WO2014199764A1 - 半導体装置及びその製造方法 - Google Patents
半導体装置及びその製造方法 Download PDFInfo
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- WO2014199764A1 WO2014199764A1 PCT/JP2014/062785 JP2014062785W WO2014199764A1 WO 2014199764 A1 WO2014199764 A1 WO 2014199764A1 JP 2014062785 W JP2014062785 W JP 2014062785W WO 2014199764 A1 WO2014199764 A1 WO 2014199764A1
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- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L24/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L24/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/42—Wire connectors; Manufacturing methods related thereto
- H01L24/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
- H01L24/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/73—Means for bonding being of different types provided for in two or more of groups H01L24/10, H01L24/18, H01L24/26, H01L24/34, H01L24/42, H01L24/50, H01L24/63, H01L24/71
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L24/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L24/85—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/00011—Not relevant to the scope of the group, the symbol of which is combined with the symbol of this group
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/00014—Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/181—Encapsulation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/19—Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
- H01L2924/191—Disposition
- H01L2924/19101—Disposition of discrete passive components
- H01L2924/19107—Disposition of discrete passive components off-chip wires
Definitions
- the present invention relates to a semiconductor device having a terminal structure capable of strengthening fixing of a terminal of an insert-type case and performing strong wire bonding, and a method of manufacturing the semiconductor device.
- FIG. 26 is a schematic configuration diagram of a power semiconductor module.
- the power semiconductor module 50 includes a frame body 51 made of PPS (polyphenol sulfide) resin, and a terminal 53 that penetrates the frame body 51 and is embedded in the first step portion 52 of the frame body 51.
- the power semiconductor module 50 includes a second stepped portion 54 formed inside the back surface side of the frame 51, and a circuit board 56 fitted to the second stepped portion 54 and fixed with an adhesive resin 55.
- the power semiconductor module 50 includes a semiconductor chip 57 soldered to the circuit board 56, a wire 58 that connects the semiconductor chip 57 and the terminal 53 by ultrasonic bonding, and a sealing material 59 that fills the inside of the frame 51.
- the circuit board 56 includes a metal plate 56c such as aluminum, an insulating plate 56b such as an epoxy resin covering the metal plate 56c, and a circuit board 56a formed on the insulating plate 56b.
- the surface of the first step portion 52 of the frame body 51 and the surface of the terminal 53 have the same height.
- the terminal 53 is formed by cutting and removing unnecessary portions of the lead frame.
- the frame 51 functions as a resin case. Further, the terminal 53 is fixed to the frame 51 by integral molding.
- FIG. 27 is an enlarged view of part B of FIG. 26, and shows only the frame and the terminals. Adhesiveness is low between the back surface 53a of the integrally formed terminal 53 and the bottom portion 52a of the embedded portion of the first step portion 52 of the frame 51. Further, due to the difference in thermal expansion coefficient between them, as shown in FIG. 27, the terminal 53 embedded in the first step portion 52 may float from the bottom portion 52a of the embedded portion of the first step portion 52. Since the ultrasonic vibration at the time of wire bonding is not transmitted well to the terminal 53 in such a state, strong wire bonding cannot be performed. Therefore, there arises a problem that the wire 58 is peeled off from the terminal 53.
- Patent Document 1 the cross-sectional structure of the terminal is inverted T-shaped and embedded in the case, and the case member is fixed in a shape that engages the terminal.
- Patent Document 2 a protrusion is attached to the case, and the terminal is fixed by pressing the protrusion from above.
- Patent Document 3 a pin is inserted from a through hole provided on the back surface of the case under the terminal to lift and fix the terminal. Moreover, in patent document 4, a terminal is adhere
- patent document 1 since the fixing location of a terminal becomes large, size reduction of a power semiconductor module is difficult. Moreover, although the structure which hold
- Patent Document 3 since Patent Document 3 requires a component having a complicated shape, it is not suitable for mass production, resulting in an increase in manufacturing cost. Moreover, in patent document 4, it is necessary to add the process of attaching an anchor board to a terminal, and the hardening process before performing case and terminal collective molding, and a manufacturing cost becomes high.
- An object of the present invention is to provide a low-cost and small-sized semiconductor device that can solve this problem, perform strong wire bonding, and is excellent in mass productivity, and a manufacturing method thereof.
- a semiconductor device includes a first step portion disposed in an annular shape on the inner periphery on one main surface side and an annular shape on the inner periphery on the other main surface side.
- a frame having a second stepped portion disposed on the inner wall provided between the first stepped portion and the second stepped portion, a terminal led out from the first stepped portion, A circuit board fitted in the second step portion; and an adhesive resin that bonds the second step portion and the circuit board and is in contact with the inner wall and the terminal.
- a semiconductor device in another aspect of the present invention, includes a first step portion disposed in an annular shape on an inner periphery on one main surface side, and an annular shape disposed on an inner periphery on the other main surface side.
- a frame having two step portions, an inner wall provided between the first step portion and the second step portion, and a through-hole penetrating the first step portion and the second step portion;
- the terminal led out from the first stepped portion, the circuit board fitted to the second stepped portion, the second stepped portion and the circuit substrate are bonded, filled in the through hole, and And an adhesive resin in contact with the terminal.
- a semiconductor device in another aspect of the present invention, includes a first step portion disposed in an annular shape on an inner periphery on one main surface side, and an annular shape disposed on an inner periphery on the other main surface side.
- a frame having two step portions, an inner wall provided between the first step portion and the second step portion, a terminal led out from the first step portion, and the second step portion And a first adhesive resin that bonds the second stepped portion and the circuit board, and the frame body has a gap in a side portion of the terminal in the first stepped portion. And a second adhesive resin is disposed in the gap.
- a method for manufacturing a semiconductor device includes a first step portion disposed in an annular shape on an inner periphery on one main surface side, a terminal fixed to the first step portion, Preparing a frame having a second stepped portion annularly arranged on the inner periphery on the other main surface side, and an inner wall provided between the first stepped portion and the second stepped portion; A step of preparing a circuit board; a step of applying an adhesive resin to the second step portion with the one main surface facing downward; and fitting the circuit board to the second step portion And extruding the adhesive resin, and applying the adhesive resin to the inner wall and the terminal.
- a method for manufacturing a semiconductor device includes a first step portion disposed in an annular shape on an inner periphery on one main surface side, a terminal fixed to the first step portion, Preparing a frame having a second stepped portion annularly arranged on the inner periphery on the other main surface side, and an inner wall provided between the first stepped portion and the second stepped portion; A step of preparing a circuit board; a step of applying the first adhesive resin to the second stepped portion with the one main surface facing downward; and the circuit board at the second stepped portion. And a step of applying a second adhesive resin to the inner wall and the terminal with the one main surface facing upward.
- a method for manufacturing a semiconductor device includes a first step portion disposed in an annular shape on an inner periphery on one main surface side, a terminal fixed to the first step portion, A second stepped portion arranged annularly on the inner periphery of the other main surface, an inner wall provided between the first stepped portion and the second stepped portion, the first stepped portion and the second stepped portion.
- a step of preparing a frame body having a through-hole penetrating the step portion, a step of preparing a circuit board, and the frame body are bonded to the second step portion with the one main surface facing downward Applying a resin and filling the through hole with the adhesive resin; and fitting the circuit board into the second stepped portion.
- FIG. 3 is a main part configuration diagram (No. 1) of the semiconductor device according to the first example;
- FIG. 3 is a main part configuration diagram (No. 2) of the semiconductor device according to the first example;
- FIG. 3 is a main part configuration diagram (No. 3) of the semiconductor device according to the first example;
- FIG. 4 is a main part configuration diagram (part 4) of the semiconductor device according to the first example;
- It is a principal part block diagram of the semiconductor device which concerns on 2nd Example.
- It is a principal part block diagram of the semiconductor device which concerns on 3rd Example.
- It is a principal part block diagram of the semiconductor device which concerns on 4th Example.
- It is a principal part block diagram of the semiconductor device which concerns on 5th Example.
- Example 1 to 4 are main part configuration diagrams of the semiconductor device according to the first embodiment.
- the semiconductor device 100 includes a frame body 7, terminals 15, a circuit board 12, and an adhesive resin 8.
- the frame body 7 is made of, for example, PPS resin and corresponds to a resin case of the semiconductor device 100.
- the frame body 7 has an annular shape on the inner circumference on the side of one main surface (upper surface in the figure) and an inner circumference on the side of the other main surface (lower surface in the figure).
- a second step portion 9 disposed on the inner wall 7d and an inner wall 7d provided between the first step portion 21 and the second step portion 9.
- the terminal 15 penetrates the frame body 7, and the front surface 4a is exposed and embedded from the front surface 21a of the first step portion 21.
- the terminal 15 has a protruding portion 15e whose tip protrudes from the inner wall 7d of the frame body 7 by, for example, about 1 mm.
- the circuit board 12 is fitted to the second step portion 9 of the frame body 7.
- the circuit board 12 includes a metal plate 12c such as aluminum, an insulating plate 12b such as an epoxy resin covering the metal plate 12c, and a circuit board 12a formed on the surface of the insulating plate 12b. Further, as the circuit board 12, a DCB (Direct Copper Bonding) board or the like may be used.
- a DCB Direct Copper Bonding
- the adhesive resin 8 is disposed so as to adhere the circuit board 12 and the second stepped portion 9 of the frame body 7, and contact the inner wall 7 d of the frame body 7 and the terminal 15.
- the semiconductor device 100 includes a semiconductor chip 11, a wire 13, and a sealing material 14.
- the semiconductor chip 11 is soldered to the circuit board 12 a of the circuit board 12.
- the wire 13 is made of aluminum, copper, or the like, and electrically connects the semiconductor chip 11 and the terminal 15.
- the sealing material 14 is filled in the frame body 7 and seals the inside of the semiconductor device 100.
- the frame body 7 is provided with an attachment hole 22.
- the adhesive resin 8 is in contact with the back surface 15b of the protruding portion 15e of the terminal 15 and the inner wall 7d of the frame body 7, whereby the terminal 15 and the frame body 7 are firmly fixed with the adhesive resin 8. Therefore, strong wire bonding can be performed on the terminal 15 by ultrasonic vibration.
- FIG. 4 shows a case where the terminal is lifted from the buried portion of the first step portion.
- the adhesive resin 8 can enter the solid space 26 and be solidified. . Therefore, the terminal 15 and the first step portion 21 (frame body 7) are firmly fixed using the adhesive resin 8, and strong wire bonding can be performed using the ultrasonic bonding apparatus 25.
- This shear strength is a condition in which a force parallel to the surface of the terminal 15 is applied to the bonding joint and the joint surface does not peel off. Note that the vibration indicated by the arrow in the figure indicates the direction of ultrasonic vibration.
- the terminal 15 and the frame body 7 can be fixed with the adhesive resin 8 for fixing the circuit board 12, no additional process is required, and the terminal 15 can be firmly fixed to the first step portion 21 at low cost. .
- the adhesive resin 8 is a material having an elastic coefficient capable of absorbing vibration, and is preferably a thermosetting resin that is liquid and can be processed at room temperature with a low viscosity.
- the adhesive resin 8 is preferably, for example, an epoxy resin, a polyimide resin, a polyamide resin, or a silicone resin.
- FIG. 5 is a block diagram of the main part of the semiconductor device according to the second embodiment.
- FIG. 5 is a diagram corresponding to FIG. 2 of the first embodiment.
- the terminal 15 is different from the semiconductor device 100 of FIG. 2 in that the adhesive resin 8 is also in contact with the end face 15c of the protruding portion 15e of the terminal 15. Compared with the first embodiment, since the protruding portion 15e of the terminal 15 is bonded to the frame body 7 not only on the back surface 15b but also on the end surface 15c, the terminal 15 can be more firmly fixed.
- FIG. 6 is a block diagram of the main part of the semiconductor device according to the third embodiment.
- FIG. 6 is a diagram corresponding to FIG. 5 of the second embodiment.
- FIG. 7 is a main part configuration diagram of the semiconductor device according to the fourth embodiment.
- FIG. 7 corresponds to FIG. 6 of the third embodiment.
- FIG. 8 is a block diagram of the main part of the semiconductor device according to the fifth embodiment.
- FIG. 8 is a diagram corresponding to FIG. 7 of the fourth embodiment.
- FIG. 9 is a main part configuration diagram of the semiconductor device according to the sixth embodiment.
- FIG. 9 is a diagram corresponding to FIG. 8 of the fifth embodiment.
- FIG. 10 is a main part configuration diagram of the semiconductor device according to the seventh embodiment.
- FIG. 10 is a diagram corresponding to FIG. 8 of the fifth embodiment.
- FIG. 11 is a main part configuration diagram of the semiconductor device according to the eighth embodiment.
- FIG. 11 is a diagram corresponding to FIG. 10 of the seventh embodiment.
- FIG. 12 is a main part configuration diagram of the semiconductor device according to the ninth embodiment.
- FIG. 12 is a diagram corresponding to FIG. 2 of the first embodiment.
- a stopper 30 is provided in the first step portion 21 of the frame body 7.
- the stopper 30 may be formed integrally with the frame body 7 or may be formed separately from another material and attached with an adhesive.
- FIG. 13 is a main part configuration diagram of the semiconductor device according to the tenth embodiment.
- FIG. 13 is a diagram corresponding to FIG. 6 of the third embodiment.
- FIG. 14 is a main part configuration diagram of the semiconductor device according to the eleventh embodiment.
- FIG. 14 is a diagram corresponding to FIG. 13 of the tenth embodiment.
- the difference between the semiconductor device 1100 shown in FIG. 14 and the semiconductor device 1000 shown in FIG. 13 is that a gap 33 is provided in the first step portion 21 in contact with the side surface 15 d of the terminal 15, Thus, the first step portion 21 is fixed on the side surface 15d of the terminal 15. Also in this case, the terminal 15 and the first step portion 21 are firmly fixed, and the ultrasonic bonding is favorably performed.
- FIG. 15 is a main part configuration diagram of the semiconductor device according to the twelfth embodiment.
- FIG. 15 is a diagram corresponding to FIG. 8 of the fifth embodiment.
- FIGS. 16 to 18 are cross-sectional views of the main part manufacturing process shown in the order of the processes, which are the method of manufacturing the semiconductor device according to the thirteenth embodiment.
- the thirteenth embodiment is a method for manufacturing the semiconductor device 100 shown in FIG.
- a mold 3 composed of a lower mold 1 and an upper mold 2 is prepared.
- a Cu lead frame 4 is placed in the lower mold 1.
- the upper mold 2 is arranged on the lower mold 1.
- the front surface 4a of the lead frame 4 and the lower surface 2a of the upper mold 2 are brought into close contact with each other.
- PPS resin which is a mold resin 6
- the space 3 a inside the mold 3 is filled with the mold resin 6.
- the mold 3 is heated to cure the mold resin 6.
- the frame body 7 is formed by this curing, and the frame body 7 and the lead frame 4 are integrally molded.
- the lead frame 4 penetrates the frame body 7 and is fixed to the frame body 7.
- the lower mold 1 and the upper mold 2 are separated, and the integrally formed frame 7 and lead frame 4 are removed from the mold 3. This completes the resin case with the lead frame 4.
- the circuit board 12 is prepared.
- the liquid adhesive resin 8 is applied to the second stepped portion 9 using the dispenser 10 shown in FIG. 25 with the back surface 7 b of the frame body 7 facing up.
- 4b is the back surface of the lead frame
- 4c is the end surface of the protrusion 4e at the tip of the lead frame.
- Reference numeral 7a denotes a front surface of the frame.
- the circuit board 12 to which the semiconductor chip 11 is fixed is turned upside down, and the surface to which the semiconductor chip 11 is fixed faces downward, so that the metal plate 12c of the circuit board 12 is 2 is fitted to the stepped portion 9.
- the liquid adhesive resin 8 applied to the second stepped portion 9 spreads to the back surface 4b of the protruding portion 4e at the tip of the lead frame 4, and the back wall 4b and the inner wall 7d of the opening 7c of the frame body 7 are liquid.
- the adhesive resin 8 is applied.
- the adhesive resin 8 may wrap around the front surface 4 a of the protrusion 4 e at the tip of the lead frame 4. However, it is only necessary that the wraparound portion is separated from the bonding portion 35.
- the whole is heated to cure the liquid adhesive resin 8.
- the circuit board 12 and the back surface 4 b of the protruding portion 4 e at the tip of the lead frame 4 are firmly fixed to the frame body 7 through the adhesive resin 8.
- a reflow furnace may be used for curing the liquid adhesive resin 8.
- the sealing material 14 is filled into the frame body 7. Subsequently, unnecessary portions of the lead frame 4 are cut and then bent to form the terminals 15. In this way, the semiconductor device 100 is completed.
- the adhesive resin 8 is an epoxy resin having a viscosity of, for example, about 10 Pa ⁇ sec to 50 Pa ⁇ sec, preferably about 16 Pa ⁇ sec to 30 Pa ⁇ sec, and is applied using the dispenser 10.
- the adhesive resin 8 is preferably a thermosetting resin that is liquid and can be processed at room temperature with a low viscosity, and may be a polyimide resin or a polyamide resin.
- the adhesive resin 8 that flows out when the circuit board 12 is fitted to the second stepped portion 9 is discharged from the second stepped portion 9 to the lead frame. 4 can be applied accurately over the back surface 4b of the protruding portion 4e at the tip of 4.
- the adhesive resin 8 may slightly wrap around the front surface 4a.
- the length L of the protrusion 4e at the tip of the lead frame 4 may be about 0.2 mm to 1 mm, for example, from the viewpoint of adhesiveness.
- the back surface 4b of the embedded lead frame 4 may be lifted, for example, by about 70 ⁇ m as shown in FIG. 4 due to the difference in thermal expansion coefficient.
- the adhesive resin 8 having a low viscosity penetrates into the gap 26, and good fixation is obtained.
- FIG. 19 to FIG. 21 are cross-sectional views of main part manufacturing steps shown in the order of steps in the method for manufacturing a semiconductor device according to the fourteenth embodiment.
- the fourteenth embodiment is a method for manufacturing the semiconductor device 1000 shown in FIG.
- the process from FIG. 19A to the process in FIG. 20E is the same as the process from FIG. 16A to the process in FIG. 17E in the thirteenth embodiment.
- the circuit board 12 is prepared.
- the liquid first adhesive resin 18 is applied to the second stepped portion 9 with the back surface 7 b of the frame body 7 facing up, using the dispenser 10 shown in FIG. 25. .
- the amount of the first adhesive resin 18 is made smaller than the amount of the adhesive resin 8 in the case of FIG.
- the circuit board 12 to which the semiconductor chip 11 is fixed is turned upside down, and the surface to which the semiconductor chip 11 is fixed faces downward, and the circuit board 12a of the circuit board 12 is second Fits into the step 9.
- the first adhesive resin 18 is small, the first adhesive resin 18 is prevented from flowing to the inner wall 7d of the opening 7c of the frame body 7.
- the entire temperature is raised and the first adhesive resin 18 is cured.
- the circuit board 12 is firmly cured to the frame body 7 via the first adhesive resin 18.
- the second adhesive resin 19 is applied to the side wall 4 d at the tip of the lead frame 4 and the inner wall 7 d of the opening 7 c of the frame body 7 by turning the whole upside down. .
- the second adhesive resin 19 may be applied to the front surface 4 a of the leading end of the lead frame 4.
- the second adhesive resin 19 applied to the front surface 4a is cured and then rides on the front surface 4a of the lead frame 4.
- the dispenser 10 shown in FIG. 25 is also used for the application of the second adhesive resin 19.
- a dispenser different from the above is used.
- the second adhesive resin 19 is cured.
- the lead frame 4 and the frame 7 are firmly cured via the second adhesive resin 19.
- the wires 13 are fixed to the semiconductor chip 11, the lead frame 4, and the circuit board 12a by ultrasonic bonding.
- the sealing material 14 is filled into the frame body 7. Subsequently, unnecessary portions of the lead frame 4 are cut and then bent to form the terminals 15. In this way, the semiconductor device 1000 is completed.
- the first adhesive resin 18 and the second adhesive resin 19 may be the same resin or different resins.
- these resins for example, epoxy resins, polyimide resins, polyamide resins, or silicone resins may be used.
- Example 15 are cross-sectional views of the main part manufacturing process shown in the order of the processes, which are the method of manufacturing the semiconductor device according to the fifteenth embodiment.
- the fifteenth embodiment is a method for manufacturing the semiconductor device 500 shown in FIG.
- a mold 3 composed of a lower mold 1 and an upper mold 2 is prepared.
- a Cu lead frame 4 is arranged in the lower mold 1.
- the lower mold 1 is provided with a protrusion 28 a so that a through hole 28 is formed from the first step portion 21 of the frame body 7 toward the second step portion 9.
- the upper mold 2 is placed on the lower mold 1.
- the front surface 4a of the lead frame 4 and the lower surface 2a of the upper mold 2 are brought into close contact with each other.
- PPS resin which is a mold resin 6
- the space 3 b inside the mold 3 is filled with the mold resin 6.
- the mold 3 is heated to cure the mold resin 6.
- the frame body 7 having the through holes 28 is formed, and the frame body 7 and the lead frame 4 are integrally molded.
- the lead frame 4 penetrates the frame body 7 and is fixed to the frame body 7.
- the lower mold 1 and the upper mold 2 are separated from each other, and the frame body 7 and the lead frame 4 that are integrally molded are removed from the mold 3. This completes the resin case with the lead frame 4.
- the circuit board 12 is prepared.
- the liquid adhesive resin 8 is transferred to the second stepped portion 9 using the dispenser 10 shown in FIG. 25. Apply to fill.
- the circuit board 12 to which the semiconductor chip 11 is fixed is turned upside down, and the surface to which the semiconductor chip 11 is fixed faces downward, and the metal plate 12c of the circuit board 12 is 2 is fitted to the stepped portion 9. Subsequently, the whole is heated to cure the liquid adhesive resin 8. As a result, the circuit board 12 is firmly cured on the second step portion 9 via the adhesive resin 8, and the back surface 15 b of the lead frame 4 is firmly cured on the frame body 7 via the adhesive resin 8 filled in the through hole 28.
- a reflow furnace may be used for curing the liquid adhesive resin 8.
- FIG. 25 is a schematic configuration diagram of a coating apparatus for applying an adhesive resin used in the thirteenth, fourteenth and fifteenth embodiments. This apparatus can also be applied to the reference numerals 18 and 19 of the adhesive resin.
- the coating device 150 is a device that applies the adhesive resin 8 to the inner wall 7d of the opening 7c of the frame body 7.
- the coating device 150 can be moved to the X axis and the X axis, the dispenser 10, and the Z axis.
- a discharge controller 43 that discharges the adhesive resin 8 from the dispenser 10 and controls the discharge amount and discharge pressure of the resin is provided.
- An adsorption unit 44 that adsorbs the circuit board 12, an adsorption unit attachment column 45 that can move in the Z-axis, and an adsorption control unit 46 that controls intake of the adsorption unit 44 are provided.
- a moving unit 47 that moves the support base 41 and a movement control unit 48 that issues a command to the moving unit 47 are provided.
- the numbers in parentheses in the figure indicate the process order.
- step (1) the circuit board 12 with the semiconductor chip 11 placed on the support base 41 is placed.
- the support unit 41 is moved by moving the moving unit 47 in the X direction and the Y direction according to a command from the movement control unit 48, and the circuit board 12 is positioned immediately below the suction unit 44. Subsequently, the suction portion 44 is lowered and brought into contact with the circuit board 12. Subsequently, the suction control unit 46 sucks the metal plate 12 c of the circuit board 12 in close contact with the suction unit 44.
- the frame 7 is placed on the support base 41 with the front surface 7a side down.
- this step is omitted.
- the support unit 41 is moved by moving the moving unit 47 in the X direction and the Y direction according to a command from the movement control unit 48, and the second step portion 9 of the frame body 7 is moved to the dispenser. It is located immediately below 10.
- the dispenser 10 is lowered to the vicinity of the second step portion 9 of the frame body 7, and an appropriate amount controlled by the discharge control unit 43 is placed on the second step portion 9 of the frame body 7. Adhesive resin 8 is applied.
- the moving unit 47 is moved in the X direction and the Y direction by a command from the movement control unit 48 to move the support base 41, and the frame body 7 is positioned immediately below the circuit board 12. .
- the circuit board 12 is lowered and the circuit board 12 is fitted to the second step portion 9 of the frame body 7.
- the adhesive resin 8 applied to the second step portion 9 is compressed and flows to the back surface 4b of the protruding portion 4e at the tip of the lead frame 4 as shown in FIG. At this time, it may flow up to the end face 4c.
- the application amount of the adhesive resin 8 since the application amount of the adhesive resin 8 is controlled, it does not flow to the end surface 4c of the protruding portion 4e of the lead frame 4 or the front surface 4a.
- the discharge of the adhesive resin 8 to the inner wall 7d of the opening 7c of the frame body 7 is appropriately controlled by the discharge control unit 43 so that the discharge amount and the discharge speed of the adhesive resin 8 are appropriately controlled.
- the dispenser 10 discharges an appropriate weight of the adhesive resin 8 to the second step portion 9.
- the adhesive resin 8 discharged from the dispenser 10 is uniformly applied to the second step portion 9 of the frame body 7 by moving the support base 41.
- the appropriate weight of the adhesive resin 8 is about 100 mg and the discharge pressure is about 1.5 ⁇ 9.8 N, for example. It can be applied properly.
- the first adhesive resin 18 is cured by moving the support base 41 from the applied state to the transport belt and passing through the reflow furnace.
- the adhesive resin 18 is cured.
- the support base 41 is moved from the transport belt to a place where the second coating device is located, the frame body 7 is turned over, the second adhesive resin 19 is applied, and then the transport belt is shifted to another transport belt. Cure through an oven.
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- Engineering & Computer Science (AREA)
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- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Chemical & Material Sciences (AREA)
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- Materials Engineering (AREA)
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Abstract
Description
このパワー半導体モジュール50は、PPS(ポリフェノルサルファイド)樹脂で形成された枠体51と、枠体51を貫通し、枠体51の第1段差部52に埋設された端子53を備える。パワー半導体モジュール50は、枠体51の裏面側の内側に形成された第2段差部54と、この第2段差部54に嵌合され接着樹脂55で固定された回路基板56とを備える。パワー半導体モジュール50は、回路基板56にはんだ付けされた半導体チップ57と、半導体チップ57と端子53を超音波ボンディングで接続するワイヤ58と、枠体51内を充填する封止材59とを備える。回路基板56は、アルミニウムなどの金属板56cと、この金属板56c上を被覆するエポキシ樹脂などの絶縁板56bと、この絶縁板56b上に形成される回路板56aとで構成される。
この一体成型された端子53の裏面53aと、枠体51の第1段差部52の埋設箇所の底部52aの間は密着性が低い。また両者の熱膨張係数差により、図27に示すように、第1段差部52に埋設された端子53は、第1段差部52の埋設箇所の底部52aから浮き上がる場合がある。このような状態の端子53には、ワイヤボンディング時の超音波振動がうまく伝達されないため、強固なワイヤボンディングができない。そのため、ワイヤ58が端子53から剥離する不都合を生じる。
特許文献2ではケースに突出部をつけ、端子を突出部で上から押さえて固定されている。
また、特許文献4では、アンカー板に端子を接着し、ケースにアンカー板を固定する。アンカー板とケースと同じ材料にすることで互いの表面を融合させて一体化する。これによって、端子がしっかり固定されている。
また、特許文献2ではケースの突出部で上から押さえる構造を設けているが、端子下とケースの隙間は依然として残る。このことから、端子とケースとの密着性が十分確保できない場合がある。
また、特許文献4では、ケースと端子の一括成型を行う前に、端子にアンカー板を付ける工程と、その硬化工程を追加する必要があり製造コストが高くなる。
(実施例1)
図1~図4は、第1実施例に係る半導体装置の要部構成図である。
また、半導体装置100は、半導体チップ11と、ワイヤ13と、封止材14を有する。半導体チップ11は、回路基板12の回路板12aにはんだ付けされている。ワイヤ13は、アルミや銅などで構成され、半導体チップ11と端子15とを電気的に接続している。封止材14は、枠体7内に充填され、半導体装置100の内部を封止している。また、枠体7には、取り付け孔22が設けられている。
接着樹脂8は、振動を吸収可能な弾性係数を有する材質で、液状で粘度の小さな常温処理ができる熱硬化性樹脂がよい。接着樹脂8は、例えば、エポキシ系樹脂、ポリイミド系樹脂、ポリアミド系樹脂もしくはシリコーン系樹脂がよい。
(実施例2)
図5は、第2実施例に係る半導体装置の要部構成図である。なお、図5は、第1実施例の図2に相当する図である。
(実施例3)
図6は、第3実施例に係る半導体装置の要部構成図である。なお、図6は、第2実施例の図5に相当する図である。
(実施例4)
図7は、第4実施例に係る半導体装置の要部構成図である。なお図7は、第3実施例の図6に相当する図である。
(実施例5)
図8は、第5実施例に係る半導体装置の要部構成図である。なお図8は、第4実施例の図7に相当する図である。
(実施例6)
図9は、第6実施例に係る半導体装置の要部構成図である。なお、図9は、第5実施例の図8に相当する図である。
(実施例7)
図10は、第7実施例に係る半導体装置の要部構成図である。なお、図10は、第5実施例の図8に相当する図である。
(実施例8)
図11は、第8実施例に係る半導体装置の要部構成図である。なお、図11は、第7実施例の図10に相当する図である。
(実施例9)
図12は、第9実施例に係る半導体装置の要部構成図である。なお、図12は、第1実施例の図2に相当する図である。
また、半導体装置200~800にこの止め部30を設けることで、さらに強固な超音波ボンディングを行うことができる。
(実施例10)
図13は、第10実施例に係る半導体装置の要部構成図である。なお、図13は、第3実施例の図6に相当する図である。
(実施例11)
図14は、第11実施例に係る半導体装置の要部構成図である。なお、図14は、第10実施例の図13に相当する図である。
(実施例12)
図15は、第12実施例に係る半導体装置の要部構成図である。なお、図15は、第5実施例の図8に相当する図である。
(実施例13)
図16~図18は、第13実施例に係る半導体装置の製造方法であり、工程順に示した要部製造工程断面図である。なお、この第13実施例は図1に示す半導体装置100の製造方法である。
次に、図16(b)に示すように、下部金型1に、例えば、Cuのリードフレーム4を配置する。
また、枠体7とリードフレーム4の一体成型において、埋設されたリードフレーム4の裏面4bが熱膨張係数の違いにより、図4に示すように、例えば70μm程度浮き上がる場合がある。しかし、この場合も粘度の低い接着樹脂8は隙間26に浸透して行き、良好な固着が得られる。
(実施例14)
図19~図21は、第14実施例に係る半導体装置の製造方法であり、工程順に示した要部製造工程断面図である。なお、この第14実施例は、図13に示す半導体装置1000の製造方法である。
次に、図21(j)に示すように、枠体7内に封止材14を充填する。続いて、リードフレーム4の不要部分を切断した後、折り曲げて端子15を形成する。このようにして、半導体装置1000ができ上がる。
(実施例15)
図22~図24は、第15実施例に係る半導体装置の製造方法であり、工程順に示した要部製造工程断面図である。なお、この第15実施例は、図8に示す半導体装置500の製造方法である。
次に、図22(b)に示すように、下部金型1に、例えば、Cuのリードフレーム4を配置する。この下部金型1には枠体7の第1段差部21から第2段差部9に向かって貫通孔28が形成されるように突起部28aが設けられている。
図25は、第13実施例、第14実施例及び第15実施例で用いられる接着樹脂を塗布する塗布装置の模式的な構成図である。接着樹脂の符号18,19にもこの装置は適用できる。
まず、(1)の工程において、支持台41に半導体チップ11を下にした回路基板12を載置する。
次に、(4)の工程において、移動制御部48からの指令で移動部47をX方向、Y方向に移動させて支持台41を移動させ、枠体7の第2段差部9をデスペンサー10直下に位置させる。
次に、(7)の工程において、回路基板12を下降させて、枠体7の第2段差部9に回路基板12を嵌合させる。このとき、第2段差部9に塗布された接着樹脂8は圧縮されて図18で示すようにリードフレーム4の先端の突出部4eの裏面4bまで流れてゆく。このとき端面4cまで流れるようにしてもよい。このとき接着樹脂8の塗布量が管理されているため、リードフレーム4の突出部4eの端面4cやおもて面4aまでは流れて行かないようにする。
(5)の工程において、枠体7の開口部7cの内壁7dへの接着樹脂8の排出は、排出制御部43により、接着樹脂8の排出量や排出速度が適正に制御されて、枠体7の第2段差部9に適正重量の接着樹脂8がデスペンサー10により排出される。デスペンサー10から排出された接着樹脂8は支持台41を移動させることで、均一に枠体7の第2段差部9に塗布される。この枠体7の第2段差部9の周囲長が、例えば75mm程度ある場合には、接着樹脂8の適正重量を例えば、100mg程度、排出圧力は例えば、1.5×9.8N程度にすると適正に塗布することができる。
2 上部金型
3 金型
4 リードフレーム
4a,7a,15a,21a おもて面
4b,7b,15b 裏面
4c,15c,15f 端面
4e,15e 突出部
5 注入口
6 モールド樹脂
7 枠体
7c 開口部
7d 内壁
8 接着樹脂
9 第2段差部
10 デスペンサー
11 半導体チップ
12 回路基板
12a 回路板
12b 絶縁膜
12c 金属板
13 ワイヤ
14 封止材
15 端子
15d 側面
18 第1接着樹脂
19 第2接着樹脂
21 第1段差部
22 取り付け孔
25 超音波ボンディング装置
26 隙間
27,33 空隙
28,29 貫通孔
28a 突起部
35 ボンディング箇所
41 支持台
42 取り付け支柱
43 排出制御部
44 吸着部
45 吸着部取り付け支柱
46 吸着制御部
47 移動部
48 移動制御部
100~1200 半導体装置
150 塗布装置
Claims (19)
- 一方の主面側の内周に環状に配置される第1段差部と、他方の主面側の内周に環状に配置される第2段差部と、前記第1段差部と前記第2段差部との間に設けられた内壁とを有する枠体と、
前記第1段差部から外部に導出された端子と、
前記第2段差部に嵌合された回路基板と、
前記第2段差部と前記回路基板とを接着し、前記内壁及び前記端子に接している接着樹脂と、
を備える半導体装置。 - 前記端子が、前記第1段差部側の先端部に、前記内壁から突出した突出部を有し、
前記接着樹脂が前記突出部の前記内壁側の面に接している、
請求項1記載の半導体装置。 - 前記接着樹脂が前記端子の前記突出部側の端面に接している、
請求項2記載の半導体装置。 - 前記端子の前記第1段差部側の先端部が前記内壁と略面一に配置され、
前記接着樹脂は、前記先端部に接している、
請求項1記載の半導体装置。 - 前記接着樹脂は、前記第1段差部面と前記第1段差部面上の前記端子との間を接着している、
請求項4記載の半導体装置。 - 一方の主面側の内周に環状に配置される第1段差部と、他方の主面側の内周に環状に配置される第2段差部と、前記第1段差部と前記第2段差部との間に設けられた内壁と、前記第1段差部と前記第2段差部とを貫通する貫通孔とを有する枠体と、
前記第1段差部から外部に導出された端子と、
前記第2段差部に嵌合された回路基板と、
前記第2段差部と前記回路基板とを接着し、前記貫通孔に充填されて前記端子に接している接着樹脂と、
を備える半導体装置。 - 前記端子の前記第1段差部側の先端部が前記内壁と略面一に配置され、
前記接着樹脂は前記内壁と前記先端部とに接している、
請求項6記載の半導体装置。 - 前記貫通孔はその幅が、前記端子の幅よりも広い、
請求項6または7記載の半導体装置。 - 前記枠体は、前記第1段差部に、前記端子を前記一方の主面側から前記他方の主面側に押圧する止め部を有する、
請求項1または2記載の半導体装置。 - 前記止め部は前記枠体と一体に形成されている、
請求項9記載の半導体装置。 - 前記接着樹脂は、
前記第2段差部と前記回路基板とを接着する第1接着樹脂と、
前記内壁及び前記端子に接している第2接着樹脂と、
を含む請求項4記載の半導体装置。 - 一方の主面側の内周に環状に配置される第1段差部と、他方の主面側の内周に環状に配置される第2段差部と、前記第1段差部と前記第2段差部との間に設けられた内壁とを有する枠体と、
前記第1段差部から外部に導出された端子と、
前記第2段差部に嵌合された回路基板と、
前記第2段差部と前記回路基板とを接着する第1接着樹脂と、
を備え、
前記枠体は、前記第1段差部内の前記端子の側部に空隙を備え、
前記空隙に第2接着樹脂が配置されている半導体装置。 - 前記接着樹脂が、エポキシ系樹脂、ポリイミド系樹脂、ポリアミド系樹脂もしくはシリコーン系樹脂のいずれかである、
請求項1記載の半導体装置。 - 一方の主面側の内周に環状に配置される第1段差部と、前記第1段差部に固定される端子と、他方の主面側の内周に環状に配置される第2段差部と、前記第1段差部と前記第2段差部との間に設けられた内壁とを有する枠体を準備する工程と、
回路基板を準備する工程と、
前記枠体を、前記一方の主面を下向きに向けて、前記第2段差部に接着樹脂を塗布する工程と、
前記第2段差部に前記回路基板を嵌合することで前記接着樹脂を押し出し、前記接着樹脂を前記内壁及び前記端子に塗布する工程と、
を有する半導体装置の製造方法。 - 前記端子の前記第1段差部側の先端部に前記内壁から突出した突出部を設け、
押し出された前記接着樹脂を前記突出部の前記内壁側の面に塗布する、
請求項14記載の半導体装置の製造方法。 - 一方の主面側の内周に環状に配置される第1段差部と、前記第1段差部に固定される端子と、他方の主面側の内周に環状に配置される第2段差部と、前記第1段差部と前記第2段差部との間に設けられた内壁とを有する枠体を準備する工程と、
回路基板を準備する工程と、
前記枠体を、前記一方の主面を下向きに向けて、前記第2段差部に第1接着樹脂を塗布する工程と、
前記第2段差部に前記回路基板を嵌合する工程と、
前記枠体を、前記一方の主面を上向きに向けて、前記内壁及び前記端子に第2接着樹脂を塗布する工程と、
を有する半導体装置の製造方法。 - 一方の主面側の内周に環状に配置される第1段差部と、前記第1段差部に固定される端子と、他方の主面側の内周に環状に配置される第2段差部と、前記第1段差部と前記第2段差部との間に設けられた内壁と、前記第1段差部と前記第2段差部とを貫通する貫通孔とを有する枠体を準備する工程と、
回路基板を準備する工程と、
前記枠体を、前記一方の主面を下向きに向けて、前記第2段差部に接着樹脂を塗布し、該接着樹脂を前記貫通孔に充填する工程と、
前記第2段差部に前記回路基板を嵌合する工程と、
を有する半導体装置の製造方法。 - 前記接着樹脂が、エポキシ系樹脂、ポリイミド系樹脂、ポリアミド系樹脂もしくはシリコーン系樹脂のいずれかである、
請求項14または17記載の半導体装置の製造方法。 - 前記第1接着樹脂及び前記第2接着樹脂が、エポキシ系樹脂、ポリイミド系樹脂、ポリアミド系樹脂もしくはシリコーン系樹脂のいずれかである、
請求項16記載の半導体装置の製造方法。
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JPWO2018096656A1 (ja) * | 2016-11-25 | 2019-04-11 | 三菱電機株式会社 | 半導体装置 |
JP7172338B2 (ja) | 2018-09-19 | 2022-11-16 | 富士電機株式会社 | 半導体装置及び半導体装置の製造方法 |
JP2020047763A (ja) * | 2018-09-19 | 2020-03-26 | 富士電機株式会社 | 半導体装置及び半導体装置の製造方法 |
JP2020098821A (ja) * | 2018-12-17 | 2020-06-25 | 富士電機株式会社 | 半導体装置及び半導体装置の製造方法 |
JP7188049B2 (ja) | 2018-12-17 | 2022-12-13 | 富士電機株式会社 | 半導体装置 |
CN111341731A (zh) * | 2018-12-19 | 2020-06-26 | 富士电机株式会社 | 半导体装置 |
JP2020098885A (ja) * | 2018-12-19 | 2020-06-25 | 富士電機株式会社 | 半導体装置 |
JP7247574B2 (ja) | 2018-12-19 | 2023-03-29 | 富士電機株式会社 | 半導体装置 |
JPWO2022013936A1 (ja) * | 2020-07-14 | 2022-01-20 | ||
JP7199604B2 (ja) | 2020-07-14 | 2023-01-05 | 三菱電機株式会社 | 半導体装置の製造方法 |
US11610826B2 (en) | 2020-08-27 | 2023-03-21 | Fuji Electric Co., Ltd. | Semiconductor module |
JP7353255B2 (ja) | 2020-10-30 | 2023-09-29 | 三菱電機株式会社 | 半導体装置用の筐体の製造方法 |
Also Published As
Publication number | Publication date |
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CN105190876B (zh) | 2018-04-13 |
US9299642B2 (en) | 2016-03-29 |
US20150371931A1 (en) | 2015-12-24 |
JP6041053B2 (ja) | 2016-12-07 |
CN105190876A (zh) | 2015-12-23 |
JPWO2014199764A1 (ja) | 2017-02-23 |
DE112014000756B4 (de) | 2023-06-29 |
DE112014000756T5 (de) | 2016-03-10 |
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