SG11201705304PA - Pellicle film, pellicle frame, and pellicle and method for producing same - Google Patents

Pellicle film, pellicle frame, and pellicle and method for producing same

Info

Publication number
SG11201705304PA
SG11201705304PA SG11201705304PA SG11201705304PA SG11201705304PA SG 11201705304P A SG11201705304P A SG 11201705304PA SG 11201705304P A SG11201705304P A SG 11201705304PA SG 11201705304P A SG11201705304P A SG 11201705304PA SG 11201705304P A SG11201705304P A SG 11201705304PA
Authority
SG
Singapore
Prior art keywords
pellicle
producing same
film
frame
pellicle frame
Prior art date
Application number
SG11201705304PA
Inventor
Atsushi Okubo
Tsuneaki BIYAJIMA
Yosuke Ono
Kazuo Kohmura
Yasuhisa Fujii
Nobuko Matsumoto
Original Assignee
Mitsui Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Chemicals Inc filed Critical Mitsui Chemicals Inc
Publication of SG11201705304PA publication Critical patent/SG11201705304PA/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Laser Beam Processing (AREA)
SG11201705304PA 2015-02-24 2016-01-22 Pellicle film, pellicle frame, and pellicle and method for producing same SG11201705304PA (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2015034267 2015-02-24
JP2015214500 2015-10-30
PCT/JP2016/051811 WO2016136343A1 (en) 2015-02-24 2016-01-22 Pellicle film, pellicle frame, and pellicle and method for producing same

Publications (1)

Publication Number Publication Date
SG11201705304PA true SG11201705304PA (en) 2017-07-28

Family

ID=56789454

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201705304PA SG11201705304PA (en) 2015-02-24 2016-01-22 Pellicle film, pellicle frame, and pellicle and method for producing same

Country Status (8)

Country Link
US (1) US10261411B2 (en)
EP (1) EP3264175B1 (en)
JP (1) JP6491313B2 (en)
KR (1) KR101920172B1 (en)
CN (1) CN107003602B (en)
SG (1) SG11201705304PA (en)
TW (1) TWI713493B (en)
WO (1) WO2016136343A1 (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3196700B1 (en) * 2014-09-19 2019-01-30 Mitsui Chemicals, Inc. Pellicle, pellicle production method and exposure method using pellicle
JP6275270B2 (en) 2014-09-19 2018-02-07 三井化学株式会社 Pellicle, manufacturing method thereof and exposure method
TWI612369B (en) * 2016-12-28 2018-01-21 Micro Lithography Inc EUV reticle inorganic protective film assembly manufacturing method
JP6787799B2 (en) * 2017-01-24 2020-11-18 信越化学工業株式会社 Adhesive molding method and pellicle manufacturing method by this molding method
CN111373324A (en) 2017-11-06 2020-07-03 Asml荷兰有限公司 Metal silicon nitride for stress reduction
WO2019211083A1 (en) 2018-05-04 2019-11-07 Asml Netherlands B.V. Pellicle for euv lithography
KR102689722B1 (en) * 2020-08-05 2024-07-31 미쯔이가가꾸가부시끼가이샤 Pellicle, exposure original plate, exposure apparatus, pellicle manufacturing method, and semiconductor device manufacturing method
KR20220113200A (en) * 2021-02-05 2022-08-12 에스케이하이닉스 주식회사 Pellicle for EUV lithography and manufacturing methods for the same
KR20220166494A (en) 2021-06-10 2022-12-19 주식회사 에프에스티 Defect removal method of pellicle film for extreme ultraviolet lithography
KR102662986B1 (en) * 2021-07-06 2024-05-07 주식회사 에프에스티 Method for Fabricating Pellicle for EUV(extreme ultraviolet) Lithography
WO2024048365A1 (en) * 2022-09-02 2024-03-07 三井化学株式会社 Foreign matter removal device, pellicle production device, pellicle production method, and pellicle

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5422704A (en) * 1992-07-13 1995-06-06 Intel Corporation Pellicle frame
US6475575B1 (en) 1999-09-13 2002-11-05 Asahi Glass Company, Limited Pellicle and method for manufacture thereof
JP2001147519A (en) * 1999-11-19 2001-05-29 Asahi Glass Co Ltd Pellicle and method for producing pellicle plate
US6593035B1 (en) * 2001-01-26 2003-07-15 Advanced Micro Devices, Inc. Pellicle for use in small wavelength lithography and a method for making such a pellicle using polymer films
US7094505B2 (en) 2002-10-29 2006-08-22 Toppan Photomasks, Inc. Photomask assembly and method for protecting the same from contaminants generated during a lithography process
JP5454136B2 (en) * 2007-03-01 2014-03-26 株式会社ニコン Pellicle frame apparatus, mask, reticle apparatus, exposure method, exposure apparatus, and device manufacturing method
JP4822357B2 (en) * 2007-04-20 2011-11-24 信越化学工業株式会社 Pellicle storage container and manufacturing method thereof
JP5489499B2 (en) * 2009-03-18 2014-05-14 オリンパス株式会社 Thin film attaching method and pellicle optical element manufactured thereby
JP5481106B2 (en) * 2009-06-24 2014-04-23 信越化学工業株式会社 Pellicle frame and lithography pellicle
JP5552095B2 (en) 2011-06-21 2014-07-16 信越化学工業株式会社 EUV reticle
JP5795747B2 (en) * 2012-04-04 2015-10-14 信越化学工業株式会社 Pellicle frame and pellicle
JP5822401B2 (en) * 2012-12-25 2015-11-24 信越化学工業株式会社 Pellicle for lithography
CN103246157A (en) * 2013-05-21 2013-08-14 上海和辉光电有限公司 Dustproof film framework, optical mask and installation method thereof
WO2014188710A1 (en) * 2013-05-24 2014-11-27 三井化学株式会社 Pellicle and euv exposure device comprising same
WO2015182483A1 (en) * 2014-05-27 2015-12-03 三井化学株式会社 Pellicle-manufacturing device

Also Published As

Publication number Publication date
KR101920172B1 (en) 2018-11-19
JP6491313B2 (en) 2019-03-27
EP3264175A4 (en) 2018-10-24
WO2016136343A1 (en) 2016-09-01
CN107003602B (en) 2021-03-12
US20170285461A1 (en) 2017-10-05
JPWO2016136343A1 (en) 2017-11-02
CN107003602A (en) 2017-08-01
KR20170070146A (en) 2017-06-21
US10261411B2 (en) 2019-04-16
TW201631199A (en) 2016-09-01
TWI713493B (en) 2020-12-21
EP3264175B1 (en) 2020-01-08
EP3264175A1 (en) 2018-01-03

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