光发射装置
TWI732580B (zh) * 2020-06-03 2021-07-01 新應材股份有限公司 感光性樹脂組成物、隔壁、光轉換層以及光發射裝置

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Also Published As

Publication number Publication date
KR101451204B1 (ko) 2014-10-15
TW200919083A (en) 2009-05-01
TWI418932B (zh) 2013-12-11
JP2009048111A (ja) 2009-03-05
US20090053626A1 (en) 2009-02-26
US8137890B2 (en) 2012-03-20
KR20090020490A (ko) 2009-02-26
EP2028544B1 (de) 2011-10-12
EP2028544A3 (de) 2009-10-28
JP4890388B2 (ja) 2012-03-07
EP2028544A2 (de) 2009-02-25

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