WO2022202398A1 - 金属-酸素-金属結合を主鎖とする高分子、その組成物、固体物およびその製造方法、ならびに電子部品および繊維 - Google Patents
金属-酸素-金属結合を主鎖とする高分子、その組成物、固体物およびその製造方法、ならびに電子部品および繊維 Download PDFInfo
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- WO2022202398A1 WO2022202398A1 PCT/JP2022/010857 JP2022010857W WO2022202398A1 WO 2022202398 A1 WO2022202398 A1 WO 2022202398A1 JP 2022010857 W JP2022010857 W JP 2022010857W WO 2022202398 A1 WO2022202398 A1 WO 2022202398A1
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- carbon atoms
- polymetalloxane
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- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
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- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- OQAGVSWESNCJJT-UHFFFAOYSA-N isovaleric acid methyl ester Natural products COC(=O)CC(C)C OQAGVSWESNCJJT-UHFFFAOYSA-N 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- HCOAPXXZSLSJCN-UHFFFAOYSA-M lithium;1-methylpyrrolidin-2-one;chloride Chemical compound [Li+].[Cl-].CN1CCCC1=O HCOAPXXZSLSJCN-UHFFFAOYSA-M 0.000 description 1
- 238000010309 melting process Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- VMTCKFAPVIWNOF-UHFFFAOYSA-N methane tetrahydrofluoride Chemical compound C.F.F.F.F VMTCKFAPVIWNOF-UHFFFAOYSA-N 0.000 description 1
- UNRFQJSWBQGLDR-UHFFFAOYSA-N methane trihydrofluoride Chemical compound C.F.F.F UNRFQJSWBQGLDR-UHFFFAOYSA-N 0.000 description 1
- ZEIWWVGGEOHESL-UHFFFAOYSA-N methanol;titanium Chemical compound [Ti].OC.OC.OC.OC ZEIWWVGGEOHESL-UHFFFAOYSA-N 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 125000004674 methylcarbonyl group Chemical group CC(=O)* 0.000 description 1
- VGGNVBNNVSIGKG-UHFFFAOYSA-N n,n,2-trimethylaziridine-1-carboxamide Chemical compound CC1CN1C(=O)N(C)C VGGNVBNNVSIGKG-UHFFFAOYSA-N 0.000 description 1
- GXMIHVHJTLPVKL-UHFFFAOYSA-N n,n,2-trimethylpropanamide Chemical compound CC(C)C(=O)N(C)C GXMIHVHJTLPVKL-UHFFFAOYSA-N 0.000 description 1
- CLZGJKHEVKJLLS-UHFFFAOYSA-N n,n-diheptylheptan-1-amine Chemical compound CCCCCCCN(CCCCCCC)CCCCCCC CLZGJKHEVKJLLS-UHFFFAOYSA-N 0.000 description 1
- QKCGXXHCELUCKW-UHFFFAOYSA-N n-[4-[4-(dinaphthalen-2-ylamino)phenyl]phenyl]-n-naphthalen-2-ylnaphthalen-2-amine Chemical compound C1=CC=CC2=CC(N(C=3C=CC(=CC=3)C=3C=CC(=CC=3)N(C=3C=C4C=CC=CC4=CC=3)C=3C=C4C=CC=CC4=CC=3)C3=CC4=CC=CC=C4C=C3)=CC=C21 QKCGXXHCELUCKW-UHFFFAOYSA-N 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000003758 nuclear fuel Substances 0.000 description 1
- 238000007344 nucleophilic reaction Methods 0.000 description 1
- QYSGYZVSCZSLHT-UHFFFAOYSA-N octafluoropropane Chemical compound FC(F)(F)C(F)(F)C(F)(F)F QYSGYZVSCZSLHT-UHFFFAOYSA-N 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 125000004675 pentylcarbonyl group Chemical group C(CCCC)C(=O)* 0.000 description 1
- 229960004065 perflutren Drugs 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 229920001230 polyarylate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- HKJYVRJHDIPMQB-UHFFFAOYSA-N propan-1-olate;titanium(4+) Chemical compound CCCO[Ti](OCCC)(OCCC)OCCC HKJYVRJHDIPMQB-UHFFFAOYSA-N 0.000 description 1
- XPGAWFIWCWKDDL-UHFFFAOYSA-N propan-1-olate;zirconium(4+) Chemical compound [Zr+4].CCC[O-].CCC[O-].CCC[O-].CCC[O-] XPGAWFIWCWKDDL-UHFFFAOYSA-N 0.000 description 1
- BCWYYHBWCZYDNB-UHFFFAOYSA-N propan-2-ol;zirconium Chemical compound [Zr].CC(C)O.CC(C)O.CC(C)O.CC(C)O BCWYYHBWCZYDNB-UHFFFAOYSA-N 0.000 description 1
- 125000001501 propionyl group Chemical group O=C([*])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004673 propylcarbonyl group Chemical group 0.000 description 1
- RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- 238000000985 reflectance spectrum Methods 0.000 description 1
- 230000002787 reinforcement Effects 0.000 description 1
- 235000009566 rice Nutrition 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 125000004469 siloxy group Chemical group [SiH3]O* 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- SFZCNBIFKDRMGX-UHFFFAOYSA-N sulfur hexafluoride Chemical compound FS(F)(F)(F)(F)F SFZCNBIFKDRMGX-UHFFFAOYSA-N 0.000 description 1
- 229960000909 sulfur hexafluoride Drugs 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 125000006253 t-butylcarbonyl group Chemical group [H]C([H])([H])C(C(*)=O)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 239000004753 textile Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 description 1
- 125000005389 trialkylsiloxy group Chemical group 0.000 description 1
- MYWQGROTKMBNKN-UHFFFAOYSA-N tributoxyalumane Chemical compound [Al+3].CCCC[O-].CCCC[O-].CCCC[O-] MYWQGROTKMBNKN-UHFFFAOYSA-N 0.000 description 1
- 125000002306 tributylsilyl group Chemical group C(CCC)[Si](CCCC)(CCCC)* 0.000 description 1
- FAQYAMRNWDIXMY-UHFFFAOYSA-N trichloroborane Chemical compound ClB(Cl)Cl FAQYAMRNWDIXMY-UHFFFAOYSA-N 0.000 description 1
- JLGLQAWTXXGVEM-UHFFFAOYSA-N triethylene glycol monomethyl ether Chemical compound COCCOCCOCCO JLGLQAWTXXGVEM-UHFFFAOYSA-N 0.000 description 1
- 125000004044 trifluoroacetyl group Chemical group FC(C(=O)*)(F)F 0.000 description 1
- 125000000025 triisopropylsilyl group Chemical group C(C)(C)[Si](C(C)C)(C(C)C)* 0.000 description 1
- UAEJRRZPRZCUBE-UHFFFAOYSA-N trimethoxyalumane Chemical compound [Al+3].[O-]C.[O-]C.[O-]C UAEJRRZPRZCUBE-UHFFFAOYSA-N 0.000 description 1
- AAPLIUHOKVUFCC-UHFFFAOYSA-N trimethylsilanol Chemical compound C[Si](C)(C)O AAPLIUHOKVUFCC-UHFFFAOYSA-N 0.000 description 1
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- OBROYCQXICMORW-UHFFFAOYSA-N tripropoxyalumane Chemical compound [Al+3].CCC[O-].CCC[O-].CCC[O-] OBROYCQXICMORW-UHFFFAOYSA-N 0.000 description 1
- DAOVYDBYKGXFOB-UHFFFAOYSA-N tris(2-methylpropoxy)alumane Chemical compound [Al+3].CC(C)C[O-].CC(C)C[O-].CC(C)C[O-] DAOVYDBYKGXFOB-UHFFFAOYSA-N 0.000 description 1
- MDDPTCUZZASZIQ-UHFFFAOYSA-N tris[(2-methylpropan-2-yl)oxy]alumane Chemical compound [Al+3].CC(C)(C)[O-].CC(C)(C)[O-].CC(C)(C)[O-] MDDPTCUZZASZIQ-UHFFFAOYSA-N 0.000 description 1
- 238000011179 visual inspection Methods 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G79/00—Macromolecular compounds obtained by reactions forming a linkage containing atoms other than silicon, sulfur, nitrogen, oxygen, and carbon with or without the latter elements in the main chain of the macromolecule
-
- D—TEXTILES; PAPER
- D01—NATURAL OR MAN-MADE THREADS OR FIBRES; SPINNING
- D01F—CHEMICAL FEATURES IN THE MANUFACTURE OF ARTIFICIAL FILAMENTS, THREADS, FIBRES, BRISTLES OR RIBBONS; APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OF CARBON FILAMENTS
- D01F1/00—General methods for the manufacture of artificial filaments or the like
- D01F1/02—Addition of substances to the spinning solution or to the melt
- D01F1/10—Other agents for modifying properties
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D185/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing atoms other than silicon, sulfur, nitrogen, oxygen, and carbon; Coating compositions based on derivatives of such polymers
-
- D—TEXTILES; PAPER
- D01—NATURAL OR MAN-MADE THREADS OR FIBRES; SPINNING
- D01F—CHEMICAL FEATURES IN THE MANUFACTURE OF ARTIFICIAL FILAMENTS, THREADS, FIBRES, BRISTLES OR RIBBONS; APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OF CARBON FILAMENTS
- D01F9/00—Artificial filaments or the like of other substances; Manufacture thereof; Apparatus specially adapted for the manufacture of carbon filaments
- D01F9/08—Artificial filaments or the like of other substances; Manufacture thereof; Apparatus specially adapted for the manufacture of carbon filaments of inorganic material
- D01F9/10—Artificial filaments or the like of other substances; Manufacture thereof; Apparatus specially adapted for the manufacture of carbon filaments of inorganic material by decomposition of organic substances
Definitions
- the present invention relates to a polymer having a metal-oxygen-metal bond as a main chain, a composition thereof, a solid substance, a method for producing the same, an electronic component and a fiber comprising the same.
- Metal oxides have properties such as high heat resistance, high transparency, and a high refractive index, and are expected to have useful properties in various applications by making them into films and fibers.
- a method for forming a film made of such a metal oxide there is a method for forming a film of titanium oxide or zirconium oxide by a vapor phase method such as chemical vapor deposition (CVD).
- CVD chemical vapor deposition
- the vapor phase method such as CVD has a slow film formation rate, and it is difficult to obtain a metal oxide film having a thickness that can be used industrially.
- polymetalloxane a polymer having a metal-oxygen-metal atom bond as its main chain
- a method is proposed to obtain Such polymetalloxane can be obtained by hydrolyzing a metal alkoxide and polycondensing it.
- a metal alkoxide is hydrolyzed, the hydrolyzate aggregates and becomes insoluble in a solvent. Therefore, there is a demand for a polymetalloxane that can stably exist in a solution in a uniform state and form a uniform cured film.
- Patent Document 1 Past literature has reported polymetalloxane that exists stably in a uniform state in a solution by introducing specific substituents into the side chains of the polymer (see, for example, Patent Document 1).
- a polymetalloxane that can stably exist in a solution in a uniform state is obtained by using a specific group such as a trialkylsiloxy group as a side chain.
- a polymetalloxane can be obtained, for example, by using a compound obtained by reacting a trialkylsilanol with a metal alkoxide as a raw material.
- a polymetalloxane solution has a high concentration, its viscosity rises sharply and gelation occurs, so there has been a problem in industrially stable supply.
- the object of the present invention is to provide a polymetalloxane that stably exists without aggregation or gelation even at high concentrations and high viscosities.
- the present invention provides a polymer whose main chain is a metal-oxygen-metal bond having a structural unit represented by the following general formula (1):
- M is Al, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge, Y, Zr, Nb, Mo, In, Sn, Sb, Hf, Ta, W and Bi represents a metal atom selected from the group consisting of;
- R 1 is a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, an alkylcarbonyl group having 1 to 8 carbon atoms, an aryl group having 6 to 12 carbon atoms, an aralkyl group having 7 to 13 carbon atoms, (R 5 3 Si— ) group, (R 6 R 7 N—) group, 4-oxopent-2-en-2-yl group, 4-alkoxy-4-oxobut-2-en-2-yl group having 5 to 12 carbon atoms and carbon selected from 4-aryloxy-4-oxobut-2-en-2-yl groups of numbers 10 to 16; R 2 and R 3 are each independently a hydrogen atom or an alkyl group having 1 to 8
- R 13 aralkyl groups or groups having a siloxane bond
- multiple R 5 may be the same or different
- R 6 and R 7 each independently represents a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, an alicyclic alkyl group having 5 to 12 carbon atoms, an aryl group having 6 to 12 carbon atoms, or an aryl group having 7 to 13 carbon atoms.
- R 6 and R 7 may be linked via a carbon-carbon saturated bond or a carbon-carbon unsaturated bond to form a ring structure;
- m is an integer indicating the valence of the metal atom M;
- a is an integer from 1 to (m-2);
- b is an integer of 1-6 and c is an integer of 1-5.
- the polymer having a metal-oxygen-metal bond as a main chain of the present invention stably exists in a transparent and uniform state in a high-viscosity, high-concentration solution, and has excellent storage stability.
- the present invention is a polymer (hereinafter referred to as "polymetalloxane”) having a metal-oxygen-metal bond as a main chain and having structural units represented by the following general formula (1).
- M is Al, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge, Y, Zr, Nb, Mo, In, Sn, Sb, Hf, Ta, W and Bi represents a metal atom selected from the group consisting of R 1 is a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, an alkylcarbonyl group having 1 to 8 carbon atoms, an aryl group having 6 to 12 carbon atoms, an aralkyl group having 7 to 13 carbon atoms, (R 5 3 Si— ) group, (R 6 R 7 N—) group, 4-oxopent-2-en-2-yl group, 4-alkoxy-4-oxobut-2-en-2-yl group having 5 to 12 carbon atoms and carbon It is selected from 4-aryloxy-4-oxobut-2-en-2-yl groups of numbers 10 to 16.
- R 2 and R 3 are each independently a hydrogen atom or an alkyl group having 1 to 8 carbon atoms.
- R 4 is a hydrogen atom, an alkyl group having 1 to 8 carbon atoms or an alkylcarbonyl group having 1 to 8 carbon atoms.
- R 5 is a hydroxy group, an alkyl group having 1 to 8 carbon atoms, an alicyclic alkyl group having 5 to 12 carbon atoms, an alkoxy group having 1 to 12 carbon atoms, an aryl group having 6 to 12 carbon atoms, and an aryl group having 7 to 12 carbon atoms. It is a group having 13 aralkyl groups or siloxane bonds. Multiple R 5 may be the same or different.
- R 6 and R 7 each independently represents a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, an alicyclic alkyl group having 5 to 12 carbon atoms, an aryl group having 6 to 12 carbon atoms, or an aryl group having 7 to 13 carbon atoms. It is an aralkyl group or an acyl group having 1 to 12 carbon atoms.
- R 6 and R 7 may be linked via a carbon-carbon saturated bond or carbon-carbon unsaturated bond to form a ring structure.
- m is an integer indicating the valence of the metal atom M; a is an integer from 1 to (m-2).
- b is an integer of 1-6 and c is an integer of 1-5.
- alkyl groups having 1 to 8 carbon atoms include methyl group, ethyl group, propyl group, isopropyl group, butyl group, isobutyl group, s-butyl group, t-butyl group, pentyl group, hexyl group and heptyl group. , octyl group, 2-ethylhexyl group and the like.
- alkylcarbonyl groups having 1 to 8 carbon atoms include methylcarbonyl, ethylcarbonyl, propylcarbonyl, isopropylcarbonyl, butylcarbonyl, isobutylcarbonyl, s-butylcarbonyl and t-butylcarbonyl groups. , pentylcarbonyl group, hexylcarbonyl group, heptylcarbonyl group, octylcarbonyl group, 2-ethylhexylcarbonyl group and the like.
- aryl group having 6 to 12 carbon atoms include a phenyl group and a naphthyl group.
- aralkyl groups having 7 to 13 carbon atoms include a benzyl group and a phenethyl group.
- alicyclic alkyl group having 5 to 12 carbon atoms include cyclopentyl group, cyclohexyl group, cycloheptyl group, cyclooctyl group, cyclononyl group and cyclodecyl group.
- alkoxy groups having 1 to 12 carbon atoms include methoxy, ethoxy, propoxy, isopropoxy, butoxy, isobutoxy, s-butoxy, t-butoxy, pentoxy, hexyloxy and heptoxy. group, octoxy group, 2-ethylhexyloxy group, nonyl group, decyloxy group and the like.
- a group having a siloxane bond means that it is bonded to another Si via an oxygen atom.
- the (R 5 3 Si—) group examples include a trihydroxysilyl group, a trimethylsilyl group, a triethylsilyl group, a tripropylsilyl group, a triisopropylsilyl group, a tributylsilyl group, a triisobutylsilyl group and a tri-s-butylsilyl group.
- the (R 6 R 7 N-) group examples include an N-succinimidyl group, an N-phthalimidyl group, an N-(5-norbornene-2,3-dicarboximidyl) group, an N-(N'-hydroxy pyromellitisimidyl)oxy group, N-(1,8-naphthalimidyl) group, N-(N'-hydroxy-1,2,3,4-cyclobutanetetracarboxylic acid diimidyl) group and the like.
- 4-alkoxy-4-oxobut-2-en-2-yl group having 5 to 12 carbon atoms include 4-methoxy-4-oxobut-2-en-2-yl group, 4-ethoxy-4 -oxobut-2-en-2-yl group, 4-propoxy-4-oxobut-2-en-2-yl group, 4-butoxy-4-oxobut-2-en-2-yl group and the like.
- 4-aryloxy-4-oxobut-2-en-2-yl group having 10 to 16 carbon atoms include 4-phenyloxy-4-oxobut-2-en-2-yl group and 4-naphthyl and oxy-4-oxobut-2-en-2-yl group.
- acyl groups having 1 to 12 carbon atoms include formyl, acetyl, trifluoroacetyl, phenylacetyl, propionyl, and benzoyl groups.
- a polymetalloxane is a polymer whose main chain is a metal-oxygen-metal bond.
- the metal atoms M constituting the polymetalloxane in the present invention include Al, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge, Y, Zr, Nb, Mo, Pd, Selected from the group consisting of Ag, In, Sn, Sb, Hf, Ta, W and Bi. By including these metal atoms, it is possible to obtain a highly heat-resistant cured film or metal oxide fiber.
- M preferably contains one or more metal atoms selected from the group consisting of Al, Ti, Zr and Sn. By including these metal atoms, a polymetalloxane having a high refractive index can be obtained.
- the polymetalloxane containing the repeating structural unit represented by the general formula (1) has the structure of the portion surrounded by ( ) a in the general formula (1), thereby significantly improving compatibility with other components. . Therefore, the polymetalloxane exists stably in the solvent. Therefore, it stably exists in a transparent and uniform state in a highly viscous and highly concentrated solution, and the solution has excellent storage stability. In addition, in the step of forming a cured film and metal oxide fibers, which will be described later, since the condensation stress is relaxed, a uniform cured film and metal oxide fibers that are less likely to crack can be obtained.
- the ether group in the structure of the part enclosed by ( ) a produces an electrostatic interaction with the metal atom contained in the main chain of the polymetalloxane. Therefore, it has the effect of suppressing the nucleophilic reaction to the metal atoms in the polymetalloxane main chain by water and hydroxyl groups present in the polymetalloxane solution. From the above, when the polymetalloxane has the structure of the portion enclosed by ( ) a , it becomes a polymetalloxane with high storage stability.
- c is preferably 2 to 4.
- the condensation stress is relaxed during curing of the polymetalloxane. Therefore, it is possible to obtain a uniform cured film and metal oxide fibers that are less likely to crack.
- R 4 is preferably an alkyl group having 2 to 6 carbon atoms.
- the polymetalloxane has a structure surrounded by ( ) a in which R 4 is an alkyl group having 2 to 6 carbon atoms, thereby further improving compatibility with other components. Therefore, the polymetalloxane exists more stably in the solvent, and the solution has excellent storage stability.
- the content of the structure of the part surrounded by ( ) a is the ratio of the number of moles of the structure of the part surrounded by ( ) a to the number of moles of M atoms contained in the polymetalloxane
- the content of the structure is preferably 1 mol % or more and 250 mol % or less, more preferably 15 mol % or more and 200 mol % or less.
- the content of the structure surrounded by ( ) a in the polymetalloxane is obtained by the following method.
- the polymetalloxane solution is decomposed under pressure using sulfuric acid and then nitric acid, and then heated and incinerated.
- the obtained ash is melted with a mixed flux of sodium carbonate and boric acid, and dissolved with dilute nitric acid to a constant volume.
- the M atoms contained in the polymetalloxane are measured using ICP emission spectroscopy, the content of M atoms is determined, and converted to the molar concentration of M atoms.
- the polymetalloxane solution was filled in an NMR tube, and 1 H-NMR and 13 C-NMR measurements were carried out using a nuclear magnetic resonance apparatus (NMR) to determine the structure of the portion enclosed by ( ) a . From the corresponding peak area, the molar concentration of the structure in the portion enclosed by ( ) a is determined. By dividing the obtained molar concentration of the structure of the portion surrounded by ( ) a by the molar concentration of the M atom, the content of the structure of the portion surrounded by ( ) a in the polymetalloxane can be obtained. .
- NMR nuclear magnetic resonance apparatus
- m is preferably an integer of 3 or more and 5 or less.
- the lower limit of the weight average molecular weight of the polymetalloxane of the present invention is preferably 10,000 or more, more preferably 20,000 or more, and still more preferably 100,000 or more.
- the upper limit of the weight average molecular weight is preferably 1,000,000 or less, more preferably 800,000 or less, and still more preferably 500,000 or less.
- the weight average molecular weight of the polymetalloxane is within the above range, the coating properties of the polymetalloxane are improved.
- the weight average molecular weight is at least the lower limit, the physical properties of the cured film and metal oxide fiber described below are improved, and a cured film and metal oxide fiber having particularly excellent crack resistance can be obtained.
- the polymetalloxane solution exhibits spinnability, so that the processability into a filamentous material is improved in the spinning step described later. Further, when the molecular weight is equal to or higher than the lower limit, crack resistance of the filamentous material is improved, and there is an effect that uniform metal oxide fibers without cracks can be obtained even in the step of firing.
- the weight average molecular weight in the present invention refers to a polystyrene-equivalent value measured by gel permeation chromatography (GPC).
- the weight average molecular weight of polymetalloxane is obtained by the following method. In this method, first, polymetalloxane is dissolved in a developing solvent so as to have a concentration of 0.2 wt % to obtain a sample solution. Next, this sample solution is injected into a column filled with porous gel and developing solvent and measured by gel permeation chromatography. The weight-average molecular weight of the polymetalloxane is obtained by detecting the column eluate with a differential refractive index detector and analyzing the elution time.
- a solvent capable of dissolving the polymetalloxane at a concentration of 0.2 wt % is selected.
- polymetalloxane is dissolved in a solution of 0.02 mol/dm 3 of lithium chloride and N-methyl-2-pyrrolidone, it is used as the developing solvent.
- Method for producing polymetalloxane The method for producing the polymetalloxane represented by the general formula (1) is not particularly limited, but the method shown below can be used.
- a method for producing a polymetalloxane according to an embodiment of the present invention comprises a compound represented by the following general formula (2) or a hydrolyzate thereof (hereinafter referred to as "the compound represented by the general formula (2), etc.") including the step of polycondensing the
- R 8 is a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, an alkylcarbonyl group having 1 to 8 carbon atoms, an aryl group having 6 to 12 carbon atoms or an aralkyl group having 7 to 13 carbon atoms.
- d is an integer from 2 to (ma).
- Other components represented by the same reference numerals as in general formula (1) are the same as in general formula (1).
- the compound represented by the general formula (2) is obtained by combining a metal alkoxide represented by the following general formula (3) and a compound represented by the following general formula (4), wherein a in the general formula (2) is 1, It can be obtained by reacting in a predetermined molar ratio so as to obtain 2 or 3 compounds.
- e is an integer of 3 to m.
- Other components represented by the same reference numerals as in general formula (2) are the same as in general formula (2).
- examples include tetramethoxytitanium, tetraethoxytitanium, tetrapropoxytitanium, tetraisopropoxytitanium, tetrabutoxytitanium, tetra-s-butoxytitanium, tetraisobutoxytitanium, tetra-t-butoxytitanium, and the like. be done.
- examples include tetramethoxyzirconium, tetraethoxyzirconium, tetrapropoxyzirconium, tetraisopropoxyzirconium, tetrabutoxyzirconium, tetra-s-butoxyzirconium, tetraisobutoxyzirconium, tetra-t-butoxyzirconium, and the like. be done.
- metal atom is Al, trimethoxyaluminum, triethoxyaluminum, tri-n-propoxyaluminum, triisopropoxyaluminum, tri-n-butoxyaluminum, tri-s-butoxyaluminum, s-butoxy(diisopropoxy)aluminum, triisobutoxyaluminum, tri-t-butoxyaluminum, and the like.
- trihydroxysiloxy group trimethylsiloxy group, triethylsiloxy group, tripropylsiloxy group, triisopropylsiloxy group, tributylsiloxy group, triisobutylsiloxy group, tri-s-butylsiloxy group, tri-t-butylsiloxy group, tricyclohexyl siloxy group, trimethoxysiloxy group, triethoxysiloxy group, tripropoxysiloxy group, triisopropoxysiloxy group, tributoxysiloxy group, triphenylsiloxy group, hydroxydiphenylsiloxy group, methyldiphenylsiloxy group, ethyldiphenylsiloxy group, propyl diphenylsiloxy group, dihydroxy(phenyl)siloxy group, dimethyl(phenyl)siloxy group, diethyl(phenyl)siloxy group, dipropyl(phenyl)siloxy group,
- compounds having a structure represented by general formula (4) include: 2-methoxyethanol, 3-methoxypropanol, 4-methoxybutanol, 5-methoxyhexanol, 1-methoxypropan-2-ol, 2-methoxypropanol, 2-ethoxyethanol, 3-ethoxypropanol, 4-ethoxybutanol, 5-ethoxyhexanol, 1-ethoxypropan-2-ol, 2-ethoxypropanol, 2-propoxyethanol, 3-propoxypropanol, 4-propoxybutanol, 5-propoxyhexanol, 1-propoxypropan-2-ol, 2-propoxypropanol, 2-butoxyethanol, 3-butoxypropanol, 4-butoxybutanol, 5-butoxyhexanol, 1-butoxypropan-2-ol, 2-propoxypropanol, 2-butoxyethanol, 3-butoxypropanol, 4-butoxybutanol, 5-butoxyhexanol, 1-butoxypropan-2-
- a solvent may be added to the reaction mixture as necessary.
- the solvent those described below can be used.
- the reaction temperature is preferably 20-100° C., and the reaction time is preferably 10-120 minutes.
- reaction time is preferably 10 to 120 minutes.
- a metal compound having a hydroxy group aggregates due to hydrogen bonding of the hydroxy group and becomes insoluble in an organic solvent.
- the compound represented by the general formula (5) does not aggregate in an organic solvent because it has the structure of the part enclosed by ( ) a in the side chain. Therefore, the solution containing the compound represented by general formula (5) can exist as a transparent and homogeneous solution.
- the reaction mixture is heated to a range of 60° C. to 180° C. for the purpose of producing the polymetalloxane represented by the general formula (1), and if necessary, a polymerization catalyst is added, The condensed water and alcohol generated are removed to proceed with polycondensation to obtain a polymetalloxane solution.
- amide-based solvents is not particularly limited, amide-based solvents, ester-based solvents, alcohol-based solvents, ether-based solvents, ketone-based solvents, dimethyl sulfoxide, and the like can be suitably used.
- amide solvents include N,N-dimethylformamide, N,N-dimethylacetamide, N,N-dimethylisobutyramide, N-methyl-2-pyrrolidone, 1,3-dimethyl-2-imidazolidinone. , N,N-dimethylpropylene urea and the like.
- ester solvents include ⁇ -butyrolactone, ethyl acetate, isobutyl acetate, propylene glycol monomethyl ether acetate, and ethyl acetoacetate.
- alcohol solvents include n-propanol, isopropanol, n-butanol, isobutanol, t-butanol, ethyl lactate, butyl lactate, propylene glycol monomethyl ether, diethylene glycol monomethyl ether, ethylene glycol, propylene glycol, and the like.
- ether solvents include 1,2-dimethoxyethane, 1,2-diethoxyethane, dipropylene glycol dimethyl ether and the like.
- ketone solvents include diisobutyl ketone, acetylacetone, cyclopentanone, cyclohexanone and the like.
- solvents that can be preferably used include, for example, solvents described in International Publication No. 2017/90512 and International Publication No. 2019/188835.
- an acidic catalyst or a basic catalyst is preferably used.
- acidic catalysts include hydrochloric acid, nitric acid, sulfuric acid, hydrofluoric acid, phosphoric acid, acetic acid, trifluoroacetic acid, formic acid, polyvalent carboxylic acids or their anhydrides, and ion exchange resins.
- basic catalysts include triethylamine, tripropylamine, tributylamine, tripentylamine, trihexylamine, triheptylamine, trioctylamine, diethylamine, dipropylamine, dibutylamine, diisobutylamine, dipentylamine, and dihexylamine.
- diheptylamine, dioctylamine triethanolamine, diethanolamine, dicyclohexylamine, dicyclohexylmethylamine, sodium hydroxide, potassium hydroxide, alkoxysilanes having an amino group, and ion exchange resins.
- a more preferred polymerization catalyst is a base catalyst.
- a basic catalyst By using a basic catalyst, it is possible to obtain particularly high molecular weight polymetalloxane.
- the basic catalysts diethylamine, dipropylamine, dibutylamine, dipentylamine, dihexylamine, diheptylamine, dioctylamine, triethylamine, tripropylamine, tributylamine, triisobutylamine, tripentylamine, trihexylamine, tri Particular preference is given to heptylamine, trioctylamine, diethanolamine, triethanolamine, dicyclohexylamine, dicyclohexylmethylamine, 2,2,6,6-tetramethylpiperidine.
- the amount of the polymerization catalyst added is preferably 0.01 to 30 mol% with respect to 100 mol% of the compound represented by general formula (2).
- the polymetalloxane solution after hydrolysis, partial condensation and polymerization does not contain the above polymerization catalyst, so the polymerization catalyst should be removed as necessary. can be done.
- washing with water and/or treatment with an ion exchange resin are preferred from the standpoint of ease of operation and removability.
- Water washing is a method of diluting a polymetalloxane solution with a suitable hydrophobic solvent, washing with water several times, and concentrating the resulting organic layer using an evaporator or the like.
- Treatment with an ion exchange resin is a method of contacting a polymetalloxane solution with a suitable ion exchange resin.
- composition containing polymetalloxane A polymetalloxane according to an embodiment of the present invention can be mixed with a solvent and other necessary components to form a composition. That is, the composition according to the embodiment of the present invention contains at least the polymetalloxane described above.
- polymetalloxane when used as a composition, it is preferable to dilute it with an organic solvent to adjust the solid content concentration.
- the solid content concentration of the solution containing polymetalloxane is preferably 0.1 to 50 wt %. By setting the solid content concentration within this range, the viscosity can be arbitrarily adjusted. As a result, it is possible to achieve both the stringiness and fluidity of this composition.
- solid content is components other than the solvent in a composition.
- the organic solvent is not particularly limited, it is preferably the same as the solvent used in synthesizing the polymetalloxane. More preferred organic solvents are aprotic polar solvents. By using an aprotic polar solvent as the organic solvent, an interaction between the polymetalloxane and the organic solvent occurs, so that the viscosity of the composition containing them can be increased. As a result, a filamentous material can be easily obtained from the composition in the spinning step described below.
- aprotic polar solvents include acetone, tetrahydrofuran, ethyl acetate, dimethoxyethane, N,N-dimethylformamide, dimethylacetamide (DMAc, 165°C), dipropylene glycol dimethyl ether, tetramethyl urea, diethylene glycol ethylmethyl.
- Ether dimethylsulfoxide, N-methylpyrrolidone, ⁇ -butyrolactone, 1,3-dimethyl-2-imidazolidinone, propylene carbonate, N,N'-dimethylpropylene urea and the like.
- Other components may be added to this solution when adjusting the solid content concentration of the polymetalloxane solution.
- Other components include fluorine-based surfactants, surfactants such as silicone-based surfactants, silane coupling agents, cross-linking agents, cross-linking accelerators, and the like. Specific examples thereof include those described in International Publication No. 2017/90512 and International Publication No. 2019/188835.
- solid object Al, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge, Obtaining a solid material containing oxygen atoms and at least one metal atom selected from the group consisting of Y, Zr, Nb, Mo, Pd, Ag, In, Sn, Sb, Hf, Ta, W and Bi. can be done.
- the solid material obtained in this manner is a hardened body mainly composed of a resin having a metal atom with a high electron density in the main chain. can be easily obtained.
- the obtained solid material has high heat resistance because it is a dielectric material that does not have free electrons.
- Solid objects include membranes and fibers. Specific embodiments and manufacturing methods will be described later.
- the solid object is a film, it is sometimes called a cured film.
- the carbon atom weight in the solid is preferably 10 atomic % or less, more preferably 8 atomic % or less, and even more preferably 5 atomic %. When the carbon atom weight in the solid is within the above range, the solid can have high heat resistance.
- the amount of carbon atoms in a solid can be measured by Rutherford Backscattering Spectroscopy (RBS). Specifically, a solid object is irradiated with an ion beam (H + or He ++ ), and the energy and intensity of ions scattered backward by Rutherford scattering are measured. From the scattered ion energy spectrum obtained, the mass numbers of the colliding atoms are examined to obtain the average atomic number ratio of the solid matter. An average atomic ratio of carbon atoms is selected from among the obtained average atomic ratios, and this is taken as the carbon atomic weight in the solid.
- RBS Rutherford Backscattering Spectroscopy
- a fiber can be obtained by spinning a solution of the polymetalloxane or composition thereof according to the embodiment of the present invention. That is, the fiber according to the embodiment of the present invention contains the above-described polymetalloxane or the above-described polymetalloxane composition. The fibers thus obtained can be made into metal oxide fibers by firing.
- Fibers made of metal oxides have properties such as high heat resistance, high strength, and surface activity, and are expected to have useful properties for various applications.
- Such fibers are generally produced by a melt fiberization method. This method is as follows. For example, in this method, first, a metal oxide raw material and a low melting point compound such as silica are mixed. The mixture is then melted in a high temperature furnace and the melt is removed as a stream. By blowing high-pressure air or applying centrifugal force to this stream, it is rapidly cooled to form metal oxide fibers.
- the higher the concentration of the metal oxide raw material the higher the melting temperature. abbreviated) is difficult to obtain.
- a spinning solution containing a metal oxide raw material and a thickening agent is generally used to prepare a fibrous precursor, which is heated and spun. It has been known. However, in such a method, voids and cracks are generated when the thickener is burned off during the firing process, resulting in insufficient strength of the obtained metal oxide fibers.
- the polymetalloxane and the composition thereof according to the embodiment of the present invention can be handled in a solution state, they can be spun without the need for a melting process as in the melt fiberization method described above.
- the polymetalloxane and the composition thereof do not require a thickening agent during spinning, a dense metal oxide fiber can be obtained. Therefore, metal oxide fibers having properties such as high heat resistance, high strength, and surface activity can be easily obtained.
- a method for producing a fiber according to an embodiment of the present invention includes at least a spinning step of spinning the polymetalloxane or composition thereof described above to obtain a fiber.
- a known method can be used as a method for spinning the polymetalloxane or its composition.
- the spinning method includes a dry spinning method, a wet spinning method, a dry-wet spinning method, and an electrospinning method.
- polymetalloxane or composition thereof is abbreviated as "composition, etc.” as appropriate.
- the dry spinning method is a method in which a composition or the like is extruded into the atmosphere from a spinneret with pores under a load, and the organic solvent is evaporated to form a filamentous material.
- the composition or the like may be heated to reduce viscosity during extrusion.
- the composition or the like may be extruded into a heated atmosphere to control the evaporation rate of the organic solvent.
- the filamentous material can be stretched by a rotating roller or a high-speed air flow.
- Wet spinning is a method in which a composition or the like is extruded from a spinneret with fine pores into a coagulation bath under a load to remove the organic solvent and form a filamentous material.
- Water or a polar solvent is preferably used as the coagulation bath.
- Dry-wet spinning is a method in which a composition or the like is extruded into an atmosphere and then immersed in a coagulation bath to remove the organic solvent and form filaments.
- the electrospinning method In the electrospinning method, a high voltage is applied to a nozzle filled with a composition or the like, so that the droplets at the tip of the nozzle are charged, and the charges repel each other, causing the droplets to spread and the solution flow to be stretched. It is a method of spinning with With this method, it is possible to obtain filaments with a small diameter. Therefore, according to the electrospinning method, it is possible to obtain a fine filamentous material with a diameter of several tens of nanometers to several microns.
- the dry spinning method or the electrospinning method can be preferably used as the spinning method in the spinning step in the present invention.
- the fibers obtained by spinning may be subjected to drying treatment, steam treatment, hot water treatment, or a combination thereof, as necessary, before firing.
- the fiber manufacturing method includes the spinning step and the firing step of firing the fiber obtained by the spinning step when manufacturing the metal compound fiber.
- the firing temperature is not particularly limited, but is preferably 200° C. or higher and 2000° C. or lower, and more preferably 400° C. or higher and 1500° C. or lower.
- a firing method is not particularly limited. Examples of firing methods include a method of firing in an air atmosphere, a method of firing in an inert atmosphere such as nitrogen or argon, and a method of firing in a vacuum.
- the obtained metal oxide fibers may be further sintered in a reducing atmosphere such as hydrogen.
- the fiber obtained by spinning or the metal oxide fiber may be fired while applying tension.
- continuous and dense metal oxide fibers having an average fiber diameter of 0.01 ⁇ m or more and 1000 ⁇ m or less can be obtained.
- the average fiber diameter of the metal oxide fibers is preferably 0.01 ⁇ m or more and 1000 ⁇ m or less, more preferably 0.10 ⁇ m or more and 200 ⁇ m or less.
- the metal oxide fibers can be uniform fibers without cracks.
- the average fiber diameter of the obtained metal oxide fibers is obtained by the following method. For example, an adhesive tape is attached to a mount, and a monofilament whose fiber diameter is to be measured is horizontally adhered thereon to obtain a monofilament test piece. This single fiber test piece is observed from above with an electron microscope, and the width of the image is defined as the fiber diameter. The fiber diameter is measured three times along the length direction and taken as an average value. This operation is performed on 20 randomly selected single fibers, and the resulting fiber diameters are averaged to obtain the average fiber diameter.
- Fibers such as metal oxide fibers obtained by spinning a solution of the polymetalloxane or its composition according to the embodiment of the present invention and baking the fibers obtained by this spinning are photocatalysts, heat insulating materials, heat dissipating materials, and fiber reinforcement. It can be used as a composite material such as plastic (FRP).
- FRP plastic
- a photocatalyst it can be used in filters for water and air purification.
- a heat insulating material and a heat radiating material it can be used for electric furnaces, nuclear fuel rod sheaths, aircraft engine turbines, heat exchangers, and the like.
- a cured film according to an embodiment of the present invention contains the above-described polymetalloxane or the above-described polymetalloxane composition.
- the polymetalloxane or the composition containing the polymetalloxane described above can be coated on a substrate and heated to form a cured film. That is, this method for producing a cured film includes at least a heating step of heating the above-described polymetalloxane or composition thereof.
- the cured film thus obtained is a cured film mainly composed of a resin having a metal atom with a high electron density in the main chain. A high refractive index can be obtained. Moreover, since the cured film becomes a dielectric having no free electrons, high heat resistance can be obtained.
- the substrate to which the polymetalloxane or composition thereof is applied is not particularly limited, but examples include silicon wafers, sapphire wafers, glass, and optical films.
- glass include alkali glass, non-alkali glass, heat-strengthened glass, and chemically-strengthened glass.
- optical films include films made of acrylic resin, polyester resin, polycarbonate, polyarylate, polyethersulfone, polypropylene, polyethylene, polyimide, or cycloolefin polymer.
- the method for producing a cured film according to an embodiment of the present invention includes a coating step of coating the above-described polymetalloxane or composition thereof on a substrate, and the above-described heating step.
- a known method can be used as a coating method for coating the above-described polymetalloxane or composition thereof on the substrate.
- Apparatuses used for coating include full-surface coating apparatuses such as spin coating, dip coating, curtain flow coating, spray coating, and slit coating, and printing apparatuses such as screen printing, roll coating, microgravure coating, and inkjet.
- heating may be performed using a heating device such as a hot plate or an oven.
- Pre-baking is preferably carried out at a temperature of 50° C. to 150° C. for 30 seconds to 30 minutes, and the coating film on the substrate is preferably a pre-baked film.
- this coating film can have good film thickness uniformity.
- the thickness of the coating film after prebaking is preferably 0.1 ⁇ m or more and 15 ⁇ m or less.
- a heating step is performed to obtain a cured film by heating the polymetalloxane or its composition on the substrate.
- the coating film from the coating step or the pre-baked film is heated (cured) at a temperature range of 150° C. to 450° C. for about 30 seconds to 2 hours using a heating device such as a hot plate or an oven. .
- a cured film containing the polymetalloxane or the composition thereof can be obtained.
- the film thickness of this cured film is preferably 0.1 ⁇ m or more and 15 ⁇ m or less.
- the cured film obtained as described above preferably has a refractive index of 1.53 or more and 2.20 or less at a wavelength of 550 nm, more preferably 1.65 or more and 2.10 or less.
- the refractive index of the cured film can be measured by the following method.
- a spectroscopic ellipsometer is used to measure the change in the polarization state of light reflected from the cured film and the substrate to obtain the phase difference from the incident light and the amplitude reflectance spectrum.
- the refractive index spectrum is obtained by fitting the dielectric function of the computational model to approximate the obtained spectrum. By reading the refractive index value at a wavelength of 550 nm from the obtained refractive index spectrum, the refractive index of the cured film can be obtained.
- the cured film according to the embodiment of the present invention is excellent in refractive index and insulation, it is suitably used as a member of electronic parts such as solid-state imaging devices and displays.
- a member refers to a component part that assembles an electronic component. That is, the member according to the embodiment of the present invention is provided with a cured film containing the above-mentioned polymetalloxane or its composition.
- An electronic component according to an embodiment of the present invention is provided with such a cured film.
- the members of the solid-state imaging device include a condensing lens, an optical waveguide connecting the condensing lens and the optical sensor section, an antireflection film, and the like.
- Display components include index matching materials, planarizing materials, dielectric protection materials, and the like.
- the cured film according to the embodiment of the present invention can also be used as a protective film or dry etching resist in multilayer NAND flash memory, a buffer coat for semiconductor devices, an interlayer insulating film, and various protective films.
- the cured film according to the embodiment of the present invention is mainly composed of polymetalloxane having metal atoms in the main chain that are less reactive with the etching gas or etching solution when patterning an inorganic solid material by etching. , has high etching resistance. Therefore, the cured film pattern of the present invention can be used as a mask for patterning an inorganic solid material by etching.
- a cured film obtained from the composition of the present invention has a lower film stress than a carbon film. Therefore, when a cured film containing polymetalloxane is formed on an inorganic solid, stress applied to the substrate and the inorganic solid can be reduced.
- a step of applying the composition of the present invention on an inorganic solid material for example, a step of applying the composition of the present invention on an inorganic solid material, and heating the coating film obtained by the above coating step at a temperature of 100 ° C. or higher and 1000 ° C. or lower to obtain a cured film a step of forming a pattern of the cured film, and a step of patterning the inorganic solid by etching using the pattern of the cured film as a mask.
- the inorganic solid substance preferably contains SiO 2 or Si 3 N 4 .
- the inorganic solid substance is preferably composed of one or more materials selected from the group consisting of SiO 2 , Si 3 N 4 , Al 2 O 3 , TiO 2 and ZrO 2 .
- the inorganic solid is preferably a laminate of a plurality of inorganic solid layers.
- the method of forming the pattern of the cured film is not particularly limited, but for example, a photoresist pattern is formed on the cured film, or a compound selected from the group consisting of SiO 2 , Si 3 N 4 and carbon, Alternatively, a method of forming a hard mask pattern composed of a composite compound thereof and etching the cured film is preferred.
- a dry etching method or a wet etching method can be used using a photoresist pattern or a hard mask pattern as a mask.
- the dry etching method for the cured film uses a reactive ion etching device (RiE device) and uses methane trifluoride (CHF 3 ), methane tetrafluoride (CF 4 ), Cl 2 (chlorine), and BCl 3 as process gases. (boron trichloride), CCl 3 (carbon tetrachloride), oxygen, or a mixed gas thereof.
- Wet etching of heat-treated films includes hydrofluoric acid (HF), nitric acid (HNO 3 ), ammonium fluoride (NH 4 F), phosphoric acid (H 3 PO 4 ) or mixtures thereof, water and/or acetic acid (CH 3 COOH) is preferably used.
- the etching of the inorganic solid material using the pattern of the cured film as a mask is preferably dry etching or wet etching.
- a reactive ion etching device for dry etching of inorganic solids, a reactive ion etching device (RiE device) is used, and process gases are SF 6 (sulfur hexafluoride), NF 3 (nitrogen trifluoride), and CF 4 (carbon tetrafluoride). , C 2 F 6 (hexafluoroethane), C 3 F 8 (octafluoropropane), C 4 F 6 (hexafluoro-1,3-butadiene), CHF 3 (trifluoromethane), CH 2 F 2 ( difluoromethane), COF 2 (carbonyl fluoride), oxygen, or a mixed gas thereof.
- SF 6 sulfur hexafluoride
- NF 3 nitrogen trifluoride
- CF 4 carbon tetrafluoride
- C 2 F 6 hexafluoroethane
- C 3 F 8 octafluoropropane
- wet etching of inorganic solids includes hydrofluoric acid (HF), nitric acid ( HNO3 ), ammonium fluoride ( NH4F ), phosphoric acid ( H3PO4 ) or mixtures thereof, water and/or acetic acid (CH 3 COOH) is preferably used.
- DMIB N,N'-dimethylisobutyramide (manufactured by Mitsubishi Gas Chemical).
- TPnB 1-((1-((1-butoxypropan-2-yl)oxy)propan-2-yl)oxy)propan-2-ol (manufactured by Sigma Aldrich)
- PnB 1-butoxypropan-2-ol (manufactured by Sigma-Aldrich)
- DPnB 1-((1-butoxypropan-2-yl)oxy)propan-2-ol (manufactured by Sigma-Aldrich)
- DPM 1-((1-methoxypropan-2-yl)oxy)propan-2-ol (manufactured by Sigma-Aldrich).
- Solid content concentration In each synthesis example and working example, the solid content concentration of the polymetalloxane solution was measured by weighing 1.0 g of the polymetalloxane solution in an aluminum cup and heating it at 250° C. for 30 minutes using a hot plate to evaporate the liquid content. It was determined by weighing the solid content remaining in the aluminum cup after heating.
- FT-IR Fourier transform infrared spectroscopy
- the weight average molecular weight (Mw) was obtained by the following method.
- As a developing solvent lithium chloride was dissolved in N-methyl-2-pyrrolidone to prepare a 0.02 mol/dm 3 lithium chloride N-methyl-2-pyrrolidone solution.
- Polymetalloxane was dissolved in a developing solvent so as to be 0.2 wt %, and this was used as a sample solution.
- the developing solvent is passed through a porous gel column (Tosoh TSKgel ⁇ -M, ⁇ -3000, one each) at a flow rate of 0.5 mL/min, and 0.2 mL of the sample solution is injected into the porous gel column for analysis by gel permeation chromatography. rice field.
- the product eluted from the column was detected with a differential refractive index detector (Model RI-201, manufactured by Showa Denko), and the elution time was analyzed to determine the weight average molecular weight (Mw) in terms of polystyrene.
- the content of the structure in the portion surrounded by ( ) a in the polymetalloxane is expressed by the ratio of the number of moles of the structure in the portion surrounded by ( ) a to the number of moles of M atoms contained in the polymetalloxane.
- the polymetalloxane solution was decomposed under pressure with sulfuric acid and then with nitric acid, and then heated and incinerated. The obtained ash was melted with a mixed flux of sodium carbonate and boric acid, and dissolved with dilute nitric acid to a constant volume.
- the M atoms contained in the polymetalloxane were measured using ICP emission spectrometry, the content of M atoms was determined, and converted to the molar concentration of M atoms.
- the polymetalloxane solution was filled in an NMR tube, and 1 H-NMR and 13 C-NMR measurements were carried out using a nuclear magnetic resonance apparatus (NMR) to determine the structure of the portion enclosed by ( ) a . From the corresponding peak area, the molar concentration of the structure surrounded by ( ) a was determined. The obtained molar concentration of the structure in the portion surrounded by ( ) a was divided by the molar concentration of the M atom to obtain the content of the structure in the portion surrounded by ( ) a in the polymetalloxane.
- NMR nuclear magnetic resonance apparatus
- the viscosity was measured by the following method. The temperature of the sample was set to 25° C., and the viscosity of the sample was measured at a rotational speed of 3 rpm using a B-type viscometer with a digital operation function (DV-II, manufactured by Brookfield, Inc., USA).
- zirconium compound (Z-1) was analyzed by FT-IR, the absorption (1122 cm ⁇ 1 ) derived from propoxy was reduced compared to tripropoxy(trimethylsiloxy)zirconium, and it was newly attributed to the binding of TPnB and zirconium. A derived peak (1095 cm ⁇ 1 ) was confirmed. Moreover, since the absorption peak (968 cm ⁇ 1 ) of Zr—O—Si was also confirmed, it was confirmed that the obtained zirconium compound (Z-1) was a zirconium compound having the following structure.
- zirconium compound (Z-2) was analyzed by FT-IR, the absorption (1122 cm ⁇ 1 ) derived from propoxy was reduced compared to tripropoxy(trimethylsiloxy)zirconium, and it was newly found in the bond between PnB and zirconium. A derived peak (1095 cm ⁇ 1 ) was confirmed. Moreover, since the absorption peak (968 cm ⁇ 1 ) of Zr—O—Si was also confirmed, it was confirmed that the obtained zirconium compound (Z-2) was a zirconium compound having the following structure.
- zirconium compound (Z-3) was analyzed by FT-IR, compared with tripropoxy(trimethylsiloxy)zirconium, the absorption derived from propoxy (1122 cm -1 ) was reduced, and it was newly found in the binding of DPnB and zirconium. A derived peak (1095 cm ⁇ 1 ) was confirmed. Moreover, since the absorption peak (968 cm ⁇ 1 ) of Zr—O—Si was also confirmed, it was confirmed that the obtained zirconium compound (Z-3) was a zirconium compound having the following structure.
- zirconium compound (Z-4) was analyzed by FT-IR, compared with tripropoxy(trimethylsiloxy)zirconium, the absorption derived from propoxy (1122 cm ⁇ 1 ) was reduced, and it was newly found in the bond between DPM and zirconium. A derived peak (1095 cm ⁇ 1 ) was confirmed. Moreover, since the absorption peak (968 cm ⁇ 1 ) of Zr—O—Si was also confirmed, it was confirmed that the obtained zirconium compound (Z-4) was a zirconium compound having the following structure.
- Example 1 Polymetalloxane (A-1) solution 54.6 g (0.10 mol) of the zirconium compound (Z-1) synthesized in Synthesis Example 3 and 5.0 g of DMIB as a solvent were mixed, This was referred to as Solution 1. Further, 3.60 g (0.20 mol) of water, 50.0 g of IPA as a water-diluting solvent, and 0.37 g (0.02 mol) of tributylamine as a polymerization catalyst were mixed to obtain a solution 2. .
- a three-necked flask with a capacity of 500 mL was charged with the entire amount of Solution 1, and the flask was immersed in an oil bath at 40°C and stirred for 30 minutes. Then, for the purpose of hydrolysis, the dropping funnel was filled with the entire amount of Solution 2, and the solution was dropped into the flask over 1 hour. During the addition of Solution 2, precipitation did not occur in the liquid contained in the flask, and it was a uniform pale yellow transparent solution. After addition of Solution 2, the mixture was stirred for an additional hour to obtain a hydroxy group-containing metal compound. After that, the oil bath was heated to 140° C. over 30 minutes for the purpose of polycondensation.
- the obtained polymetalloxane (A-1) solution had a solid content concentration of 39.57% by mass and a viscosity of 304 cP.
- the storage stability of the polymetalloxane (A-1) solution was rated as A because the rate of change in viscosity was less than 10%.
- Example 2 Polymetalloxane (A-2) solution 38.2 g (0.07 mol) of the zirconium compound (Z-1) synthesized in Synthesis Example 3 and di-s-butoxy synthesized in Synthesis Example 2 ( 7.87 g (0.03 mol) of trimethylsiloxy)aluminum and 5.0 g of DMIB as a solvent were mixed to obtain a solution 3. Further, 3.60 g (0.20 mol) of water, 50.0 g of IPA as a water dilution solvent, and 0.37 g (0.02 mol) of tributylamine as a polymerization catalyst were mixed to obtain a solution 4. .
- a three-necked flask with a capacity of 500 mL was charged with the entire amount of the above solution 3, and the flask was immersed in an oil bath at 40°C and stirred for 30 minutes. Then, for the purpose of hydrolysis, the dropping funnel was filled with the entire amount of Solution 4, and the solution was dropped into the flask over 1 hour. During the addition of solution 4, no precipitation occurred in the liquid contained in the flask, and it was a uniform pale yellow transparent solution. After the addition of solution 4, the mixture was further stirred for 1 hour to obtain a hydroxy group-containing metal compound. After that, the oil bath was heated to 140° C. over 30 minutes for the purpose of polycondensation.
- the obtained polymetalloxane (A-2) solution had a solid content concentration of 44.07% by mass and a viscosity of 826 cP.
- the polymetalloxane (A-2) solution was analyzed by FT-IR, the absorption peak (1095 cm -1 ) derived from the bond between tripropylene glycol monobutyl ether and zirconium, the absorption peak of Zr-O-Si (968 cm -1 ) and Al—O—Si absorption peak (949 cm ⁇ 1 ) were confirmed, it was confirmed to be a polymetalloxane having a tripropylene glycol monobutyl ether group and a trimethylsiloxy group in the side chain.
- the weight average molecular weight (Mw) of polymetalloxane (A-2) was 234,000 in terms of polystyrene.
- the storage stability of the polymetalloxane (A-2) solution was rated as A because the rate of change in viscosity was less than 10%.
- Example 3 to 5 Polymetalloxane (A-3 to A-5) solutions Except that the amounts of zirconium compound (Z-1) and di-s-butoxy(trimethylsiloxy)aluminum were changed to the amounts shown in Table 1. was hydrolyzed and polycondensed in the same manner as in Example 2 to obtain polymetalloxane (A-3 to A-5) solutions. The appearance of each polymetalloxane (A-3 to A-5) solution was pale yellow and transparent. The structure content, solid concentration, viscosity and weight average molecular weight of the portion enclosed by ( ) a in the polymetalloxane were measured, and the storage stability was evaluated.
- a three-necked flask with a capacity of 500 mL was charged with the entire amount of the solution 5, and the flask was immersed in an oil bath at 40°C and stirred for 30 minutes. Then, for the purpose of hydrolysis, the dropping funnel was filled with the entire amount of the solution 6, and the solution was dropped into the flask over 1 hour. During the addition of Solution 6, no precipitation occurred in the flask content liquid, and it was a uniform pale yellow transparent solution. After addition of Solution 6, the mixture was stirred for an additional hour to obtain a hydroxy group-containing metal compound. After that, the oil bath was heated to 140° C. over 30 minutes for the purpose of polycondensation.
- Comparative Example 2 Polymetalloxane (B-2) Solution Hydrolysis and polycondensation were carried out in the same manner as in Comparative Example 1, except that the amount of DMIB mixed as a solvent was changed from 5.0 g to 15.0 g. During the heating and stirring, precipitation and gelation did not occur in the flask content liquid, and it was a uniform transparent solution.
- the liquid in the flask was cooled to room temperature to obtain a polymetalloxane (B-2) solution.
- the appearance of the obtained polymetalloxane solution was pale yellow and transparent.
- the resulting polymetalloxane (B-2) solution had a solid content concentration of 46.86% by mass and a viscosity of 1317 cP.
- the weight average molecular weight (Mw) of polymetalloxane (B-2) was 190,000 in terms of polystyrene.
- the storage stability of the polymetalloxane (B-2) solution was judged as C because the viscosity change rate was 50% or more.
- a three-necked flask with a capacity of 500 mL was charged with the entire amount of the solution 7, and the flask was immersed in an oil bath at 40°C and stirred for 30 minutes. Then, for the purpose of hydrolysis, the dropping funnel was filled with the entire amount of the solution 8, and the solution was dropped into the flask over 1 hour. During the addition of solution 8, no precipitation occurred in the liquid in the flask, and it was a uniform pale yellow transparent solution. After addition of solution 8, the mixture was stirred for an additional hour to obtain a hydroxy group-containing metal compound. After that, the oil bath was heated to 140° C. over 30 minutes for the purpose of polycondensation.
- Comparative Example 4 Polymetalloxane (B-4) Solution Hydrolysis and polycondensation were carried out in the same manner as in Comparative Example 3, except that 5.0 g of DMIB mixed as a solvent was changed to 15.0 g. During the heating and stirring, precipitation and gelation did not occur in the flask content liquid, and it was a uniform transparent solution.
- the liquid in the flask was cooled to room temperature to obtain a polymetalloxane (B-4) solution.
- the appearance of the obtained polymetalloxane solution was pale yellow and transparent.
- the obtained polymetalloxane (B-4) solution had a solid content concentration of 43.84% by mass and a viscosity of 827 cP.
- polymetalloxane (B-4) solution was analyzed by FT-IR, an absorption peak (968 cm ⁇ 1 ) of Zr—O—Si was confirmed, so that polymetalloxane having a trimethylsiloxy group in the side chain Confirmed that there is.
- the weight average molecular weight (Mw) of polymetalloxane (B-4) was 280,000 in terms of polystyrene.
- the storage stability of the polymetalloxane (B-4) solution was determined as D because the viscosity change rate was 100% or more.
- a three-necked flask with a capacity of 500 mL was charged with the entire amount of the solution 9, and the flask was immersed in an oil bath at 40°C and stirred for 30 minutes. Then, for the purpose of hydrolysis, the dropping funnel was filled with the entire amount of the solution 10, and the solution was dropped into the flask over 1 hour. During the addition of solution 10, no precipitation occurred in the liquid in the flask, and it was a uniform pale yellow transparent solution. After addition of Solution 10, the mixture was stirred for an additional hour to obtain a hydroxy group-containing metal compound. After that, the oil bath was heated to 140° C. over 30 minutes for the purpose of polycondensation.
- the liquid in the flask was cooled to room temperature to obtain a polymetalloxane (B-5) solution.
- the appearance of the obtained polymetalloxane solution was pale yellow and transparent.
- the obtained polymetalloxane (B-5) solution had a solid content concentration of 47.63% by mass and a viscosity of 1785 cP.
- polymetalloxane (B-5) solution was analyzed by FT-IR, an absorption peak of Zr-O-Si (968 cm -1 ) and an absorption peak of Al-O-Si (949 cm -1 ) were confirmed. From the results, it was confirmed to be a polymetalloxane having a trimethylsiloxy group in the side chain.
- the weight average molecular weight (Mw) of polymetalloxane (B-5) was 218,000 in terms of polystyrene.
- the storage stability of the polymetalloxane (B-5) solution was determined as D because the viscosity change rate was 100% or more.
- Example 6 Polymetalloxane (A-6) solution Hydrolysis and polycondensation were carried out in the same manner as in Example 1 except that 5.0 g of DMIB mixed as a solvent was not mixed. During the heating and stirring, precipitation and gelation did not occur in the flask content liquid, and it was a uniform transparent solution.
- Example 7 to 9 Polymetalloxane (A-7 to A-9) solutions
- the amounts of zirconium compound (Z-1) and di-s-butoxy(trimethylsiloxy)aluminum were changed to the amounts shown in Table 1, Hydrolysis and polycondensation were carried out in the same manner as in Example 2 except that 5.0 g of DMIB mixed as a solvent was not mixed. During the heating and stirring, precipitation and gelation did not occur in the flask content liquid, and it was a uniform transparent solution.
- each polymetalloxane (A-7 to A-9) solution After heating, the contents of the flask were cooled to room temperature to obtain each polymetalloxane (A-7 to A-9) solution. The appearance of the obtained polymetalloxane solution was pale yellow and transparent. Solid content concentration, viscosity and weight average molecular weight were measured, and storage stability was evaluated.
- Example 10 to 12 Polymetalloxane (A-10 to A-12) Hydrolysis and polycondensation were carried out in the same manner as in Example 3, except that the type and amount of the zirconium compound was changed as shown in Table 1 and the amount of DMIB used as a solvent was changed as shown in Table 1. During the heating and stirring, precipitation and gelation did not occur in the flask content liquid, and it was a uniform transparent solution.
- Example 13 Polymetalloxane (A-13) Hydrolysis and polycondensation were carried out in the same manner as in Example 3, except that the amount of water shown in Table 1 was changed. During the heating and stirring, precipitation and gelation did not occur in the flask content liquid, and it was a uniform transparent solution.
- each polymetalloxane (A-13) solution After completion of heating, the contents of the flask were cooled to room temperature to obtain each polymetalloxane (A-13) solution. The appearance of the obtained polymetalloxane solution was pale yellow and transparent. The structure content, solid content concentration, viscosity and weight average molecular weight of the portion enclosed by ( ) a in the polymetalloxane were measured, and the storage stability was evaluated.
- Example 14 (Preparation of composition) DMIB was added as a solvent to the polymetalloxane (A-3) solution synthesized in Example 3 to adjust the solid content concentration to 20% by mass.
- the crack resistance of the obtained cured film was evaluated in the following five stages. 4 or more was set as the pass. 5: Cracks are not visible in optical microscope observation (magnification: 5 times) 4: Cracks are slightly visible in optical microscope observation (magnification: 5 times) 3: Cracks are clearly visible in optical microscope observation (magnification: 5 times) 2 1: Cracks are clearly visible by normal visual inspection.
- the carbon content in the solid matter was measured for the prepared cured film having a thickness of 0.5 ⁇ m.
- the carbon atom content in the solid substance was obtained by the following method.
- the cured film was irradiated with an ion beam using Pelletron 3SDH (manufactured by National Electrodtstics) to obtain a scattered ion energy spectrum.
- Pelletron 3SDH manufactured by National Electrodtstics
- the mass numbers of the atoms that collided were examined to obtain the average atomic number ratio of the cured film.
- the average atomic ratio of carbon atoms was selected from among the obtained average atomic ratios, and this was used as the carbon atomic weight in the solid.
- the measurement conditions were as follows: incident ion: 4He ++ , incident energy: 2300 keV, incident angle: 0 deg, scattering angle: 160 deg, sample current: 8 nA, beam diameter: 2 mm ⁇ , irradiation amount: 48 ⁇ C.
- Table 1 shows the carbon content in the solid matter.
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Abstract
Description
R1は、水素原子、炭素数1~8のアルキル基、炭素数1~8のアルキルカルボニル基、炭素数6~12のアリール基、炭素数7~13のアラルキル基、(R5 3Si-)基、(R6R7N-)基、4-オキソペント-2-エン-2-イル基、炭素数5~12の4-アルコキシ-4-オキソブタ-2-エン-2-イル基および炭素数10~16の4-アリールオキシ-4-オキソブタ-2-エン-2-イル基の中から選ばれる;
R2およびR3は、それぞれ独立に、水素原子または炭素数1~8のアルキル基である;
R4は、水素原子、炭素数1~8のアルキル基または炭素数1~8のアルキルカルボニル基である;
R5は、ヒドロキシ基、炭素数1~8のアルキル基、炭素数5~12の脂環式アルキル基、炭素数1~12のアルコキシ基、炭素数6~12のアリール基、炭素数7~13のアラルキル基またはシロキサン結合を有する基である;複数存在するR5は、それぞれ同じでも異なっていてもよい;
R6およびR7は、それぞれ独立に、水素原子、炭素数1~8のアルキル基、炭素数5~12の脂環式アルキル基、炭素数6~12のアリール基、炭素数7~13のアラルキル基または炭素数1~12のアシル基である;R6およびR7は、炭素-炭素飽和結合または炭素-炭素不飽和結合を介して連結し、環構造を形成していてもよい;
mは金属原子Mの価数を示す整数である;
aは1~(m-2)の整数である;
bは1~6の整数であり、cは1~5の整数である。
R1は、水素原子、炭素数1~8のアルキル基、炭素数1~8のアルキルカルボニル基、炭素数6~12のアリール基、炭素数7~13のアラルキル基、(R5 3Si-)基、(R6R7N-)基、4-オキソペント-2-エン-2-イル基、炭素数5~12の4-アルコキシ-4-オキソブタ-2-エン-2-イル基および炭素数10~16の4-アリールオキシ-4-オキソブタ-2-エン-2-イル基の中から選ばれる。
R2およびR3は、それぞれ独立に、水素原子または炭素数1~8のアルキル基である。
R4は、水素原子、炭素数1~8のアルキル基または炭素数1~8のアルキルカルボニル基である。
R5は、ヒドロキシ基、炭素数1~8のアルキル基、炭素数5~12の脂環式アルキル基、炭素数1~12のアルコキシ基、炭素数6~12のアリール基、炭素数7~13のアラルキル基またはシロキサン結合を有する基である。複数存在するR5は、それぞれ同じでも異なっていてもよい。
R6およびR7は、それぞれ独立に、水素原子、炭素数1~8のアルキル基、炭素数5~12の脂環式アルキル基、炭素数6~12のアリール基、炭素数7~13のアラルキル基または炭素数1~12のアシル基である。R6およびR7は、炭素-炭素飽和結合または炭素-炭素不飽和結合を介して連結し、環構造を形成していてもよい。
mは金属原子Mの価数を示す整数である。
aは1~(m-2)の整数である。
bは1~6の整数であり、cは1~5の整数である。
2-エトキシエトキシ基、3-エトキシプロポキシ基、4-エトキシブトキシ基、5-エトキシヘキシロキシ基、(1-エトキシプロパン-2-イル)オキシ基、2-エトキシプロポキシ基、
2-プロポキシエトキシ基、3-プロポキシプロポキシ基、4-プロポキシブトキシ基、5-プロポキシヘキシロキシ基、(1-プロポキシプロパン-2-イル)オキシ基、2-プロポキシプロポキシ基、
2-ブトキシエトキシ基、3-ブトキシプロポキシ基、4-ブトキシブトキシ基、5-ブトキシヘキシロキシ基、(1-ブトキシプロパン-2-イル)オキシ基、2-ブトキシプロポキシ基、
2-(2-メトキシエトキシ)エトキシ基、3-(3-メトキシプロポキシ)プロポキシ基、4-(4-メトキシブトキシ)ブトキシ基、5-(5-メトキシヘキシロキシ)ヘキシロキシ基、(1-((1-メトキシプロパン-2-イル)オキシ)プロパン-2-イル)オキシ基、2-(2-メトキシプロポキシ)プロポキシ基、
2-(2-エトキシエトキシ)エトキシ基、3-(3-エトキシプロポキシ)プロポキシ基、4-(4-エトキシブトキシ)ブトキシ基、5-(5-エトキシヘキシロキシ)ヘキシロキシ基、(1-((1-エトキシプロパン-2-イル)オキシ)プロパン-2-イル)オキシ基、2-(2-エトキシプロポキシ)プロポキシ基、
2-(2-プロポキシエトキシ)エトキシ基、3-(3-プロポキシプロポキシ)プロポキシ基、4-(4-プロポキシブトキシ)ブトキシ基、5-(5-プロポキシヘキシロキシ)ヘキシロキシ基、(1-((1-プロポキシプロパン-2-イル)オキシ)プロパン-2-イル)オキシ基、2-(2-プロポキシプロポキシ)プロポキシ基、
2-(2-ブトキシエトキシ)エトキシ基、3-(3-ブトキシプロポキシ)プロポキシ基、4-(4-ブトキシブトキシ)ブトキシ基、5-(5-ブトキシヘキシロキシ)ヘキシロキシ基、(1-((1-ブトキシプロパン-2-イル)オキシ)プロパン-2-イル)オキシ基、2-(2-ブトキシプロポキシ)プロポキシ基、
2-(2-(2-メトキシエトキシ)エトキシ)エトキシ基、3-(3-(3-メトキシプロポキシ)プロポキシ)プロポキシ基、4-(4-(4-メトキシブトキシ)ブトキシ)ブトキシ基、5-(5-(5-メトキシヘキシロキシ)ヘキシロキシ)ヘキシロキシ基、(1-((1-((1-メトキシプロパン-2-イル)オキシ)プロパン-2-イル)オキシ)プロパン-2-イル)オキシ基、2-(2-(2-メトキシプロポキシ)プロポキシ)プロポキシ基、
2-(2-(2-エトキシエトキシ)エトキシ)エトキシ基、3-(3-(3-エトキシプロポキシ)プロポキシ)プロポキシ基、4-(4-(4-エトキシブトキシ)ブトキシ)ブトキシ基、5-(5-(5-エトキシヘキシロキシ)ヘキシロキシ)ヘキシロキシ基、(1-((1-((1-エトキシプロパン-2-イル)オキシ)プロパン-2-イル)オキシ)プロパン-2-イル)オキシ基、2-(2-(2-エトキシプロポキシ)プロポキシ)プロポキシ基、
2-(2-(2-プロポキシエトキシ)エトキシ)エトキシ基、3-(3-(3-プロポキシプロポキシ)プロポキシ)プロポキシ基、4-(4-(4-プロポキシブトキシ)ブトキシ)ブトキシ基、5-(5-(5-プロポキシヘキシロキシ)ヘキシロキシ)ヘキシロキシ基、(1-((1-((1-プロポキシプロパン-2-イル)オキシ)プロパン-2-イル)オキシ)プロパン-2-イル)オキシ基、2-(2-(2-プロポキシプロポキシ)プロポキシ)プロポキシ基、
2-(2-(2-ブトキシエトキシ)エトキシ)エトキシ基、3-(3-(3-ブトキシプロポキシ)プロポキシ)プロポキシ基、4-(4-(4-ブトキシブトキシ)ブトキシ)ブトキシ基、5-(5-(5-ブトキシヘキシロキシ)ヘキシロキシ)ヘキシロキシ基、(1-((1-((1-ブトキシプロパン-2-イル)オキシ)プロパン-2-イル)オキシ)プロパン-2-イル)オキシ基、2-(2-(2-ブトキシプロポキシ)プロポキシ)プロポキシ基などが挙げられる。
一般式(1)で表されるポリメタロキサンの製造方法に特に制限はないが、以下に示す方法を用いることが可能である。
その他、一般式(2)と同じ符号で表されるものは一般式(2)におけるものと同じである。
N-スクシンイミジルオキシ基、N-フタルイミジルオキシ基、N-(5-ノルボルネン-2,3-ジカルボキシイミジル)オキシ基、N-(N'-ヒドロキシピロメリットイミジル)オキシ基、N-(1,8-ナフタルイミジル)オキシ基、N-(N’-ヒドロキシ-1,2,3,4-シクロブタンテトラカルボン酸ジイミジル)オキシ基;
(4-オキソペント-2-エン-2-イル)オキシ基;
(4-メトキシ-4-オキソブタ-2-エン-2-イル)オキシ基、(4-エトキシ-4-オキソブタ-2-エン-2-イル)オキシ基、(4-プロポキシ-4-オキソブタ-2-エン-2-イル)オキシ基、(4-ブトキシ-4-オキソブタ-2-エン-2-イル)オキシ基;
(4-フェニルオキシ-4-オキソブタ-2-エン-2-イル)オキシ基、(4-ナフチルオキシ-4-オキソブタ-2-エン-2-イル)オキシ基。
2-メトキシエタノール、3-メトキシプロパノール、4-メトキシブタノール、5-メトキシヘキサノール、1-メトキシプロパン-2-オール、2-メトキシプロパノール、
2-エトキシエタノール、3-エトキシプロパノール、4-エトキシブタノール、5-エトキシヘキサノール、1-エトキシプロパン-2-オール、2-エトキシプロパノール、
2-プロポキシエタノール、3-プロポキシプロパノール、4-プロポキシブタノール、5-プロポキシヘキサノール、1-プロポキシプロパン-2-オール、2-プロポキシプロパノール、
2-ブトキシエタノール、3-ブトキシプロパノール、4-ブトキシブタノール、5-ブトキシヘキサノール、1-ブトキシプロパン-2-オール、2-ブトキシプロパノール、
2-(2-メトキシエトキシ)エタノール、3-(3-メトキシプロポキシ)プロパノール、4-(4-メトキシブトキシ)ブタノール、5-(5-メトキシヘキシロキシ)ヘキサノール、1-((1-メトキシプロパン-2-イル)オキシ)プロパン-2-オール、2-(2-メトキシプロポキシ)プロパノール、
2-(2-エトキシエトキシ)エタノール、3-(3-エトキシプロポキシ)プロパノール、4-(4-エトキシブトキシ)ブタノール、5-(5-エトキシヘキシロキシ)ヘキサノール、1-((1-エトキシプロパン-2-イル)オキシ)プロパン-2-オール、2-(2-エトキシプロポキシ)プロパノール、
2-(2-プロポキシエトキシ)エタノール、3-(3-プロポキシプロポキシ)プロパノール、4-(4-プロポキシブトキシ)ブタノール、5-(5-プロポキシヘキシロキシ)ヘキサノール、1-((1-プロポキシプロパン-2-イル)オキシ)プロパン-2-オール、2-(2-プロポキシプロポキシ)プロパノール、
2-(2-ブトキシエトキシ)エタノール、3-(3-ブトキシプロポキシ)プロパノール、4-(4-ブトキシブトキシ)ブタノール、5-(5-ブトキシヘキシロキシ)ヘキサノール、1-((1-ブトキシプロパン-2-イル)オキシ)プロパン-2-オール、2-(2-ブトキシプロポキシ)プロパノール、
2-(2-(2-メトキシエトキシ)エトキシ)エタノール、3-(3-(3-メトキシプロポキシ)プロポキシ)プロパノール、4-(4-(4-メトキシブトキシ)ブトキシ)ブタノール、5-(5-(5-メトキシヘキシロキシ)ヘキシロキシ)ヘキサノール、1-((1-((1-メトキシプロパン-2-イル)オキシ)プロパン-2-イル)オキシ)プロパン-2-オール、2-(2-(2-メトキシプロポキシ)プロポキシ)プロパノール、
2-(2-(2-エトキシエトキシ)エトキシ)エタノール、3-(3-(3-エトキシプロポキシ)プロポキシ)プロパノール、4-(4-(4-エトキシブトキシ)ブトキシ)ブタノール、5-(5-(5-エトキシヘキシロキシ)ヘキシロキシ)ヘキサノール、1-((1-((1-エトキシプロパン-2-イル)オキシ)プロパン-2-イル)オキシ)プロパン-2-オール、2-(2-(2-エトキシプロポキシ)プロポキシ)プロパノール、
2-(2-(2-プロポキシエトキシ)エトキシ)エタノール、3-(3-(3-プロポキシプロポキシ)プロポキシ)プロパノール、4-(4-(4-プロポキシブトキシ)ブトキシ)ブタノール、5-(5-(5-プロポキシヘキシロキシ)ヘキシロキシ)ヘキサノール、1-((1-((1-プロポキシプロパン-2-イル)オキシ)プロパン-2-イル)オキシ)プロパン-2-オール、2-(2-(2-プロポキシプロポキシ)プロポキシ)プロパノール、
2-(2-(2-ブトキシエトキシ)エトキシ)エタノール、3-(3-(3-ブトキシプロポキシ)プロポキシ)プロパノール、4-(4-(4-ブトキシブトキシ)ブトキシ)ブタノール、5-(5-(5-ブトキシヘキシロキシ)ヘキシロキシ)ヘキサノール、1-((1-((1-ブトキシプロパン-2-イル)オキシ)プロパン-2-イル)オキシ)プロパン-2-オール、2-(2-(2-ブトキシプロポキシ)プロポキシ)プロパノールなどが挙げられる。
ケトン系溶媒の具体例としては、ジイソブチルケトン、アセチルアセトン、シクロペンタノン、シクロヘキサノンなどが挙げられる。
本発明の実施の形態に係るポリメタロキサンは、溶媒やその他必要な成分と混合して組成物とすることができる。すなわち、本発明の実施の形態に係る組成物は、少なくとも、上述したポリメタロキサンを含むものである。
本発明の実施の形態に係るポリメタロキサンまたはその組成物を加熱して硬化させることにより、Al、Sc、Ti、V、Cr、Mn、Fe、Co、Ni、Cu、Zn、Ga、Ge、Y、Zr、Nb、Mo、Pd、Ag、In、Sn、Sb、Hf、Ta、WおよびBiからなる群より選ばれる金属原子のうち1種以上と、酸素原子とを含む固体物を得ることができる。このようにして得られた固体物は、電子密度の高い金属原子を主鎖に有する樹脂を主体とする硬化体となるため、固体物中における金属原子の濃度を高くすることができ、高い密度を有する固体物を容易に得ることができる。また、得られた固体物は、自由電子を有さない誘電体となることから、高い耐熱性を有する。
本発明の実施の形態に係るポリメタロキサンまたはその組成物の溶液を紡糸することで、繊維とすることができる。すなわち、本発明の実施の形態に係る繊維は、上述したポリメタロキサンを含有するもの、または上述したポリメタロキサンの組成物を含有するものである。このようにして得られた繊維は、焼成することにより、金属酸化物繊維とすることができる。
本発明の実施の形態に係る繊維の製造方法は、少なくとも、上述したポリメタロキサンまたはその組成物を紡糸して繊維を得る紡糸工程を含む。この紡糸工程において、ポリメタロキサンまたはその組成物を紡糸する方法としては、公知の方法を用いることができる。例えば、この紡糸の方法として、乾式紡糸法、湿式紡糸法、乾湿式紡糸法、エレクトロスピニング法が挙げられる。以下、「ポリメタロキサンまたはその組成物」は、「組成物等」と適宜略記する。
本発明の実施の形態に係る硬化膜は、上述したポリメタロキサンを含有するもの、または上述したポリメタロキサンの組成物を含有するものである。本発明の実施の形態に係る硬化膜の製造方法において、上述したポリメタロキサンまたはそれを含む組成物は、基板上に塗布し、加熱することにより硬化膜とすることができる。すなわち、この硬化膜の製造方法は、少なくとも、上述したポリメタロキサンまたはその組成物を加熱する加熱工程を含む。このようにして得られた硬化膜は、電子密度の高い金属原子を主鎖に有する樹脂を主体とする硬化膜となるため、硬化膜中における金属原子の密度を高くすることができ、容易に高い屈折率を得ることができる。また、当該硬化膜は、自由電子を有さない誘電体となることから、高い耐熱性を得ることができる。
本発明の実施の形態に係る硬化膜は、屈折率や絶縁性に優れるため、固体撮像素子、ディスプレイ等の電子部品の部材として好適に用いられる。部材とは、電子部品を組み立てている部分品を指す。すなわち、本発明の実施の形態に係る部材は、上述したポリメタロキサンまたはその組成物を含有する硬化膜を具備するものである。本発明の実施の形態に係る電子部品は、このような硬化膜を具備するものである。例えば、固体撮像素子の部材として、集光用レンズや、集光用レンズと光センサー部とを繋ぐ光導波路、反射防止膜などが挙げられる。ディスプレイの部材として、インデックスマッチング材、平坦化材、絶縁保護材などが挙げられる。
DMIB:N,N’-ジメチルイソブチルアミド(三菱ガス化学製)。
PnB:1-ブトキシプロパン-2-オール(シグマ アルドリッチ製)
DPnB:1-((1-ブトキシプロパン-2-イル)オキシ)プロパン-2-オール(シグマ アルドリッチ製)
DPM:1-((1-メトキシプロパン-2-イル)オキシ)プロパン-2-オール(シグマ アルドリッチ製)。
各合成例、実施例において、ポリメタロキサン溶液の固形分濃度は、アルミカップにポリメタロキサン溶液を1.0g秤取し、ホットプレートを用いて250℃で30分間加熱して液分を蒸発させ、加熱後のアルミカップに残った固形分を秤量することにより求めた。
フーリエ変換型赤外分光(以下、FT-IRと略す)による分析は、以下の方法により行った。まず、フーリエ変換型赤外分光計(島津製作所製FT720)を用いて、シリコンウェハーを2枚重ねたものを測定し、それをベースラインとした。次いで、金属化合物あるいはその溶液をシリコンウェハー上に1滴垂らし、それを別のシリコンウェハーで挟むことにより、それを測定試料とした。測定試料の吸光度と、ベースラインの吸光度の差から、化合物あるいはその溶液の吸光度を算出し、吸収ピークを読み取った。
重量平均分子量(Mw)は、以下の方法により求めた。展開溶媒として、N-メチル-2-ピロリドンに塩化リチウムを溶解し、0.02mol/dm3塩化リチウムN-メチル-2-ピロリドン溶液を作成した。展開溶媒にポリメタロキサンを0.2wt%となるように溶解し、これを試料溶液とした。展開溶媒を多孔質ゲルカラム(東ソー製TSKgel α-M、α-3000各1本)に流速0.5mL/minで流し、ここに試料溶液を0.2mL注入してゲル浸透クロマトグラフィーによる分析を行った。カラムからの溶出物を示差屈折率検出器(昭和電工製RI-201型)により検出し、溶出時間を解析することにより、ポリスチレン換算の重量平均分子量(Mw)を求めた。
ポリメタロキサン中の( )aで囲まれた部分の構造の含有量は、ポリメタロキサンに含まれるM原子のモル数に対する( )aで囲まれた部分の構造のモル数の比率で表した。具体的には、ポリメタロキサン溶液を硫酸、次いで硝酸を用いて加圧分解した後、加熱灰化した。得られた灰分を炭酸ナトリウムとほう酸の混合融剤で融解し、希硝酸で溶解して定容とした。この溶液について、ICP 発光分光分析法を用いてポリメタロキサンに含まれるM原子を測定し、M原子の含有量を求め、M原子のモル濃度に換算した。次いで、ポリメタロキサン溶液をNMRチューブに充填し、核磁気共鳴装置(NMR)を用いて、1H-NMRおよび13C-NMR測定を行うことにより、( )aで囲まれた部分の構造に対応するピーク面積から、( )aで囲まれた部分の構造のモル濃度を求めた。得られた( )aで囲まれた部分の構造のモル濃度をM原子のモル濃度で割ることにより、ポリメタロキサン中の( )aで囲まれた部分の構造の含有量とした。
粘度の測定は、以下の方法により行った。サンプルの温度を25℃とし、デジタル演算機能付きB型粘度計(DV-II、米国ブルックフィールド社製)を用いて、回転数3rpmで当該サンプルの粘度を測定した。
保存安定性の測定は、以下の方法により行った。各実施例および比較例により得られたポリメタロキサン溶液について、合成終了直後に粘度を測定し、これを保管前の粘度とした。次いで、各実施例および比較例により得られたポリメタロキサン溶液を密封容器に入れ、23℃で7日保管した後の粘度測定し、これを保管後の粘度とした。粘度変化率=((保管後粘度-保管前粘度)/保管前粘度)として、以下の基準により保存安定性を評価した。
A:粘度変化率10%未満
B:粘度変化率10%以上50%未満
C:粘度変化率50%以上100%未満
D:粘度変化率100%以上。
特許第6327366号の合成例8に記載の方法により、トリプロポキシ(トリメチルシロキシ)ジルコニウムを合成した。
容量500mlの三口フラスコに、トリ-s-ブトキシアルミニウムを24.6g(0.1mol)仕込み、フラスコを40℃のオイルバスに浸けて30分間撹拌した。その後、滴下ロートを用いてトリメチルシラノール9.0g(0.1mol)を1時間かけて添加し、添加後さらに1時間撹拌した。フラスコ内容物を200mlナス型フラスコに移し、生成したs-ブタノールを減圧留去することにより、無色液体のアルミニウム化合物を得た。
容量500mlの三口フラスコに、トリプロポキシ(トリメチルシロキシ)ジルコニウムを35.8g(0.1mol)仕込み、フラスコを40℃のオイルバスに浸けて30分間撹拌した。その後、滴下ロートを用いてTPnB24.8g(0.1mol)を1時間かけて添加し、添加後さらに1時間撹拌した。フラスコ内容物を200mlナス型フラスコに移し、生成したプロパノールを減圧留去することにより、無色液体のジルコニウム化合物(Z-1)を得た。
容量500mlの三口フラスコに、トリプロポキシ(トリメチルシロキシ)ジルコニウムを35.8g(0.1mol)仕込み、フラスコを40℃のオイルバスに浸けて30分間撹拌した。その後、滴下ロートを用いてPnB13.2g(0.1mol)を1時間かけて添加し、添加後さらに1時間撹拌した。フラスコ内容物を200mlナス型フラスコに移し、生成したプロパノールを減圧留去することにより、無色液体のジルコニウム化合物(Z-2)を得た。
容量500mlの三口フラスコに、トリプロポキシ(トリメチルシロキシ)ジルコニウムを35.8g(0.1mol)仕込み、フラスコを40℃のオイルバスに浸けて30分間撹拌した。その後、滴下ロートを用いてDPnB19.0g(0.1mol)を1時間かけて添加し、添加後さらに1時間撹拌した。フラスコ内容物を200mlナス型フラスコに移し、生成したプロパノールを減圧留去することにより、無色液体のジルコニウム化合物(Z-3)を得た。
容量500mlの三口フラスコに、トリプロポキシ(トリメチルシロキシ)ジルコニウムを35.8g(0.1mol)仕込み、フラスコを40℃のオイルバスに浸けて30分間撹拌した。その後、滴下ロートを用いてDPM14.8g(0.1mol)を1時間かけて添加し、添加後さらに1時間撹拌した。フラスコ内容物を200mlナス型フラスコに移し、生成したプロパノールを減圧留去することにより、無色液体のジルコニウム化合物(Z-4)を得た。
合成例3で合成したジルコニウム化合物(Z-1)を54.6g(0.10mol)と、溶媒としてDMIBを5.0gとを混合し、これを溶液1とした。また、水を3.60g(0.20mol)と、水希釈溶媒としてIPAを50.0gと、重合触媒としてトリブチルアミンを0.37g(0.02mol)とを混合し、これを溶液2とした。
合成例3で合成したジルコニウム化合物(Z-1)を38.2g(0.07mol)と、合成例2で合成したジ-s-ブトキシ(トリメチルシロキシ)アルミニウムを7.87g(0.03mol)と、溶媒としてDMIBを5.0gとを混合し、これを溶液3とした。また、水を3.60g(0.20mol)と、水希釈溶媒としてIPAを50.0gと、重合触媒としてトリブチルアミンを0.37g(0.02mol)とを混合し、これを溶液4とした。
ジルコニウム化合物(Z-1)、ジ-s-ブトキシ(トリメチルシロキシ)アルミニウムの量を表1記載の量に変更した以外は、実施例2と同様に加水分解、重縮合を行い、ポリメタロキサン(A-3~A-5)溶液を得た。各ポリメタロキサン(A-3~A-5)溶液の外観は、淡黄色透明であった。ポリメタロキサン中の( )aで囲まれた部分の構造の含有量、固形分濃度、粘度および重量平均分子量の測定、保存安定性の評価を行い、それぞれ表2に記載した。
合成例2で合成したジ-s-ブトキシ(トリメチルシロキシ)アルミニウムを26.2gと、溶媒としてDMIBを5.0gとを混合し、これを溶液5とした。また、水を3.60g(0.20mol)と、水希釈溶媒としてIPAを50.0gと、重合触媒としてトリブチルアミンを0.37g(0.02mol)とを混合し、これを溶液6とした。
溶媒として混合したDMIBを5.0gから、15.0gと変更した以外は、比較例1と同様に加水分解、重縮合を行った。加熱攪拌中、フラスコ内容液に析出およびゲル化は生じず、均一な透明溶液であった。
合成例1で合成したトリプロポキシ(トリメチルシロキシ)ジルコニウムを35.8gと、溶媒としてDMIBを5.0gとを混合し、これを溶液7とした。また、水を3.60g(0.20mol)と、水希釈溶媒としてIPAを50.0gと、重合触媒としてトリブチルアミンを0.37g(0.02mol)とを混合し、これを溶液8とした。
溶媒として混合したDMIBを5.0gから、15.0gと変更した以外は、比較例3と同様に加水分解、重縮合を行った。加熱攪拌中、フラスコ内容液に析出およびゲル化は生じず、均一な透明溶液であった。
合成例1で合成したトリプロポキシ(トリメチルシロキシ)ジルコニウムを17.9gと、合成例2で合成したジ-s-ブトキシ(トリメチルシロキシ)アルミニウムを13.1g(0.05mol)と、溶媒としてDMIBを15.0gとを混合し、これを溶液9とした。また、水を3.60g(0.20mol)と、水希釈溶媒としてIPAを50.0gと、重合触媒としてトリブチルアミンを0.37g(0.02mol)とを混合し、これを溶液10とした。
溶媒として混合したDMIB5.0gを混合しなかった以外は実施例1と同様に、加水分解、重縮合を行った。加熱攪拌中、フラスコ内容液に析出およびゲル化は生じず、均一な透明溶液であった。
ジルコニウム化合物(Z-1)、ジ-s-ブトキシ(トリメチルシロキシ)アルミニウムの量を表1記載の量に変更し、かつ溶媒として混合したDMIB5.0gを、混合しなかった以外は、実施例2と同様に加水分解、重縮合を行った。加熱攪拌中、フラスコ内容液に析出およびゲル化は生じず、均一な透明溶液であった。
ジルコニウム化合物を表1記載の種類および量に変更し、溶媒として用いたDMIBを表1記載の量に変更した以外は、実施例3と同様に加水分解、重縮合を行った。加熱攪拌中、フラスコ内容液に析出およびゲル化は生じず、均一な透明溶液であった。
水を表1記載の量に変更した以外は、実施例3と同様に加水分解、重縮合を行った。加熱攪拌中、フラスコ内容液に析出およびゲル化は生じず、均一な透明溶液であった。
(組成物の調製)
実施例3で合成したポリメタロキサン(A-3)溶液に溶媒としてDMIBを添加し、固形分濃度を20質量%に調整した。
6インチシリコンウェハーを3枚用意した。これらを基板とし、上記組成物の調製により得られた組成物をスピンコーター(ミカサ製1H-360S)を用いて、基板ごとに回転数を変えてスピン塗布した後、ホットプレート(SCREENホールディングス製SCW-636)を用いて100℃で5分間加熱し、塗布膜を作成した。塗布工程により得られた塗布膜を、ホットプレート(SCREENホールディングス製SCW-636)を用いて500℃で5分間加熱し、膜厚0.3μm、0.5μmおよび0.7μmの硬化膜をそれぞれ作成した。なお、膜厚は、光干渉式膜厚計(SCREENホールディングス製ラムダエ-スSTM602)を用いて、測定した。
5 : 光学顕微鏡観察(倍率:5倍)においてクラックが見えない
4 : 光学顕微鏡観察(倍率:5倍)においてわずかにクラックが見える
3 : 光学顕微鏡観察(倍率:5倍)においてはっきりクラックが見える
2 : 通常の目視でわずかにクラックが見える
1 : 通常の目視ではっきりクラックが見える
クラック耐性評価の結果を表3に示す。
作成した膜厚0.5μmの硬化膜について、固体物中の炭素含有量の測定をした。固体物中の炭素原子含有量は、以下の方法で求めた。Pelletron 3SDH(National Electrodtstics製)を用いて硬化膜にイオンビームを照射し、散乱イオンエネルギースペクトルを得た。次いで、得られたスペクトルから、衝突した原子の質量数を調べ、硬化膜の平均原子数比を得た。得られた平均原子数比の中から、炭素原子の平均原子数比を選択し、これを固体物中の炭素原子量とした。なお、測定条件は、入射イオン:4He++、入射エネルギー2300keV、入射角:0deg、散乱角:160deg、試料電流:8nA、ビーム径:2mmφ、照射量:48μCとした。固体物中の炭素含有量を表1に示す。
実施例14と同様の方法で、表3記載の組成物について実施例14と同様の評価をした。評価結果を表3に示す。
Claims (14)
- 下記一般式(1)で表される構成単位を有する金属-酸素-金属結合を主鎖とする高分子:
R1は、水素原子、炭素数1~8のアルキル基、炭素数1~8のアルキルカルボニル基、炭素数6~12のアリール基、炭素数7~13のアラルキル基、(R5 3Si-)基、(R6R7N-)基、4-オキソペント-2-エン-2-イル基、炭素数5~12の4-アルコキシ-4-オキソブタ-2-エン-2-イル基および炭素数10~16の4-アリールオキシ-4-オキソブタ-2-エン-2-イル基の中から選ばれる;
R2およびR3は、それぞれ独立に、水素原子または炭素数1~8のアルキル基である;
R4は、水素原子、炭素数1~8のアルキル基または炭素数1~8のアルキルカルボニル基である;
R5は、ヒドロキシ基、炭素数1~8のアルキル基、炭素数5~12の脂環式アルキル基、炭素数1~12のアルコキシ基、炭素数6~12のアリール基、炭素数7~13のアラルキル基またはシロキサン結合を有する基である;複数存在するR5は、それぞれ同じでも異なっていてもよい;
R6およびR7は、それぞれ独立に、水素原子、炭素数1~8のアルキル基、炭素数5~12の脂環式アルキル基、炭素数6~12のアリール基、炭素数7~13のアラルキル基または炭素数1~12のアシル基である;R6およびR7は、炭素-炭素飽和結合または炭素-炭素不飽和結合を介して連結し、環構造を形成していてもよい;
mは金属原子Mの価数を示す整数である;
aは1~(m-2)の整数である;
bは1~6の整数であり、cは1~5の整数である。 - cが2~4である、請求項1に記載の高分子。
- R4が炭素数2~6のアルキル基である、請求項1または2に記載の高分子。
- 重量平均分子量が1万以上100万以下である、請求項1~3のいずれかに記載の高分子。
- MがAl、Ti、ZrおよびSnからなる群より選ばれる金属原子を1種以上含む請求項1~4のいずれかに記載の高分子。
- 請求項1~5のいずれかに記載の金属-酸素-金属結合を主鎖とする高分子を含む組成物。
- 請求項1~5のいずれかに記載のポリメタロキサンまたは請求項6に記載の組成物を硬化してなる固体物。
- 請求項7に記載の固体物を具備する電子部品。
- 請求項7に記載の固体物からなる繊維。
- Al、Sc、Ti、V、Cr、Mn、Fe、Co、Ni、Cu、Zn、Ga、Ge、Y、Zr、Nb、Mo、Pd、Ag、In、Sn、Sb、Hf、Ta、WおよびBiからなる群より選ばれる金属原子のうち1種以上と、酸素原子とを含む、固体物の製造方法であって、請求項1~5のいずれかに記載の金属-酸素-金属結合を主鎖とする高分子または請求項6に記載の組成物を加熱する工程を含む固体物の製造方法。
- 固体物中の炭素原子量が10atomic%以下である、請求項10に記載の固体物の製造方法。
- 固体物が膜である請求項10または11記載の固体物の製造方法。
- 固体物が電子部品用である、請求項10~12のいずれかに記載の固体物の製造方法。
- 固体物が繊維である請求項10または11記載の固体物の製造方法。
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Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01109610A (ja) * | 1987-10-23 | 1989-04-26 | Central Glass Co Ltd | 透明導電性膜用組成物およびその膜の形成方法 |
JPH07268024A (ja) * | 1994-03-29 | 1995-10-17 | Sekisui Chem Co Ltd | 高屈折率材料 |
JP2009173910A (ja) * | 2007-12-27 | 2009-08-06 | Nagase Chemtex Corp | 硬化性組成物 |
WO2015156703A2 (en) * | 2014-04-11 | 2015-10-15 | Enikolopov Institute Of Synthetic Polymeric Materials, A Foundation Of The Russian Academy Of Sciences (Ispm Ras) | Functional metallosiloxanes, products of their partial hydrolysis and their use |
WO2017090512A1 (ja) * | 2015-11-26 | 2017-06-01 | 東レ株式会社 | ポリメタロキサン、その製造方法、その組成物、硬化膜およびその製造方法ならびにそれを備えた部材および電子部品 |
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Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01109610A (ja) * | 1987-10-23 | 1989-04-26 | Central Glass Co Ltd | 透明導電性膜用組成物およびその膜の形成方法 |
JPH07268024A (ja) * | 1994-03-29 | 1995-10-17 | Sekisui Chem Co Ltd | 高屈折率材料 |
JP2009173910A (ja) * | 2007-12-27 | 2009-08-06 | Nagase Chemtex Corp | 硬化性組成物 |
WO2015156703A2 (en) * | 2014-04-11 | 2015-10-15 | Enikolopov Institute Of Synthetic Polymeric Materials, A Foundation Of The Russian Academy Of Sciences (Ispm Ras) | Functional metallosiloxanes, products of their partial hydrolysis and their use |
WO2017090512A1 (ja) * | 2015-11-26 | 2017-06-01 | 東レ株式会社 | ポリメタロキサン、その製造方法、その組成物、硬化膜およびその製造方法ならびにそれを備えた部材および電子部品 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2024093176A1 (zh) * | 2022-11-04 | 2024-05-10 | 复旦大学 | 一种主链为金属元素的高分子及其制备方法和应用 |
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