WO2013094728A1 - 導電シート及びタッチパネル - Google Patents

導電シート及びタッチパネル Download PDF

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Publication number
WO2013094728A1
WO2013094728A1 PCT/JP2012/083221 JP2012083221W WO2013094728A1 WO 2013094728 A1 WO2013094728 A1 WO 2013094728A1 JP 2012083221 W JP2012083221 W JP 2012083221W WO 2013094728 A1 WO2013094728 A1 WO 2013094728A1
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WIPO (PCT)
Prior art keywords
conductive
pattern
electrode pattern
conductive pattern
sub
Prior art date
Application number
PCT/JP2012/083221
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English (en)
French (fr)
Japanese (ja)
Inventor
博重 中村
Original Assignee
富士フイルム株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 富士フイルム株式会社 filed Critical 富士フイルム株式会社
Priority to EP12859178.1A priority Critical patent/EP2796971B1/en
Priority to CN201280063278.2A priority patent/CN104011634B/zh
Priority to KR1020147017121A priority patent/KR101616217B1/ko
Priority to BR112014015320A priority patent/BR112014015320A2/pt
Publication of WO2013094728A1 publication Critical patent/WO2013094728A1/ja
Priority to US14/310,702 priority patent/US9271396B2/en

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    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0448—Details of the electrode shape, e.g. for enhancing the detection of touches, for generating specific electric field shapes, for enhancing display quality
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0416—Control or interface arrangements specially adapted for digitisers
    • G06F3/04164—Connections between sensors and controllers, e.g. routing lines between electrodes and connection pads
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0445—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using two or more layers of sensing electrodes, e.g. using two layers of electrodes separated by a dielectric layer
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0446—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0447—Position sensing using the local deformation of sensor cells
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/047—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means using sets of wires, e.g. crossed wires
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
    • H01B5/14—Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/0296—Conductive pattern lay-out details not covered by sub groups H05K1/02 - H05K1/0295
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04111—Cross over in capacitive digitiser, i.e. details of structures for connecting electrodes of the sensing pattern where the connections cross each other, e.g. bridge structures comprising an insulating layer, or vias through substrate
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04112—Electrode mesh in capacitive digitiser: electrode for touch sensing is formed of a mesh of very fine, normally metallic, interconnected lines that are almost invisible to see. This provides a quite large but transparent electrode surface, without need for ITO or similar transparent conductive material
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49117—Conductor or circuit manufacturing
    • Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/49155—Manufacturing circuit on or in base
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]

Definitions

  • the present invention relates to a conductive sheet and a touch panel.
  • a touch panel is arrange
  • a position detection method in the touch panel for example, a resistance film method, a capacitance method, and the like are known.
  • ITO indium tin oxide
  • ITO indium tin oxide
  • Patent Document 1 discloses a plurality of first detection electrodes configured by mesh-shaped conductive wires and arranged in parallel in one direction, and a plurality of first detection electrodes configured by mesh-shaped conductive wires and arranged in parallel in a direction orthogonal to the first detection electrodes.
  • a second touch electrode is disclosed.
  • a touch position of a finger is detected by capturing a change in capacitance generated by an electrode by touching the touch panel with a finger.
  • the touch panel disclosed in Patent Document 1 when the upper electrode is formed of a uniform conductive region and does not have a non-conductive region, even when a finger or the like is touched, the emitted electric lines of force are closed between the electrodes. In some cases, finger contact cannot be detected.
  • the present invention has been made in consideration of such problems, and an object of the present invention is to provide a conductive sheet and a touch panel having an electrode pattern composed of a thin metal wire with high detection accuracy.
  • a conductive sheet according to an aspect of the present invention is disposed on a base body having a first main surface and a second main surface, a first electrode pattern disposed on the first main surface, and a second main surface.
  • the first electrode pattern is composed of a plurality of grids made of a plurality of intersecting fine metal wires, and the first electrode pattern includes a plurality of first conductive patterns extending in the first direction;
  • a plurality of first conductive patterns and a plurality of first non-conductive patterns that are electrically separated are alternately provided
  • the second electrode pattern is composed of a plurality of grids made of a plurality of intersecting metal thin wires, and the second electrode
  • the pattern alternately includes a plurality of second conductive patterns extending in a second direction orthogonal to the first direction and a plurality of second non-conductive patterns electrically separated from the plurality of second conductive patterns.
  • the first conductive pattern includes at least a slit-like sub-nonconductive pattern extending in a first direction electrically separated from the first conductive pattern therein, and each first conductive pattern is formed by each sub non-conductive pattern.
  • a plurality of first conductive pattern rows to be divided are provided, and each second conductive pattern has a strip shape.
  • a conductive sheet includes a substrate having a first main surface and a second main surface, a first electrode pattern disposed on the first main surface, and a second main surface.
  • the first electrode pattern is composed of a plurality of grids made of a plurality of intersecting fine metal wires, and the first electrode pattern includes a plurality of first conductive patterns extending in the first direction;
  • a plurality of first conductive patterns and a plurality of first non-conductive patterns that are electrically separated are alternately provided, and the second electrode pattern is composed of a plurality of grids made of a plurality of intersecting metal thin wires, and the second electrode
  • the pattern alternately includes a plurality of second conductive patterns extending in a second direction orthogonal to the first direction and a plurality of second non-conductive patterns electrically separated from the plurality of second conductive patterns.
  • first conductive patterns and a plurality of The first electrode pattern and the second electrode pattern are disposed on the substrate so that the second conductive pattern is orthogonal to the first electrode pattern and the second electrode pattern so as to form a small lattice.
  • One conductive pattern has an X-shaped structure that periodically intersects by providing sub-non-conductive patterns that are spaced apart from each other along the first direction, and each second conductive pattern has a strip shape.
  • the first non-conductive pattern and the second non-conductive pattern have a first disconnection portion and a second disconnection portion in addition to the intersection portion of the thin metal wires, and the first disconnection portion and the second disconnection portion intersect the intersection portion and the intersection portion. Located near the center of.
  • the width of the first disconnection portion and the second disconnection portion exceeds the line width of the metal thin wire and is 50 ⁇ m or less.
  • the fine metal wire of the second conductive pattern is positioned at the first disconnection portion of the first non-conductive pattern, and the fine metal wire of the first conductive pattern is positioned at the second disconnection portion of the second non-conductive pattern.
  • the grid of the first electrode pattern and the grid of the second electrode pattern have one side with a length of 250 ⁇ m to 900 ⁇ m, and the small grid has one side with a length of 125 ⁇ m to 450 ⁇ m.
  • the fine metal wire constituting the first electrode pattern and the fine metal wire constituting the second electrode pattern have a line width of 30 ⁇ m or less.
  • the grid of the first electrode pattern and the grid of the second electrode pattern have a rhombus shape.
  • a conductive sheet includes a base body having a first main surface and a first electrode pattern disposed on the first main surface, wherein the first electrode pattern intersects a plurality of thin metal wires.
  • the first electrode pattern includes a plurality of first conductive patterns extending in the first direction, and each of the first conductive patterns is electrically separated from at least the first conductive pattern therein.
  • a slit-like sub-non-conductive pattern extending in one direction is provided, and each first conductive pattern has a plurality of first conductive pattern rows divided by each sub-non-conductive pattern.
  • a conductive sheet includes a base body having a first main surface and a first electrode pattern disposed on the first main surface, wherein the first electrode pattern intersects a plurality of thin metal wires.
  • the first electrode pattern periodically intersects with a plurality of first conductive patterns extending in the first direction and a plurality of sub-non-conductive patterns spaced apart from each other along the first direction. It has an X-shaped structure.
  • the width of the first conductive pattern row and the width of the sub non-conductive pattern are substantially equal.
  • the width of the first conductive pattern row is narrower than the width of the sub non-conductive pattern.
  • the width of the first conductive pattern row is wider than the width of the sub-nonconductive pattern.
  • connection part which electrically connects a plurality of 1st electric conduction pattern rows.
  • the number of first conductive pattern rows is 10 or less.
  • the sub-non-conductive pattern is surrounded by a plurality of sides, and the sides are configured by connecting the sides constituting the lattice and arranging the plurality of lattices in a straight line.
  • the sub-non-conductive pattern is surrounded by a plurality of sides, and the sides are configured by connecting a plurality of lattices in a straight line by connecting the sides constituting the lattice.
  • the sub-non-conductive pattern is surrounded by a plurality of sides, and some of the sides are configured by connecting the sides constituting the lattice and arranging the plurality of lattices in a straight line.
  • a plurality of lattices are arranged in a straight line by connecting apex angles constituting the lattice.
  • the plurality of sub-non-conducting patterns defined by the sides formed by the plurality of grids are arranged along the first direction by connecting the apex angles of the grids.
  • sub-non-conductive patterns adjacent along the first direction have different shapes.
  • the plurality of grids constituting the side for defining the sub-non-conductive pattern further have a protruding wiring constituted by a fine metal wire.
  • the first conductive pattern has an X-shaped structure that does not have a lattice at a periodic intersection by providing sub-nonconductive patterns spaced apart from each other.
  • the sub non-conductive patterns adjacent along the first direction of the first conductive patterns have the same shape, and the sub non-conductive patterns have different shapes between the adjacent first conductive patterns. .
  • a touch panel according to another aspect of the present invention preferably a capacitive touch panel, more preferably a projected capacitive touch panel has the conductive sheet of the present invention.
  • the schematic plan view of the electrically conductive sheet for touchscreens The schematic sectional drawing of a conductive sheet. Explanatory drawing explaining operation
  • the top view which shows the example of the 1st electrode pattern of 1st Embodiment.
  • the top view which shows the example of the 2nd electrode pattern of 1st Embodiment.
  • FIG. 1 is a schematic plan view of a conductive sheet 1 for a touch panel (preferably for a capacitive touch panel, more preferably for a projected capacitive touch panel).
  • the conductive sheet 1 includes a first electrode pattern 10 composed of a thin metal wire and a second electrode pattern 40 composed of a thin metal wire.
  • the first electrode pattern 10 includes a plurality of first conductive patterns 12 extending in the first direction (X direction) and arranged in parallel.
  • the second electrode pattern 40 includes second conductive patterns 42 extending in a second direction (Y direction) orthogonal to the first direction (X direction) and arranged in parallel.
  • Each first conductive pattern 12 is electrically connected to the first electrode terminal 14 at one end thereof. Further, each first electrode terminal 14 is electrically connected to the conductive first wiring 16. Each second conductive pattern 42 is electrically connected to the second electrode terminal 44 at one end thereof. Each second electrode terminal 44 is electrically connected to the conductive second wiring 46.
  • FIG. 2 is a schematic cross-sectional view of the conductive sheet 1 according to the present embodiment.
  • the conductive sheet 1 includes a base body 30 having a first main surface and a second main surface, a first electrode pattern 10 disposed on the first main surface of the base body 30, and a second main surface of the base body 30. And a second electrode pattern 40 disposed on the substrate.
  • the first electrode pattern 10 has a first conductive pattern 12, and each first conductive pattern 12 has a sub-nonconductive pattern 18 that is electrically separated from each first conductive pattern 12.
  • two adjacent first conductive patterns 12 are represented, and each first conductive pattern 12 has two sub-nonconductive patterns 18.
  • FIG. 3 is a diagram showing a state in which the finger 500 is in contact with the touch panel including the conductive sheet 1 of FIG.
  • the conductive sheet 1 includes a base body 30 having a first main surface and a second main surface, a first electrode pattern 10 disposed on the first main surface of the base body 30, and a second main surface of the base body 30. And a second electrode pattern 40 disposed on the substrate.
  • the finger 500 touches the first conductive pattern 12 having the sub non-conductive pattern 18, the electric lines of force emitted from the second conductive pattern 42 pass through the sub non-conductive pattern 18. That is, the electric lines of force are not closed between the first conductive pattern 12 and the second conductive pattern 42. As a result, it is possible to reliably recognize the change in capacitance caused by the contact of the finger 500.
  • FIG. 4 is a diagram showing a state in which a finger 500 is in contact with a touch panel including the conventional conductive sheet 101.
  • the conductive sheet 101 includes a substrate 300 having a first main surface and a second main surface, a first electrode pattern 100 disposed on the first main surface of the substrate 300, and a second main surface of the substrate 300. And a second electrode pattern 400 disposed on the substrate.
  • Each first conductive pattern 120 of the first electrode pattern 100 does not include a sub-non-conductive pattern that is electrically separated from each first conductive pattern 120. That is, each first conductive pattern 120 is composed of a uniform conductive region.
  • the lines of electric force emitted from the second conductive pattern 420 of the second electrode pattern 400 are closed between the first conductive pattern 120 and the second conductive pattern 420, and the contact of the finger 500 cannot be detected. There is.
  • FIG. 5 shows the conductive sheet 1 having the first electrode pattern 10 according to one embodiment.
  • FIG. 5 shows two types of first conductive patterns 12 in which the first electrode pattern 10 is composed of a large number of lattices 26 made of fine metal wires.
  • the plurality of gratings 26 have a substantially uniform shape.
  • substantially uniform shape means that the shape and size of the lattice 26 seem to be the same in addition to the case where they completely match.
  • the first conductive pattern 12 is electrically connected to the first electrode terminal 14 at one end.
  • Each first electrode terminal 14 is electrically connected to one end of each first wiring 16.
  • Each first wiring 16 is electrically connected to the terminal 20 at the other end.
  • Each first conductive pattern 12 is electrically separated by a first non-conductive pattern 28.
  • a dummy pattern composed of a metal wiring having a disconnection portion described later is formed as the first non-conductive pattern 28.
  • a dummy pattern composed of a thin metal wire is formed as the first non-conductive pattern 28. Instead, it exists as a space.
  • the first conductive patterns 12 extend in the first direction (X direction) and are arranged in parallel. Each first conductive pattern 12 includes a slit-like sub-nonconductive pattern 18 that is electrically separated from each first conductive pattern 12. Each first conductive pattern 12 includes a plurality of first conductive pattern rows 22 divided by each sub-nonconductive pattern 18.
  • a dummy pattern composed of a metal wiring having a disconnection portion described later is formed as the sub-non-conductive pattern 18.
  • a dummy pattern composed of thin metal wires is formed as the sub-non-conductive pattern 18. It exists as a space.
  • the first first conductive pattern 12 includes a slit-like sub-non-conductive pattern 18 with the other end opened. Since the other end is open, the first first conductive pattern 12 has a comb structure. In the present embodiment, the first first conductive pattern 12 has two sub-nonconductive patterns 18, thereby forming three first conductive pattern rows 22. Since each 1st conductive pattern row
  • the second first conductive pattern 12 is provided with an additional first electrode terminal 24 at the other end, as shown on the lower side of FIG.
  • the slit-shaped sub-non-conductive pattern 18 is closed in the first conductive pattern 12.
  • each first conductive pattern 12 can be easily inspected.
  • the second first conductive pattern 12 has two closed sub-nonconductive patterns 18, whereby three first conductive pattern rows 22 are formed.
  • Each first conductive pattern row 22 is connected to the first electrode terminal 14 and the additional first electrode terminal 24, respectively, and thus has the same potential.
  • This first conductive pattern row is one of the modifications of the comb structure.
  • the number of the first conductive pattern rows 22 may be two or more, and is determined in consideration of the relationship with the pattern design of the fine metal wires in the range of 10 or less, preferably 7 or less.
  • each first conductive pattern row 22 has a different shape.
  • the uppermost first conductive pattern row 22 among the three first conductive pattern rows 22 has a first direction (X It is comprised by extending along (direction).
  • the first conductive pattern row 22 on the upper side is not a complete lattice 26 and has a structure without a lower apex angle.
  • the first conductive pattern row 22 in the center is constituted by two rows by bringing one side of the adjacent lattice 26 into contact with each other and extending along the first direction (X direction).
  • the first conductive pattern row 22 on the lowermost side makes apex angles of adjacent lattices 26 contact each other, extends along the first direction (X direction), and further extends one side of each lattice 26. Consists of.
  • the uppermost first conductive pattern row 22 and the lowermost first conductive pattern row 22 have substantially the same lattice shape, and one side of the adjacent lattice 26 is adjacent to each other. Are made to contact each other and extend along the first direction (X direction) to form two rows.
  • the first conductive pattern row 22 at the center of the second first conductive pattern 12 extends along the first direction (X direction) with the apex angles of adjacent lattices 26 in contact with each other, and further, Constructed by extending one side.
  • the area A1 of the first conductive pattern 12 and the area B1 of the sub-nonconductive pattern 18 are set, it is preferable that 40% ⁇ B1 / (A1 + B1) ⁇ 60%.
  • 40% ⁇ B1 / (A1 + B1) ⁇ 60% it is preferable that 40% ⁇ B1 / (A1 + B1) ⁇ 60%.
  • Each area can be obtained as follows. Each area is calculated
  • FIG. 1 is calculated
  • the following formula (W1-1) The condition is preferably satisfied, the condition of the following formula (W1-2) is more preferably satisfied, and the condition of the following formula (W1-3) is more preferably satisfied. Further, the condition of the following formula (W2-1) is preferably satisfied, the condition of the following formula (W2-2) is more preferable, and the condition of the following formula (W2-3) is more preferable.
  • the sum of the widths a 1, a 2, and a 3 of the first conductive pattern row 22 is Wa
  • the sum of the widths b 1 and b 2 of the sub-non-conductive pattern 18 and the width b 3 of the first non-conductive pattern 28. Becomes Wb.
  • the first first conductive pattern 12 that does not include the additional first electrode terminal 24 and the second first conductive pattern 12 that includes the additional first electrode terminal 24 are formed on the same surface.
  • One piece of the conductive sheet 1 is shown. However, it is not necessary to mix the first first conductive pattern 12 and the second first conductive pattern 12, and only one of the first first conductive pattern 12 or the second first conductive pattern 12 is used. As long as the is formed.
  • the total width Wa of the first conductive pattern columns 22, the total width of the sub-nonconductive patterns 18, and the total width of the first nonconductive patterns 28 be Wb.
  • the relationship of 1.0 mm ⁇ Wa ⁇ 5.0 mm and 1.5 mm ⁇ Wb ⁇ 5.0 mm is satisfied.
  • the position can be detected more accurately by using this range.
  • the value of Wa is preferably 1.5 mm ⁇ Wa ⁇ 4.0 mm, and more preferably 2.0 mm ⁇ Wa ⁇ 2.5 mm.
  • the value of Wb is preferably 1.5 mm ⁇ Wb ⁇ 4.0 mm, more preferably 2.0 mm ⁇ Wb ⁇ 3.0 mm.
  • the fine metal wire constituting the first electrode pattern 10 is made of an opaque conductive material such as a metal material such as gold, silver or copper or a conductive material such as a metal oxide.
  • the line width of the fine metal wire it is 30 ⁇ m or less, preferably 15 ⁇ m or less, more preferably 10 ⁇ m or less, more preferably 9 ⁇ m or less, more preferably 7 ⁇ m or less, and preferably 0.5 ⁇ m or more, preferably 1 ⁇ m or more.
  • the first electrode pattern 10 includes a plurality of grids 26 formed by intersecting metal fine wires.
  • the lattice 26 includes an opening region surrounded by fine metal wires.
  • the grating 26 has one side with a length of 900 ⁇ m or less and 250 ⁇ m or more. The length of one side is desirably 700 ⁇ m or less and 300 ⁇ m or more.
  • the aperture ratio is preferably 85% or more, more preferably 90% or more, and most preferably 95% or more from the viewpoint of visible light transmittance. .
  • the aperture ratio corresponds to the ratio of the entire portion of the first electrode pattern 10 excluding the fine metal wires in the predetermined area.
  • the lattice 26 has a substantially rhombus shape.
  • a substantially rhombus means a shape that appears to be a rhombus at first glance.
  • other polygonal shapes may be used.
  • the shape of one side may be a curved shape or a circular arc shape in addition to a linear shape.
  • two opposing sides may be outwardly convex arc shapes, and the other two opposing sides may be inwardly convex arc shapes.
  • the shape of each side may be a wavy shape in which an outwardly convex arc and an inwardly convex arc are continuous.
  • the shape of each side may be a sine curve.
  • FIG. 6 shows the second electrode pattern.
  • the second electrode pattern 40 is composed of a large number of grids made of fine metal wires.
  • the second electrode pattern 40 includes a plurality of second conductive patterns 42 extending in a second direction (Y direction) orthogonal to the first direction (X direction) and arranged in parallel.
  • Each second conductive pattern 42 is electrically connected to the second electrode terminal 44.
  • Each second conductive pattern 42 is electrically separated by a second non-conductive pattern 58.
  • Each second electrode terminal 44 is electrically connected to the conductive second wiring 46.
  • Each second conductive pattern 42 is electrically connected to the second electrode terminal 44 at one end.
  • Each second electrode terminal 44 is electrically connected to one end of each second wiring 46.
  • Each second wiring 46 is electrically connected to the terminal 50 at the other end.
  • Each second conductive pattern 42 has a strip structure having a substantially constant width along the second direction. However, each second conductive pattern 42 is not limited to a strip shape.
  • the second electrode pattern 40 may be provided with an additional second electrode terminal 54 at the other end. By providing the additional second electrode terminal 54, each of the second conductive patterns 42 can be easily inspected.
  • FIG. 6 one conductive sheet in which the second conductive pattern 42 not including the additional second electrode terminal 54 and the second conductive pattern 42 including the additional second electrode terminal 54 are formed on the same surface. 1 is shown. However, it is not necessary to mix the second conductive patterns 42 described above, and only one second conductive pattern 42 needs to be formed.
  • the fine metal wires constituting the second electrode pattern 40 are formed of substantially the same line width and substantially the same material as the first electrode pattern 10.
  • the second electrode pattern 40 includes a plurality of lattices 56 formed of intersecting fine metal wires, and the lattice 56 has substantially the same shape as the lattice 26.
  • the length of one side of the grating 56 and the aperture ratio of the grating 56 are the same as those of the grating 26.
  • a dummy pattern composed of a metal wiring having a disconnection portion to be described later is formed as the second non-conductive pattern 58.
  • a dummy pattern composed of fine metal wires is formed as the second non-conductive pattern 58. Instead, it exists as a space.
  • FIG. 7 shows the first electrode pattern 10 including the first conductive pattern 12 having a comb structure and the second electrode pattern 40 including the second conductive pattern 42 having a strip structure, and the first conductive pattern 12 and the second conductive pattern 42. It is a top view of the electroconductive sheet 1 arrange
  • a combination pattern 70 is formed by the first electrode pattern 10 and the second electrode pattern 40.
  • substantially orthogonal includes the case where the first conductive pattern 12 and the second conductive pattern 42 intersect at a right angle and at first glance are orthogonal.
  • a small lattice 76 is formed by the lattice 26 and the lattice 56 in a top view. That is, the intersecting portion of the grating 26 is arranged at substantially the center of the opening area of the grating 56.
  • the small lattice 76 has one side with a length of 125 ⁇ m or more and 450 ⁇ m or less, and preferably has one side with a length of 150 ⁇ m or more and 350 ⁇ m or less. This corresponds to half the length of one side of the grating 26 and the grating 56.
  • FIG. 8 is a plan view showing an example of another first electrode pattern 10 of the first embodiment in which a dummy pattern is clearly shown.
  • the 1st nonelectroconductive pattern 28 is comprised with the metal fine wire similarly to the 1st electroconductive pattern 12, and has a disconnection part.
  • the sub non-conductive pattern 18 formed in the 1st conductive pattern 12 is comprised with a metal fine wire similarly to the 1st conductive pattern 12, and has a disconnection part. Since the fine metal wires formed in the first non-conductive pattern 28 and the sub non-conductive pattern 18 have a disconnection portion, they constitute a dummy pattern that is not electrically conductive.
  • the first non-conductive pattern 28 is a dummy pattern
  • the adjacent first conductive patterns 12 are electrically separated as in FIG.
  • the sub non-conductive pattern 18 is formed of a dummy pattern
  • the first conductive pattern row 22 is formed as in FIG.
  • the first electrode pattern 10 is configured by a grid of fine metal wires arranged at equal intervals. Thereby, it can prevent that visibility falls and it becomes easy to visually recognize the 1st electrode pattern 10.
  • FIG. 9 is an enlarged view of a portion surrounded by a circle in FIG.
  • the fine metal wires formed as the first non-conductive pattern 28 and the sub non-conductive pattern 18 have a broken portion 29 (first broken portion) and are electrically separated from the first conductive pattern 12. Is done.
  • the disconnection part 29 is formed other than the crossing part of a metal fine wire. It is preferable that the disconnection part 29 is formed in the approximate center of an intersection part. The approximate center includes not only completely located at the center but also those slightly deviated from the center.
  • the line width of the first conductive pattern 12 is widened, and the first non-conductive pattern 28 and the sub non-conductive pattern 18 are defined.
  • the line width with the conductive pattern 18 is narrowed and exaggerated.
  • the length of the disconnection portion 29 is preferably 60 ⁇ m or less, more preferably 10 to 50 ⁇ m, 15 to 40 ⁇ m, and 20 to 40 ⁇ m.
  • FIG. 10 is a plan view showing an example of another second electrode pattern 40 of the first embodiment.
  • the second non-conductive pattern 58 is composed of a fine metal wire and has a disconnected portion. Since the fine metal wire formed in the second non-conductive pattern 58 has a disconnected portion, it forms a dummy pattern that is not electrically conductive. Since the second non-conductive pattern 58 is a dummy pattern, the adjacent second conductive patterns 42 are electrically separated as in FIG.
  • the second electrode pattern 40 is configured by a grid of fine metal wires arranged at equal intervals. Thereby, it can prevent that visibility falls and it becomes easy to visually recognize the 2nd electrode pattern 40.
  • FIG. 11 is an enlarged view of a portion surrounded by a circle in FIG.
  • the fine metal wire formed as the second non-conductive pattern 58 has a broken portion 59 (second broken portion) and is electrically separated from the second conductive pattern 42.
  • the disconnection part 59 is formed other than the crossing part of the fine metal wires.
  • the disconnection part 59 is formed in the approximate center of an intersection part. The approximate center includes not only completely located at the center but also those slightly deviated from the center.
  • the line width of the second conductive pattern 42 is widened and the line width of the second non-conductive pattern 58 is narrowed and exaggerated. It is shown.
  • the length of the disconnection part 59 it is the same length as the disconnection part 29 of FIG.
  • FIG. 12 clearly shows the first electrode pattern 10 having a dummy pattern made of fine metal wires and the second electrode pattern 40 having a dummy pattern made of fine metal wires.
  • the first electrode pattern 10 and the second electrode pattern 40 are disposed to face each other.
  • the first conductive pattern 12 and the second conductive pattern 42 are orthogonal to each other, and a combination pattern 70 is formed by the first electrode pattern 10 and the second electrode pattern 40.
  • a small lattice 76 is formed by the lattice 26 and the lattice 56 in a top view. That is, the intersecting portion of the grating 26 is arranged at substantially the center of the opening area of the grating 56.
  • the fine metal wire of the second electrode pattern 40 is disposed at a position facing the disconnection portion 29 of the first electrode pattern 10. Further, the fine metal wires of the first electrode pattern 10 are arranged at positions facing the disconnection portions 59 of the second electrode pattern 40.
  • the fine metal wire of the second electrode pattern 40 masks the broken portion 29 of the first electrode pattern 10, and the fine metal wire of the first electrode pattern 10 masks the broken portion 59 of the second electrode pattern 40. Therefore, in the combination pattern 70, the disconnection portion 29 of the first electrode pattern 10 and the disconnection portion 59 of the second electrode pattern 40 are difficult to be visually recognized in a top view, and thus visibility can be improved.
  • FIG. 13 shows a first electrode pattern 10 according to another embodiment.
  • the 1st electrode pattern 10 is provided with the 1st conductive pattern 12 comprised by many lattices 26 by a metal fine wire.
  • the first conductive pattern 12 extends in the first direction (X direction).
  • the first conductive pattern 12 includes a slit-shaped sub-non-conductive pattern 18 for electrically separating the first conductive pattern 12.
  • the first conductive pattern 12 includes a plurality of first conductive pattern rows 22 divided by the sub non-conductive pattern 18. As shown in FIG. 13, each first conductive pattern row 22 includes a plurality of lattices 26 arranged in a row in the first direction (X direction). Each first conductive pattern row 22 is electrically connected by a large number of grids 26 made of fine metal wires arranged at the ends.
  • each first conductive pattern row 22 includes the first lattice, the third lattice, and the fifth among the five lattices 26 arranged in the second direction (Y direction) at the end. Extends in the first direction (X direction) from the grid. As a result, the widths a1, a2, and a3 of the first conductive pattern 12 and the widths b1 and b2 of the sub-nonconductive pattern 18 have substantially the same length (the length of the diagonal line of the grating 26). “Substantially the same length” includes what appears to be the same length at first glance, in addition to the case where they are completely matched.
  • FIG. 14 shows a first electrode pattern 10 according to another embodiment.
  • the same components as those described above are denoted by the same reference numerals, and description thereof may be omitted.
  • the 1st electrode pattern 10 is provided with the 1st conductive pattern 12 comprised by many lattices 26 by a metal fine wire.
  • the first conductive pattern 12 extends in the first direction (X direction).
  • the first conductive pattern 12 includes a slit-shaped sub-non-conductive pattern 18 for electrically separating the first conductive pattern 12.
  • each first conductive pattern row 22 includes a plurality of lattices 26 arranged in a row in the first direction (X direction).
  • FIG. 14 is different from FIG. 13 in that each first conductive pattern row 22 includes the first lattice, the third lattice, and the fourth among the six lattices 26 arranged in the second direction (Y direction). Extending in the first direction (X direction) from the second lattice and the sixth lattice. That is, as compared with FIG. 13, the plurality of first conductive pattern rows 22 of FIG. 14 are arranged at a pitch that is half as long as the lattice 26. As a result, the widths b1 and b2 of the sub non-conductive pattern 18 are longer than the widths a1, a2 and a3 of the first conductive pattern 12.
  • the widths b1 and b2 of the sub-nonconductive pattern 18 are 1.5 times as long as the diagonal of the grid 26, and the widths a1, a2 and a3 of the first conductive pattern 12 are the lengths of the diagonal of the grid 26.
  • the first non-conductive pattern 18 is wide in the first electrode pattern 10.
  • FIG. 15 shows a first electrode pattern 10 according to another embodiment.
  • the same components as those of the first electrode pattern 10 described above may be denoted by the same reference numerals and description thereof may be omitted.
  • the 1st electrode pattern 10 is provided with the 1st conductive pattern 12 comprised by many lattices 26 by a metal fine wire.
  • the first conductive pattern 12 extends in the first direction (X direction).
  • the first conductive pattern 12 includes a slit-shaped sub-non-conductive pattern 18 for electrically separating the first conductive pattern 12.
  • each first conductive pattern row 22 includes a plurality of lattices 26 arranged in two rows in the first direction (X direction).
  • each first conductive pattern row 22 includes a first lattice, a third lattice, a fourth lattice, and a fifth lattice among the six lattices 26 arranged in the second direction (Y direction).
  • Two rows extend from the lattice and the sixth lattice in the first direction (X direction).
  • the widths b1 and b2 of the sub non-conductive pattern 18 are shorter than the widths a1, a2 and a3 of the first conductive pattern 12.
  • the widths b1 and b2 of the sub-non-conductive pattern 18 are the lengths of the diagonal lines of the grating 26, and the widths a1, a2 and a3 of the first conductive pattern 12 are 1.5 times the length of the diagonal lines of the grating 26.
  • the first conductive pattern 12 is the first electrode pattern 10 having a wide width.
  • FIG. 16 shows a first electrode pattern 10 according to another embodiment.
  • the same components as those of the first electrode pattern 10 described above may be denoted by the same reference numerals and description thereof may be omitted.
  • the first electrode pattern 10 shown in FIG. 16 has basically the same structure as the first electrode pattern 10 shown in FIG. It differs from FIG. 13 in the following points.
  • a connecting portion 27 that electrically connects each first conductive pattern row 22 is provided at a place other than the end portion of the first conductive pattern row 22. Since the connecting portion 27 is provided, each first conductive pattern row 22 can be maintained at the same potential even if the first conductive pattern row 22 becomes longer and the wiring resistance increases.
  • FIG. 17 shows a first electrode pattern 10 according to another embodiment.
  • the same components as those of the first electrode pattern 10 described above may be denoted by the same reference numerals and description thereof may be omitted.
  • the first electrode pattern 10 shown in FIG. 17 has basically the same structure as the first electrode pattern 10 shown in FIG. FIG. 17 is different from FIG. 13 in that the first conductive pattern rows 22 are not three rows but two rows. If the number of first conductive pattern rows 22 of the first electrode pattern 10 is two or more, finger detection accuracy can be increased.
  • FIG. 18 shows a first electrode pattern 10 according to another embodiment.
  • the same components as those of the first electrode pattern 10 described above may be denoted by the same reference numerals and description thereof may be omitted.
  • the first electrode pattern 10 shown in FIG. 18 has basically the same structure as the first electrode pattern 10 shown in FIG. FIG. 18 is different from FIG. 13 in that the first conductive pattern rows 22 are not four rows but four rows. Even if the first conductive pattern rows 22 of the first electrode pattern 10 are two rows or more, for example, five rows or more, the finger detection accuracy can be increased.
  • each area can be obtained as follows. Each area is calculated
  • FIG. 13 Each area is calculated
  • FIG. 19 shows the conductive sheet 1 having the first electrode pattern 10 according to the second embodiment.
  • the first electrode pattern 10 includes two types of first conductive patterns 12 constituted by a large number of grids made of fine metal wires. Each first conductive pattern 12 is electrically connected to the first electrode terminal 14 at one end. Each first electrode terminal 14 is electrically connected to one end of each first wiring 16. Each first wiring 16 is electrically connected to the terminal 20 at the other end. Each first conductive pattern 12 is electrically separated by a first non-conductive pattern 28.
  • the first first conductive pattern 12 does not have the additional first electrode terminal 24 as shown in the upper side of FIG.
  • the second first conductive pattern 12 has an additional first electrode terminal 24 as shown on the lower side of FIG.
  • the first first conductive pattern 12 that does not include the additional first electrode terminal 24 and the second first conductive pattern 12 that includes the additional first electrode terminal 24 are formed on the same surface.
  • One piece of the conductive sheet 1 is shown. However, it is not necessary to mix the first first conductive pattern 12 and the second first conductive pattern 12, and only one of the first first conductive pattern 12 or the second first conductive pattern 12 is used. As long as the is formed.
  • the first conductive pattern 12 has an X-shaped structure that periodically intersects by including the sub-non-conductive pattern 18 along the first direction.
  • the period can be selected as appropriate.
  • the relationship of 20% ⁇ B2 / (A2 + B2) ⁇ 80% is satisfied.
  • the relationship 5% ⁇ B2 / (A2 + B2) ⁇ 70% is satisfied.
  • the relationship of 45% ⁇ B2 / (A2 + B2) ⁇ 65% is satisfied.
  • the area can be obtained as follows.
  • the area of the first conductive pattern 12 is calculated by the unit area of the lattice 26 ⁇ the number of the lattices 26.
  • the area of the sub-non-conductive pattern 18 is calculated as follows: a virtual grid 26 is arranged and the unit area of the virtual grid 26 ⁇ the number of grids 26.
  • the difference in capacitance between when the finger is in contact and when the finger is not in contact can be increased. That is, the detection accuracy can be increased.
  • the line width of the fine metal wires constituting the first electrode pattern 10 and the constituting material are substantially the same as those in the first embodiment. Further, the metal thin wire grid 26 constituting the first electrode pattern 10 is substantially the same as that of the first embodiment.
  • the second electrode pattern 40 the one including the second conductive pattern 42 having a strip structure can be used as in FIG. 6 of the first embodiment.
  • FIG. 20 is a plan view of the conductive sheet 1 in which the first electrode pattern 10 including the X-shaped first conductive pattern 12 and the second electrode pattern 40 including the strip-shaped second conductive pattern 42 are arranged to face each other. .
  • the first conductive pattern 12 and the second conductive pattern 42 are orthogonal to each other, and a combination pattern 70 is formed by the first electrode pattern 10 and the second electrode pattern 40.
  • a small lattice 76 is formed by the lattice 26 and the lattice 56.
  • FIG. 21 is a plan view showing an example of another first electrode pattern 10 of the second embodiment.
  • the first non-conductive pattern 28 is composed of a thin metal wire, like the first conductive pattern 12.
  • the sub-non-conductive pattern 18 formed on the first conductive pattern 12 is formed of a thin metal wire, like the first conductive pattern 12.
  • a so-called dummy pattern that is electrically separated from the first conductive pattern 12 is formed.
  • the first electrode pattern 10 is constituted by a grid of fine metal wires arranged at equal intervals. Thereby, the fall of visibility can be prevented.
  • the fine metal wires formed as the first non-conductive pattern 28 and the sub non-conductive pattern 18 have a broken portion and are electrically separated from the first conductive pattern 12. It is preferable that the disconnection portion is formed at a portion other than the crossing portion of the fine metal wires.
  • the second electrode pattern 40 the one including the second conductive pattern 42 having a strip structure can be used as in FIG. 10 of the first embodiment.
  • FIG. 22 is a plan view of the conductive sheet 1 in which the first electrode pattern 10 having a dummy pattern and the second electrode pattern 40 having a dummy pattern are arranged to face each other.
  • the first conductive pattern 12 and the second conductive pattern 42 are orthogonal to each other, and a combination pattern 70 is formed by the first electrode pattern 10 and the second electrode pattern 40.
  • a small lattice 76 is formed by the lattice 26 and the lattice 56 in a top view. That is, the intersecting portion of the grating 26 is arranged at substantially the center of the opening area of the grating 56.
  • the fine metal wire of the second electrode pattern 40 is disposed at a position facing the disconnection portion 29 of the first electrode pattern 10. Further, the fine metal wires of the first electrode pattern 10 are arranged at positions facing the disconnection portions 59 of the second electrode pattern 40. The fine metal wire of the second electrode pattern 40 masks the broken portion 29 of the first electrode pattern 10, and the fine metal wire of the first electrode pattern 10 masks the broken portion 59 of the second electrode pattern 40.
  • FIG. 23 shows a first electrode pattern 10 according to another embodiment.
  • the same components as those of the first electrode pattern 10 described above may be denoted by the same reference numerals and description thereof may be omitted.
  • the 1st electrode pattern 10 is provided with the 1st conductive pattern 12 comprised by many lattices 26 by a metal fine wire.
  • the first conductive pattern 12 has a plurality of sub-non-conductive patterns 18 along the first direction, thereby having an X-shaped structure that periodically intersects.
  • the sub-non-conductive pattern 18 is determined by being surrounded by four sides. One side is composed of a plurality of lattices 26 that are arranged in a straight line by connecting the sides.
  • a diamond pattern is formed by surrounding the sub-nonconductive pattern 18 with a plurality of lattices 26 arranged in a straight line. Adjacent diamond patterns are electrically connected. In FIG. 23, adjacent diamond patterns are electrically connected through the sides of the lattice 26.
  • FIG. 24 shows the first electrode pattern 10 according to another embodiment.
  • the same components as those of the first electrode pattern 10 described above may be denoted by the same reference numerals and description thereof may be omitted.
  • the 1st electrode pattern 10 is provided with the 1st conductive pattern 12 comprised by many lattices 26 by a metal fine wire.
  • the first conductive pattern 12 has a plurality of sub-non-conductive patterns 18 along the first direction, thereby having an X-shaped structure that periodically intersects.
  • the sub-nonconductive pattern 18 is determined by being surrounded by four sides.
  • One side is formed by connecting a plurality of lattices 26 arranged in a straight line by connecting the sides to each other.
  • one side is composed of two stages, but is not limited to two stages.
  • FIG. 25 shows a first electrode pattern 10 according to another embodiment.
  • the same components as those of the first electrode pattern 10 described above may be denoted by the same reference numerals and description thereof may be omitted.
  • the 1st electrode pattern 10 is provided with the 1st conductive pattern 12 comprised by many lattices 26 by a metal fine wire.
  • the first conductive pattern 12 has a plurality of sub-non-conductive patterns 18 along the first direction, thereby having an X-shaped structure that periodically intersects.
  • the sub non-conductive pattern 18 is determined by being surrounded by six sides. Of the six sides, four sides are configured by a plurality of lattices 26 that are connected in a straight line. Of the six sides, two sides are constituted by a plurality of lattices 26 arranged in a straight line with apex angles connected to each other.
  • FIG. 26 shows the first electrode pattern 10 according to another embodiment.
  • the same components as those of the first electrode pattern 10 described above may be denoted by the same reference numerals and description thereof may be omitted.
  • the 1st electrode pattern 10 is provided with the 1st conductive pattern 12 comprised by many lattices 26 by a metal fine wire.
  • the first conductive pattern 12 has a plurality of sub-non-conductive patterns 18 along the first direction, thereby having an X-shaped structure that periodically intersects.
  • the first conductive pattern 12 shown in FIG. 26 is the same as the first conductive pattern 12 shown in FIG. However, unlike FIG. 23, in FIG. 26, adjacent diamond patterns are electrically connected to each other at the apex angle of the lattice 26, that is, at one point. However, the shape of the sub non-conductive pattern 18 is not limited to the diamond pattern.
  • FIG. 27 shows a first electrode pattern 10 according to another embodiment.
  • the same components as those of the first electrode pattern 10 described above may be denoted by the same reference numerals and description thereof may be omitted.
  • the 1st electrode pattern 10 is provided with the 1st conductive pattern 12 comprised by many lattices 26 by a metal fine wire.
  • the first conductive pattern 12 has a plurality of sub-non-conductive patterns 18 along the first direction, thereby having an X-shaped structure that periodically intersects.
  • the diamond patterns have alternately different shapes, and the sizes of the adjacent sub-nonconductive patterns 18 are different. That is, the same shape appears every two cycles. However, it is not limited to every two cycles, and the same shape may appear every three cycles or every four cycles.
  • FIG. 28 shows a first electrode pattern 10 according to another embodiment.
  • the same components as those of the first electrode pattern 10 described above may be denoted by the same reference numerals and description thereof may be omitted.
  • the 1st electrode pattern 10 is provided with the 1st conductive pattern 12 comprised by many lattices 26 by a metal fine wire.
  • the first conductive pattern 12 has a plurality of sub-non-conductive patterns 18 along the first direction, thereby having an X-shaped structure that periodically intersects.
  • the first conductive pattern 12 shown in FIG. 28 has basically the same shape as the first conductive pattern 12 shown in FIG. However, a protruding wiring 31 made of a fine metal wire is provided on the lattice 26 located at the apex angle of the diamond pattern.
  • FIG. 29 shows a first electrode pattern 10 according to another embodiment.
  • the same components as those of the first electrode pattern 10 described above may be denoted by the same reference numerals and description thereof may be omitted.
  • the 1st electrode pattern 10 is provided with the 1st conductive pattern 12 comprised by many lattices 26 by a metal fine wire.
  • the first conductive pattern 12 has a plurality of sub-non-conductive patterns 18 along the first direction, thereby having an X-shaped structure that periodically intersects.
  • the first conductive pattern 12 shown in FIG. 29 has basically the same shape as the first conductive pattern 12 shown in FIG. However, a protruding wiring 31 made of a fine metal wire is provided on the lattice 26 constituting one side of the diamond pattern.
  • the sensor area for detecting a finger can be expanded.
  • FIG. 30 shows the first electrode pattern 10 according to another embodiment.
  • the same components as those of the first electrode pattern 10 described above may be denoted by the same reference numerals and description thereof may be omitted.
  • the 1st electrode pattern 10 is provided with the 1st conductive pattern 12 comprised by many lattices 26 by a metal fine wire.
  • the first conductive pattern 12 includes a plurality of sub-non-conductive patterns 18 along the first direction, thereby forming an X-shaped structure having no lattice 26 at the intersection.
  • a plurality of gratings 26 are arranged in a zigzag manner.
  • the two lattice groups arranged in a zigzag are arranged so as not to contact each other, an X-shaped structure having no intersection is formed. Since the X-shaped structure is composed of two lattice groups arranged in a zigzag manner, the electrode pattern can be made thin, and a fine position can be detected.
  • FIG. 31 shows a first electrode pattern 10 according to another embodiment.
  • the same components as those of the first electrode pattern 10 described above may be denoted by the same reference numerals and description thereof may be omitted.
  • the 1st electrode pattern 10 is provided with the 1st conductive pattern 12 comprised by many lattices 26 by a metal fine wire.
  • the first conductive pattern 12 includes a plurality of sub-non-conductive patterns 18 along the first direction, thereby forming an X-shaped structure having no lattice 26 at the intersection.
  • a plurality of gratings 26 are arranged at adjacent corners of two grating groups arranged in a zigzag pattern.
  • FIG. 32 shows the first electrode pattern 10 according to another embodiment.
  • the same components as those of the first electrode pattern 10 described above may be denoted by the same reference numerals and description thereof may be omitted.
  • the first electrode pattern 10 shown in FIG. 32 includes two first conductive patterns 12 constituted by a large number of lattices 26 made of fine metal wires.
  • the first conductive pattern 12 has the X-shaped structure that periodically intersects by including the sub-non-conductive pattern 18 along the first direction.
  • the upper first conductive pattern 12 includes a sub-non-conductive pattern 18 having the same shape along the first direction.
  • the lower first conductive pattern 12 includes a sub-nonconductive pattern 18 having the same shape along the first direction.
  • the upper first conductive pattern 12 and the lower first conductive pattern 12 are provided with sub-non-conductive patterns 18 having different shapes.
  • the first conductive patterns 12 having different shapes are alternately arranged.
  • the area of the first conductive pattern 12 is calculated by the unit area of the lattice 26 ⁇ the number of the lattices 26.
  • the area of the sub-non-conductive pattern 18 is calculated as follows: a virtual grid 26 is arranged and the unit area of the virtual grid 26 ⁇ the number of grids 26.
  • the conductive sheet 1 In the case of producing the conductive sheet 1, for example, an exposed portion is exposed by exposing a photosensitive material having an emulsion layer containing a photosensitive silver halide salt on the first main surface of the transparent substrate 30 and developing the photosensitive material.
  • the first electrode pattern 10 may be formed by forming a metal silver part (metal fine wire) and a light-transmitting part (opening region) in the unexposed part.
  • the first electrode pattern 10 may be formed.
  • the first electrode pattern 10 may be formed by printing a paste containing metal fine particles on the first main surface of the transparent substrate 30 and performing metal plating on the paste.
  • the first electrode pattern 10 may be printed on the first main surface of the transparent substrate 30 by screen printing or gravure printing. Alternatively, the first electrode pattern 10 may be formed on the first main surface of the transparent substrate 30 by inkjet.
  • the second electrode pattern 40 can be formed on the second main surface of the substrate 30 by the same manufacturing method of the first electrode pattern 10.
  • a metal portion and a light transmissive portion are formed in the exposed portion and the unexposed portion, respectively.
  • a conductive metal may be supported on the metal part by further performing physical development and / or plating treatment on the metal part. More specific contents are disclosed in JP2003-213437, JP2006-64923, JP2006-58797, JP2006-135271, and the like.
  • the first electrode pattern 10 is formed on the first main surface of the substrate 30 and the second electrode pattern 40 is formed on the second main surface of the substrate 30, according to a normal manufacturing method.
  • the method of exposing the first main surface first and then exposing the second main surface is employed, the first electrode pattern 10 and the second electrode pattern 40 having a desired pattern cannot be obtained. There is.
  • the following production method can be preferably employed.
  • the photosensitive silver halide emulsion layers formed on both surfaces of the substrate 30 are collectively exposed to form the first electrode pattern 10 on one main surface of the substrate 30, and the first electrode pattern 10 on the other main surface of the substrate 30.
  • a two-electrode pattern 40 is formed.
  • the photosensitive material includes a base 30, a photosensitive silver halide emulsion layer (hereinafter referred to as a first photosensitive layer) formed on the first main surface of the base 30, and a photosensitive formed on the other main surface of the base 30.
  • a silver halide emulsion layer (hereinafter referred to as a second photosensitive layer).
  • the photosensitive material is exposed.
  • the first photosensitive layer is irradiated with light toward the substrate 30 to expose the first photosensitive layer along the first exposure pattern
  • the second photosensitive layer is exposed to the substrate.
  • a second exposure process is performed in which light is irradiated toward 30 to expose the second photosensitive layer along the second exposure pattern (double-sided simultaneous exposure).
  • the first photosensitive layer is irradiated with the first light (parallel light) through the first photomask
  • the second photosensitive layer is irradiated with the second light (parallel light).
  • the first light is obtained by converting the light emitted from the first light source into parallel light by the first collimator lens in the middle
  • the second light is obtained by converting the light emitted from the second light source in the middle of the first light. It is obtained by being converted into parallel light by a two-collimator lens.
  • the case where two light sources (the first light source and the second light source) are used is shown, but the light emitted from one light source is divided through the optical system, and the first light and the second light are divided.
  • the first photosensitive layer and the second photosensitive layer may be irradiated as light.
  • the exposed photosensitive material is developed to produce a conductive sheet 1 for a touch panel.
  • the conductive sheet 1 for a touch panel includes a base 30, a first electrode pattern 10 along a first exposure pattern formed on the first main surface of the base 30, and a first surface formed on the other main surface of the base 30. And a second electrode pattern 40 along the two exposure patterns.
  • the preferable numerical range should be determined unconditionally. However, the exposure time and the development time are adjusted so that the development rate becomes 100%.
  • the first exposure process includes, for example, arranging a first photomask on the first photosensitive layer in close contact with the first light source arranged opposite to the first photomask.
  • the first photosensitive layer is exposed by irradiating the first light toward one photomask.
  • the first photomask is composed of a glass substrate formed of transparent soda glass and a mask pattern (first exposure pattern) formed on the glass substrate. Accordingly, the first exposure process exposes a portion of the first photosensitive layer along the first exposure pattern formed on the first photomask. A gap of about 2 to 10 ⁇ m may be provided between the first photosensitive layer and the first photomask.
  • a second photomask is disposed in close contact with the second photosensitive layer, and the second light source disposed opposite to the second photomask is secondly directed toward the second photomask.
  • the second photosensitive layer is exposed by irradiating light.
  • the second photomask is composed of a glass substrate made of transparent soda glass and a mask pattern (second exposure pattern) formed on the glass substrate. Therefore, the second exposure process exposes a portion of the second photosensitive layer along the second exposure pattern formed on the second photomask. In this case, a gap of about 2 to 10 ⁇ m may be provided between the second photosensitive layer and the second photomask.
  • the emission timing of the first light from the first light source and the emission timing of the second light from the second light source may be made simultaneously or different from each other.
  • the first photosensitive layer and the second photosensitive layer can be exposed simultaneously by one exposure process, and the processing time can be shortened.
  • the first light from the first light source that has reached the first photosensitive layer is scattered by the silver halide grains in the first photosensitive layer, passes through the substrate 30 as scattered light, and a part thereof is the second photosensitive layer. Reach up to the layer. Then, the boundary portion between the second photosensitive layer and the substrate 30 is exposed over a wide range, and a latent image is formed. For this reason, in the second photosensitive layer, exposure with the second light from the second light source and exposure with the first light from the first light source are performed, and when the conductive sheet 1 for touch panel is formed in the subsequent development processing.
  • a thin conductive layer by the first light from the first light source is formed between the conductive patterns, and a desired pattern (along the second exposure pattern) Pattern) cannot be obtained.
  • the silver halide itself absorbs light and can limit light transmission to the back side.
  • the thickness of the first photosensitive layer and the second photosensitive layer can be set to 1 ⁇ m or more and 4 ⁇ m or less.
  • the upper limit is preferably 2.5 ⁇ m.
  • the coated silver amount of the first photosensitive layer and the second photosensitive layer was regulated to 5 to 20 g / m 2 .
  • the first light from the first light source reaching the first photosensitive layer is set and defined by setting the thickness of the first photosensitive layer and the second photosensitive layer, the coating silver amount, and the volume ratio of silver / binder. Does not reach the second photosensitive layer.
  • the second light from the second light source that has reached the second photosensitive layer does not reach the first photosensitive layer.
  • the manufacturing method using the above-described double-sided batch exposure it is possible to obtain the first photosensitive layer and the second photosensitive layer that have both conductivity and suitability for double-sided exposure. Further, the same pattern or different patterns can be arbitrarily formed on both surfaces of the base body 30 by the exposure process on one base body 30, whereby the electrodes of the touch panel can be easily formed and the touch panel Thinning (low profile) can be achieved.
  • the manufacturing method of the conductive sheet 1 according to the present embodiment includes the following three forms depending on the photosensitive material and the form of development processing.
  • a photosensitive silver halide black-and-white photosensitive material containing no physical development nuclei and an image receiving sheet having a non-photosensitive layer containing physical development nuclei are overlapped and developed by diffusion transfer, and the metallic silver portion is non-photosensitive image-receiving sheet. Form formed on top.
  • the above aspect (1) is an integrated black-and-white development type, and a light-transmitting conductive film such as a light-transmitting conductive film is formed on the photosensitive material.
  • the resulting developed silver is chemically developed silver or heat developed silver, and is highly active in the subsequent plating or physical development process in that it is a filament with a high specific surface.
  • the light-transmitting conductive film such as a light-transmitting conductive film is formed on the photosensitive material by dissolving silver halide grains close to the physical development nucleus and depositing on the development nucleus in the exposed portion.
  • a characteristic film is formed.
  • This is also an integrated black-and-white development type. Although the development action is precipitation on the physical development nuclei, it is highly active, but developed silver is a sphere with a small specific surface.
  • the silver halide grains are dissolved and diffused in the unexposed area and deposited on the development nuclei on the image receiving sheet, whereby a light transmitting conductive film or the like is formed on the image receiving sheet.
  • a conductive film is formed. This is a so-called separate type in which the image receiving sheet is peeled off from the photosensitive material.
  • either negative development processing or reversal development processing can be selected (in the case of the diffusion transfer method, negative development processing is possible by using an auto-positive type photosensitive material as the photosensitive material).
  • the substrate 30 examples include a plastic film, a plastic plate, and a glass plate.
  • the raw material for the plastic film and plastic plate include polyesters such as polyethylene terephthalate (PET) and polyethylene naphthalate (PEN); polyethylene (PE), polypropylene (PP), polystyrene, ethylene vinyl acetate (EVA) / cyclo Polyolefins such as olefin polymer (COP) / cycloolefin copolymer (COC); vinyl-based resin; polycarbonate (PC), polyamide, polyimide, acrylic resin, triacetyl cellulose (TAC), and the like can be used.
  • PET polyethylene terephthalate
  • PEN polyethylene naphthalate
  • PE polyethylene
  • PP polypropylene
  • EVA ethylene vinyl acetate
  • COP olefin polymer
  • COC olefin copolymer
  • vinyl-based resin polycarbonate
  • PC polyamide, polyimide
  • the silver salt emulsion layer to be the first electrode pattern 10 and the second electrode pattern 40 of the first conductive sheet contains additives such as a solvent and a dye in addition to the silver salt and the binder.
  • Examples of the silver salt used in the present embodiment include inorganic silver salts such as silver halide and organic silver salts such as silver acetate. In the present embodiment, it is preferable to use silver halide having excellent characteristics as an optical sensor.
  • Silver coating amount of silver salt emulsion layer is preferably 1 ⁇ 30g / m 2 in terms of silver, more preferably 1 ⁇ 25g / m 2, more preferably 5 ⁇ 20g / m 2 .
  • binder used in this embodiment examples include gelatin, polyvinyl alcohol (PVA), polyvinyl pyrrolidone (PVP), starch and other polysaccharides, cellulose and derivatives thereof, polyethylene oxide, polyvinyl amine, chitosan, polylysine, and polyacryl.
  • PVA polyvinyl alcohol
  • PVP polyvinyl pyrrolidone
  • starch and other polysaccharides, cellulose and derivatives thereof, polyethylene oxide, polyvinyl amine, chitosan, polylysine, and polyacryl.
  • acid polyalginic acid, polyhyaluronic acid, carboxycellulose and the like. These have neutral, anionic, and cationic properties depending on the ionicity of the functional group.
  • the content of the binder contained in the silver salt emulsion layer is not particularly limited, and can be appropriately determined as long as dispersibility and adhesion can be exhibited.
  • the binder content in the silver salt emulsion layer is preferably 1 ⁇ 4 or more, more preferably 1 ⁇ 2 or more in terms of the silver / binder volume ratio.
  • the silver / binder volume ratio is preferably 100/1 or less, more preferably 50/1 or less, further preferably 10/1 or less, and particularly preferably 6/1 or less.
  • the silver / binder volume ratio is more preferably 1/1 to 4/1. Most preferably, it is 1/1 to 3/1.
  • the silver / binder volume ratio is converted from the amount of silver halide / binder amount (weight ratio) of the raw material to the amount of silver / binder amount (weight ratio), and the amount of silver / binder amount (weight ratio) is further converted to the amount of silver. / It can obtain
  • the solvent used for forming the silver salt emulsion layer is not particularly limited.
  • water organic solvents (for example, alcohols such as methanol, ketones such as acetone, amides such as formamide, dimethyl sulfoxide, etc. Sulphoxides such as, esters such as ethyl acetate, ethers, etc.), ionic liquids, and mixed solvents thereof.
  • the content of the solvent used in the silver salt emulsion layer of the present embodiment is in the range of 30 to 90% by mass with respect to the total mass of silver salt and binder contained in the silver salt emulsion layer, and 50 to 80%. It is preferably in the range of mass%.
  • the various additives used in the present embodiment are not particularly limited, and known ones can be preferably used.
  • a protective layer (not shown) may be provided on the silver salt emulsion layer.
  • the “protective layer” means a layer made of a binder such as gelatin or a high molecular polymer, and is provided on a silver salt emulsion layer having photosensitivity in order to exhibit the effect of preventing scratches and improving mechanical properties. It is formed.
  • the thickness is preferably 0.5 ⁇ m or less.
  • the coating method and forming method of the protective layer are not particularly limited, and a known coating method and forming method can be appropriately selected.
  • An undercoat layer for example, can be provided below the silver salt emulsion layer.
  • the case where the first electrode pattern 10 and the second electrode pattern 40 are applied by a printing method is included, but the first electrode pattern 10 and the second electrode pattern 40 are formed by exposure and development, etc., except for the printing method.
  • exposure is performed on a photosensitive material having a silver salt-containing layer provided on the substrate 30 or a photosensitive material coated with a photopolymer for photolithography.
  • the exposure can be performed using electromagnetic waves. Examples of the electromagnetic wave include light such as visible light and ultraviolet light, and radiation such as X-rays.
  • a light source having a wavelength distribution may be used for exposure, or a light source having a specific wavelength may be used.
  • a method through a glass mask or a pattern exposure method by laser drawing is preferable.
  • development processing is further performed.
  • the development processing can be performed by a normal development processing technique used for silver salt photographic film, photographic paper, printing plate-making film, photomask emulsion mask, and the like.
  • the development process in the present embodiment can include a fixing process performed for the purpose of removing and stabilizing the silver salt in the unexposed part.
  • a fixing process technique used for silver salt photographic film, photographic paper, film for printing plate making, emulsion mask for photomask, and the like can be used.
  • the light-sensitive material that has been subjected to development and fixing processing is preferably subjected to a film hardening process, a water washing process, and a stabilization process.
  • the mass of the metallic silver contained in the exposed portion after the development treatment is preferably a content of 50% by mass or more, and 80% by mass or more with respect to the mass of silver contained in the exposed portion before exposure. More preferably. If the mass of silver contained in the exposed portion is 50% by mass or more based on the mass of silver contained in the exposed portion before exposure, it is preferable because high conductivity can be obtained.
  • the gradation after the development processing in the present embodiment is not particularly limited, but is preferably more than 4.0.
  • the conductivity of the conductive metal portion can be increased while keeping the light transmissive property of the light transmissive portion high.
  • means for setting the gradation to 4.0 or higher include the aforementioned doping of rhodium ions and iridium ions.
  • the conductive sheet is obtained through the above steps, but the surface resistance of the obtained conductive sheet is 100 ohm / sq.
  • the following is preferable, and 80 ohm / sq.
  • the following is more preferable, and 60 ohm / sq.
  • the following is more preferable, and 40 ohm / sq.
  • the lower limit of the surface resistance is preferably as low as possible, but is generally 0.01 ohm / sq. Is sufficient, 0.1 ohm / sq. And 1 ohm / sq. However, it can be used depending on the application.
  • the position can be detected even with a large touch panel having an area of 10 cm ⁇ 10 cm or more.
  • the conductive sheet after the development treatment may be further subjected to a calendar treatment, and can be adjusted to a desired surface resistance by the calendar treatment.
  • Hardening after development It is preferable to perform a film hardening process by immersing the film in a hardener after the silver salt emulsion layer is developed.
  • the hardener include dialdehydes such as glutaraldehyde, adipaldehyde, 2,3-dihydroxy-1,4-dioxane, and inorganic compounds such as boric acid and chromium alum / potassium alum. No. 141279 can be mentioned.
  • physical development and / or plating treatment for supporting conductive metal particles on the metal silver portion may be performed for the purpose of improving the conductivity of the metal silver portion formed by exposure and development processing.
  • the conductive metal particles may be supported on the metallic silver portion by only one of physical development and plating treatment, or the conductive metal particles are supported on the metallic silver portion by combining physical development and plating treatment. Also good.
  • the thing which performed the physical development and / or the plating process to the metal silver part is called "conductive metal part".
  • Oxidation treatment it is preferable to subject the metallic silver portion after the development treatment and the conductive metal portion formed by physical development and / or plating treatment to oxidation treatment.
  • oxidation treatment for example, when a metal is slightly deposited on the light transmissive portion, the metal can be removed and the light transmissive portion can be made almost 100% transparent.
  • the “light-transmitting portion” in the present embodiment means a portion having translucency other than the first electrode pattern 10 and the second electrode pattern 40 in the conductive sheet 1.
  • the transmittance in the light transmissive portion is 90% or more, preferably 95 in the minimum value of the transmittance in the wavelength region of 380 to 780 nm excluding the contribution of light absorption and reflection of the substrate 30. % Or more, more preferably 97% or more, even more preferably 98% or more, and most preferably 99% or more.
  • the film thickness of the substrate 30 in the conductive sheet 1 according to the present embodiment is preferably 5 to 350 ⁇ m, and more preferably 30 to 150 ⁇ m. If it is in the range of 5 to 350 ⁇ m, a desired visible light transmittance can be obtained, and handling is easy.
  • the thickness of the metallic silver portion provided on the substrate 30 can be appropriately determined according to the coating thickness of the silver salt-containing layer coating applied on the substrate 30.
  • the thickness of the metallic silver portion can be selected from 0.001 mm to 0.2 mm, but is preferably 30 ⁇ m or less, more preferably 20 ⁇ m or less, and further preferably 0.01 to 9 ⁇ m. 0.05 to 5 ⁇ m is most preferable.
  • a metal silver part is pattern shape.
  • the metallic silver part may be a single layer or a multilayer structure of two or more layers. When the metallic silver portion is patterned and has a multilayer structure of two or more layers, different color sensitivities can be imparted so as to be sensitive to different wavelengths. Thereby, when the exposure wavelength is changed and exposed, a different pattern can be formed in each layer.
  • the thickness of the conductive metal part is preferably as the thickness of the touch panel is thinner because the viewing angle of the display panel is wider, and a thin film is also required for improving the visibility. From such a viewpoint, the thickness of the layer made of the conductive metal supported on the conductive metal portion is desirably less than 9 ⁇ m, less than 5 ⁇ m, less than 3 ⁇ m, and 0.1 ⁇ m or more.
  • the thickness of the layer made of conductive metal particles is formed by controlling the coating thickness of the silver salt-containing layer described above to form a metallic silver portion having a desired thickness, and further by physical development and / or plating treatment. Therefore, even the conductive sheet 1 having a thickness of less than 5 ⁇ m, preferably less than 3 ⁇ m can be easily formed.
  • the conductive sheet 1 having the above has been described. However, as shown in FIG. 33, the conductive sheet 1 having the base body 30 and the first electrode pattern 10 formed on the first main surface of the base body 30, and the first main surface of the base body 80 and the base body 80.
  • the conductive sheet 2 having the second electrode pattern 40 formed thereon may be arranged so that the first electrode pattern 10 and the second electrode pattern 40 are orthogonal to each other.
  • a manufacturing method applied to the base body 30 and the first electrode pattern can be adopted for the base body 80 and the second electrode pattern 40.
  • the conductive sheet and the touch panel according to the present invention are not limited to the above-described embodiments, but can of course have various configurations without departing from the gist of the present invention. Further, it can be used in appropriate combination with the techniques disclosed in JP 2011-113149, JP 2011-129501, JP 2011-129112, JP 2011-134311, JP 2011-175628, and the like.
PCT/JP2012/083221 2011-12-22 2012-12-21 導電シート及びタッチパネル WO2013094728A1 (ja)

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EP12859178.1A EP2796971B1 (en) 2011-12-22 2012-12-21 Conductive sheet and touch panel
CN201280063278.2A CN104011634B (zh) 2011-12-22 2012-12-21 导电片和触摸面板
KR1020147017121A KR101616217B1 (ko) 2011-12-22 2012-12-21 도전 시트 및 터치 패널
BR112014015320A BR112014015320A2 (pt) 2011-12-22 2012-12-21 folha condutora e painel de toque
US14/310,702 US9271396B2 (en) 2011-12-22 2014-06-20 Conductive sheet and touch panel

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JP2011281927 2011-12-22
JP2011-281927 2011-12-22
JP2012182712A JP5875484B2 (ja) 2011-12-22 2012-08-21 導電シート及びタッチパネル
JP2012-182712 2012-08-21

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