TWI586833B - 無電解白金電鍍液 - Google Patents
無電解白金電鍍液 Download PDFInfo
- Publication number
- TWI586833B TWI586833B TW105106086A TW105106086A TWI586833B TW I586833 B TWI586833 B TW I586833B TW 105106086 A TW105106086 A TW 105106086A TW 105106086 A TW105106086 A TW 105106086A TW I586833 B TWI586833 B TW I586833B
- Authority
- TW
- Taiwan
- Prior art keywords
- platinum
- electroless
- plating solution
- platinum plating
- acid
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/42—Coating with noble metals
- C23C18/44—Coating with noble metals using reducing agents
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemically Coating (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015203809A JP6352879B2 (ja) | 2015-10-15 | 2015-10-15 | 無電解白金めっき液 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201713798A TW201713798A (zh) | 2017-04-16 |
TWI586833B true TWI586833B (zh) | 2017-06-11 |
Family
ID=58518047
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW105106086A TWI586833B (zh) | 2015-10-15 | 2016-03-01 | 無電解白金電鍍液 |
Country Status (5)
Country | Link |
---|---|
US (1) | US20180305819A1 (ja) |
EP (1) | EP3363928A4 (ja) |
JP (1) | JP6352879B2 (ja) |
TW (1) | TWI586833B (ja) |
WO (1) | WO2017064874A1 (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3626857A4 (en) | 2017-05-18 | 2021-07-14 | Japan Pure Chemical Co., Ltd. | SOLUTION FOR PLATING AUTOCATALYTIC PLATES AND PLATINUM FILM OBTAINED WITH THE SAID SOLUTION |
DE102018126804B4 (de) * | 2018-10-26 | 2020-09-24 | RF360 Europe GmbH | Verfahren zur Herstellung eines elektroakustischen Resonators und elektroakustische Resonatorvorrichtung |
JP6572376B1 (ja) | 2018-11-30 | 2019-09-11 | 上村工業株式会社 | 無電解めっき浴 |
KR102293808B1 (ko) * | 2019-12-02 | 2021-08-24 | (재)한국건설생활환경시험연구원 | 무전해 백금 도금액 조성물 및 이를 이용한 도금방법 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW200745377A (en) * | 2006-03-28 | 2007-12-16 | Nippon Chemical Ind | Conductive powder plated by electroless plating and process for producing the same |
TW201346326A (zh) * | 2012-02-28 | 2013-11-16 | Asahi Glass Co Ltd | 電潤濕裝置、顯示裝置、透鏡(二) |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5412435B2 (ja) * | 1971-11-22 | 1979-05-23 | ||
JPS54117329A (en) * | 1978-03-06 | 1979-09-12 | Ngk Spark Plug Co | Electroless plating method |
JPH01319683A (ja) * | 1988-06-20 | 1989-12-25 | Electroplating Eng Of Japan Co | 白金コロイド溶液及びそれを用いた無電解白金メッキ方法ならびに白金担持体の製法 |
US5041196A (en) * | 1989-12-26 | 1991-08-20 | Olin Corporation | Electrochemical method for producing chlorine dioxide solutions |
JP3101061B2 (ja) * | 1992-02-14 | 2000-10-23 | 日本エレクトロプレイテイング・エンジニヤース株式会社 | 白金無電解めっき浴及びそれを用いた白金めっき品の製造方法 |
DE10048844A1 (de) * | 2000-10-02 | 2002-04-11 | Basf Ag | Verfahren zur Herstellung von Platinmetall-Katalysatoren |
US8317910B2 (en) * | 2010-03-22 | 2012-11-27 | Unity Semiconductor Corporation | Immersion platinum plating solution |
DE102014006739B3 (de) * | 2014-05-12 | 2015-06-25 | Albert-Ludwigs-Universität Freiburg | Verfahren zur Beschichtung von Oberflächen mit Nanostrukturen, nach dem Verfahren her- gestelltes Bauteil und Verwendung des Bauteils |
-
2015
- 2015-10-15 JP JP2015203809A patent/JP6352879B2/ja active Active
-
2016
- 2016-02-29 US US15/767,817 patent/US20180305819A1/en not_active Abandoned
- 2016-02-29 EP EP16855128.1A patent/EP3363928A4/en active Pending
- 2016-02-29 WO PCT/JP2016/056047 patent/WO2017064874A1/ja active Application Filing
- 2016-03-01 TW TW105106086A patent/TWI586833B/zh not_active IP Right Cessation
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW200745377A (en) * | 2006-03-28 | 2007-12-16 | Nippon Chemical Ind | Conductive powder plated by electroless plating and process for producing the same |
TW201346326A (zh) * | 2012-02-28 | 2013-11-16 | Asahi Glass Co Ltd | 電潤濕裝置、顯示裝置、透鏡(二) |
Also Published As
Publication number | Publication date |
---|---|
EP3363928A1 (en) | 2018-08-22 |
US20180305819A1 (en) | 2018-10-25 |
TW201713798A (zh) | 2017-04-16 |
WO2017064874A1 (ja) | 2017-04-20 |
JP6352879B2 (ja) | 2018-07-04 |
EP3363928A4 (en) | 2019-06-19 |
JP2017075379A (ja) | 2017-04-20 |
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Legal Events
Date | Code | Title | Description |
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MC4A | Revocation of granted patent |