TWI660239B - 負型感光性樹脂組成物、樹脂硬化膜、隔壁及光學元件 - Google Patents
負型感光性樹脂組成物、樹脂硬化膜、隔壁及光學元件 Download PDFInfo
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- TWI660239B TWI660239B TW104123269A TW104123269A TWI660239B TW I660239 B TWI660239 B TW I660239B TW 104123269 A TW104123269 A TW 104123269A TW 104123269 A TW104123269 A TW 104123269A TW I660239 B TWI660239 B TW I660239B
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- SIUCRCTXWKUUCK-UHFFFAOYSA-N methane;3-sulfanylpropanoic acid Chemical compound C.OC(=O)CCS SIUCRCTXWKUUCK-UHFFFAOYSA-N 0.000 description 1
- IHHCJKNEVHNNMW-UHFFFAOYSA-N methane;phenol Chemical compound C.OC1=CC=CC=C1 IHHCJKNEVHNNMW-UHFFFAOYSA-N 0.000 description 1
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- 150000007522 mineralic acids Chemical class 0.000 description 1
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 239000004843 novolac epoxy resin Substances 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 239000012860 organic pigment Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 150000002918 oxazolines Chemical class 0.000 description 1
- 125000005702 oxyalkylene group Chemical group 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 125000001037 p-tolyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 1
- IGALFTFNPPBUDN-UHFFFAOYSA-N phenyl-[2,3,4,5-tetrakis(oxiran-2-ylmethyl)phenyl]methanediamine Chemical group C=1C(CC2OC2)=C(CC2OC2)C(CC2OC2)=C(CC2OC2)C=1C(N)(N)C1=CC=CC=C1 IGALFTFNPPBUDN-UHFFFAOYSA-N 0.000 description 1
- RPGWZZNNEUHDAQ-UHFFFAOYSA-N phenylphosphine Chemical group PC1=CC=CC=C1 RPGWZZNNEUHDAQ-UHFFFAOYSA-N 0.000 description 1
- 150000003017 phosphorus Chemical class 0.000 description 1
- FLKPEMZONWLCSK-UHFFFAOYSA-N phthalic acid di-n-ethyl ester Natural products CCOC(=O)C1=CC=CC=C1C(=O)OCC FLKPEMZONWLCSK-UHFFFAOYSA-N 0.000 description 1
- OXNIZHLAWKMVMX-UHFFFAOYSA-N picric acid Chemical compound OC1=C([N+]([O-])=O)C=C([N+]([O-])=O)C=C1[N+]([O-])=O OXNIZHLAWKMVMX-UHFFFAOYSA-N 0.000 description 1
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- 229920000767 polyaniline Polymers 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000007348 radical reaction Methods 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 239000001054 red pigment Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000009877 rendering Methods 0.000 description 1
- 230000001235 sensitizing effect Effects 0.000 description 1
- 239000010421 standard material Substances 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-O sulfonium Chemical compound [SH3+] RWSOTUBLDIXVET-UHFFFAOYSA-O 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 238000005211 surface analysis Methods 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- DUYAAUVXQSMXQP-UHFFFAOYSA-M thioacetate Chemical compound CC([S-])=O DUYAAUVXQSMXQP-UHFFFAOYSA-M 0.000 description 1
- 229940071127 thioglycolate Drugs 0.000 description 1
- CWERGRDVMFNCDR-UHFFFAOYSA-M thioglycolate(1-) Chemical compound [O-]C(=O)CS CWERGRDVMFNCDR-UHFFFAOYSA-M 0.000 description 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-M triflate Chemical compound [O-]S(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-M 0.000 description 1
- 239000013638 trimer Substances 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- RIOQSEWOXXDEQQ-UHFFFAOYSA-O triphenylphosphanium Chemical compound C1=CC=CC=C1[PH+](C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-O 0.000 description 1
- 239000012953 triphenylsulfonium Substances 0.000 description 1
- FAYMLNNRGCYLSR-UHFFFAOYSA-M triphenylsulfonium triflate Chemical compound [O-]S(=O)(=O)C(F)(F)F.C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 FAYMLNNRGCYLSR-UHFFFAOYSA-M 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0382—Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/12—Light sources with substantially two-dimensional radiating surfaces
- H05B33/22—Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
- H10K71/13—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
- H10K71/135—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing using ink-jet printing
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Manufacturing & Machinery (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- Ceramic Engineering (AREA)
- Materials For Photolithography (AREA)
- Electroluminescent Light Sources (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014148345 | 2014-07-18 | ||
| JP2014-148345 | 2014-07-18 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201619694A TW201619694A (zh) | 2016-06-01 |
| TWI660239B true TWI660239B (zh) | 2019-05-21 |
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| TW104123269A TWI660239B (zh) | 2014-07-18 | 2015-07-17 | 負型感光性樹脂組成物、樹脂硬化膜、隔壁及光學元件 |
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| Country | Link |
|---|---|
| JP (1) | JP6536578B2 (ko) |
| KR (1) | KR102411740B1 (ko) |
| CN (1) | CN106662815B (ko) |
| TW (1) | TWI660239B (ko) |
| WO (1) | WO2016010077A1 (ko) |
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| KR102622857B1 (ko) * | 2017-02-09 | 2024-01-10 | 동우 화인켐 주식회사 | 유기발광소자 및 양자점발광소자의 화소정의막 형성용 흑색 감광성 수지 조성물 |
| KR20190116307A (ko) * | 2017-02-21 | 2019-10-14 | 니폰 제온 가부시키가이샤 | 네거티브형 감광성 수지 조성물 |
| KR102469945B1 (ko) * | 2017-07-14 | 2022-11-23 | 삼성디스플레이 주식회사 | 표시 장치 및 그 제조방법 |
| KR102146095B1 (ko) * | 2017-09-15 | 2020-08-19 | 주식회사 엘지화학 | 화학증폭형 포토레지스트 조성물, 포토레지스트 패턴, 및 포토레지스트 패턴 제조방법 |
| CN110412829A (zh) * | 2018-04-26 | 2019-11-05 | 东友精细化工有限公司 | 负型感光性树脂组合物、光固化图案及图像显示装置 |
| KR102311491B1 (ko) * | 2019-02-13 | 2021-10-08 | 삼성에스디아이 주식회사 | 2중층 격벽 조성물, 이를 이용한 2중층 격벽 및 2중층 격벽을 포함하는 디스플레이 소자 |
| CN111752097A (zh) * | 2019-03-29 | 2020-10-09 | 常州强力电子新材料股份有限公司 | 自发光感光性树脂组合物、彩色滤光片和图像显示装置 |
| KR20200135682A (ko) | 2019-05-24 | 2020-12-03 | 삼성디스플레이 주식회사 | 디스플레이 장치 및 그 제조방법 |
| JPWO2021177253A1 (ko) * | 2020-03-04 | 2021-09-10 | ||
| KR20210121917A (ko) * | 2020-03-31 | 2021-10-08 | 동우 화인켐 주식회사 | 광변환 잉크 조성물, 컬러필터 및 화상표시장치 |
| KR20230096006A (ko) | 2020-10-28 | 2023-06-29 | 샌트랄 글래스 컴퍼니 리미티드 | 함불소 수지, 발액제, 감광성 수지 조성물, 경화물 및 디스플레이 |
| WO2022210797A1 (ja) * | 2021-03-29 | 2022-10-06 | 株式会社カネカ | ネガ型感光性組成物、光半導体装置、固体撮像装置、及び電子機器 |
| CN114203748A (zh) * | 2021-12-10 | 2022-03-18 | Tcl华星光电技术有限公司 | 显示面板以及其制造方法 |
| KR20240002709A (ko) | 2022-06-29 | 2024-01-05 | 샌트랄 글래스 컴퍼니 리미티드 | 감광성 수지 조성물, 수지막, 경화물, 격벽, 유기 전계발광 소자, 파장 변환층, 디스플레이, 경화물의 제조 방법 및 격벽의 제조 방법 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007002194A (ja) * | 2005-06-27 | 2007-01-11 | Nippon Kayaku Co Ltd | フッ素含有ポリシロキサン、それを用いる感光性樹脂組成物及びその硬化物 |
| JP2009003442A (ja) * | 2007-05-23 | 2009-01-08 | Mitsubishi Chemicals Corp | 感光性樹脂組成物、液晶配向制御突起、スペーサー、カラーフィルター及び画像表示装置 |
| WO2012086610A1 (ja) * | 2010-12-20 | 2012-06-28 | 旭硝子株式会社 | 感光性樹脂組成物、隔壁、カラーフィルタおよび有機ｅｌ素子 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4609071B2 (ja) * | 2002-11-06 | 2011-01-12 | 旭硝子株式会社 | 隔壁を製造する方法及び隔壁 |
| JP2004277494A (ja) * | 2003-03-13 | 2004-10-07 | Asahi Glass Co Ltd | 含フッ素樹脂および感光性樹脂組成物 |
| JP4474991B2 (ja) * | 2004-04-27 | 2010-06-09 | 旭硝子株式会社 | レジスト組成物及びその塗膜 |
| JP4809006B2 (ja) * | 2005-07-05 | 2011-11-02 | 太陽ホールディングス株式会社 | 着色感光性樹脂組成物及びその硬化物 |
| JP2009251392A (ja) * | 2008-04-08 | 2009-10-29 | Fujifilm Corp | ネガ型レジスト組成物及びパターン形成方法 |
| CN102105823A (zh) * | 2008-07-30 | 2011-06-22 | 旭硝子株式会社 | 形成有间隔壁和像素的基板的制造方法 |
| JP2011048064A (ja) * | 2009-08-26 | 2011-03-10 | Asahi Kasei E-Materials Corp | 感光性樹脂組成物及び積層体、並びにこれを用いた電磁波シールド及び透明導電性基板 |
| JP2012014931A (ja) | 2010-06-30 | 2012-01-19 | Sanyo Chem Ind Ltd | 感光性樹脂組成物 |
| JP5562739B2 (ja) * | 2010-06-30 | 2014-07-30 | 三洋化成工業株式会社 | 感光性樹脂組成物 |
| JP2012185430A (ja) * | 2011-03-08 | 2012-09-27 | Sumitomo Chemical Co Ltd | 着色硬化性樹脂組成物 |
| JP2013167687A (ja) * | 2012-02-14 | 2013-08-29 | Mitsubishi Chemicals Corp | 感光性着色樹脂組成物、及びカラーフィルタ、及び液晶表示装置 |
| KR102107962B1 (ko) * | 2012-11-28 | 2020-05-07 | 에이지씨 가부시키가이샤 | 네거티브형 감광성 수지 조성물, 수지 경화막, 격벽 및 광학 소자 |
-
2015
- 2015-07-15 KR KR1020177001713A patent/KR102411740B1/ko active IP Right Grant
- 2015-07-15 CN CN201580038938.5A patent/CN106662815B/zh active Active
- 2015-07-15 JP JP2016534467A patent/JP6536578B2/ja active Active
- 2015-07-15 WO PCT/JP2015/070289 patent/WO2016010077A1/ja active Application Filing
- 2015-07-17 TW TW104123269A patent/TWI660239B/zh active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007002194A (ja) * | 2005-06-27 | 2007-01-11 | Nippon Kayaku Co Ltd | フッ素含有ポリシロキサン、それを用いる感光性樹脂組成物及びその硬化物 |
| JP2009003442A (ja) * | 2007-05-23 | 2009-01-08 | Mitsubishi Chemicals Corp | 感光性樹脂組成物、液晶配向制御突起、スペーサー、カラーフィルター及び画像表示装置 |
| WO2012086610A1 (ja) * | 2010-12-20 | 2012-06-28 | 旭硝子株式会社 | 感光性樹脂組成物、隔壁、カラーフィルタおよび有機ｅｌ素子 |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2016010077A1 (ja) | 2016-01-21 |
| KR20170032318A (ko) | 2017-03-22 |
| CN106662815B (zh) | 2020-06-16 |
| JP6536578B2 (ja) | 2019-07-03 |
| CN106662815A (zh) | 2017-05-10 |
| JPWO2016010077A1 (ja) | 2017-04-27 |
| KR102411740B1 (ko) | 2022-06-21 |
| TW201619694A (zh) | 2016-06-01 |
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