TWI476356B - Heat treatment device - Google Patents
Heat treatment device Download PDFInfo
- Publication number
- TWI476356B TWI476356B TW097119342A TW97119342A TWI476356B TW I476356 B TWI476356 B TW I476356B TW 097119342 A TW097119342 A TW 097119342A TW 97119342 A TW97119342 A TW 97119342A TW I476356 B TWI476356 B TW I476356B
- Authority
- TW
- Taiwan
- Prior art keywords
- gas
- heat treatment
- pipe
- introduction
- heat
- Prior art date
Links
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B17/00—Furnaces of a kind not covered by any preceding group
- F27B17/0016—Chamber type furnaces
- F27B17/0025—Especially adapted for treating semiconductor wafers
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B17/00—Furnaces of a kind not covered by any preceding group
- F27B17/0016—Chamber type furnaces
- F27B17/0083—Chamber type furnaces with means for circulating the atmosphere
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D7/00—Forming, maintaining, or circulating atmospheres in heating chambers
- F27D7/02—Supplying steam, vapour, gases, or liquids
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D7/00—Forming, maintaining, or circulating atmospheres in heating chambers
- F27D7/04—Circulating atmospheres by mechanical means
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D7/00—Forming, maintaining, or circulating atmospheres in heating chambers
- F27D7/02—Supplying steam, vapour, gases, or liquids
- F27D2007/023—Conduits
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D7/00—Forming, maintaining, or circulating atmospheres in heating chambers
- F27D7/04—Circulating atmospheres by mechanical means
- F27D2007/045—Fans
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Waste-Gas Treatment And Other Accessory Devices For Furnaces (AREA)
- Furnace Details (AREA)
- Gas-Filled Discharge Tubes (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007141427A JP4589941B2 (ja) | 2007-05-29 | 2007-05-29 | 熱処理装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200907269A TW200907269A (en) | 2009-02-16 |
TWI476356B true TWI476356B (zh) | 2015-03-11 |
Family
ID=40105675
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW097119342A TWI476356B (zh) | 2007-05-29 | 2008-05-26 | Heat treatment device |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4589941B2 (ja) |
KR (1) | KR101450902B1 (ja) |
CN (1) | CN101314516B (ja) |
TW (1) | TWI476356B (ja) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010144939A (ja) * | 2008-12-16 | 2010-07-01 | Tohoku Univ | 循環式の基板焼成炉 |
TWI404955B (zh) * | 2009-02-23 | 2013-08-11 | Yang Electronic Systems Co Ltd | 平板顯示器基材電性測試中使用的冷卻和防濕設備 |
JP5639262B2 (ja) * | 2011-04-14 | 2014-12-10 | シャープ株式会社 | 表示パネル用基板の製造装置 |
JP6855687B2 (ja) * | 2015-07-29 | 2021-04-07 | 東京エレクトロン株式会社 | 基板処理装置、基板処理方法及び基板処理装置のメンテナンス方法及び記憶媒体 |
CA3008497A1 (en) * | 2016-11-29 | 2018-06-07 | Yue Zhang | Hot-air oxygen-free brazing system |
KR102012158B1 (ko) * | 2019-05-13 | 2019-08-20 | 정영문 | 환경조절장치 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07100422A (ja) * | 1993-10-02 | 1995-04-18 | Osaka Gas Co Ltd | 塗装乾燥炉 |
TWI323332B (en) * | 2003-04-14 | 2010-04-11 | Koyo Thermo Sys Co Ltd | Continuous kiln with unit of dealing with discharge gas |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2222050B2 (de) * | 1972-05-05 | 1975-08-21 | Leybold-Heraeus Gmbh & Co Kg, 5000 Koeln | Verfahren und Vorrichtung zum Vakuumsintern von Kohlenwasserstoffe enthaltenden Preßkorpern aus pulverformigen Ausgangsstoffen |
JPH0424576Y2 (ja) * | 1985-01-29 | 1992-06-10 | ||
JPH03420U (ja) * | 1989-05-25 | 1991-01-07 | ||
JPH059556A (ja) * | 1991-07-02 | 1993-01-19 | Daido Steel Co Ltd | 熱処理炉の送気方法 |
JP3000420U (ja) * | 1994-01-25 | 1994-08-09 | 日本電熱計器株式会社 | はんだ付け装置における雰囲気の冷却装置 |
JP3959141B2 (ja) * | 1996-11-12 | 2007-08-15 | エスペック株式会社 | 昇華物対策付き熱処理装置 |
JP2001201271A (ja) * | 2000-01-24 | 2001-07-27 | Shinko Mex Co Ltd | 銅の縦型溶解炉における排ガス処理システム |
JP4402846B2 (ja) * | 2001-02-20 | 2010-01-20 | 中外炉工業株式会社 | 平面ガラス基板用連続式焼成炉 |
JP2002257314A (ja) * | 2001-03-02 | 2002-09-11 | Ngk Insulators Ltd | 熱風発生装置 |
JP2003158082A (ja) * | 2001-11-22 | 2003-05-30 | Hitachi Ltd | 基板処理装置 |
JP2003229425A (ja) * | 2002-02-05 | 2003-08-15 | Hitachi Kokusai Electric Inc | 基板処理装置 |
JP4111269B2 (ja) * | 2002-12-19 | 2008-07-02 | 株式会社日立国際電気 | 基板処理装置 |
JP2004206983A (ja) * | 2002-12-25 | 2004-07-22 | Pioneer Electronic Corp | プラズマディスプレイパネルの製造方法及び熱処理装置 |
CN100501287C (zh) * | 2003-01-25 | 2009-06-17 | 北京环能海臣科技有限公司 | 一种物料脱水干燥回收冷凝水热气体循环回用装置 |
JP2005037024A (ja) * | 2003-07-18 | 2005-02-10 | Matsushita Electric Ind Co Ltd | プラズマディスプレイパネルの焼成炉 |
JP4098179B2 (ja) * | 2003-07-30 | 2008-06-11 | 日本碍子株式会社 | 熱処理炉 |
JP2005071632A (ja) * | 2003-08-25 | 2005-03-17 | Fujitsu Hitachi Plasma Display Ltd | プラズマディスプレイパネルの製造方法及びその装置 |
JP2007085702A (ja) * | 2005-09-26 | 2007-04-05 | Espec Corp | ガラス基板処理装置、ガラス基板処理システム及びガラス基板処理方法 |
JP4291832B2 (ja) * | 2006-06-23 | 2009-07-08 | 株式会社フューチャービジョン | 基板焼成炉の給排気システム |
JP4372806B2 (ja) * | 2006-07-13 | 2009-11-25 | エスペック株式会社 | 熱処理装置 |
JP4331784B2 (ja) * | 2008-07-22 | 2009-09-16 | 株式会社フューチャービジョン | 基板焼成炉の給排気方法 |
-
2007
- 2007-05-29 JP JP2007141427A patent/JP4589941B2/ja active Active
-
2008
- 2008-05-26 KR KR1020080048563A patent/KR101450902B1/ko active IP Right Grant
- 2008-05-26 CN CN2008101001260A patent/CN101314516B/zh active Active
- 2008-05-26 TW TW097119342A patent/TWI476356B/zh active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07100422A (ja) * | 1993-10-02 | 1995-04-18 | Osaka Gas Co Ltd | 塗装乾燥炉 |
TWI323332B (en) * | 2003-04-14 | 2010-04-11 | Koyo Thermo Sys Co Ltd | Continuous kiln with unit of dealing with discharge gas |
Also Published As
Publication number | Publication date |
---|---|
TW200907269A (en) | 2009-02-16 |
KR101450902B1 (ko) | 2014-10-14 |
CN101314516A (zh) | 2008-12-03 |
CN101314516B (zh) | 2012-05-30 |
JP4589941B2 (ja) | 2010-12-01 |
JP2008298300A (ja) | 2008-12-11 |
KR20080104972A (ko) | 2008-12-03 |
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