JPH08240800A - Resin substrate for liqud crystal display - Google Patents
Resin substrate for liqud crystal displayInfo
- Publication number
- JPH08240800A JPH08240800A JP4419995A JP4419995A JPH08240800A JP H08240800 A JPH08240800 A JP H08240800A JP 4419995 A JP4419995 A JP 4419995A JP 4419995 A JP4419995 A JP 4419995A JP H08240800 A JPH08240800 A JP H08240800A
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- Prior art keywords
- refractive index
- film
- resin substrate
- ito
- crystal display
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Liquid Crystal (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】液晶ディスプレイ用透明電極膜付
き樹脂基板に関するものである。TECHNICAL FIELD The present invention relates to a resin substrate with a transparent electrode film for a liquid crystal display.
【０００２】[0002]
【従来の技術】液晶表示素子（以下、ＬＣＤと称する）
は、パソコン、ワープロ、電子手帳、携帯電話、携帯用
情報端末機器等のディスプレイとして広く用いられ、こ
れらの製品の小型・軽量化に伴い、液晶表示素子自身の
小型・軽量化と耐衝撃性向上の要求が高まっている。そ
の中で、従来のガラス基板の代わりに、軽量性、耐衝撃
性に優れた樹脂基板を用いた液晶表示装置（以下、プラ
スチックＬＣＤと称する）やタッチパネルが盛んに検討
されている。2. Description of the Related Art Liquid crystal display device (hereinafter referred to as LCD)
Is widely used as a display for personal computers, word processors, electronic organizers, mobile phones, portable information terminals, etc., and as these products become smaller and lighter, the liquid crystal display element itself becomes smaller, lighter and has improved impact resistance. The demand for is increasing. Among them, a liquid crystal display device (hereinafter referred to as a plastic LCD) and a touch panel using a resin substrate having excellent lightness and impact resistance instead of the conventional glass substrate have been actively studied.
【０００３】従来の液晶表示装置に用いられる透明導電
基板は、ガラス基板上にスパッタリング法や真空蒸着法
等によりスズをドープした酸化インジウム（ＩＴＯ）等
の透明導電膜を形成し、そののちフォトリソグラフィー
工程、ウェットエッチング工程によりＩＴＯ電極の微細
加工（パターニング）をして作製される。また、タッチ
パネル用基板については、前述のＩＴＯ膜の他に、化学
的気相成長法（ＣＶＤ）を使ったフッ素ドープ酸化スズ
膜などが用いられている。As a transparent conductive substrate used in a conventional liquid crystal display device, a transparent conductive film such as indium oxide (ITO) doped with tin is formed on a glass substrate by a sputtering method or a vacuum deposition method, and then photolithography. It is manufactured by finely processing (patterning) the ITO electrode by the process and the wet etching process. As the touch panel substrate, a fluorine-doped tin oxide film using chemical vapor deposition (CVD) is used in addition to the ITO film described above.
【０００４】しかし、前述の目的のために樹脂基板を用
いる場合には、その耐熱性のために、１００℃前後まで
しか加熱できない。その結果、基板温度が２００℃以上
の場合に比べて、ＩＴＯ膜は不完全なものとなり、種々
の特性が低下する。However, when a resin substrate is used for the above purpose, it can be heated only up to around 100 ° C. because of its heat resistance. As a result, compared with the case where the substrate temperature is 200 ° C. or higher, the ITO film becomes incomplete and various characteristics deteriorate.
【０００５】特に、ＩＴＯ膜の屈折率は、基板温度が２
００℃以上の場合に１．８〜１．９であったものが、基
板温度が１００℃前後では２．０〜２．１に上昇してし
まう。その結果、ＩＴＯ電極のある部分とない部分とで
の光学的な反射による色差が大きくなり、ＬＣＤとして
セル化した場合に、ＩＴＯ電極が見えてしまう（以下、
骨見えと称する）という問題が生じる。In particular, the refractive index of the ITO film is such that the substrate temperature is 2
What was 1.8 to 1.9 when the temperature was 00 ° C or higher, increased to 2.0 to 2.1 when the substrate temperature was around 100 ° C. As a result, the color difference between the portion with the ITO electrode and the portion without the ITO electrode becomes large, and the ITO electrode becomes visible when the cell is formed into an LCD (hereinafter,
This is called a bone appearance).
【０００６】この骨見え現象を低減するためには、ＩＴ
Ｏの膜厚を４０ｎｍ程度まで薄くする必要があるが、プ
ラスチックＬＣＤのＳＴＮ化、大面積、表示品位の向上
のためには、よりＩＴＯ膜厚の厚い低抵抗電極が必要と
なり、骨見え現象低減とは両立しないという問題点を有
していた。In order to reduce this bone appearance phenomenon, IT
Although it is necessary to reduce the film thickness of O to about 40 nm, a low resistance electrode with a thicker ITO film is required to reduce the STN of plastic LCDs, increase the area, and improve the display quality. It had a problem that it was not compatible with.
【０００７】[0007]
【発明が解決しようとする課題】本発明は、ＩＴＯ膜厚
を薄くせずに、骨見え現象を低減させることができる液
晶ディスプレイ用透明導電樹脂基板の提供を目的とす
る。SUMMARY OF THE INVENTION It is an object of the present invention to provide a transparent conductive resin substrate for a liquid crystal display which can reduce the bone appearance phenomenon without reducing the ITO film thickness.
【０００８】[0008]
【課題を解決するための手段】本発明は、透明樹脂基体
上に屈折率が１．６５以上１．８５以下で、かつその膜
厚が５０ｎｍ以上１００ｎｍ以下の範囲にある中間屈折
率層を設け、その上に透明導電膜を形成したことを特徴
とする液晶ディスプレイ用樹脂基板を提供する。According to the present invention, an intermediate refractive index layer having a refractive index of 1.65 or more and 1.85 or less and a film thickness of 50 nm or more and 100 nm or less is provided on a transparent resin substrate. Provided is a resin substrate for a liquid crystal display, which has a transparent conductive film formed thereon.
【０００９】本発明に係るＬＣＤ用透明樹脂基板の断面
図を図１に示す。１は透明樹脂基板、２はガスバリアー
層、３はハードコート層、４は屈折率が１．６５以上
１．８５以下で、膜厚が５０ｎｍ以上１００ｎｍ以下の
中間屈折率層を示し、５は透明導電膜を示す。A cross-sectional view of a transparent resin substrate for LCD according to the present invention is shown in FIG. 1 is a transparent resin substrate, 2 is a gas barrier layer, 3 is a hard coat layer, 4 is an intermediate refractive index layer having a refractive index of 1.65 to 1.85 and a film thickness of 50 nm to 100 nm, and 5 is A transparent conductive film is shown.
【００１０】本発明における透明樹脂基板１としては、
特に限定されず、ポリエチレンテレフタレート、ポリフ
ェニレンサルファイド、ポリイミド、ポリエーテルイミ
ド、ポリメチルメタクリレート、ポリカーボネート、ポ
リエーテルサルフォン、ポリアリレート、アモルファス
ポレオレフィン等を挙げることができる。As the transparent resin substrate 1 in the present invention,
It is not particularly limited, and examples thereof include polyethylene terephthalate, polyphenylene sulfide, polyimide, polyether imide, polymethyl methacrylate, polycarbonate, polyether sulfone, polyarylate, and amorphous polyolefin.
【００１１】その他、アクリル系、ポリエチレン系、ポ
リエステル系、ポリイミド系、アラミド系、シリコーン
系、フッ素系、マレイミド系、エポキシ系の各種樹脂が
挙げられる。In addition, various acrylic-based, polyethylene-based, polyester-based, polyimide-based, aramid-based, silicone-based, fluorine-based, maleimide-based, and epoxy-based resins can be used.
【００１２】本発明においては液晶表示素子（ＬＣＤ）
の用途に用いるため、いずれの樹脂においても、光学異
方性の小さい樹脂基板であることが望ましい。In the present invention, a liquid crystal display device (LCD)
Therefore, it is desirable that the resin substrate has small optical anisotropy in any of the resins.
【００１３】中間屈折率層４としては、屈折率が１．６
５以上１．８５以下で、膜厚が５０ｎｍ以上１００ｎｍ
以下の透明物質であり、該組成や成膜方法などは特に限
定されるものではないが、透明導電膜５の電気特性、パ
ターニング特性、耐久性などを十分に引き出すという点
から、スパッタリング法により形成された金属酸化物
膜、金属窒化物膜、金属酸窒化物膜が特に好ましい。The intermediate refractive index layer 4 has a refractive index of 1.6.
5 to 1.85 and a film thickness of 50 nm to 100 nm
It is the following transparent substance, and its composition and film forming method are not particularly limited, but it is formed by the sputtering method from the viewpoint that the electric characteristics, patterning characteristics, durability, etc. of the transparent conductive film 5 are sufficiently drawn out. A metal oxide film, a metal nitride film, and a metal oxynitride film are particularly preferable.
【００１４】例えば、アルミナなどの中間屈折率材料単
体や、シリカに代表される低屈折率材料とジルコニア、
チタニアなどの高屈折率材料を混合することで得られる
中間屈折率材料や、酸素と窒素の組成比を制御すること
で中間屈折率が得られるＳｉＯx Ｎy など金属酸窒化物
などを挙げることができる。For example, an intermediate refractive index material such as alumina alone, a low refractive index material typified by silica and zirconia,
Examples include an intermediate refractive index material obtained by mixing a high refractive index material such as titania, and a metal oxynitride such as SiO x N y that can obtain an intermediate refractive index by controlling the composition ratio of oxygen and nitrogen. You can
【００１５】透明導電膜５としては、スズを添加した酸
化インジウム膜、ＡｌやＧａを添加した酸化酸化亜鉛
膜、ＳｂやＦを添加した酸化錫膜などを挙げることがで
きる。このうち、スズを５〜１０ｗｔ％添加した酸化イ
ンジウム（ＩＴＯ）膜は、抵抗値が低く、良好な結果を
得ることができることから、好ましく用いられる。Examples of the transparent conductive film 5 include an indium oxide film to which tin is added, a zinc oxide oxide film to which Al or Ga is added, and a tin oxide film to which Sb or F is added. Among these, an indium oxide (ITO) film added with tin in an amount of 5 to 10 wt% is preferably used because it has a low resistance value and a good result can be obtained.
【００１６】透明導電膜５の形成方法は、特に限定され
ないが、容易に低抵抗の膜が得られるという理由から、
スパッタリング法、イオンプレーティング法が好まし
い。The method of forming the transparent conductive film 5 is not particularly limited, but for the reason that a low resistance film can be easily obtained,
The sputtering method and the ion plating method are preferable.
【００１７】ガスバリアー層２、およびハードコート層
３は、樹脂基板１自身が化学的、光学的、機械的な耐久
性に欠ける場合や、ガス遮断性能に欠ける場合に必要と
なる。すなわち、透明導電膜の電極パターニング時に要
求される耐酸、耐アルカリ性能や、セル化工程での耐Ｕ
Ｖ、耐溶剤性能、またハンドリング時等に要求される耐
擦傷性能などが不十分であるポリカーボネートなどの樹
脂基板１を用いる場合には、より耐久性に富む安定な有
機物または無機物等のハードコート層３、およびガスバ
リアー層２を施す事により樹脂基板１自身の劣化を防ぐ
ことができる。The gas barrier layer 2 and the hard coat layer 3 are necessary when the resin substrate 1 itself lacks chemical, optical and mechanical durability, or when it lacks gas barrier performance. That is, the acid resistance and alkali resistance performance required for electrode patterning of the transparent conductive film and the U resistance in the cell formation process are required.
When using a resin substrate 1 such as polycarbonate having insufficient V, solvent resistance, and scratch resistance required at the time of handling, etc., a hard coat layer made of a stable organic or inorganic material having higher durability. By providing 3 and the gas barrier layer 2, deterioration of the resin substrate 1 itself can be prevented.
【００１８】樹脂基板１が前述の各種耐久性能を満足す
る場合には、ハードコート層３、ガスバリアー層２を設
けなくともよい。When the resin substrate 1 satisfies the above various durability performances, the hard coat layer 3 and the gas barrier layer 2 may not be provided.
【００１９】本発明におけるハードコート層３として
は、樹脂基板１との密着性が要求されるため、樹脂基板
１の種類により異なるが、一般的にはアクリル系、ポリ
イミド系、シリコーン系、ウレタン系、およびエポキシ
系のうち少なくとも１種の系の樹脂を主成分とする有機
物、あるいはアルコキシドを焼成・乾燥して得られるＴ
ｉＯ2 、ＺｒＯ2 、Ａｌ2 Ｏ3 、およびＳｉＯ2 のうち
少なくとも１種を主成分とする無機物、または上記有機
物と上記無機物との混合物、複数積層したものなどが挙
げられる。Since the hard coat layer 3 in the present invention is required to have adhesion to the resin substrate 1, it varies depending on the type of the resin substrate 1, but is generally an acrylic type, a polyimide type, a silicone type, a urethane type. , And T obtained by baking and drying an organic material containing at least one resin of epoxy series as a main component, or an alkoxide.
Examples thereof include an inorganic material containing at least one of iO 2 , ZrO 2 , Al 2 O 3 , and SiO 2 as a main component, a mixture of the above organic material and the above inorganic material, and a plurality of laminated materials.
【００２０】本発明におけるガスバリアー層２として
は、エチレンビニルアルコール（ＥＶＡ）などの有機膜
や、ＳｉＯ2 やＳｉＮx などの無機膜が用いられる。As the gas barrier layer 2 in the present invention, an organic film such as ethylene vinyl alcohol (EVA) or an inorganic film such as SiO 2 or SiN x is used.
【００２１】ハードコート層３、およびガスバリアー層
２の形成方法としては、スピンコート法、ロールコート
法、ディップコート法、スプレーコート法、スパッタ法
などが挙げられる。Examples of methods for forming the hard coat layer 3 and the gas barrier layer 2 include a spin coat method, a roll coat method, a dip coat method, a spray coat method and a sputtering method.
【００２２】ハードコート層３、およびガスバリアー層
２の組成や、構成は、特に限定されず、前述の諸性能を
満足する限りは自由に選択し得る。The composition and constitution of the hard coat layer 3 and the gas barrier layer 2 are not particularly limited, and can be freely selected as long as the above-mentioned various performances are satisfied.
【００２３】[0023]
【作用】プラスチックＬＣＤ用透明電極の骨見え現象発
生の原因とその改善策を詳細に検討した結果、以下のこ
とが明らかになった。まず、従来のプラスチック液晶デ
ィスプレイの典型的な構成断面を図２に示す。１は透明
樹脂基板、２はガスバリアー層、３はハードコート層、
６は密着力向上のための中間層（シリカなど）、７はパ
ターニング加工されたＩＴＯ透明導電膜、８はポリイミ
ドなどの配向膜、および９は液晶層を示し、Ａ、Ｂはそ
れぞれ、ＩＴＯ透明電極部と、ＩＴＯ膜がエッチングに
より除去された部分であり、（ａ）、（ｂ）はそれぞれ
Ａ部分、Ｂ部分の入射光と反射光を示している。[Function] As a result of detailed examination of the cause of occurrence of the bone appearance phenomenon of the transparent electrode for the plastic LCD and the improvement measures thereof, the following has become clear. First, FIG. 2 shows a typical structural cross section of a conventional plastic liquid crystal display. 1 is a transparent resin substrate, 2 is a gas barrier layer, 3 is a hard coat layer,
6 is an intermediate layer (such as silica) for improving adhesion, 7 is a patterned ITO transparent conductive film, 8 is an alignment film such as polyimide, and 9 is a liquid crystal layer, and A and B are ITO transparent films, respectively. The electrode portion and the portion where the ITO film is removed by etching are shown in (a) and (b), respectively, showing the incident light and the reflected light of the A portion and the B portion, respectively.
【００２４】このような構成のガラス基板とプラスチッ
ク基板を用いて、ＬＣＤを作製し、ＩＴＯ電極部Ａでの
反射光（ａ）とＩＴＯ電極のない部分Ｂでの反射光
（ｂ）の色の差をよく知られたＣＩＥ（国際照明委員
会）の色差ΔＥ* ａｂを用いて比較してみると、ガラス
基板を用いた場合には、ＩＴＯの膜厚が３００ｎｍ程度
の厚膜まで、色の差が認知しにくく、ΔＥ* ａｂが約４
以下の色差であるのに対し、プラスチック基板を用いた
場合には、ＩＴＯ膜の膜厚が４０ｎｍを超えると色差Δ
Ｅ* ａｂが４以上の値を示し、その結果、ＩＴＯ電極が
見える、すなわちＩＴＯ電極の骨見え現象が顕著とな
り、ＬＣＤの表示品位が低下する。An LCD is manufactured by using the glass substrate and the plastic substrate having such a structure, and the color of the reflected light (a) at the ITO electrode part A and the reflected light (b) at the part B without the ITO electrode are A comparison using the well-known CIE (International Commission on Illumination) color difference ΔE * ab shows that when a glass substrate is used, the ITO film thickness of about 300 nm The difference is difficult to recognize, and ΔE * ab is about 4
In contrast to the following color difference, in the case of using a plastic substrate, when the thickness of the ITO film exceeds 40 nm, the color difference Δ
E * ab shows a value of 4 or more, and as a result, the ITO electrode can be seen, that is, the bone appearance phenomenon of the ITO electrode becomes noticeable, and the display quality of the LCD is deteriorated.
【００２５】従来のガラスを基板として用いる場合と本
発明のような樹脂基板を用いた場合の相違点の第一は、
ガラス基板を用いる場合には、液晶セル内の絶縁性、骨
見え現象低減のために、ＩＴＯ電極と配向膜の間に屈折
率１．７５程度の絶縁中間膜を挿入して用いる点であ
る。この絶縁中間膜形成の際の焼成温度は２５０℃程度
であるため、プラスチック基板の場合には、その耐熱温
度限界より、該絶縁中間膜を用いることができない。The first difference between the case where the conventional glass is used as the substrate and the case where the resin substrate according to the present invention is used is as follows.
When a glass substrate is used, an insulating intermediate film having a refractive index of about 1.75 is inserted between the ITO electrode and the alignment film in order to reduce the insulating property in the liquid crystal cell and the bone appearance phenomenon. Since the firing temperature for forming the insulating intermediate film is about 250 ° C., the insulating intermediate film cannot be used in the case of a plastic substrate due to its heat resistant temperature limit.
【００２６】第二は、基板温度２００℃以上で成膜され
たガラス基板上のＩＴＯ薄膜は、多結晶構造を取り、キ
ャリア密度も１０20〜１０21ｃｍ-3と高く、その結果、
屈折率は１．８〜１．９となる点である。一般に樹脂基
板はその耐熱温度限界より、基板を１００℃前後までし
か加熱できず、ＩＴＯ薄膜は、アモルファス構造を取
り、しかもキャリア電子密度は低い。そのために、屈折
率は、２．０〜２．１にまで上昇し、現状では、該屈折
率を低減することは困難である。Secondly, the ITO thin film formed on the glass substrate at a substrate temperature of 200 ° C. or higher has a polycrystalline structure and has a high carrier density of 10 20 to 10 21 cm -3 .
The refractive index is a point of 1.8 to 1.9. Generally, the resin substrate can heat the substrate only up to about 100 ° C. due to its heat resistant temperature limit, the ITO thin film has an amorphous structure, and the carrier electron density is low. Therefore, the refractive index rises to 2.0 to 2.1, and it is difficult to reduce the refractive index at present.
【００２７】第三は、基板の屈折率が異なる点である。
すなわち、屈折率１．５のガラス基板に比較し、ＬＣＤ
用に用いられる樹脂基板の屈折率は、ポリカーボネート
で１．５９、ポリエチレンテレフタレートで１．５８、
ポリエーテルサルフォンで１．６５、ポリアリレートで
１．６１、アモルファスポレオレフィンで１．５４と一
般に高い。Thirdly, the refractive index of the substrate is different.
That is, compared to a glass substrate with a refractive index of 1.5, LCD
The refractive index of the resin substrate used for the purpose is 1.59 for polycarbonate, 1.58 for polyethylene terephthalate,
Generally, it is high at 1.65 for polyether sulfone, 1.61 for polyarylate, and 1.54 for amorphous polyolefin.
【００２８】図１に示すように、ＩＴＯ膜の屈折率
（２．０〜２．１）と基板の屈折率（１．５４〜１．６
５）の中間の屈折率（１．６５〜１．８５）を持ち、か
つ膜厚が５０ｎｍ〜１００ｎｍである中間屈折率層を挿
入することによって、ＬＣＤ構成後のＩＴＯ電極部Ａと
ＩＴＯ電極のない部分Ｂとの色差が小さくなるような光
学的干渉条件が満足でき、その結果、ＩＴＯ電極の骨見
え現象が低減できる。As shown in FIG. 1, the refractive index of the ITO film (2.0 to 2.1) and the refractive index of the substrate (1.54 to 1.6).
By inserting an intermediate refractive index layer having an intermediate refractive index (1.65 to 1.85) of 5) and having a film thickness of 50 nm to 100 nm, the ITO electrode portion A and the ITO electrode of the LCD structure are formed. The optical interference condition that the color difference with the non-existing portion B becomes small can be satisfied, and as a result, the bone appearance phenomenon of the ITO electrode can be reduced.
【００２９】[0029]
［実施例］透明樹脂基板１として、あらかじめ両面に、
アクリル／ウレタン系のハードコート層３を１０μｍコ
ートされたポリカーボネート樹脂基板を用い、その上に
シリコンとジルコニウムとの酸化物（ＺｒＳｉx Ｏy ）
からなる各種膜厚の中間屈折率層４、およびＩＴＯ膜を
スパッタ法を用いてコーテイングした。なお、ポリカー
ボネートの屈折率は１．５９、ハードコート層３の屈折
率は１．５３である。[Example] As the transparent resin substrate 1, both sides were previously
Acrylic / urethane hard coat layer 3 using a polycarbonate resin substrate that is 10μm coat, the oxide of silicon and zirconium on its (ZrSi x O y)
The intermediate refractive index layer 4 having various film thicknesses and the ITO film were coated by a sputtering method. The refractive index of polycarbonate is 1.59, and the refractive index of the hard coat layer 3 is 1.53.
【００３０】本実施例の中間屈折率層４は、シリコンと
ジルコニウムの混合物ターゲットから酸素との反応性ス
パッタにより形成したものであり、シリコンとジルコニ
ウムの混合比を変化させることによって得られる中間屈
折率膜の屈折率をも変化させた。The intermediate refractive index layer 4 of this embodiment is formed by reactive sputtering of oxygen from a mixture target of silicon and zirconium, and has an intermediate refractive index obtained by changing the mixing ratio of silicon and zirconium. The refractive index of the film was also changed.
【００３１】その後、ＨＣｌ−ＨＮＯ3 系のエッチング
液を用いＩＴＯ膜をパターニングし、配向膜塗布後、図
２に示すようなＬＣＤを構成した。なお、配向膜の屈折
率は１．６３、配向膜の膜厚は６０ｎｍ、液晶層の屈折
率は１．５〜１．６である。After that, the ITO film was patterned using an HCl-HNO 3 based etching solution, and after applying an alignment film, an LCD as shown in FIG. 2 was constructed. The alignment film has a refractive index of 1.63, the alignment film has a thickness of 60 nm, and the liquid crystal layer has a refractive index of 1.5 to 1.6.
【００３２】本実施例において得られた各種ＬＣＤにつ
いて、ＩＴＯ電極部ＡとＩＴＯ電極のない部分Ｂの可視
光領域での顕微分光測定を行い、ＡとＢ部分間の色差Δ
Ｅ*ａｂを比較すると同時に、骨見えの優劣を目視観察
にて判断した。With respect to various LCDs obtained in this example, the ITO electrode portion A and the portion B without the ITO electrode were subjected to microspectroscopic measurement in the visible light region, and the color difference Δ between the portions A and B was measured.
Simultaneously with the comparison of E * ab, the superiority or inferiority of bone appearance was judged by visual observation.
【００３３】表１に、中間屈折率層の屈折率と膜厚に対
して、色差ΔＥ* ａｂが４以下となるＩＴＯ膜厚（ｎ
ｍ）の上限を示す。Table 1 shows the ITO film thickness (n) at which the color difference ΔE * ab is 4 or less with respect to the refractive index and film thickness of the intermediate refractive index layer.
The upper limit of m) is shown.
【００３４】表２に、中間屈折率層として、屈折率が
１．７５、膜厚が８０ｎｍのＺｒＳｉx Ｏy 膜を用いた
場合の、ＩＴＯ膜厚と色差ΔＥ* ａｂとの関係を示す。[0034] Table 2 shows the intermediate refractive index layer, the refractive index is 1.75, the thickness of the case of using the ZrSi x O y film of 80 nm, the relationship between the ITO film thickness and the color difference Delta] E * ab.
【００３５】［比較例１〜２］中間屈折率層としてシリ
カ（ＳｉＯ2 ）膜を用いた以外は、実施例と同様にして
ＬＣＤを構成し、また実施例と同様にして評価した。中
間屈折率層として、屈折率が１．４６、膜厚が１５ｎｍ
のＳｉＯ2 膜を用いた場合を比較例１、中間屈折率層と
して、屈折率が１．４６、膜厚が５０ｎｍのＳｉＯ2 膜
を用いた場合を比較例２として、結果を表２に示す。[Comparative Examples 1 and 2] An LCD was constructed and evaluated in the same manner as in Examples except that a silica (SiO 2 ) film was used as the intermediate refractive index layer. As the intermediate refractive index layer, the refractive index is 1.46 and the film thickness is 15 nm.
Examples comparing the case of using the SiO 2 film 1, as an intermediate refractive index layer, the refractive index is 1.46, as a comparative example 2 where the thickness using an SiO 2 film of 50 nm, and the results are shown in Table 2 .
【００３６】表１より、ＩＴＯ膜の膜厚が１００ｎｍ以
上でも、中間層の屈折率が１．６５以上１．８５以下
で、かつ膜厚が５０ｎｍ以上１００ｎｍ以下の範囲であ
れば、色差ΔＥ* ａｂが４以下となることが解る。同時
に、骨見え現象の優劣を目視観察によって判断した結
果、該範囲が非常に良好であった。From Table 1, even if the thickness of the ITO film is 100 nm or more, if the refractive index of the intermediate layer is 1.65 or more and 1.85 or less and the film thickness is in the range of 50 nm or more and 100 nm or less, the color difference ΔE *. It can be seen that ab is 4 or less. At the same time, as a result of visually observing the superiority or inferiority of the bone appearance phenomenon, the range was very good.
【００３７】なお、表２に示すように、中間屈折率層と
して、屈折率１．７５、膜厚８０ｎｍのシリコンとジル
コニウムとの酸化物膜を用いた場合には、ＩＴＯ膜厚３
００ｎｍ程度まで色差ΔＥ* ａｂが３以下となり、骨見
え現象が低減できる。As shown in Table 2, when an oxide film of silicon and zirconium having a refractive index of 1.75 and a film thickness of 80 nm is used as the intermediate refractive index layer, the ITO film thickness is 3
The color difference ΔE * ab becomes 3 or less up to about 00 nm, and the bone appearance phenomenon can be reduced.
【００３８】他方、比較例の従来の屈折率１．４６のシ
リカ膜を用いた場合には、いずれの場合にも、ＩＴＯ膜
厚を４０ｎｍ以下にしないと骨見え現象が低減できない
ことが解る。On the other hand, when the conventional silica film having a refractive index of 1.46 of the comparative example is used, it is understood that the bone appearance phenomenon cannot be reduced unless the ITO film thickness is 40 nm or less in any case.
【００３９】以上に記載した実施例のほか、ＩＴＯ膜と
樹脂層との密着力、ＩＴＯ膜のパターニング性、耐久性
についても評価した結果、従来のシリカ膜同様の性能が
得られることが確認された。In addition to the examples described above, the adhesion between the ITO film and the resin layer, the patterning property of the ITO film, and the durability were evaluated, and it was confirmed that the same performance as that of the conventional silica film was obtained. It was
【００４０】さらに、プラスチック基板を用いたＬＣＤ
において必要とされるガスバリアー性能についても評価
した結果、ＬＣＤセル内での発泡現象が低減されること
が確認された。これは、本発明において用いる中間屈折
率層の膜厚が５０ｎｍ以上であることに起因していると
考えられる。Further, an LCD using a plastic substrate
As a result of evaluating the gas barrier performance required in, it was confirmed that the foaming phenomenon in the LCD cell was reduced. It is considered that this is because the film thickness of the intermediate refractive index layer used in the present invention is 50 nm or more.
【００４１】[0041]
【表１】 [Table 1]
【００４２】[0042]
【表２】 [Table 2]
【００４３】[0043]
【発明の効果】本発明により、ＩＴＯ膜厚を薄くせず
に、すなわち、低抵抗のＩＴＯ電極を形成させ、かつ骨
見え現象を低減させることができる液晶ディスプレイ用
樹脂基板を提供できる。According to the present invention, it is possible to provide a resin substrate for a liquid crystal display capable of forming an ITO electrode having a low resistance without reducing the ITO film thickness and reducing the bone appearance phenomenon.
【００４４】本発明において用いる中間屈折率層は、従
来のシリカ膜同様にＩＴＯ膜と樹脂層との密着力を向上
させ、ＩＴＯ膜のパターニング性、耐久性を向上させ
る。The intermediate refractive index layer used in the present invention improves the adhesion between the ITO film and the resin layer, like the conventional silica film, and improves the patterning property and durability of the ITO film.
【００４５】また、本発明において用いる中間屈折率層
の膜厚は５０ｎｍ以上であるので、プラスチック基板を
用いたＬＣＤにおいて必要とされるガスバリアー性能も
向上し、ＬＣＤセル内での発泡現象も低減できるという
優れた効果をも有する。Further, since the film thickness of the intermediate refractive index layer used in the present invention is 50 nm or more, the gas barrier performance required in the LCD using the plastic substrate is also improved and the foaming phenomenon in the LCD cell is reduced. It also has an excellent effect that it can be done.
【図面の簡単な説明】[Brief description of drawings]
【図１】本発明に係る液晶ディスプレイ用樹脂基板の構
成断面図FIG. 1 is a sectional view showing the configuration of a resin substrate for a liquid crystal display according to the present invention.
【図２】従来のプラスチック液晶ディスプレイの構成断
面図FIG. 2 is a sectional view showing the structure of a conventional plastic liquid crystal display.
１：透明樹脂基板 ２：ガスバリアー層 ３：ハードーコート層 ４：中間屈折率層 ５：透明導電膜 ６：密着力向上中間層 ７：電極加工された透明導電膜 ８：配向膜 ９：液晶層 1: Transparent Resin Substrate 2: Gas Barrier Layer 3: Hard Coat Layer 4: Intermediate Refractive Index Layer 5: Transparent Conductive Film 6: Adhesion Enhancement Intermediate Layer 7: Electrode-Processed Transparent Conductive Film 8: Alignment Film 9: Liquid Crystal Layer
Claims (2)
１．８５以下で、かつその膜厚が５０ｎｍ以上１００ｎ
ｍ以下の範囲にある中間屈折率層を設け、その上に透明
導電膜を形成したことを特徴とする液晶ディスプレイ用
樹脂基板。1. A transparent resin substrate having a refractive index of 1.65 to 1.85 and a film thickness of 50 nm to 100 n.
A resin substrate for a liquid crystal display, wherein an intermediate refractive index layer having a thickness of m or less is provided, and a transparent conductive film is formed thereon.
ウムからなる膜であることを特徴とする請求項１の液晶
ディスプレイ用樹脂基板。2. The resin substrate for a liquid crystal display according to claim 1, wherein the transparent conductive film is a film made of indium oxide containing tin.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4419995A JPH08240800A (en) | 1995-03-03 | 1995-03-03 | Resin substrate for liqud crystal display |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4419995A JPH08240800A (en) | 1995-03-03 | 1995-03-03 | Resin substrate for liqud crystal display |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH08240800A true JPH08240800A (en) | 1996-09-17 |
Family
ID=12684910
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4419995A Pending JPH08240800A (en) | 1995-03-03 | 1995-03-03 | Resin substrate for liqud crystal display |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH08240800A (en) |
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