TWI597773B - 電漿處理裝置及電漿處理方法 - Google Patents

電漿處理裝置及電漿處理方法 Download PDF

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Publication number
TWI597773B
TWI597773B TW101145748A TW101145748A TWI597773B TW I597773 B TWI597773 B TW I597773B TW 101145748 A TW101145748 A TW 101145748A TW 101145748 A TW101145748 A TW 101145748A TW I597773 B TWI597773 B TW I597773B
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Taiwan
Prior art keywords
fluoride
plasma
processing apparatus
plasma processing
processing container
Prior art date
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TW101145748A
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English (en)
Chinese (zh)
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TW201342462A (zh
Inventor
Masaru Nishino
Masatsugu Makabe
Nobuyuki Nagayama
Tatsuya Handa
Ryotaro Midorikawa
Keigo Kobayashi
Tetsuya Niya
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Tokyo Electron Ltd
Tocalo Co Ltd
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Publication of TW201342462A publication Critical patent/TW201342462A/zh
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Publication of TWI597773B publication Critical patent/TWI597773B/zh

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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/46Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32458Vessel
    • H01J37/32477Vessel characterised by the means for protecting vessels or internal parts, e.g. coatings
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32458Vessel
    • H01J37/32477Vessel characterised by the means for protecting vessels or internal parts, e.g. coatings
    • H01J37/32495Means for protecting the vessel against plasma

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
TW101145748A 2011-12-05 2012-12-05 電漿處理裝置及電漿處理方法 TWI597773B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2011265897 2011-12-05
JP2012259114A JP6034156B2 (ja) 2011-12-05 2012-11-27 プラズマ処理装置及びプラズマ処理方法

Publications (2)

Publication Number Publication Date
TW201342462A TW201342462A (zh) 2013-10-16
TWI597773B true TWI597773B (zh) 2017-09-01

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TW101145748A TWI597773B (zh) 2011-12-05 2012-12-05 電漿處理裝置及電漿處理方法

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US (1) US8896210B2 (enExample)
JP (1) JP6034156B2 (enExample)
KR (1) KR101903831B1 (enExample)
CN (1) CN103959447B (enExample)
SG (1) SG11201402768WA (enExample)
TW (1) TWI597773B (enExample)
WO (1) WO2013084902A1 (enExample)

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