JP4656296B2 - Local cleaning device and clean room - Google Patents

Local cleaning device and clean room Download PDF

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JP4656296B2
JP4656296B2 JP2004349542A JP2004349542A JP4656296B2 JP 4656296 B2 JP4656296 B2 JP 4656296B2 JP 2004349542 A JP2004349542 A JP 2004349542A JP 2004349542 A JP2004349542 A JP 2004349542A JP 4656296 B2 JP4656296 B2 JP 4656296B2
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air
manufacturing equipment
local cleaning
clean room
cleaning device
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JP2006162090A (en
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得男 久禮
順太 平田
康博 頭島
匠 杉浦
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Hitachi Plant Technologies Ltd
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Description

本発明は局所清浄化装置及びクリーンルームに係り、精密品製造機器の周囲を局所的に清浄化する場合に好適な局所清浄化装置及びこの局所清浄化装置を配置したクリーンルームに関する。   The present invention relates to a local cleaning apparatus and a clean room, and more particularly to a local cleaning apparatus suitable for locally cleaning the periphery of precision product manufacturing equipment and a clean room in which the local cleaning apparatus is arranged.

半導体ウェハなどの精密品を生産する場合には、精密品に空気中の塵埃やガス状のケミカル成分が付着すると製品不良の原因になる。このため、各種の処理、加工を行うための製造機器を高清浄に維持したクリーンルーム内に設置することが一般に行われている。しかしながら、製造機器を多数設置したクリーンルーム大空間を常に高清浄に維持するためには、クリーンルームの建設費、運転費が莫大となり、精密品の製造コストが増大する。そこで、近年にはミニエンバイロ方式のクリーンルームが採用されるようになってきた。   When producing precision products such as semiconductor wafers, product defects may occur if dust or gaseous chemical components in the air adhere to the precision products. For this reason, it is common practice to install manufacturing equipment for performing various types of processing and processing in a clean room that is kept highly clean. However, in order to maintain a clean room large space where a large number of manufacturing devices are installed at a high level of cleanliness, the construction cost and operation cost of the clean room become enormous, and the manufacturing cost of precision products increases. Therefore, in recent years, a mini-environment type clean room has been adopted.

図11はミニエンバイロ方式のクリーンルームを例示した側断面図である。本方式のクリーンルーム1は天井に設置するFFU(ファンフィルタユニット)3の台数を削減することによって内部の清浄度を緩和し、クリーンルーム1のコスト低減を図っている。半導体ウェハなどの精密品は密閉容器4に収納して搬送車5で搬送し、製造機器2への移載室(ミニエンバイロ室)6のみを局所的に高清浄することによって、精密品への塵埃やケミカル成分の付着を防ぐようにしている。この方式では通常時は精密品に対する環境を高清浄に保つことができる。しかしながら、製造機器2の保守作業のために製造機器2の内部を開放した場合には、清浄度が低いクリーンルーム雰囲気によって製造機器2の内部が汚染され、ひいては保守作業の後に取り扱われる精密品が汚染されるという問題がある。また、製造機器2自体も内部に反応生成物である塵埃や残留ガスなどを持つ。このため、製造機器2の内部を開放した際にこれらの物質がクリーンルーム1内に拡散して他の製造機器2や精密品を汚染させるという問題がある。   FIG. 11 is a side sectional view illustrating a mini-environment clean room. The clean room 1 of this system reduces the number of FFUs (fan filter units) 3 installed on the ceiling, thereby reducing the cleanliness of the interior and reducing the cost of the clean room 1. Precision products such as semiconductor wafers are stored in a sealed container 4 and transported by a transport vehicle 5, and only a transfer chamber (mini-environment chamber) 6 to the manufacturing equipment 2 is locally highly cleaned, thereby achieving precision products. It prevents the adhesion of dust and chemical components. In this method, the environment for precision products can be kept highly clean at normal times. However, when the inside of the manufacturing equipment 2 is opened for maintenance work of the manufacturing equipment 2, the inside of the manufacturing equipment 2 is contaminated by a clean room atmosphere with a low cleanliness, and as a result, the precision products handled after the maintenance work are contaminated. There is a problem of being. Further, the manufacturing equipment 2 itself has dust and residual gas as reaction products. For this reason, when the inside of the manufacturing apparatus 2 is opened, there is a problem that these substances diffuse into the clean room 1 and contaminate other manufacturing apparatuses 2 and precision products.

特許文献1には製造機器からの汚染物質の拡散を防止するためのクリーンルームの構造が開示されている。図12にその概要を示す。クリーンルーム11は天井面の全面がフィルタユニット12で覆われており、空調機13によって温湿度を調和した空気を天井空間→クリーンルーム11→床下空間の順に循環させることにより、クリーンルーム11全体の清浄度が保たれている。クリーンルーム11内に熱気流などの上昇気流Wを発生させる製造機器15が配置された場合に、上昇気流Wに伴う汚染物質の拡散が懸念される。そこで製造機器15上方のフィルタユニット12の裏側に吸気口16を配し、この吸気口16に接続した吸気ファン18によって上昇気流Wを吸気口16から吸引する。吸気ファン18の吐出側には送風口17が配されており、吸気した気流を送風口17を介して下降気流Zとしてクリーンルーム11に戻す。   Patent Document 1 discloses a clean room structure for preventing diffusion of contaminants from manufacturing equipment. The outline is shown in FIG. In the clean room 11, the entire ceiling surface is covered with the filter unit 12, and the cleanliness of the entire clean room 11 is improved by circulating air in harmony with temperature and humidity by the air conditioner 13 in the order of ceiling space → clean room 11 → underfloor space. It is kept. When the manufacturing equipment 15 that generates the rising airflow W such as a hot airflow is arranged in the clean room 11, there is a concern about the diffusion of contaminants accompanying the rising airflow W. Therefore, an intake port 16 is arranged on the back side of the filter unit 12 above the manufacturing equipment 15, and the rising air flow W is sucked from the intake port 16 by the intake fan 18 connected to the intake port 16. A blower port 17 is disposed on the discharge side of the intake fan 18, and the sucked airflow is returned to the clean room 11 as a descending airflow Z through the blower port 17.

このような構成によって、上昇気流Wの拡散を抑制する。また、上昇気流W中の汚染物質はフィルタユニット12を通過する際に除去され、清浄な下降気流Zが製造機器15の周囲を覆うエアカーテンとしての役割を果たす。
特開平8−247512号公報
With such a configuration, diffusion of the updraft W is suppressed. Further, contaminants in the updraft W are removed when passing through the filter unit 12, and the clean downdraft Z serves as an air curtain that covers the periphery of the manufacturing equipment 15.
JP-A-8-247512

しかしながら、上記特許文献1に記載されたクリーンルーム11では、製造機器15からの上昇気流が無いか又は弱い場合には、図13に示したように吸気口16には送風口17から出た直近の空気Xが吸い込まれ、製造機器15の上方では滞留Yが生じ、製造機器15からの汚染を速やかに除去することができない欠点がある。滞留した気流の一部はやがて周辺の下降気流Zに誘引されて空調機13や他の製造機器へ流れ込んでクリーンルーム11全体の汚染を招くという欠点がある。   However, in the clean room 11 described in Patent Document 1, when there is no or weak ascending airflow from the manufacturing equipment 15, as shown in FIG. The air X is sucked in, and the stay Y is generated above the manufacturing equipment 15, so that there is a disadvantage that the contamination from the manufacturing equipment 15 cannot be removed promptly. A part of the staying airflow is eventually attracted by the surrounding downward airflow Z and flows into the air conditioner 13 and other manufacturing equipment, causing the entire clean room 11 to be contaminated.

本発明の目的は、上記従来技術の欠点を改善し、クリーンルーム内に設置された個々の精密品製造機器の周辺を周囲の汚染から防護するとともに、製造機器自身から発生する汚染を他の領域に拡散させない局所清浄装置並びにクリーンルームを提供することにある。   The object of the present invention is to improve the above-mentioned drawbacks of the prior art, protect the surroundings of individual precision product manufacturing equipment installed in a clean room from surrounding contamination, and to prevent contamination generated from the manufacturing equipment itself in other areas. An object of the present invention is to provide a local cleaning device and a clean room that do not diffuse.

上記の目的を達成するために、本発明に係る局所清浄装置は、クリーンルーム内に設置された精密品製造機器の周辺の空気を吸い込む中央吸気口と、この中央吸気口から吸い込んだ前記空気を清浄化する空気清浄化手段と、前記中央吸気口を囲むように配置されて前記空気清浄化手段からの清浄空気を前記製造機器に向けて送風する送風口と、前記中央吸気口に一端が接続し、他端が前記製造機器側に伸長して開口した、長さが調整可能な吸い込みダクトとを具備し、前記空気清浄化手段には、前記製造機器から離れた位置からの外部空気を取り込み可能であるとともにその取り込む外部空気の量を調整する流量調整手段を備えた給気口が接続し、前記空気清浄化手段は当該給気口から取り込んだ外部空気と前記中央吸気口から吸い込んだ前記汚染空気の合流空気を清浄化して前記送風口に送り込むようにされたことを特徴とする。また、本発明に係る局所清浄装置は、前記給気口にはダンパが取り付けられており、前記ダンパの開度を変化させることによって前記給気口からの外部空気の取り込み量を調整可能であることを特徴とする。 In order to achieve the above object, the local cleaning device according to the present invention cleans the air sucked from the central air intake port for sucking air around the precision product manufacturing apparatus installed in the clean room, and the air sucked from the central air intake port. One end is connected to the central air inlet, the air cleaner that is disposed so as to surround the central air inlet, and the air outlet that blows clean air from the air cleaner toward the manufacturing equipment. A suction duct of which the other end extends and opens to the manufacturing equipment side and is adjustable in length , and the air cleaning means can take in external air from a position away from the manufacturing equipment. And an air supply port provided with a flow rate adjusting means for adjusting the amount of external air to be taken in is connected, and the air cleaning means is connected to the external air taken in from the air supply port and the air before being sucked in from the central air intake port. And cleaning the confluent air contaminated air, characterized in that it is so fed to the blower opening. Further, in the local cleaning device according to the present invention, a damper is attached to the air supply port, and the amount of external air taken in from the air supply port can be adjusted by changing the opening of the damper. It is characterized by that.

上記構成の局所清浄装置は、前記吸い込みダクトの有効口径をw、吸い込みダクトの平均吸い込み風速をv1、送風口の平均吹き出し風速をv2とした時に、前記吸い込みダクトの他端開口と前記製造機器の表面との距離dが式d≦2・w・v2/v1を満足するように調整されたことが望ましい。また、上記構成の局所清浄装置は、前記クリーンルーム内を移動可能にすることができる。
また、本発明に係るクリーンルームは、上記構成の局所清浄化装置が内部に配置されたことを特徴とする。
The local cleaning device having the above-described configuration is configured such that the effective diameter of the suction duct is w, the average suction wind speed of the suction duct is v1, and the average blowing wind speed of the blower port is v2, and the other end opening of the suction duct and the manufacturing device It is desirable that the distance d to the surface is adjusted so as to satisfy the formula d ≦ 2 · w · v2 / v1. Moreover, the local cleaning apparatus of the said structure can be moved within the said clean room.
The clean room according to the present invention is characterized in that the local cleaning device having the above-described configuration is disposed inside.

本発明の局所清浄化装置によれば、低清浄なクリーンルームであっても必要な箇所に本装置を固定配置又は移動配置することによって、製造機器の周辺を周囲の汚染から防護するとともに、製造機器自身から発生する汚染を他の領域に拡散させない。このため、製造機器の保守作業時などおいても製造機器の環境を高清浄に保つことができる。また、製造機器相互間の汚染の防止、作業者の安全の確保に有効である。さらに本発明のクリーンルームによれば、当該局所清浄化装置を必要な時にのみ稼動させるか、又は必要な箇所に移動して使用することができるので、クリーンルーム全体の清浄度を常時高く保つ必要がない。このため、クリーンルームの運転コストを削減できる。   According to the local cleaning device of the present invention, the periphery of the manufacturing equipment is protected from the surrounding contamination by fixing or moving the device at a necessary place even in a low-clean clean room. Do not disperse contamination from itself to other areas. For this reason, the environment of the manufacturing equipment can be kept highly clean even during maintenance work of the manufacturing equipment. It is also effective in preventing contamination between manufacturing equipment and ensuring worker safety. Furthermore, according to the clean room of the present invention, the local cleaning device can be operated only when necessary, or can be used by moving to a necessary location, so it is not necessary to keep the cleanliness of the entire clean room high all the time. . For this reason, the operating cost of a clean room can be reduced.

図1は本発明に係る局所清浄化装置の第1実施形態を示す側断面図であり、図2は図1のA−A矢視断面図である。当該局所清浄化装置20は、図3に示したようにクリーンルーム22内に設置された精密品製造機器24の近傍に配置される。クリーンルーム22は例えばミニエンバイロ方式のクリーンルームであり、天井26には削減された数のFFU(ファンフィルタユニット)28が設置され、クリーンルーム22内に向けて清浄空気を吹き出す。この清浄空気は通気性の床面30を通過した後に、大部分は循環路32から天井空間に戻り、一部は空調機34によって温湿度が調整された後にダクト35を介して天井空間に戻り、FFU28によって清浄空気として循環される。   FIG. 1 is a side sectional view showing a first embodiment of a local cleaning device according to the present invention, and FIG. 2 is a sectional view taken along line AA in FIG. The local cleaning device 20 is disposed in the vicinity of the precision product manufacturing apparatus 24 installed in the clean room 22 as shown in FIG. The clean room 22 is, for example, a mini-environment type clean room, and a reduced number of FFUs (fan filter units) 28 are installed on the ceiling 26 to blow clean air into the clean room 22. After this clean air has passed through the breathable floor 30, most of it returns from the circulation path 32 to the ceiling space, and part of it returns to the ceiling space through the duct 35 after the temperature and humidity are adjusted by the air conditioner 34. , And circulated as clean air by the FFU 28.

局所清浄化装置20は製造機器24の直上位置に支持部材36によってクリーンルーム22の天井26から吊り下げられる。当該局所清浄化装置20は箱状のチャンバ40の下面中央部に中央吸気口42を有し、この中央吸気口42を取り囲むようにして空気清浄化手段である4基のFFU44がチャンバ40内に収められている。各FFU44は上部のファン46の下方にケミカルフィルタ48、エアフィルタ50を積層した構成とされる。エアフィルタ50の下面は送風口52とされ、この送風口52からFFU44によって清浄化された清浄空気が製造機器24に向けて下向きに送風される。中央吸気口42には吸い込みダクト54の一端がスライド自在に接続し、この吸い込みダクト54の他端が製造機器側に伸長して開口している。吸い込みダクト54の他端開口と製造機器24の表面との距離dは、吸い込みダクト54の一端を上下方向にスライドさせることによって調整することができる。   The local cleaning device 20 is suspended from the ceiling 26 of the clean room 22 by a support member 36 at a position directly above the manufacturing equipment 24. The local cleaning device 20 has a central air inlet 42 at the center of the lower surface of a box-shaped chamber 40, and four FFUs 44 as air cleaning means are provided in the chamber 40 so as to surround the central air inlet 42. It is stored. Each FFU 44 has a structure in which a chemical filter 48 and an air filter 50 are stacked below an upper fan 46. The lower surface of the air filter 50 is a blower port 52, and clean air purified by the FFU 44 is blown downward toward the manufacturing equipment 24 from the blower port 52. One end of a suction duct 54 is slidably connected to the central air inlet 42, and the other end of the suction duct 54 extends to the manufacturing equipment side and opens. The distance d between the other end opening of the suction duct 54 and the surface of the manufacturing equipment 24 can be adjusted by sliding one end of the suction duct 54 in the vertical direction.

チャンバ40の上面中央部には給気口56が設けられ、製造機器24から離れた位置からのクリーンルーム22内の空気を取り込み可能とされる。給気口56にはダンパ58が取り付けられており、ダンパ58の開度を変化させることによって、給気口56からの空気取り込み量を調整することができる。   An air supply port 56 is provided at the center of the upper surface of the chamber 40 so that air in the clean room 22 can be taken from a position away from the manufacturing equipment 24. A damper 58 is attached to the air supply port 56, and the amount of air taken in from the air supply port 56 can be adjusted by changing the opening degree of the damper 58.

上記構成の局所清浄化装置20は製造機器24から汚染空気が臨時的又は継続的に発生する際に主に稼動させる。すなわち、保守作業などのために製造機器24の内部を開放した際に、製造機器24から汚染空気が発生する。又は製造機器24が定常運転している際でも継続的に製造機器24から汚染空気が発生する場合がある。したがって、このような汚染空気が当該製造機器24からクリーンルーム22全体に拡散しないように局所清浄化装置20を稼動させる。このため、局所清浄化装置20は製造機器24の汚染空気発生部24Aの直上に位置するように予め配置される。   The local cleaning device 20 having the above-described configuration is mainly operated when contaminated air is temporarily or continuously generated from the manufacturing equipment 24. That is, when the inside of the manufacturing equipment 24 is opened for maintenance work or the like, contaminated air is generated from the manufacturing equipment 24. Alternatively, there may be a case where contaminated air is continuously generated from the manufacturing device 24 even when the manufacturing device 24 is in steady operation. Therefore, the local cleaning device 20 is operated so that such contaminated air does not diffuse from the manufacturing equipment 24 to the entire clean room 22. For this reason, the local cleaning device 20 is disposed in advance so as to be located immediately above the contaminated air generation unit 24A of the manufacturing equipment 24.

局所清浄化装置20を稼動させる際には吸い込みダクト54の他端開口を汚染空気発生部24Aになるべく接近させる。次いで各FFU44のファン46を駆動する。すると、汚染空気発生部24Aで発生した汚染空気は吸い込みダクト54の他端開口から吸い込みダクト54内に吸い込まれ、中央吸気口42から各FFU44を通過し、送風口52に送られる。汚染空気はFFU44を通過する際に汚染空気中の有害ガス成分がケミカルフィルタ48に、塵埃がエアフィルタ50によって除去されて、清浄空気となる。この清浄空気は送風口52から製造機器24に向けて下向きに送風され、エアカーテンを形成するとともに、その大部分が再び中央吸気口42に吸い込まれる。その結果、汚染空気発生部24Aで発生した汚染空気は清浄空気によるエアカーテンに囲まれた状態となり、汚染空気がクリーンルーム22全体へ拡散することを防止する。なお、吸い込みダクト54は汚染空気発生部24Aで発生した汚染空気を確実に吸い込む機能以外に、外面が仕切り板の役目を果たし、送風口52から吹き出した清浄空気を外面に沿って確実に下方へ案内する。   When the local cleaning device 20 is operated, the other end opening of the suction duct 54 is brought as close as possible to the contaminated air generation unit 24A. Next, the fan 46 of each FFU 44 is driven. Then, the contaminated air generated in the contaminated air generating unit 24A is sucked into the suction duct 54 from the other end opening of the suction duct 54, passes through each FFU 44 from the central intake port 42, and is sent to the blower port 52. When the polluted air passes through the FFU 44, harmful gas components in the polluted air are removed by the chemical filter 48 and dust is removed by the air filter 50 to become clean air. The clean air is blown downward from the blower opening 52 toward the manufacturing equipment 24 to form an air curtain, and most of the air is again sucked into the central air intake 42. As a result, the contaminated air generated in the contaminated air generating unit 24A is surrounded by an air curtain made of clean air, and the contaminated air is prevented from diffusing to the entire clean room 22. In addition to the function of reliably sucking the contaminated air generated in the contaminated air generating section 24A, the suction duct 54 functions as a partition plate, and clean air blown out from the blower port 52 is surely moved downward along the outer surface. invite.

給気口56は中央吸気口42から吸い込む汚染空気の量を調整する場合に有効である。FFU44は給気口56から取り込んだ外部空気と中央吸気口42から吸い込んだ汚染空気の合流空気を清浄化して送風口52に送り込む。給気口56に設けたダンパ58の開度を大きくすると、製造機器24から離れた位置からのクリーンルーム22内の空気が給気口56から多量にチャンバ40内に吸い込まれ、その分、中央吸気口42から吸い込む汚染空気の量が減少する。逆に、ダンパ58の開度を小さくすると、給気口56からチャンバ40内に吸い込まれる空気量が少なくなり、その分、中央吸気口42から吸い込む汚染空気の量が増加する。   The air supply port 56 is effective in adjusting the amount of contaminated air sucked from the central air intake port 42. The FFU 44 cleans the combined air of the external air taken in from the air supply port 56 and the contaminated air sucked in from the central intake port 42 and sends it to the blower port 52. When the opening degree of the damper 58 provided at the air supply port 56 is increased, a large amount of air in the clean room 22 from a position away from the manufacturing equipment 24 is sucked into the chamber 40 from the air supply port 56, and the central intake air is correspondingly increased. The amount of contaminated air sucked from the mouth 42 is reduced. Conversely, when the opening degree of the damper 58 is reduced, the amount of air sucked into the chamber 40 from the air supply port 56 is reduced, and the amount of contaminated air sucked from the central air inlet 42 is increased accordingly.

したがって、汚染空気発生部24Aで発生する汚染空気量が少ないか、又は汚染空気の汚染度が低い場合には、ダンパ58の開度を大きくして中央吸気口42から吸い込む汚染空気の量を減少させる。すると、製造機器24の上方で内部循環する空気量が減少し、製造機器24の周囲を下方に流れる清浄空気Bの量を増やすことができ、この清浄空気Aが製造機器24を大きく包み込んで清浄環境を保持する。逆に、汚染空気発生部24Aで発生する汚染空気量が多いか、又は汚染空気の汚染度が高い場合には、ダンパ58の開度を小さくして中央吸気口42から吸い込む汚染空気の量を増加させる。すると、発生した汚染空気を確実に中央吸気口42から吸い込むことができ、汚染空気の外部拡散を防ぐ。   Therefore, when the amount of polluted air generated in the polluted air generating unit 24A is small or the polluted air has a low degree of pollution, the amount of the polluted air sucked from the central air inlet 42 is decreased by increasing the opening degree of the damper 58. Let Then, the amount of air circulating internally above the manufacturing equipment 24 is reduced, and the amount of clean air B flowing downward around the manufacturing equipment 24 can be increased. This clean air A encloses the manufacturing equipment 24 and cleans it. Preserve the environment. On the contrary, when the amount of contaminated air generated in the contaminated air generating unit 24A is large or the degree of contamination of the contaminated air is high, the amount of the contaminated air sucked from the central air inlet 42 by reducing the opening of the damper 58 is reduced. increase. Then, the generated contaminated air can be reliably sucked from the central air inlet 42, and the outside diffusion of the contaminated air is prevented.

実験検討結果によれば、前記した吸い込みダクト54の他端開口と製造機器24の表面との距離dは、吸い込みダクト54の有効口径をw、吸い込みダクト54の平均吸い込み風速をv、送風口52の平均吹き出し風速をvとした時に、式d≦2・w・v/vを満足するように調整することが望ましい。上記関係式において吸い込みダクト54の有効口径とは、ダクト断面形状が正方形の場合には各辺の幅、長方形の場合には長辺と短辺の平均幅、円形の場合には直径である。上記関係式を満足させると吸い込みダクト54による汚染空気の吸い上げを比較的円滑に行うことができる。上記関係式を満足させるためには、主に2通りのアプローチ法がある。第1の方法は吸い込みダクト54を上下方向にスライドさせて、距離dを直接に調整する方法である。第2の方法は給気口56に設けたダンパ58の開度を調整する方法である。前記したようにダンパ58の開度を調整することによって、中央吸気口42から吸い込む汚染空気の量、すなわち吸い込みダクト54の平均吸い込み風速v1を増減させることができる。したがって、ダンパ58の開度の調整によって間接的に距離dを調整することができる。 According to the experimental examination results, the distance d between the other end opening of the suction duct 54 and the surface of the manufacturing equipment 24 is as follows. The effective diameter of the suction duct 54 is w, the average suction wind speed of the suction duct 54 is v 1 , It is desirable to adjust so that the formula d ≦ 2 · w · v 2 / v 1 is satisfied when the average blowing wind speed of 52 is v 2 . In the above relational expression, the effective diameter of the suction duct 54 is the width of each side when the duct cross-sectional shape is square, the average width of the long side and the short side when rectangular, and the diameter when circular. When the above relational expression is satisfied, the contaminated air can be sucked up by the suction duct 54 relatively smoothly. In order to satisfy the above relational expression, there are mainly two approaches. The first method is a method of directly adjusting the distance d by sliding the suction duct 54 in the vertical direction. The second method is a method of adjusting the opening degree of the damper 58 provided at the air supply port 56. By adjusting the opening degree of the damper 58 as described above, the amount of contaminated air sucked from the central air inlet 42, that is, the average suction wind speed v1 of the suction duct 54 can be increased or decreased. Therefore, the distance d can be indirectly adjusted by adjusting the opening degree of the damper 58.

ただし、製造機器24の形状は様々であり、汚染空気発生部24Aの形状、拡がりも様々であるたため、上記関係式が常に成り立つわけではない。その際には、この関係式を目安にして、距離dやダンパ58の開度を適宜に調整すればよい。   However, since the shape of the manufacturing equipment 24 is various, and the shape and spread of the contaminated air generating unit 24A are also various, the above relational expression does not always hold. In this case, the distance d and the opening degree of the damper 58 may be appropriately adjusted using this relational expression as a guide.

上記説明では局所清浄化装置20の稼動状況として、製造機器24から汚染空気が発生し、この発生した汚染空気をクリーンルーム22の他の領域に拡散させない場合について説明した。しかしながら、本実施形態に係る局所清浄化装置20はクリーンルーム22の環境が何らかの原因で汚染している際に、製造機器24をクリーンルーム22の汚染環境から保護する場合にも役立つ。この場合には給気口56のダンパ58を全開にして、給気口56からの空気取り込み量を相対的に多くし、中央吸気口42からの空気吸い込み量を少なくした運転を行う。すると給気口56からの空気取り込み量に相当した量の清浄空気Aが製造機器24を大きく包み込むことになり、製造機器24をクリーンルーム22の汚染環境から保護する。   In the above description, as an operating state of the local cleaning device 20, a case where contaminated air is generated from the manufacturing equipment 24 and the generated contaminated air is not diffused to other areas of the clean room 22 has been described. However, the local cleaning device 20 according to the present embodiment is also useful for protecting the manufacturing equipment 24 from the contaminated environment of the clean room 22 when the environment of the clean room 22 is contaminated for some reason. In this case, the damper 58 of the air supply port 56 is fully opened, the air intake amount from the air supply port 56 is relatively increased, and the air intake amount from the central intake port 42 is decreased. Then, the amount of clean air A corresponding to the amount of air taken in from the air supply port 56 greatly encloses the manufacturing equipment 24, and the manufacturing equipment 24 is protected from the contaminated environment of the clean room 22.

上述のとおり、本実施形態の局所清浄化装置20によればクリーンルーム22内に設置された精密品製造機器24の周辺を周囲の汚染から防護するとともに、製造機器24自身から発生する汚染を他の領域に拡散させない。   As described above, according to the local cleaning device 20 of the present embodiment, the periphery of the precision product manufacturing device 24 installed in the clean room 22 is protected from surrounding contamination, and the contamination generated from the manufacturing device 24 itself is protected from other contamination. Do not diffuse into the area.

図4は本発明の第2実施形態の要部を示す斜視図である。中央吸気口42Aを挟んで2基のFFU44Aを配置し、中央吸気口42Aの残りの2辺には閉止板60が取り付けてある。中央吸気口42Aの下方には吸い込みダクト54Aが接続している。他の構成は前記第1実施形態と同様である。すなわち、中央吸気口42Aの周囲全体をFFU44Aで囲わずに、一部省略している。この実施形態では閉止板60の下方領域に送風口52Aからの清浄空気が行き渡らない可能性がある。そこで送風口52Aの一部に傾斜送風部62を設けている。これによって、閉止板60の下方領域にも清浄空気が行き渡ることになり、周囲からの汚染の侵入を防止できる。   FIG. 4 is a perspective view showing a main part of the second embodiment of the present invention. Two FFUs 44A are arranged with the central air inlet 42A interposed therebetween, and a closing plate 60 is attached to the remaining two sides of the central air inlet 42A. A suction duct 54A is connected below the central air inlet 42A. Other configurations are the same as those of the first embodiment. In other words, the entire periphery of the central air inlet 42A is not surrounded by the FFU 44A, but is partially omitted. In this embodiment, there is a possibility that clean air from the blower opening 52 </ b> A does not reach the lower region of the closing plate 60. Therefore, the inclined air blowing part 62 is provided in a part of the air blowing port 52A. As a result, clean air spreads also to the lower region of the closing plate 60, and contamination from the surroundings can be prevented.

図5は本発明の第3実施形態の要部を示す側断面図である。第1実施形態と同様にチャンバ40Bの中央に中央吸気口42Bを配置し、この中央吸気口42Bを囲むようにして送風口52Bが設けられている。中央吸気口42Bにはファン64を配し、送風口52B側にはケミカルフィルタ48Bとエアフィルタ50Bを配置している。この実施形態の構造ではファン64は中央吸気口42Bから吸い込んだ空気をチャンバ40Bの内部に向けて送風するので、チャンバ40Bの内部は外部に対して陽圧になる。このため、第1実施形態で示したような給気口56を設けて外部空気を取り込むことはできないが、1台のファン64のみで吸気と送風ができるので装置の軽量化とコスト低減を図ることができる。   FIG. 5 is a side sectional view showing the main part of the third embodiment of the present invention. Similar to the first embodiment, a central air inlet 42B is disposed in the center of the chamber 40B, and a blower port 52B is provided so as to surround the central air inlet 42B. A fan 64 is disposed in the central air inlet 42B, and a chemical filter 48B and an air filter 50B are disposed on the air outlet 52B side. In the structure of this embodiment, the fan 64 blows air sucked from the central air inlet 42B toward the inside of the chamber 40B, so that the inside of the chamber 40B has a positive pressure with respect to the outside. For this reason, the air supply port 56 as shown in the first embodiment cannot be provided and external air cannot be taken in. However, since only one fan 64 can intake and blow air, the device is reduced in weight and cost is reduced. be able to.

図6は本発明の第4実施形態の要部を示す側断面図である。この実施形態も第1実施形態と同様にチャンバ40Cの中央に中央吸気口42Cを配置し、この中央吸気口42Cを囲むようにして送風口52Cが設けられている。中央吸気口42Cの上方にファン64C、ケミカルフィルタ48C、エアフィルタ50Cで構成された1台のFFU44Cを配置し、このFFU44Cによって吸気、空気清浄化及び送風を行う。この第4実施形態によれば、より一層、装置の軽量化とコスト低減を図ることができる。   FIG. 6 is a side sectional view showing the main part of the fourth embodiment of the present invention. Similarly to the first embodiment, in this embodiment, a central air inlet 42C is arranged at the center of the chamber 40C, and an air outlet 52C is provided so as to surround the central air inlet 42C. One FFU 44C composed of a fan 64C, a chemical filter 48C, and an air filter 50C is disposed above the central intake port 42C, and intake, air purification, and ventilation are performed by the FFU 44C. According to the fourth embodiment, it is possible to further reduce the weight and cost of the apparatus.

図7は本発明の第5実施形態の要部を示す側断面図である。この実施形態も第4実施形態と同様に中央吸気口42Dに1台のFFU44Dを配置し、このFFU44Dによって吸気、空気清浄化及び送風を行う。チャンバ40D内には気流方向を滑らかに案内する案内板66が設置されている。また、中央吸気口42Dの周囲を閉止板60Dで囲み、送風口52Dが閉止板60Dの外側に狭い面積で開口している。このような構成によって、送風口52Dからの清浄空気の吹き出し風速を大きくし、エアカーテン効果を増強するとともに、製造機器側の吸気範囲を拡大することができる。なお、閉止板60Dが設置された内側部分を閉止板60Dに替えて通気抵抗の大きい送風口とし、その周辺を通気抵抗の小さい送風口52Dとすれば、清浄空気の下降気流に乱れが発生しにくくなるのでより一層、有効である。   FIG. 7 is a side sectional view showing an essential part of a fifth embodiment of the present invention. In this embodiment, similarly to the fourth embodiment, one FFU 44D is arranged at the central air inlet 42D, and intake, air purification, and ventilation are performed by the FFU 44D. A guide plate 66 that smoothly guides the direction of airflow is installed in the chamber 40D. Further, the periphery of the central air inlet 42D is surrounded by the closing plate 60D, and the air blowing port 52D is opened outside the closing plate 60D in a small area. With such a configuration, it is possible to increase the blowing speed of clean air from the blower opening 52D, enhance the air curtain effect, and expand the intake range on the manufacturing equipment side. If the inner portion where the closing plate 60D is installed is replaced with the closing plate 60D to form a ventilation port with a large ventilation resistance, and the surrounding area is a ventilation port 52D with a small ventilation resistance, the downflow of clean air will be disturbed. It becomes more effective because it becomes difficult.

図8は本発明の第6実施形態の要部を示す側断面図である。この実施形態も第4実施形態と同様に中央吸気口42Eに1台のFFU44Eを配置し、このFFU44Eによって吸気、空気清浄化及び送風を行う。チャンバ40Eを覆うように外周チャンバ68が設けられ、この外周チャンバ68の上面中央に第2のFFU70が取り付けられている。第2のFFU70はクリーンルーム内の外部空気を取り込んで清浄化し、この清浄空気をチャンバ40Eの外周部に形成された吹き出し口72から下降気流として吹き出す。この第6実施形態によれば、下方の製造機器側に吹き出す清浄空気量が増加するので、より一層、周辺を周囲の汚染から防護するとともに、製造機器24自身から発生する汚染を他の領域に拡散させない。   FIG. 8 is a side sectional view showing the main part of the sixth embodiment of the present invention. In this embodiment, similarly to the fourth embodiment, one FFU 44E is arranged at the central air inlet 42E, and intake, air cleaning, and blowing are performed by the FFU 44E. An outer peripheral chamber 68 is provided so as to cover the chamber 40 </ b> E, and a second FFU 70 is attached to the center of the upper surface of the outer peripheral chamber 68. The second FFU 70 takes in and cleans the outside air in the clean room, and blows out this clean air as a descending air current from the outlet 72 formed in the outer peripheral portion of the chamber 40E. According to the sixth embodiment, the amount of clean air blown to the lower manufacturing equipment side is increased, so that the periphery is further protected from the surrounding contamination, and the contamination generated from the manufacturing equipment 24 itself is transferred to other areas. Do not diffuse.

図9は本発明の第7実施形態を示す側面図である。この実施形態の係る局所清浄化装置の主要部80は第1実施形態と同様であるので、図1に図示したものと同一の符号を付して説明を省略する。この局所清浄化装置は主要部80を複数本の支柱74で支持するとともに、支柱74の下端に車輪76を取り付け、クリーンルームの床面78を移動可能にしたものである。この第7実施形態によれば、保守作業などを必要とする製造機器24の位置に当該局所清浄化装置を移動し、その機能を発揮させることができる。このため、個々の製造機器24に対応した局所清浄化装置を設置する必要がなく、コスト低減に寄与する。本実施形態は床面78を移動可能な局所清浄化装置としたが、これに替えてクリーンルームの天井面に走行用のレールを配し、主要部80を天井面に沿って移動可能な構成としてもよい。   FIG. 9 is a side view showing a seventh embodiment of the present invention. Since the main part 80 of the local cleaning apparatus according to this embodiment is the same as that of the first embodiment, the same reference numerals as those shown in FIG. In this local cleaning device, the main part 80 is supported by a plurality of pillars 74, and wheels 76 are attached to the lower ends of the pillars 74 so that the floor surface 78 of the clean room can be moved. According to the seventh embodiment, the local cleaning device can be moved to the position of the manufacturing equipment 24 that requires maintenance work or the like, and its function can be exhibited. For this reason, it is not necessary to install the local cleaning apparatus corresponding to each manufacturing apparatus 24, and it contributes to cost reduction. In the present embodiment, the local cleaning device is movable on the floor surface 78, but instead of this, a traveling rail is arranged on the ceiling surface of the clean room, and the main part 80 is movable along the ceiling surface. Also good.

図10は本発明の第8実施形態を示す側面図である。この実施形態の係る局所清浄化装置は主要部90が前記各実施形態のものに対して90度、起立しており、この主要部90が支柱92によって支持されている。主要部90は第1実施形態と同様であるので、図1に図示したものと同一の符号を付して説明を省略する。この第8実施形態の局所清浄化装置は、製造機器94の開放面が横向きであるような場合に好適に利用される。当該局所清浄化装置の支柱92に車輪を付けてクリーンルーム内を移動可能にすることもできる。   FIG. 10 is a side view showing an eighth embodiment of the present invention. In the local cleaning device according to this embodiment, the main portion 90 stands up 90 degrees with respect to those of the above-described embodiments, and the main portion 90 is supported by the support column 92. Since the main part 90 is the same as that of the first embodiment, the same reference numerals as those shown in FIG. The local cleaning apparatus according to the eighth embodiment is suitably used when the open surface of the manufacturing equipment 94 is in the horizontal direction. It is also possible to attach a wheel to the column 92 of the local cleaning device so that it can move in the clean room.

本発明の第1実施形態を示す側断面図である。It is a sectional side view which shows 1st Embodiment of this invention. 図1のA−A矢視断面図である。It is AA arrow sectional drawing of FIG. 第1実施形態に係る局所清浄化装置が設置されたクリーンルームの側断面図である。It is a sectional side view of the clean room where the local cleaning device concerning a 1st embodiment was installed. 本発明の第2実施形態の要部を示す側断面図である。It is a sectional side view which shows the principal part of 2nd Embodiment of this invention. 本発明の第3実施形態の要部を示す側断面図である。It is a sectional side view which shows the principal part of 3rd Embodiment of this invention. 本発明の第4実施形態の要部を示す側断面図である。It is a sectional side view which shows the principal part of 4th Embodiment of this invention. 本発明の第5実施形態の要部を示す側断面図である。It is a sectional side view which shows the principal part of 5th Embodiment of this invention. 本発明の第6実施形態の要部を示す側断面図である。It is side sectional drawing which shows the principal part of 6th Embodiment of this invention. 本発明の第7実施形態を示す側面図である。It is a side view which shows 7th Embodiment of this invention. 本発明の第8実施形態を示す側面図である。It is a side view which shows 8th Embodiment of this invention. ミニエンバイロ方式のクリーンルームを例示した側断面図である。It is side sectional drawing which illustrated the clean room of the mini environment system. 特許文献1に開示されたクリーンルームの概要を示す側断面図である。It is a sectional side view which shows the outline | summary of the clean room disclosed by patent document 1. FIG. 特許文献1に開示されたクリーンルームの技術課題を説明するための側断面図である。It is a sectional side view for demonstrating the technical subject of the clean room disclosed by patent document 1. FIG.

符号の説明Explanation of symbols

20………局所清浄化装置、22………クリーンルーム、24………製造機器、24A………汚染空気発生部、26………天井、28………FFU、30………床面、32………循環路、34………空調機、35………ダクト、36………支持部材、40,40B,40C,40D,40E………チャンバ、42、42A,42B,42C,42D,42E………中央吸気口、44,44A,44C,44D,44E………FFU、46,46C………ファン、48,48B,48C………ケミカルフィルタ、50,50B,50C………エアフィルタ、52,52A,52B,52C,52D………送風口、54,54A………吸い込みダクト、56………給気口、58………ダンパ、60………閉止板、62………傾斜送風部、64………ファン、66………案内板、68………外周チャンバ、70………第2のFFU、72………吹き出し口、74………支柱、76………車輪、78………床面、80、90………主要部、92………支柱、94………製造機器。   20 ......... Local cleaning device, 22 ......... Clean room, 24 ......... Manufacturing equipment, 24A ......... Contaminated air generating part, 26 ......... Ceiling, 28 ......... FFU, 30 ...... Floor surface, 32 ......... circulation path, 34 ......... air conditioner, 35 ......... duct, 36 ......... support member, 40, 40B, 40C, 40D, 40E ......... chamber, 42, 42A, 42B, 42C, 42D , 42E ......... Central air inlet, 44, 44A, 44C, 44D, 44E ......... FFU, 46, 46C ......... Fan, 48, 48B, 48C ......... Chemical filter, 50, 50B, 50C ......... Air filter, 52, 52A, 52B, 52C, 52D ......... Blower port, 54, 54A ......... Suction duct, 56 ......... Air supply port, 58 ...... Damper, 60 ......... Closed plate, 62 ... ...... Inclined fan section, 64 …… Fan, 66 ......... Guide plate, 68 ......... Outer peripheral chamber, 70 ......... Second FFU, 72 ......... Blowout port, 74 ......... Post, 76 ...... Wheel, 78 ......... Floor surface , 80, 90... Main part, 92.

Claims (5)

クリーンルーム内に設置された精密品製造機器の周辺の空気を吸い込む中央吸気口と、この中央吸気口から吸い込んだ前記空気を清浄化する空気清浄化手段と、前記中央吸気口を囲むように配置されて前記空気清浄化手段からの清浄空気を前記製造機器に向けて送風する送風口と、前記中央吸気口に一端が接続し、他端が前記製造機器側に伸長して開口した、長さが調整可能な吸い込みダクトとを具備し
前記空気清浄化手段には、前記製造機器から離れた位置からの外部空気を取り込み可能であるとともにその取り込む外部空気の量を調整する流量調整手段を備えた給気口が接続し、前記空気清浄化手段は当該給気口から取り込んだ外部空気と前記中央吸気口から吸い込んだ空気の合流空気を清浄化して前記送風口に送り込むようにされたことを特徴とする局所清浄化装置。
A central air inlet that sucks in the air around the precision product manufacturing equipment installed in the clean room, an air cleaning means that cleans the air sucked from the central air inlet, and a central air inlet that is arranged to surround the air inlet. The length of the air outlet that blows clean air from the air cleaning means toward the manufacturing equipment and one end connected to the central air inlet and the other end extended and opened toward the manufacturing equipment. An adjustable suction duct ,
The air cleaning means is connected to an air supply port that is capable of taking in external air from a position away from the manufacturing equipment and includes a flow rate adjusting means for adjusting the amount of the external air to be taken in. The local cleaning device according to claim 1, wherein the converting means purifies the combined air of the external air taken in from the air supply port and the air sucked in from the central air intake port and sends it to the air blowing port .
前記給気口にはダンパが取り付けられており、前記ダンパの開度を変化させることによって前記給気口からの外部空気の取り込み量を調整可能であることを特徴とする請求項1に記載の局所清浄化装置。 The damper according to claim 1 , wherein a damper is attached to the air supply port, and an amount of external air taken in from the air supply port can be adjusted by changing an opening degree of the damper . Local cleaning device. 前記吸い込みダクトの有効口径をw、吸い込みダクトの平均吸い込み風速をv、送風口の平均吹き出し風速をvとした時に、前記吸い込みダクトの他端開口と前記製造機器の表面との距離dが式d≦2・w・v/vを満足するように調整されたことを特徴とする請求項1又は請求項2に記載の局所清浄化装置。 When the effective diameter of the suction duct is w, the average suction wind speed of the suction duct is v 1 , and the average blowing wind speed of the blower outlet is v 2 , the distance d between the other end opening of the suction duct and the surface of the manufacturing equipment is The local cleaning apparatus according to claim 1, wherein the local cleaning apparatus is adjusted so as to satisfy the formula d ≦ 2 · w · v 2 / v 1 . 前記クリーンルーム内を移動可能とされたことを特徴とする請求項1又は請求項2に記載の局所清浄化装置。   The local cleaning apparatus according to claim 1, wherein the local cleaning apparatus is movable in the clean room. 請求項1乃至請求項4のいずれかに記載の局所清浄化装置が配置されたことを特徴とするクリーンルーム。   A clean room in which the local cleaning device according to any one of claims 1 to 4 is arranged.
JP2004349542A 2004-12-02 2004-12-02 Local cleaning device and clean room Expired - Fee Related JP4656296B2 (en)

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JP5105757B2 (en) 2006-03-15 2012-12-26 富士フイルム株式会社 Ink set for inkjet recording and inkjet recording method
US8545296B2 (en) 2007-10-26 2013-10-01 Panasonic Corporation Clean room
JP5154976B2 (en) * 2008-02-27 2013-02-27 新日本空調株式会社 Local space air purifier
JP4733163B2 (en) * 2008-03-28 2011-07-27 新菱冷熱工業株式会社 Clean air circulation system
JP5652917B2 (en) * 2011-08-31 2015-01-14 大成建設株式会社 Clean room
EP3062030B1 (en) * 2013-10-25 2019-06-12 Japan Tissue Engineering Co., Ltd. Clean work device

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Publication number Priority date Publication date Assignee Title
JPH08247513A (en) * 1995-03-14 1996-09-27 Sanki Eng Co Ltd Clean unit
JP2004324939A (en) * 2003-04-22 2004-11-18 Toyo Netsu Kogyo Kk Clean room

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08247513A (en) * 1995-03-14 1996-09-27 Sanki Eng Co Ltd Clean unit
JP2004324939A (en) * 2003-04-22 2004-11-18 Toyo Netsu Kogyo Kk Clean room

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