TWI362476B - - Google Patents

Download PDF

Info

Publication number
TWI362476B
TWI362476B TW097128190A TW97128190A TWI362476B TW I362476 B TWI362476 B TW I362476B TW 097128190 A TW097128190 A TW 097128190A TW 97128190 A TW97128190 A TW 97128190A TW I362476 B TWI362476 B TW I362476B
Authority
TW
Taiwan
Prior art keywords
space
floor surface
air
clean air
room
Prior art date
Application number
TW097128190A
Other languages
Chinese (zh)
Other versions
TW200909751A (en
Inventor
Kensuke Hirata
Original Assignee
Ihi Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ihi Corp filed Critical Ihi Corp
Publication of TW200909751A publication Critical patent/TW200909751A/en
Application granted granted Critical
Publication of TWI362476B publication Critical patent/TWI362476B/zh

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24HEATING; RANGES; VENTILATING
    • F24FAIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
    • F24F3/00Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems
    • F24F3/12Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems characterised by the treatment of the air otherwise than by heating and cooling
    • F24F3/16Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems characterised by the treatment of the air otherwise than by heating and cooling by purification, e.g. by filtering; by sterilisation; by ozonisation
    • F24F3/167Clean rooms, i.e. enclosed spaces in which a uniform flow of filtered air is distributed
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24HEATING; RANGES; VENTILATING
    • F24FAIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
    • F24F2221/00Details or features not otherwise provided for
    • F24F2221/40HVAC with raised floors

Landscapes

  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Combustion & Propulsion (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Ventilation (AREA)
  • Filtering Of Dispersed Particles In Gases (AREA)
  • Devices For Use In Laboratory Experiments (AREA)

Description

1362476 九、發明說明 【發明所屬之技術領域】 本發明係關於適用於製造顯示 的製程之處理裝置,以及含有該處 系統。 【先前技術】 無塵室,係應用於像製造顯示I 的製程。無塵室,爲了將其中的空I 用特別的過濾器(用來從空氣除去I 物質)的送風裝置。爲了維持高度β 過濾器的劣化,清淨空氣並不是用I 回流而反覆通過過濾器。 爲達成前述目的,無塵室具有ΐ 型的無塵室的天花板,具有由天花ί 板面更低之天花板所組成之二層構全 爲讓空氣流通的空室(chamber)。 備:地板面、被支承成比地板面更P ,在地板面和格柵板之間也是成爲g 和地板側的空室是經由回流導管來 置,通常是設於天花板而和天花板 的各裝置是設置在格柵板上,從天 ,係通過各裝置而流過格柵板,再 地板側的空室內之清淨空氣,經由 置等的要求清淨環境 裝置而構築成之無塵 置等之要求清淨環境 保持清淨,係利用採 細的塵埃及其他污染 清淨度,且爲了防止 即丟,一般都是讓其 別的構造。亦即,典 面、被支承成比天花 ,二層構造的內部成 無塵室的地板,係具 的格柵板(grating) 室。天花板側的空室 通。過濾器及送風裝 空室連通。無塵室內 板側供應的清淨空氣 地板側向下流。流入 流導管收集而往天花 -4- 1362476 板側空室回流。 相關的技術係揭示於日本特開平11-337115號 平 10-116758 號。 【發明內容】 根據上述說明可理解到,習知的無麈室,因此 別的構造而不容易構築。又由於在天花板及地板需 空室的空間,會產生無法設置裝置之龐大的無效空 使裝置的佈局受到限制。 本發明係有鑑於上述課題而構成者,其目的是 種無塵系統,即使未在地板面設置格栅板和空室, 接設置在該地板面而簡單地構築出,且對於裝置的 提供更大的自由度。 依據本發明的第1態樣,處理裝置,是和具有 置(用來供應清淨空氣)及地板面的房間一起使用 處理裝置’係具備可收容前述清淨空氣的裝置本體 來支承前述裝置本體的台;該台,係選自:在其與 板面之間將可通氣的空間氣密包圍的台、以及將可 空間氣密包圍且可置於前述地板面的台所構成群中 者’該台係具備:連通於前述空間之取入口、將通 裝置本體的前述清淨空氣經由前述取入口導入前述 吸引風扇。 . 較佳爲,刖述處理裝置進一步具備回流導管, 述台氣密結合,用來使導入前述空間的前述清淨空 及特開 具有特 要形成 間,而 提供一 仍可直 佈局可 送風裝 。前述 以及用 前述地 通氣的 之任一 過則述 空間之 其和前 氣往前 -5- 1362476 述送風裝置回流。 依據本發明的第2態樣,無塵系統係具備:具有包圍 @室的天花板及地板面之房間、連通於前述空室且將前述 @室內的空氣清淨化以供應清淨空氣之送風裝置、用來收 容前述清淨空氣之裝置本體、用來支承前述裝置本體的台 、以及回流導管;該台,係選自:在其與前述地板面之間 將可通氣的空間氣密包圍的台、以及將可通氣的空間氣密 包圍且可置於前述地板面的台所構成群中之任一者,該台 係具備:連通於前述空間之取入口、將通過前述裝置本體 的前述清淨空氣經由前述取入口導入前述空間之吸引風扇 :該回流導管,係爲了連通前述空間和前述空室,而和前 述台及前述天花板氣密結合。 【實施方式】 以下參照圖式來說明本發明的實施形態。以下所說明 的例子,係用來暫時貯留玻璃基板(顯示裝置的材料)並 將其供應至下游裝置的保管裝置,但本發明的實施並不限 於此。 本發明的實施形態之無塵系統1,如第1圖所示,係 利用建築物3內的房間5來構築出。房間5的地板面5 f , 爲了防止發生粉麈,例如是在水泥漿塗布聚胺酯樹脂等的 構成的塗料,但不限於此。房間5的天花板5 c比建築物3 的天花板面低,以在其間確保能讓空氣流通的天花板室7 。天花板5c具有開口 ’並具備連通於開口而往下方供應 -6- 1362476 清淨空氣的送風裝置9。用來供應清淨空氣的送風裝 ,係具備:從空氣將微細塵埃和其他的污染物質除去 濾器、以及用來吹送清淨化後的空氣之風扇,只要是 於無塵室的公知裝置都能採用。房間5係具備:用來 地板面附近和天花板室7之大致垂直的回流導管11。 導管11也是構成能讓空氣流通。 保管裝置13係具備:裝置本體15、台17、一對 19、以及其他構件。台17設置於地板面5f上,一對 19固定於台17上,其他構件是藉由框架19支承。 各框架19具備垂直延伸的軌道21,各軌道21分 支承構件25支承成可昇降。支承構件25係藉由電動 等的驅動裝置(未圖示)驅動而進行昇降。支承構f 是用來支承收納匣23。收納匣23,係具備沿垂直方 層的複數個水平收納部,在各收納部收納玻璃板W。 控制驅動裝置的驅動,可將所收納之複數個玻璃板當 意的玻璃板W昇降至期望的高度,並進一步在前述 進行必要的處理。 作爲保管裝置1 3,可利用公知的裝置,例如可使 本特開2005-159141號及特開2005-175429號所揭示与 在台17的下面具備設成一體的導管構件27。在 構件27的下面形成開口,若將導管構件27直接設置 板面5f上,其下面的開口會被地板面5f封閉,而構 通氣的導管CD。·亦即,具有導管構件27的台17,是 和地板面7f之間將可通氣的空間氣密包圍。導管構f 置 9 之過 適用 連絡 回流 框架 框架 別將 馬達 卜25 向積 藉由 中任 高度 用曰 t 0 導管 於地 成可· 在其 27 1362476 ,係具備和前述空間連通的複數個取入口 27t,台17係具 備分別和各取入口 27t連通之複數個開口 17h。在各開口 17h分別設置吸引風扇29,以將上方的空氣導入前述空間 〇 導管CD是和回流導管11氣密結合,導入前述空間的 空氣可經由回流導管π而往天花板室7回流。 天花板室7中的空氣,藉由送風裝置9清淨化後向下 供應。因此保管裝置13會收容清淨空氣而在其周圍維持 清淨環境。藉由驅動保管裝置13會產生微量的塵埃乃至 污染物質,而藉由吸引風扇29來吸引含有該污染等的空 氣並導入導管CD。前述空氣經由導管CD及回流導管11 而往天花板室7回流,並再度藉由送風裝置9實施清淨化 〇 依據本實施形態,就算不是在地板具備格柵板之無塵 室特有的構造的房間,仍可簡單地實現與無塵室同等級的 清淨環境。又能避免格柵板下方的無效空間,而對裝置的 佈局可提供更大的自由度。 上述實施形態可作各種的變形。例如,在第3圖所示 的變形例的無塵系統31,前述下面開口的導管構件27, 不是在下面形成開口,而是用本身可將供空氣流通吋空間 氣密包圍的導管33來代替。導管33亦可直接設置於地板 面5f。因此,該變形例也能簡單地實現出清淨環境,而對 裝置的佈局可提供更大的自由度。 以上雖是參照較佳實施形態來說明本發明,但本發明 1362476 並不限於上述實施形態。根據上述揭示內容,在本發明的 技術領域具有通常知識者,可將實施形態予以修正乃至變 形來實施本發明。 本發明提供的無塵系統,能簡單地構築出清淨環境, 且對裝置的佈局可提供更大的自由度。 【圖式簡單說明】 第1圖係本發明的一實施形態之無塵系統的截面圖。 第2圖係第1圖的ll-π線的截面圖。 第3圖係變形例之無塵系統的截面圖。 【主要元件符號說明】 1 :無塵系統 3 :建築物 5 :房間 5c :天花板 5 f :地板面 7 :天花板室 9 :送風裝置 1 1 :回流導管 13 :保管裝置 15 :裝置本體 17 :台 17h :開口 -9- 1362476 19 :框架 21 :軌道 2 3 :收納匣 25 :支承構件 2 7 :導管構件 27t :取入口 29 :吸引風扇 3 1 :無塵系統 33 :導管 33t :取入口 W :玻璃板 CD :導管1362476 IX. Description of the Invention [Technical Field of the Invention] The present invention relates to a processing apparatus suitable for manufacturing a display process, and a system therefor. [Prior Art] A clean room is applied to a process like Manufacturing Display I. Clean room, a blower for the use of a special filter (used to remove I material from the air). In order to maintain the deterioration of the height beta filter, the clean air does not pass through the filter by refluxing with I. In order to achieve the above object, the clean room has a 无-type clean room ceiling, and has a two-story structure consisting of a ceiling with a lower ceiling and a chamber for air circulation. Preparation: the floor surface is supported to be more P than the floor surface, and the space between the floor surface and the grille plate is also g and the floor side is placed via a return duct, usually on the ceiling and the ceiling. It is installed on the grille plate, and it flows through the grid plate through the devices from the sky, and the clean air in the empty space on the floor side is constructed to be cleaned by the required environment cleaning device. The clean environment is kept clean, and it uses the fine dust and other pollution cleanliness of the dust, and in order to prevent it from being lost, it is generally allowed to have other structures. That is, the pattern, the floor which is supported by the ceiling, the interior of the two-story structure is a clean room, and the grating chamber of the system. The empty room on the ceiling side is open. The filter and the air supply chamber are connected. Clean air supplied from the side of the clean room. The floor side flows downward. The inflow conduit collects and returns to the ceiling -4- 1362476 plate side empty chamber. A related art is disclosed in Japanese Patent Laid-Open No. Hei 11-337115, No. 10-116758. SUMMARY OF THE INVENTION From the above description, it can be understood that the conventional innocent chamber is not easily constructed in other configurations. Moreover, due to the space in the ceiling and the floor space, there is a large amount of invalid space in which the device cannot be installed, and the layout of the device is limited. The present invention has been made in view of the above problems, and an object of the present invention is to provide a dust-free system that is easily constructed without being placed on a floor surface of a floor panel, and is provided on the floor surface, and is provided for the device. Great freedom. According to a first aspect of the present invention, a processing apparatus is provided with a device having a room for supplying clean air and a floor surface, and a device body for accommodating the clean air to support the device body. The table is selected from the group consisting of a table that hermetically encloses a ventilable space between the plate and the surface, and a group that can be space-sealed and can be placed on the floor surface. The intake fan that communicates with the space is introduced into the suction fan via the intake port. Preferably, the processing device further includes a return conduit for airtightly combining the clean air and the special opening to be introduced into the space to provide a windshield that can still be disposed directly. The air blower is recirculated as described above and in any of the spaces ventilated as described above and the forward air is forwarded to -5 - 1362476. According to a second aspect of the present invention, the dust-free system includes: a room having a ceiling and a floor surface surrounding the @室, and an air supply device that communicates with the empty space and purifies the air in the @room to supply clean air. a device body for accommodating the clean air, a table for supporting the device body, and a return conduit; the table is selected from: a table that hermetically encloses a ventilable space between the floor surface and the floor surface, and Any one of the groups of the table that can be placed in the air-tight space and that can be placed on the floor surface, the station includes: an inlet that communicates with the space, and the clean air that passes through the apparatus body passes through the inlet A suction fan that introduces the space: the return duct is airtightly coupled to the stage and the ceiling in order to communicate the space and the empty space. [Embodiment] Hereinafter, embodiments of the present invention will be described with reference to the drawings. The example described below is a storage device for temporarily storing a glass substrate (material of a display device) and supplying it to a downstream device, but the implementation of the present invention is not limited thereto. The dust-free system 1 according to the embodiment of the present invention is constructed using the room 5 in the building 3 as shown in Fig. 1. The floor surface 5 f of the room 5 is, for example, a coating material such as a polyurethane resin coated with a cement slurry in order to prevent the occurrence of white dust, but is not limited thereto. The ceiling 5 c of the room 5 is lower than the ceiling surface of the building 3 to ensure a ceiling chamber 7 for allowing air to circulate therebetween. The ceiling 5c has an opening ‘and has a blower 9 that communicates with the opening to supply -6 - 1362476 clean air downward. The air supply device for supplying clean air includes a fan that removes fine dust and other pollutants from the air, and a fan that blows the cleaned air, and can be used as long as it is a known device in a clean room. The room 5 is provided with a return duct 11 for use in the vicinity of the floor surface and the ceiling chamber 7 which is substantially vertical. The conduit 11 is also configured to allow air to circulate. The storage device 13 includes an apparatus body 15, a table 17, a pair of 19, and other members. The table 17 is placed on the floor surface 5f, a pair 19 is fixed to the table 17, and the other members are supported by the frame 19. Each of the frames 19 is provided with a vertically extending rail 21, and each of the rails 21 is supported by the support member 25 so as to be movable up and down. The support member 25 is driven up and down by being driven by a driving device (not shown) such as electric motor. The support structure f is for supporting the housing cassette 23. The housing cassette 23 includes a plurality of horizontal housing portions along the vertical layer, and the glass sheets W are accommodated in the housing portions. By controlling the driving of the driving device, the glass plate W of the plurality of glass plates accommodated can be raised and lowered to a desired height, and further necessary processing is performed as described above. As the storage device 1, a known device can be used. For example, the catheter member 27 integrally provided on the lower surface of the table 17 can be provided as disclosed in Japanese Patent Laid-Open No. Hei. No. 2005-159141 and No. 2005-175429. An opening is formed in the lower surface of the member 27. If the conduit member 27 is directly disposed on the plate surface 5f, the lower opening thereof is closed by the floor surface 5f, and the ventilated conduit CD is constructed. That is, the stage 17 having the duct member 27 is airtightly surrounded by the ventilable space with the floor surface 7f. The conduit structure is applied to the frame of the refusal reflow frame. The motor is 25 directional. The 高度t 0 conduit is used for the ground. In its 27 1362476, there are a plurality of inlets connected to the space. At 27t, the stage 17 has a plurality of openings 17h that are respectively connected to the respective inlets 27t. A suction fan 29 is provided in each of the openings 17h to introduce the upper air into the space. The conduit CD is hermetically coupled to the return conduit 11, and the air introduced into the space can be recirculated to the ceiling chamber 7 via the return conduit π. The air in the ceiling chamber 7 is cleaned by the air blowing device 9 and supplied downward. Therefore, the storage device 13 accommodates the clean air and maintains a clean environment around it. By driving the storage device 13, a small amount of dust or even a pollutant is generated, and the air containing the contamination or the like is sucked by the suction fan 29 and introduced into the conduit CD. The air is returned to the ceiling chamber 7 via the duct CD and the return duct 11, and is again cleaned by the air blower 9. According to the present embodiment, even in a room having a structure unique to the clean room of the floor panel, It is still possible to simply achieve a clean environment of the same level as a clean room. It also avoids the ineffective space under the grid plate and provides greater freedom in the layout of the device. The above embodiment can be variously modified. For example, in the dust-free system 31 of the modification shown in Fig. 3, the duct member 27 that is open at the lower side is not formed with an opening in the lower side, but is replaced by a duct 33 which itself can hermetically surround the air supply space. . The duct 33 can also be directly disposed on the floor surface 5f. Therefore, this modification can also easily realize a clean environment, and provides a greater degree of freedom in the layout of the device. The present invention has been described above with reference to preferred embodiments, but the present invention 1362476 is not limited to the above embodiment. Based on the above disclosure, those skilled in the art can modify or modify the embodiments to implement the present invention. The dust-free system provided by the invention can simply construct a clean environment and provide greater freedom for the layout of the device. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a cross-sectional view showing a dust-free system according to an embodiment of the present invention. Fig. 2 is a cross-sectional view taken along line ll-π of Fig. 1. Fig. 3 is a cross-sectional view showing a dust-free system of a modification. [Description of main component symbols] 1 : Dust-free system 3 : Building 5 : Room 5c : Ceiling 5 f : Floor surface 7 : Ceiling room 9 : Air supply unit 1 1 : Return conduit 13 : Storage device 15 : Device body 17 : Table 17h: opening-9-1362476 19: frame 21: rail 2 3: housing 匣 25: support member 2 7 : duct member 27t: take-in port 29: suction fan 3 1 : dust-free system 33: duct 33t: take-in W: Glass plate CD: catheter

Claims (1)

1362476 ι0°年'少月 '日修(S)正替換頁 第097128190號專利申請案中文申請專利範圍修正本 民國1〇〇年I2月1 日修正 十、申請專利範圍 1. 一種處理裝置,是和具有送風裝置(用來供應清 淨空氣)及地板面的房間一起使用之處理裝置; 該處理裝置係具備可收容前述清淨空氣的裝置本體以 及用來支承前述裝置本體的台;1362476 ι0°年年少月'日修(S)正换页第097128190号 Patent application Chinese application patent scope revision The Republic of China 1〇〇I1月1日修正10, application patent scope 1. A processing device, a processing device for use with a room having a blower (for supplying clean air) and a floor surface; the treatment device having a device body for accommodating the clean air and a table for supporting the device body; 該台,係選自:在其與前述地板面之間將可通氣的空 間氣密包圍之具備導管構件的台、以及具備將可通氣的空 間氣密包圍之導管構件且可置於前述地板面的台所構成群 中之任一者, 該台係具備:連通於前述空間之取入口、將通過前述 裝置本體的前述清淨空氣經由前述取入口導入前述空間之 吸引風扇。 2. 如申請專利範圍第1項記載之處理裝置,其中進 φ 一步具備回流導管,其和前述台氣密結合,用來使導入前 述空間的前述清淨空氣往前述送風裝置回流。 3. —種無塵系統,係具備: 具有包圍空室的天花板及地板面之房間、 連通於前述空室且將前述空室內的空氣清淨化以供應 清淨空氣之送風裝置、 用來收容前述清淨空氣之裝置本體、 用來支承前述裝置本體的台、 以及回流導管; 1362476 1^年、1 \日修(更)正替换ΐ 該台,係選自:在其與前述地板面之間將可通氣的空 間氣密包圍之具備導管構件的台、以及具備將可通氣的空 間氣密包圍之導管構件且可置於前述地板面的台所構成群 中之任一者, 該台係具備:連通於前述空間之取入口、將通過前述 裝置本體的前述清淨空氣經由前述取入口導入前述空間之 吸引風扇;The table is selected from the group consisting of a duct member that hermetically surrounds the ventilable space between the floor surface, and a duct member that is airtightly surrounded by the ventilable space and can be placed on the floor surface. Any one of the group of the stations includes a suction fan that communicates with the inlet of the space, and introduces the clean air passing through the apparatus main body into the space through the intake port. 2. The processing apparatus according to claim 1, wherein the step φ is provided with a return conduit which is airtightly coupled to the stage for returning the clean air introduced into the space to the air blower. 3. A dust-free system comprising: a room having a ceiling and a floor surface surrounding the empty room; and an air supply device that communicates with the empty space and purifies the air in the empty room to supply clean air, and is used for storing the clean air The air device body, the table for supporting the device body, and the return conduit; 1362476 1^year, 1 \day repair (more) replacement ΐ The table is selected from: between the floor surface and the aforementioned floor surface Any one of a group having a duct member surrounded by a ventilated space and a duct member having a duct member that hermetically surrounds the ventilable space and placed on the floor surface, the station having: communicating with The inlet of the space, the suction fan that is introduced into the space through the intake port by the clean air of the apparatus body; 該回流導管,係爲了連通前述空間和前述空室,而和 前述台及前述天花板氣密結合。The return conduit is airtightly coupled to the stage and the ceiling in order to communicate the space and the empty chamber. -2--2-
TW097128190A 2007-07-27 2008-07-24 Processing apparatus and clean system including processing apparatus TW200909751A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007196459A JP5125291B2 (en) 2007-07-27 2007-07-27 Thin plate processing apparatus and clean thin plate processing system

Publications (2)

Publication Number Publication Date
TW200909751A TW200909751A (en) 2009-03-01
TWI362476B true TWI362476B (en) 2012-04-21

Family

ID=40304156

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097128190A TW200909751A (en) 2007-07-27 2008-07-24 Processing apparatus and clean system including processing apparatus

Country Status (5)

Country Link
JP (1) JP5125291B2 (en)
KR (1) KR101289367B1 (en)
CN (1) CN101779085B (en)
TW (1) TW200909751A (en)
WO (1) WO2009016919A1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106839245A (en) * 2017-01-20 2017-06-13 温州弘大市政园林建设有限公司 A kind of indoor green building decoration engineering structure
CN109227605B (en) * 2018-10-24 2021-08-10 上海稻黄电子设备技术有限公司 Industrial robot precision assembly workshop
CN113488413B (en) * 2021-07-06 2022-08-16 华海清科股份有限公司 Wafer post-processing equipment and ventilation system with flow guide function and applied by same

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63157436A (en) * 1986-12-22 1988-06-30 Hitachi Electronics Eng Co Ltd Containinc box for wafer cassette
JPH11141939A (en) * 1997-11-13 1999-05-28 Toyota Autom Loom Works Ltd Power unit
JPH11337115A (en) * 1998-05-27 1999-12-10 Fuji Denki Sosetsu Co Ltd Local air-conditioning system in clean room
JP3884570B2 (en) * 1998-05-29 2007-02-21 大日本スクリーン製造株式会社 Substrate processing equipment
JP4294837B2 (en) * 1999-07-16 2009-07-15 東京エレクトロン株式会社 Processing system
US6426303B1 (en) * 1999-07-16 2002-07-30 Tokyo Electron Limited Processing system
JP2002039583A (en) * 2000-07-24 2002-02-06 Ricoh Elemex Corp Air-cleaning system
JP2002174441A (en) * 2000-12-08 2002-06-21 Mitsubishi Electric Corp Air cleaning system and air cleaning housing
JP2003194390A (en) * 2001-12-27 2003-07-09 Mitsubishi Electric Corp Air conditioning system
JP4715088B2 (en) * 2003-11-27 2011-07-06 株式会社Ihi Substrate transfer device and substrate storage transfer device

Also Published As

Publication number Publication date
WO2009016919A1 (en) 2009-02-05
JP5125291B2 (en) 2013-01-23
JP2009030899A (en) 2009-02-12
TW200909751A (en) 2009-03-01
CN101779085B (en) 2012-10-03
CN101779085A (en) 2010-07-14
KR101289367B1 (en) 2013-07-29
KR20100037617A (en) 2010-04-09

Similar Documents

Publication Publication Date Title
TWI784799B (en) Equipment Front-End Module (EFEM) System
TWI352797B (en) A clean room
KR100514716B1 (en) Apparatus for cleaning air and method for the same
JP2008075945A (en) Local cleaning device
TWI362476B (en)
JPH02126912A (en) Air cleaner and clean room using it
JP2008296069A (en) Air cleaner for eliminating fine particle or fine particle and harmful gas in sheet-like object manufacturing apparatus
KR20020061515A (en) Substrate processing apparatus and substrate processing method
KR101017910B1 (en) Clean room system
JP2551923Y2 (en) Clean room
JP5507095B2 (en) Fan filter unit, semiconductor manufacturing apparatus, flat panel display manufacturing apparatus, and method of manufacturing purified air
JP5330805B2 (en) Clean room
JP4798816B2 (en) Circulating clean room
JP4656296B2 (en) Local cleaning device and clean room
JP4743379B2 (en) Clean room
JP4441732B2 (en) Clean room
JP3427921B2 (en) Semiconductor device production clean room and semiconductor device production method
KR200229933Y1 (en) Apparatus for ventilation constant temperature and constant humidity
JP2007178065A (en) Air returning device for clean room
WO2019207841A1 (en) Safety cabinet, and vibration damping mechanism for fan filter unit
JP3503770B2 (en) Clean unit and clean room
JP2002540379A (en) Devices for manufacturing semiconductor products
CN111936236A (en) Safety cabinet
JP4511773B2 (en) Clean stocker
JP2003214668A (en) Clean room