WO2017090512A1 - ポリメタロキサン、その製造方法、その組成物、硬化膜およびその製造方法ならびにそれを備えた部材および電子部品 - Google Patents
ポリメタロキサン、その製造方法、その組成物、硬化膜およびその製造方法ならびにそれを備えた部材および電子部品 Download PDFInfo
- Publication number
- WO2017090512A1 WO2017090512A1 PCT/JP2016/084138 JP2016084138W WO2017090512A1 WO 2017090512 A1 WO2017090512 A1 WO 2017090512A1 JP 2016084138 W JP2016084138 W JP 2016084138W WO 2017090512 A1 WO2017090512 A1 WO 2017090512A1
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- WIPO (PCT)
- Prior art keywords
- titanium
- polymetalloxane
- group
- zirconium
- solution
- Prior art date
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- MYWQGROTKMBNKN-UHFFFAOYSA-N tributoxyalumane Chemical compound [Al+3].CCCC[O-].CCCC[O-].CCCC[O-] MYWQGROTKMBNKN-UHFFFAOYSA-N 0.000 description 1
- JYVWRCIOZLRMKO-UHFFFAOYSA-N tributyl(hydroxy)silane Chemical compound CCCC[Si](O)(CCCC)CCCC JYVWRCIOZLRMKO-UHFFFAOYSA-N 0.000 description 1
- SZHOJFHSIKHZHA-UHFFFAOYSA-N tridecanoic acid Chemical compound CCCCCCCCCCCCC(O)=O SZHOJFHSIKHZHA-UHFFFAOYSA-N 0.000 description 1
- FRGPKMWIYVTFIQ-UHFFFAOYSA-N triethoxy(3-isocyanatopropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCCN=C=O FRGPKMWIYVTFIQ-UHFFFAOYSA-N 0.000 description 1
- KDQOFMAEKGBTEL-UHFFFAOYSA-N triheptyl(hydroxy)silane Chemical compound CCCCCCC[Si](O)(CCCCCCC)CCCCCCC KDQOFMAEKGBTEL-UHFFFAOYSA-N 0.000 description 1
- NOVLNRUYLAGEMC-UHFFFAOYSA-N trihexyl(hydroxy)silane Chemical compound CCCCCC[Si](O)(CCCCCC)CCCCCC NOVLNRUYLAGEMC-UHFFFAOYSA-N 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- UAEJRRZPRZCUBE-UHFFFAOYSA-N trimethoxyalumane Chemical compound [Al+3].[O-]C.[O-]C.[O-]C UAEJRRZPRZCUBE-UHFFFAOYSA-N 0.000 description 1
- ZFYVMCFENKKDFG-UHFFFAOYSA-N trioctoxyalumane Chemical compound [Al+3].CCCCCCCC[O-].CCCCCCCC[O-].CCCCCCCC[O-] ZFYVMCFENKKDFG-UHFFFAOYSA-N 0.000 description 1
- NLSXASIDNWDYMI-UHFFFAOYSA-N triphenylsilanol Chemical compound C=1C=CC=CC=1[Si](C=1C=CC=CC=1)(O)C1=CC=CC=C1 NLSXASIDNWDYMI-UHFFFAOYSA-N 0.000 description 1
- DAOVYDBYKGXFOB-UHFFFAOYSA-N tris(2-methylpropoxy)alumane Chemical compound [Al+3].CC(C)C[O-].CC(C)C[O-].CC(C)C[O-] DAOVYDBYKGXFOB-UHFFFAOYSA-N 0.000 description 1
- TYCVNFYGWNZRAM-UHFFFAOYSA-N tritert-butyl(hydroxy)silane Chemical compound CC(C)(C)[Si](O)(C(C)(C)C)C(C)(C)C TYCVNFYGWNZRAM-UHFFFAOYSA-N 0.000 description 1
- JFALSRSLKYAFGM-UHFFFAOYSA-N uranium(0) Chemical compound [U] JFALSRSLKYAFGM-UHFFFAOYSA-N 0.000 description 1
- JFALSRSLKYAFGM-OIOBTWANSA-N uranium-235 Chemical compound [235U] JFALSRSLKYAFGM-OIOBTWANSA-N 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 1
- 230000003612 virological effect Effects 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
- DUNKXUFBGCUVQW-UHFFFAOYSA-J zirconium tetrachloride Chemical compound Cl[Zr](Cl)(Cl)Cl DUNKXUFBGCUVQW-UHFFFAOYSA-J 0.000 description 1
- MNUKOWCSUUMTRC-UHFFFAOYSA-F zirconium(4+) octachloride Chemical compound [Cl-].[Cl-].[Cl-].[Cl-].[Cl-].[Cl-].[Cl-].[Cl-].[Zr+4].[Zr+4] MNUKOWCSUUMTRC-UHFFFAOYSA-F 0.000 description 1
Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G25/00—Compounds of zirconium
- C01G25/006—Compounds containing, besides zirconium, two or more other elements, with the exception of oxygen or hydrogen
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B9/00—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/25—Oxides by deposition from the liquid phase
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/25—Oxides by deposition from the liquid phase
- C03C17/256—Coating containing TiO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3649—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer made of metals other than silver
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/38—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal at least one coating being a coating of an organic material
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0834—Compounds having one or more O-Si linkage
- C07F7/0836—Compounds with one or more Si-OH or Si-O-metal linkage
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G79/00—Macromolecular compounds obtained by reactions forming a linkage containing atoms other than silicon, sulfur, nitrogen, oxygen, and carbon with or without the latter elements in the main chain of the macromolecule
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/10—Metal compounds
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
- C08K3/20—Oxides; Hydroxides
- C08K3/22—Oxides; Hydroxides of metals
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L85/00—Compositions of macromolecular compounds obtained by reactions forming a linkage in the main chain of the macromolecule containing atoms other than silicon, sulfur, nitrogen, oxygen and carbon; Compositions of derivatives of such polymers
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/111—Anti-reflection coatings using layers comprising organic materials
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/02—Details
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/12—Light sources with substantially two-dimensional radiating surfaces
- H05B33/22—Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/12—Light sources with substantially two-dimensional radiating surfaces
- H05B33/26—Light sources with substantially two-dimensional radiating surfaces characterised by the composition or arrangement of the conductive material used as an electrode
- H05B33/28—Light sources with substantially two-dimensional radiating surfaces characterised by the composition or arrangement of the conductive material used as an electrode of translucent electrodes
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K51/00—Preparations containing radioactive substances for use in therapy or testing in vivo
- A61K51/02—Preparations containing radioactive substances for use in therapy or testing in vivo characterised by the carrier, i.e. characterised by the agent or material covalently linked or complexing the radioactive nucleus
- A61K51/04—Organic compounds
- A61K51/0474—Organic compounds complexes or complex-forming compounds, i.e. wherein a radioactive metal (e.g. 111In3+) is complexed or chelated by, e.g. a N2S2, N3S, NS3, N4 chelating group
- A61K51/0478—Organic compounds complexes or complex-forming compounds, i.e. wherein a radioactive metal (e.g. 111In3+) is complexed or chelated by, e.g. a N2S2, N3S, NS3, N4 chelating group complexes from non-cyclic ligands, e.g. EDTA, MAG3
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/212—TiO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/22—ZrO2
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/90—Other aspects of coatings
- C03C2217/94—Transparent conductive oxide layers [TCO] being part of a multilayer coating
- C03C2217/948—Layers comprising indium tin oxide [ITO]
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/11—Deposition methods from solutions or suspensions
- C03C2218/116—Deposition methods from solutions or suspensions by spin-coating, centrifugation
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
- C03C2218/32—After-treatment
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
- C03C2218/32—After-treatment
- C03C2218/328—Partly or completely removing a coating
- C03C2218/33—Partly or completely removing a coating by etching
Definitions
- the present invention relates to a polymetalloxane, a production method thereof, a composition thereof, a cured film, a production method thereof, a member provided with the same, and an electronic component.
- a film made of a metal oxide has properties such as high heat resistance, high transparency, and a high refractive index, and is expected to have useful properties for various applications.
- a method for forming such a film As a method for forming such a film, a method of forming a titanium oxide or zirconium oxide film by a vapor phase method such as chemical vapor deposition (CVD) is known.
- CVD chemical vapor deposition
- a vapor phase method such as CVD has a slow film formation speed and it is difficult to obtain a film thickness that can be used industrially.
- Patent Document 1 As a method for hydrolyzing a metal alkoxide in a solvent, the technique described in Patent Document 1 is such that the temperature of the metal alkoxide solution is maintained at 70 ° C., and water for hydrolysis is 1 mol or more per 1 mol of titanium alkoxide. By adding 7 moles or less, an organic solvent-soluble ladder-like polytitanoxane is obtained.
- water when water is added at a temperature of less than 70 ° C. or when the amount of water added is increased, precipitation occurs due to aggregation of the hydrolyzate.
- the resulting polytitanoxane since the hydrolysis rate is low, the resulting polytitanoxane has a large amount of alkoxy groups remaining, which causes hydrolysis of the alkoxy groups due to moisture in the air when forming the coating film, and cracks due to separation, resulting in a homogeneous film. There was a problem that could not.
- Patent Document 2 is a technique for producing a titanium compound oligomer by reacting a titanium compound and water in an alcohol solution in the presence of a special hydrochloride.
- a special hydrochloride Even in such a method, when the amount of water added is increased, the hydrolyzate precipitates due to the aggregation of the hydrolyzate, so that a high molecular weight polymetalloxane cannot be obtained, cracks occur during the formation of the coating film, and a homogeneous film is formed. There was a problem that I could not.
- An object of the present invention is to provide a polymetalloxane that is stably present in a solution in a transparent and uniform state and can form a uniform cured film.
- the present invention is a polymetalloxane having a structural unit represented by the following general formula (1).
- R 1 is an organic group, and at least one of R 1 is a (R 3 3 SiO—) group, and R 3 is a hydroxy group, an alkyl group having 1 to 12 carbon atoms, or an aliphatic group having 5 to 12 carbon atoms.
- R 2 is optionally selected from a cyclic alkyl group, an alkoxy group having 1 to 12 carbon atoms, an aromatic group having 6 to 30 carbon atoms, a group having a siloxane bond or a group having a metalloxane bond, R 2 is a hydrogen atom, carbon R 1 , R 2 and R 3 may be the same as or different from each other when there are a plurality of alkyl groups having 1 to 12 or a group having a metalloxane bond.
- Another embodiment of the present invention is a method for producing a polymetalloxane comprising a step of polycondensing a compound represented by the following general formula (2) or a hydrolyzate thereof.
- R 4 is any of a hydroxy group, an alkyl group having 1 to 12 carbon atoms, an alicyclic alkyl group having 5 to 12 carbon atoms, an alkoxy group having 1 to 12 carbon atoms, or an aromatic group having 6 to 30 carbon atoms.
- R 5 is arbitrarily selected from a hydrogen atom or an alkyl group having 1 to 12 carbon atoms, and when a plurality of R 4 and R 5 are present, they may be the same or different.
- M is Al, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge, Zr, Nb, Mo, Ru, Rh, Pd, Ag, In, Sn, Sb, Hf, Ta,
- the polymetalloxane of the present invention is stably present in a transparent and uniform state in the solution. Moreover, according to the polymetalloxane of the present invention, a cured film having high transparency and a high refractive index can be provided.
- the present invention is a polymetalloxane having a structural unit represented by the following general formula (1).
- R 1 is an organic group, and at least one of R 1 is a (R 3 3 SiO—) group.
- R 3 includes a hydroxy group, an alkyl group having 1 to 12 carbon atoms, an alicyclic alkyl group having 5 to 12 carbon atoms, an alkoxy group having 1 to 12 carbon atoms, an aromatic group having 6 to 30 carbon atoms, and a siloxane bond. It is arbitrarily selected from a group having or a group having a metalloxane bond.
- R 2 is arbitrarily selected from a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, or a group having a metalloxane bond.
- R 1 , R 2 and R 3 When a plurality of R 1 , R 2 and R 3 are present, they may be the same or different.
- M is Al, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge, Zr, Nb, Mo, Ru, Rh, Pd, Ag, In, Sn, Sb, Hf, Ta,
- a metal atom selected from the group consisting of W, Re, Os, Ir, Pt, Au, Tl and Bi is shown.
- m is an integer indicating the valence of the metal atom M
- a is an integer of 1 to (m ⁇ 2).
- Examples of the organic group represented by R 1 include a hydroxy group, an alkyl group having 1 to 12 carbon atoms, an alicyclic alkyl group having 5 to 12 carbon atoms, an alkoxy group having 1 to 12 carbon atoms, and an aromatic group having 6 to 30 carbon atoms. It is preferably a group, a (R 3 3 SiO—) group, a group having a siloxane bond or a group having a metalloxane bond.
- alkyl group having 1 to 12 carbon atoms examples include methyl group, ethyl group, propyl group, isopropyl group, butyl group, isobutyl group, s-butyl group, t-butyl group, pentyl group, hexyl group, heptyl group, octyl group 2-ethylhexyl group, nonyl group, decyl group and the like.
- Examples of the alicyclic alkyl group having 5 to 12 carbon atoms include cyclopentyl group, cyclohexyl group, cycloheptyl group, cyclooctyl group, cyclononyl group, and cyclodecyl group.
- alkoxy group having 1 to 12 carbon atoms examples include methoxy group, ethoxy group, propoxy group, isopropoxy group, butoxy group, isobutoxy group, s-butoxy group, t-butoxy group, pentoxy group, hexyloxy group, heptoxy group, octoxy group Group, 2-ethylhexyloxy group, nonyl group, decyloxy group and the like.
- Examples of the aromatic group having 6 to 30 carbon atoms include a phenyl group, a phenoxy group, a benzyl group, a phenylethyl group, and a naphthyl group.
- the group having a siloxane bond refers to bonding with other Si.
- the group having a metalloxane bond refers to bonding with other M.
- the polymetalloxane of the present invention has a structural unit represented by the general formula (1) as a repeating unit. Since the polymetalloxane having the structural unit represented by the general formula (1) has a (R 3 3 SiO—) group, compatibility with other components is significantly improved. Therefore, the polymetalloxane exists stably in the organic solvent.
- the polymetalloxane having the structural unit represented by the general formula (1) has an (R 3 3 SiO—) group, the condensation stress of the polymetalloxane due to heating in the step of forming a cured film, which will be described later. To ease. Therefore, by using the polymetalloxane, it is possible to obtain a uniform cured film in which cracks are unlikely to occur.
- (R 3 3 SiO—) group includes trihydroxysiloxy group, trimethylsiloxy group, triethylsiloxy group, tripropylsiloxy group, triisopropylsiloxy group, tributylsiloxy group, triisobutylsiloxy group, tri-s-butylsiloxy group , Tri-t-butylsiloxy group, tricyclohexylsiloxy group, trimethoxysiloxy group, triethoxysiloxy group, tripropoxysiloxy group, triisopropoxysiloxy group, tributoxysiloxy group, triphenylsiloxy group, hydroxydiphenylsiloxy group, Methyldiphenylsiloxy group, ethyldiphenylsiloxy group, propyldiphenylsiloxy group, dihydroxy (phenyl) siloxy group, dimethyl (phenyl) siloxy group, diethyl (phenyl) siloxy group,
- R 3 is preferably an alkyl group having 1 to 4 carbon atoms or a phenyl group.
- the alkyl group having 1 to 4 carbon atoms include methyl group, ethyl group, propyl group, isopropyl group, butyl group, isobutyl group, and t-butyl group.
- preferred (R 3 3 SiO—) groups include trimethylsiloxy group, triethylsiloxy group, tripropylsiloxy group, triisopropylsiloxy group, tributylsiloxy group, triisobutylsiloxy group, tri-s-butylsiloxy group, tri -T-butylsiloxy group, methyldiphenylsiloxy group, ethyldiphenylsiloxy group, propyldiphenylsiloxy group, dihydroxy (phenyl) siloxy group, dimethyl (phenyl) siloxy group, diethyl (phenyl) siloxy group, dipropyl (phenyl) siloxy group, etc. Is mentioned.
- the content of (R 3 3 SiO—) group when expressed as a ratio of the number of moles of Si atoms to the number of moles of M atoms in the polymetalloxane, it may be 1 mol% or more and 250 mol% or less. Preferably, it is 10 mol% or more and 200 mol% or less.
- the polymetalloxane further improves the compatibility with other components. Therefore, it is preferable that at least one of R 1 in the polymetalloxane which exists in the organic solvent particularly stably in the organic solvent is a hydroxy group. Since the polymetalloxane having the structural unit represented by the general formula (1) has a hydroxy group, it can be a polymetalloxane having a small increase in viscosity even during long-term storage and excellent in storage stability. .
- the polymetalloxane has the structural unit represented by the general formula (1)
- a cured film mainly composed of a resin having a metal atom having a high electron density in the main chain can be obtained. Therefore, the density of metal atoms in the cured film can be increased, and a high refractive index can be easily obtained.
- the polymetalloxane has a structural unit represented by the general formula (1), a dielectric having no free electrons is obtained, so that high transparency and heat resistance can be obtained.
- M is preferably a metal atom selected from the group consisting of Al, Ti, Zr and Sn.
- a polymetalloxane having a high refractive index can be obtained. More preferably, it is Ti or Zr.
- m is preferably 3 or more and 5 or less.
- the weight average molecular weight of the polymetalloxane is preferably 500 or more as a lower limit, more preferably 1000 or more, and preferably 10,000 or more. Further preferred.
- the upper limit is preferably 1000000 or less, more preferably 500000 or less, and further preferably 200000 or less.
- the weight average molecular weight in the present invention refers to a value in terms of polystyrene measured by gel permeation chromatography (GPC).
- the weight average molecular weight of the polymetalloxane can be determined, for example, by the following method.
- a polymetalloxane is dissolved in a developing solvent so as to be 0.2 wt% to obtain a sample solution.
- the sample solution is injected into a column filled with a porous gel and a developing solvent.
- the weight average molecular weight is determined.
- a developing solvent N-methyl-2-pyrrolidone in which lithium chloride is dissolved is preferably used.
- Method for producing polymetalloxane Although there is no restriction
- R 4 is optionally selected from a hydroxy group, an alkyl group having 1 to 12 carbon atoms, an alicyclic alkyl group having 5 to 12 carbon atoms, an alkoxy group having 1 to 12 carbon atoms, or an aromatic group having 6 to 30 carbon atoms.
- R 5 is arbitrarily selected from a hydrogen atom or an alkyl group having 1 to 12 carbon atoms. When a plurality of R 4 and R 5 are present, they may be the same or different.
- M is Al, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge, Zr, Nb, Mo, Ru, Rh, Pd, Ag, In, Sn, Sb, Hf, Ta,
- a metal atom selected from the group consisting of W, Re, Os, Ir, Pt, Au, Tl and Bi is shown.
- m is an integer indicating the valence of the metal atom M
- n is an integer of 1 to (m ⁇ 1).
- the compound represented by the general formula (2) it is preferable to synthesize the compound represented by the general formula (2) by subjecting the compound to hydrolysis as necessary, followed by partial condensation and polymerization.
- the partial condensation means that not all the M-OH of the hydrolyzate is condensed, but that some M-OH remains in the resulting polymetalloxane. In general condensation conditions described later, it is general that M-OH partially remains. The amount of M-OH remaining is not limited.
- the alkoxy group can be selectively hydrolyzed by adding water. it can.
- the obtained hydrolyzate can obtain a transparent and uniform solution without aggregation in the solution due to steric hindrance of the siloxy group. For this reason, compared with the conventional technique, a hydrolysis rate can be made high. Therefore, by hydrolyzing and polycondensing the compound represented by the general formula (2), a high molecular weight polymetalloxane, particularly a polymetalloxane having a weight average molecular weight exceeding 10,000 can be obtained.
- the metal atom M is Ti
- the compound represented by the general formula (2) is preferably a compound represented by the following general formula (3).
- R 6 is the same as R 4 in the general formula (1), and R 7 is an alkyl group having 1 to 12 carbon atoms.
- m is an integer indicating the valence of the metal atom M
- x is an integer from 1 to (m ⁇ 1)
- y is an integer from 1 to (m ⁇ 1)
- x + y ⁇ m is an integer from 1 to (m ⁇ 1)
- y is preferably an integer of 2 to (m ⁇ 1).
- a compound having a hydroxy group aggregates due to a hydrogen bond of the hydroxy group and becomes insoluble in an organic solvent.
- the metal compound represented by the general formula (3) has a siloxy group, so that Because of the obstacle, a transparent and uniform solution can be obtained without agglomeration in the organic solvent.
- the hydroxy group can cause dehydration condensation, a high molecular weight polymetalloxane can be obtained by polycondensation of the metal compound represented by the general formula (3).
- the heat resistance of a siloxy group is high, it can be set as the high molecular weight polymetalloxane which is excellent in transparency.
- y 2 Methoxydihydroxy (trimethylsiloxy) titanium, ethoxydihydroxy (trimethylsiloxy) titanium, propoxydihydroxy (trimethylsiloxy) titanium, isopropoxydihydroxy (trimethylsiloxy) titanium, butoxydihydroxy (trimethylsiloxy) titanium, isobutoxydihydroxy (trimethylsiloxy) titanium, s-butoxydihydroxy (trimethylsiloxy) titanium, t-butoxydihydroxy (trimethylsiloxy) titanium, cyclohexoxydihydroxy (trimethylsiloxy) titanium, phenoxydihydroxy (trimethylsiloxy) titanium; Methoxydihydroxy (triethylsiloxy) titanium, ethoxydihydroxy (triethylsiloxy) titanium, propoxydihydroxy (triethylsiloxy) titanium, isopropoxydihydroxy (triethylsiloxy)
- y 2 Methoxydihydroxy (trimethylsiloxy) zirconium, ethoxydihydroxy (trimethylsiloxy) zirconium, propoxydihydroxy (trimethylsiloxy) zirconium, isopropoxydihydroxy (trimethylsiloxy) zirconium, butoxydihydroxy (trimethylsiloxy) zirconium, isobutoxydihydroxy (trimethylsiloxy) zirconium, s-butoxydihydroxy (trimethylsiloxy) zirconium, t-butoxydihydroxy (trimethylsiloxy) zirconium, cyclohexoxydihydroxy (trimethylsiloxy) zirconium, phenoxydihydroxy (trimethylsiloxy) zirconium; Methoxydihydroxy (triethylsiloxy) zirconium, ethoxydihydroxy (triethylsiloxy) zirconium, propoxydihydroxy (triethy
- the method for producing the compound represented by the general formula (2) is not particularly limited.
- R 5 is an alkyl group having 1 to 12 carbon atoms
- a metal alkoxide and the following general formula (4) are represented.
- the compound can be obtained by reacting at a predetermined molar ratio so that a compound of n is 1, 2 or 3.
- R 8 is the same as R 4 in the general formula (2).
- Specific examples of the compound represented by the general formula (4) include trimethylsilanol, triethylsilanol, tripropylsilanol, triisopropylsilanol, tributylsilanol, triisobutylsilanol, tri-s-butylsilanol, tri-t-butylsilanol.
- the metal alkoxide is not particularly limited.
- the metal atom M is Ti, tetramethoxy titanium, tetraethoxy titanium, tetrapropoxy titanium, tetraisopropoxy titanium, tetrabutoxy titanium, tetra-s-butoxy titanium.
- M is Zr
- the metal alkoxide represented by the general formula (2) obtained by the above-described method is hydrolyzed.
- a general method can be used for the hydrolysis. For example, a method of adding a solvent, water and, if necessary, a catalyst to the metal alkoxide represented by the general formula (2) and stirring at ⁇ 20 to 60 ° C. for about 0.1 to 100 hours can be mentioned. If necessary, hydrolysis by-products (alcohols such as methanol) may be distilled off by distillation under reduced pressure.
- the reaction solvent is not particularly limited, but compounds having an alcoholic hydroxyl group, esters, ethers, and ketones are preferably used.
- the alcohol solvent include methanol, ethanol, propanol, isopropanol, butanol, isobutanol, t-butanol, acetonitrile, 3-hydroxy-3-methyl-2-butanone, 5-hydroxy-2-pentanone, 4-hydroxy-4-methyl-2-pentanone (diacetone alcohol), ethyl lactate, butyl lactate, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monopropyl ether, propylene glycol monobutyl ether, propylene glycol mono-t -Butyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, dipropylene glycol monomethyl ether, 3-methoxy-1-butano Le, 3-methyl-3-methoxy-1-but
- Esters include ethyl acetate, propyl acetate, isopropyl acetate, butyl acetate, isobutyl acetate, propylene glycol monomethyl ether acetate, 3-methoxy-1-butyl acetate, 3-methyl-3-methoxy-1-butyl acetate, ethyl acetoacetate And cyclohexanol acetate.
- ethers include diethyl ether, diisopropyl ether, dibutyl ether, diphenyl ether, diethylene glycol ethyl methyl ether, diethylene glycol dimethyl ether, 1,2-diethoxyethane, and dipropylene glycol dimethyl ether.
- ketone solvent examples include methyl isobutyl ketone, diisopropyl ketone, diisobutyl ketone, acetylacetone, cyclopentanone, cyclohexanone, cycloheptanone and the like.
- solvents that can be preferably used include propylene carbonate and N-methylpyrrolidone.
- the amount of the hydroxy group of the metal compound represented by the general formula (3) can be adjusted.
- the metal compound by which all the alkoxy groups were hydrolyzed can be obtained by adding 1 mol of water with respect to 1 mol of alkoxy groups which are hydrolysable groups.
- the amount of water added is preferably 0.1 to 2 mol with respect to the alkoxy group.
- An acidic catalyst or a basic catalyst is used preferably.
- Specific examples of the acid catalyst include hydrochloric acid, nitric acid, sulfuric acid, hydrofluoric acid, phosphoric acid, acetic acid, trifluoroacetic acid, formic acid, polyvalent carboxylic acid or anhydride thereof, and ion exchange resin.
- the base catalyst include triethylamine, tripropylamine, tributylamine, tripentylamine, trihexylamine, triheptylamine, trioctylamine, diethylamine, dipropylamine, dibutylamine, diisobutylamine, dipentylamine, dihexylamine.
- the addition amount of the catalyst is preferably 0.01 to 30 parts by weight with respect to 100 parts by weight of the siloxy group-containing compound represented by the general formula (2).
- a general method can be used for hydrolysis, partial condensation and polymerization of the compound represented by the general formula (2).
- the reaction conditions for the hydrolysis are preferably that water is added to the compound represented by the general formula (2) in a solvent over 1 to 180 minutes, and then the reaction is performed at room temperature to 110 ° C. for 1 to 180 minutes. By performing the hydrolysis reaction under such conditions, a rapid reaction can be suppressed.
- the reaction temperature is preferably 30 to 150 ° C.
- a hydrolyzate is obtained by hydrolysis reaction of the compound represented by the general formula (2), and then the reaction solution is heated as it is at 50 ° C. to 180 ° C. for 1 to 100 hours. Is preferred. Moreover, in order to raise the polymerization degree of polymetalloxane, you may add reheating or a catalyst. In addition, after the hydrolysis reaction, an appropriate amount of the produced alcohol or the like may be distilled and removed by heating and / or decompression as necessary, and an optional solvent may be added thereafter.
- the solvent is not particularly limited, but compounds having an alcoholic hydroxyl group, esters, ethers, and ketones are preferably used. When these solvents are used, the stability of the polymetalloxane can be improved and the transparency of the resulting coating film can be improved.
- the alcohol solvent include methanol, ethanol, n-propanol, isopropanol, n-butanol, isobutanol, t-butanol, acetol, 3-hydroxy-3-methyl-2-butanone, 5-hydroxy-2- Pentanone, 4-hydroxy-4-methyl-2-pentanone (diacetone alcohol), ethyl lactate, butyl lactate, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol mono n-propyl ether, propylene glycol mono n-butyl ether , Propylene glycol mono t-butyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, dipropylene glycol monomethyl ether, 3-methoate Shi-1-butanol, 3-methyl-3-methoxy-1-butanol, ethylene glycol, propylene glycol, and the like.
- Esters include ethyl acetate, n-propyl acetate, isopropyl acetate, n-butyl acetate, isobutyl acetate, propylene glycol monomethyl ether acetate, 3-methoxy-1-butyl acetate, 3-methyl-3-methoxy-1-butyl acetate , Ethyl acetoacetate, cyclohexanol acetate and the like.
- ethers include diethyl ether, diisopropyl ether, di n-butyl ether, diphenyl ether, diethylene glycol ethyl methyl ether, diethylene glycol dimethyl ether, 1,2-dimethoxyethane, 1,2-diethoxyethane, and dipropylene glycol dimethyl ether.
- ketone solvent examples include methyl isobutyl ketone, diisopropyl ketone, diisobutyl ketone, acetylacetone, cyclopentanone, cyclohexanone, cycloheptanone and the like.
- solvents that can be preferably used include propylene carbonate, N-methylpyrrolidone and the like.
- the hydrolysis rate of the compound represented by the general formula (2) can be adjusted by adjusting the amount of water used for the hydrolysis reaction.
- the amount of water added is preferably 0.1 to 2 moles per mole of alkoxy groups.
- An acidic catalyst or a basic catalyst is used preferably.
- Specific examples of the acid catalyst include hydrochloric acid, nitric acid, sulfuric acid, hydrofluoric acid, phosphoric acid, acetic acid, trifluoroacetic acid, formic acid, polyvalent carboxylic acid or anhydride thereof, and ion exchange resin.
- the base catalyst include triethylamine, tripropylamine, tributylamine, tripentylamine, trihexylamine, triheptylamine, trioctylamine, diethylamine, dipropylamine, dibutylamine, diisobutylamine, dipentylamine, dihexylamine.
- Diheptylamine, dioctylamine triethanolamine, diethanolamine, dicyclohexylamine, dicyclohexylmethylamine, sodium hydroxide, potassium hydroxide, alkoxysilane having an amino group, and ion exchange resin.
- a more preferred catalyst is a base catalyst.
- a base catalyst By using a base catalyst, a particularly high molecular weight polymetalloxane can be obtained.
- base catalysts tripropylamine, triisobutylamine, tripentylamine, triisopentylamine, trihexylamine, triheptylamine, trioctylamine, dibutylamine, diisobutylamine, dipentylamine, dihexylamine, diheptylamine, Dioctylamine is particularly preferred.
- the catalyst is not contained in the polymetalloxane solution after hydrolysis, partial condensation and polymerization, and the catalyst can be removed as necessary.
- the removal method is not particularly limited, but water washing and / or ion exchange resin treatment is preferable from the viewpoint of easy operation and removability.
- the water washing is a method of concentrating an organic layer obtained by diluting a polymetalloxane solution with an appropriate hydrophobic solvent and then washing several times with water with an evaporator or the like.
- the treatment with an ion exchange resin is a method of bringing a polysiloxane solution into contact with an appropriate ion exchange resin.
- composition of polymetalloxane The polymetalloxane of the present invention can be mixed with a solvent and other necessary components to form a composition.
- the polymetalloxane of the present invention is preferably diluted with a solvent to adjust the solid content concentration.
- a solvent to adjust the solid content concentration.
- the solid content concentration of the solution containing polymetalloxane is preferably 0.1 to 50 wt%. By setting the solid content concentration within this range, the film thickness of the coating film can be controlled well.
- Other components may be added when adjusting the solid content of the polymetalloxane solution.
- examples of other components include inorganic particles, surfactants, silane coupling agents, crosslinking agents, and crosslinking accelerators.
- the inorganic particles are preferably used for improving the refractive index of the cured film.
- the inorganic particles are (b1) one or more particles selected from aluminum compound particles, tin compound particles, titanium compound particles and zirconium compound particles, or (b2) one or more particles selected from aluminum compounds, tin compounds, titanium compounds and zirconium compounds.
- a composite particle of a metal compound and a silicon compound is preferable.
- these particles are collectively referred to as “metal compound particles”.
- the refractive index can be further improved by adding these particles.
- the average particle diameter of the metal compound particles is preferably 1 nm to 400 nm.
- the thickness is 1 nm or more, generation of cracks during thick film formation can be further suppressed, and the thickness is more preferably 5 nm or more.
- a refractive index can be improved without reducing the transparency with respect to visible light of a cured film by being 400 nm or less, and it is more preferable that it is 70 nm or less.
- metal compound particles examples include tin oxide-titanium oxide composite particles “OPTRAIK TR-502” and “OPTRAIK TR-504”, silicon oxide-titanium oxide composite particles “OPTRAIK TR-503”, “Opto” Lake TR-513, OPTRAK TR-520, OPTRAK TR-527, OPTRAK TR-528, OPTRAK TR-529, OPTRAK TR-543, OPTRAK TR -544 "," Optlake TR-550 ",” Oplake TR-505 "of titanium oxide particles (trade name, manufactured by Catalyst Kasei Kogyo Co., Ltd.), NOD-7771GTB (trade name, Nagase ChemteX Corporation) ), Zirconium oxide particles (manufactured by Kojundo Chemical Laboratory Co., Ltd.), tin oxide-zirconium oxide composite particles (catalyst chemical industry) Co., Ltd.), tin oxide particles (manufactured by Kojundo Chemical Laboratories Co
- the surfactant is preferably used for improving the flowability at the time of application.
- the surfactant may remain in the cured film.
- the type of the surfactant for example, “Megafac (registered trademark)” F142D, F172, F173, F183, F444, F445, F470, F475, F477 (above, DIC) Fluorine-based surfactants such as BYX-333, BYK-301, BYK-331, BYK-345, BYK-, and the like, NBX-15, FTX-218, DFX-18 (manufactured by Neos) Silicone surfactants such as 307 (manufactured by Big Chemie Japan Co., Ltd.), polyalkylene oxide surfactants, poly (meth) acrylate surfactants, and the like can be used. Two or more of these may be used.
- the addition amount of the surfactant is preferably 0.001 to 10 parts by weight, more preferably 0.01 to 1 part by weight with respect to 100 parts by weight of the polymetalloxane.
- the silane coupling agent is preferably used for improving the adhesion to the substrate.
- the silane coupling agent is not particularly limited, and examples thereof include vinyltrimethoxysilane, vinyltriethoxysilane, 2- (3,4 epoxy cyclohexyl) ethyltrimethoxysilane, 3-glycidoxypropyltrimethoxysilane, and 3-methacryloxy.
- the addition amount of the silane coupling agent is preferably 0.1 to 50 parts by weight, and more preferably 1 to 20 parts by weight with respect to 100 parts by weight of the polymetalloxane.
- crosslinking agent and the crosslinking accelerator are preferably used for improving the chemical resistance of the cured film.
- type of crosslinking agent and crosslinking accelerator include mono-s-butoxyaluminum diisopropylate, aluminum-s-butyrate, ethylacetoacetate aluminum diisopropylate, aluminum tris (ethyl acetate), alkylacetoaluminum.
- Diisopropylate aluminum monoacetylacetonate bis (ethyl acetoacetate), aluminum tris (acetylacetonate), zirconium tris (acetylacetate), zirconium tris (ethylacetoacetate), titanium tris (acetylacetate), titanium tris (ethyl) Acetoacetate) and the like can be used.
- the total content of the crosslinking agent and the crosslinking accelerator is preferably from 0.1 to 50 parts by weight, more preferably from 1 to 20 parts by weight, based on 100 parts by weight of the polymetalloxane.
- the cross-linking agent and the cross-linking accelerator may be used alone or in combination.
- the substrate there are no particular restrictions on the substrate, but examples include silicon wafers, sapphire wafers, glass, and optical films.
- the glass include alkali glass, non-alkali glass, heat tempered glass, and chemically tempered glass.
- the optical film include films made of acrylic resin, polyester resin, polycarbonate, polyarylate, polyethersulfone, polypropylene, polyethylene, polyimide, or cycloolefin polymer.
- the polymetalloxane of the present invention or the composition containing the same can be made into a cured film by heating.
- the cured film thus obtained becomes a cured film mainly composed of a resin having a metal atom having a high electron density in the main chain, so that the density of metal atoms in the cured film can be increased easily A high refractive index can be obtained. Further, since the dielectric does not have free electrons, high transparency and heat resistance can be obtained.
- a known method can be used as a coating method of the solution containing polymetalloxane.
- the device used for coating include spin coating, dip coating, curtain flow coating, spray coating, slit coating, and other full surface coating devices, and screen printing, roll coating, micro gravure coating, and inkjet printing devices.
- heating may be performed using a heating device such as a hot plate or an oven.
- Pre-baking is preferably performed at a temperature range of 50 to 150 ° C. for 30 seconds to 30 minutes to form a pre-baked film.
- the film thickness after pre-baking is preferably 0.1 to 15 ⁇ m.
- a cured film containing polymetalloxane is prepared by heating (curing) the coating film or the pre-baked film in a temperature range of 150 ° C. to 450 ° C. for about 30 seconds to 2 hours using a heating device such as a hot plate or an oven. Obtainable.
- the thickness of the cured film is preferably 0.1 to 15 ⁇ m.
- the obtained cured film preferably has a refractive index of 1.58 or more and 2.20 or less at a wavelength of 550 nm, and more preferably 1.65 or more and 2.10 or less.
- the refractive index of the cured film can be measured by the following method. Using a spectroscopic ellipsometer, the change in the polarization state of the reflected light from the cured film and the substrate is measured, and the phase difference from the incident light and the spectrum of the amplitude reflectance are obtained. A refractive index spectrum is obtained by fitting the dielectric function of the calculation model so as to approach the obtained spectrum. By reading the refractive index value at a wavelength of 550 nm from the obtained refractive index spectrum, the refractive index of the cured film can be obtained.
- the obtained cured film preferably has a light transmittance of 90% or more per 1 ⁇ m thickness at a wavelength of 400 nm.
- the light transmittance can be measured by the following method as long as it is prepared on a transparent substrate. First, an ultraviolet-visible absorption spectrum of a substrate is measured using a spectrophotometer, and this is used as a reference. Next, the UV-visible absorption spectrum of the cured film prepared on the transparent substrate is measured, and the UV-visible absorption spectrum of the cured film is calculated based on the difference from the reference. Using the obtained UV-visible absorption spectrum and the thickness of the cured film, the light transmittance per 1 ⁇ m of film thickness at a wavelength of 400 nm of the microphone lens is calculated.
- the light transmittance of a cured film formed on an opaque substrate such as a silicon wafer can be measured by the following method. Using a spectroscopic ellipsometer, the change in the polarization state of the reflected light from the cured film and the substrate is measured, and the phase difference from the incident light and the spectrum of the amplitude reflectance are obtained. An extinction coefficient spectrum is obtained by fitting the dielectric function of the calculation model so as to approach the obtained spectrum.
- a light transmittance (%) in terms of a film thickness of 1 ⁇ m at a wavelength of 400 nm is obtained by using the following formula:
- Light transmittance exp ( ⁇ 4 ⁇ kt / ⁇ )
- k represents an extinction coefficient
- t represents a converted film thickness ( ⁇ m)
- ⁇ represents a measurement wavelength (nm).
- t is 1 ( ⁇ m).
- the above-mentioned cured film is excellent in refractive index and transparency, it is suitably used for electronic parts such as a solid-state imaging device, an optical filter, and a display. More specifically, a condensing microlens or optical waveguide formed on a solid-state imaging device such as a back-illuminated CMOS image sensor, an antireflection film installed as an optical filter, a planarizing material for a TFT substrate for display, Examples thereof include color filters such as liquid crystal displays, protective films thereof, phase shifters, and the like.
- the cured film obtained from the polymetalloxane of the present invention or a composition thereof can be used suitably for a touch sensor member used for a smartphone or a tablet terminal because it can achieve both high transparency and a high refractive index. More specifically, an insulating layer thin film formed on the top or bottom of the transparent conductive film used for sensor formation can be mentioned.
- ITO Indium Tin Oxide
- a technology for suppressing the visibility of transparent electrode patterns a technology has been developed to reduce interfacial reflection and suppress the visibility of transparent electrode patterns by forming an insulating layer thin film above or below the transparent electrode. (For example, JP-A-1-205122, JP-A-6-033000, JP-A-8-240800).
- insulating layer thin film since the refractive index of a transparent electrode pattern is high, a high refractive index and transparency are required.
- a technique for reducing the visibility of the transparent electrode pattern a technique in which a thin film of Nb 2 O 3 and SiO 2 is provided as an undercoat layer or a topcoat layer has been developed (for example, Japanese Patent Application Laid-Open No. 2010-152809 and Japanese Patent Application Laid-Open No. 2010-152809). 2010-086684). Furthermore, a technique for forming an organic thin film having a refractive index of 1.58 to 1.85 and a silicon oxide thin film has been developed for the purpose of low cost and process saving (for example, WO2014 / 119372).
- This technology uses an organic composition containing titanium oxide particles having a high refractive index alone, titanium oxide fine particles such as barium titanate particles, or zirconium oxide particles such as zirconium oxide particles, and a desired refractive index. It is what controls the range. Alternatively, a substituent having a high refractive index is introduced into the organic component to control the refractive index within a desired range.
- the refractive index can be easily controlled by using the cured film obtained from the polymetalloxane of the present invention or a composition thereof, a substrate with greatly reduced visibility of the transparent conductive film pattern can be easily and inexpensively produced. Can be provided.
- the touch sensor is formed by laminating thin films in the order of the transparent conductive thin film (I) and the cured film (II) obtained from the polymetalloxane of the present invention or a composition thereof from the upper surface of the transparent base material.
- the reflected light at the upper interface and lower interface of the transparent conductive thin film (I) formed in the lower layer can be weakened, and the pattern visibility of the transparent conductive thin film can be reduced.
- the transparent conductive film is protected with the thin film, durability of a touch sensor can be improved.
- a member having a portion where thin films are laminated in the order of a transparent conductive thin film (I) and a cured film (II) obtained from the polymetalloxane of the present invention or a composition thereof will be described in detail.
- the material for the transparent base material is not particularly limited as long as it has a function of transmitting light, but the total line transmittance per 0.1 mm thickness (conforming to JIS K 7361-1: 1997) is 80% or more.
- a thing is preferable for example, glass and an optical film are mentioned. From the viewpoint of heat resistance and chemical resistance, glass is more preferable.
- the glass include alkali glass, non-alkali glass, heat tempered glass, and chemically tempered glass, but heat tempered glass or chemically tempered glass widely used as a cover glass for touch panels is preferable.
- optical film examples include acrylic resin, polyester resin, polycarbonate, polyarylate, polyethersulfone, polypropylene, polyethylene, polyimide, and cycloolefin polymer.
- acrylic resin, polyester resin, polycarbonate or cycloolefin polymer is preferable from the viewpoint of transparency.
- acrylic resin polymethyl methacrylate is preferable.
- polyester resin polyethylene terephthalate, polyethylene naphthalate or polybutylene terephthalate is preferable.
- polycarbonate a resin obtained by polycondensation of bisphenol A and phosgene is preferable.
- a resin having an aliphatic carboxylic dianhydride and / or an aliphatic diamine as a monomer is preferable from the viewpoint of transparency.
- the cycloolefin polymer for example, those obtained by addition polymerization or ring-opening metathesis polymerization of cyclohexene, norbornene, or derivatives thereof are preferable.
- an ITO thin film is the most common. In the present application, an ITO thin film will be described as an example, but the present invention is not limited to this.
- a method of forming the transparent conductive thin film a sputtering method is preferable because a thin film having low resistance can be easily obtained and precise film thickness control is possible.
- the film thickness of the transparent conductive thin film (I) is preferably 1 to 200 nm.
- the film thickness and refractive index of the cured film (II) obtained from the polymetalloxane of the present invention or a composition thereof laminated on the upper surface of the transparent conductive thin film (I) are 0.01 to 3 ⁇ m and 1.58 to 1 respectively. .95 is preferred.
- the phase and intensity of reflected light at the upper interface and lower interface of the thin film (II) containing the composition can be controlled, and the upper interface and lower interface of the transparent conductive thin film (I) as described above. It is possible to weaken the reflected light on the surface and reduce the pattern visibility of the transparent conductive thin film.
- the phase can be controlled and the effect of reducing the pattern visibility can be made sufficient.
- the refractive index of the thin film (II) containing the composition in this range, the intensity of the reflected light can be controlled and the effect of reducing the pattern visibility can be made sufficient. More preferably, the film thickness and the refractive index are 0.1 to 2.5 ⁇ m and 1.65 to 1.95, respectively, particularly preferably 0.15 to 2 ⁇ m and 1.80. To 1.95.
- a silicon oxide thin film (III) and / or a transparent adhesive thin film (IV) having a refractive index of 1.46 to 1.53 is formed on the upper surface of the cured film (II) obtained from the polymetalloxane of the invention or a composition thereof. It is preferable to have a portion where is laminated.
- the intensity of the reflected light at the lower interface (that is, the reflected light at the upper interface of the cured film (II) obtained from the polymetalloxane or the composition thereof) can be controlled. Moreover, since the base metal including the transparent conductive thin film (I) can be protected at the same time, the reliability of the touch sensor can be improved in the touch sensor application.
- the film thickness of the silicon oxide thin film (III) is preferably 0.01 to 10 ⁇ m. If the thickness is less than 0.01 ⁇ m, the reflected light from the upper interface affects the pattern visibility, and it is difficult to obtain the effect of reducing the pattern visibility. If it exceeds 10 ⁇ m, cracks are likely to occur with slight distortion, and the reliability and appearance of the touch panel are impaired.
- a dry process method such as a sputtering method, a vacuum deposition method (electron beam method), an ion plating method (IP method) or a CVD (Chemical Vapor Deposition) method, or SOG ( There is a wet process method such as Spin on Glass.
- the CVD method is preferable because a thin film with few defects can be formed at a relatively low temperature.
- the transparent adhesive thin film (IV) refers to a thin film formed with a transparent adhesive.
- the transparent adhesive refers to a material that transmits light and has adhesiveness.
- the film thickness of the transparent adhesive thin film (IV) is preferably 1 to 200 ⁇ m from the viewpoint of adhesiveness and transparency.
- the adhesive strength of the transparent adhesive is preferably 3 to 100 N / 20 mm. Further, the transmittance of the transparent adhesive is preferably 90% or more in terms of the total line transmittance (JIS K 7361-1: 1997) from the viewpoint of the appearance of the touch sensor.
- the transparent adhesive examples include a thermosetting adhesive and a UV curable adhesive.
- the thermosetting transparent adhesive having a refractive index of 1.46 to 1.52 include an alkyl (meth) acrylate having 1 to 20 carbon atoms, a (meth) acrylate containing a hydroxyl group, and / or a carboxyl group.
- examples thereof include a copolymer having a (meth) acrylic acid derivative as a constituent monomer, or a thermosetting pressure-sensitive adhesive containing a polyfunctional isocyanate compound and / or a polyfunctional epoxy compound.
- UV curable transparent adhesive having a refractive index of 1.46 to 1.52 examples include, as a main component, a monofunctional or polyfunctional (meth) acrylate monomer and / or oligomer, and a photopolymerization initiator, A UV curable pressure sensitive adhesive may be mentioned.
- OCA Optical Cler Adhesive
- OCR Optical Cler Adhesive Resin
- UV curable type used for bonding various substrates together.
- the common name of the pressure-sensitive adhesive can be used.
- a transparent adhesive thin film (IV) formed from the above transparent adhesives the adhesive which commercial multifunctional films, such as a scattering prevention film, comprise can be used.
- Examples of commercially available OCA materials that can form the transparent adhesive thin film (IV) include 8171CL, 8172CL, 8146-1 or 8146-2 (all manufactured by Sumitomo 3M Limited), CS9622T, CS9621T, or CS9070. (All manufactured by Nitto Denko Corporation), TE-9000, TE-7000, TE-8500 or DA-5000H (Hitachi Chemical Co., Ltd.) or MO-3010 or MO-T010 (all of which are Lintec Corporation) )).
- Examples of commercially available OCR materials that can form a transparent adhesive thin film (IV) include XV-SV-B1 or XV-7811 (both manufactured by Panasonic Corporation), UVP-1003, UVP-1100, UVP-7100 or UVP-7000 (both manufactured by Toagosei Co., Ltd.).
- Examples of commercially available multifunctional films with a transparent adhesive that can be made into a transparent adhesive thin film (IV) include, for example, HA-110, HA-115, HA-116, or HA-, which are widely used as anti-scattering films. 203 (all manufactured by Lintec Corporation) or HC1100F-BP or HC2120F-BP (all manufactured by DIC Corporation).
- a member having a portion where thin films are laminated in the order of a transparent conductive thin film (I) and a cured film (II) obtained from the polymetalloxane of the present invention or a composition thereof is suitably used for display applications.
- a resistive touch panel, a capacitive touch panel, and a TFT substrate can be used, but it is preferably used for a capacitive touch panel, and more preferably used for a cover glass integrated capacitive touch panel.
- the cured film obtained from the polymetalloxane of the present invention is excellent in refractive index and transparency, it is suitably used for lenses. More specifically, it can be suitably used for a condensing microlens formed in a solid-state imaging device such as a backside illumination type CMOS image sensor.
- the solid-state image sensor includes a large number of photoelectric conversion elements arranged in a matrix on a semiconductor substrate. In front of each photoelectric conversion element, microlenses that collect incident light on the photoelectric conversion element are arranged for each photoelectric conversion element.
- the microlens is required to have a high refractive index and transparency from the viewpoint of light collection efficiency.
- a method using dry etching As a manufacturing method of such a microlens, there is a method using dry etching. This method is as follows. A cured film of lens material is formed on the substrate. Next, a photoresist pattern is formed on the cured film in the same shape as the microlens. Then, both the photoresist and the cured film are dry-etched, and the photoresist pattern is transferred to the cured film to obtain a microlens.
- the cured film obtained from the polymetalloxane of the present invention is a dielectric that does not have free electrons, high transparency and heat resistance can be obtained. Moreover, it can be set as the cured film which mainly has a resin component, and the reactivity of the cured film at the time of dry etching and etching gas can be made substantially uniform over the whole film. Therefore, a smooth microlens without surface roughness can be obtained without causing a local difference in dry etching rate.
- the above-mentioned substrate is not particularly limited, and examples thereof include a silicon wafer, a sapphire wafer, glass, and an optical film.
- the glass include alkali glass, non-alkali glass, heat tempered glass, and chemically tempered glass.
- the optical film include films made of acrylic resin, polyester resin, polycarbonate, polyarylate, polyethersulfone, polypropylene, polyethylene, polyimide, or cycloolefin polymer.
- a method of forming a cured film containing polymetalloxane on the substrate a method of applying a solution containing polymetalloxane and forming a cured film by heating is preferable.
- the photoresist pattern is obtained by forming a photoresist layer on the cured film containing the polymetalloxane and patterning the photoresist layer by photolithography.
- the photoresist layer can be obtained by applying a commercially available photoresist.
- a known method can be used as the coating method.
- the device used for coating include spin coating, dip coating, curtain flow coating, spray coating, slit coating, and other full surface coating devices, and screen printing, roll coating, micro gravure coating, and inkjet printing devices.
- heating may be performed using a heating device such as a hot plate or an oven.
- Pre-baking is preferably performed at a temperature range of 50 to 150 ° C. for 30 seconds to 30 minutes to form a pre-baked film.
- the film thickness after pre-baking is preferably 0.1 to 15 ⁇ m.
- the patterning method of the photoresist layer by photolithography is not particularly limited, but a UV-visible exposure machine such as a stepper, a mirror projection mask aligner (MPA), a parallel light mask aligner (PLA), or the like is used to pass through a desired mask. It is preferable to obtain a pattern by pattern exposure and then developing using a known photoresist developer.
- a UV-visible exposure machine such as a stepper, a mirror projection mask aligner (MPA), a parallel light mask aligner (PLA), or the like is used to pass through a desired mask. It is preferable to obtain a pattern by pattern exposure and then developing using a known photoresist developer.
- a mask designed to obtain a dot-shaped or square-shaped photoresist pattern of 0.1 ⁇ m to 10 ⁇ m is preferably used as a mask used for pattern exposure.
- the photoresist pattern can be heat-melted as necessary. By thermally melting, the photoresist pattern can be made convex.
- the heat melting condition is not particularly limited, but it is preferable to heat at a temperature range of 50 ° C. to 300 ° C. for about 30 seconds to 2 hours using a heating device such as a hot plate or an oven.
- a microlens can be obtained by performing dry etching on the entire surface of the photoresist pattern and the cured film containing polymetalloxane.
- dry etching it is preferable to use a reactive ion etching apparatus (RiE apparatus) and use CHF 3 (methane trifluoride), CF 4 (tetrafluoromethane), oxygen, or a mixed gas thereof as a process gas.
- SiE apparatus reactive ion etching apparatus
- CHF 3 methane trifluoride
- CF 4 tetrafluoromethane
- oxygen or a mixed gas thereof as a process gas.
- the photoresist may be removed as necessary.
- the removal method is not particularly limited, and examples include ashing using oxygen as a process gas and a method of immersing in a commercially available resist stripping solution.
- the cured film obtained from the polymetalloxane of the present invention is suitably used for organic EL devices and organic EL lighting applications. More specifically, an insulating layer thin film formed above or below a transparent conductive film used for an organic EL element or organic EL lighting can be mentioned.
- organic EL is a new light source that emits light, and is expected to be applied to next-generation displays and lighting.
- the organic EL has a structure in which an organic layer such as a light emitting layer or a layer for controlling carrier injection and transport properties is provided between electrodes.
- the organic EL has a problem that the light extraction efficiency, that is, the efficiency with which the generated light comes out of the device is low. That is, since the refractive index of the organic layer and the refractive index of the transparent electrode are large, most of the light is propagated when propagating to a low refractive index substrate (n to 1.5) or air (n to 1.0). There is a problem that total reflection occurs at the interface and the extraction efficiency decreases.
- the phase and intensity of the reflected light at the upper interface and the stock interface of the cured film can be controlled.
- the reflection at the upper interface or the lower interface can be suppressed, and the light extraction efficiency can be greatly improved.
- the metalloxane of the present invention can be made into a metal oxide film by coating and curing, it can be used for building materials. More specifically, a flame retardant material and a hydrophilicity imparting material are mentioned. As a flame retardant, since the polymetalloxane of the present invention becomes a non-flammable layer, flame retardancy can be imparted by a combustion blocking effect. Moreover, since a highly hydrophilic film can be formed by coating the surface of the building material with the polymetalloxane of the present invention, an antifouling effect can be expected.
- the polymetalloxane of the present invention can be used for radionuclide generator applications. Specifically, it is a radionuclide generator including a column packed with the polymetalloxane of the present invention.
- radionuclides are used as radiodiagnostic agents and radiotherapeutic agents.
- the radionuclide 99m Tc (technetium- 99m , half-life 6.01 hours) is most frequently used as a radiodiagnostic agent.
- 99m Tc is produced by ⁇ decay of the parent nuclide 99 Mo (molybdenum-99, half-life 65.9 hours). That is, MoO 3 pellets containing 99 Mo produced by the fission method or the activation method are used as a sodium molybdate aqueous solution, and the aqueous solution is passed through a column filled with the adsorbent, thereby trapping Mo in the adsorbent. Of the captured Mo, only 98 Mo causes ⁇ decay and becomes 98 m Tc. By passing water through the column in this state, 98m Tc can be selectively taken out.
- the fission method in the production method of 99 Mo is a method in which 235 U (uranium- 235 ) in enriched uranium is irradiated with neutrons to cause a fission reaction, and 99 Mo is extracted through a complicated process.
- this method has a drawback that a large amount of radioactive waste can be produced.
- the activation method is a method in which 99 Mo is produced by irradiating 98 Mo (molybdenum-98) existing in nature with neutrons. This activation method has the advantage that no radioactive waste is produced, but there is a problem that the specific activity of 99 Mo produced is low. Therefore, there is a demand for adsorbents and columns with high adsorption capacity.
- An inorganic polymer zirconium chloride compound has been developed as an adsorbent with high adsorption performance.
- the chloro group at the end of the compound is hydrolyzed to produce hydrogen chloride. Since this hydrogen chloride becomes corrosive gas, there is a problem in safety. Therefore, an adsorbent with high adsorption performance that does not generate hydrogen chloride is required.
- the polymetalloxane of the present invention has a (R 3 3 SiO—) group and / or a hydroxy group at the terminal, this serves as an adsorption site for Mo. Therefore, like the inorganic polymer zirconium zirconium chloride, it has high adsorption performance, but does not generate corrosive gas such as hydrogen chloride, and therefore can be suitably used as an adsorbent with high adsorption performance and high safety.
- the column filled with the polymetalloxane of the present invention as a radionuclide generator, 98m Tc can be efficiently produced with high adsorption capacity, and thus the apparatus can be reduced in size and weight.
- FT-IR Fourier transform infrared spectroscopy
- titanium compound (T1) was analyzed by FT-IR, a Ti—O—Si absorption peak (958 cm ⁇ 1 ) was produced, and no silanol absorption (883 cm ⁇ 1 ) was present. It was confirmed that the titanium compound (T1) was tributoxy (trimethylsiloxy) titanium.
- titanium compound (T2) was analyzed by FT-IR, a Ti—O—Si absorption peak (958 cm ⁇ 1 ) was produced, and no silanol absorption (883 cm ⁇ 1 ) was present. It was confirmed that the titanium compound (T2) was triisopropoxy (trimethylsiloxy) titanium.
- titanium compound (T3) was analyzed by FT-IR, a Ti—O—Si absorption peak (958 cm ⁇ 1 ) was produced, and no silanol absorption (883 cm ⁇ 1 ) was present. It was confirmed that the titanium compound (T3) was tri-t-butoxy (trimethylsiloxy) titanium.
- titanium compound (T4) was analyzed by FT-IR, a Ti—O—Si absorption peak (958 cm ⁇ 1 ) was produced, and no silanol absorption (883 cm ⁇ 1 ) was present. It was confirmed that the titanium compound (T4) was tributoxy (triethylsiloxy) titanium.
- This titanium compound (T5) was analyzed by FT-IR, and it was confirmed that a Ti—O—Si absorption peak (958 cm ⁇ 1 ) was produced and that a silanol absorption peak (883 cm ⁇ 1 ) was not present. Further, since the absorption peak intensity of Ti—O—Si was twice that of the titanium compound (T1), it was confirmed that the obtained titanium compound (T5) was dibutoxybis (trimethylsiloxy) titanium. .
- This titanium compound (T6) was analyzed by FT-IR, and it was confirmed that a Ti—O—Si absorption peak (958 cm ⁇ 1 ) was produced and that a silanol absorption peak (883 cm ⁇ 1 ) did not exist. Further, since the absorption peak intensity of Ti—O—Si was three times that of the titanium compound (T1), it was confirmed that the obtained titanium compound (T6) was butoxytris (trimethylsiloxy) titanium). confirmed.
- zirconium compound (Z1) was analyzed by FT-IR, an absorption peak (968 cm ⁇ 1 ) of Zr—O—Si was generated, and no silanol absorption (883 cm ⁇ 1 ) was present. It was confirmed that the zirconium compound (Z1) was tributoxy (trimethylsiloxy) zirconium.
- Synthesis Example 8 Synthesis of Zirconium Compound (Z2) 32.8 g (0.1 mol) of tetrapropoxyzirconium was charged into a 500 ml three-necked flask, and the flask was immersed in an oil bath at 40 ° C. and stirred for 30 minutes. Thereafter, 9.0 g (0.1 mol) of trimethylsilanol was added over 1 hour using a dropping funnel, and the mixture was further stirred for 1 hour after the addition. The flask contents were transferred to a 200 ml eggplant type flask, and the produced propanol was distilled off under reduced pressure to obtain a colorless liquid zirconium compound (Z2).
- zirconium compound (Z2) was analyzed by FT-IR, an absorption peak (968 cm ⁇ 1 ) of Zr—O—Si was generated, and no silanol absorption (883 cm ⁇ 1 ) was present. It was confirmed that the zirconium compound (Z2) was tripropoxy (trimethylsiloxy) zirconium.
- Synthesis Example 9 Synthesis of Zirconium Compound (Z3)
- 38.4 g (0.1 mol) of tetrabutoxyzirconium was charged, and the flask was immersed in an oil bath at 40 ° C. and stirred for 30 minutes. Thereafter, 18.0 g (0.1 mol) of triethylsilanol was added over 1 hour using a dropping funnel, and the mixture was further stirred for 1 hour after the addition.
- the flask contents were transferred to a 200 ml eggplant type flask, and the butanol produced was distilled off under reduced pressure to obtain a colorless liquid zirconium compound (Z3).
- zirconium compound (Z3) was analyzed by FT-IR, an absorption peak (968 cm-1) of Zr-O-Si was produced, and no silanol absorption (883 cm-1) was present. It was confirmed that the zirconium compound (Z3) was tributoxy (triethylsiloxy) zirconium.
- Synthesis Example 10 Synthesis of Zirconium Compound (Z4) 38.4 g (0.1 mol) of tetrabutoxyzirconium was charged into a 500 ml three-necked flask, and the flask was immersed in a 40 ° C. oil bath and stirred for 30 minutes. Thereafter, 18.0 g (0.2 mol) of trimethylsilanol was added over 1 hour using a dropping funnel, followed by further stirring for 1 hour. The flask contents were transferred to a 200 ml eggplant type flask, and the butanol produced was distilled off under reduced pressure to obtain a colorless liquid zirconium compound (Z4).
- This zirconium compound (Z4) was analyzed by FT-IR, and it was confirmed that a Zr—O—Si absorption peak (968 cm ⁇ 1 ) was produced and a silanol absorption peak (883 cm ⁇ 1 ) was not present. In addition, since the absorption peak intensity of Zr—O—Si was doubled compared to the zirconium compound (Z3), it was confirmed that the obtained zirconium compound (Z4) was dibutoxybis (trimethylsiloxy) zirconium. .
- Titanium compound (T1-H1) solution In a three-necked flask with a volume of 500 ml, 35.6 g (0.1 mol) of titanium compound (T1) and propylene glycol monomethyl ether acetate (hereinafter abbreviated as PGMEA) as a solvent. was placed in an oil bath at 40 ° C. and stirred for 30 minutes. Thereafter, 1.8 g (0.1 mol) of water was filled in the dropping funnel for the purpose of hydrolysis, and added to the flask over 1 hour. During the addition of water, no precipitation occurred in the flask contents, and the solution was a uniform colorless transparent solution. The mixture was further stirred for 1 hour.
- PGMEA propylene glycol monomethyl ether acetate
- the contents of the flask were transferred to a 200 ml eggplant type flask, and the butanol formed was distilled off under reduced pressure to obtain a colorless and transparent titanium compound (T1-H1) solution.
- T1-H1 solution was analyzed by FT-IR, an absorption peak of Ti—O—Si (958 cm ⁇ 1 ) and an absorption peak of Ti—OH (1645 cm ⁇ 1 and 3380 cm ⁇ 1 ) were found. From the confirmation, it was estimated that the titanium compound (T1-H1) was dibutoxy (hydroxy) (trimethylsiloxy) titanium.
- the flask contents were transferred to a 200 ml eggplant type flask, and the butanol produced was distilled off under reduced pressure to obtain a colorless and transparent zirconium compound (Z1-H1) solution.
- Z1-H1 solution was analyzed by FT-IR, an absorption peak of Zr—O—Si (968 cm ⁇ 1 ) and an absorption peak of Zr—OH (1600 cm ⁇ 1 and 3410 cm ⁇ 1 ) were found. From the confirmation, it was estimated that the zirconium compound (Z1-H1) was dibutoxy (hydroxy) (trimethylsiloxy) zirconium.
- the solid content concentration of the polymetalloxane solution was measured by weighing 1.0 g of the polymetalloxane solution in an aluminum cup and heating it at 250 ° C. for 30 minutes using a hot plate to evaporate the liquid content. The solid content remaining in the heated aluminum cup was weighed.
- FT-IR analysis was performed by the following method. First, using a Fourier transform type infrared spectrometer (FT720 manufactured by Shimadzu Corporation), only a silicon wafer was measured and used as a baseline. Subsequently, the polymetalloxane solution was dropped on the silicon wafer, then spin-coated at an arbitrary rotation number, and then vacuum-dried to prepare a measurement sample. The absorbance of polymetalloxane was calculated from the difference between the absorbance of the measurement sample and the absorbance of the baseline, and the absorption peak was read.
- FT720 Fourier transform type infrared spectrometer
- the weight average molecular weight (Mw) was determined by the following method.
- As a developing solvent lithium chloride was dissolved in N-methyl-2-pyrrolidone to prepare a 0.02M lithium chloride N-methyl-2-pyrrolidone solution.
- a polymetalloxane was dissolved in a developing solvent so as to be 0.2 wt%, and this was used as a sample solution.
- the developing solvent was packed in a porous gel column (TSKgel ⁇ -M, Tosoh, one each) at a flow rate of 0.5 mL / min, and 0.2 mL of the sample solution was injected therein.
- the column eluate was detected with a differential refractive index detector (RI-201, Showa Denko), and the elution time was analyzed to determine the weight average molecular weight (Mw).
- Example 1 Synthesis of Polymetalloxane (TP-1) 35.6 g (0.1 mol) of a titanium compound (T1) and 50.0 g of propylene glycol monomethyl ether acetate (hereinafter abbreviated as PGMEA) as a solvent were mixed. This was designated as Solution 1. Further, 1.8 g (0.1 mol) of water, 50.0 g of isopropyl alcohol (hereinafter abbreviated as IPA) as a water dilution solvent, and 2.2 g (0.01 mol) of tributylamine as a polymerization catalyst were mixed. To solution 2.
- IPA isopropyl alcohol
- the solid content concentration of the obtained polymetalloxane solution was determined, and then PGMEA was added so that the solid content concentration was 20 wt% to obtain a polymetalloxane (TP-1) solution.
- the weight average molecular weight (Mw) of polymetalloxane (TP-1) was 6000 in terms of polystyrene.
- Example 2 Synthesis of Polymetalloxane (TP-2) 35.6 g (0.1 mol) of the titanium compound (T1) and 50.0 g of PGMEA as a solvent were mixed, and this was used as Solution 1. Further, 3.6 g (0.2 mol) of water, 50.0 g of IPA as a water dilution solvent, and 2.2 g (0.01 mol) of tributylamine as a polymerization catalyst were mixed, and this was used as Solution 2.
- TP-2 Polymetalloxane
- the solid content concentration of the obtained polymetalloxane solution was determined, and then PGMEA was added so that the solid content concentration was 20 wt% to obtain a polymetalloxane (TP-2) solution.
- the weight average molecular weight (Mw) of polymetalloxane (TP-2) was 21000 in terms of polystyrene.
- Example 3 Synthesis of Polymetalloxane (TP-3) 35.6 g (0.1 mol) of the titanium compound (T1) and 50.0 g of PGMEA as a solvent were mixed, and this was used as Solution 1. Further, 3.6 g (0.2 mol) of water, 50.0 g of IPA as a water dilution solvent, and 1.3 g (0.01 mol) of diisobutylamine as a polymerization catalyst were mixed, and this was used as Solution 2.
- the solid content concentration of the obtained polymetalloxane solution was determined, and then PGMEA was added so that the solid content concentration was 20 wt% to obtain a polymetalloxane (TP-3) solution.
- the weight average molecular weight (Mw) of polymetalloxane (TP-3) was 25,000 in terms of polystyrene.
- Example 4 Synthesis of polymetalloxane (TP-4) 35.6 g (0.1 mol) of the titanium compound (T1) and 50.0 g of PGMEA as a solvent were mixed, and this was used as Solution 1. Further, 3.6 g (0.2 mol) of water and 50.0 g of IPA as a water dilution solvent were mixed, and this was designated as Solution 2.
- the solid content concentration of the obtained polymetalloxane solution was determined, and then PGMEA was added so that the solid content concentration was 20 wt% to obtain a polymetalloxane (TP-4) solution.
- the weight average molecular weight (Mw) of polymetalloxane (TP-4) was 6000 in terms of polystyrene.
- Example 5 Synthesis of Polymetalloxane (TP-5) 35.6 g (0.1 mol) of the titanium compound (T1) and 50.0 g of PGMEA as a solvent were mixed, and this was used as Solution 1. Further, 5.4 g (0.3 mol) of water, 50.0 g of IPA as a water dilution solvent, and 2.2 g (0.01 mol) of tributylamine as a polymerization catalyst were mixed, and this was used as Solution 2.
- the solid content concentration of the obtained polymetalloxane solution was determined, and then PGMEA was added so that the solid content concentration was 20 wt% to obtain a polymetalloxane (TP-5) solution.
- the weight average molecular weight (Mw) of polymetalloxane (TP-5) was 44,000 in terms of polystyrene.
- Example 6 Synthesis of Polymetalloxane (TP-6) 35.6 g (0.1 mol) of the titanium compound (T1) and 50.0 g of PGMEA as a solvent were mixed, and this was used as Solution 1. Further, 5.4 g (0.3 mol) of water, 50.0 g of IPA as a water dilution solvent, and 1.3 g (0.01 mol) of diisobutylamine as a polymerization catalyst were mixed, and this was used as Solution 2.
- the solid content concentration of the obtained polymetalloxane solution was determined, and then PGMEA was added so that the solid content concentration was 20 wt% to obtain a polymetalloxane (TP-6) solution.
- the weight average molecular weight (Mw) of polymetalloxane (TP-6) was 25000 in terms of polystyrene.
- Example 7 Synthesis of polymetalloxane (TP-7) 31.4 g (0.1 mol) of the titanium compound (T2) and 50.0 g of PGMEA as a solvent were mixed, and this was used as Solution 1. Further, 5.4 g (0.3 mol) of water, 50.0 g of IPA as a water dilution solvent, and 2.2 g (0.01 mol) of tributylamine as a polymerization catalyst were mixed, and this was used as Solution 2.
- the solid content concentration of the obtained polymetalloxane solution was determined, and then PGMEA was added so that the solid content concentration was 20 wt% to obtain a polymetalloxane (TP-7) solution.
- the weight average molecular weight (Mw) of polymetalloxane (TP-7) was 46000 in terms of polystyrene.
- Example 8 Synthesis of polymetalloxane (TP-8) 39.8 g (0.1 mol) of titanium compound (T4) and 50.0 g of PGMEA as a solvent were mixed, and this was used as solution 1. Further, 5.4 g (0.3 mol) of water, 50.0 g of IPA as a water dilution solvent, and 2.2 g (0.01 mol) of tributylamine as a polymerization catalyst were mixed, and this was used as Solution 2.
- the solid content concentration of the obtained polymetalloxane solution was determined, and then PGMEA was added so that the solid content concentration was 20 wt% to obtain a polymetalloxane (TP-8) solution.
- the weight average molecular weight (Mw) of polymetalloxane (TP-8) was 28000 in terms of polystyrene.
- Example 9 Synthesis of Polymetalloxane (TP-9) 37.2 g (0.1 mol) of the titanium compound (T5) and 50.0 g of PGMEA as a solvent were mixed, and this was used as Solution 1. Further, 3.6 g (0.2 mol) of water, 50.0 g of IPA as a water dilution solvent, and 2.2 g (0.01 mol) of tributylamine as a polymerization catalyst were mixed, and this was used as Solution 2.
- the solid content concentration of the obtained polymetalloxane solution was determined, and then PGMEA was added so that the solid content concentration was 20 wt% to obtain a polymetalloxane (TP-9) solution.
- the weight average molecular weight (Mw) of polymetalloxane (TP-9) was 18000 in terms of polystyrene.
- Example 10 Synthesis of polymetalloxane (TP-10) 68.81 g of titanium compound (T2-H3) solution (18.81 g (0.1 mol) as trihydroxy (trimethylsiloxy) titanium) and 50.0 g of PGMEA ) was weighed and this was designated as Solution 1. Further, 50.0 g of IPA as a diluting solvent and 2.2 g (0.01 mol) of tributylamine as a polymerization catalyst were mixed, and this was used as Solution 2.
- T2-H3 titanium compound
- PGMEA PGMEA
- the solid content concentration of the obtained polymetalloxane solution was determined, and then PGMEA was added so that the solid content concentration was 20 wt% to obtain a polymetalloxane (TP-10) solution.
- the weight average molecular weight (Mw) of polymetalloxane (TP-10) was 48,000 in terms of polystyrene.
- Example 11 Synthesis of Polymetalloxane (TP-11) 73.02 g ((isopropoxy) (dihydroxy) (trimethylsiloxy) titanium as a titanium compound (T2-H2)) solution was 18.81 g (0.1 mol), PGMEA 50. 0 g) was weighed and this was designated Solution 1. Further, 1.8 g (0.1 mol) of water, 50.0 g of IPA as a diluting solvent, and 2.2 g (0.01 mol) of tributylamine as a polymerization catalyst were mixed, and this was used as Solution 2.
- the solid content concentration of the obtained polymetalloxane solution was determined, and then PGMEA was added so that the solid content concentration was 20 wt% to obtain a polymetalloxane (TP-11) solution.
- the weight average molecular weight (Mw) of polymetalloxane (TP-11) was 47000 in terms of polystyrene.
- Example 12 Synthesis of polymetalloxane (TP-12) Synthesis and solid content adjustment were carried out in the same manner as in Example 7 except that PGMEA as the solvent in Example 7 was changed to 1,2-diethoxyethane. A polymetalloxane (TP-12) solution was obtained. The appearance of the resulting polymetalloxane (TP-12) solution was light yellow and transparent.
- the weight average molecular weight (Mw) of polymetalloxane (TP-12) was 49000 in terms of polystyrene.
- Example 13 Synthesis of polymetalloxane (TP-13) Synthesis and solid content adjustment in the same manner as in Example 7 except that PGMEA as the solvent in Example 7 was changed to 2,6-dimethyl-4-heptanone To obtain polymetalloxane (TP-13). The appearance of the resulting polymetalloxane (TP-13 solution was light yellow and transparent.
- the weight average molecular weight (Mw) of polymetalloxane (TP-13) was 46000 in terms of polystyrene.
- Example 14 Synthesis of Polymetalloxane (ZP-1) 40.0 g (0.1 mol) of a zirconium compound (Z-1) and 50.0 g of PGMEA as a solvent were mixed, and this was used as Solution 1. Further, 5.4 g (0.3 mol) of water, 50.0 g of IPA as a water dilution solvent, and 2.2 g (0.01 mol) of tributylamine as a polymerization catalyst were mixed, and this was used as Solution 2.
- the solid content concentration of the obtained polymetalloxane solution was determined, and then PGMEA was added so that the solid content concentration was 20 wt% to obtain a polymetalloxane (ZP-1) solution.
- the weight average molecular weight (Mw) of polymetalloxane (ZP-1) was 45,000 in terms of polystyrene.
- Example 15 Synthesis of Polymetalloxane (ZP-2) 41.6 g (0.1 mol) of a zirconium compound (Z-4) and 50.0 g of PGMEA as a solvent were mixed, and this was used as Solution 1. Further, 3.6 g (0.2 mol) of water, 50.0 g of IPA as a water dilution solvent, and 2.2 g (0.01 mol) of tributylamine as a polymerization catalyst were mixed, and this was used as Solution 2.
- the solid content concentration of the obtained polymetalloxane solution was determined, and then PGMEA was added so that the solid content concentration was 20 wt% to obtain a polymetalloxane (ZP-2) solution.
- the weight average molecular weight (Mw) of polymetalloxane (ZP-2) was 19000 in terms of polystyrene.
- Example 16 Synthesis of polymetalloxane (ZP-3) Weighed 73.1 g of zirconium compound (Z1-H3) solution (trihydroxy (trimethylsiloxy) zirconium g (0.1 mol), composed of 50.0 g of PGMEA). This was designated as Solution 1. Further, 50.0 g of IPA as a diluting solvent and 2.2 g (0.01 mol) of tributylamine as a polymerization catalyst were mixed, and this was used as Solution 2.
- the solid content concentration of the obtained polymetalloxane solution was determined, and then PGMEA was added so that the solid content concentration was 20 wt% to obtain a polymetalloxane (ZP-3) solution.
- the weight average molecular weight (Mw) of polymetalloxane (ZP-3) was 46000 in terms of polystyrene.
- polymetalloxane (TP-14) was not dissolved in PGMEA, it was dissolved in tetrahydrofuran and adjusted so that the solid content concentration was 20 wt%.
- the weight average molecular weight (Mw) of polymetalloxane (TP-14) was 1700 in terms of polystyrene.
- the solid content concentration of the obtained polymetalloxane solution was determined, and then PGMEA was added so that the solid content concentration was 20 wt% to obtain a polymetalloxane (TP-15) solution.
- the weight average molecular weight (Mw) of polymetalloxane (TP-15) was 8000 in terms of polystyrene.
- the solid content concentration of the obtained polysiloxane solution was determined, and then PGMEA was added so that the solid content concentration was 20 wt% to obtain a polysiloxane (SP-1) solution.
- the resulting polysiloxane (SP-01) had a weight average molecular weight (Mw) of 3000 in terms of polystyrene.
- the flask was immersed in a 40 ° C. oil bath and stirred for 60 minutes, and then the oil bath was heated to 120 ° C. over 30 minutes.
- the internal temperature of the solution reached 100 ° C., and was then heated and stirred for 2 hours (the internal temperature was 100 to 110 ° C.).
- methanol and water as by-products distill off.
- the solid content concentration of the obtained metal compound particle-containing polysiloxane solution was determined, and then PGMEA was added so that the solid content concentration was 20 wt% to obtain a metal compound particle-containing polysiloxane (SP-2) solution.
- Example 17 (1) Preparation of cured film A polymetalloxane (TP-1) solution was spin-coated on a 4-inch silicon wafer and a Tempax glass plate using a spin coater (1H-360S manufactured by Mikasa Co., Ltd.), and then hot plate A pre-baked film was prepared by heating at 100 ° C. for 3 minutes using (SCW-636 manufactured by Dainippon Screen Manufacturing Co., Ltd.). Then, it cured for 5 minutes at 300 degreeC using the hotplate, and produced the cured film with a film thickness of 0.3 micrometer and 0.5 micrometer. The film thickness was measured using an optical interference type film thickness meter (Lambda Ace STM602 manufactured by Dainippon Screen Manufacturing Co., Ltd.).
- Examples 18 to 32, Comparative Examples 1 to 4 For the solutions shown in Table 5, in the same manner as in Example 17, (1) Creation of cured film, (2) Evaluation of crack resistance of cured film, (3) Refractive index measurement of cured film, (4) Cured film The transmittance was measured. The evaluation results are shown in Table 5.
- Comparative Example 1 and Comparative Example 2 when a cured film was prepared, cracks were observed and a homogeneous film could not be obtained.
- This is a polymetalloxane in which a large number of alkoxy groups remain, so hydrolysis of the alkoxy groups occurs due to moisture in the air when the coating film is formed. It is done.
- Example 33 Polymetalloxane (TP-5) solution 3.5g (solid content weight 0.7g) and silicon oxide-titanium oxide composite particles "OPTRAIK TR-513" (trade name, manufactured by Catalyst Kasei Kogyo Co., Ltd., solid A composition 1 was prepared by mixing 1.0 g (solid content weight 0.3 g) of a 30% ⁇ -butyrolactone dispersion. In the same manner as in Example 17, (1) creation of a cured film, (2) evaluation of crack resistance of the cured film, (3) measurement of refractive index of the cured film, and (4) measurement of transmittance of the cured film were performed. The evaluation results are shown in Table 5.
- Example 34 A member having a portion where a transparent conductive film (I), a polymetalloxane cured film (II), a silicon oxide thin film (III) and / or a transparent adhesive thin film (IV) are laminated on the upper surface of a transparent base material is prepared. (5) The transparent conductive film visibility was evaluated.
- the pre-baked film of the obtained photoresist was exposed to 1000 J / m 2 with a gap of 100 ⁇ m through a mask using PLA and an ultrahigh pressure mercury lamp as a light source. Thereafter, using an automatic developing device (AD-2000; manufactured by Takizawa Sangyo Co., Ltd.), shower development is performed for 90 seconds with an aqueous solution of 2.38 wt% tetramethylammonium hydroxide (hereinafter abbreviated as TMAH), and then with water for 30 seconds. Rinse and pattern processing of photoresist were performed.
- AD-2000 automatic developing device
- TMAH 2.38 wt% tetramethylammonium hydroxide
- the ITO is etched with an HCl-HNO 3 -based etching solution, the photoresist is removed with a stripping solution, and the first electrode and a portion of the second electrode perpendicular thereto are patterned (FIGS. 1 and 2).
- a polymetalloxane cured film (II) is formed by the method described in (5a-4) above on a glass having MAM on the entire surface as a base metal, and then the above (5a- 5) A silicon oxide thin film (III) was formed by the method described.
- a test pressure cooker test, PCT test
- an oven HAST CHAMBERE EHS-221MD; manufactured by Espec Corp.
- the occupied area ratio of defects in which the lower MAM discolors due to corrosion was visually evaluated in the following 11 stages. Seven or more were accepted.
- the discolored area ratio of MAM under the cured film is 0%. No change in the appearance of the cured film itself.
- 9 The MAM discolored area ratio under the cured film is 1 to 3%. No change in the appearance of the cured film itself.
- 8 The MAM discolored area ratio under the cured film is 4 to 6%. No change in the appearance of the cured film itself.
- 7 The MAM discolored area ratio under the cured film is 7 to 9%. No change in the appearance of the cured film itself.
- the discolored area ratio of MAM under the cured film is 21 to 30%. No change in the appearance of the cured film itself.
- 3: Discolored area ratio of MAM under the cured film is 31 to 50%. No change in the appearance of the cured film itself.
- 2: The discolored area ratio of MAM under the cured film is 51 to 70%. No change in the appearance of the cured film itself.
- 0 The discolored area ratio of MAM under the cured film is 100%. In addition, discoloration and cracks occur in the cured film itself.
- Example 50 In the formation of the cured polymetalloxane film (II), the same composition as in Example 34 was used except that the composition 1 prepared in Example 33 was used instead of the polymetalloxane (TP-1) solution. By the method, (5) transparent conductive film visibility evaluation and (6) base metal evaluation were performed. The evaluation results are shown in Table 6.
- Example 51 Except for not performing the step of forming the silicon oxide thin film (III), (5) Transparent conductive film visibility evaluation and (6) Base metal evaluation were performed in the same manner as in Example 40. It was. The evaluation results are shown in Table 6.
- Example 52 Except for not performing the step of laminating the film with the transparent adhesive, (5) Transparent conductive film visibility evaluation and (6) Base metal evaluation were performed in the same manner as in Example 40. . The evaluation results are shown in Table 6.
- Example 53 In the production of the transparent conductive film pattern, the same as Example 40 except that a polyethylene terephthalate (hereinafter abbreviated as PET) base material having a thickness of 0.2 mm was used instead of the chemically strengthened glass substrate. (5) Transparent conductive film visibility evaluation was performed by the method. The evaluation results are shown in Table 6.
- PET polyethylene terephthalate
- Comparative Example 9 Except for not performing the step of forming the polymetalloxane cured film (II), by the same method as in Example 40, (5) Transparent conductive film visibility evaluation, and (6) Base metal evaluation Went. The evaluation results are shown in Table 6.
- Example 54 The polymetalloxane cured film prepared on the substrate was dry etched, and the surface roughness Ra and light transmittance after dry etching were measured. Details are shown below. The measurement results are shown in Table 6.
- Examples 55 to 65, Comparative Examples 10 to 11 For the solutions shown in Table 7, in the same manner as in Example 54, (6-1) Preparation of cured film, (6-2) Measurement of refractive index, (6-3) Measurement of light transmittance of cured film, (6-4) Dry etching, (6-5) Surface roughness measurement after dry etching. (6-6) The light transmittance after dry etching was measured. The evaluation results are shown in Table 7.
- a cured film was formed using a polysiloxane (SP-1) solution. Since polysiloxane (SP-1) has an anthracenyl group having a high refractive index, a high refractive index of 1.63 was achieved. However, since the anthracenyl group has absorption in the visible light region due to its origin, the transmittance is 85%, and high transparency required for the microlens cannot be obtained.
- SP-1 polysiloxane
- a cured film was formed using a metal compound particle-containing polysiloxane (SP-2) solution. Since titanium oxide particles having a high refractive index are used, a very high refractive index of 1.75 can be realized. However, during dry etching, the reactivity of the etching gas is different between the titanium oxide particles and the polysiloxane component, resulting in a local difference in the dry etching rate. Therefore, the surface of the cured film was rough, and the arithmetic average roughness Ra was 50 nm. Further, since the surface of the cured film is rough, light is scattered, and thus the transmittance after dry etching is 80%, and the high transparency required for the microlens cannot be obtained.
- SP-2 metal compound particle-containing polysiloxane
- Example 66 A polymetalloxane solution (TP-7) was spin-coated on a 6-inch silicon wafer using a spin coater (1H-360S manufactured by Mikasa Co., Ltd.), and then a hot plate (SCW-636 manufactured by Dainippon Screen Mfg. Co., Ltd.) Was heated at 100 ° C. for 3 minutes to prepare a pre-baked film. Then, it cured for 5 minutes at 300 degreeC using the hotplate, and the cured film containing a polymetalloxane with a film thickness of 0.5 micrometer was created.
- TP-7 polymetalloxane solution
- SCW-636 manufactured by Dainippon Screen Mfg. Co., Ltd.
- a positive photoresist (OFPR-800 manufactured by Tokyo Ohka Kogyo Co., Ltd.) is spin-coated on the cured film containing polymetalloxane, and then heated at 100 ° C. for 2 minutes using a hot plate to form a photoresist layer. Formed. Thereafter, pattern exposure was performed through a mask using an i-line stepper (Nikon NSR-i9C). Note that. As the mask, a mask designed to obtain a 2 ⁇ m dot-like pattern was used.
- a reactive ion etching apparatus (RIE-10N manufactured by Samco Co., Ltd.) for a cured film containing a photoresist pattern and polymetalloxane
- a mixed gas of CF 4 (tetrafluoromethane) and oxygen is used as a process gas
- the entire surface was dry-etched to obtain a microlens pattern containing polymetalloxane.
- microlens pattern was observed using a scanning electron microscope (S-4800 manufactured by Hitachi High-Tech Technologies), it was confirmed that the microlens pattern was a smooth microlens pattern without surface roughness.
- the arithmetic average surface roughness of the microlens pattern was determined by the following method.
- the surface of the microlens pattern was scanned with a scanning probe microscope (Dimension Icon manufactured by Bruker Corporation) to obtain a three-dimensional stereoscopic image.
- the obtained image was cut to obtain a contour curve of the cross section of the microlens.
- the curvature of the microlens was removed from the contour curve to obtain a surface roughness curve.
- the arithmetic average roughness Ra was obtained by calculating from the surface roughness curve based on JIS B 0601: 2013.
- the obtained microlens pattern had an arithmetic average surface roughness Ra of 4 nm.
- Transparent base substrate 2 Transparent conductive thin film (I) 3: Insulating film 4: MAM wiring 5: Cured film (II) obtained from polymetalloxane or composition thereof 6: Silicon oxide thin film (III) 7: Transparent adhesive layer (IV)
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Abstract
Description
また、本発明の別の態様は、下記一般式(2)で表される化合物またはその加水分解体を重縮合する工程を含むポリメタロキサンの製造方法。
本発明は、下記一般式(1)で表される構成単位を有するポリメタロキサンである。
ポリメタロキサン中のR1の少なくとも一つはヒドロキシ基であることが好ましい。一般式(1)で表される構成単位を有するポリメタロキサンは、ヒドロキシ基を有することにより、長期保管時においても粘度の上昇が小さい、保存安定性に優れたポリメタロキサンとすることができる。
ポリメタロキサンの重量平均分子量は、下限としては500以上であることが好ましく、1000以上であることがより好ましく、10000以上であることがさらに好ましい。上限としては1000000以下であることが好ましく、500000以下であることがより好ましく、200000以下であることがさらに好ましい。重量平均分子量を上記範囲とすることで、塗布特性が良好となる。また、重量平均分子量が下限値以上であることで、後述の硬化膜の物性が向上し、特に耐クラック性に優れた硬化膜が得られる。
一般式(1)で表される構成単位を有するポリメタロキサンの合成方法に特に制限はないが、下記一般式(2)で表される化合物またはその加水分解体を重縮合する工程を含むことが好ましい。すなわち、本発明の別の態様は、下記一般式(2)で表される化合物またはその加水分解体を重縮合する工程を含むポリメタロキサンの製造方法である。
トリメトキシ(トリメチルシロキシ)チタン、トリエトキシ(トリメチルシロキシ)チタン、トリプロポキシ(トリメチルシロキシ)チタン、トリイソプロポキシ(トリメチルシロキシ)チタン、トリブトキシ(トリメチルシロキシ)チタン、トリイソブトキシ(トリメチルシロキシ)チタン、トリ-s-ブトキシ(トリメチルシロキシ)チタン、トリ-t-ブトキシ(トリメチルシロキシ)チタン、トリシクロヘキソキシ(トリメチルシロキシ)チタン、トリフェノキシ(トリメチルシロキシ)チタン;
トリメトキシ(トリエチルシロキシ)チタン、トリエトキシ(トリエチルシロキシ)チタン、トリプロポキシ(トリエチルシロキシ)チタン、トリイソプロポキシ(トリエチルシロキシ)チタン、トリブトキシ(トリエチルシロキシ)チタン、トリイソブトキシ(トリエチルシロキシ)チタン、トリ-s-ブトキシ(トリエチルシロキシ)チタン、トリ-t-ブトキシ(トリエチルシロキシ)チタン、トリシクロヘキソキシ(トリエチルシロキシ)チタン、トリフェノキシ(トリエチルシロキシ)チタン;
トリメトキシ(トリプロピルシロキシ)チタン、トリエトキシ(トリプロピルシロキシ)チタン、トリプロポキシ(トリプロピルシロキシ)チタン、トリイソプロポキシ(トリプロピルシロキシ)チタン、トリブトキシ(トリプロピルシロキシ)チタン、トリイソブトキシ(トリプロピルシロキシ)チタン、トリ-s-ブトキシ(トリプロピルシロキシ)チタン、トリ-t-ブトキシ(トリプロピルシロキシ)チタン、トリシクロヘキソキシ(トリプロピルシロキシ)チタン、トリフェノキシ(トリプロピルシロキシ)チタン;
トリメトキシ(トリイソプロピルシロキシ)チタン、トリエトキシ(トリイソプロピルシロキシ)チタン、トリプロポキシ(トリイソプロピルシロキシ)チタン、トリイソプロポキシ(トリイソプロピルシロキシ)チタン、トリブトキシ(トリイソプロピルシロキシ)チタン、トリイソブトキシ(トリイソプロピルシロキシ)チタン、トリ-s-ブトキシ(トリイソプロピルシロキシ)チタン、トリ-t-ブトキシ(トリイソプロピルシロキシ)チタン、トリシクロヘキソキシ(トリイソプロピルシロキシ)チタン、トリフェノキシ(トリイソプロピルシロキシ)チタン;
トリメトキシ(トリブチルシロキシ)チタン、トリエトキシ(トリブチルシロキシ)チタン、トリプロポキシ(トリブチルシロキシ)チタン、トリイソプロポキシ(トリブチルシロキシ)チタン、トリブトキシ(トリブチルシロキシ)チタン、トリイソブトキシ(トリブチルシロキシ)チタン、トリ-s-ブトキシ(トリブチルシロキシ)チタン、トリ-t-ブトキシ(トリブチルシロキシ)チタン、トリシクロヘキソキシ(トリブチルシロキシ)チタン、トリフェノキシ(トリブチルシロキシ)チタン;
トリメトキシ(トリイソブチルシロキシ)チタン、トリエトキシ(トリイソブチルシロキシ)チタン、トリプロポキシ(トリイソブチルシロキシ)チタン、トリイソプロポキシ(トリイソブチルシロキシ)チタン、トリブトキシ(トリイソブチルシロキシ)チタン、トリイソブトキシ(トリイソブチルシロキシ)チタン、トリ-s-ブトキシ(トリイソブチルシロキシ)チタン、トリ-t-ブトキシ(トリイソブチルシロキシ)チタン、トリシクロヘキソキシ(トリイソブチルシロキシ)チタン、トリフェノキシ(トリイソブチルシロキシ)チタン;
トリメトキシ(トリ-s-ブトキシシロキシ)チタン、トリエトキシ(トリ-s-ブトキシシロキシ)チタン、トリプロポキシ(トリ-s-ブトキシシロキシ)チタン、トリイソプロポキシ(トリ-s-ブトキシシロキシ)チタン、トリブトキシ(トリ-s-ブトキシシロキシ)チタン、トリイソブトキシ(トリ-s-ブトキシシロキシ)チタン、トリ-s-ブトキシ(トリ-s-ブトキシシロキシ)チタン、トリ-t-ブトキシ(トリ-s-ブトキシシロキシ)チタン、トリシクロヘキソキシ(トリ-s-ブトキシシロキシ)チタン、トリフェノキシ(トリ-s-ブトキシシロキシ)チタン;
トリメトキシ(トリ-t-ブトキシシロキシ)チタン、トリエトキシ(トリ-t-ブトキシシロキシ)チタン、トリプロポキシ(トリ-t-ブトキシシロキシ)チタン、トリイソプロポキシ(トリ-t-ブトキシシロキシ)チタン、トリブトキシ(トリ-t-ブトキシシロキシ)チタン、トリイソブトキシ(トリ-t-ブトキシシロキシ)チタン、トリ-s-ブトキシ(トリ-t-ブトキシシロキシ)チタン、トリ-t-ブトキシ(トリ-t-ブトキシシロキシ)チタン、トリシクロヘキソキシ(トリ-t-ブトキシシロキシ)チタン、トリフェノキシ(トリ-t-ブトキシシロキシ)チタン;
トリメトキシ(トリシクロヘキシルシロキシ)チタン、トリエトキシ(トリシクロヘキシルシロキシ)チタン、トリプロポキシ(トリシクロヘキシルシロキシ)チタン、トリイソプロポキシ(トリシクロヘキシルシロキシ)チタン、トリブトキシ(トリシクロヘキシルシロキシ)チタン、トリイソブトキシ(トリシクロヘキシルシロキシ)チタン、トリ-s-ブトキシ(トリシクロヘキシルシロキシ)チタン、トリ-t-ブトキシ(トリシクロヘキシルシロキシ)チタン、トリシクロヘキソキシ(トリシクロヘキシルシロキシ)チタン、トリフェノキシ(トリシクロヘキシルシロキシ)チタン;
トリメトキシ(トリフェニルシロキシ)チタン、トリエトキシ(トリフェニルシロキシ)チタン、トリプロポキシ(トリフェニルシロキシ)チタン、トリイソプロポキシ(トリフェニルシロキシ)チタン、トリブトキシ(トリフェニルシロキシ)チタン、トリイソブトキシ(トリフェニルシロキシ)チタン、トリ-s-ブトキシ(トリフェニルシロキシ)チタン、トリ-t-ブトキシ(トリフェニルシロキシ)チタン、トリシクロヘキソキシ(トリフェニルシロキシ)チタン、トリフェノキシ(トリフェニルシロキシ)チタン;
などが挙げられ、n=2のものとしては、
ジメトキシビス(トリメチルシロキシ)チタン、ジエトキシビス(トリメチルシロキシ)チタン、ジプロポキシビス(トリメチルシロキシ)チタン、ジイソプロポキシビス(トリメチルシロキシ)チタン、ジブトキシビス(トリメチルシロキシ)チタン、ジイソブトキシビス(トリメチルシロキシ)チタン、ジ-s-ブトキシビス(トリメチルシロキシ)チタン、ジ-t-ブトキシビス(トリメチルシロキシ)チタン、ジシクロヘキソキシビス(トリメチルシロキシ)チタン、ジフェノキシビス(トリメチルシロキシ)チタン;
ジメトキシビス(トリエチルシロキシ)チタン、ジエトキシビス(トリエチルシロキシ)チタン、ジプロポキシビス(トリエチルシロキシ)チタン、ジイソプロポキシビス(トリエチルシロキシ)チタン、ジブトキシビス(トリエチルシロキシ)チタン、ジイソブトキシビス(トリエチルシロキシ)チタン、ジ-s-ブトキシビス(トリエチルシロキシ)チタン、ジ-t-ブトキシビス(トリエチルシロキシ)チタン、ジシクロヘキソキシビス(トリエチルシロキシ)チタン、ジフェノキシビス(トリエチルシロキシ)チタン;
ジメトキシビス(トリプロピルシロキシ)チタン、ジエトキシビス(トリプロピルシロキシ)チタン、ジプロポキシビス(トリプロピルシロキシ)チタン、ジイソプロポキシビス(トリプロピルシロキシ)チタン、ジブトキシビス(トリプロピルシロキシ)チタン、ジイソブトキシビス(トリプロピルシロキシ)チタン、ジ-s-ブトキシビス(トリプロピルシロキシ)チタン、ジ-t-ブトキシビス(トリプロピルシロキシ)チタン、ジシクロヘキソキシビス(トリプロピルシロキシ)チタン、ジフェノキシビス(トリプロピルシロキシ)チタン;
ジメトキシビス(トリイソプロピルシロキシ)チタン、ジエトキシビス(トリイソプロピルシロキシ)チタン、ジプロポキシビス(トリイソプロピルシロキシ)チタン、ジイソプロポキシビス(トリイソプロピルシロキシ)チタン、ジブトキシビス(トリイソプロピルシロキシ)チタン、ジイソブトキシビス(トリイソプロピルシロキシ)チタン、ジ-s-ブトキシビス(トリイソプロピルシロキシ)チタン、ジ-t-ブトキシビス(トリイソプロピルシロキシ)チタン、ジシクロヘキソキシビス(トリイソプロピルシロキシ)チタン、ジフェノキシビス(トリイソプロピルシロキシ)チタン;
ジメトキシビス(トリブチルシロキシ)チタン、ジエトキシビス(トリブチルシロキシ)チタン、ジプロポキシビス(トリブチルシロキシ)チタン、ジイソプロポキシビス(トリブチルシロキシ)チタン、ジブトキシビス(トリブチルシロキシ)チタン、ジイソブトキシビス(トリブチルシロキシ)チタン、ジ-s-ブトキシビス(トリブチルシロキシ)チタン、ジ-t-ブトキシビス(トリブチルシロキシ)チタン、ジシクロヘキソキシビス(トリブチルシロキシ)チタン、ジフェノキシビス(トリブチルシロキシ)チタン;
ジメトキシビス(トリイソブチルシロキシ)チタン、ジエトキシビス(トリイソブチルシロキシ)チタン、ジプロポキシビス(トリイソブチルシロキシ)チタン、ジイソプロポキシビス(トリイソブチルシロキシ)チタン、ジブトキシビス(トリイソブチルシロキシ)チタン、ジイソブトキシビス(トリイソブチルシロキシ)チタン、ジ-s-ブトキシビス(トリイソブチルシロキシ)チタン、ジ-t-ブトキシビス(トリイソブチルシロキシ)チタン、ジシクロヘキソキシビス(トリイソブチルシロキシ)チタン、ジフェノキシビス(トリイソブチルシロキシ)チタン;
ジメトキシビス(トリ-s-ブトキシシロキシ)チタン、ジエトキシビス(トリ-s-ブトキシシロキシ)チタン、ジプロポキシビス(トリ-s-ブトキシシロキシ)チタン、ジイソプロポキシビス(トリ-s-ブトキシシロキシ)チタン、ジブトキシビス(トリ-s-ブトキシシロキシ)チタン、ジイソブトキシビス(トリ-s-ブトキシシロキシ)チタン、ジ-s-ブトキシビス(トリ-s-ブトキシシロキシ)チタン、ジ-t-ブトキシビス(トリ-s-ブトキシシロキシ)チタン、ジシクロヘキソキシビス(トリ-s-ブトキシシロキシ)チタン、ジフェノキシビス(トリ-s-ブトキシシロキシ)チタン;
ジメトキシビス(トリ-t-ブトキシシロキシ)チタン、ジエトキシビス(トリ-t-ブトキシシロキシ)チタン、ジプロポキシビス(トリ-t-ブトキシシロキシ)チタン、ジイソプロポキシビス(トリ-t-ブトキシシロキシ)チタン、ジブトキシビス(トリ-t-ブトキシシロキシ)チタン、ジイソブトキシビス(トリ-t-ブトキシシロキシ)チタン、ジ-s-ブトキシビス(トリ-t-ブトキシシロキシ)チタン、ジ-t-ブトキシビス(トリ-t-ブトキシシロキシ)チタン、ジシクロヘキソキシビス(トリ-t-ブトキシシロキシ)チタン、ジフェノキシビス(トリ-t-ブトキシシロキシ)チタン;
ジメトキシビス(トリシクロヘキシルシロキシ)チタン、ジエトキシビス(トリシクロヘキシルシロキシ)チタン、ジプロポキシビス(トリシクロヘキシルシロキシ)チタン、ジイソプロポキシビス(トリシクロヘキシルシロキシ)チタン、ジブトキシビス(トリシクロヘキシルシロキシ)チタン、ジイソブトキシビス(トリシクロヘキシルシロキシ)チタン、ジ-s-ブトキシビス(トリシクロヘキシルシロキシ)チタン、ジ-t-ブトキシビス(トリシクロヘキシルシロキシ)チタン、ジシクロヘキソキシビス(トリシクロヘキシルシロキシ)チタン、ジフェノキシビス(トリシクロヘキシルシロキシ)チタン;
ジメトキシビス(トリフェニルシロキシ)チタン、ジエトキシビス(トリフェニルシロキシ)チタン、ジプロポキシビス(トリフェニルシロキシ)チタン、ジイソプロポキシビス(トリフェニルシロキシ)チタン、ジブトキシビス(トリフェニルシロキシ)チタン、ジイソブトキシビス(トリフェニルシロキシ)チタン、ジ-s-ブトキシビス(トリフェニルシロキシ)チタン、ジ-t-ブトキシビス(トリフェニルシロキシ)チタン、ジシクロヘキソキシビス(トリフェニルシロキシ)チタン、ジフェノキシビス(トリフェニルシロキシ)チタン;
などが挙げられる。
トリメトキシ(トリメチルシロキシ)ジルコニウム、トリエトキシ(トリメチルシロキシ)ジルコニウム、トリプロポキシ(トリメチルシロキシ)ジルコニウム、トリイソプロポキシ(トリメチルシロキシ)ジルコニウム、トリブトキシ(トリメチルシロキシ)ジルコニウム、トリイソブトキシ(トリメチルシロキシ)ジルコニウム、トリ-s-ブトキシ(トリメチルシロキシ)ジルコニウム、トリ-t-ブトキシ(トリメチルシロキシ)ジルコニウム、トリシクロヘキソキシ(トリメチルシロキシ)ジルコニウム、トリフェノキシ(トリメチルシロキシ)ジルコニウム;
トリメトキシ(トリエチルシロキシ)ジルコニウム、トリエトキシ(トリエチルシロキシ)ジルコニウム、トリプロポキシ(トリエチルシロキシ)ジルコニウム、トリイソプロポキシ(トリエチルシロキシ)ジルコニウム、トリブトキシ(トリエチルシロキシ)ジルコニウム、トリイソブトキシ(トリエチルシロキシ)ジルコニウム、トリ-s-ブトキシ(トリエチルシロキシ)ジルコニウム、トリ-t-ブトキシ(トリエチルシロキシ)ジルコニウム、トリシクロヘキソキシ(トリエチルシロキシ)ジルコニウム、トリフェノキシ(トリエチルシロキシ)ジルコニウム;
トリメトキシ(トリプロピルシロキシ)ジルコニウム、トリエトキシ(トリプロピルシロキシ)ジルコニウム、トリプロポキシ(トリプロピルシロキシ)ジルコニウム、トリイソプロポキシ(トリプロピルシロキシ)ジルコニウム、トリブトキシ(トリプロピルシロキシ)ジルコニウム、トリイソブトキシ(トリプロピルシロキシ)ジルコニウム、トリ-s-ブトキシ(トリプロピルシロキシ)ジルコニウム、トリ-t-ブトキシ(トリプロピルシロキシ)ジルコニウム、トリシクロヘキソキシ(トリプロピルシロキシ)ジルコニウム、トリフェノキシ(トリプロピルシロキシ)ジルコニウム;
トリメトキシ(トリイソプロピルシロキシ)ジルコニウム、トリエトキシ(トリイソプロピルシロキシ)ジルコニウム、トリプロポキシ(トリイソプロピルシロキシ)ジルコニウム、トリイソプロポキシ(トリイソプロピルシロキシ)ジルコニウム、トリブトキシ(トリイソプロピルシロキシ)ジルコニウム、トリイソブトキシ(トリイソプロピルシロキシ)ジルコニウム、トリ-s-ブトキシ(トリイソプロピルシロキシ)ジルコニウム、トリ-t-ブトキシ(トリイソプロピルシロキシ)ジルコニウム、トリシクロヘキソキシ(トリイソプロピルシロキシ)ジルコニウム、トリフェノキシ(トリイソプロピルシロキシ)ジルコニウム;
トリメトキシ(トリブチルシロキシ)ジルコニウム、トリエトキシ(トリブチルシロキシ)ジルコニウム、トリプロポキシ(トリブチルシロキシ)ジルコニウム、トリイソプロポキシ(トリブチルシロキシ)ジルコニウム、トリブトキシ(トリブチルシロキシ)ジルコニウム、トリイソブトキシ(トリブチルシロキシ)ジルコニウム、トリ-s-ブトキシ(トリブチルシロキシ)ジルコニウム、トリ-t-ブトキシ(トリブチルシロキシ)ジルコニウム、トリシクロヘキソキシ(トリブチルシロキシ)ジルコニウム、トリフェノキシ(トリブチルシロキシ)ジルコニウム;
トリメトキシ(トリイソブチルシロキシ)ジルコニウム、トリエトキシ(トリイソブチルシロキシ)ジルコニウム、トリプロポキシ(トリイソブチルシロキシ)ジルコニウム、トリイソプロポキシ(トリイソブチルシロキシ)ジルコニウム、トリブトキシ(トリイソブチルシロキシ)ジルコニウム、トリイソブトキシ(トリイソブチルシロキシ)ジルコニウム、トリ-s-ブトキシ(トリイソブチルシロキシ)ジルコニウム、トリ-t-ブトキシ(トリイソブチルシロキシ)ジルコニウム、トリシクロヘキソキシ(トリイソブチルシロキシ)ジルコニウム、トリフェノキシ(トリイソブチルシロキシ)ジルコニウム;
トリメトキシ(トリ-s-ブトキシシロキシ)ジルコニウム、トリエトキシ(トリ-s-ブトキシシロキシ)ジルコニウム、トリプロポキシ(トリ-s-ブトキシシロキシ)ジルコニウム、トリイソプロポキシ(トリ-s-ブトキシシロキシ)ジルコニウム、トリ-n-ブトキシ(トリ-s-ブトキシシロキシ)ジルコニウム、トリイソブトキシ(トリ-s-ブトキシシロキシ)ジルコニウム、トリ-s-ブトキシ(トリ-s-ブトキシシロキシ)ジルコニウム、トリ-t-ブトキシ(トリ-s-ブトキシシロキシ)ジルコニウム、トリシクロヘキソキシ(トリ-s-ブトキシシロキシ)ジルコニウム、トリフェノキシ(トリ-s-ブトキシシロキシ)ジルコニウム;
トリメトキシ(トリ-t-ブトキシシロキシ)ジルコニウム、トリエトキシ(トリ-t-ブトキシシロキシ)ジルコニウム、トリプロポキシ(トリ-t-ブトキシシロキシ)ジルコニウム、トリイソプロポキシ(トリ-t-ブトキシシロキシ)ジルコニウム、トリ-n-ブトキシ(トリ-t-ブトキシシロキシ)ジルコニウム、トリイソブトキシ(トリ-t-ブトキシシロキシ)ジルコニウム、トリ-s-ブトキシ(トリ-t-ブトキシシロキシ)ジルコニウム、トリ-t-ブトキシ(トリ-t-ブトキシシロキシ)ジルコニウム、トリシクロヘキソキシ(トリ-t-ブトキシシロキシ)ジルコニウム、トリフェノキシ(トリ-t-ブトキシシロキシ)ジルコニウム;
トリメトキシ(トリシクロヘキシルシロキシ)ジルコニウム、トリエトキシ(トリシクロヘキシルシロキシ)ジルコニウム、トリプロポキシ(トリシクロヘキシルシロキシ)ジルコニウム、トリイソプロポキシ(トリシクロヘキシルシロキシ)ジルコニウム、トリブトキシ(トリシクロヘキシルシロキシ)ジルコニウム、トリイソブトキシ(トリシクロヘキシルシロキシ)ジルコニウム、トリ-s-ブトキシ(トリシクロヘキシルシロキシ)ジルコニウム、トリ-t-ブトキシ(トリシクロヘキシルシロキシ)ジルコニウム、トリシクロヘキソキシ(トリシクロヘキシルシロキシ)ジルコニウム、トリフェノキシ(トリシクロヘキシルシロキシ)ジルコニウム;
トリメトキシ(トリフェニルシロキシ)ジルコニウム、トリエトキシ(トリフェニルシロキシ)ジルコニウム、トリプロポキシ(トリフェニルシロキシ)ジルコニウム、トリイソプロポキシ(トリフェニルシロキシ)ジルコニウム、トリブトキシ(トリフェニルシロキシ)ジルコニウム、トリイソブトキシ(トリフェニルシロキシ)ジルコニウム、トリ-s-ブトキシ(トリフェニルシロキシ)ジルコニウム、トリ-t-ブトキシ(トリフェニルシロキシ)ジルコニウム、トリシクロヘキソキシ(トリフェニルシロキシ)ジルコニウム、トリフェノキシ(トリフェニルシロキシ)ジルコニウム;
などが挙げられ、n=2のものとしては、
ジメトキシビス(トリメチルシロキシ)ジルコニウム、ジエトキシビス(トリメチルシロキシ)ジルコニウム、ジプロポキシビス(トリメチルシロキシ)ジルコニウム、ジイソプロポキシビス(トリメチルシロキシ)ジルコニウム、ジブトキシビス(トリメチルシロキシ)ジルコニウム、ジイソブトキシビス(トリメチルシロキシ)ジルコニウム、ジ-s-ブトキシビス(トリメチルシロキシ)ジルコニウム、ジ-t-ブトキシビス(トリメチルシロキシ)ジルコニウム、ジシクロヘキソキシビス(トリメチルシロキシ)ジルコニウム、ジフェノキシビス(トリメチルシロキシ)ジルコニウム;
ジメトキシビス(トリエチルシロキシ)ジルコニウム、ジエトキシビス(トリエチルシロキシ)ジルコニウム、ジプロポキシビス(トリエチルシロキシ)ジルコニウム、ジイソプロポキシビス(トリエチルシロキシ)ジルコニウム、ジブトキシビス(トリエチルシロキシ)ジルコニウム、ジイソブトキシビス(トリエチルシロキシ)ジルコニウム、ジ-s-ブトキシビス(トリエチルシロキシ)ジルコニウム、ジ-t-ブトキシビス(トリエチルシロキシ)ジルコニウム、ジシクロヘキソキシビス(トリエチルシロキシ)ジルコニウム、ジフェノキシビス(トリエチルシロキシ)ジルコニウム;
ジメトキシビス(トリプロピルシロキシ)ジルコニウム、ジエトキシビス(トリプロピルシロキシ)ジルコニウム、ジプロポキシビス(トリプロピルシロキシ)ジルコニウム、ジイソプロポキシビス(トリプロピルシロキシ)ジルコニウム、ジブトキシビス(トリプロピルシロキシ)ジルコニウム、ジイソブトキシビス(トリプロピルシロキシ)ジルコニウム、ジ-s-ブトキシビス(トリプロピルシロキシ)ジルコニウム、ジ-t-ブトキシビス(トリプロピルシロキシ)ジルコニウム、ジシクロヘキソキシビス(トリプロピルシロキシ)ジルコニウム、ジフェノキシビス(トリプロピルシロキシ)ジルコニウム;
ジメトキシビス(トリイソプロピルシロキシ)ジルコニウム、ジエトキシビス(トリイソプロピルシロキシ)ジルコニウム、ジプロポキシビス(トリイソプロピルシロキシ)ジルコニウム、ジイソプロポキシビス(トリイソプロピルシロキシ)ジルコニウム、ジブトキシビス(トリイソプロピルシロキシ)ジルコニウム、ジイソブトキシビス(トリイソプロピルシロキシ)ジルコニウム、ジ-s-ブトキシビス(トリイソプロピルシロキシ)ジルコニウム、ジ-t-ブトキシビス(トリイソプロピルシロキシ)ジルコニウム、ジシクロヘキソキシビス(トリイソプロピルシロキシ)ジルコニウム、ジフェノキシビス(トリイソプロピルシロキシ)ジルコニウム;
ジメトキシビス(トリブチルシロキシ)ジルコニウム、ジエトキシビス(トリブチルシロキシ)ジルコニウム、ジプロポキシビス(トリブチルシロキシ)ジルコニウム、ジイソプロポキシビス(トリブチルシロキシ)ジルコニウム、ジブトキシビス(トリブチルシロキシ)ジルコニウム、ジイソブトキシビス(トリブチルシロキシ)ジルコニウム、ジ-s-ブトキシビス(トリブチルシロキシ)ジルコニウム、ジ-t-ブトキシビス(トリブチルシロキシ)ジルコニウム、ジシクロヘキソキシビス(トリブチルシロキシ)ジルコニウム、ジフェノキシビス(トリブチルシロキシ)ジルコニウム;
ジメトキシビス(トリイソブチルシロキシ)ジルコニウム、ジエトキシビス(トリイソブチルシロキシ)ジルコニウム、ジプロポキシビス(トリイソブチルシロキシ)ジルコニウム、ジイソプロポキシビス(トリイソブチルシロキシ)ジルコニウム、ジブトキシビス(トリイソブチルシロキシ)ジルコニウム、ジイソブトキシビス(トリイソブチルシロキシ)ジルコニウム、ジ-s-ブトキシビス(トリイソブチルシロキシ)ジルコニウム、ジ-t-ブトキシビス(トリイソブチルシロキシ)ジルコニウム、ジシクロヘキソキシビス(トリイソブチルシロキシ)ジルコニウム、ジフェノキシビス(トリイソブチルシロキシ)ジルコニウム;
ジメトキシビス(トリ-s-ブトキシシロキシ)ジルコニウム、ジエトキシビス(トリ-s-ブトキシシロキシ)ジルコニウム、ジプロポキシビス(トリ-s-ブトキシシロキシ)ジルコニウム、ジイソプロポキシビス(トリ-s-ブトキシシロキシ)ジルコニウム、ジブトキシビス(トリ-s-ブトキシシロキシ)ジルコニウム、ジイソブトキシビス(トリ-s-ブトキシシロキシ)ジルコニウム、ジ-s-ブトキシビス(トリ-s-ブトキシシロキシ)ジルコニウム、ジ-t-ブトキシビス(トリ-s-ブトキシシロキシ)ジルコニウム、ジシクロヘキソキシビス(トリ-s-ブトキシシロキシ)ジルコニウム、ジフェノキシビス(トリ-s-ブトキシシロキシ)ジルコニウム;
ジメトキシビス(トリ-t-ブトキシシロキシ)ジルコニウム、ジエトキシビス(トリ-t-ブトキシシロキシ)ジルコニウム、ジプロポキシビス(トリ-t-ブトキシシロキシ)ジルコニウム、ジイソプロポキシビス(トリ-t-ブトキシシロキシ)ジルコニウム、ジブトキシビス(トリ-t-ブトキシシロキシ)ジルコニウム、ジイソブトキシビス(トリ-t-ブトキシシロキシ)ジルコニウム、ジ-s-ブトキシビス(トリ-t-ブトキシシロキシ)ジルコニウム、ジ-t-ブトキシビス(トリ-t-ブトキシシロキシ)ジルコニウム、ジシクロヘキソキシビス(トリ-t-ブトキシシロキシ)ジルコニウム、ジフェノキシビス(トリ-t-ブトキシシロキシ)ジルコニウム;
ジメトキシビス(トリシクロヘキシルシロキシ)ジルコニウム、ジエトキシビス(トリシクロヘキシルシロキシ)ジルコニウム、ジプロポキシビス(トリシクロヘキシルシロキシ)ジルコニウム、ジイソプロポキシビス(トリシクロヘキシルシロキシ)ジルコニウム、ジ-n-ブトキシビス(トリシクロヘキシルシロキシ)ジルコニウム、ジイソブトキシビス(トリシクロヘキシルシロキシ)ジルコニウム、ジ-s-ブトキシビス(トリシクロヘキシルシロキシ)ジルコニウム、ジ-t-ブトキシビス(トリシクロヘキシルシロキシ)ジルコニウム、ジシクロヘキソキシビス(トリシクロヘキシルシロキシ)ジルコニウム、ジフェノキシビス(トリシクロヘキシルシロキシ)ジルコニウム;
ジメトキシビス(トリフェニルシロキシ)ジルコニウム、ジエトキシビス(トリフェニルシロキシ)ジルコニウム、ジプロポキシビス(トリフェニルシロキシ)ジルコニウム、ジイソプロポキシビス(トリフェニルシロキシ)ジルコニウム、ジブトキシビス(トリフェニルシロキシ)ジルコニウム、ジイソブトキシビス(トリフェニルシロキシ)ジルコニウム、ジ-s-ブトキシビス(トリフェニルシロキシ)ジルコニウム、ジ-t-ブトキシビス(トリフェニルシロキシ)ジルコニウム、ジシクロヘキソキシビス(トリフェニルシロキシ)ジルコニウム、ジフェノキシビス(トリフェニルシロキシ)ジルコニウム;
などが挙げられる。
メトキシジヒドロキシ(トリメチルシロキシ)チタン、エトキシジヒドロキシ(トリメチルシロキシ)チタン、プロポキシジヒドロキシ(トリメチルシロキシ)チタン、イソプロポキシジヒドロキシ(トリメチルシロキシ)チタン、ブトキシジヒドロキシ(トリメチルシロキシ)チタン、イソブトキシジヒドロキシ(トリメチルシロキシ)チタン、s-ブトキシジヒドロキシ(トリメチルシロキシ)チタン、t-ブトキシジヒドロキシ(トリメチルシロキシ)チタン、シクロヘキソキシジヒドロキシ(トリメチルシロキシ)チタン、フェノキシジヒドロキシ(トリメチルシロキシ)チタン;
メトキシジヒドロキシ(トリエチルシロキシ)チタン、エトキシジヒドロキシ(トリエチルシロキシ)チタン、プロポキシジヒドロキシ(トリエチルシロキシ)チタン、イソプロポキシジヒドロキシ(トリエチルシロキシ)チタン、ブトキシジヒドロキシ(トリエチルシロキシ)チタン、イソブトキシジヒドロキシ(トリエチルシロキシ)チタン、s-ブトキシジヒドロキシ(トリエチルシロキシ)チタン、t-ブトキシジヒドロキシ(トリエチルシロキシ)チタン、シクロヘキソキシジヒドロキシ(トリエチルシロキシ)チタン、フェノキシジヒドロキシ(トリエチルシロキシ)チタン;
メトキシジヒドロキシ(トリプロピルシロキシ)チタン、エトキシジヒドロキシ(トリプロピルシロキシ)チタン、プロポキシジヒドロキシ(トリプロピルシロキシ)チタン、イソプロポキシジヒドロキシ(トリプロピルシロキシ)チタン、ブトキシジヒドロキシ(トリプロピルシロキシ)チタン、イソブトキシジヒドロキシ(トリプロピルシロキシ)チタン、s-ブトキシジヒドロキシ(トリプロピルシロキシ)チタン、t-ブトキシジヒドロキシ(トリプロピルシロキシ)チタン、シクロヘキソキシジヒドロキシ(トリプロピルシロキシ)チタン、フェノキシジヒドロキシ(トリプロピルシロキシ)チタン;
メトキシジヒドロキシ(トリイソプロピルシロキシ)チタン、エトキシジヒドロキシ(トリイソプロピルシロキシ)チタン、プロポキシジヒドロキシ(トリイソプロピルシロキシ)チタン、イソプロポキシジヒドロキシ(トリイソプロピルシロキシ)チタン、ブトキシジヒドロキシ(トリイソプロピルシロキシ)チタン、イソブトキシジヒドロキシ(トリイソプロピルシロキシ)チタン、s-ブトキシジヒドロキシ(トリイソプロピルシロキシ)チタン、t-ブトキシジヒドロキシ(トリイソプロピルシロキシ)チタン、シクロヘキソキシジヒドロキシ(トリイソプロピルシロキシ)チタン、フェノキシジヒドロキシ(トリイソプロピルシロキシ)チタン;
メトキシジヒドロキシ(トリブチルシロキシ)チタン、エトキシジヒドロキシ(トリブチルシロキシ)チタン、プロポキシジヒドロキシ(トリブチルシロキシ)チタン、イソプロポキシジヒドロキシ(トリブチルシロキシ)チタン、ブトキシジヒドロキシ(トリブチルシロキシ)チタン、イソブトキシジヒドロキシ(トリブチルシロキシ)チタン、ブトキシジヒドロキシ(トリブチルシロキシ)チタン、t-ブトキシジヒドロキシ(トリブチルシロキシ)チタン、シクロヘキソキシジヒドロキシ(トリブチルシロキシ)チタン、フェノキシジヒドロキシ(トリブチルシロキシ)チタン;
メトキシジヒドロキシ(トリイソブチルシロキシ)チタン、エトキシジヒドロキシ(トリイソブチルシロキシ)チタン、プロポキシジヒドロキシ(トリイソブチルシロキシ)チタン、イソプロポキシジヒドロキシ(トリイソブチルシロキシ)チタン、ブトキシジヒドロキシ(トリイソブチルシロキシ)チタン、イソブトキシジヒドロキシ(トリイソブチルシロキシ)チタン、s-ブトキシジヒドロキシ(トリイソブチルシロキシ)チタン、t-ブトキシジヒドロキシ(トリイソブチルシロキシ)チタン、シクロヘキソキシジヒドロキシ(トリイソブチルシロキシ)チタン、フェノキシジヒドロキシ(トリイソブチルシロキシ)チタン;
メトキシジヒドロキシ(トリ-s-ブトキシシロキシ)チタン、エトキシジヒドロキシ(トリ-s-ブトキシシロキシ)チタン、プロポキシジヒドロキシ(トリ-s-ブトキシシロキシ)チタン、イソプロポキシジヒドロキシ(トリ-s-ブトキシシロキシ)チタン、ブトキシジヒドロキシ(トリ-s-ブトキシシロキシ)チタン、イソブトキシジヒドロキシ(トリ-s-ブトキシシロキシ)チタン、s-ブトキシジヒドロキシ(トリ-s-ブトキシシロキシ)チタン、t-ブトキシジヒドロキシ(トリ-s-ブトキシシロキシ)チタン、シクロヘキソキシジヒドロキシ(トリ-s-ブトキシシロキシ)チタン、フェノキシジヒドロキシ(トリ-s-ブトキシシロキシ)チタン;
メトキシジヒドロキシ(トリ-t-ブトキシシロキシ)チタン、エトキシジヒドロキシ(トリ-t-ブトキシシロキシ)チタン、プロポキシジヒドロキシ(トリ-t-ブトキシシロキシ)チタン、イソプロポキシジヒドロキシ(トリ-t-ブトキシシロキシ)チタン、ブトキシジヒドロキシ(トリ-t-ブトキシシロキシ)チタン、イソブトキシジヒドロキシ(トリ-t-ブトキシシロキシ)チタン、s-ブトキシジヒドロキシ(トリ-t-ブトキシシロキシ)チタン、t-ブトキシジヒドロキシ(トリ-t-ブトキシシロキシ)チタン、シクロヘキソキシジヒドロキシ(トリ-t-ブトキシシロキシ)チタン、フェノキシジヒドロキシ(トリ-t-ブトキシシロキシ)チタン;
メトキシジヒドロキシ(トリシクロヘキシルシロキシ)チタン、エトキシジヒドロキシ(トリシクロヘキシルシロキシ)チタン、プロポキシジヒドロキシ(トリシクロヘキシルシロキシ)チタン、イソプロポキシジヒドロキシ(トリシクロヘキシルシロキシ)チタン、ブトキシジヒドロキシ(トリシクロヘキシルシロキシ)チタン、イソブトキシジヒドロキシ(トリシクロヘキシルシロキシ)チタン、s-ブトキシジヒドロキシ(トリシクロヘキシルシロキシ)チタン、t-ブトキシジヒドロキシ(トリシクロヘキシルシロキシ)チタン、シクロヘキソキシジヒドロキシ(トリシクロヘキシルシロキシ)チタン、フェノキシジヒドロキシ(トリシクロヘキシルシロキシ)チタン;
メトキシジヒドロキシ(トリフェニルシロキシ)チタン、エトキシジヒドロキシ(トリフェニルシロキシ)チタン、プロポキシジヒドロキシ(トリフェニルシロキシ)チタン、イソプロポキシジヒドロキシ(トリフェニルシロキシ)チタン、ブトキシジヒドロキシ(トリフェニルシロキシ)チタン、イソブトキシジヒドロキシ(トリフェニルシロキシ)チタン、s-ブトキシジヒドロキシ(トリフェニルシロキシ)チタン、t-ブトキシジヒドロキシ(トリフェニルシロキシ)チタン、シクロヘキソキシジヒドロキシ(トリフェニルシロキシ)チタン、フェノキシジヒドロキシ(トリフェニルシロキシ)チタン;
などが挙げられ、y=3のものとしては、
トリヒドロキシ(トリメチルシロキシ)チタン、トリヒドロキシ(トリエチルシロキシ)チタン、トリヒドロキシ(トリプロピルシロキシ)チタン、トリヒドロキシ(トリイソプロピルシロキシ)チタン、トリヒドロキシ(トリブチルシロキシ)チタン、トリヒドロキシ(トリイソブチルシロキシ)チタン、トリヒドロキシ(トリ-s-ブトキシシロキシ)チタン、トリヒドロキシ(トリ-t-ブトキシシロキシ)チタン、トリヒドロキシ(トリシクロヘキシルシロキシ)チタン、トリヒドロキシ(トリフェニルシロキシ)チタン;
などが挙げられる。
メトキシジヒドロキシ(トリメチルシロキシ)ジルコニウム、エトキシジヒドロキシ(トリメチルシロキシ)ジルコニウム、プロポキシジヒドロキシ(トリメチルシロキシ)ジルコニウム、イソプロポキシジヒドロキシ(トリメチルシロキシ)ジルコニウム、ブトキシジヒドロキシ(トリメチルシロキシ)ジルコニウム、イソブトキシジヒドロキシ(トリメチルシロキシ)ジルコニウム、s-ブトキシジヒドロキシ(トリメチルシロキシ)ジルコニウム、t-ブトキシジヒドロキシ(トリメチルシロキシ)ジルコニウム、シクロヘキソキシジヒドロキシ(トリメチルシロキシ)ジルコニウム、フェノキシジヒドロキシ(トリメチルシロキシ)ジルコニウム;
メトキシジヒドロキシ(トリエチルシロキシ)ジルコニウム、エトキシジヒドロキシ(トリエチルシロキシ)ジルコニウム、プロポキシジヒドロキシ(トリエチルシロキシ)ジルコニウム、イソプロポキシジヒドロキシ(トリエチルシロキシ)ジルコニウム、ブトキシジヒドロキシ(トリエチルシロキシ)ジルコニウム、イソブトキシジヒドロキシ(トリエチルシロキシ)ジルコニウム、s-ブトキシジヒドロキシ(トリエチルシロキシ)ジルコニウム、t-ブトキシジヒドロキシ(トリエチルシロキシ)ジルコニウム、シクロヘキソキシジヒドロキシ(トリエチルシロキシ)ジルコニウム、フェノキシジヒドロキシ(トリエチルシロキシ)ジルコニウム;
メトキシジヒドロキシ(トリプロピルシロキシ)ジルコニウム、エトキシジヒドロキシ(トリプロピルシロキシ)ジルコニウム、プロポキシジヒドロキシ(トリプロピルシロキシ)ジルコニウム、イソプロポキシジヒドロキシ(トリプロピルシロキシ)ジルコニウム、ブトキシジヒドロキシ(トリプロピルシロキシ)ジルコニウム、イソブトキシジヒドロキシ(トリプロピルシロキシ)ジルコニウム、s-ブトキシジヒドロキシ(トリプロピルシロキシ)ジルコニウム、t-ブトキシジヒドロキシ(トリプロピルシロキシ)ジルコニウム、シクロヘキソキシジヒドロキシ(トリプロピルシロキシ)ジルコニウム、フェノキシジヒドロキシ(トリプロピルシロキシ)ジルコニウム;
メトキシジヒドロキシ(トリイソプロピルシロキシ)ジルコニウム、エトキシジヒドロキシ(トリイソプロピルシロキシ)ジルコニウム、プロポキシジヒドロキシ(トリイソプロピルシロキシ)ジルコニウム、イソプロポキシジヒドロキシ(トリイソプロピルシロキシ)ジルコニウム、ブトキシジヒドロキシ(トリイソプロピルシロキシ)ジルコニウム、イソブトキシジヒドロキシ(トリイソプロピルシロキシ)ジルコニウム、s-ブトキシジヒドロキシ(トリイソプロピルシロキシ)ジルコニウム、t-ブトキシジヒドロキシ(トリイソプロピルシロキシ)ジルコニウム、シクロヘキソキシジヒドロキシ(トリイソプロピルシロキシ)ジルコニウム、フェノキシジヒドロキシ(トリイソプロピルシロキシ)ジルコニウム;
メトキシジヒドロキシ(トリブチルシロキシ)ジルコニウム、エトキシジヒドロキシ(トリブチルシロキシ)ジルコニウム、プロポキシジヒドロキシ(トリブチルシロキシ)ジルコニウム、イソプロポキシジヒドロキシ(トリブチルシロキシ)ジルコニウム、ブトキシジヒドロキシ(トリブチルシロキシ)ジルコニウム、イソブトキシジヒドロキシ(トリブチルシロキシ)ジルコニウム、ブトキシジヒドロキシ(トリブチルシロキシ)ジルコニウム、t-ブトキシジヒドロキシ(トリブチルシロキシ)ジルコニウム、シクロヘキソキシジヒドロキシ(トリブチルシロキシ)ジルコニウム、フェノキシジヒドロキシ(トリブチルシロキシ)ジルコニウム;
メトキシジヒドロキシ(トリイソブチルシロキシ)ジルコニウム、エトキシジヒドロキシ(トリイソブチルシロキシ)ジルコニウム、プロポキシジヒドロキシ(トリイソブチルシロキシ)ジルコニウム、イソプロポキシジヒドロキシ(トリイソブチルシロキシ)ジルコニウム、ブトキシジヒドロキシ(トリイソブチルシロキシ)ジルコニウム、イソブトキシジヒドロキシ(トリイソブチルシロキシ)ジルコニウム、s-ブトキシジヒドロキシ(トリイソブチルシロキシ)ジルコニウム、t-ブトキシジヒドロキシ(トリイソブチルシロキシ)ジルコニウム、シクロヘキソキシジヒドロキシ(トリイソブチルシロキシ)ジルコニウム、フェノキシジヒドロキシ(トリイソブチルシロキシ)ジルコニウム;
メトキシジヒドロキシ(トリ-s-ブトキシシロキシ)ジルコニウム、エトキシジヒドロキシ(トリ-s-ブトキシシロキシ)ジルコニウム、プロポキシジヒドロキシ(トリ-s-ブトキシシロキシ)ジルコニウム、イソプロポキシジヒドロキシ(トリ-s-ブトキシシロキシ)ジルコニウム、ブトキシジヒドロキシ(トリ-s-ブトキシシロキシ)ジルコニウム、イソブトキシジヒドロキシ(トリ-s-ブトキシシロキシ)ジルコニウム、s-ブトキシジヒドロキシ(トリ-s-ブトキシシロキシ)ジルコニウム、t-ブトキシジヒドロキシ(トリ-s-ブトキシシロキシ)ジルコニウム、シクロヘキソキシジヒドロキシ(トリ-s-ブトキシシロキシ)ジルコニウム、フェノキシジヒドロキシ(トリ-s-ブトキシシロキシ)ジルコニウム;
メトキシジヒドロキシ(トリ-t-ブトキシシロキシ)ジルコニウム、エトキシジヒドロキシ(トリ-t-ブトキシシロキシ)ジルコニウム、プロポキシジヒドロキシ(トリ-t-ブトキシシロキシ)ジルコニウム、イソプロポキシジヒドロキシ(トリ-t-ブトキシシロキシ)ジルコニウム、ブトキシジヒドロキシ(トリ-t-ブトキシシロキシ)ジルコニウム、イソブトキシジヒドロキシ(トリ-t-ブトキシシロキシ)ジルコニウム、s-ブトキシジヒドロキシ(トリ-t-ブトキシシロキシ)ジルコニウム、t-ブトキシジヒドロキシ(トリ-t-ブトキシシロキシ)ジルコニウム、シクロヘキソキシジヒドロキシ(トリ-t-ブトキシシロキシ)ジルコニウム、フェノキシジヒドロキシ(トリ-t-ブトキシシロキシ)ジルコニウム;
メトキシジヒドロキシ(トリシクロヘキシルシロキシ)ジルコニウム、エトキシジヒドロキシ(トリシクロヘキシルシロキシ)ジルコニウム、プロポキシジヒドロキシ(トリシクロヘキシルシロキシ)ジルコニウム、イソプロポキシジヒドロキシ(トリシクロヘキシルシロキシ)ジルコニウム、ブトキシジヒドロキシ(トリシクロヘキシルシロキシ)ジルコニウム、イソブトキシジヒドロキシ(トリシクロヘキシルシロキシ)ジルコニウム、s-ブトキシジヒドロキシ(トリシクロヘキシルシロキシ)ジルコニウム、t-ブトキシジヒドロキシ(トリシクロヘキシルシロキシ)ジルコニウム、シクロヘキソキシジヒドロキシ(トリシクロヘキシルシロキシ)ジルコニウム、フェノキシジヒドロキシ(トリシクロヘキシルシロキシ)ジルコニウム;
メトキシジヒドロキシ(トリフェニルシロキシ)ジルコニウム、エトキシジヒドロキシ(トリフェニルシロキシ)ジルコニウム、プロポキシジヒドロキシ(トリフェニルシロキシ)ジルコニウム、イソプロポキシジヒドロキシ(トリフェニルシロキシ)ジルコニウム、ブトキシジヒドロキシ(トリフェニルシロキシ)ジルコニウム、イソブトキシジヒドロキシ(トリフェニルシロキシ)ジルコニウム、s-ブトキシジヒドロキシ(トリフェニルシロキシ)ジルコニウム、t-ブトキシジヒドロキシ(トリフェニルシロキシ)ジルコニウム、シクロヘキソキシジヒドロキシ(トリフェニルシロキシ)ジルコニウム、フェノキシジヒドロキシ(トリフェニルシロキシ)ジルコニウム;
などが挙げられ、y=3のものとしては、
トリヒドロキシ(トリメチルシロキシ)ジルコニウム、トリヒドロキシ(トリエチルシロキシ)ジルコニウム、トリヒドロキシ(トリプロピルシロキシ)ジルコニウム、トリヒドロキシ(トリイソプロピルシロキシ)ジルコニウム、トリヒドロキシ(トリブチルシロキシ)ジルコニウム、トリヒドロキシ(トリイソブチルシロキシ)ジルコニウム、トリヒドロキシ(トリ-s-ブトキシシロキシ)ジルコニウム、トリヒドロキシ(トリ-t-ブトキシシロキシ)ジルコニウム、トリヒドロキシ(トリシクロヘキシルシロキシ)ジルコニウム、トリヒドロキシ(トリフェニルシロキシ)ジルコニウム;
などが挙げられる。
一般式(2)で表される化合物の製造方法に特に制限はないが、例えば、R5が炭素数1~12のアルキル基の場合、金属アルコキシドと、下記一般式(4)で表される化合物を、nが1,2または3の化合物が得られるように所定のモル比で反応させることにより得ることができる。
一般式(2)で表される化合物の加水分解ならびに部分縮合および重合には一般的な方法を用いることができる。例えば、加水分解の反応条件は、溶媒中、一般式(2)で表される化合物に水を1~180分かけて添加した後、室温~110℃で1~180分反応させることが好ましい。このような条件で加水分解反応を行うことにより、急激な反応を抑制することができる。反応温度は、30~150℃が好ましい。また必要に応じて触媒を添加してもよい。
本発明のポリメタロキサンは、溶剤やその他必要な成分と混合して組成物とすることができる。
本発明のポリメタロキサンまたはそれを含む組成物は、加熱することにより硬化膜とすることができる。このようにして得られた硬化膜は、電子密度の高い金属原子を主鎖に有する樹脂を主体とする硬化膜となるため、硬化膜中における金属原子の密度の高くすることができ、容易に高い屈折率を得ることができる。また、自由電子を有さない誘電体となることから、高い透明性および耐熱性を得ることができる。
光透過率=exp(-4πkt/λ)
ただし、kは消衰係数、tは換算膜厚(μm)、λは測定波長(nm)を表す。なお本測定では1μm換算の光透過率を求めるため、tは1(μm)とする。
上述の硬化膜は屈折率、透明性に優れるため、固体撮像素子、光学フィルター、ディスプレイ等の電子部品に好適に用いられる。より具体的には、裏面照射型CMOSイメージセンサーなどの固体撮像素子等に形成される集光用マイクロレンズや光導波路、光学フィルターとして設置される反射防止膜、ディスプレイ用TFT基板の平坦化材、液晶ディスプレイ等のカラーフィルターおよびその保護膜、位相シフター等が挙げられる。
本発明のポリメタロキサンまたはその組成物から得られる硬化膜は、高い透明性と高い屈折率を両立できることから、スマートフォンやタブレット端末に用いられるタッチセンサー部材に好適に用いられる。より具体的には、センサー形成に用いられる透明導電膜の上部又は下部に形成される絶縁層薄膜が挙げられる。
本発明のポリメタロキサンから得られる硬化膜は、屈折率、透明性に優れるため、レンズに好適に用いられる。より具体的には、裏面照射型CMOSイメージセンサーなどの固体撮像素子等に形成される集光用マイクロレンズに好適に用いることができる。
本発明のポリメタロキサンから得られる硬化膜は、有機EL素子、有機EL照明用途として好適に用いられる。より具体的には、有機EL素子あるいは有機EL照明に用いられる透明導電膜の上部または下部に形成される絶縁層薄膜が挙げられる。
本発明のメタロキサンは、塗布し、硬化することにより、金属酸化膜とすることができるため、建材に用いることができる。より具体的には、難燃材、親水性付与材が挙げられる。難燃剤としては、本発明のポリメタロキサンは、不燃層となるため、燃焼の遮断効果で、難燃性を付与することができる。また、建材表面に本発明のポリメタロキサンをコートすることにより、親水性の高い膜を形成することができるため、防汚効果が期待できる。
本発明のポリメタロキサンは、放射性核種ジェネレータ用途に用いることができる。具体的には、本発明のポリメタロキサンが充填されたカラムを具備する放射性核種ジェネレータである。
容量500mlの三口フラスコに、テトラブトキシチタンを34.0g(0.1mol)仕込み、フラスコを40℃のオイルバスに浸けて30分間撹拌した。その後、滴下ロートを用いてトリメチルシラノール9.0g(0.1mol)を1時間かけて添加し、添加後さらに1時間撹拌した。フラスコ内容物を200mlナス型フラスコに移し、生成したブタノールを減圧留去することにより、無色液体のチタン化合物(T1)を得た。
容量500mlの三口フラスコに、テトライソプロポキシチタンを28.4g(0.1mol)仕込み、フラスコを40℃のオイルバスに浸けて30分間撹拌した。その後、滴下ロートを用いてトリメチルシラノール9.0g(0.1mol)を1時間かけて添加し、添加後さらに1時間撹拌した。フラスコ内容物を200mlナス型フラスコに移し、生成したイソプロパノールを減圧留去することにより、無色液体のチタン化合物(T2)を得た。
容量500mlの三口フラスコに、テトラ-t-ブトキシチタンを34.0g(0.1mol)仕込み、フラスコを40℃のオイルバスに浸けて30分間撹拌した。その後、滴下ロートを用いてトリメチルシラノール9.0g(0.1mol)を1時間かけて添加し、添加後さらに1時間撹拌した。フラスコ内容物を200mlナス型フラスコに移し、生成したt-ブタノールを減圧留去することにより、無色液体のチタン化合物(T3)を得た。
容量500mlの三口フラスコに、テトラブトキシチタンを34.0g(0.1mol)仕込み、フラスコを40℃のオイルバスに浸けて30分間撹拌した。その後、滴下ロートを用いてトリエチルシラノール13.3g(0.1mol)を1時間かけて添加し、添加後さらに1時間撹拌した。フラスコ内容物を200mlナス型フラスコに移し、生成したブタノールを減圧留去することにより、無色液体のチタン化合物(T4)を得た。
このチタン化合物(T4)をFT-IRにて分析すると、Ti-O-Siの吸収ピーク(958cm-1)が生成し、シラノールの吸収(883cm-1)が存在しなかったことから、得られたチタン化合物(T4)がトリブトキシ(トリエチルシロキシ)チタンであることを確認した。
容量500mlの三口フラスコに、テトラブトキシチタンを34.0g(0.1mol)仕込み、フラスコを40℃のオイルバスに浸けて30分間撹拌した。その後、滴下ロートを用いてトリメチルシラノール18.0g(0.2mol)を1時間かけて添加し、添加後さらに1時間撹拌した。フラスコ内容物を200mlナス型フラスコに移し、生成したブタノールを減圧留去することにより、無色液体のチタン化合物(T5)を得た。
容量500mlの三口フラスコに、テトラブトキシチタンを34.0g(0.1mol)仕込み、フラスコを40℃のオイルバスに浸けて30分間撹拌した。その後、滴下ロートを用いてトリメチルシラノール27.1g(0.3mol)を1時間かけて添加し、添加後さらに1時間撹拌した。フラスコ内容物を200mlナス型フラスコに移し、生成したブタノールを減圧留去することにより、無色液体のチタン化合物(T6)を得た。
容量500mlの三口フラスコに、テトラブトキシジルコニウムを38.4g(0.1mol)仕込み、フラスコを40℃のオイルバスに浸けて30分間撹拌した。その後、滴下ロートを用いてトリメチルシラノール9.0g(0.1mol)を1時間かけて添加し、添加後さらに1時間撹拌した。フラスコ内容物を200mlナス型フラスコに移し、生成したブタノールを減圧留去することにより、無色液体のジルコニウム化合物(Z1)を得た。
容量500mlの三口フラスコに、テトラプロポキシジルコニウムを32.8g(0.1mol)仕込み、フラスコを40℃のオイルバスに浸けて30分間撹拌した。その後、滴下ロートを用いてトリメチルシラノール9.0g(0.1mol)を1時間かけて添加し、添加後さらに1時間撹拌した。フラスコ内容物を200mlナス型フラスコに移し、生成したプロパノールを減圧留去することにより、無色液体のジルコニウム化合物(Z2)を得た。
容量500mlの三口フラスコに、テトラブトキシジルコニウムを38.4g(0.1mol)仕込み、フラスコを40℃のオイルバスに浸けて30分間撹拌した。その後、滴下ロートを用いてトリエチルシラノール18.0g(0.1mol)を1時間かけて添加し、添加後さらに1時間撹拌した。フラスコ内容物を200mlナス型フラスコに移し、生成したブタノールを減圧留去することにより、無色液体のジルコニウム化合物(Z3)を得た。
容量500mlの三口フラスコに、テトラブトキシジルコニウムを38.4g(0.1mol)仕込み、フラスコを40℃のオイルバスに浸けて30分間撹拌した。その後、滴下ロートを用いてトリメチルシラノール18.0g(0.2mol)を1時間かけて添加し、添加後さらに1時間撹拌した。フラスコ内容物を200mlナス型フラスコに移し、生成したブタノールを減圧留去することにより、無色液体のジルコニウム化合物(Z4)を得た。
容量500mlの三口フラスコに、チタン化合物(T1)を35.6g(0.1mol)、および溶剤としてプロピレングリコールモノメチルエーテルアセテート(以下、PGMEAと略す)を50.0g仕込み、フラスコを40℃のオイルバスに浸けて30分間撹拌した。その後、加水分解を目的として水1.8g(0.1mol)を滴下ロートに充填し、1時間かけてフラスコ内に添加した。水の添加中、フラスコ内容液に析出は生じず、均一な無色透明溶液であった。添加後さらに1時間撹拌した。
容量500mlの三口フラスコに、表2に示すチタン化合物および溶剤を仕込み、合成例11と同様に攪拌した。その後、表2に示す量の水を合成例11と同様に添加し、加水分解を行った。水の添加中におけるフラスコ内容液に外観を表2に示す。また、合成例11と同様に副生成物であるアルコールを減圧留去し、FT-IRにて分析した結果を表2に示す。
容量500mlの三口フラスコに、ジルコニウム化合物(Z1)を40.0g(0.1mol)、および溶剤としてPGMEAを50.0g仕込み、フラスコを40℃のオイルバスに浸けて30分間撹拌した。その後、加水分解を目的として水1.8g(0.1mol)を滴下ロートに充填し、1時間かけてフラスコ内に添加した。水の添加中、フラスコ内容液に析出は生じず、均一な無色透明溶液であった。添加後さらに1時間撹拌した。
容量500mlの三口フラスコに、表3に示すジルコニウム化合物および溶剤を仕込み、合成例26と同様に攪拌した。その後、表3に示す量の水を合成例26と同様に添加し、加水分解を行った。水の添加中におけるフラスコ内容液に外観を表3に示す。また、合成例26と同様に副生成物であるアルコールを減圧留去し、FT-IRにて分析した結果を表3に示す。
チタン化合物(T1)を35.6g(0.1mol)、および溶媒としてプロピレングリコールモノメチルエーテルアセテート(以下、PGMEAと略す)を50.0g混合し、これを溶液1とした。また、水を1.8g(0.1mol)、水希釈溶媒としてイソプロピルアルコール(以下、IPAと略す)を50.0g、および重合触媒としてトリブチルアミンを2.2g(0.01mol)混合し、これを溶液2とした。
チタン化合物(T1)を35.6g(0.1mol)、および溶媒としてPGMEAを50.0g混合し、これを溶液1とした。また、水を3.6g(0.2mol)、水希釈溶媒としてIPAを50.0g、および重合触媒としてトリブチルアミンを2.2g(0.01mol)混合し、これを溶液2とした。
チタン化合物(T1)を35.6g(0.1mol)、および溶媒としてPGMEAを50.0g混合し、これを溶液1とした。また、水を3.6g(0.2mol)、水希釈溶媒としてIPAを50.0g、および重合触媒としてジイソブチルアミンを1.3g(0.01mol)混合し、これを溶液2とした。
チタン化合物(T1)を35.6g(0.1mol)、および溶媒としてPGMEAを50.0g混合し、これを溶液1とした。また、水を3.6g(0.2mol)、および水希釈溶媒としてIPAを50.0g混合し、これを溶液2とした。
チタン化合物(T1)を35.6g(0.1mol)、および溶媒としてPGMEAを50.0g混合し、これを溶液1とした。また、水を5.4g(0.3mol)、水希釈溶媒としてIPAを50.0g、および重合触媒としてトリブチルアミンを2.2g(0.01mol)混合し、これを溶液2とした。
チタン化合物(T1)を35.6g(0.1mol)、および溶媒としてPGMEAを50.0g混合し、これを溶液1とした。また、水を5.4g(0.3mol)、水希釈溶媒としてIPAを50.0g、および重合触媒としてジイソブチルアミンを1.3g(0.01mol)混合し、これを溶液2とした。
チタン化合物(T2)を31.4g(0.1mol)、および溶媒としてPGMEAを50.0g混合し、これを溶液1とした。また、水を5.4g(0.3mol)、水希釈溶媒としてIPAを50.0g、および重合触媒としてトリブチルアミンを2.2g(0.01mol)混合し、これを溶液2とした。
チタン化合物(T4)を39.8g(0.1mol)、および溶媒としてPGMEAを50.0g混合し、これを溶液1とした。また、水を5.4g(0.3mol)、水希釈溶媒としてIPAを50.0g、および重合触媒としてトリブチルアミンを2.2g(0.01mol)混合し、これを溶液2とした。
チタン化合物(T5)を37.2g(0.1mol)、および溶媒としてPGMEAを50.0g混合し、これを溶液1とした。また、水を3.6g(0.2mol)、水希釈溶媒としてIPAを50.0g、および重合触媒としてトリブチルアミンを2.2g(0.01mol)混合し、これを溶液2とした。
チタン化合物(T2-H3)溶液を68.81g(トリヒドロキシ(トリメチルシロキシ)チタンとして18.81g(0.1mol)、PGMEA50.0gにより構成される)を秤量し、これを溶液1とした。また、希釈溶媒としてIPAを50.0g、および重合触媒としてトリブチルアミンを2.2g(0.01mol)混合し、これを溶液2とした。
チタン化合物(T2-H2)溶液を73.02g((イソプロポキシ)(ジヒドロキシ)(トリメチルシロキシ)チタンとして18.81g(0.1mol)、PGMEA50.0gにより構成される)を秤量し、これを溶液1とした。また、水を1.8g(0.1mol)、希釈溶媒としてIPAを50.0g、および重合触媒としてトリブチルアミンを2.2g(0.01mol)混合し、これを溶液2とした。
実施例7の溶剤であるPGMEAを、1,2-ジエトキシエタンに変えた以外は、実施例7と同様に合成、および固形分調整を行い、ポリメタロキサン(TP-12)溶液を得た。得られたポリメタロキサン(TP-12)溶液の外観は、淡黄色透明であった。
実施例7の溶剤であるPGMEAを、2,6-ジメチル-4-ヘプタノンに変えた以外は、実施例7と同様に合成、および固形分調整を行い、ポリメタロキサン(TP-13)を得た。得られたポリメタロキサン(TP-13溶液の外観は、淡黄色透明であった。
ジルコニウム化合物(Z-1)40.0g(0.1mol)、および溶媒としてPGMEAを50.0g混合し、これを溶液1とした。また、水を5.4g(0.3mol)、水希釈溶媒としてIPAを50.0g、および重合触媒としてトリブチルアミンを2.2g(0.01mol)混合し、これを溶液2とした。
ジルコニウム化合物(Z-4)41.6g(0.1mol)、および溶媒としてPGMEAを50.0g混合し、これを溶液1とした。また、水を3.6g(0.2mol)、水希釈溶媒としてIPAを50.0g、および重合触媒としてトリブチルアミンを2.2g(0.01mol)混合し、これを溶液2とした。
ジルコニウム化合物(Z1-H3)溶液を73.1g(トリヒドロキシ(トリメチルシロキシ)ジルコニウムg(0.1mol)、PGMEA50.0gにより構成される)を秤量し、これを溶液1とした。また、希釈溶媒としてIPAを50.0g、および重合触媒としてトリブチルアミンを2.2g(0.01mol)混合し、これを溶液2とした。
容量500mlの三口フラスコに、テトラブトキシチタン34.0g(0.1mol)を仕込み、フラスコを75℃のオイルバスに浸けて30分間撹拌した(内温は70℃)。その後、加水分解を目的として水3.1g(0.17mol)とブタノール50gの混合溶液を滴下ロートで1時間かけて添加した。添加中、その後、90℃に昇温し1時間撹拌保持して反応を熟成した。
容量500mlの三口フラスコに、テトラブトキシチタン34.0g(0.1mol)、および溶剤として100gのエタノールを仕込み、フラスコを40℃のオイルバスにつけて30分間攪拌した。その後、加水分解を目的として水2.7g(0.15mol)とt-ブチルヒドラジン塩酸塩0.25g(0.002モル)およびエタノール50gの混合溶液を滴下ロートに充填し、1時間かけてフラスコ内に添加した。添加後、PGMEAを50g加え、さらに1時間撹拌した。その後、重縮合を目的として、オイルバスを30分間かけて140℃まで昇温した。昇温開始1時間後に溶液の内温が100℃に到達し、そこから2時間加熱撹拌した(内温は100~130℃)。反応中に、副生成物であるブタノールおよび水が留出した。
容量500mlの三口フラスコに、2-アントラセニルトリメトキシシランを20.9g(0.07mol)、4-ヒドロキシベンジルトリメトキシシランを6.8g(0.03mol)および溶剤としてPGMEAを50.0g仕込み、撹拌しながら加水分解を目的として水5.4g(0.3mol)とリン酸0.2gの混合溶液を滴下ロートで1時間かけて添加した。その後、フラスコを40℃のオイルバスに浸けて60分間撹拌した後、オイルバスを30分間かけて120℃まで昇温した。昇温開始1時間後に溶液の内温が100℃に到達し、そこから2時間加熱撹拌した(内温は100~110℃)。反応中に副生成物であるメタノール、水が留出した。
容量500mlの三口フラスコに、メチルトリメトキシシランを4.1g(0.03mol)、フェニルトリメトキシシランを13.9g(0.07mol)、数平均粒子系15nmの“オプトレイクTR-527”(商品名、触媒化成工業(株)製 組成:酸化チタン粒子20重量%、メタノール80重量%)を315g、および溶剤としてPGMEAを50.0g仕込み、撹拌しながら加水分解を目的として水5.4g(0.3mol)とリン酸0.2gの混合溶液を滴下ロートで1時間かけて添加した。その後、フラスコを40℃のオイルバスに浸けて60分間撹拌した後、オイルバスを30分間かけて120℃まで昇温した。昇温開始1時間後に溶液の内温が100℃に到達し、そこから2時間加熱撹拌した(内温は100~110℃)。反応中に副生成物であるメタノール、水が留出した。
(1)硬化膜の作成
ポリメタロキサン(TP-1)溶液を4インチシリコンウェハーおよびテンパックスガラス板にそれぞれスピンコーター(ミカサ(株)製1H-360S)を用いてスピン塗布した後、ホットプレート(大日本スクリ-ン製造(株)製SCW-636)を用いて100℃で3分間加熱し、プリベーク膜を作成した。その後、ホットプレートを用いて300℃で5分間キュアして膜厚0.3μmおよび0.5μmの硬化膜を作成した。なお、膜厚は、光干渉式膜厚計(大日本スクリ-ン製造(株)製ラムダエ-スSTM602)を用いて、測定した。
(1)で得られた硬化膜の耐クラック性について、下記5段階で評価した。4以上を合格とした。
5 : 光学顕微鏡観察(倍率:5倍)においてクラックが見えない
4 : 光学顕微鏡観察(倍率:5倍)においてわずかにクラックが見える
3 : 光学顕微鏡観察(倍率:5倍)においてはっきりクラックが見える
2 : 通常の目視でわずかにクラックが見える
1 : 通常の目視ではっきりクラックが見える。
(1)でシリコンウェハー上に作成した膜厚0.3μmの硬化膜について、測定時の温度は22℃とし、分光エリプソメーター(大塚電子(株)製FE5000)を用いて硬化膜からの反射光の偏光状態変化を測定し、入射光との位相差と振幅反射率のスペクトルを得た。得られたスペクトルに近づくように計算モデルの誘電関数をフィッティングすることにより、屈折率スペクトルが得られた。屈折率スペクトルから、波長550nmにおける屈折率値を読み取ることにより、硬化膜の屈折率とした。
分光光度計(島津製作所製MultiSpec-1500)を用いて、テンパックスガラス板の紫外可視吸収スペクトルを測定し、これをリファレンスとした。次いで、(1)でテンパックスガラス板上に作成した膜厚0.3μmの硬化膜の紫外可視吸収スペクトルを測定し、リファレンスとの差異により、硬化膜の紫外可視吸収スペクトルを算出した。得られた紫外可視吸収スペクトルと膜厚を用いて、硬化膜の波長400nmにおける膜厚1μmあたりの光透過率を算出した。
表5に示した溶液につき、実施例17と同様にして、(1)硬化膜の作成、(2)硬化膜の耐クラック性評価、(3)硬化膜の屈折率測定、(4)硬化膜の透過率測定を行った。評価結果を表5に示した。
ポリメタロキサン(TP-5)溶液3.5g(固形分重量0.7g)と酸化ケイ素-酸化チタン複合粒子である “オプトレイクTR-513”(商品名、触媒化成工業(株)製、固形分濃度30%γ-ブチロラクトン分散液)を1.0g(固形分重量0.3g)を混合し、組成物1を調製した。実施例17と同様にして、(1)硬化膜の作成、(2)硬化膜の耐クラック性評価、(3)硬化膜の屈折率測定、(4)硬化膜の透過率測定を行った。評価結果を表5に示した。
透明下地基材の上面に、透明導電膜(I)、ポリメタロキサン硬化膜(II)、酸化ケイ素薄膜(III)および/または透明粘着薄膜(IV)が積層されている部位を有する部材を作成し、(5)透明導電膜視認性評価を行った。
(5a)部材の作製
(5a-1)透明導電膜パターンの作製
透明下地基材となる厚さ1.1mmの化学強化ガラス基板上に、透明導電膜(I)となるITOをターゲットとしてスパッタリングを行い、膜厚50nmのITOを成膜した。次いで、透明導電膜(I)上にポジ型フォトレジスト(OFPR-800;東京応化工業(株)製)をスピンコーター(1H-360S;ミカサ(株)製)を用いてスピンコートした後、ホットプレート(SCW-636;大日本スクリーン製造(株)製)を用いて100℃で2分間加熱し、プリベーク膜とした。得られたフォトレジストのプリベーク膜に、PLAを用いて超高圧水銀灯を光源として、マスクを介して100μmのギャップで1000J/m2露光した。その後、自動現像装置(AD-2000;滝沢産業(株)製)を用いて、2.38wt%水酸化テトラメチルアンモニウム(以下、TMAHと略す)水溶液で90秒間シャワー現像し、次いで水で30秒間リンスし、フォトレジストのパターン加工を施した。その後、HCl-HNO3系のエッチング液でITOをエッチングし、剥離液でフォトレジストを除去し、第一電極とそれと直交する第二電極の一部がパターン加工されたITO(図1及び図2の符号2)を有する基板を作製した(図1のaに相当)。
(5a-1)で得られた基板上にネガ型感光性樹脂組成物NS-E2000(東レ(株)製)をスピンコートした後、ホットプレートを用いて90℃で2分間加熱し、プリベーク膜を作成した。得られたプリベーク膜に、マスクを介して100μmのギャップで2000J/m2露光した。その後、0.4wt%TMAH水溶液で90秒間シャワー現像し、次いで水で30秒間リンスした。次に、空気中230℃で1時間キュアを行い、膜厚1.5μmの透明絶縁膜(図1及び図2の符号3)を作製した(図1のbに相当)。
(5a-2)で得られた基板上に、ターゲットとしてモリブデン及びアルミニウムを用い、エッチング液としてH3PO4/HNO3/CH3COOH/H2O=65/3/5/27(重量比)混合溶液を用いる以外は、上記(5a-1)と同様の手順によりMAM配線(図1及び図2の符号4)を作製した(図1のcに相当)。またMAMの膜厚は、250nmになるように調整した。
(5a-3)で得られた基板上に、ポリメタロキサン(TP-1)溶液をインクジェット塗布装置によりパターン塗布した後、ホットプレートを用いて90℃で2分間プリベークした。次に、空気中230℃で1時間キュアを行い、ポリメタロキサン(TP-1)硬化膜(II)(図2の符号5)を作製した。
高速プラズマCVD成膜装置(PD-270STL;サムコ(株)製)を用い、テトラエトキシシランを原料として酸化ケイ素薄膜(III)(図2の符号6)を形成した。その際に、酸化ケイ素薄膜(III)とポリメタロキサン含有組成物を含む薄膜(II)とのパターンが重なるようにマスク成膜を実施した。酸化ケイ素薄膜(III)の膜厚は、0.5μmであった。
(5a-5)で得られた基板上の一部に、粘着剤とその反対面にハードコートを具備するPETフィルム(HA-116;リンテック(株)製、粘着剤屈折率=1.47)を、空気が噛み込まないようにして貼り合わせ、透明粘着層(IV)を形成した。
(5a-6)で得られた基板の裏面側からの観察し、透明導電膜の視認性について、下記10段階で評価した。なお、6以上を合格とした。
10: 白色蛍光灯3cm下において凝視で全くパターンが見えない
9 : 白色蛍光灯3cm下において凝視でわずかにパターンが見える。
8 : 白色蛍光灯3cm下において凝視で少しパターンが見える。
7 : 白色蛍光灯3cm下において凝視ではっきりパターンが見える。
6 : 白色蛍光灯3cm下において通常の目視でわずかにパターンが見える。
5 : 白色蛍光灯3cm下において通常の目視で少しパターンが見える。
4 : 白色蛍光灯3cm下において通常の目視ではっきりパターンが見える。
3 : 室内灯下において通常の目視でわずかにパターンが見える。
2 : 室内灯下において通常の目視で少しパターンが見える。
1 : 室内灯下において通常の目視ではっきりパターンが見える。
下地金属として全面にMAMを具備するガラス上に、上記(5a-4)記載の方法で、ポリメタロキサン硬化膜(II)を形成し、次いで、上記(5a-5)記載の方法で、酸化ケイ素薄膜(III)を形成した。次いで、温度121℃、湿度100%、気圧=2atmのオーブン(HAST CHAMBERE EHS-221MD;エスペック株式会社製)内に放置する試験(プレッシャークッカークッカーテスト、PCT試験)を20時間行った後、硬化膜下のMAMが腐食によって変色する欠点の占有面積割合を、目視によって下記11段階で評価した。7以上を合格とした。
10:硬化膜下のMAMの変色面積割合が0%。硬化膜自体の外観変化なし。
9:硬化膜下のMAMの変色面積割合が1~3%。硬化膜自体の外観変化なし。
8:硬化膜下のMAMの変色面積割合が4~6%。硬化膜自体の外観変化なし。
7:硬化膜下のMAMの変色面積割合が7~9%。硬化膜自体の外観変化なし。
6:硬化膜下のMAMの変色面積割合が10~15%。硬化膜自体の外観変化なし。
5:硬化膜下のMAMの変色面積割合が16~20%。硬化膜自体の外観変化なし。
4:硬化膜下のMAMの変色面積割合が21~30%。硬化膜自体の外観変化なし。
3:硬化膜下のMAMの変色面積割合が31~50%。硬化膜自体の外観変化なし。
2:硬化膜下のMAMの変色面積割合が51~70%。硬化膜自体の外観変化なし。
1:硬化膜下のMAMの変色面積割合が71~100%。硬化膜自体の外観変化なし。
0:硬化膜下のMAMの変色面積割合が100%。かつ、硬化膜自体に変色、クラック等が発生。
表6に示す構成で、実施例34と同様の手法により、(5)透明導電膜視認性評価、および(6)下地金属評価を行った。評価結果を表6に示した。
(5a-3)ポリメタロキサン硬化膜(II)形成において、ポリメタロキサン(TP-1)溶液に代えて、実施例33で調整した組成物1を用いた以外は、実施例34と同様の手法により、(5)透明導電膜視認性評価、および(6)下地金属評価を行った。評価結果を表6に示した。
(5a-5)酸化ケイ素薄膜(III)を形成する工程を行わなかった以外は、実施例40と同様の手法により、(5)透明導電膜視認性評価、および(6)下地金属評価を行った。評価結果を表6に示した。
(5a-6)透明粘着剤付きフィルムを貼り合わせる工程を行わなかった以外は、実施例40と同様の手法により、(5)透明導電膜視認性評価、および(6)下地金属評価を行った。評価結果を表6に示した。
(5a-1)透明導電膜パターンの作製において、化学強化ガラス基板の代わりに厚さ0.2mmのポリエチレンテレフタラート(以下、PETと略す)基材を用いた以外は、実施例40と同様の手法により、(5)透明導電膜視認性評価を行った。評価結果を表6に示した。
(5a-4)ポリメタロキサン硬化膜(II)を形成する工程を行わなかった以外は、実施例40と同様の手法により、(5)透明導電膜視認性評価、および(6)下地金属評価を行った。評価結果を表6に示した。
基板上に作成したポリメタロキサン硬化膜のドライエッチングを行い、ドライエッチング後の表面粗さRaおよび光透過率を測定した。詳細は、下記に示す。測定結果を表6に示した。
ポリメタロキサン(TP-05)溶液を6インチシリコンウェハーおよびテンパックスガラス板にそれぞれスピンコーター(ミカサ(株)製1H-360S)を用いてスピン塗布した後、ホットプレート(大日本スクリーン製造(株)製SCW-636)を用いて100℃で3分間加熱し、プリベーク膜を作成した。その後、ホットプレートを用いて300℃で5分間キュアして膜厚0.5μmの硬化膜を作成した。なお、膜厚は、光干渉式膜厚計(大日本スクリーン製造(株)製ラムダエースSTM602)を用いて、測定した。
シリコンウェハー上に作成した硬化膜について、測定時の温度は22℃とし、分光エリプソメーター(大塚電子(株)製FE5000)を用いて硬化膜からの反射光の偏光状態変化を測定し、入射光との位相差と振幅反射率のスペクトルを得た。得られたスペクトルに近づくように計算モデルの誘電関数をフィッティングすることにより、屈折率スペクトルが得られた。屈折率スペクトルから、波長550nmにおける屈折率値を読み取ることにより、硬化膜の屈折率とした。
分光光度計(島津製作所製MultiSpec-1500)を用いて、テンパックスガラス板の紫外可視吸収スペクトルを測定し、これをリファレンスとした。次いで、テンパックスガラス板上に作成した硬化膜の紫外可視吸収スペクトルを測定し、リファレンスとの差異により、硬化膜の紫外可視吸収スペクトルを算出した。得られた紫外可視吸収スペクトルと膜厚を用いて、硬化膜の波長400nmにおける膜厚1μmあたりの光透過率を算出した。
テンパックスガラス板上に作成した硬化膜を、反応性イオンエッチング装置(サムコ(株)製RIE-10N)を用いて、プロセスガスとしてCF4(4フッ化メタン)と酸素の混合ガスを用いたドライエッチングを行った。なお、ドライエッチング条件は、ガス混合比をCF4:酸素=80:20とし、ガス流量を50sccm、出力199W、内圧を10Pa、処理時間を2minとした。
ドライエッチング処理後の硬化膜表面を走査型プローブ顕微鏡(Bruker Corporation製Dimension Icon)により走査し、硬化膜表面の3次元立体像を得た。得られた像を切断し、硬化膜断面の輪郭曲線を得た。得られた輪郭曲線をJIS B 0601:2013に基づき計算することにより、算術平均粗さRaを得た。
分光光度計(島津製作所製MultiSpec-1500)を用いて、テンパックスガラス板の紫外可視吸収スペクトルを測定し、これをリファレンスとした。次いで、テンパックスガラス板上に作成したドライエッチング処理後の硬化膜の紫外可視吸収スペクトルを測定し、リファレンスとの差異により、ドライエッチング処理後の硬化膜の紫外可視吸収スペクトルを算出した。得られた紫外可視吸収スペクトルと膜厚を用いて、ドライエッチング処理後の硬化膜の波長400nmにおける膜厚1μmあたりの光透過率を算出した。
表7に示した溶液につき、実施例54と同様にして、(6-1)硬化膜の作成、(6-2)屈折率の測定、(6-3)硬化膜の光透過率の測定、(6-4)ドライエッチング、(6-5)ドライエッチング後の表面粗さ測定。(6-6)ドライエッチング後の光透過率測定を行った。評価結果を表7に示した。
ポリメタロキサン溶液(TP-7)を6インチシリコンウェハーにスピンコーター(ミカサ(株)製1H-360S)を用いてスピン塗布した後、ホットプレート(大日本スクリーン製造(株)製SCW-636)を用いて100℃で3分間加熱し、プリベーク膜を作成した。その後、ホットプレートを用いて300℃で5分間キュアして膜厚0.5μmのポリメタロキサンを含有する硬化膜を作成した。
2 : 透明導電薄膜(I)
3 : 絶縁膜
4 : MAM配線
5 : ポリメタロキサンまたはその組成物から得られる硬化膜(II)
6 : 酸化ケイ素薄膜(III)
7 : 透明粘着層(IV)
Claims (30)
- 下記一般式(1)で表される構成単位を有するポリメタロキサン。
- R1がヒドロキシ基、炭素数1~12のアルキル基、炭素数5~12の脂環式アルキル基、炭素数1~12のアルコキシ基、炭素数6~30の芳香族基、(R3 3SiO-)基、シロキサン結合を有する基またはメタロキサン結合を有する基であり、R1の少なくとも一つは(R3 3SiO-)基である請求項1記載のポリメタロキサン。
- 前記ポリメタロキサン中のR1の少なくとも一つはヒドロキシ基である請求項1または2記載のポリメタロキサン。
- MがAl、Ti、ZrおよびSnからなる群より選ばれる金属原子を1種以上含む請求項1~3いずれかに記載のポリメタロキサン。
- 下記一般式(2)で表される化合物またはその加水分解体を重縮合する工程を含むポリメタロキサンの製造方法。
- 前記一般式(3)におけるyが2~(m-1)の整数である、請求項6記載のポリメタロキサンの製造方法。
- 前記一般式(2)におけるMがAl、Ti、ZrおよびSnからなる群より選ばれる金属原子を1種以上含む請求項5~7のいずれかに記載のポリメタロキサンの製造方法。
- 請求項1~4のいずれかに記載のポリメタロキサンを含む組成物。
- 請求項1~4いずれかに記載のポリメタロキサンと、無機粒子を含むことを特徴とする組成物。
- 前記無機粒子が金属化合物粒子である請求項10記載の組成物。
- 請求項1~5のいずれかに記載のポリメタロキサンの硬化膜。
- 請求項9~11のいずれかに記載の組成物の硬化膜。
- 波長400nmにおける膜厚1μmあたりの光透過率が90%以上である請求項12または13記載の硬化膜。
- 波長550nmにおける屈折率が1.58~2.20である請求項12~14のいずれかに記載の硬化膜。
- 請求項1~4のいずれかに記載のポリメタロキサン、または請求項9~11のいずれか記載の組成物を加熱する工程を含む硬化膜の製造方法。
- 請求項12~15のいずれかに記載の硬化膜を具備する部材。
- 前記部材が、透明下地基材の上面から、
透明導電薄膜(I)、
請求項12~15のいずれかに記載の硬化膜(II)、
の順に積層されている部位を有する、請求項17に記載の部材。 - 請求項12~15のいずれかに記載の硬化膜(II)の上面に、酸化ケイ素薄膜(III)および/または屈折率が1.46~1.53である透明粘着薄膜(IV)が積層されている部位を有する、請求項18記載の部材。
- 前記透明下地基材が、ガラス基板または光学フィルムである、請求項18または19の部材。
- 前記部材がレンズである請求項17記載の部材。
- 基板上に請求項12~15のいずれかに記載の硬化膜を形成する工程と、前記硬化膜上にフォトレジストパターンを形成する工程と、
前記フォトレジストパターンおよび前記硬化膜をドライエッチングする工程とを含む、レンズの製造方法。 - 請求項17~21のいずれかに記載の部材を具備する電子部品。
- 前記電子部品がタッチセンサーである請求項23の電子部品。
- 前記電子部品がイメージセンサーである請求項23の電子部品。
- 前記電子部品が有機EL素子である請求項23の電子部品
- 前記電子部品が有機EL照明である請求項23の電子部品
- 請求項1~5のいずれかに記載のポリメタロキサンを含有する建材。
- 請求項1~5のいずれかに記載のポリメタロキサンが充填されたカラム。
- 請求項28記載のカラムを具備する放射性核種ジェネレータ。
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JPWO2019188835A1 (ja) * | 2018-03-29 | 2021-03-11 | 東レ株式会社 | ポリメタロキサン、組成物、硬化膜、部材、電子部品、繊維、セラミックス成型用結着剤、硬化膜の製造方法、および繊維の製造方法 |
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JPWO2020261909A1 (ja) * | 2019-06-28 | 2020-12-30 | ||
WO2022054552A1 (ja) * | 2020-09-11 | 2022-03-17 | 東レ株式会社 | ポリメタロキサン含有組成物、硬化体、部材、電子部品および繊維 |
WO2022065127A1 (ja) * | 2020-09-24 | 2022-03-31 | 東レ株式会社 | 組成物、硬化体およびその製造方法、ならびに部材、電子部品および繊維 |
WO2022202398A1 (ja) * | 2021-03-22 | 2022-09-29 | 東レ株式会社 | 金属-酸素-金属結合を主鎖とする高分子、その組成物、固体物およびその製造方法、ならびに電子部品および繊維 |
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EP3381969A4 (en) | 2019-06-26 |
JPWO2017090512A1 (ja) | 2018-04-05 |
TWI679224B (zh) | 2019-12-11 |
KR20180086202A (ko) | 2018-07-30 |
EP3381969A1 (en) | 2018-10-03 |
KR102438946B1 (ko) | 2022-09-02 |
CN108291031A (zh) | 2018-07-17 |
CN108291031B (zh) | 2021-06-15 |
SG11201803938RA (en) | 2018-06-28 |
JP6327366B2 (ja) | 2018-05-23 |
US20180327275A1 (en) | 2018-11-15 |
US11795064B2 (en) | 2023-10-24 |
TW201739797A (zh) | 2017-11-16 |
EP3381969B1 (en) | 2020-06-03 |
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