JPWO2021177253A1 - - Google Patents
Info
- Publication number
- JPWO2021177253A1 JPWO2021177253A1 JP2022504367A JP2022504367A JPWO2021177253A1 JP WO2021177253 A1 JPWO2021177253 A1 JP WO2021177253A1 JP 2022504367 A JP2022504367 A JP 2022504367A JP 2022504367 A JP2022504367 A JP 2022504367A JP WO2021177253 A1 JPWO2021177253 A1 JP WO2021177253A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/22—Exposing sequentially with the same light pattern different positions of the same surface
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/12—Light sources with substantially two-dimensional radiating surfaces
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2020037173 | 2020-03-04 | ||
PCT/JP2021/007785 WO2021177253A1 (ja) | 2020-03-04 | 2021-03-01 | ポジ型感光性樹脂組成物 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPWO2021177253A1 true JPWO2021177253A1 (ko) | 2021-09-10 |
Family
ID=77614271
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2022504367A Withdrawn JPWO2021177253A1 (ko) | 2020-03-04 | 2021-03-01 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JPWO2021177253A1 (ko) |
KR (1) | KR20220149673A (ko) |
CN (1) | CN115176201A (ko) |
TW (1) | TW202141188A (ko) |
WO (1) | WO2021177253A1 (ko) |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5310051B2 (ja) | 2009-02-12 | 2013-10-09 | Jsr株式会社 | 感放射線性組成物、マイクロレンズおよびその形成方法 |
KR20160044059A (ko) * | 2012-04-27 | 2016-04-22 | 후지필름 가부시키가이샤 | 화학 증폭형 포지티브형 감광성 수지 조성물, 경화막의 제조 방법, 경화막, 유기 el 표시 장치 및 액정 표시 장치 |
KR102411740B1 (ko) * | 2014-07-18 | 2022-06-21 | 에이지씨 가부시키가이샤 | 네거티브형 감광성 수지 조성물, 수지 경화막, 격벽 및 광학 소자 |
JP6506184B2 (ja) * | 2016-01-21 | 2019-04-24 | 富士フイルム株式会社 | 感光性樹脂組成物、硬化物の製造方法、硬化膜、表示装置、及び、タッチパネル |
JP7075243B2 (ja) * | 2018-02-28 | 2022-05-25 | 太陽ホールディングス株式会社 | 感光性樹脂組成物、ドライフィルム、硬化物、および電子部品 |
-
2021
- 2021-03-01 CN CN202180016628.9A patent/CN115176201A/zh not_active Withdrawn
- 2021-03-01 WO PCT/JP2021/007785 patent/WO2021177253A1/ja active Application Filing
- 2021-03-01 KR KR1020227030030A patent/KR20220149673A/ko unknown
- 2021-03-01 JP JP2022504367A patent/JPWO2021177253A1/ja not_active Withdrawn
- 2021-03-04 TW TW110107716A patent/TW202141188A/zh unknown
Also Published As
Publication number | Publication date |
---|---|
KR20220149673A (ko) | 2022-11-08 |
CN115176201A (zh) | 2022-10-11 |
TW202141188A (zh) | 2021-11-01 |
WO2021177253A1 (ja) | 2021-09-10 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20230807 |
|
A761 | Written withdrawal of application |
Free format text: JAPANESE INTERMEDIATE CODE: A761 Effective date: 20240208 |