SG11201803938RA - Polymetalloxane, method for producing same, composition thereof, cured film and method for producing same, and members and electronic components provided with same - Google Patents

Polymetalloxane, method for producing same, composition thereof, cured film and method for producing same, and members and electronic components provided with same

Info

Publication number
SG11201803938RA
SG11201803938RA SG11201803938RA SG11201803938RA SG11201803938RA SG 11201803938R A SG11201803938R A SG 11201803938RA SG 11201803938R A SG11201803938R A SG 11201803938RA SG 11201803938R A SG11201803938R A SG 11201803938RA SG 11201803938R A SG11201803938R A SG 11201803938RA
Authority
SG
Singapore
Prior art keywords
same
producing same
polymetalloxane
members
composition
Prior art date
Application number
SG11201803938RA
Inventor
Masao Kamogawa
Mitsuhito Suwa
Hiroko Mitsui
Miki Nakamichi
Original Assignee
Toray Industries
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries filed Critical Toray Industries
Publication of SG11201803938RA publication Critical patent/SG11201803938RA/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G25/00—Compounds of zirconium
    • C01G25/006—Compounds containing, besides zirconium, two or more other elements, with the exception of oxygen or hydrogen
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B9/00—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/25—Oxides by deposition from the liquid phase
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/25—Oxides by deposition from the liquid phase
    • C03C17/256—Coating containing TiO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3649—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer made of metals other than silver
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/38—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal at least one coating being a coating of an organic material
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic System
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/0834—Compounds having one or more O-Si linkage
    • C07F7/0836—Compounds with one or more Si-OH or Si-O-metal linkage
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G79/00—Macromolecular compounds obtained by reactions forming a linkage containing atoms other than silicon, sulfur, nitrogen, oxygen, and carbon with or without the latter elements in the main chain of the macromolecule
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/10—Metal compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/20—Oxides; Hydroxides
    • C08K3/22—Oxides; Hydroxides of metals
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L85/00—Compositions of macromolecular compounds obtained by reactions forming a linkage in the main chain of the macromolecule containing atoms other than silicon, sulfur, nitrogen, oxygen and carbon; Compositions of derivatives of such polymers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/111—Anti-reflection coatings using layers comprising organic materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/02—Details
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/12—Light sources with substantially two-dimensional radiating surfaces
    • H05B33/22—Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/12—Light sources with substantially two-dimensional radiating surfaces
    • H05B33/26—Light sources with substantially two-dimensional radiating surfaces characterised by the composition or arrangement of the conductive material used as an electrode
    • H05B33/28—Light sources with substantially two-dimensional radiating surfaces characterised by the composition or arrangement of the conductive material used as an electrode of translucent electrodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K51/00—Preparations containing radioactive substances for use in therapy or testing in vivo
    • A61K51/02—Preparations containing radioactive substances for use in therapy or testing in vivo characterised by the carrier, i.e. characterised by the agent or material covalently linked or complexing the radioactive nucleus
    • A61K51/04—Organic compounds
    • A61K51/0474—Organic compounds complexes or complex-forming compounds, i.e. wherein a radioactive metal (e.g. 111In3+) is complexed or chelated by, e.g. a N2S2, N3S, NS3, N4 chelating group
    • A61K51/0478—Organic compounds complexes or complex-forming compounds, i.e. wherein a radioactive metal (e.g. 111In3+) is complexed or chelated by, e.g. a N2S2, N3S, NS3, N4 chelating group complexes from non-cyclic ligands, e.g. EDTA, MAG3
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/212—TiO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/22—ZrO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/90—Other aspects of coatings
    • C03C2217/94—Transparent conductive oxide layers [TCO] being part of a multilayer coating
    • C03C2217/948—Layers comprising indium tin oxide [ITO]
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/11—Deposition methods from solutions or suspensions
    • C03C2218/116—Deposition methods from solutions or suspensions by spin-coating, centrifugation
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/30—Aspects of methods for coating glass not covered above
    • C03C2218/32—After-treatment
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/30—Aspects of methods for coating glass not covered above
    • C03C2218/32—After-treatment
    • C03C2218/328—Partly or completely removing a coating
    • C03C2218/33—Partly or completely removing a coating by etching
SG11201803938RA 2015-11-26 2016-11-17 Polymetalloxane, method for producing same, composition thereof, cured film and method for producing same, and members and electronic components provided with same SG11201803938RA (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2015230446 2015-11-26
JP2016035370 2016-02-26
JP2016035371 2016-02-26
JP2016088895 2016-04-27
PCT/JP2016/084138 WO2017090512A1 (en) 2015-11-26 2016-11-17 Polymetalloxane, method for producing same, composition thereof, cured film and method for producing same, and members and electronic components provided with same

Publications (1)

Publication Number Publication Date
SG11201803938RA true SG11201803938RA (en) 2018-06-28

Family

ID=58763465

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201803938RA SG11201803938RA (en) 2015-11-26 2016-11-17 Polymetalloxane, method for producing same, composition thereof, cured film and method for producing same, and members and electronic components provided with same

Country Status (8)

Country Link
US (1) US11795064B2 (en)
EP (1) EP3381969B1 (en)
JP (1) JP6327366B2 (en)
KR (1) KR102438946B1 (en)
CN (1) CN108291031B (en)
SG (1) SG11201803938RA (en)
TW (1) TWI679224B (en)
WO (1) WO2017090512A1 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3779001A4 (en) 2018-03-29 2021-10-13 Toray Industries, Inc. Method for producing metal oxide fibers, and metal oxide fibers
US10684400B2 (en) * 2018-08-03 2020-06-16 Visera Technologies Company Limited Optical elements and method for fabricating the same
JP7245905B2 (en) * 2019-06-28 2023-03-24 富士フイルム株式会社 Polymer composite piezoelectric material, Piezoelectric film, Piezoelectric speaker, Flexible display
JPWO2022054552A1 (en) * 2020-09-11 2022-03-17
WO2022065127A1 (en) * 2020-09-24 2022-03-31 東レ株式会社 Composition, cured product and method for producing same, and member, electronic component, and fiber
WO2022202398A1 (en) * 2021-03-22 2022-09-29 東レ株式会社 Polymer having metal-oxygen-metal bond as primary chain, composition thereof, solid material and production method thereof, and electronic component and fiber

Family Cites Families (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3152999A (en) * 1960-05-31 1964-10-13 Hughes Aircraft Co Stable organo siloxy-aluminum oxide polymers and process of producing same
US3530078A (en) * 1967-07-24 1970-09-22 Dow Chemical Co Method for the preparation of polymers of trimethylsiloxy aluminum dihydride
JPS5562428A (en) * 1978-11-06 1980-05-10 Hitachi Ltd Liquid crystal display device
GB2026190B (en) 1978-07-07 1982-11-10 Hitachi Ltd Liquid crystal display device
JPH01129032A (en) 1987-11-12 1989-05-22 Nippon Soda Co Ltd Ladderlike polytitanoxane and its production
JPH01205122A (en) 1988-02-12 1989-08-17 Alps Electric Co Ltd Liquid crystal display element
JP3542161B2 (en) * 1994-04-01 2004-07-14 ダウ コーニング アジア株式会社 Curing method of polytitanosiloxane
JPH08240800A (en) 1995-03-03 1996-09-17 Asahi Glass Co Ltd Resin substrate for liqud crystal display
WO2001060141A2 (en) * 2000-02-18 2001-08-23 Civatech Corporation Formable integral source material for medical and industrial devices
JP3793076B2 (en) 2001-11-28 2006-07-05 日東化成株式会社 Curing catalyst for organic polymer and moisture-curing organic polymer composition containing the same
JP2003165841A (en) * 2001-11-29 2003-06-10 Dow Corning Toray Silicone Co Ltd Polyorganometaloxysiloxane and method for producing the same
KR100746067B1 (en) 2002-11-13 2007-08-03 닛뽕소다 가부시키가이샤 Dispersoid having metal-oxygen bond, metal oxide film, and monomolecular film
JP2008156280A (en) 2006-12-23 2008-07-10 Matsumoto Fine Chemical Co Ltd Organic titanium oligomer and method for producing the same
JP5625210B2 (en) 2007-12-27 2014-11-19 ナガセケムテックス株式会社 Curable composition
JP2010086684A (en) 2008-09-30 2010-04-15 Kuramoto Seisakusho Co Ltd Optical thin film with transparent conductive wiring film
JP5213694B2 (en) 2008-12-26 2013-06-19 Ｓｍｋ株式会社 Transparent panel and touch panel
KR100976461B1 (en) * 2009-12-30 2010-08-17 제일모직주식회사 Transparent resin for encapsulation material and electronic device including the same
RU2444540C1 (en) * 2010-10-21 2012-03-10 Общество с ограниченной ответственностью "Пента-91" Method of producing polymetallosiloxanes
JP5661429B2 (en) * 2010-11-01 2015-01-28 株式会社ダイセル Liquid addition-curable metallosiloxane
JP2012223711A (en) * 2011-04-20 2012-11-15 Kaken:Kk Mo ADSORBING AGENT, METHOD FOR PRODUCING THE SAME, AND 99Mo-99mTc GENERATOR
JP5650086B2 (en) 2011-06-28 2015-01-07 信越化学工業株式会社 Resist underlayer film forming composition and pattern forming method
JP6033000B2 (en) 2011-12-20 2016-11-30 オリンパス株式会社 Scanning endoscope
JP2014122135A (en) * 2012-12-21 2014-07-03 Jnc Corp Method of manufacturing composition for coating type transparent film formation
CN104903092B (en) 2013-01-29 2016-09-07 东丽株式会社 Substrate and use its touch panel component
JP6175320B2 (en) 2013-05-24 2017-08-02 マツモトファインケミカル株式会社 Method for producing high refractive index film material
JP2015199916A (en) 2014-04-02 2015-11-12 Jsr株式会社 Film-forming composition and pattern-forming method
RU2649392C2 (en) * 2014-04-11 2018-04-03 Федеральное государственное бюджетное учреждение науки Институт синтетических полимерных материалов им. Н.С. Ениколопова Российской академии наук (ИСПМ РАН) Functional metallosiloxanes, products of their partial hydrolysis and their application
JP6137037B2 (en) * 2014-04-25 2017-05-31 信越化学工業株式会社 Thermally conductive silicone composition
JP6153884B2 (en) * 2014-05-02 2017-06-28 富士フイルム株式会社 Curable composition, method for producing cured product, cured film, and display device
JP5861129B2 (en) * 2014-07-24 2016-02-16 健一 牧野 Method for producing linear alkoxytitanic acid / phosphoric acid polymer

Also Published As

Publication number Publication date
KR102438946B1 (en) 2022-09-02
TW201739797A (en) 2017-11-16
JPWO2017090512A1 (en) 2018-04-05
TWI679224B (en) 2019-12-11
EP3381969A4 (en) 2019-06-26
CN108291031A (en) 2018-07-17
CN108291031B (en) 2021-06-15
US11795064B2 (en) 2023-10-24
JP6327366B2 (en) 2018-05-23
WO2017090512A1 (en) 2017-06-01
US20180327275A1 (en) 2018-11-15
EP3381969A1 (en) 2018-10-03
KR20180086202A (en) 2018-07-30
EP3381969B1 (en) 2020-06-03

Similar Documents

Publication Publication Date Title
PT3339352T (en) Resin, composition, cured film, method for producing cured film and semiconductor device
SG11201802076PA (en) Negative photosensitive resin composition, cured film, element and display device each provided with cured film, and method for manufacturing display device
EP3255965A4 (en) Case component, electronic device and method for producing case component
EP3211018A4 (en) Composition for heat-dissipation members, heat-dissipation member, electronic device, and heat-dissipation-member production method
SG11201707013RA (en) Radical-polymerizable resin composition, curing method thereof, method of producing same, use of radical-polymerizable resin composition, and use method of thereof
EP3395870A4 (en) Prepreg and method for manufacturing same
SG11201803938RA (en) Polymetalloxane, method for producing same, composition thereof, cured film and method for producing same, and members and electronic components provided with same
SG11201709426XA (en) Resin composition, film produced by using the resincomposition, and multilayer structure
EP3136432A4 (en) Resin structure having electronic component embedded therein, and method for manufacturing said structure
EP3214142A4 (en) Curable composition for inkjet, and method for manufacturing electronic component
EP3323856A4 (en) Stretched film, method for manufacturing stretched film, and polyamide resin composition
EP3299415A4 (en) Heat-resistant resin composition and method for producing same
EP3342820A4 (en) Polymeric composition, method for producing polymeric composition, electronic apparatus, and method for manufacturing electronic apparatus
ZA201607572B (en) Resin composition suitable for printing and printing method utilizing the same
EP3357967A4 (en) Absorbent resin composition and method for producing same
EP2955015A4 (en) Resin composite, and method for manufacturing resin composite
SG11201609356RA (en) Curable composition and cured product thereof, method for producing cured product, method for manufacturing optical component, method for manufacturing circuit board, and method for manufacturing electronic component
EP3409726A4 (en) Polyphenylene sulfide resin composition and method for producing same
SG11201705304PA (en) Pellicle film, pellicle frame, and pellicle and method for producing same
EP3135725A4 (en) Acrylic resin composition, method for producing same, and acrylic resin film
EP3181355A4 (en) Laminate film, molded laminate, and method for producing same
EP3348616A4 (en) Polyester-based resin composition and production method for same
EP3136173A4 (en) Radiation-sensitive resin composition, resin film, and electronic component
SG10202110711TA (en) Curable resin composition, electronic component device, and production method for electronic component device
HUE055516T2 (en) Laminated thin film and method for producing laminated thin film