WO2006059808A1 - Electrode mettant en application un plasma immerge, dispositif generant du plasma immerge et procede generant du plasma immerge - Google Patents

Electrode mettant en application un plasma immerge, dispositif generant du plasma immerge et procede generant du plasma immerge Download PDF

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Publication number
WO2006059808A1
WO2006059808A1 PCT/JP2005/022611 JP2005022611W WO2006059808A1 WO 2006059808 A1 WO2006059808 A1 WO 2006059808A1 JP 2005022611 W JP2005022611 W JP 2005022611W WO 2006059808 A1 WO2006059808 A1 WO 2006059808A1
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Prior art keywords
liquid
plasma
electrode
discharge end
face
Prior art date
Application number
PCT/JP2005/022611
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English (en)
Japanese (ja)
Inventor
Hitotoshi Murase
Toshihisa Shimo
Hiroaki Takashima
Hiromichi Toyota
Shinfuku Nomura
Tsunehiro Maehara
Original Assignee
Kabushiki Kaisha Toyota Jidoshokki
Ehime University
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kabushiki Kaisha Toyota Jidoshokki, Ehime University filed Critical Kabushiki Kaisha Toyota Jidoshokki
Priority to US11/792,174 priority Critical patent/US8653404B2/en
Priority to DE112005003029T priority patent/DE112005003029B4/de
Priority to KR1020077012623A priority patent/KR100934139B1/ko
Priority to CN2005800472533A priority patent/CN101112132B/zh
Priority to JP2006546766A priority patent/JP4909741B2/ja
Publication of WO2006059808A1 publication Critical patent/WO2006059808A1/fr

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Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/46Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H05H1/4645Radiofrequency discharges
    • H05H1/466Radiofrequency discharges using capacitive coupling means, e.g. electrodes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/087Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
    • B01J19/088Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/46Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/48Generating plasma using an arc
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0803Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
    • B01J2219/0805Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
    • B01J2219/0807Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges involving electrodes
    • B01J2219/0809Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges involving electrodes employing two or more electrodes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0803Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
    • B01J2219/0805Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
    • B01J2219/0807Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges involving electrodes
    • B01J2219/0824Details relating to the shape of the electrodes
    • B01J2219/0835Details relating to the shape of the electrodes substantially flat
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0873Materials to be treated
    • B01J2219/0877Liquid

Definitions

  • Electrode for submerged plasma submerged plasma generator
  • the present invention relates to a plasma technology for generating plasma in a liquid, and more particularly to a method, an apparatus, and an electrode used for generating high-energy plasma in a liquid.
  • International Publication No. 0 2 0 3 8 8 2 7 pamphlet (Reference 1) includes a flow of foam containing a raw material of a material to be deposited in an electrolyte containing a pair of spaced electrodes. And a material for depositing material on the electrode by forming a plasma glow discharge in the bubble region.
  • Reference 1 includes a part of the statement that microwaves and electromagnetic waves are radiated to assist the generation of glow discharge.
  • the technique described in Reference 1 is considered to be a pure DC glow discharge. Therefore, the reaction rate is considered to be similar to that of gas phase plasma.
  • Japanese Patent Application Laid-Open No. 2000-300-1 036 (Document 2) also describes that a liquid is irradiated with microwaves from the outside of the container to decompose harmful substances in the liquid. Yes.
  • Reference 2 describes the decomposition of harmful substances contained in the liquid in the container by irradiating microwaves from the outside of the container, but it does not explain the principle of decomposition. Therefore, it is unlikely that plasma is generated in the liquid by such microwave irradiation, and Reference 2 does not describe that plasma was generated in the liquid. Even if it is not impossible to generate plasma in the liquid, it is necessary to supply extremely large power, and its practicality is low.
  • the method described in the above documents 3 and 4 for generating plasma in liquid by irradiating electromagnetic waves in the liquid has a very high molecular velocity in the liquid phase compared with the gas phase, so that a high reaction rate can be obtained. It is expected.
  • water and Liquids with conductivity such as alcohol have the problem that eddy currents are generated in the liquid and the energy of the irradiated electromagnetic waves is consumed.
  • Another problem is that electromagnetic waves attenuate because hydroxyl groups absorb specific frequencies.
  • the present invention includes an electrode for submerged plasma, a submerged plasma generator, and a liquid that can easily generate plasma in a wide range of liquids, including conductive liquids such as water and alcohol.
  • An object is to provide a method for generating a medium plasma.
  • an in-liquid plasma electrode is an in-plasma plasma electrode that generates plasma in a liquid, and a conductive member having a discharge end face in contact with the liquid, And an insulating member that covers the outer periphery of the conductive member excluding at least the discharge end face.
  • the cross section of the conductive end portion of the conductive member having the discharge end face is substantially circular or substantially rectangular, the short diameter or the length of the short side in the cross section is d, and the insulating member is substantially parallel to the discharge end face.
  • the end surface is the reference surface and the distance from the reference surface to the surface including the discharge end surface is X, it is preferable to satisfy 1 2 d ⁇ x ⁇ 2 d, and 1 d ⁇ x ⁇ d. Is more preferable.
  • the discharge end surface protrudes outward from the end surface (reference surface) of the insulating member.
  • the discharge end face and the reference plane exist on the same plane.
  • the discharge end face is recessed inward from the end face (reference plane) of the insulating member.
  • the conductive surface excluding at least the discharge end face.
  • the in-liquid plasma generator includes a container for storing a liquid, a conductive member having a discharge end face in contact with the liquid, and an insulating member covering an outer periphery of the conductive member excluding at least the discharge end face.
  • a submerged plasma electrode having at least an end provided in the container, and
  • a high-frequency power supply for supplying power to at least the conductive member
  • the submerged plasma generation method according to the present invention is a submerged plasma generation method for generating plasma in a liquid, the conductive member having a discharge end face in contact with the liquid, and the discharge end face excluding at least the discharge end face.
  • Power is supplied from a high-frequency power source to an in-liquid plasma electrode having an insulating member covering the outer periphery of the conductive member.
  • the submerged plasma generation apparatus and submerged plasma generation method of the present invention have the effect that the submerged plasma electrode of the present invention can generate high-energy submerged plasma in a wide range of liquids including water. .
  • FIG. 1 is an example of an in-liquid plasma electrode according to the present invention, and is a longitudinal sectional view of an electrode end.
  • FIG. 2 is an explanatory view showing an example of the in-liquid plasma generator of the present invention.
  • FIG. 3 is a circuit diagram showing an example of a high-frequency circuit used in the in-liquid plasma generator of the present invention.
  • FIG. 4 is an explanatory diagram of the in-liquid plasma generator used in the example.
  • FIG. 5 is a partially enlarged view showing an example of the submerged plasma electrode in the embodiment, and is an axial cross-sectional view of the electrode end portion.
  • FIG. 6 is a cross-sectional view showing an example of the in-liquid plasma electrode of the example, and shows two cross sections orthogonal to each other.
  • Fig. 7 is a graph showing the results of absorption analysis of the green pigment.
  • FIG. 8 is a graph showing the results of absorption analysis of the red pigment.
  • FIG. 1 is a longitudinal sectional view showing an example of an electrode for submerged plasma
  • FIG. 2 is an explanatory view showing an example of a submerged plasma generator
  • FIG. 3 is an example of a high-frequency circuit used in the submerged plasma generator.
  • the in-liquid plasma generator mainly includes an in-liquid plasma electrode 1, a high-frequency power source 2, and a container 3 for storing the liquid L.
  • the in-liquid plasma electrode 1 includes a conductive member 11 and an insulating member 16 as shown in FIG.
  • the submerged plasma electrode of the present invention is a submerged plasma electrode that generates plasma in a liquid, and includes a conductive member and an insulating member provided on an outer periphery thereof.
  • the conductive member has a discharge end face in contact with the liquid, and the outer periphery of the conductive member excluding at least the discharge end face is covered with an insulating member.
  • the conductive member is not particularly limited as long as it is made of a conductive material.
  • a metal material copper (C u), a copper alloy containing Cu, aluminum (A 1), A Aluminum alloy containing 1, stainless steel, Tandasten (W), silver (A g), molypden (M o), gold (A u), platinum (P t), carbon (C), etc.
  • Metal materials can be used.
  • the shape of the conductive member is not particularly limited.
  • the insulating member is preferably made of resin or ceramics.
  • the resins include epoxy resins, phenol resins, unsaturated polyester resins, urea resins, melamine resins, polyurethane resins, silicone resins, cyanate resins, polyamide resins, polyacetals, polycarbonates, modified resins Polyphenylene ether, Thermoplastic polyester resin, Polytetrafluoroethylene, Fluororesin, Polyphenylene sulfide, Ceramics such as polysulfone, amorphous polyarylate, polyetherimide, polyethersulfone, polyether ketone, liquid crystal polyester, polyimidazole, polyimide, polyallyl ether nitrile, polybenzimidazole and their polymer alloys As alumina, alumina-silica, zirconia, silicon nitride-alumina (SiAl), My force (fluor phlogopite), wallustonite, hexagonal boron nitride
  • the form of the insulating member is not particularly limited as long as it can cover the outer periphery of the conductive member excluding at least the discharge end face, and may be appropriately selected according to the shape of the conductive end.
  • “covering the outer periphery of the conductive member excluding at least the discharge end face” specifically means the surface of the conductive member 11 other than the discharge end face 1 1 1 as shown in the center diagram of FIG. 1 and the right figure. In addition to being covered, even if the surface of the conductive member 11 except for the discharge end face 1 1 1 and the side face continuous with the discharge end face 1 1 1 is covered as shown in the left figure of FIG. Good.
  • the electrode for plasma in liquid In the electrode for plasma in liquid according to the present invention, plasma is generated in the liquid without applying excessively large electric power to the electrode by giving a feature to the structure around the end (conductive end) of the conductive member having the discharge end face. Can occur. Therefore, in the following description, the electrode end portion having the conductive end portion among the liquid plasma electrodes will be described in detail.
  • the electrode end In the electrode for plasma in liquid, the electrode end is a part mainly disposed in the liquid, and the configuration of the other part excluding the electrode end is not particularly limited as long as it does not deviate from the embodiment described above. .
  • the conductive end portion has a discharge end face on which no insulating member is provided.
  • the discharge end face is
  • the conductive member may be a rectangular parallelepiped, or may be another surface other than one of the end surfaces located at both ends in the longitudinal direction.
  • the discharge end face may be a flat surface, a curved surface or a hemispherical surface.
  • the shape of the conductive end is not particularly limited, but it may be a rod-like or plate-like shape such as a cylinder or a prism. That is, the cross-sectional shape of the conductive end is preferably a substantially circular shape such as a perfect circle or an ellipse, or a substantially rectangular shape such as a square or a rectangle.
  • the conductive end portion may have a chamfered portion at an edge portion (reference numeral 1 1 2 in FIG. 1) of the discharge end surface.
  • the chamfered portion is preferably a curved surface, and the radius of curvature R is preferably 0.01 mm or more and d2 or less (d is defined later).
  • the shape of the conductive member other than the conductive end portion is not limited, and may be a shape that can be easily installed in a submerged plasma generator.
  • the insulating member positioned around the electrode end is not particularly limited as long as it is positioned on the outer periphery of the conductive end, and may be appropriately selected according to the shape of the conductive end. For example, although it depends on the material of the insulating member, it may be provided with a thickness of 0.1 mm or more from the surface of the conductive end.
  • each drawing in FIG. 1 is a cross-sectional view showing an example of an in-liquid plasma electrode according to the present invention, and is an enlarged view of an electrode end 10.
  • the conductive end 1 1 0 having the discharge end face 1 1 1 may protrude from the insulating member 16, or the conductive end 1 1 0 may be in contact with the insulating member 1 6 with the discharge end face 1 1 1 exposed. It may be buried.
  • the cross section of the conductive end portion is substantially circular, the length of the short diameter is set. If it is substantially rectangular, the length of the short side is set to d.
  • the end surface of the insulating member that is substantially parallel to the discharge end surface When the distance from the reference plane to the plane including the discharge end face is X, it is preferable to satisfy 1 2 d ⁇ X ⁇ 2 d. 1 By setting 2 d ⁇ X ⁇ 2 d, plasma can be generated in the liquid without applying extremely large power to the electrodes. Furthermore, if 1 d ⁇ x ⁇ d, the power required for plasma generation can be reduced. As described above, in this specification, X is a positive value when the discharge end face protrudes from the reference plane, and X is a negative value when the discharge end face is recessed from the reference plane. .
  • the region of the conductive member that has a surface in contact with the liquid is defined as the conductive end portion.
  • the minimal (thin) portion having the discharge end surface is defined. It can be regarded as a conductive end.
  • d is the minor axis or the length of the short side of the discharge end face.
  • X is 1 m n! In the range of ⁇ 1 mm, plasma can be generated satisfactorily regardless of the shape of the conductive edge.
  • the discharge end face or the end face (reference plane) of the insulating member is a curved surface
  • the surface including the discharge end surface or the reference surface may be used.
  • cross-sectional shape of the conductive end portion is a perfect circle, “d” is equal to the diameter. If the cross-sectional shape of the conductive end is square, “d” is equal to the length of one side. On the other hand, when the cross-sectional shape of the conductive edge is not a perfect circle or square, the length of the short diameter (cross section is oval) or short side (cross section is rectangular) corresponds to “d”. Especially for the length of There is no limitation.
  • a submerged plasma generator can be constructed using the submerged plasma electrode of the present invention described in detail above.
  • the submerged plasma generator mainly includes a submerged plasma electrode, a high-frequency power source that supplies power to the electrode, and a container that contains the liquid.
  • the container for storing liquid as long as it can hold liquid well before and after the generation of plasma.
  • the container at least an electrode end portion of the electrode for plasma in liquid is provided, and the electrode end portion is located in the liquid when the liquid is put into the container.
  • the second electrode 4 is preferably provided in the container 3 so as to face the electrode end 10 of the in-liquid plasma electrode 1.
  • the submerged plasma electrode 1 and the second electrode 4 only need to face each other, but it is desirable that the distance between the electrodes be 0.5 to 50 mm.
  • the “distance between electrodes” is the distance from the reference surface to the opposing surface of the second electrode (indicated by the symbol D in FIG. 2). Further, as shown in FIG.
  • the electrode 1 does not need to be arranged with the electrode end 10 facing upward at the bottom of the container 3, and if the electrode end 10 is in contact with the liquid L, It may be downward or horizontally.
  • one submerged plasma electrode 1 is disposed, but a plurality of sub-plasma electrodes 1 may be disposed.
  • the space including the reaction vessel may be decompressed using an exhaust means.
  • the pressure at this time is preferably 1 to 60 hPa. Note that decompression is limited to bubbles and Since it is particularly effective at the start of plasma generation, if the generation of bubbles and plasma is stable, normal pressure may be used.
  • the high-frequency power supply supplies power to the plasma electrode in liquid, that is, the conductive member.
  • the high-frequency power source may be controlled by a high-frequency circuit as shown in FIG.
  • electric power is supplied from the high-frequency power source 2 to the resonance circuit 30 through the matching unit 2 1.
  • the resonance circuit 30 includes coils 31 and 32 and a capacitor 33, and the contact C and contact D of the resonance circuit 30 are connected to the in-liquid plasma electrode 1 and the second electrode 4, respectively.
  • the resonant circuit 30 is set to resonate with the frequency of the input high frequency.
  • the contact C side is grounded and connected to the second electrode 4, and the contact D is connected to the liquid plasma electrode 1.
  • the frequency to be used may be appropriately selected according to the type of liquid and the application of the plasma, and is preferably used in the range of 3 MHz to 3 GHz.
  • a liquid containing a large amount of water for example, if industrially permitted 13.5 6 MHz or 27.12 MHz is used, it is difficult to be absorbed by water molecules.
  • the resonant circuit need not be of this type. Series resonance may be used, and when the frequency is high, a line resonator or a cavity resonator can be used.
  • the liquid is heated and boiled by the heat generated by the in-liquid plasma electrode, and the liquid is boiled by a heating element or the liquid is irradiated with ultrasonic waves.
  • a heating element or an ultrasonic generator may be provided in a container that holds the liquid.
  • a function for generating bubbles may be provided in the in-liquid plasma generation device, bubbles such as microbubbles and nanobubbles may be generated between the electrode and the substrate, and the bubbles activated by the in-liquid plasma may flow.
  • a function of circulating the liquid may be provided in the in-liquid plasma generator, and bubbles may be generated while circulating the liquid between the electrode and the substrate.
  • a gas may be supplied as an assist gas that helps generate bubbles between the electrode and the substrate.
  • the gas to be supplied if the liquid is alcohol, it may be a hydrocarbon gas such as methane or acetylene, an inert gas such as helium or argon, or a reducing gas such as hydrogen.
  • the generated plasma is high temperature, high energy, and effective for decomposition and synthesis of materials. On the other hand, it is in the liquid, so it is low in temperature and safe and easy to handle.
  • the reaction rate is extremely high because of the high density of the plasma in the liquid.
  • Electrode for submerged plasma, submerged plasma generator and submerged bra of the present invention The whatsoevera generation method is not limited to the above embodiment. That is, the present invention can be carried out in various forms that have been modified or improved by those skilled in the art without departing from the scope of the present invention.
  • an in-liquid plasma generator was produced.
  • Examples of submerged plasma electrodes, submerged plasma generators, and submerged plasma generation methods will be described below with reference to FIGS. 3 to 8 together with comparative examples.
  • FIGS. 3 and 4 the apparatus shown in FIGS. 3 and 4 was used as the liquid plasma generating apparatus.
  • the submerged plasma generator used in the following examples will be specifically described below.
  • Examples of the in-liquid plasma electrodes 1 and 1 ′ ′ used in Examples 1 to 5, 15 to 17 and Examples 6 14 are shown in FIGS. 5 and 6, respectively.
  • the container 3 includes a cylindrical container body made of quartz glass and a stainless steel substantially disc-shaped closing member that closes a lower opening end and an upper opening end thereof.
  • An in-plasma plasma electrode 1 is fixed to the central portion of the closing member that closes the lower opening end.
  • the in-liquid plasma electrode 1 is arranged such that the electrode end portion 10 protrudes into the container 3.
  • the container 3 is filled with the liquid L, and the electrode end 10 is located in the liquid L.
  • the second electrode 4 is held above the in-liquid plasma electrode 1 so as to face each other with a predetermined inter-electrode distance D.
  • the second electrode 4 is a plate-like pure aluminum (A 10 50 (JIS)), and is entirely immersed in the liquid.
  • the in-liquid plasma electrode 1 and the second electrode 4 are connected to a coil, a capacitor, or the like, and incorporated in a resonance circuit 30 (FIG. 3) to which a high frequency is supplied.
  • the second electrode 4 is held by a conductive holder that is fixed to a closing member that closes the upper opening end of the container 3 via an insulator 33.
  • the second electrode 4 is connected to the resonance circuit 30 through this holder.
  • Container 3 is housed inside an outer container 91 that is one dimension larger than container 3.
  • the outer container 91 has the same configuration as that of the container 3 except that it has a vacuum pump 90 connected to the outer container 9 1 via the exhaust passage 95.
  • the in-liquid plasma electrode 1 ′ includes a metal conductive member 12 and an insulating member 17.
  • FIG. 5 is an example of an in-liquid plasma electrode 1 ′ of Examples 1 to 5 and is an axial cross-sectional view of an electrode end 10 ′.
  • a cylindrical ceramic insulating tube (inner diameter: 3 mm, outer diameter 5 mm, length 25 mm) was used as the insulating member 17.
  • the conductive member 12 was inserted into the cylinder of the insulating member 17. Adjust the insertion position of the conductive member 1 2 at the electrode end 1 0 ′ of the electrode 1 for plasma in liquid.
  • the end face of the insulating member parallel to the end face 1 2 1 was defined as a reference face 1 7 1, and the distance X from the reference face 1 7 1 to the end face 1 2 1 (discharge end face) was determined.
  • the in-liquid plasma electrode 1 ′ was assembled in the liquid plasma generator.
  • the X-5 electrode is # 1-1
  • Tap water was prepared as a liquid and filled into the container 3 of the in-liquid plasma generator.
  • the distance D between the electrodes was 2 mm.
  • the inside of the outer container 9 1 was depressurized, and the pressure inside the container was set to 2 00 h Pa.
  • the frequency of the output power from the high frequency power supply 2 is set to 27.1 2 MHz, and the power supplied to the plasma electrode 1 in the liquid is adjusted to 0 to 600 W to generate plasma inside. Dense bubbles were generated in liquid L. Bubbles rose in the liquid L from the discharge end face 1 2 1. Table 1 shows the high-frequency power values at which plasma discharge occurred for each electrode.
  • Example 2 alcohol was used for liquid L as an example of a liquid containing a hydroxyl group. That is, plasma was generated by a submerged plasma generator in the same manner as in Example 1 except that liquid L was ethanol and the pressure in the container was 100 h Pa.
  • Table 2 shows the values of the high-frequency power at which discharge occurred for each electrode.
  • Plasma could be generated even if the liquid L was ethanol. Even if the discharge end face 1 2 1 protrudes from the reference face 1 7 1 (0 ⁇ X) or is indented (x ⁇ 0), the plasma is applied with a power of 100 W. There has occurred.
  • the generated plasma moved with the bubbles and contacted the surface of the second electrode 4 held in the liquid.
  • carbon activated in a plasma state inside the bubbles was deposited on the surface of the second electrode 4.
  • plasma was generated by an in-liquid plasma generator.
  • the inner diameter of the insulating member 17 was also changed to 1.5 mm to match the diameter of the conductive member 1 2 ′.
  • a plasma was generated by a submerged plasma generator in the same manner as in Example 1 except that the pressure in the container was 50 h Pa.
  • the inner diameter of the insulating member 17 was also changed according to the diameter of the conductive member 12.
  • the plasma was generated by the in-liquid plasma generator in the same manner as in Example 1 except for a.
  • the inner diameter of the insulating member 17 was also changed to match the diameter of the conductive member 12.
  • the shape of the electrode 1 for plasma in liquid was changed, and the materials of the conductive member and insulating member, the type of liquid L, the distance between electrodes, and the vessel pressure were changed to the values shown in Tables 6 to 14.
  • plasma was generated by a submerged plasma generator.
  • the in-plasma plasma electrode 1 '' used in each example will be described with reference to FIG.
  • the in-liquid plasma electrode 1 ′ of this embodiment is composed of a metal conductive member 13 and an insulating member 18.
  • FIG. 6 is an example of the submerged plasma electrode 1 ′ of Examples 6 to 14 and is a longitudinal sectional view of the submerged plasma electrode 1 (right diagram in FIG. 6) and perpendicular to the longitudinal direction. It is sectional drawing of a direction (left figure of FIG. 6).
  • a flat end face 1 3 1 of 10 mm ⁇ 2 mm of the plate-like body 1 3 5 was used as a discharge end face.
  • the center of the other end opposite to the end face 1 3 1 is inserted into the groove of the holding body 1 3 6 having a groove with a width of 2 mm.
  • the thickness of the insulation strength par was 3 mm.
  • the dimensions of the insulating member 1 8 are adjusted so that the end surface of the insulating member substantially parallel to the end surface 1 3 1 becomes the reference surface 1 8 1 Reference surface 1 8
  • the distance X from 1 to the end face 1 3 1 (discharge end face) was determined.
  • Tables 6 to 14 show the values of high-frequency power at which discharge occurred for each electrode.
  • Example 6 and Example 7 the material of the insulating member 1 8 (insulating cover) is different between ceramic and epoxy resin. In both Examples 6 and 7, discharge occurred before reaching 600 W. However, Example 7 using an epoxy resin insulating cover as the force S and the insulating member 18 was able to generate plasma more efficiently with low power.
  • plasma was able to be generated in the liquid without applying extremely large power by setting the range of 1 2 d ⁇ X 2 d. Furthermore, if _ d ⁇ x ⁇ d, the power required for plasma generation could be reduced.
  • Example 9 plasma S could be generated even in force S using ethanol as the liquid L and in ethanol.
  • Examples 6 to 14 pure aluminum or pure copper was used as the conductive member 13, but plasma could be generated satisfactorily in any case. Furthermore, even when the liquid L was tap water as in Example 14, plasma could be generated satisfactorily. The generated plasma moved with the bubbles and contacted the surface of the second electrode 4 held in the liquid. In Examples 6 to 13, when the surface of the second electrode 4 was observed after the end of the discharge, the carbon activated in the plasma state inside the bubbles was linearly formed on the surface of the second electrode 4. It was confirmed that it was deposited.
  • the discharge started when a power of 2500 W was applied. That is, even if the liquid L was an aqueous solution, discharge could be obtained in the liquid. In particular, in the NaCl aqueous solution, orange luminescence, which is the D line of Na, was observed.
  • the submerged plasma electrode, the submerged plasma generation apparatus, and the submerged plasma generation method according to the present invention have high energy plasma in a wide range of liquids including conductive liquids such as water and alcohols. Can be generated. That is, the present invention can be applied as a chemical vapor deposition, a chemical reaction furnace, or a decomposition furnace for harmful substances.
  • the method for generating plasma in liquid of the present invention although high temperature 'high energy plasma is generated in the liquid, it is surrounded by a liquid having a large heat capacity. It can be used for vapor deposition on the surface.

Abstract

L'invention concerne une électrode mettant en application un plasma immergé (1) destiné à générer du plasma dans un liquide L, comprenant un élément conducteur (11) doté d'une surface d'extrémité de décharge (111) en contact avec le liquide L, et un élément d'isolation (16) destiné à recouvrir la périphérie externe excluant au moins la surface d'extrémité de décharge (111) de l'élément conducteur (11). De préférence, lorsque le diamètre le plus court de la section de la partie d'extrémité conductrice (110) de l'élément conducteur (11), s'il est presque circulaire, ou le côté le plus court de la section, s'il est presque rectangulaire est représenté par d, et la distance à partir de la surface d'extrémité (161), censé être une surface de référence (161) et presque en parallèle de la surface d'extrémité de décharge (111), de l'élément d'isolation (16) par rapport à une surface comprenant la surface d'extrémité de décharge (111) est représenté par x, - 2d ≤x≤ 2d étant satisfait. L'invention concerne donc une électrode mettant en application un plasma immergé capable de générer facilement du plasma dans une large gamme de liquides, notamment du liquide conducteur, tel que de l'eau et de l'alcool, un dispositif générant du plasma immergé q ui contient cette électrode, et un procédé générant du plasma immergé au moyen cette électrode.
PCT/JP2005/022611 2004-12-03 2005-12-02 Electrode mettant en application un plasma immerge, dispositif generant du plasma immerge et procede generant du plasma immerge WO2006059808A1 (fr)

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US11/792,174 US8653404B2 (en) 2004-12-03 2005-12-02 In-liquid plasma electrode, in-liquid plasma generating apparatus and in-liquid plasma generating method
DE112005003029T DE112005003029B4 (de) 2004-12-03 2005-12-02 In-Flüssigkeit-Plasmaelektrode, In-Flüssigkeit-Plasmaerzeugungsvorrichtung, und In-Flüssigkeit-Plasmaerzeugungsverfahren
KR1020077012623A KR100934139B1 (ko) 2004-12-03 2005-12-02 액중 플라즈마용 전극, 액중 플라즈마 발생 장치 및 액중 플라즈마 발생 방법
CN2005800472533A CN101112132B (zh) 2004-12-03 2005-12-02 液体中等离子体电极、液体中等离子体产生装置和液体中等离子体产生方法
JP2006546766A JP4909741B2 (ja) 2004-12-03 2005-12-02 液中プラズマ用電極、液中プラズマ発生装置および液中プラズマ発生方法

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JP2004-350516 2004-12-03
JP2004350516 2004-12-03

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JP (1) JP4909741B2 (fr)
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WO (1) WO2006059808A1 (fr)

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010177002A (ja) * 2009-01-28 2010-08-12 Ehime Univ 液中プラズマ用電極、液中プラズマ発生装置および液中プラズマ発生方法
JP2011000504A (ja) * 2009-06-16 2011-01-06 Toyota Industries Corp 液中プラズマを用いた成膜方法および液中プラズマ成膜装置
DE112009000734T5 (de) 2008-03-07 2011-04-14 Kabushiki Kaisha Toyota Jidoshokki Flüssigkeitsbasiertes Plasmaschichtausbildungsgerät, Elektrode für flüssigkeitsbasiertes Plasma, und Schichtausbildungsverfahren unter Verwendung von flüssigkeitsbasiertem Plasma
WO2012001936A1 (fr) * 2010-06-30 2012-01-05 国立大学法人名古屋大学 Électrode pour plasma submergé et dispositif à plasma submergé
WO2012070687A1 (fr) * 2010-11-25 2012-05-31 Jfeスチール株式会社 Procédé de fabrication d'un matériau métallique à traitement de surface
WO2012147334A1 (fr) * 2011-04-28 2012-11-01 国立大学法人愛媛大学 Dispositif de fabrication de nanoparticules, procédé de fabrication de nanoparticules, nanoparticules, nanoparticules de zinc/oxyde de zinc et nanoparticules d'hydroxyde de magnésium
JP2013031842A (ja) * 2005-03-25 2013-02-14 Mitsubishi Rayon Co Ltd 表面処理方法および表面処理された物品
JPWO2011099247A1 (ja) * 2010-02-10 2013-06-13 国立大学法人愛媛大学 液中プラズマ用電極、液中プラズマ発生装置およびプラズマ発生方法
JP2013258159A (ja) * 2011-05-17 2013-12-26 Panasonic Corp プラズマ発生装置およびプラズマ発生方法
WO2014017020A1 (fr) * 2012-07-24 2014-01-30 パナソニック株式会社 Dispositif de traitement de liquide et procédé de traitement de liquide
JP2014167880A (ja) * 2013-02-28 2014-09-11 Nagoya Univ 液中プラズマ用電極および液中プラズマ発生装置
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JP2016531064A (ja) * 2013-06-19 2016-10-06 オブスチェストヴォ エス オグラニチェンノイ オトヴェットステヴェンノスチュ“プラズマ−エスケー” ナノスケールカーボンのコロイド溶液を製造する方法
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9480137B2 (en) * 2009-07-02 2016-10-25 Corona Plasma Systems, Inc Electrolytic cell for heating electrolyte by a glow plasma field in the electrolyte
EP2475230A4 (fr) 2009-09-02 2015-04-01 Korea Basic Science Inst Appareil de génération de décharges de plasma en milieu liquide
KR100976839B1 (ko) * 2009-10-14 2010-08-20 (주)솔고나노어드벤스 스틱형상의 액체 주입형 카트리지를 이용한 나노 콜로이드 생성 장치 및 이에 이용되는 카트리지 장치
US9586840B2 (en) 2012-04-18 2017-03-07 Georgia Tech Research Corporation Systems and methods for clustering particles by liquid-phase electric plasma discharge
WO2014115552A1 (fr) * 2013-01-28 2014-07-31 パナソニック株式会社 Dispositif destiné à l'analyse élémentaire dans un liquide
KR101493673B1 (ko) * 2013-07-09 2015-02-16 한국기초과학지원연구원 액체 플라즈마 토치 발생장치
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KR101698957B1 (ko) * 2015-04-24 2017-01-23 한국기계연구원 플라즈마 발생 장치 및 플라즈마 처리 방법
WO2017134531A1 (fr) * 2016-02-03 2017-08-10 King Abdullah University Of Science And Technology Dispositifs à plasma dans un liquide et leurs procédés d'utilisation
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DE102017126886B3 (de) * 2017-11-15 2019-01-24 Graforce Gmbh Verfahren und Vorrichtung zur plasmainduzierten Wasserspaltung
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CN110317636A (zh) * 2019-07-29 2019-10-11 大连海事大学 一种利用液相放电原位加氢提质重油原料的方法和装置
CN110408421A (zh) * 2019-07-29 2019-11-05 大连海事大学 一种利用液相放电提质重油原料的方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002373888A (ja) * 2001-06-15 2002-12-26 Matsushita Electric Ind Co Ltd プラズマ処理装置およびプラズマ処理方法
JP2003071272A (ja) * 2001-08-30 2003-03-11 Hitachi Ltd プラズマ処理装置
WO2003032932A1 (fr) * 2001-10-12 2003-04-24 Phild Co., Ltd. Liquide de regeneration capillaire comprenant de l'eau dispersee avec des particules ultrafines d'un metal du groupe titane par une decharge de plasma sous eau et procede et systeme de production
JP2003243373A (ja) * 2002-02-20 2003-08-29 Hitachi High-Technologies Corp プラズマ処理装置とプラズマ処理装置用保護膜及びその取付け方法
WO2003096767A1 (fr) * 2002-05-08 2003-11-20 Chak Man Thomas Chang Formation de plasma dans un fluide

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2263443A (en) 1938-12-03 1941-11-18 Dow Chemical Co Apparatus for making acetylene
FR1600278A (fr) * 1968-12-31 1970-07-20 Anvar
EP0096493B1 (fr) * 1982-05-25 1987-08-19 Johnson Matthey Public Limited Company Four à arc à plasma
US4642440A (en) 1984-11-13 1987-02-10 Schnackel Jay F Semi-transferred arc in a liquid stabilized plasma generator and method for utilizing the same
US4801435A (en) * 1986-09-08 1989-01-31 Plasma Holdings N.V. Hybrid plasma reactor
JPH07130490A (ja) * 1993-11-02 1995-05-19 Komatsu Ltd プラズマトーチ
JPH0824562A (ja) 1994-07-11 1996-01-30 Nagatoshi Suzuki 放電プラズマを用いた脱臭装置
AU2002212963A1 (en) * 2000-10-25 2002-05-06 Tokyo Electron Limited Method of and structure for controlling electrode temperature
WO2002038872A1 (fr) * 2000-11-08 2002-05-16 Jeung Su Lee Procede d'implantation de bandes de renforcement pour produire des panneaux de parement en beton prefabrique et dispositif de montage de bandes de renforcement
AUPR129900A0 (en) 2000-11-08 2000-11-30 Chang, Chak Man Thomas Plasma electroplating
JP2002301136A (ja) 2001-04-04 2002-10-15 Mitsubishi Heavy Ind Ltd 有害物および有害菌分解装置
KR20020083564A (ko) 2001-04-27 2002-11-04 주식회사 엘지이아이 다중 플라즈마 발생장치
ITRM20010291A1 (it) * 2001-05-29 2002-11-29 Ct Sviluppo Materiali Spa Torcia al plasma
US20030146310A1 (en) * 2001-08-17 2003-08-07 Jackson David P. Method, process and apparatus for high pressure plasma catalytic treatment of dense fluids
US20030101936A1 (en) * 2001-12-04 2003-06-05 Dong Hoon Lee And Yong Moo Lee Plasma reaction apparatus
JP2003218035A (ja) 2002-01-21 2003-07-31 Sekisui Chem Co Ltd 放電プラズマ処理方法
WO2003062310A1 (fr) 2002-01-23 2003-07-31 Glasshield Patent Holding Company, Ltd. Procede et appareil d'application de materiau sur du verre
JP3624239B2 (ja) * 2002-10-29 2005-03-02 株式会社テクノネットワーク四国 液中プラズマ発生装置、薄膜形成方法およびシリコンカーバイト膜
JP3624238B2 (ja) * 2002-04-01 2005-03-02 株式会社テクノネットワーク四国 プラズマを発生させる方法およびプラズマ発生装置
JP2004202454A (ja) 2002-12-26 2004-07-22 Ebara Corp 液体中パルス放電を用いるろ過膜及びろ材の洗浄方法と装置
US7538294B2 (en) * 2005-05-17 2009-05-26 Huys Industries Limited Welding electrode and method

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002373888A (ja) * 2001-06-15 2002-12-26 Matsushita Electric Ind Co Ltd プラズマ処理装置およびプラズマ処理方法
JP2003071272A (ja) * 2001-08-30 2003-03-11 Hitachi Ltd プラズマ処理装置
WO2003032932A1 (fr) * 2001-10-12 2003-04-24 Phild Co., Ltd. Liquide de regeneration capillaire comprenant de l'eau dispersee avec des particules ultrafines d'un metal du groupe titane par une decharge de plasma sous eau et procede et systeme de production
JP2003243373A (ja) * 2002-02-20 2003-08-29 Hitachi High-Technologies Corp プラズマ処理装置とプラズマ処理装置用保護膜及びその取付け方法
WO2003096767A1 (fr) * 2002-05-08 2003-11-20 Chak Man Thomas Chang Formation de plasma dans un fluide

Cited By (26)

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Publication number Priority date Publication date Assignee Title
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US8607732B2 (en) 2008-03-07 2013-12-17 Kabushiki Kaisha Toyota Jidoshokki In-liquid plasma film-forming apparatus, electrode for in-liquid plasma, and film-forming method using in-liquid plasma
DE112009000734T5 (de) 2008-03-07 2011-04-14 Kabushiki Kaisha Toyota Jidoshokki Flüssigkeitsbasiertes Plasmaschichtausbildungsgerät, Elektrode für flüssigkeitsbasiertes Plasma, und Schichtausbildungsverfahren unter Verwendung von flüssigkeitsbasiertem Plasma
JP2010177002A (ja) * 2009-01-28 2010-08-12 Ehime Univ 液中プラズマ用電極、液中プラズマ発生装置および液中プラズマ発生方法
JP2011000504A (ja) * 2009-06-16 2011-01-06 Toyota Industries Corp 液中プラズマを用いた成膜方法および液中プラズマ成膜装置
JPWO2011099247A1 (ja) * 2010-02-10 2013-06-13 国立大学法人愛媛大学 液中プラズマ用電極、液中プラズマ発生装置およびプラズマ発生方法
JP2012014955A (ja) * 2010-06-30 2012-01-19 Nagoya Univ 液中プラズマ用電極および液中プラズマ装置
WO2012001936A1 (fr) * 2010-06-30 2012-01-05 国立大学法人名古屋大学 Électrode pour plasma submergé et dispositif à plasma submergé
WO2012070687A1 (fr) * 2010-11-25 2012-05-31 Jfeスチール株式会社 Procédé de fabrication d'un matériau métallique à traitement de surface
JP2012111998A (ja) * 2010-11-25 2012-06-14 Jfe Steel Corp 表面処理金属材料の製造方法
US8968839B2 (en) 2010-11-25 2015-03-03 Jfe Steel Corporation Method for producing surface-treated metallic material
WO2012147334A1 (fr) * 2011-04-28 2012-11-01 国立大学法人愛媛大学 Dispositif de fabrication de nanoparticules, procédé de fabrication de nanoparticules, nanoparticules, nanoparticules de zinc/oxyde de zinc et nanoparticules d'hydroxyde de magnésium
US9440213B2 (en) 2011-04-28 2016-09-13 National University Corporation Ehime University Nanometer-size-particle production apparatus, nanometer-size-particle production process, nanometer-size particles, zinc/zinc oxide nanometer-size particles, and magnesium hydroxide nanometer-size particles
US9943822B2 (en) 2011-04-28 2018-04-17 National University Corporation Ehime University Nanometer-size-particle production apparatus, nanometer-size-particle production process, nanometer-size particles, zinc/zinc oxide nanometer-size particles, and magnesium hydroxide nanometer-size particles
JP2013258159A (ja) * 2011-05-17 2013-12-26 Panasonic Corp プラズマ発生装置およびプラズマ発生方法
US9540262B2 (en) 2011-05-17 2017-01-10 Panasonic Intellectual Property Management Co., Ltd. Plasma generating apparatus and plasma generating method
WO2014017020A1 (fr) * 2012-07-24 2014-01-30 パナソニック株式会社 Dispositif de traitement de liquide et procédé de traitement de liquide
US9688549B2 (en) 2012-07-24 2017-06-27 Panasonic Intellectual Property Management Co., Ltd. Liquid treatment device and liquid treatment method
JP2014167880A (ja) * 2013-02-28 2014-09-11 Nagoya Univ 液中プラズマ用電極および液中プラズマ発生装置
JP2016531064A (ja) * 2013-06-19 2016-10-06 オブスチェストヴォ エス オグラニチェンノイ オトヴェットステヴェンノスチュ“プラズマ−エスケー” ナノスケールカーボンのコロイド溶液を製造する方法
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US10101275B2 (en) 2015-01-13 2018-10-16 Arkray, Inc. Plasma spectrochemical analysis method and plasma spectrochemical analyzer
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CN101112132A (zh) 2008-01-23
JPWO2006059808A1 (ja) 2008-06-05
US20090109141A1 (en) 2009-04-30
JP4909741B2 (ja) 2012-04-04
KR100934139B1 (ko) 2009-12-29
DE112005003029B4 (de) 2012-10-04
CN101112132B (zh) 2012-07-04
US8653404B2 (en) 2014-02-18
DE112005003029T5 (de) 2007-12-13

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