TW200907269A - Heat treatment device - Google Patents

Heat treatment device Download PDF

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Publication number
TW200907269A
TW200907269A TW097119342A TW97119342A TW200907269A TW 200907269 A TW200907269 A TW 200907269A TW 097119342 A TW097119342 A TW 097119342A TW 97119342 A TW97119342 A TW 97119342A TW 200907269 A TW200907269 A TW 200907269A
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TW
Taiwan
Prior art keywords
gas
heat treatment
heat
tube
heater
Prior art date
Application number
TW097119342A
Other languages
Chinese (zh)
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TWI476356B (en
Inventor
Hisamitsu Tezen
Original Assignee
Espec Corp
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Publication of TWI476356B publication Critical patent/TWI476356B/en

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Classifications

    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27BFURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B17/00Furnaces of a kind not covered by any preceding group
    • F27B17/0016Chamber type furnaces
    • F27B17/0025Especially adapted for treating semiconductor wafers
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27BFURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B17/00Furnaces of a kind not covered by any preceding group
    • F27B17/0016Chamber type furnaces
    • F27B17/0083Chamber type furnaces with means for circulating the atmosphere
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27DDETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D7/00Forming, maintaining, or circulating atmospheres in heating chambers
    • F27D7/02Supplying steam, vapour, gases, or liquids
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27DDETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D7/00Forming, maintaining, or circulating atmospheres in heating chambers
    • F27D7/04Circulating atmospheres by mechanical means
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27DDETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D7/00Forming, maintaining, or circulating atmospheres in heating chambers
    • F27D7/02Supplying steam, vapour, gases, or liquids
    • F27D2007/023Conduits
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27DDETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D7/00Forming, maintaining, or circulating atmospheres in heating chambers
    • F27D7/04Circulating atmospheres by mechanical means
    • F27D2007/045Fans

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Waste-Gas Treatment And Other Accessory Devices For Furnaces (AREA)
  • Furnace Details (AREA)
  • Gas-Filled Discharge Tubes (AREA)

Abstract

This invention provides a heat processing device, which is able to prevent cleaning the heat processing part under the condition that the blower or heater has a fault, including: a heat processing part including a gas introducing part and a gas exporting part respectively connected with a heating chamber; the heat processing chamber is used for accepting an object processed by heat heated processed object which can be taken out from the heat processing chamber; and a gas processing part including a gas passage used for introducing the gas for heat processing to the gas introducing part and exporting the gas after heat processing from the gas exporting part; the gas passage is provided with a catalysis exporting the gas after heat processing from the gas exporting part; ; the gas passage is provided with a catalyst decomposed to the sublimation generated from the object processed by heat when the object processed by heat is processed the heat processing; a heater used for at least heating the catalyst; and a blower. This invention includes a flange for connection, a bolt and a nut which are used for disassembly connecting the gas passage relative to the gas introducing part and the gas exporting part of the heat processing part.

Description

200907269 九、發明說明: 【發明所屬之技術領域】 本發明有關對被熱處理物進行熱處理的熱處理裝置。 【先前技術】 以往的熱處理裝置,一邊使熱處理室内的空氣發生迴 圈一邊對熱處理室内進行加熱,由此對收容於熱處理室内 的被熱處理物進行熱處理。這種熱處理裝置例如在平板顯 不器(FPD : Flat Display panel)的製造過程中用於對 光刻膠或有機薄膜的預烘(pre_bake )工序、後烘 (post-bake)工序。在這些工序中,對玻璃基板等被熱 處理物進行熱處理時,光刻膠等中所含有的揮發性成分氣 化,生成大量昇華物,存在上述昇華物重新結晶,飛散或 附著到熱處理裝置内等的問題。 作為解決上述問題的斟笛 μ 對朿’例如日本專利公開公報特 開平1 0 — 141 868號中公開這樣— ^ 裡万案,即,一邊將外 部氣體加熱並送入上述献處 、 内的空氣經導出管排出二邊…熱處理室 如此對熱處理室内進行換氣制::至内進灯換亂。 著到熱處理裝置内。 卩制幵華物重新結晶並附 然而,在日本專利公開公報 的熱處理褒置中,由於在熱處理^ k '141 868號公報 設置有氣體處理部,職㈣^广卜壁和熱處理室之間 氣在熱處理室的内外迴圈 。具有加熱器及用於使空 圈的政風機’其中存在的問題是,200907269 IX. Description of the Invention: [Technical Field of the Invention] The present invention relates to a heat treatment apparatus for heat-treating a material to be heat-treated. [Prior Art] In the conventional heat treatment apparatus, the heat-treated room is heated while the air in the heat treatment chamber is recirculated, thereby heat-treating the object to be heat-treated in the heat treatment chamber. Such a heat treatment apparatus is used, for example, in a pre-bake process or a post-bake process of a photoresist or an organic film in the process of manufacturing a flat panel display (FPD: Flat Display Panel). In the heat treatment of the heat-treated material such as a glass substrate, the volatile component contained in the photoresist or the like is vaporized to generate a large amount of sublimate, and the sublimate is recrystallized, scattered or adhered to the heat treatment apparatus. The problem. As disclosed in Japanese Laid-Open Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. The two sides of the outlet tube are discharged... The heat treatment chamber is thus ventilated in the heat treatment chamber:: the inner lamp is replaced. Into the heat treatment device. In the heat treatment apparatus of the Japanese Patent Laid-Open Publication No. ko. No. s. 868, the gas treatment section is provided, and the gas is interposed between the wall and the heat treatment chamber. Loop inside and outside the heat treatment chamber. A problem with a heater and a political fan for making an air gap is that

2014-9695-PF 200907269 況下'f 附者在熱處理室的内壁等的昇華物的情 ,,因清洗用的清洗液,可能使上述氣體 機或加熱器等電氣設備出現故障。 卩的豉風 【發明内容】 +本么明的目的在於提供一種熱處理裝置,可以在 鼓風機或加熱器出現故障的觖能 理室内。 ”早的狀態下洗熱處理部的熱處 本發明提供的熱處理裝置包括:熱處理部,呈有八 ,熱處理室連通的氣體導人部及氣體導出部,上述熱= 至用於收容被熱處理物’該所收容的被熱處理物可從上述 熱處理室取出;以及氣體處理部,具有氣體通道,节氣體 通道用於㈣處理“體導人到上述氣㈣人部,並從上 述氣體導出部導出進行熱處理後的氣體,其中,在上述氣 體通道中設置有:催化劑,分解在對上述被熱處理物進: 熱處理時從該被熱處理物產生的 熱上述催化劑;以及-個或兩個以上的鼓風機將::: 處理用氣體及上述進行熱處理後的氣體向規定方向引 導。由此,可以在防止鼓風嫩忐I„山。 匕械次加熱益出現故障的狀態 下’清洗熱處理部的熱處理室内。 【實施方式】 以下’參照附圖對本發明的車交佳實施例進行詳細的 明。 、’ 2014-9695-PF 6 200907269 (第一實施例) 圖1是本發明第—實施例所有 圖。該熱處理裝置1A例如用 理裳置的簡 是設置於無塵室(clean :不器的製造工序, oven)。 )内的所謂潔淨供箱ulean …、處理裝置1A包括熱處理部丨 埶處理邱m目士 M 丨及虱體處理部20A。 ..,、处理邛10具有用於收容被埶處 W的劫“ …爽理物(以下也稱為工件、 u理室η,該被熱處理物 ’ 中敢屮。々规士 J以從该熱處理室1 1 甲取出。軋體處理部20具有氣體補、苦〇1 另札體通遏21A,該氣體诵诸 21A用於從熱處理室η導出 、…走 至U導出進仃熱處理後的氣體(例如, 進仃熱處理後的空氣),並且 盯…知理用軋體(例如,加 熱用空氣)導入到熱處理部1。的熱處理室U内。 熱處理部10具有:氣辦填_入都 ,轧體導入部12 ,用於從氣體處理 部20A導入熱處理用氣體· w轧骽’ U及軋體導出部13,用於從熱 处至11 V出進行熱處理後的氣體。熱處理冑} ^的外側 由隔熱壁11a圍繞。 在熱處理t 11的内側設置有保持部件(未圖示 該保持部件例如可以將一個或兩個以上的被熱處理物评支 撐並保持在規定狀態。保持部件設置於圖1中雙點劃線所 不的位置上。上述氣體導入部丨2呈管狀,從熱處理室工i 的隔熱壁11 a向外延伸,並與熱處理室丨丨連通。該氣體 導入部1 2的進氣側端上設置有連接用凸緣14。上述氣體 ‘出部1 3也呈管狀,從熱處理室11的隔熱壁11 a向外延 伸’並與熱處理室1丨連通。該氣體導出部丨3的出氣側端 2014-9695-PF 7 200907269 上设置有連接用凸緣15。 氣體通道21A具有:導入管 ⑴導出管23,連接於氣體導氣體導入部 設置于導入管22與導出管23之^二及载體處理管 氣側端上設置有連接用凸緣 ¥入官22的出 導入…連接用凸緣“相連接 與氣體 端上設置有連接用凸緣26 , & 23的進氣側 部崎接用凸㈣相連:二:26與氣體導出 _接…的凸緣二:部r= Η,並例如用螺栓、螺母等連 二 12的凸緣 緣26和氣體導出部心^ 15 ^接導^ 23的凸 …爾理室u與氣體處理::::以連接熱處理部 這些連通,形成迴圈通道。並^ =體通道^並使 .w . 在氣體通道21A的適當 位置上§又置有用於調整風量的震動器(未圖示卜 f 述氣體處理管24中設置有催化劑 (灿㈣:觸媒)3G、加熱器3卜鼓風機32以及前處 理劑33。鼓風機32用於使空氣在上述迴圈通道内迴圈, 加熱'31用於加熱催化劑30及空氣。由加熱器31加孰 後的空氣經過導人管22進人熱處理室u,在_理^ 内加熱被熱處理物w。力冷# ^# 在進灯加熱该被熱處理物W的埶處 理時,會從被熱處理物w產生昇華物。進行熱處理後的空 氣中含有上述昇華物’該含有昇華物的空氣經過上述氣體 導出部13及上述導出管23流經催化劑30。 催化劑30用於促進進行熱處理後的空氣中含有的昇2014-9695-PF 200907269 In the case of the sublimation of the inner wall of the heat treatment chamber, the cleaning liquid for cleaning may cause malfunction of electrical equipment such as the above gas generator or heater. Hurricane hurricane [Summary] The purpose of the present invention is to provide a heat treatment apparatus which can be used in a 觖 energy chamber where a blower or a heater fails. "The heat treatment unit of the heat treatment unit in the early state" The heat treatment apparatus provided by the present invention comprises: a heat treatment portion having eight gas conduction portions and a gas discharge portion in communication with the heat treatment chamber, and the heat = for accommodating the heat-treated material' The heat-treated material contained therein is taken out from the heat treatment chamber; and the gas treatment portion has a gas passage for (4) processing the body guide to the gas (four) human portion, and is subjected to heat treatment from the gas discharge portion. a gas in which the catalyst is disposed in the gas passage, and decomposes in the heat treatment; the catalyst generated from the heat-treated material during heat treatment; and - or more than two blowers: : The processing gas and the gas after the heat treatment described above are guided in a predetermined direction. Therefore, the heat treatment chamber of the heat treatment unit can be cleaned in a state in which the blasting is prevented from being smashed. [Embodiment] Hereinafter, the embodiment of the present invention will be described with reference to the accompanying drawings. DETAILED DESCRIPTION OF THE INVENTION [2014-9695-PF 6 200907269 (First Embodiment) Fig. 1 is a view showing a first embodiment of the present invention. The heat treatment apparatus 1A is disposed in a clean room, for example, by using a simple arrangement. The processing unit 1A includes a heat treatment unit, a heat treatment unit, a treatment unit, and a body treatment unit 20A. The processing unit 10 has a processing unit 1A. It is used to accommodate the smashing of the bedding area W (hereinafter also referred to as the workpiece, the u-room η, the heat-treated material), and the shovel J is taken out from the heat treatment chamber 1 1 . The body treatment unit 20 has a gas replenishment and a bitterness 1 , and the gas enthalpy 21A is used for deriving from the heat treatment chamber η, ... to the U-derived heat treatment gas (for example, after heat treatment) Air), and stare...the use of rolling bodies (for example, The heating air is introduced into the heat treatment chamber U of the heat treatment unit 1. The heat treatment unit 10 includes a gas filling unit, and a rolling body introduction unit 12 for introducing a heat treatment gas from the gas processing unit 20A. The U and the rolled body lead-out portion 13 are for heat-treating the gas from the heat to 11 V. The outer side of the heat treatment is surrounded by the heat insulating wall 11a. A holding member is provided inside the heat treatment t11 (not shown). The holding member may be supported and held in a predetermined state by, for example, one or two or more heat-treated materials. The holding member is disposed at a position not indicated by a chain double-dashed line in Fig. 1. The gas introduction portion 丨2 is tubular, from The heat insulating wall 11a of the heat treatment chamber i extends outward and communicates with the heat treatment chamber. The inlet side end of the gas introduction portion 12 is provided with a connection flange 14. The gas 'outlet portion 13 is also It is tubular and extends outward from the heat insulating wall 11a of the heat treatment chamber 11 and communicates with the heat treatment chamber 1. The outlet side 15-9695-PF 7 200907269 of the gas outlet portion 3 is provided with a connecting flange 15 The gas passage 21A has: an inlet tube (1) for export 23, the gas-conducting gas introduction portion is connected to the inlet pipe 22 and the outlet pipe 23, and the gas-side end of the carrier treatment pipe is provided with a flange for the connection flange 52 The connection is provided with a connecting flange 26 on the gas end, and the inlet side of the inlet portion is connected by a convex (four): two: 26 and the flange of the gas outlet _: the part r = Η, and for example The flange edge 26 of the bolts, nuts, and the like 12 and the gas outlet portion of the gas guide portion are connected to the gas processing chamber:::: the heat treatment portion is connected to form a loop passage. And ^ = body channel ^ and .w . at the appropriate position of the gas passage 21A § is also provided with a vibrator for adjusting the air volume (not shown) the gas treatment tube 24 is provided with a catalyst (can (four): catalyst 3G, heater 3, blower 32, and pretreatment agent 33. Blower 32 is used to recirculate air in the loop passage, and heating '31 is used to heat catalyst 30 and air. Air that is heated by heater 31 After the introduction tube 22 enters the heat treatment chamber u, the heat-treated material w is heated in the heat treatment. When the heat treatment of the heat-treated material W is performed by the lamp, the sublimate is generated from the heat-treated material w. The air after the heat treatment contains the sublimate. The air containing the sublimate flows through the gas deriving unit 13 and the outlet tube 23 through the catalyst 30. The catalyst 30 is used to promote the liter contained in the air after the heat treatment.

2014-9695-PF 8 200907269 華物的氧化分解反廯,i 解心例如可以採用白金(Pt)、鈀(pd ) 等貴金屬或這些貴金屬的合金等活性金屬。上述儀化劑3〇 在大約15〇〜350T;的溫度空氣下可以得到催化性能。因 本實細例中,在催化劑3 〇的前側(在空氣流經迴圈 通道的方向上比催化劑30靠近上游的位置)酉己置加熱器 31。另外,在被稱為催化毒物(cataiyst p〇is〇n)的物 貝(例如含有S1、P、S等的有機化合物)混入昇華物中, 有可能使催化齊! 30中毒(失效)的情況下,為防止催化 劑30中毒’較為理想的是’在催化劑3()的前㈣置前處 理劑33。 如上所述,在具有上述結構的第一實施例的熱處理裝 置1A中,由於將鼓風機32及加熱器31配置在與熱處理 部ίο分開設置的(熱處理部10外側的)氣體通道2u中, 因此,可以在防止鼓風機32或加熱器31出現故障的狀態 下清洗熱處理室11的内部。並且,由於利用包括連接用 凸緣14、15、25、26及螺栓、螺母等的連接裝置,可拆 卸地將氣體通道21A與熱處理部1〇的氣體導入部12及氣 體導出部13相連接,因此,通過從熱處理部取下具有 設置在氣體通道21A内的鼓風機32及加熱器31的氣體處 理部2 0 A ’就可以將氣體處理部2 0 A和熱處理部1 η八 上υ刀開, 由此’能夠在確實地防止鼓風機32或加熱器31出現故障 的狀態下清洗熱處理室11的内部。 此外,由於在上述迴圈通道中,從熱處理室U 的氣體依次流經導出管23、氣體處理管24及導人 導出 管222014-9695-PF 8 200907269 The oxidative decomposition of Chinese materials, such as noble metals such as platinum (Pt) and palladium (pd) or active metals such as alloys of these noble metals. The above catalyst 3 〇 can obtain catalytic performance under a temperature of about 15 〇 to 350 T; In the present embodiment, the heater 31 is placed on the front side of the catalyst 3 (the position upstream of the catalyst 30 in the direction in which the air flows through the loop passage). In addition, when a substance called a catalytic poison (cataiyst p〇is〇n) (for example, an organic compound containing S1, P, or S) is mixed into a sublimate, it is possible to catalyze it! In the case of 30 poisoning (failure), in order to prevent poisoning of the catalyst 30, it is preferable to carry out the treatment agent 33 before the first (four) of the catalyst 3 (). As described above, in the heat treatment apparatus 1A of the first embodiment having the above configuration, since the air blower 32 and the heater 31 are disposed in the gas passage 2u (outside the heat treatment portion 10) provided separately from the heat treatment portion, therefore, The inside of the heat treatment chamber 11 can be cleaned in a state where the blower 32 or the heater 31 is prevented from malfunctioning. Further, the gas passage 21A is detachably connected to the gas introduction portion 12 and the gas outlet portion 13 of the heat treatment portion 1A by a connection device including the connection flanges 14, 15, 25, 26, bolts, nuts, and the like. Therefore, by removing the gas processing unit 20A' having the air blower 32 and the heater 31 provided in the gas passage 21A from the heat treatment portion, the gas processing portion 20A and the heat treatment portion 1 can be smashed. Thereby, it is possible to clean the inside of the heat treatment chamber 11 in a state where the blower 32 or the heater 31 is surely prevented from malfunctioning. Further, since the gas from the heat treatment chamber U sequentially flows through the discharge pipe 23, the gas treatment pipe 24, and the guide outlet pipe 22 in the above-described circulation passage

2014-9695-PF 9 200907269 後,再次流回熱處理室u内,因此用—個鼓風機32就可 以使氣體循環’並且用加熱器31就可以對催化劑3〇和々 體都進行加熱。並且,通過將熱處理部1〇和氣體處理^ 20A分開’就可以只交換熱處理部1〇或只交換氣體 20A。 σΡ (第二實施例) 圖2是本發明第二實施例所有關的熱處理裝置的簡 圖。在圖2中’對與圖}相同的構件標注了相同的附圖標 記。 ’、 該熱處理裝置包括與第_實施例的氣體處理部 20A不同的氣體處理部20D。即,氣體處理部咖包括$ 體通道21D,該氣體通道21D具有:開放端22&,設置2 導入管22的進氣侧端;以及開放端24a,設置在氣體處理 管24的出氣側端。氣體處理部2〇])的氣體處理管24中嗖 置有催化劑。30和加熱器31,導入管22中設置有鼓風: 34與加熱器35。並且,雖献力岡d山a 且雖然在圖4中未示出前處理劑, 但也可以設置前處理劑。 在具有上述結構的熱處理製置1D中的氣流如下所 示。即’從開放端22a流入導入管22中的空氣經加熱器 35被加熱後’流入熱處理室u内。該加熱後的空氣用於 對工件W進行熱處理。對工件w進行了熱處理的空氣(進 行熱處理後的空氣)含有昇華物,其流入導出管Μ中後, 被導向氣體處理管24内。在氣體處理f 24内,進行熱處 理後的空氣經過催化劑30而使其中包含的昇華物發生氧 2014-9695-PF 10 200907269 化分解反應,然後從開放端24a排出。此外,圖2中的工6 疋擋板,用於阻止空氣在熱處理室丨丨的内部發生逆流, 並使空氣從氣體導入部i 2流向氣體導出部丨3,由於設置 有該擋板16,在熱處理室n内,與氣體導入部12相反的 一侧形成通道16a。 …、心^^衣置1 U T也將级风飛d 4及加^ 器3卜35配置在與熱處理部1〇分開設置的(熱處理部^ 外側的)氣體通道21D中,因此可以在防止鼓風機^ , 加熱器31、35出現故障的狀態下清洗熱處理室11的户 部。而且,由於利用包括連接用凸緣14、15、M、Mj 螺栓、螺料的連接裝置,可拆卸地將氣體通道2id與索 處理部ίο的氣體導入部12及氣體導出部13相連接二 此可以從熱處料1G分開具有設置在氣體通道21 鼓風機34及加熱器31、35的氣體處理部2〇d。由此,二 夠在確實地防止鼓風機34或加熱器3卜35出現 : 態下清洗熱處理室11的内部。 早、狀 此外’通過將熱處理部1G和氣體處理部咖 可以只交換熱處理部10或只交換氣體處理部咖刀開, 並且,由於從導入管22的所開放的進氣 入的空氣被加熱器35加熱後被導入到熱處 及 後a過導出官23及氣體處理管24被導出, 之 處理室11内的空氣不含昇華物。因此,由 入到熱 新鮮空氣導入到熱處理室"内,實現催化劑'3::; =將 的氧化分解反應性能難以降低。另外, “華物 札體處理部2 〇 dAfter 2014-9695-PF 9 200907269, it flows back into the heat treatment chamber u again, so that the gas can be circulated by a blower 32 and both the catalyst 3 and the crucible can be heated by the heater 31. Further, by separating the heat treatment portion 1A and the gas treatment unit 20A, it is possible to exchange only the heat treatment portion 1 or only the exchange gas 20A. σΡ (Second Embodiment) Fig. 2 is a schematic view of a heat treatment apparatus according to a second embodiment of the present invention. In Fig. 2, the same components as those in Fig. are denoted by the same reference numerals. The heat treatment apparatus includes a gas treatment unit 20D that is different from the gas treatment unit 20A of the first embodiment. That is, the gas processing unit includes a body passage 21D having an open end 22& which is provided with the intake side end of the introduction pipe 22, and an open end 24a provided at the outlet side end of the gas processing pipe 24. The gas treatment tube 24 of the gas treatment unit 2) is provided with a catalyst. 30 and the heater 31, the inlet pipe 22 is provided with an blast: 34 and a heater 35. Further, although the pretreatment agent is not shown in FIG. 4, it is also possible to provide a pretreatment agent. The gas flow in the heat treatment set 1D having the above structure is as follows. That is, the air that has flowed into the introduction pipe 22 from the open end 22a is heated by the heater 35 and flows into the heat treatment chamber u. This heated air is used to heat treat the workpiece W. The air (heat-treated air) which has been heat-treated to the workpiece w contains a sublimate which flows into the discharge tube and is guided into the gas processing tube 24. In the gas treatment f 24, the heat-treated air passes through the catalyst 30 to cause the sublimate contained therein to generate oxygen, and then is discharged from the open end 24a. In addition, the working 6 疋 baffle in FIG. 2 is for preventing the air from flowing back inside the heat treatment chamber ,, and allowing air to flow from the gas introduction portion i 2 to the gas discharge portion , 3, since the baffle 16 is provided, In the heat treatment chamber n, a channel 16a is formed on the side opposite to the gas introduction portion 12. ..., the heart ^^ clothes set 1 UT also arranges the class wind fly d 4 and the adder 3 b 35 in the gas passage 21D (outside the heat treatment portion ^) provided separately from the heat treatment portion 1 , so that the blower can be prevented ^, the households of the heat treatment chamber 11 are cleaned in a state where the heaters 31, 35 are in a failure state. Further, since the gas passage 2id is detachably connected to the gas introduction portion 12 and the gas discharge portion 13 of the cable treatment portion by the connection means including the connection flanges 14, 15, M, Mj bolts and the screw. The gas processing unit 2〇d provided in the gas passage 21 blower 34 and the heaters 31, 35 can be separated from the hot material 1G. Thus, it is sufficient to prevent the blower 34 or the heater 3 from appearing in the state of cleaning the inside of the heat treatment chamber 11. In addition, the heat treatment portion 1G and the gas treatment portion can exchange only the heat treatment portion 10 or only the gas treatment portion, and the air that is introduced from the inlet of the introduction tube 22 is heated by the heater. After the heating is 35, it is introduced into the hot portion, and then the a-derivation official 23 and the gas processing tube 24 are led out, and the air in the processing chamber 11 does not contain the sublimate. Therefore, it is difficult to reduce the oxidative decomposition reaction performance of the catalyst '3::; = by introducing hot fresh air into the heat treatment chamber". In addition, "Chinese object processing department 2 〇 d

2014-9695-PF 200907269 中,由於使空氣單向迴圈,並且 機以,因此可以通過導入管22將導入官22中設置鼓風 導入s以將氣體導 内,通過導出管23從熱處理室Μ出氣體。&至11 入:中在:述第二實施例中,將鼓風機34設置于導 二I ;並不僅限於此。例如’也可以將鼓風機34 攻置于導出管23和氣體處理管24 要;措— τ $也可以將鼓風機 34 §又置于導入管22、氣體處理管24及導出管23的至少 其中之一中。 (第三實施例) 圖 記 圖3是本發明第三實施例所有關的熱處理裝置的„ 在圖3中’對與圖2相同的構件標注了相同的附圖標 該熱處理裳置1C包括與第二實施例的氣體處理部 2〇D不同的氣體處理部20C。即,氣體處理部2〇c包括氣 體通道2U>該氣體通道21C具有用於將導人管22盘= 處理管24連通的連接管28。連接管28的一端部連接亍氣In 2014-9695-PF 200907269, since the air is circulated in one direction and the machine is in the air, the blast air can be introduced into the introduction guide 22 through the introduction pipe 22 to guide the gas, and the heat transfer chamber is taken out from the heat treatment chamber through the outlet pipe 23. Out of the gas. & 11 In: In the second embodiment, the blower 34 is disposed on the guide I; it is not limited thereto. For example, it is also possible to apply the blower 34 to the outlet tube 23 and the gas treatment tube 24; the method τ $ can also place the blower 34 § in at least one of the introduction tube 22, the gas treatment tube 24 and the outlet tube 23. in. (THIRD EMBODIMENT) FIG. 3 is a view showing a heat treatment apparatus according to a third embodiment of the present invention. In FIG. 3, the same components as those of FIG. 2 are denoted by the same reference numerals. The gas processing unit 2D of the embodiment has a different gas processing unit 20C. That is, the gas processing unit 2〇c includes a gas passage 2U> The gas passage 21C has a connecting tube for connecting the guide tube 22 to the processing tube 24. 28. One end of the connecting pipe 28 is connected to helium

體處理管24的設置有催化齊J 30、加熱器31及鼓風機S 的位置與出氣側端24a之間。連接管28的另一端部連接 于導入管22的中途部分。在這種氣體處理部2〇c中,將 加熱器35和鼓風機34設置于導入管22中比連接技 、 丧官2 8所 連接的部位靠近下游的位置上。此外,雖然在圖3中未八 出前處理劑,但也可設置前處理劑。另外,可少 」,略上述鼓 風機32。 在具有上述結構的熱處理裝置1C中的氣流如下所 2014-9695-PF 12 200907269 示。即,從開放端22a流入導入管22中的空氣經加熱器 35被加熱後,流入熱處理室i j。該加熱後的空氣用於對 工件W進行熱處理。進行熱處理後的空氣中含有昇華物, 該進行熱處理後的空氣流入導出管23中後,被導入到氣 體處理管24内。在氣體處理管24内,進行熱處理後的空 氣通過催化劑30而使其中包含的昇華物發生氧化分解反 應,然後從開放端24a排出,或通過連接管28及導入管 22流回熱處理t !】。此外,目3中的16是與第二實施例 相同的播板。 如上所述,在第三實施例的熱處理裝置1C中也由於 將鼓風機32、34及加熱器3卜35配置在與熱處理部u 刀開D又置的(熱處理部丨〇外側的)氣體通道2 C中,因 此可以在防止鼓風機32、34或加熱器3卜35出現故障的 狀態下清洗熱處理室11的内部。而且,由於利用包括連 接用凸緣14、15、25、26及螺栓、螺母等的連接裝置, 可拆卸地將氣體通道21G與熱處理部10的氣料入部12 及氣體導出部13相連接,因此可以從熱處理部10分開具 有設置在氣體通道21(:中^1士*1^4*〇〇 〇 、以匕干的豉風機32、34及加熱器3ί、 35的氣體處理部2〇C。由此,能夠在確實地防止鼓風機 32 34或加熱為3卜35出現故障的狀態下清洗熱處理室 1 1的内部,並且可實頊σ六她 處理部2〇c。 …乂換熱處理部或只交換氣體 此外,在熱處理裝置1 C φ,| Μ 罝1L中,由於導入管22的進 端22a處於開放狀態,因 孔甸 J將新鮮空軋導入到導入管22The body treatment tube 24 is provided between the position of the catalyst J 30, the heater 31, and the blower S and the outlet side end 24a. The other end of the connecting pipe 28 is connected to a midway portion of the introduction pipe 22. In the gas processing unit 2〇c, the heater 35 and the blower 34 are disposed at positions downstream of the portion of the introduction pipe 22 that is connected to the connection technology and the smuggling unit 28. Further, although the pretreatment agent is not provided in Fig. 3, a pretreatment agent may be provided. Further, the blower 32 may be omitted. The gas flow in the heat treatment apparatus 1C having the above structure is as follows: 2014-9695-PF 12 200907269. That is, the air that has flowed into the introduction pipe 22 from the open end 22a is heated by the heater 35, and then flows into the heat treatment chamber ij. This heated air is used to heat treat the workpiece W. The sublimate is contained in the air after the heat treatment, and the air after the heat treatment flows into the discharge pipe 23, and then introduced into the gas processing pipe 24. In the gas treatment tube 24, the air subjected to the heat treatment passes through the catalyst 30 to cause an oxidative decomposition reaction of the sublimate contained therein, and then is discharged from the open end 24a, or flows back to the heat treatment through the connection pipe 28 and the introduction pipe 22. Further, 16 in Fig. 3 is the same broadcast board as the second embodiment. As described above, in the heat treatment apparatus 1C of the third embodiment, the air blowers 32, 34 and the heaters 3 are also disposed in the gas passage 2 (which is outside the heat treatment portion) which is disposed in the heat treatment portion u. In C, it is therefore possible to clean the inside of the heat treatment chamber 11 in a state where the blowers 32, 34 or the heaters 3 are prevented from malfunctioning. Further, since the gas passage 21G is detachably connected to the gas inlet portion 12 and the gas discharge portion 13 of the heat treatment portion 10 by the connection means including the connection flanges 14, 15, 25, 26, bolts, nuts, and the like, The gas processing unit 2〇C having the xenon blowers 32 and 34 and the heaters 3ί, 35 provided in the gas passage 21 can be separated from the heat treatment unit 10 . Thereby, it is possible to clean the inside of the heat treatment chamber 1 1 in a state where the blower 32 34 or the heating is prevented from being malfunctioning, and the processing portion 2 〇 c can be realized. In addition, in the heat treatment apparatus 1 C φ, | Μ 罝 1L, since the inlet end 22a of the introduction pipe 22 is in an open state, fresh air rolling is introduced into the introduction pipe 22 by Kongdian J.

2014-9695-PF 13 200907269 中。並且,由於從熱處理室i 1導出的空氣被催化劑淨 化,且被加熱器31加熱後通過連接管28流入導入管22 中,因此可減少熱損失。而且,由於將設置于導入管Μ 内的氣體加熱用加熱器35用於熱處理室丨〗的溫度控制, 並將設置于氣體處理管24内的加熱器31用於催化劑3〇 的溫度控制,因此可以分別專門性地利用加熱器35、W。 由此’在不受到被熱處理物的加熱溫度(設定溫度)的 情況下,將催化劑30的溫度設定為可得到催化性能的最 佳溫度。 (第四實施例) 圖4是本發明第四實施例 所有關的熱處理裝置的簡 圖在圖4十,對與圖3相同 記。 丁竹^土 ;相问的附圖標 «處理裝置1β包括具有第二連接管打的氣體 Β。第一連接t27的—端部連接于導 ^ 管28所連接的部位靠近下游、且㈣=的比連接 熱器35和鼓風機34 %體加熱用加 連接管27和導人f22 = ^上游的位置上,以使第二 U連通。弟二連接管 連接于導出管23的中”> 的另—端部 管23連通。第二連 吏弟-連接管27和導出 接g 27由隔熱壁圍繞。 氣體處理部2〇B的έ士椹 有催化劑3〇、加敎及構^下。氣體處理管24争設置 管Μ中,比第-遠1 鼓風機32°如上所述,在導入 第一連接管27所連接的位 *導入 上设置有鼓風機34和加埶 k下游的位置 ,、,、盗35。加熱器35用於對要導入2014-9695-PF 13 200907269. Further, since the air derived from the heat treatment chamber i 1 is cleaned by the catalyst and heated by the heater 31 and then flows into the introduction pipe 22 through the connection pipe 28, heat loss can be reduced. Further, since the gas heating heater 35 provided in the introduction pipe is used for the temperature control of the heat treatment chamber, the heater 31 provided in the gas treatment pipe 24 is used for the temperature control of the catalyst 3, The heaters 35, W can be utilized exclusively for each. Thus, the temperature of the catalyst 30 is set to an optimum temperature at which catalytic performance can be obtained without being subjected to the heating temperature (set temperature) of the object to be heat-treated. (Fourth embodiment) Fig. 4 is a schematic view of a heat treatment apparatus according to a fourth embodiment of the present invention, which is shown in Fig. 40 and the same as Fig. 3. Dingzhu ^ soil; the attached icon «The processing device 1β includes a gas 具有 with a second connecting pipe. The end of the first connection t27 is connected to the portion where the conduit 28 is connected close to the downstream, and (4) = the ratio of the connection heater 35 and the blower 34% body heating connection pipe 27 and the guide person f22 = ^ upstream Upper to connect the second U. The second connecting pipe is connected to the other end pipe 23 of the middle of the outlet pipe 23. The second connecting pipe-connecting pipe 27 and the outgoing connecting g 27 are surrounded by the heat insulating wall. The gas processing part 2〇B The gentleman has a catalyst of 3 〇, twisting and structuring. The gas processing tube 24 is placed in the tube ,, which is 32° higher than the first-distal blower, as described above, and is introduced at the position where the first connecting tube 27 is connected*. The air blower 34 and the position downstream of the twisting k are provided, and the thief 35 is used.

2014-9695-PF 14 200907269 到熱處理室11内的空齑推― 工虱進仃加熱D另外,在埶 的内部設置有上述擋板丨6。 …、疫至11 6此外,雖然在圖4中夫千屮前 處理劑,但也可設置前處理劑。 /、 具有上述結構的熱處理裝置1B中的氣流如下所示。 即,從開放端22a流入導入管2 / 吕“ 的空軋經加敎器3 5姑 加熱後,流入熱處理室u&老 .、、、為北被 至11在熱處理室11中用於進行熱 處理。該進行熱處理後的空 ……道t、· 乳合有昇華物。該進行熱處理 後的工氣導入到導出管23中你 ^ ΑΛ- .ν U十後,向第二連接管27和氣體 處理g 2 4分流。導入到第_、击时一 J第一連接管27的空氣經加熱器35 再次被加熱後’經導入管22攻 g “ /瓜回熱處理室11。即,空氣 在熱處理室11和第二連接其〇7 /、 "運接官27之間迴圈。另—方面,導 入到氣體處理管24中的含右田贫& △ 有升華物的進行熱處理後的空 氣通過催化劑30接觸而使复中勺 使再中包含的昇華物發生氧化分 解反應後從開放端24a排4» V, 挪」4a排出,或通過連接管28及導入管 2 2流回熱處理室11。 如上所述,在熱處理梦罢, 展置IB t也由於將鼓風機32、 34及加熱器31、35配置在盘舶老m 罝在與熱處理部10分開設置的(熱 處理部10外側的)氣體通道 ^ ^ ΰ中,因此可以在防止鼓 風機3 2、3 4或加熱器31、3 5 4* @ @ 出現故障的狀態下清洗熱處 理室11的内部。並且,由於法丨 田於利用包括連接用凸緣u、丨5、 25、26及螺栓、螺母等的連接 死接及置,可拆卸地將氣體通道 21B與熱處理部1〇的教體m 幻乱體¥入部以及氣體導出部13相連 接,因此可以從熱處理部1 〇分2014-9695-PF 14 200907269 The empty push in the heat treatment chamber 11 is heated to the inside of the heat treatment chamber 11. In addition, the baffle plate 6 is provided inside the crucible. ..., epidemic to 11 6 In addition, although the treatment agent is used in Fig. 4, a pretreatment agent may be provided. / The gas flow in the heat treatment apparatus 1B having the above structure is as follows. That is, the empty rolling from the open end 22a into the introduction pipe 2 / L" is heated by the twister 35, and then flows into the heat treatment chamber u & old, and is used in the heat treatment chamber 11 for heat treatment. After the heat treatment, the air is filled with the sublimate, and the work gas after the heat treatment is introduced into the outlet pipe 23, and then the second connecting pipe 27 and the gas are introduced. The g 2 4 is shunted, and the air introduced into the first and second connecting tubes 27 of the first and third stages is heated again by the heater 35, and then "passed through the introduction tube 22" to return to the heat treatment chamber 11. That is, the air is looped between the heat treatment chamber 11 and the second connection 〇7 /, " On the other hand, the heat-treated air containing the right-handed lean & Δ sublimated material introduced into the gas treatment pipe 24 is contacted by the catalyst 30, and the retort is further oxidized and decomposed after being subjected to oxidative decomposition reaction. The end 24a is discharged from the row 4»V, the "4a", or flows back to the heat treatment chamber 11 through the connecting pipe 28 and the inlet pipe 2 2 . As described above, in the heat treatment of the dream, the IB t is also disposed because the air blowers 32, 34 and the heaters 31, 35 are disposed in the gas passage which is disposed separately from the heat treatment portion 10 (outside the heat treatment portion 10). ^ ^ ΰ, so it is possible to clean the inside of the heat treatment chamber 11 in a state where the blowers 3 2, 3 4 or the heaters 31, 3 5 4 * @ @ are prevented from malfunctioning. Further, since the method of smashing and arranging the connection, including the connection flanges u, 丨5, 25, and 26, bolts, nuts, and the like, the gas passage 21B and the heat treatment portion 1 are detachably illusory. Since the chaotic body portion and the gas outlet portion 13 are connected, it is possible to divide the heat treatment portion 1

刀開具有设置在氣體通道21B 中的妓風機32、34及加敎写si、 …為31、35的氣體處理部2〇b。The gas processing unit 2〇b having the xenon blowers 32 and 34 provided in the gas passage 21B and the twisted write si, ..., 31, 35 is opened.

2014-9695-PF 200907269 由此’能夠在確實地防止鼓風機32、34或加熱器31、35 出現故障的狀態下清洗熱處理室11的内部,並且能實現 只交換熱處理部10或只交換氣體處理部20B。 此外’在上述氣體處理部20B中,導入管22的進氣 側端22a處於開放狀態,並且,空氣通過連接管28迴圈, 因此可獲得與第三實施例相同的效果。而且,由於設置第 二連接管27來形成比連接管28所形成的迴圈通道更靠近 熱處理室11的迴圈通道,並且,在包括第二連接管27的 迴圈通道中設置有氣體加熱用加熱器35,因此可實現重新 利用溫度下降較小的空氣。 在上述第一〜第四實施例中,用於將熱處理部丨〇的 氣體導入部12及氣體導出部13與氣體通道(21a〜 21D) 相連接的連接裝置包括連接用凸緣14、25、i5、26及螺 栓、螺母,但本發明並不僅限於此。例如,也可利用將螺2014-9695-PF 200907269 Thus, it is possible to clean the inside of the heat treatment chamber 11 while surely preventing the blowers 32, 34 or the heaters 31, 35 from malfunctioning, and it is possible to exchange only the heat treatment portion 10 or only the gas treatment portion. 20B. Further, in the gas treatment portion 20B, the intake side end 22a of the introduction pipe 22 is in an open state, and the air is circulated through the connection pipe 28, so that the same effects as those of the third embodiment can be obtained. Moreover, since the second connecting pipe 27 is provided to form a loop passage closer to the heat treatment chamber 11 than the loop passage formed by the connecting pipe 28, and the gas passage for heating is provided in the loop passage including the second connecting pipe 27. The heater 35 is thus capable of reusing air having a small temperature drop. In the above-described first to fourth embodiments, the connecting means for connecting the gas introduction portion 12 and the gas outlet portion 13 of the heat treatment portion 与 with the gas passages (21a to 21D) includes the connection flanges 14, 25, I5, 26 and bolts and nuts, but the invention is not limited thereto. For example, you can also use the snail

絲和螺母相組合來構成的連接裝置,也可以利用其他連接 裝置。 而且,在上述第 第四實施例中,利用連接裝置(連 接用凸緣14、15、25、26及螺栓、螺母),可拆卸地將 熱處理部ίο的氣體導人部12及氣體導出部13與氣體通 道(21A〜21D)才目連接’但本發明並不限於此。例如,也 可以通過焊接等來連接氣體導人部12和導人f22,並通 過焊接等連接氣體導㈣13和導出f23。在採用此連接 方法的情況下,也將鼓風機32等及加熱器Μ等配置在斑 熱處理部1〇分開設置的(熱處理部Η外側的)氣體通道 2014-9695-PF 16 200907269 (21A〜21D)中,田比 ,^ ^ 1 ^ 清洗液等難以飛到鼓風機32耸 及加熱器3",可以在防止:機324 狀態下清洗熱處理室η & “、、益出現故障的 ' 至U,能夠達成本發明的目的。 並且’在上述證 、 义第一〜第四貫施例中, 10上設置了一個( 個熱處理部 成體處理部(2射〜20D),但發 於此,也可以在一也月並不限 产理部。例… 上設置兩個以上的氣體 处 > 知圖5對在一個熱處理部丨〇上# w 個氣體處理部的情況進行說明。 5又置兩 在圖5所_熱處理部1G中,除—個氣體導 和氣體導出部13之外,較置有—個氣料人部12a和 耽體導出部13a。氣體導入部12和氣體導出部工 處理部m的氣體通道21A相連接,以使這些連通,並且, =體導入部心和氣體導出部…與具有相同結構的氣體 处理部20A的氣體通道21A相連接,以使這些連通。在這 種結構中’在只使用—個氣體導人部12和氣體導出部13 的It况下’如圖6所示’取下所追加的氣體通道2i a,相 對於氣體導人部12a和氣體導㈣13a裝上頂蓋18就可 以。 並且,在上述實施例中,只在氣體處理管24内設置 催化劑30,但本發明並不限於此。例如圖7所示,也可以 在熱處理室11的内部設置其他催化劑17。此時,在熱處 理室11的内部,既可以設置擋板16也可以不設置擋板 16。在採用這種結構的情況下,通過兩個催化劑3〇、】7 能高效率的使昇華物發生氧化分解反應。 17A connecting device composed of a combination of a wire and a nut may also utilize other connecting means. Further, in the fourth embodiment, the gas guiding portion 12 and the gas outlet portion 13 of the heat treatment portion are detachably separated by the connecting means (the connecting flanges 14, 15, 25, 26 and the bolts and nuts). It is connected to the gas passages (21A to 21D), but the present invention is not limited thereto. For example, the gas guiding portion 12 and the guiding person f22 may be connected by welding or the like, and the gas guide (four) 13 and the lead f23 may be connected by welding or the like. In the case of using this connection method, the air blower 32 and the like, and the heater Μ etc. are disposed in the gas passage 2014-9695-PF 16 200907269 (21A to 21D) which are separately provided in the spot heat treatment unit 1 (outside the heat treatment portion)中,田比, ^ ^ 1 ^ It is difficult to fly to the blower 32 and the heater 3", and it is possible to clean the heat treatment chamber η & ",,,,,,,,,,,,, The object of the present invention is achieved. Further, in the above-mentioned first to fourth embodiments, one (the heat treatment unit adult processing unit (2 shots to 20D) is provided on the 10th, but it may be In the case of one month, it is not limited to the Department of Production. For example, two or more gas chambers are provided. > FIG. 5 shows a case where #w gas processing units are placed in one heat treatment unit. In the heat treatment unit 1G of Fig. 5, in addition to the gas guide and the gas outlet portion 13, a gas person portion 12a and a body lead portion 13a are disposed. The gas introduction portion 12 and the gas discharge portion processing unit The gas passages 21A of m are connected to make these connections, and, = body conduction The inlet core and the gas outlet portion are connected to the gas passage 21A of the gas treatment portion 20A having the same structure to communicate these. In this configuration, 'only the gas guide portion 12 and the gas outlet portion 13 are used. In the case of 'It', as shown in Fig. 6, the additional gas passage 2i a is removed, and the top cover 18 is attached to the gas guiding portion 12a and the gas guide (four) 13a. Also, in the above embodiment, only in the gas The catalyst 30 is provided in the treatment tube 24, but the present invention is not limited thereto. For example, as shown in Fig. 7, other catalysts 17 may be provided inside the heat treatment chamber 11. At this time, a baffle may be provided inside the heat treatment chamber 11. It is also possible to provide no baffle 16 in the case of this configuration. In the case of adopting such a structure, the oxidative decomposition reaction of the sublimate can be efficiently performed by the two catalysts 3, 7 .

2014-9695-PF 200907269 (實施例概要) 上述實施例總結為如下: (1) 在本貧施例的熱處理裝署 加埶邴罢y-命為南 ’由於將鼓風機及 :二=在與熱處理部分開設置的(熱處理 = 體通道中,因此可以在防止 】的) 肤能τ、主、土也走 機或加熱器出現故障的 狀恶下清洗熱處理部的熱處理室内。 丨早的 (2) 在上述熱處理裝置中優選的 具有:導入管,通過連接單元 “軋體通道 、、逆按早兀可拆卸地與上 連接;以及導出管,通過連接單 、—入部 逆摆早兀可拆卸地與上 邛連接。採用該結構,由於利用連接裝置,二— 理部分開氣體處理部的導入管和導出管。在從執=從熱處 開氣體處理部的情況下,可以在確實地防止士^理部分 器出現故障的狀態下清洗熱處理部的熱處理室:機::熱 通過從熱處理部分開氣體處理 , 部或只交換氣體處理部。 熱處理 (3)在上述熱處理裝置中,上述氣體通 處理管,通過該氣體處理管,上述導人管的進氣側:^ j導出官的出氣側端可以連接’在上述氣體處㈣中可以 。又置有上述催化劑和上述加熱器。在該結構中,形^… ,處理室導出❸氣體依次流經導出t、氣體處理管及導2 μ後再久机回熱處理室這樣一種迴圈通道。由此,利 一個鼓風機就可以使氣體循環,並且利用氣體處理管的 熱裔就可以加熱催化劑和氣體。 、 “)在上述熱處理裝置中’上述氣體通道具有氣體 2014-9695-PF 18 200907269 處理管,上述導入營 # 在該導入管中可以以處於開放狀態,並且 管的出氣側…用加熱器,在上述導出 中設置有上述催化劑和上述::;處:管’該氣體處理管 氣體處理管及上述導入管的至;;复在上述導出管'上述 上述鼓風機。 ,、中之一令可以設置有 採用该結構,由於從導入;^ ΑΑ 的氣體經氣體加孰用…;的所開放的進氣側端吸收 内,並經過導出管及氣後導人到熱處理室 理室内的氣體中不含有昇 W ’因此導人到熱處 體導入到熱處理室内此,可以始終將新鮮氣 庫性能難… 劑對昇華物的氧化分解反 應性靶難以降低。而且, 因此在導入管、導出構’由於氣體單向迴圈, 置豉風機,就可以將氣體導 中。又 室導出氣體。 …、處理至内’並從熱處理 (5 )在上述熱處理裝置中, 處理管和遠接技u 述軋體通道具有氣體 化心 述導出管的出氣側端與設置有上述催 —^上述加熱器的氣體處理管 上述導出管的出氣側端上連接氣體==下’可以在 化劑和上述加熱器,上述氣體處理管的比 口又置有上述催化劑和上述加 盥上ϋ奠Λ # …态的位置罪近下游的部分 ^ 官,可以通過上述連接管相連接,上述導入管 的進氣侧端可以處於開放狀態, 比f·奸、击祕- 上且,在上述導入管中, 迷連接官所連接的位置靠近下游的部分,可以設置有2014-9695-PF 200907269 (Summary of the Examples) The above examples are summarized as follows: (1) In the heat treatment of the poor example, the 埶邴 命 命 为 为 命 命 命 命 命 命 命 命 命 命 ' ' ' 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于The heat treatment chamber of the heat treatment unit is cleaned in a part of the heat treatment unit (heat treatment = body passage, so it can be prevented), the skin energy τ, the main body, the soil, or the heater malfunctioning. (2) In the above heat treatment apparatus, it is preferable to have: an introduction pipe through which the connection unit "rolls through the passage, and reversely presses the nipple to be detachably connected to the upper; and the outlet pipe, through the connection of the single and the inlet. The raft is detachably connected to the upper cymbal. With this configuration, the inlet pipe and the outlet pipe of the gas processing section are opened by the second part by the connection means. In the case where the gas processing section is opened from the heat= The heat treatment chamber of the heat treatment portion is cleaned in a state where the failure of the device is reliably prevented: machine: heat is supplied by gas treatment from the heat treatment portion, or only the gas treatment portion is exchanged. Heat treatment (3) in the above heat treatment device The gas-passing treatment tube, through the gas processing tube, the inlet side of the inlet tube: the outlet side of the outlet can be connected to 'in the gas (4). The catalyst and the heater are further disposed In this structure, the shape of the ..., the processing chamber derivates the helium gas to flow through the lead t, the gas treatment tube and the guide 2 μ and then return to the heat treatment chamber for a long time. The gas can be circulated by a blower, and the catalyst and gas can be heated by the heat of the gas treatment tube. ") In the above heat treatment device, the gas passage has a gas 2014-9695-PF 18 200907269 treatment tube, In the inlet pipe, the gas can be opened, and the outlet side of the pipe is provided with a heater, and in the above-mentioned derivation, the above catalyst and the above::; pipe: the gas processing pipe gas processing pipe and the above The introduction of the tube to;; the above-mentioned outlet tube of the above-mentioned outlet tube. One of the , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , The gas in the chamber does not contain the rise W'. Therefore, the introduction of the hot body into the heat treatment chamber can always make the performance of the fresh gas reservoir difficult. It is difficult to reduce the oxidative decomposition reactivity target of the sublimate. Moreover, the gas can be guided in the introduction pipe and the outlet structure because the gas is unidirectionally looped and the fan is placed. The chamber is also used to derive gas. ..., processing to the inside 'and from the heat treatment (5) in the above heat treatment apparatus, the treatment tube and the remote connection technology, the rolling body passage has a gasification, the outlet side of the outlet tube, and the above-mentioned heater The gas processing tube is connected to the gas outlet side of the outlet tube. The gas is connected to the heater, and the gas processing tube is further provided with the catalyst and the above-mentioned catalyst. The location of the sin near the downstream part of the official can be connected through the above-mentioned connecting pipe, the inlet side of the above-mentioned introduction pipe can be in an open state, compared with f, traitor, and above, in the above-mentioned introduction pipe, the connection The location where the official is connected is close to the downstream part and can be set

2014-9695-PF 19 200907269 氣體加熱用加熱器和上述鼓風機。 採用該結構,由於導入管的 因此可以導入新鮮的氣體。而且:處於開放狀態, 氣體經催化劑被淨化,並被加 =處理至導出的 側端吸收的氣體升溫並導導入管的所開放的進氣 敎損失。而且士處理室内,因此能夠減少 ”、、相矢 而且,由於可以膝执班丄# 埶哭用於埶處理〜’叹纟導入管的氣體加熱用加 .、、、》。用π熱處理至的溫度管理 熱器用於催化劑的溫度管理,因;置,體處理管的加 力…。由此… 此可以專門性地利用這些 下,'、、::&不受到被熱處理物的加熱溫度的狀能 度。 抓皿度…可得到催化性能的最佳溫 (6)在上述熱處理裝置中,上述氣體通道呈 連接管,上述導入營的卜卜μ、+、$ λ ^ ^ 、上述連接管所連接的位置靠近下 j且比上述氣體加熱用加熱器及上述鼓風 :置與上述導出管,可以通過上述第二連接管相連接= 用該結構,由於暮Λ挥Ma , 知: 、導入S的進氣側端處於開放狀態,並且教 體經由連接管進行迴圈,因此 虱 相同的^。自卩此了以獲付與上述熱處理裝置 所开^果。而且’由於設置第二連接管來形成比連接管 圈Ή ^圈通道更靠近熱處理室的迴圈通道’並且在迴 H ^置有氣體加熱用加熱器’因此,可以重新利用 溫度降低較小的氣體。 里新扪用 故♦⑺在上述熱處理裝置中,在上述熱處理部的上述 —理室内也可以設置有催化劑。採用該結構,可以根據2014-9695-PF 19 200907269 Gas heating heater and the above air blower. With this configuration, fresh gas can be introduced due to the introduction of the tube. Moreover, in an open state, the gas is purified by the catalyst and is heated by the addition of the gas to the side of the outlet and is introduced into the tube to open the inlet enthalpy loss. In addition, the interior of the room is treated, so it can be reduced by ",, and, because of the knees, the 膝 丄 埶 埶 埶 埶 埶 埶 ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' 气体 气体 气体 气体The temperature management heat exchanger is used for the temperature management of the catalyst, because of the force of the body treatment tube.... This can be used specifically for these, ', , ::: & not subject to the heating temperature of the heat-treated material The degree of energy can be obtained. (6) In the above heat treatment apparatus, the gas passage is a connecting pipe, and the above-mentioned introduction camp is provided with Bub, +, $λ^^, and the above connecting pipe. The connected position is closer to the lower jaw j than the gas heating heater and the blasting means: the outlet tube is connected to the second connecting tube. According to the configuration, the structure is used, and since The intake side end of S is in an open state, and the teaching body is looped through the connecting pipe, so that the same is obtained from the above-mentioned heat treatment device, and 'the second connecting pipe is set To form a ratio The tube ring Ή ^ ring channel is closer to the loop channel of the heat treatment chamber and the gas heating heater is placed at the back H ^. Therefore, it is possible to reuse the gas with a lower temperature drop. The new heat treatment ♦ (7) in the above heat treatment In the apparatus, a catalyst may be provided in the chamber in the heat treatment unit.

2014-9695-PF 20 200907269 熱處理室的容量或昇華物的產生量,選定並選擇氣體處理 部的能力。 【圖式簡單說明】 圖1是本發明的第一實施例的熱處理裝置的簡圖。 圖2是本發明的第二實施例的熱處理裝置的簡圖。 圖3是本發明的第三實施例的熱處理裝置的簡圖。 圖4是本發明的第四實施例的熱處理裝置的簡圖。 圖5是本發明的其他實施例的熱處理裝置的簡圖。 圖6疋本發明另外實施例的熱處理裝置的簡圖。 圖7疋本發明另一種實施例的熱處理裝置的簡圖。 【主要元件符號說明】 1A〜該熱處理裝置; 1 0〜熱處理部; 11〜熱處理室; 11 a〜隔熱壁; 12 ~氣體導入部; 13〜氣體導出部; 14、15、八 ^、26〜連接用凸緣; 2 0 ~氣體處理部· 20A〜氣體處理部; 21A〜氣體通道; 2 2〜導入管·2014-9695-PF 20 200907269 The capacity of the heat treatment chamber or the amount of sublimate produced, and the ability of the gas treatment unit is selected and selected. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic view of a heat treatment apparatus according to a first embodiment of the present invention. Fig. 2 is a schematic view of a heat treatment apparatus of a second embodiment of the present invention. Figure 3 is a schematic view of a heat treatment apparatus of a third embodiment of the present invention. Fig. 4 is a schematic view of a heat treatment apparatus of a fourth embodiment of the present invention. Fig. 5 is a schematic view of a heat treatment apparatus according to another embodiment of the present invention. Figure 6 is a schematic view of a heat treatment apparatus according to another embodiment of the present invention. Figure 7 is a schematic view of a heat treatment apparatus according to another embodiment of the present invention. [Description of main component symbols] 1A to the heat treatment device; 10 0 heat treatment portion; 11 to heat treatment chamber; 11 a to heat insulation wall; 12 to gas introduction portion; 13 to gas discharge portion; 14, 15, 八, 26 ~ Connection flange; 2 0 ~ gas treatment unit · 20A ~ gas treatment unit; 21A ~ gas passage; 2 2 ~ introduction tube

2014-9695-PF 21 200907269 23〜導出管; 24〜氣體處理管; 3 0 ~催化劑; 31〜加熱器; 3 2〜鼓風機; 33〜前處理劑; W ~被熱處理物。2014-9695-PF 21 200907269 23~Export tube; 24~ gas treatment tube; 3 0 ~ catalyst; 31~heater; 3 2~ blower; 33~ pretreatment agent; W ~ heat treated material.

CC

2014-9695-PF 222014-9695-PF 22

Claims (1)

200907269 十、申請專利範圍: 1. 一種熱處理裝置,其特徵在於包括: 熱處理部’具有分別與熱處理室連通的氣體導人部及氣 體^出β ’上述熱處理室用於收容被熱處理物,該所收容的 被熱處理物可從上述熱處理室取出;以及 氣體處理部’具有氣體通道,該氣體通道用於將熱處理 用氣體導人到上述氣體導人部,並從上述氣體導出部導出進 行熱處理後的氣體,其中, 在上述氣體通道中設置有:催化劑,分解在對上述被熱 處理物進行熱處理時從該被熱處理物產生的昇華物;加熱 至夕加熱上述催化劑;以及一個或兩個以上的鼓風機, 將上述熱處理用氣體及上述進行熱處理後的氣體向規定方向 引導。 2.如申請專利範圍第1項所述的熱處理裝置,其中,上 述氣體通道具有: 〃 導入官,通過連接單元可拆卸地與上述氣體導入部 接;以及 導出管’通過連接單元可拆卸地與上述氣體導出部連接。 3 ·如申4專利範圍第2項所述的熱處理裝置,其中,上 述氣體通道具有氣體處理管, …通過上述氣體處理f ’上述導人管的進氣側端和 出管的出氣侧端相連接, 在上述氣體處理管中設置有上述催化劑和上述加熱器。 4_如申請專利範圍第2項所述的熱處理裝置,其中上 2014-9695-PF 23 200907269 述氣體通道具有氣體處理管, n: : S的進乳側端處於開放狀態,並且在兮導入其 又置有氣體加熱用加熱器, t且在该導入官 纟上述導出管的出氣側端 體處理管中設置右 述軋體處理管,該氣 、、置有上述催化劑和上述加熱器, 在上述導出管、上述氣體處 中之一令設置有上述鼓風機。 攻導入官的至少其 5·如申請專利範圍第2項所述的埶處 述氣體通道具有氣體處理管和連接管,',' 置,其中,上 在上述導出管的出氣側端 體處理管中气:晋古处氧體處理管’該氣 二°又置有上述催化劑和上述加熱器, 上述氣體處理管的比設置 位置靠近下游的部分與上述導人Ί _和上述加熱器的 上述導入管的B 、匕上述連接管相連接, s的進氣側端處於開放 入管中,比上述連接…開放狀恶,並且’在上述導 有氣體加_1所連接的位置靠近下游的部分,設置 花體加熱用加熱器和上述鼓風機。 6.如申請專利範圍第5 述氣體通道具有第二連接管,處理裝置,其中,上 上述導入管的比上述連接 bt±H' - 楼S所連接的位置靠近下游、且 述導出管… 4豉風機靠近上游的位置與上 G出「通過上述第二連接管相連接。 7·如申請專利範圍第 置,其t H十6項中任—項所述的熱處理裝 r 在上述熱處理部的j·诂备疮 劑。 幻上述熱處理室内也設置有催化 2014-9695-PF 24200907269 X. Patent application scope: 1. A heat treatment device, comprising: a heat treatment portion 'having a gas guiding portion respectively communicating with a heat treatment chamber and a gas generating portion β', wherein the heat treatment chamber is for accommodating a heat-treated material, the The heat-treated product to be contained may be taken out from the heat treatment chamber; and the gas treatment portion 'haves a gas passage for guiding the heat treatment gas to the gas guide portion, and is led out from the gas discharge portion for heat treatment. a gas in which: a catalyst is disposed to decompose a sublimate generated from the object to be heat treated when heat-treating the heat-treated material; heating the catalyst to heat the catalyst; and one or more blowers, The gas for heat treatment and the gas after the heat treatment are guided in a predetermined direction. 2. The heat treatment apparatus according to claim 1, wherein the gas passage has: a 导入 introduction member detachably coupled to the gas introduction portion through a connection unit; and the outlet tube detachably coupled to the outlet unit The gas discharge unit is connected. 3. The heat treatment apparatus according to claim 2, wherein the gas passage has a gas treatment tube, ... through the gas treatment f' the inlet side of the inlet tube and the outlet side end of the outlet tube In the gas processing tube, the catalyst and the heater are provided. 4_ The heat treatment apparatus according to claim 2, wherein the gas passage of the above-mentioned 2014-9695-PF 23 200907269 has a gas treatment tube, the milk-feeding side end of n: : S is in an open state, and is introduced into the crucible Further, a heater for gas heating is provided, and a rolling-up processing tube of the right side is disposed in the outlet side end processing tube of the introduction tube, and the gas, the catalyst, and the heater are placed thereon. One of the outlet pipe and the above gas is provided with the above blower. At least 5 of the attacking introduction officer, as described in the second paragraph of the patent application scope, has a gas processing tube and a connecting tube, ',', wherein the outlet side end body processing tube of the above-mentioned outlet tube Medium gas: the ancient gas processing tube of the ancient chamber is provided with the above-mentioned catalyst and the above-mentioned heater, and the gas processing tube is disposed closer to the downstream portion than the above-mentioned guide _ _ and the above-mentioned introduction of the heater The connecting pipes of the tubes B and 匕 are connected, and the inlet side end of the s is in the open inlet pipe, which is opener than the above-mentioned connection, and is disposed near the downstream portion at the position where the gas-added _1 is connected. The heater for flower heating and the above blower. 6. The gas passage of claim 5, wherein the gas passage has a second connecting pipe, and the processing device, wherein the upper inlet pipe is closer to the downstream than the connection of the connection bt±H'-floor S, and the outlet pipe is... 4 The position of the blower near the upstream is connected to the upper G by "connecting through the above second connecting pipe. 7. If the patent application scope is set, the heat treatment device r described in the item t H:6 is in the heat treatment portion. j·诂备疮剂. Magical above the heat treatment room is also equipped with catalysis 2014-9695-PF 24
TW097119342A 2007-05-29 2008-05-26 Heat treatment device TWI476356B (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI404955B (en) * 2009-02-23 2013-08-11 Yang Electronic Systems Co Ltd Cooling and moisture-proofing apparatus for use in electric property test of flat panel display substrate

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010144939A (en) * 2008-12-16 2010-07-01 Tohoku Univ Circulation type substrate burning furnace
WO2012141081A1 (en) * 2011-04-14 2012-10-18 シャープ株式会社 Apparatus for producing display panel substrate
JP6855687B2 (en) * 2015-07-29 2021-04-07 東京エレクトロン株式会社 Substrate processing equipment, substrate processing method, maintenance method of substrate processing equipment, and storage medium
WO2018099149A1 (en) * 2016-11-29 2018-06-07 张跃 Hot-air oxygen-free brazing system
KR102012158B1 (en) * 2019-05-13 2019-08-20 정영문 air conditioning apparatus

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2222050B2 (en) * 1972-05-05 1975-08-21 Leybold-Heraeus Gmbh & Co Kg, 5000 Koeln Method and device for vacuum sintering pressed bodies containing hydrocarbons from powdered starting materials
JPH0424576Y2 (en) * 1985-01-29 1992-06-10
JPH03420U (en) * 1989-05-25 1991-01-07
JPH059556A (en) * 1991-07-02 1993-01-19 Daido Steel Co Ltd Gas feeding method for heat treating furnace
JP3461187B2 (en) * 1993-10-02 2003-10-27 大阪瓦斯株式会社 Paint drying oven
JP3000420U (en) * 1994-01-25 1994-08-09 日本電熱計器株式会社 Atmosphere cooling device for soldering equipment
JP3959141B2 (en) * 1996-11-12 2007-08-15 エスペック株式会社 Heat treatment equipment with sublimation countermeasures
JP2001201271A (en) * 2000-01-24 2001-07-27 Shinko Mex Co Ltd Exhaust gas treatment system of vertical blast furnace for copper
JP4402846B2 (en) * 2001-02-20 2010-01-20 中外炉工業株式会社 Continuous firing furnace for flat glass substrates
JP2002257314A (en) * 2001-03-02 2002-09-11 Ngk Insulators Ltd Hot blast generator
JP2003158082A (en) * 2001-11-22 2003-05-30 Hitachi Ltd Substrate processor
JP2003229425A (en) * 2002-02-05 2003-08-15 Hitachi Kokusai Electric Inc Substrate processing apparatus
JP4111269B2 (en) * 2002-12-19 2008-07-02 株式会社日立国際電気 Substrate processing equipment
JP2004206983A (en) * 2002-12-25 2004-07-22 Pioneer Electronic Corp Manufacturing method of plasma display panel, and heat treatment device therefor
CN100501287C (en) * 2003-01-25 2009-06-17 北京环能海臣科技有限公司 Thermal gas recycling device for retrieving condensed water from dehydrating material
JP4010411B2 (en) * 2003-04-14 2007-11-21 光洋サーモシステム株式会社 Continuous firing furnace with exhaust gas treatment unit
JP2005037024A (en) * 2003-07-18 2005-02-10 Matsushita Electric Ind Co Ltd Baking furnace for plasma display panel
JP4098179B2 (en) * 2003-07-30 2008-06-11 日本碍子株式会社 Heat treatment furnace
JP2005071632A (en) * 2003-08-25 2005-03-17 Fujitsu Hitachi Plasma Display Ltd Method and device for manufacturing plasma display panel
JP2007085702A (en) * 2005-09-26 2007-04-05 Espec Corp Glass substrate treating device, glass substrate treating system and glass substrate treating method
JP4291832B2 (en) * 2006-06-23 2009-07-08 株式会社フューチャービジョン Air supply and exhaust system for substrate firing furnace
JP4372806B2 (en) * 2006-07-13 2009-11-25 エスペック株式会社 Heat treatment equipment
JP4331784B2 (en) * 2008-07-22 2009-09-16 株式会社フューチャービジョン Supply and exhaust method for substrate firing furnace

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI404955B (en) * 2009-02-23 2013-08-11 Yang Electronic Systems Co Ltd Cooling and moisture-proofing apparatus for use in electric property test of flat panel display substrate

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TWI476356B (en) 2015-03-11
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