TW200905151A - Heat treatment equipment - Google Patents

Heat treatment equipment Download PDF

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Publication number
TW200905151A
TW200905151A TW097115911A TW97115911A TW200905151A TW 200905151 A TW200905151 A TW 200905151A TW 097115911 A TW097115911 A TW 097115911A TW 97115911 A TW97115911 A TW 97115911A TW 200905151 A TW200905151 A TW 200905151A
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TW
Taiwan
Prior art keywords
heat treatment
gas
heat
chamber
catalyst
Prior art date
Application number
TW097115911A
Other languages
Chinese (zh)
Inventor
Hisamitsu Tezen
Original Assignee
Espec Corp
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Publication date
Application filed by Espec Corp filed Critical Espec Corp
Publication of TW200905151A publication Critical patent/TW200905151A/en

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Classifications

    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27BFURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B17/00Furnaces of a kind not covered by any preceding group
    • F27B17/0016Chamber type furnaces
    • F27B17/0025Especially adapted for treating semiconductor wafers
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27BFURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B17/00Furnaces of a kind not covered by any preceding group
    • F27B17/0016Chamber type furnaces
    • F27B17/0083Chamber type furnaces with means for circulating the atmosphere
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27DDETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D7/00Forming, maintaining, or circulating atmospheres in heating chambers
    • F27D7/02Supplying steam, vapour, gases, or liquids
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27DDETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D7/00Forming, maintaining, or circulating atmospheres in heating chambers
    • F27D7/04Circulating atmospheres by mechanical means
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27DDETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D7/00Forming, maintaining, or circulating atmospheres in heating chambers
    • F27D7/02Supplying steam, vapour, gases, or liquids
    • F27D2007/023Conduits
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27DDETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D7/00Forming, maintaining, or circulating atmospheres in heating chambers
    • F27D7/04Circulating atmospheres by mechanical means
    • F27D2007/045Fans

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Furnace Details (AREA)
  • Waste-Gas Treatment And Other Accessory Devices For Furnaces (AREA)

Abstract

The invention provides heat treatment equipment, causing that it is difficult for sublimates generated from the heated treatment products to flow out through an air guide hole. The heat treatment equipment includes a main body of the equipment including a heat treatment chamber, holding the heated treatment products, which can be extracted from the heat treatment chamber; and a heating chamber, communicating with the heat treatment chamber, wherein in the heating chamber, the heat treatment air is heated through the air guide hole of the heating chamber to the heating chamber, for heat treatment on the heated treatment products, and the air after heat treatment is inducted from the heat treatment chamber through the air guide hole arranged at the heat treatment chamber.; The heat treatment equipment is provided with accelerants, jammed at an inlet of the air guide hole, which decomposes the sublimate generated from the heated treatment products included in the air after heat treatment.

Description

200905151 ' 九、發明說明: 【發明所属之技術領域] 本發明有關於對被執虚理私7U i …、爽理物進仃熱處理的熱處理裴 置。200905151 ' IX. Description of the invention: [Technical field to which the invention pertains] The present invention relates to a heat treatment apparatus for heat treatment of a 7U i ..., a dry material.

L无耵技術J / 目前公知的熱處理裝置’―邊使熱處理室内的空^ 圈-邊加熱熱處理室’以對收容在熱處理室内的被熱處; 物進打熱處理。這樣的熱處理裝置,例如,可以在平心 不器(Hat Panel Dlsplay)的製造過程中用於對心 /Phot。Resist)或有機薄膜的預供如―驗)工序 後烘(Post bake )工序。名;;古砂 . 。二工序中,當對玻璃基板I 被熱處理物進行熱處理時,光 ,^ ^ ^ 尤阻荨所包含的揮發性成分巧 '而產生大量的昇華物。其中存在昇華物再結晶 附著在熱處理裝置等的問題。 。 n 作為此問題的解決方案 開平—號公報公開這專:公開= 戶外的空氣並將其送入上述敎邊加熱 上述熱處理室内的空氣产出 至内-邊通過導出管使 土 3 J工札/现出,以盤 氣。這樣對上述熱處理室内進行換理室内進行換 結晶並附著在熱處理裝p 、乱,可以抑制昇華物再 此外,也可以在熱處理室 媒以代替或加上上述熱處理 置觸媒,按照其配置位置的不 内配置用於除去昇華物的觸 室内的換氣。然而,即使配 同,也會導致通過熱處理產L flawless technique J / a conventionally known heat treatment apparatus ‘the heat treatment chamber in the heat treatment chamber is heated to the heat-receiving chamber contained in the heat treatment chamber; the material is subjected to heat treatment. Such a heat treatment device can be used, for example, for the center/Phot in the manufacturing process of a Hat Panel Dlsplay. Resist) or pre-supplied organic film, post-bake process. Name;; ancient sand. In the second step, when the heat-treated material of the glass substrate I is subjected to heat treatment, the light, and the volatile components contained in the film, are formed to generate a large amount of sublimate. Among them, there is a problem that the sublimate recrystallizes and adheres to the heat treatment apparatus. . n As a solution to this problem, the Kaiping-No. Gazette discloses this special: public = outdoor air and sent it to the above-mentioned side to heat the air in the above heat treatment chamber to the inside - side through the outlet pipe to make the soil 3 J / Show off, take the breath. In this way, the inside of the heat treatment chamber is subjected to crystal change and adhered to the heat treatment apparatus p, and the sublimation material may be suppressed. Alternatively, the heat treatment chamber medium may be used instead of or in addition to the heat treatment catalyst. The ventilation in the chamber for removing the sublimate is not disposed inside. However, even with the same, it will lead to heat production.

2014-9644-PF 200905151 生的昇華物不被觸婼 θ哇 、心就向氣體導出孔流出,再結晶的 升華物附著在氣體導出 的 出孔或與其連接的導出管等。因此, 上述的熱處理裝置還留有改善的餘地。 【發明内容】 ±本毛明的目的在於提供-種熱處理裝置,可以使轨處 理時從被熱處理物產生的 ^ 生的幵華物難以通過氣體導出孔流 出。 本土 θ $面有關的熱處理裝置包括裝置主體,該裝 置主體具有:熱處理室,收容被熱處理物,該被熱處理物 可從4熱處理至取出;以及加熱室,與上述熱處理室% 通,其中,在上述加熱室内,對通過設置在上述加熱室的 氣月且一入孔導入到上述加熱g _熱處理用t體進行加 熱’以對上述被熱處理物進行熱處理,並通過設置在上述 熱處理至的氣體導出孔,將熱處理完畢的氣體從上述熱處 理室導出’這種熱處理裝置的要點在於:設置有觸媒,堵 塞上述氣體導出孔的入口,該觸媒可以分解上述熱處理完 畢的氣體中所包含的從上述被熱處理物產生的昇華物。 由此 了以使熱處理時從被熱處理物產生的昇華物難 以通過氣體導出孔流出。 【實施方式】 以下,參照附圖對本發明的實施例進行詳細的說明。 (第一實施例)2014-9644-PF 200905151 The sublimate material is not touched. θ Wow, the heart flows out to the gas outlet hole, and the recrystallized sublimate is attached to the gas outlet hole or the outlet tube connected thereto. Therefore, the above heat treatment apparatus leaves room for improvement. SUMMARY OF THE INVENTION The purpose of the present invention is to provide a heat treatment apparatus which makes it difficult for a raw material generated from a material to be heat-treated at a rail to be discharged through a gas outlet hole. The heat treatment device related to the local θ $ surface includes a device body having: a heat treatment chamber for accommodating the heat-treated material, the heat-treated material can be heat-treated from 4 to be taken out; and a heating chamber communicating with the heat treatment chamber, wherein In the heating chamber, the gas is introduced into the heating chamber and the inlet hole is introduced into the heating g_heat treatment t body to heat the material to be heat-treated, and the gas is heat-treated by the heat treatment. a hole for extracting a heat-treated gas from the heat treatment chamber. The main point of the heat treatment apparatus is that a catalyst is provided to block an inlet of the gas outlet hole, and the catalyst can decompose the gas contained in the heat-treated gas from the above Sublimate produced by the heat treated material. Therefore, it is difficult for the sublimate generated from the object to be heat-treated at the time of heat treatment to flow out through the gas outlet hole. [Embodiment] Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. (First Embodiment)

2014-9644-PF 6 200905151 圖1是本發明的第—實施例的熱處理裝置的概略結構 圖。此熱處理裝置1A例如用於平板顯示器的製造工序。此 裝置1A設置在無塵室(Clean R〇〇m)内’稱為無塵烤箱。 熱處理裝置1A包括裝置主體10,該裝置主體1〇在其 内部具有:熱處理室U,收容被熱處理物(工件)w,該 被熱處理物W可以從熱處理室11中取出和;以及加熱室 1 2,向熱處理室丨丨供給熱空氣。在圖示的例子中,加熱室 1 2配置在熱處理室11的上方。 裝置主體1 〇 1其剖s為矩形狀的箱形,具冑四個側面 (側壁)' 天棚(頂部)和底面(底部)。在此,右側面 (右侧壁)為1 〇a,内側面(内側壁)為i 〇b,左侧面(左 侧壁)為10c,天棚為1〇d,底面為1〇e。 在右側面10a的與加熱室12對應的高度位置上設置有 氣體導入孔14。_ ’氣體導人孔14設置在加熱室12的側 土上此氣體導入孔14與安裝在右側面i 〇a外側的導入管 15聯通。而且,在右侧自1〇a的與熱處理室u對應的高 度位置(在圖示的例子中靠近熱處理室u的底面的位置即 下方位置)上設置有氣體導出孔1 6。即,氣體導出孔^ 6 設置在熱處理室11的側壁上°此氣體導出孔16與安裝在 右側面10a外側的導出管I?聯通。 導入g 1 5及氣體導入孔! 4用於將戶外的空氣導入到 加…、至12内’氣體導出孔16及導出管η用於將熱處理室 11内的空氣導出到外部。 在上述加熱室12和熱處理室丨丨之間設置有分離板工3。2014-9644-PF 6 200905151 Fig. 1 is a schematic configuration diagram of a heat treatment apparatus according to a first embodiment of the present invention. This heat treatment apparatus 1A is used, for example, in the manufacturing process of a flat panel display. This device 1A is disposed in a clean room (Clean R〇〇m) and is referred to as a dust-free oven. The heat treatment apparatus 1A includes a device main body 10 having therein a heat treatment chamber U for accommodating a heat-treated product (workpiece) w, which can be taken out from the heat treatment chamber 11; and a heating chamber 1 2 , supplying hot air to the heat treatment chamber. In the illustrated example, the heating chamber 12 is disposed above the heat treatment chamber 11. The apparatus main body 1 〇 1 has a rectangular shape in the shape of a box having four sides (side walls) of a ceiling (top) and a bottom (bottom). Here, the right side (right side wall) is 1 〇a, the inner side (inner side wall) is i 〇 b, the left side (left side wall) is 10c, the ceiling is 1 〇d, and the bottom is 1 〇e. A gas introduction hole 14 is provided at a height position of the right side surface 10a corresponding to the heating chamber 12. The gas guiding hole 14 is disposed on the side of the heating chamber 12, and the gas introducing hole 14 communicates with the introduction pipe 15 attached to the outside of the right side surface i 〇 a. Further, a gas lead-out hole 16 is provided on the right side from a height position corresponding to the heat treatment chamber u of 1〇a (a position close to the bottom surface of the heat treatment chamber u in the illustrated example). That is, the gas lead-out hole 6 is provided on the side wall of the heat treatment chamber 11. This gas lead-out hole 16 communicates with the lead-out tube I? attached to the outside of the right side surface 10a. Import g 1 5 and gas inlet holes! 4 is for introducing outdoor air into the air supply opening 16 and the outlet pipe η for discharging the air in the heat treatment chamber 11 to the outside. A split sheet 3 is disposed between the heating chamber 12 and the heat treatment chamber 上述.

2014-9644-PF 7 200905151 板1 3水平架a又在内側面1 〇 b和與内侧面1 〇 b對置的 圖中沒有表示的前側面上,在分離板13和右側面10a之間 形成有間隙13a’在分離板13和左側面10c之間形成有間 隙 即,在I置主體10内形成有靠近氣體導入孔14 及氣體導出孔16側的間隙13a和偏離氣體導入孔14及氣 體導出孔16側的間隙i3b。 卞㈣分離板13上方的加熱巾設置有加熱器2〇 和鼓風機21。加熱器2〇對通過導入管15及氣體導入孔“ 導=的户外的空氣及在裝置主體1〇内迴圈的空氣進行 機21向熱處理室11送出被加熱的戶外的空氣 體1〇内迴圈的空氣。間隙13a位於鼓風機?! 的及風侧,間請位於鼓風機21的送風側。 在熱處理室n的右侧面…上,將觸媒 體導出孔16的入口邻八m ^ 女1在風 16的入口丨…^ 該觸媒22堵塞氣體導出孔 ί6的另:163。觸媒22被未圖示的固定部件固定。 —另卜在熱處理室u的内側設置有 不),可以保持例如—個或兩個埶、 β 定狀態。在圖",以雙點割線表亍=處理4"的規 觸媒22用於促進熱處理完畢:::部件的位置。 物的氧化分解反應,作為觸媒22,例如III所包含的昇華 鈀(Pd)等貴金屬戏 *用白金(Pt)、 觸媒以在大約15。〜屬的合金等活性金屬。這種 能。 I右的溫度空氣尹得到觸媒性 在具有這種結構 的熱處理裝置 利用加熱器 202014-9644-PF 7 200905151 The plate 1 3 horizontal frame a is formed between the separation plate 13 and the right side surface 10a on the inner side surface 1 〇b and the front side surface not shown in the figure opposite to the inner side surface 1 〇b. A gap 13a' is formed with a gap between the separation plate 13 and the left side surface 10c, that is, a gap 13a close to the gas introduction hole 14 and the gas outlet hole 16 side and the deviation gas introduction hole 14 and the gas are formed in the I body 10. The gap i3b on the side of the hole 16. The heating pad above the 卞 (4) separating plate 13 is provided with a heater 2 〇 and a blower 21. The heater 2 送 returns the heated outdoor air body to the heat treatment chamber 11 by the outdoor air passing through the introduction pipe 15 and the gas introduction hole and the air circulating in the apparatus main body 1 . The air of the circle. The gap 13a is located on the wind side of the blower?!, please be located on the air supply side of the blower 21. On the right side of the heat treatment chamber n, the entrance of the touch medium outlet hole 16 is adjacent to the ground 8 m ^ female 1 The inlet of the wind 16 ^...^ The catalyst 22 blocks the other: 163 of the gas outlet hole ί6. The catalyst 22 is fixed by a fixing member (not shown). - Alternatively, it is provided inside the heat treatment chamber u, and can be held, for example. - One or two 埶, β deterministic states. In the figure ", the two-point secant table 亍 = process 4 " the catalyst 22 is used to promote the heat treatment::: the position of the component. The oxidative decomposition reaction of the object, as The catalyst 22, for example, a noble metal such as sublimation palladium (Pd) contained in III, is made of platinum (Pt), and the catalyst is an active metal such as an alloy of about 15. genus. This energy can be obtained by the right temperature of the air. Catalyst uses a heater 20 in a heat treatment apparatus having such a structure

2014-9644-PF 200905151 對通過導入管15及氣體導入孔14導入到加熱室i2内的空 氣進行加熱,並利用鼓風機21將該所加熱的线經過間隙 供給到熱處理t u。導入到熱處理室n内的熱空氣經 過間隙13a再被供給到加熱室以,進行迴圈。在此迴圈 過程中,空氣的—部分通過氣體導出孔16及導出管㈣ 外部排出。經過間隙13a再被供給到加熱室12内進行迴圈 的空氣與從氣體導入孔14導入來的空氣相互混合。 利用這樣流動的空氣,對熱處理室u内的工件w進行 熱處理。此時,從工件w產生昇華物a,言亥昇華物A包含 f熱處理完畢的空氣中進行移動。如果昇華物A與配設在 ::導出孔16的入口 16&上的觸媒22相接觸,昇華物A 就:到氧化分解反應而被去除。去除了昇華物A的空氣通 過氣體導出孔16及導出管1 7排出。 因此,在第一實施例的熱處理裝置u中,可以得到如 下的效果。 以 )因為觸媒22堵塞氣體導出孔16的入口 16a,所 处$從被熱處理物w產生的昇華物A的熱處理完畢的 空亂之中,要通過氣體導出孔16排出的空氣都與觸媒Μ :接觸。因此,可以實現昇華物A難以從氣體導出孔“流 )包έ幵華物A的熱處理完畢的空氣在導出管I) 内被冷卻之前,可以利用觸媒22分解昇華物a。因此,可 ,制觸媒22的溫度降低,能夠使觸媒22的處理效率提 南。2014-9644-PF 200905151 The air introduced into the heating chamber i2 through the introduction pipe 15 and the gas introduction hole 14 is heated, and the heated wire is supplied to the heat treatment ut through the gap by the blower 21. The hot air introduced into the heat treatment chamber n is supplied to the heating chamber through the gap 13a to perform a loop. During this loop, part of the air is exhausted through the gas outlet hole 16 and the outlet tube (4). The air that has been supplied to the heating chamber 12 through the gap 13a and that is looped is mixed with the air introduced from the gas introduction hole 14. The workpiece w in the heat treatment chamber u is heat-treated by the air thus flowing. At this time, the sublimate a is generated from the workpiece w, and the haihai sublimate A is moved in the air in which the heat treatment is completed. If the sublimate A comes into contact with the catalyst 22 disposed at the inlet 16& of the ::extraction hole 16, the sublimate A is removed by the oxidative decomposition reaction. The air from which the sublimate A is removed is discharged through the gas outlet hole 16 and the outlet pipe 17. Therefore, in the heat treatment apparatus u of the first embodiment, the following effects can be obtained. In order to block the inlet 16a of the gas outlet hole 16 by the catalyst 22, the air to be discharged through the gas outlet hole 16 is separated from the catalyst by the heat treatment of the sublimate A generated from the heat-treated material w. Μ: Contact. Therefore, it is possible to realize that the sublimated material A is difficult to "flow" from the gas outlet hole, and the heat-treated air of the package A is cooled in the outlet pipe I), and the catalyst 22 can be used to decompose the sublimate a. Therefore, The temperature of the catalyst 22 is lowered, and the processing efficiency of the catalyst 22 can be increased.

2014-9644-PF 200905151 (C )因為觸媒22設置在熱處理 使用不能收容在氣體導出孔16^ ,所以,可以 為包含昇華物A的熱處理完 乂教觸媒。並且’因 _ , 工乳在熱處理室 11内迴 圈,所以,通過在熱處理室n内 ^ 士!〇 — 1 1 又置觸媒2 2 ’可以使教 處理至11内流動的昇華物 …、 接觸觸媒2 2的幾率提高。據 此,可以使觸媒22對昇華物的氧 跟 h 7虱化分解反應的促進進一步 提南。 (第二實施例) 圖2疋本叙明的第二實施例的熱處理裝置的概略結構 圖。在圖中’對與圖1相同的構件附加了相同的附圖標記。 此熱處理裝i 1B包括配置在加熱室12和熱處理室U 之間的分割板30,以代替第一實施例的熱處理裘置ia的 分離板13。此分割板3〇被裝置主體1〇的右側面1〇“口内 側面1〇b和前侧面水平支撐。並且,只有在間隔板3〇和左 側面l〇c之間形成有間隙3〇a。即,此間隙3〇&設置在與 設置有氣體導入孔14及氣體導出孔1 6的右側面! 〇a相反 的一侧。換句話說,在鼓風機2 j的送風側設置有間隙加& 而在鼓風機21的吸風側沒有設置間隙。 在此熱處理裝置1B中,利用加熱器20對通過導入管 15及氣體導入孔14導入到加熱室12内的空氣進行加熱, 並利用鼓風機21將該所加熱的空氣經過上述間隙3〇a供給 到熱處理室11。並且,空氣不返回到加熱室12内,利用 觸媒22去除昇華物a並通過氣體導出孔16及導出管17排 出。即’因為通過氣體導入孔14導入到裝置主體1〇内的2014-9644-PF 200905151 (C) Since the catalyst 22 is disposed in the heat treatment, it cannot be accommodated in the gas outlet hole 16^, so that the heat treatment of the sublimate A can be performed. And because of the _, the working milk is looped in the heat treatment chamber 11, so it is passed through the heat treatment chamber n! 〇 — 1 1 The catalyst 2 2 ' can be used to increase the probability of contact with the catalyst 2 in the flow of the sublimate ... and the contact with the catalyst 2 2 . Accordingly, the catalyst 22 can further promote the promotion of the oxygen and h 7 decomposing reactions of the sublimate. (Second Embodiment) Fig. 2 is a schematic configuration diagram of a heat treatment apparatus according to a second embodiment of the present invention. In the drawings, the same reference numerals are attached to the same members as those in Fig. 1. This heat treatment package i 1B includes a split plate 30 disposed between the heating chamber 12 and the heat treatment chamber U in place of the separation plate 13 of the heat treatment set ia of the first embodiment. This dividing plate 3 is horizontally supported by the right side surface 1" of the apparatus main body 1" "the inner side surface 1b" and the front side surface. Further, a gap 3〇a is formed only between the partition plate 3A and the left side surface l〇c. That is, the gap 3〇& is provided on the opposite side to the right side surface 〇a where the gas introduction hole 14 and the gas lead-out hole 16 are provided. In other words, a gap is added to the air supply side of the blower 2j. On the air suction side of the air blower 21, no gap is provided. In the heat treatment apparatus 1B, the air introduced into the heating chamber 12 through the introduction pipe 15 and the gas introduction hole 14 is heated by the heater 20, and is blown by the air blower 21. The heated air is supplied to the heat treatment chamber 11 through the gap 3〇a. Further, the air is not returned to the heating chamber 12, and the sublimate a is removed by the catalyst 22 and discharged through the gas outlet hole 16 and the outlet tube 17. Because it is introduced into the device body 1 through the gas introduction hole 14

2014-9644-PF 10 200905151 工氣知:照加敎室〗9 ^ …、至u、熱處理室11、氣 進行移動,所w如 導出孔16的順序 ,二氣不會從熱處理室11 1 2 〇 王丄1返回到加熱室 口此’在此第二音大&办丨士 , 的效果’此外’還可以得到下述的(d) 相同的(a)〜,、、' 可以得到與第一實施例 的效果。 )口為空氣不從埶處理室1】该门不丨 以,從加敎室至11返回到加熱室12’戶) 華物A的新鮮 内的工軋疋不包含男 導入的斩^ 可以利料過氣體導入孔1 ¥的新鮮的空氣進行熱處 制熱處理室Μ肉沾θ 1使觸嫘U泌化也能夠拆 "内可以/ 華物濃度的增加。而且,在熱處理室 化所Μ㈣讀制觸媒22的劣 至U内的幵華物濃度的增加。 (第三實施例) 圖3是本發明的第三實施例的熱處理裝置的 二’對與圖1相同的構件附加了相同的附圖標記 此熱處理裝置1C,a μ罢士 本Α 在5又置有回流管18這一點上與 一貝知例的熱處理裝置u有 乐 山” U有所不同,回流管18將流經導 官7的空氣的-部分返回到導入管^。回流管心复 一端與導入管15的途中部位聯通,另-端與導出管17二 途中部位聯通。在回流管18的内部設有鼓風冑19,使* 氣從上述另一端向上述一端流通。 二 因此’在此熱處理裝置1。中,可以得到與第-實施例 相同的(Ο、⑴及⑴的效果,此外,還可以得到下2014-9644-PF 10 200905151 The work knows: according to the chamber 〗9 ^ ..., to u, the heat treatment chamber 11, the gas moves, so as the order of the holes 16 is exported, the second gas will not be from the heat treatment chamber 11 1 2 〇王丄1 returned to the heating chamber mouth this 'in this second sound big & gentleman, the effect 'in addition' can also get the following (d) the same (a) ~,,, ' can be obtained with The effect of the first embodiment. The mouth is the air does not come from the processing room 1] The door is not smashed, from the twisting chamber to the 11th return to the heating chamber 12' household) The fresh inside of the Chinese A is not included in the male 斩^ The fresh air that has passed through the gas introduction hole 1 is subjected to heat treatment in the heat treatment room, and the meat is dip θ1 so that the contact with the U can also be removed. Further, in the heat treatment chamber, (4) the increase in the concentration of the catalyst 22 which is inferior to the U in the U is read. (Third Embodiment) Fig. 3 is a second embodiment of a heat treatment apparatus according to a third embodiment of the present invention. The same reference numerals are attached to the same members as those of Fig. 1. This heat treatment apparatus 1C, a μ striker is at 5 The point at which the return pipe 18 is placed is different from that of a heat treatment device u, which is a Leshan "U", and the return pipe 18 returns the portion of the air flowing through the guide 7 to the introduction pipe ^. It is connected to the midway portion of the introduction pipe 15, and the other end is connected to the intermediate portion of the outlet pipe 17. The blast pipe 19 is provided inside the return pipe 18, and the gas is circulated from the other end to the one end. In the heat treatment apparatus 1, the same effects as those of the first embodiment (Ο, (1), and (1) can be obtained, and further, the following can be obtained.

2014-9644-PF 11 200905151 述(e )的效果。 e因為通過氣體導出孔U排出的熱處理完畢的空 氣的-部分通過回流管18返回到氣體導入孔14(加熱室 '可以將熱處理完畢的空氣具有的熱量再利用 到被熱處理物W的熱處理中。 另外,圖4所示的熱處理裝置卯也可以得到此效果 (e )豸處理裝置1D是在圖2所示的熱處理裝置…上設 置了本實施例的回流管1δ而構成的裝置。 (第四實施例) 圖5是本發明的第四實施例的熱處理裝置的概略結構 圖在圖中’對與圖2相同的構件附加了相同的附圖標記。 在此=處理裳置1Ε中,導出管頭部的結構和觸媒的配 置方法與第—實施例的熱處理裝置1Β有所不同。以下,對 其不同點進行詳細說明。 觸媒32安裝在導出管31的頭部。觸媒32通過未圖示 的tl件可裝卸地安裝在導出管31上。導出管31具有向其 外周面突出的凸緣31a。導出管31白勺比凸緣3la更靠頭部 的部位插入氣體導出孔1 6内。 將在頭部安裝有觸媒32的導出管3丨從頭部向氣體導 出孔1 6内依次插入,使凸緣3丨a抵接在右侧面丨〇a的外壁 面。在此狀態下,通過螺絲等將凸緣31a固定在右側面i 〇a 上’則觸媒32被配置在氣體導出孔1 6的入口 1 6a。此觸 媒32的尺寸和剖面形狀大體上與氣體導出孔1 6的内剖面 和尺寸相同。觸媒32和氣體導出孔16的入口 的位置2014-9644-PF 11 200905151 The effect of (e). e is that the portion of the heat-treated air discharged through the gas outlet hole U is returned to the gas introduction hole 14 through the return pipe 18 (the heating chamber' can reuse the heat of the heat-treated air to the heat treatment of the heat-treated material W. Further, the heat treatment apparatus shown in Fig. 4 can also obtain this effect. (e) The processing apparatus 1D is a device in which the return pipe 1? of the present embodiment is provided in the heat treatment apparatus shown in Fig. 2. [Embodiment] Fig. 5 is a schematic configuration diagram of a heat treatment apparatus according to a fourth embodiment of the present invention. In the figure, 'the same members as those in Fig. 2 are denoted by the same reference numerals. The configuration of the head and the method of arranging the catalyst are different from those of the heat treatment apparatus 1 of the first embodiment. Hereinafter, the differences will be described in detail. The catalyst 32 is attached to the head of the discharge tube 31. The catalyst 32 passes through The illustrated tl piece is detachably attached to the outlet pipe 31. The outlet pipe 31 has a flange 31a that protrudes toward the outer peripheral surface thereof. The outlet pipe 31 is inserted into the gas outlet hole 16 at a portion closer to the head than the flange 31a. Inside. The outlet pipe 3 to which the catalyst 32 is attached to the head is inserted in order from the head to the gas outlet hole 16 so that the flange 3丨a abuts against the outer wall surface of the right side face a. In this state, the screw is passed. The flange 31a is fixed to the right side i 〇a', and the catalyst 32 is disposed at the inlet 16a of the gas outlet hole 16. The size and cross-sectional shape of the catalyst 32 is substantially the same as that of the gas outlet hole 16. The section and dimensions are the same. The position of the inlet of the catalyst 32 and the gas outlet hole 16

2014-9644-PF 12 200905151 關係設定為:觸媒3 2的熱處理室11側 惻的端面和氣體導出 孔1 6的入口 1 6a位於同一平面上, :¾考,觸媒32的與熱 處理室11側的端面相反的端面位於氣體 ’、 月且守出孑L 1 6内,且 觸媒32的熱處理室11侧的端面從氣體 咖彳awu 16的入口 1 6a向熱處理室11側突出。 因此,在此熱處理裝置1E中,可 付判與第二實施例 相同的U)〜(d)的效果’此外,還可以得到下述⑴ 的效果。2014-9644-PF 12 200905151 The relationship is set such that the end face of the heat treatment chamber 11 side of the catalyst 3 2 and the inlet 16 6a of the gas lead-out hole 16 are located on the same plane, : 3⁄4 test, the catalyst 32 and the heat treatment chamber 11 The end surface opposite to the end surface of the side is located in the gas ', month, and the 孑 L 16 , and the end surface on the side of the heat treatment chamber 11 of the catalyst 32 protrudes from the inlet 16 6a of the gas café awu 16 toward the heat treatment chamber 11 side. Therefore, in the heat treatment apparatus 1E, the effects of U) to (d) which are the same as those of the second embodiment can be determined. Further, the effects of the following (1) can be obtained.

(f)通過將導出管31的頭部插入氣體導出孔Μ内, 可以配置觸媒32,堵塞氣體導出孔16的入口工“。反之 通過從氣體導出孔16取下導出管3卜可以將觸二2:氣 體導出孔16中脫開,此’能夠易於進行觸媒' 32的交換。 另外’在此第四實施例中,在導出管31的頭部的端面 配設了觸女某32 ’但是’也可以在導出f 31的頭部的内側 配設觸媒。如果要在導出管31的si都认士 / t * s 1的碩部的内側配設觸媒,不 可在氣體導出孔16和導出管31之間存在間隙。 此外,也可以準備與導出t 31分開的觸媒32,先將 觸媒3 2放入氣體導出孔1 6内並在那裏插入導出管31,利 用導出管31推壓,使觸媒32配置並覆蓋在入口 l6a上。 在此情況下,如果在氣體導出孔16的入口 16a上設置具有 孔的制動器,就可以簡單地實現位置決定及防止脫落。 此外,在圖1的熱處理裝置1A、圖3的熱處理裝置1C 及圖4的熱處理裝置1D上分別組合第四實施例的導出管 31和觸媒32的結構也當然可以同樣地獲得上述效果(f )。 2014-9644-PF 13 200905151 在上述的第一〜第四實施例中,將氣體導入孔丨4和氣 體導出孔16配置在同_個右側面心上,但是,本發明並 不僅限於此,也可以將氣體導入孔14和氣體導出孔以配 置在其他的三個側面中的一個側面上’或將氣體導入孔Μ 和氣體導出孔16配置在不同的侧面上。(f) By inserting the head of the outlet tube 31 into the gas outlet port, the catalyst 32 can be disposed to block the inlet of the gas outlet hole 16. Instead, the outlet tube 3 can be removed by removing the outlet tube 3 from the gas outlet hole 16. 2: The gas outlet hole 16 is disengaged, and this 'can be easily exchanged with the catalyst' 32. In addition, in the fourth embodiment, the end face of the outlet tube 31 is provided with a contact lens 32' However, it is also possible to arrange a catalyst on the inside of the head of the lead f 31. If the catalyst is to be disposed inside the shunt portion of the outlet tube 31, the gas is not allowed to be in the gas outlet hole 16 There is a gap between the outlet tube 31 and the outlet tube 31. Alternatively, the catalyst 32 separated from the outlet t 31 may be prepared, and the catalyst 3 2 is first placed in the gas outlet hole 16 and inserted into the outlet tube 31 there, using the outlet tube 31. Pushing, the catalyst 32 is disposed and covered on the inlet 16a. In this case, if a stopper having a hole is provided in the inlet 16a of the gas outlet hole 16, positional determination and prevention of falling off can be easily achieved. Heat treatment device 1A of Fig. 1, heat treatment device 1C of Fig. 3, and Fig. 4 The above-described effect (f) can of course be obtained in the same manner in the configuration of the discharge tube 31 and the catalyst 32 of the fourth embodiment in the processing apparatus 1D. 2014-9644-PF 13 200905151 In the first to fourth embodiments described above The gas introduction port 4 and the gas outlet hole 16 are disposed on the same right side face. However, the present invention is not limited thereto, and the gas introduction hole 14 and the gas lead hole may be disposed on the other three sides. On one of the sides, the gas introduction port and the gas outlet hole 16 are disposed on different sides.

而且’上述的第一〜第四實施例例舉了在熱處理室U 的上方配置加熱室12的熱處理裝置,但是,本發明並不僅 限於此’也可以適用於加熱室配置在熱處理室的下方,或 者側方的熱處理裝置。 (實施例概要) 對實施例歸納如下: ⑴在本實施例中’設置有堵塞氣體導出孔的入口的 觸媒’所以,包含從被熱處理物 处奶座生的昇華物的熱處理完 畢的氣體之中要通過氣體導出孔排出的氣體都與觸媒相接 觸。因此,可以使昇華物難以從氣體導出孔流出。而且, 包含昇華物的熱處理完畢的氣體在導出管中被冷卻之前, 可以通過觸媒分解昇華物。由此, J μ抑制觸媒的溫度降 低,能夠使觸媒的處理效率提高。 …2)在上述的熱處理裝置中’上述觸媒設置在熱處理 至的内側。根據此結構’因為觸媒設置在熱處理室的内側, 所以,可以將手放入熱處理室内 η木乂換觸媒。而且,由於 可以使用不能收容在氣體導出孔 、 J杈大的觸媒,所以名 使包含昇華物的熱處理完畢的氣 7虱體在熱處理室内迴圈時, 可以使其與觸媒接觸的幾率提 千杈阿。由此,可以使觸媒對昇Further, the first to fourth embodiments described above exemplify a heat treatment apparatus in which the heating chamber 12 is disposed above the heat treatment chamber U. However, the present invention is not limited to this, and the heating chamber may be disposed below the heat treatment chamber. Or a side heat treatment device. (Summary of the Examples) The following are summarized as follows: (1) In the present embodiment, 'the catalyst for clogging the inlet of the gas outlet hole' is provided, so that the heat-treated gas containing the sublimate material from the milk seat at the object to be heat-treated is contained. The gas to be discharged through the gas outlet hole is in contact with the catalyst. Therefore, it is possible to make it difficult for the sublimate to flow out from the gas outlet hole. Further, the heat-treated gas containing the sublimate may be decomposed by the catalyst before being cooled in the discharge tube. Thereby, J μ suppresses the temperature drop of the catalyst, and the processing efficiency of the catalyst can be improved. (2) In the above heat treatment apparatus, the above-mentioned catalyst is disposed inside the heat treatment. According to this structure, since the catalyst is disposed inside the heat treatment chamber, the hand can be placed in the heat treatment chamber to change the catalyst. Further, since it is possible to use a catalyst which cannot be accommodated in the gas outlet hole and has a large size, it is possible to increase the probability of contact with the catalyst when the heat-treated gas 7 body containing the sublimate is recirculated in the heat treatment chamber. Millenium. Thereby, the catalyst can be made to rise

2014-9644-PF 14 200905151 華物的氧化分解反應的促進進一步提高。 (3)在上述的熱處理裝詈中 展置中,包括導出管,該導出管 的頭部可脫開地從上述裝置主體的外側插入到上述氣體導 出孔的内側,上述觸媒具有堵塞上述氣體導出孔的I口的 尺寸’且配設在上述導出管的頭部。並且,將上 插入到上述氣體導出孔,以# 使上述觸媒配置到上述氣體導 的^口。根據此結構’通過將導出管的頭部插入到氣 肢導出孔,配置觸媒,可以堵塞氣體導出孔的人口。反之, =氣Π出孔取下導出管,可以將觸媒從氣體導出孔 中脫開。因此,能夠易於進行觸媒的交換。 d4)在上述熱處理裝置中,將從上述氣體導出孔排出 氧的一部分返回到上述氣體導入孔。根據此結構,因 孔排出的熱處理完畢的氣體的-部分返回到 、 將;處理完畢的氣體具有的熱量 可以再利用到被熱處理物的熱處理中。 丄5)在上述熱處理裝置中,上述裝置主體在上述加熱 加孰^ 室之間設置有分割板,只允許氣體從上述 曾口’、、、至α上述熱處理室流動。根據此結構,因為通過氣體 V入孔導入到裝置主體内的氣體按照加熱 罐以的順序流動,所以,從加熱室供給到熱處二 :孔體疋不包含昇華物的新鮮的氣體。由此,可以利用從 虱體導人孔導人來的新鮮的氣體進行減理 ^ 在熱處理室中=理室内的昇華物濃度的增加。而且, 中了Μ抑制氣體停滯,因此,也可以抑制觸媒2014-9644-PF 14 200905151 The promotion of the oxidative decomposition reaction of Chinese is further improved. (3) In the above-described heat treatment device, the extension tube includes a discharge tube, and the head of the outlet tube is detachably inserted from the outside of the apparatus main body to the inside of the gas outlet hole, and the catalyst blocks the gas The size of the I port of the outlet hole is '' and is disposed at the head of the above-mentioned outlet pipe. Further, the upper portion is inserted into the gas lead-out hole, and the catalyst is placed in the gas guide port. According to this configuration, the population of the gas outlet holes can be blocked by inserting the head of the outlet tube into the gas outlet opening and disposing the catalyst. Conversely, the gas outlet is removed from the outlet tube to disengage the catalyst from the gas outlet. Therefore, the exchange of the catalyst can be easily performed. D4) In the above heat treatment apparatus, a part of the oxygen discharged from the gas outlet hole is returned to the gas introduction hole. According to this configuration, the portion of the heat-treated gas discharged from the pores is returned to, and the heat of the treated gas can be reused in the heat treatment of the heat-treated material.丄5) In the above heat treatment apparatus, the apparatus main body is provided with a partition plate between the heating and heating chambers, and only gas is allowed to flow from the above-mentioned heat exchanger chamber to the heat treatment chamber. According to this configuration, since the gas introduced into the apparatus main body through the gas V inlet hole flows in the order of the heating tank, it is supplied from the heating chamber to the hot portion 2: the pore body 疋 does not contain the fresh gas of the sublimate. Thereby, it is possible to perform the reduction by using a fresh gas guided from the scorpion guide hole. ^ In the heat treatment chamber, the increase in the concentration of the sublimate in the chamber. Moreover, the sputum suppresses the gas stagnation, and therefore, the catalyst can also be suppressed.

2014-9644-PF 15 200905151 的劣化所引起的熱處理室内的昇華物濃度的增加。 機’ :6人在么述熱處理裝置中,在上述加熱室設置有鼓風 八 ^風機的送風側設置有使上述加熱室和上述 熱處理室連通的間隙。裉摅 ^ 根據此結構,通過氣體導入孔導入 到加熱室内的潢髀,M、風, ^ 1,經過上述間隙流向 體導出孔排出。因此,名至通過乳 導出孔的順序進行流動。 及⑽ 【圖式簡單說明】 的概略結構 的概略結構 的概略結構 理裝置的概 圖1疋本發明的第—實施例的熱處理裝置 圖。 又 圖2是本發明的第二實施例的熱處理裝 圖。 圖3是本發明的第三實施例的熱處理裝置 圖。 圖4是本發明的第三實施例的其他的熱處 略結構圖。 圖 疋本叙明的第四實施例的熱處理裴 置的概略結構 【主要元件符號說明】 W〜被熱處理物; 1A〜熱處理裝置; 10〜裝置主體;2014-9644-PF 15 200905151 The increase in the concentration of the sublimate in the heat treatment chamber caused by the deterioration. In the heat treatment apparatus of the present invention, a gap is provided between the heating chamber and the heat treatment chamber on the air supply side where the air blower is provided in the heating chamber.裉摅 ^ According to this configuration, the M, wind, and ^1 introduced into the heating chamber through the gas introduction hole are discharged to the body outlet hole through the gap. Therefore, the name flows to the order in which the pores are led out through the milk. And (10) [Schematic Description of Schematic Configuration] Schematic Configuration of Schematic Configuration of the Schematic Configuration of the Apparatus of the First Embodiment of the Present Invention. Fig. 2 is a view showing the heat treatment of the second embodiment of the present invention. Fig. 3 is a view showing a heat treatment apparatus of a third embodiment of the present invention. Fig. 4 is a view showing another heat configuration of a third embodiment of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 3 is a schematic view showing a heat treatment structure of a fourth embodiment of the present invention. [Description of main components] W~heated material; 1A~heat treatment device; 10~device body;

2014-9644-PF 16 200905151 1 0 a〜右侧面; 1 0 b ~内側面; 1 0 c〜左侧面; 10d~天棚; 10e〜底面; 13〜分離板; 11〜熱處理室; 1 2〜加熱室; 13a、13b〜間隙; 14 ~氣體導入孔; 15〜導入管; 16〜氣體導出孔; 1 6 ~ 入 口; 17〜導出管; 2 0〜加熱器; 21 ~鼓風機; 2 2〜觸媒。 172014-9644-PF 16 200905151 1 0 a~right side; 1 0 b ~ inner side; 1 0 c~ left side; 10d~ ceiling; 10e~ bottom; 13~ separation board; 11~ heat treatment room; ~ heating chamber; 13a, 13b~ gap; 14 ~ gas introduction hole; 15~ introduction tube; 16~ gas outlet hole; 1 6 ~ inlet; 17~ outlet tube; 2 0~ heater; 21 ~ blower; catalyst. 17

2014-9644-PF2014-9644-PF

Claims (1)

200905151 十、申請專利範圍: ι_:種熱處理裝置,包括裝置主體,該裝置主體具有: 熱=至,收容被熱處理物’該被熱處理物可以從該熱處 理至中取出;以及加熱室,與上述熱處理室聯通’豆中, Γ述加熱室内’對通過設置在上述加熱室的氣體導入孔 ¥入到上述加熱室内的熱處理用氣體進行加熱,以對上述 ==熱處理’並通過設置在上述熱處理室的氣 體“孔,將熱處理完畢的氣體從上述熱處理室導出, =寺徵在於:設置有觸媒,堵塞上述氣體導出孔的入 口,该觸媒可以分解上述熱處理完畢的氣 上述被熱處理物產生的昇華物。 、攸 、、 申明專利範圍1項所述的熱處理裝置,其 述觸媒設置在上述熱處理室的内侧。 ’、 後置,其中, 上述裝置主體 口的尺寸,且 .戈申明專利範圍帛1項所述的熱處理 包括:導出管,該導出管的頭部可脫開地從 的外側插入到上述氣體導出孔的内側,其’ 上述觸媒具有堵塞上述氣體導出孔的入 配設在上述導出管的頭部, ,以使上述觸媒 項所述的熱處理 氣體的一部分返 員所述的熱處理 上述導出管插入到上述氣體導出孔中 配置到上述氣體導出孔的入口。 4·如申請專利範圍第1至3項中任_ 裝置’其巾’將從上述氣體導出孔排出的 回到上述氣體導入孔。 5·如申請專利範圍第1至3項中任一 201 冬9644-PF 18 200905151 裝置’其中’在上述裝置主體中 、 處理室之間設置有分割板,节八’在上述加熱室 熱室流向上述熱處理室。 刀μ板只允許氣體 6.如申請專利範圍第$ μ Λ Μ ^ ^ ^ ^ 項所述的熱處理裝置 在上迷加熱至内设置有鼓風機, 只在上述鼓風機的送風側設置有使上述加熱室和 理室聯通的間隙。 和上述熱 從上述加 ,其中, 上述熱處200905151 X. Patent application scope: ι_: a heat treatment device comprising a main body of the device, the main body of the device having: heat=to, containing the heat-treated material 'the heat-treated material can be taken out from the heat treatment to the middle; and the heating chamber, and the heat treatment described above In the room of the Bean, the heating chamber is heated by the heat treatment gas that has been introduced into the heating chamber through the gas introduction hole provided in the heating chamber, and is provided in the heat treatment chamber by the above-mentioned == heat treatment a gas "hole, the heat-treated gas is led out from the heat treatment chamber, and the temple is provided with a catalyst to block the inlet of the gas-extracting hole, and the catalyst can decompose the heat-treated gas to be sublimated by the heat-treated material. The heat treatment device according to claim 1, wherein the catalyst is disposed inside the heat treatment chamber. ', rear, wherein the size of the main body port of the device, and the scope of the patent application 帛The heat treatment of item 1 includes: a discharge tube whose head is detachably from the outer side Entering the inside of the gas lead-out hole, the 'catalyst having a gas clogging hole is disposed in a head portion of the lead-out tube to return a part of the heat treatment gas described in the catalyst item Heat treatment The above-mentioned outlet tube is inserted into the gas outlet hole and disposed at the inlet of the gas outlet hole. 4. As in the scope of claims 1 to 3, the device 'the towel' is discharged from the gas outlet hole. The gas introduction hole is as follows: 5. As claimed in any one of claims 1 to 3, in the winter, the 9644-PF 18 200905151 device 'where' is provided with a dividing plate between the processing chambers and the section VIII' The heating chamber heat chamber flows to the above-mentioned heat treatment chamber. The knife μ plate only allows gas 6. The heat treatment device described in the patent scope of the range of μ μΛ Μ ^ ^ ^ ^ is provided with a blower in the upper heating, only in the above-mentioned blower The air supply side is provided with a gap that connects the heating chamber and the chamber. The heat is added from the above, wherein the heat is 2014-9644-PF 192014-9644-PF 19
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