TWI476356B - Heat treatment device - Google Patents

Heat treatment device Download PDF

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Publication number
TWI476356B
TWI476356B TW097119342A TW97119342A TWI476356B TW I476356 B TWI476356 B TW I476356B TW 097119342 A TW097119342 A TW 097119342A TW 97119342 A TW97119342 A TW 97119342A TW I476356 B TWI476356 B TW I476356B
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Taiwan
Prior art keywords
gas
heat treatment
pipe
introduction
heat
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TW097119342A
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Chinese (zh)
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TW200907269A (en
Inventor
Tezen Hisamitsu
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Espec Corp
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    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27BFURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B17/00Furnaces of a kind not covered by any preceding group
    • F27B17/0016Chamber type furnaces
    • F27B17/0025Especially adapted for treating semiconductor wafers
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27BFURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B17/00Furnaces of a kind not covered by any preceding group
    • F27B17/0016Chamber type furnaces
    • F27B17/0083Chamber type furnaces with means for circulating the atmosphere
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27DDETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D7/00Forming, maintaining, or circulating atmospheres in heating chambers
    • F27D7/02Supplying steam, vapour, gases, or liquids
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27DDETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D7/00Forming, maintaining, or circulating atmospheres in heating chambers
    • F27D7/04Circulating atmospheres by mechanical means
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27DDETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D7/00Forming, maintaining, or circulating atmospheres in heating chambers
    • F27D7/02Supplying steam, vapour, gases, or liquids
    • F27D2007/023Conduits
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27DDETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D7/00Forming, maintaining, or circulating atmospheres in heating chambers
    • F27D7/04Circulating atmospheres by mechanical means
    • F27D2007/045Fans

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Waste-Gas Treatment And Other Accessory Devices For Furnaces (AREA)
  • Furnace Details (AREA)
  • Gas-Filled Discharge Tubes (AREA)

Description

熱處理裝置Heat treatment device

本發明有關對被熱處理物進行熱處理的熱處理裝置。The present invention relates to a heat treatment apparatus for heat-treating a material to be heat treated.

以往的熱處理裝置,一邊使熱處理室內的空氣發生迴圈一邊對熱處理室內進行加熱,由此對收容於熱處理室內的被熱處理物進行熱處理。這種熱處理裝置例如在平板顯示器(FPD: Flat Display Panel)的製造過程中用於對光刻膠或有機薄膜的預烘(pre-bake)工序、後烘(post-bake)工序。在這些工序中,對玻璃基板等被熱處理物進行熱處理時,光刻膠等中所含有的揮發性成分氣化,生成大量昇華物,存在上述昇華物重新結晶,飛散或附著到熱處理裝置內等的問題。In the conventional heat treatment apparatus, the heat-treated room is heated while the air in the heat treatment chamber is looped, thereby heat-treating the object to be heat-treated in the heat treatment chamber. Such a heat treatment apparatus is used in a pre-bake process or a post-bake process of a photoresist or an organic film, for example, in the manufacturing process of a flat panel display (FPD: Flat Display Panel). In the heat treatment of the heat-treated material such as a glass substrate, the volatile component contained in the photoresist or the like is vaporized to generate a large amount of sublimate, and the sublimate is recrystallized, scattered or adhered to the heat treatment apparatus. The problem.

作為解決上述問題的對策,例如日本專利公開公報特開平10-141868號中公開這樣一種方案,即,一邊將外部氣體加熱並送入上述熱處理室內,一邊使上述熱處理室內的空氣經導出管排出,以對上述熱處理室內進行換氣。如此對熱處理室內進行換氣,可抑制昇華物重新結晶並附著到熱處理裝置內。For example, Japanese Patent Laid-Open No. Hei 10-141868 discloses a method in which air in the heat treatment chamber is discharged through a discharge pipe while heating and feeding the outside air into the heat treatment chamber. The air in the above heat treatment chamber is ventilated. By ventilating the heat treatment chamber in this manner, the sublimate can be prevented from recrystallizing and adhering to the heat treatment apparatus.

然而,在日本專利公開公報特開平10-141868號公報的熱處理裝置中,由於在熱處理部的外壁和熱處理室之間設置有氣體處理部,該氣體處理部具有加熱器及用於使空氣在熱處理室的內外迴圈的鼓風機,其中存在的問題是, 在要清洗並除去附著在熱處理室的內壁等的昇華物的情況下,因清洗用的清洗液,可能使上述氣體處理部的鼓風機或加熱器等電氣設備出現故障。In the heat treatment apparatus of Japanese Laid-Open Patent Publication No. Hei 10-141868, a gas processing portion having a heater and a heat treatment for air is provided between the outer wall of the heat treatment portion and the heat treatment chamber. The inside and outside of the chamber of the blower, the problem is that When the sublimate adhering to the inner wall of the heat treatment chamber or the like is to be cleaned and removed, the cleaning device for cleaning may cause malfunction of an electric device such as a blower or a heater of the gas treatment unit.

本發明的目的在於提供一種熱處理裝置,可以在防止鼓風機或加熱器出現故障的狀態下,清洗熱處理部的熱處理室內。An object of the present invention is to provide a heat treatment apparatus which can clean a heat treatment chamber of a heat treatment portion while preventing a malfunction of a blower or a heater.

本發明提供的熱處理裝置包括:熱處理部,具有分別與熱處理室連通的氣體導入部及氣體導出部,上述熱處理室用於收容被熱處理物,該所收容的被熱處理物可從上述熱處理室取出;以及氣體處理部,具有氣體通道,該氣體通道用於將熱處理用氣體導入到上述氣體導入部,並從上述氣體導出部導出進行熱處理後的氣體,其中,在上述氣體通道中設置有:催化劑,分解在對上述被熱處理物進行熱處理時從該被熱處理物產生的昇華物;加熱器,至少加熱上述催化劑;以及一個或兩個以上的鼓風機,將上述熱處理用氣體及上述進行熱處理後的氣體向規定方向引導。由此,可以在防止鼓風機或加熱器出現故障的狀態下,清洗熱處理部的熱處理室內。The heat treatment apparatus according to the present invention includes: a heat treatment unit having a gas introduction portion and a gas discharge portion that communicate with the heat treatment chamber, wherein the heat treatment chamber is for accommodating the object to be heat-treated, and the heat-treated product to be contained can be taken out from the heat treatment chamber; And the gas processing unit, wherein the gas passage is configured to introduce a heat treatment gas into the gas introduction unit, and to derive a gas after the heat treatment from the gas discharge unit, wherein the gas passage is provided with a catalyst. Decomposing a sublimate generated from the heat-treated material when heat-treating the heat-treated material; heating the at least the catalyst; and one or two or more blowers, and the gas for heat treatment and the gas after the heat treatment Guide the direction. Thereby, it is possible to clean the heat treatment chamber of the heat treatment portion while preventing the blower or the heater from malfunctioning.

以下,參照附圖對本發明的較佳實施例進行詳細的說明。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.

(第一實施例)(First Embodiment)

圖1是本發明第一實施例所有關的熱處理裝置的簡圖。該熱處理裝置1A例如用於平板顯示器的製造工序,是設置於無塵室(clean room)內的所謂潔淨烘箱(clean oven)。BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a schematic view of a heat treatment apparatus according to a first embodiment of the present invention. The heat treatment apparatus 1A is used, for example, in a manufacturing process of a flat panel display, and is a so-called clean oven installed in a clean room.

熱處理裝置1A包括熱處理部10及氣體處理部20A。熱處理部10具有用於收容被熱處理物(以下也稱為工件)W的熱處理室11,該被熱處理物W可以從該熱處理室11中取出。氣體處理部20具有氣體通道21A,該氣體通道21A用於從熱處理室11導出進行熱處理後的氣體(例如,進行熱處理後的空氣),並且將熱處理用氣體(例如,加熱用空氣)導入到熱處理部10的熱處理室11內。The heat treatment apparatus 1A includes a heat treatment unit 10 and a gas treatment unit 20A. The heat treatment unit 10 has a heat treatment chamber 11 for accommodating a heat-treated product (hereinafter also referred to as a workpiece) W, and the heat-treated material W can be taken out from the heat treatment chamber 11. The gas processing unit 20 has a gas passage 21A for discharging a gas subjected to heat treatment from the heat treatment chamber 11 (for example, air subjected to heat treatment), and introducing a heat treatment gas (for example, heating air) into the heat treatment. The heat treatment chamber 11 of the portion 10 is inside.

熱處理部10具有:氣體導入部12,用於從氣體處理部20A導入熱處理用氣體;以及氣體導出部13,用於從熱處理室11導出進行熱處理後的氣體。熱處理室11的外側由隔熱壁11a圍繞。The heat treatment unit 10 includes a gas introduction unit 12 for introducing a heat treatment gas from the gas treatment unit 20A, and a gas discharge unit 13 for discharging the gas subjected to the heat treatment from the heat treatment chamber 11. The outer side of the heat treatment chamber 11 is surrounded by the heat insulating wall 11a.

在熱處理室11的內側設置有保持部件(未圖示),該保持部件例如可以將一個或兩個以上的被熱處理物W支撐並保持在規定狀態。保持部件設置於圖1中雙點劃線所示的位置上。上述氣體導入部12呈管狀,從熱處理室11的隔熱壁11a向外延伸,並與熱處理室11連通。該氣體導入部12的進氣側端上設置有連接用凸緣14。上述氣體導出部13也呈管狀,從熱處理室11的隔熱壁11a向外延伸,並與熱處理室11連通。該氣體導出部13的出氣側端 上設置有連接用凸緣15。A holding member (not shown) is provided inside the heat treatment chamber 11, and the holding member can support and hold one or two or more heat-treated objects W in a predetermined state, for example. The holding member is placed at a position shown by a chain double-dashed line in FIG. The gas introduction portion 12 has a tubular shape and extends outward from the heat insulating wall 11a of the heat treatment chamber 11 and communicates with the heat treatment chamber 11. A connection flange 14 is provided on the intake side end of the gas introduction portion 12. The gas discharge portion 13 also has a tubular shape and extends outward from the heat insulating wall 11a of the heat treatment chamber 11 and communicates with the heat treatment chamber 11. The outlet side of the gas discharge portion 13 A connecting flange 15 is provided on the upper side.

氣體通道21A具有:導入管22,連接於氣體導入部12;導出管23,連接於氣體導出部13;以及氣體處理管24,設置于導入管22與導出管23之間。導入管22的出氣側端上設置有連接用凸緣25,該連接用凸緣25與氣體導入部12的連接用凸緣14相連接。導出管23的進氣側端上設置有連接用凸緣26,該連接用凸緣26與氣體導出部13的連接用凸緣15相連接。例如用螺栓、螺母等連接裝置連接導入管22的凸緣25和氣體導入部12的凸緣14,並例如用螺栓、螺母等連接裝置連接導出管23的凸緣26和氣體導出部13的凸緣15,就可以連接熱處理部10的熱處理室11與氣體處理部20A的氣體通道21A並使這些連通,形成迴圈通道。並且,在氣體通道21A的適當位置上設置有用於調整風量的震動器(未圖示)。The gas passage 21A has an introduction pipe 22 connected to the gas introduction portion 12, a discharge pipe 23 connected to the gas discharge portion 13, and a gas treatment pipe 24 provided between the introduction pipe 22 and the outlet pipe 23. A connection flange 25 is provided on the air outlet side end of the introduction pipe 22, and the connection flange 25 is connected to the connection flange 14 of the gas introduction portion 12. A connection flange 26 is provided on the intake side end of the outlet pipe 23, and the connection flange 26 is connected to the connection flange 15 of the gas discharge portion 13. For example, the flange 25 of the introduction pipe 22 and the flange 14 of the gas introduction portion 12 are connected by a connecting means such as a bolt or a nut, and the flange 26 of the discharge pipe 23 and the convex portion of the gas discharge portion 13 are connected by, for example, a connecting means such as a bolt or a nut. With the edge 15, the heat treatment chamber 11 of the heat treatment portion 10 and the gas passage 21A of the gas treatment portion 20A can be connected to each other to form a loop passage. Further, a vibrator (not shown) for adjusting the air volume is provided at an appropriate position of the gas passage 21A.

另外,上述氣體處理管24中設置有催化劑(catalyst:觸媒)30、加熱器31、鼓風機32以及前處理劑33。鼓風機32用於使空氣在上述迴圈通道內迴圈,加熱器31用於加熱催化劑30及空氣。由加熱器31加熱後的空氣經過導入管22進入熱處理室11,在熱處理室11內加熱被熱處理物W。在進行加熱該被熱處理物W的熱處理時,會從被熱處理物W產生昇華物。進行熱處理後的空氣中含有上述昇華物,該含有昇華物的空氣經過上述氣體導出部13及上述導出管23流經催化劑30。Further, a catalyst (catalyst) 30, a heater 31, a blower 32, and a pretreatment agent 33 are provided in the gas treatment tube 24. The blower 32 is for circulating air in the above-mentioned loop passage, and the heater 31 is for heating the catalyst 30 and the air. The air heated by the heater 31 enters the heat treatment chamber 11 through the introduction pipe 22, and heats the material to be heatd W in the heat treatment chamber 11. When the heat treatment of the heat-treated material W is performed, a sublimate is generated from the object W to be heat-treated. The sublimate is contained in the air after the heat treatment, and the sublimate-containing air flows through the catalyst 30 through the gas deriving portion 13 and the outlet tube 23.

催化劑30用於促進進行熱處理後的空氣中含有的昇 華物的氧化分解反應,例如可以採用白金(Pt)、鈀(Pd)等貴金屬或這些貴金屬的合金等活性金屬。上述催化劑30在大約150~350℃的溫度空氣下可以得到催化性能。因此,本實施例中,在催化劑30的前側(在空氣流經迴圈通道的方向上比催化劑30靠近上游的位置)配置加熱器31。另外,在被稱為催化毒物(catalyst poison)的物質(例如含有Si、P、S等的有機化合物)混入昇華物中,有可能使催化劑30中毒(失效)的情況下,為防止催化劑30中毒,較為理想的是,在催化劑30的前側設置前處理劑33。The catalyst 30 is used to promote the liter contained in the air after the heat treatment For the oxidative decomposition reaction of the organic matter, for example, a noble metal such as platinum (Pt) or palladium (Pd) or an active metal such as an alloy of these noble metals may be used. The above catalyst 30 can obtain catalytic performance at a temperature of about 150 to 350 ° C. Therefore, in the present embodiment, the heater 31 is disposed on the front side of the catalyst 30 (a position upstream of the catalyst 30 in the direction in which the air flows through the loop passage). In addition, when a substance called a catalytic poison (for example, an organic compound containing Si, P, S, or the like) is mixed into a sublimate, there is a possibility that the catalyst 30 is poisoned (failed), and the catalyst 30 is prevented from being poisoned. Preferably, a pretreatment agent 33 is provided on the front side of the catalyst 30.

如上所述,在具有上述結構的第一實施例的熱處理裝置1A中,由於將鼓風機32及加熱器31配置在與熱處理部10分開設置的(熱處理部10外側的)氣體通道21A中,因此,可以在防止鼓風機32或加熱器31出現故障的狀態下清洗熱處理室11的內部。並且,由於利用包括連接用凸緣14、15、25、26及螺栓、螺母等的連接裝置,可拆卸地將氣體通道21A與熱處理部10的氣體導入部12及氣體導出部13相連接,因此,通過從熱處理部10取下具有設置在氣體通道21A內的鼓風機32及加熱器31的氣體處理部20A,就可以將氣體處理部20A和熱處理部10分開,由此,能夠在確實地防止鼓風機32或加熱器31出現故障的狀態下清洗熱處理室11的內部。As described above, in the heat treatment apparatus 1A of the first embodiment having the above-described configuration, since the air blower 32 and the heater 31 are disposed in the gas passage 21A (outside the heat treatment portion 10) provided separately from the heat treatment portion 10, The inside of the heat treatment chamber 11 can be cleaned in a state where the blower 32 or the heater 31 is prevented from malfunctioning. Further, since the gas passage 21A is detachably connected to the gas introduction portion 12 and the gas outlet portion 13 of the heat treatment portion 10 by the connection means including the connection flanges 14, 15, 25, 26, bolts, nuts, and the like, By removing the gas processing unit 20A having the air blower 32 and the heater 31 provided in the gas passage 21A from the heat treatment unit 10, the gas processing unit 20A and the heat treatment unit 10 can be separated, whereby the blower can be surely prevented The inside of the heat treatment chamber 11 is cleaned in a state where 32 or the heater 31 is malfunctioning.

此外,由於在上述迴圈通道中,從熱處理室11導出的氣體依次流經導出管23、氣體處理管24及導入管22 後,再次流回熱處理室11內,因此用一個鼓風機32就可以使氣體循環,並且用加熱器31就可以對催化劑30和氣體都進行加熱。並且,通過將熱處理部10和氣體處理部20A分開,就可以只交換熱處理部10或只交換氣體處理部20A。Further, since the gas derived from the heat treatment chamber 11 sequentially flows through the outlet pipe 23, the gas processing pipe 24, and the introduction pipe 22 in the above-described circulation passage. Thereafter, it flows back into the heat treatment chamber 11, so that the gas can be circulated by a blower 32, and both the catalyst 30 and the gas can be heated by the heater 31. Further, by separating the heat treatment portion 10 and the gas treatment portion 20A, it is possible to exchange only the heat treatment portion 10 or only the gas treatment portion 20A.

(第二實施例)(Second embodiment)

圖2是本發明第二實施例所有關的熱處理裝置的簡圖。在圖2中,對與圖1相同的構件標注了相同的附圖標記。Figure 2 is a schematic view of a heat treatment apparatus according to a second embodiment of the present invention. In FIG. 2, the same members as those in FIG. 1 are denoted by the same reference numerals.

該熱處理裝置1D包括與第一實施例的氣體處理部20A不同的氣體處理部20D。即,氣體處理部20D包括氣體通道21D,該氣體通道21D具有:開放端22a,設置在導入管22的進氣側端;以及開放端24a,設置在氣體處理管24的出氣側端。氣體處理部20D的氣體處理管24中設置有催化劑30和加熱器31,導入管22中設置有鼓風機34與加熱器35。並且,雖然在圖4中未示出前處理劑,但也可以設置前處理劑。This heat treatment apparatus 1D includes a gas treatment unit 20D that is different from the gas treatment unit 20A of the first embodiment. That is, the gas processing section 20D includes a gas passage 21D having an open end 22a provided at the intake side end of the introduction pipe 22, and an open end 24a provided at the outlet side end of the gas processing pipe 24. The gas processing tube 24 of the gas processing unit 20D is provided with a catalyst 30 and a heater 31, and the introduction tube 22 is provided with a blower 34 and a heater 35. Further, although the pretreatment agent is not shown in FIG. 4, a pretreatment agent may be provided.

在具有上述結構的熱處理裝置1D中的氣流如下所示。即,從開放端22a流入導入管22中的空氣經加熱器35被加熱後,流入熱處理室11內。該加熱後的空氣用於對工件W進行熱處理。對工件W進行了熱處理的空氣(進行熱處理後的空氣)含有昇華物,其流入導出管23中後,被導向氣體處理管24內。在氣體處理管24內,進行熱處理後的空氣經過催化劑30而使其中包含的昇華物發生氧 化分解反應,然後從開放端24a排出。此外,圖2中的16是擋板,用於阻止空氣在熱處理室11的內部發生逆流,並使空氣從氣體導入部12流向氣體導出部13,由於設置有該擋板16,在熱處理室11內,與氣體導入部12相反的一側形成通道16a。The gas flow in the heat treatment apparatus 1D having the above structure is as follows. That is, the air that has flowed into the introduction pipe 22 from the open end 22a is heated by the heater 35, and then flows into the heat treatment chamber 11. This heated air is used to heat treat the workpiece W. The air (heat-treated air) that has been heat-treated to the workpiece W contains a sublimate, which flows into the discharge pipe 23 and is guided into the gas processing pipe 24. In the gas processing tube 24, the heat-treated air passes through the catalyst 30 to cause oxygen to be contained in the sublimate contained therein. The decomposition reaction is then discharged from the open end 24a. Further, 16 in Fig. 2 is a baffle plate for preventing backflow of air inside the heat treatment chamber 11, and causing air to flow from the gas introduction portion 12 to the gas discharge portion 13, which is provided in the heat treatment chamber 11 due to the provision of the baffle plate 16. Inside, a side opposite to the gas introduction portion 12 forms a passage 16a.

如上所述,在熱處理裝置1D中也將鼓風機34及加熱器31、35配置在與熱處理部10分開設置的(熱處理部10外側的)氣體通道21D中,因此可以在防止鼓風機34或加熱器31、35出現故障的狀態下清洗熱處理室11的內部。而且,由於利用包括連接用凸緣14、15、25、26及螺栓、螺母等的連接裝置,可拆卸地將氣體通道21D與熱處理部10的氣體導入部12及氣體導出部13相連接,因此可以從熱處理部10分開具有設置在氣體通道21D中的鼓風機34及加熱器31、35的氣體處理部20D。由此,能夠在確實地防止鼓風機34或加熱器31、35出現故障的狀態下清洗熱處理室11的內部。As described above, the air blower 34 and the heaters 31 and 35 are also disposed in the gas passage 21D (outside the heat treatment portion 10) provided separately from the heat treatment portion 10 in the heat treatment apparatus 1D, so that the blower 34 or the heater 31 can be prevented. The inside of the heat treatment chamber 11 is cleaned in a state where the failure occurs at 35. Further, since the gas passage 21D is detachably connected to the gas introduction portion 12 and the gas discharge portion 13 of the heat treatment portion 10 by the connection means including the connection flanges 14, 15, 25, 26, bolts, nuts, and the like, The gas processing unit 20D having the air blower 34 and the heaters 31 and 35 provided in the gas passage 21D can be separated from the heat treatment unit 10. Thereby, it is possible to clean the inside of the heat treatment chamber 11 while surely preventing the blower 34 or the heaters 31, 35 from malfunctioning.

此外,通過將熱處理部10和氣體處理部20D分開,可以只交換熱處理部10或只交換氣體處理部20D。Further, by separating the heat treatment portion 10 and the gas treatment portion 20D, it is possible to exchange only the heat treatment portion 10 or only the gas treatment portion 20D.

並且,由於從導入管22的所開放的進氣側端22a吸入的空氣被加熱器35加熱後被導入到熱處理室11內,之後經過導出管23及氣體處理管24被導出,因此導入到熱處理室11內的空氣不含昇華物。因此,由於可以始終將新鮮空氣導入到熱處理室11內,實現催化劑30對昇華物的氧化分解反應性能難以降低。另外,在該氣體處理部20D 中,由於使空氣單向迴圈,並且在導入管22中設置鼓風機34,因此可以通過導入管22將氣體導入到熱處理室11內,通過導出管23從熱處理室11導出氣體。Further, the air taken in from the open intake side end 22a of the introduction pipe 22 is heated by the heater 35, introduced into the heat treatment chamber 11, and then discharged through the outlet pipe 23 and the gas treatment pipe 24, so that it is introduced into the heat treatment. The air in chamber 11 contains no sublimate. Therefore, since fresh air can always be introduced into the heat treatment chamber 11, it is difficult to reduce the oxidative decomposition reaction performance of the catalyst 30 on the sublimate. In addition, in the gas processing unit 20D In the middle, since the air is circulated in one direction and the blower 34 is provided in the introduction pipe 22, the gas can be introduced into the heat treatment chamber 11 through the introduction pipe 22, and the gas can be led out from the heat treatment chamber 11 through the discharge pipe 23.

此外,在上述第二實施例中,將鼓風機34設置于導入管22中,但並不僅限於此。例如,也可以將鼓風機34設置于導出管23和氣體處理管24中,或也可以將鼓風機34設置于導入管22、氣體處理管24及導出管23的至少其中之一中。Further, in the second embodiment described above, the air blower 34 is provided in the introduction pipe 22, but it is not limited thereto. For example, the blower 34 may be disposed in the outlet pipe 23 and the gas processing pipe 24, or the blower 34 may be disposed in at least one of the introduction pipe 22, the gas processing pipe 24, and the outlet pipe 23.

(第三實施例)(Third embodiment)

圖3是本發明第三實施例所有關的熱處理裝置的簡圖。在圖3中,對與圖2相同的構件標注了相同的附圖標記。Figure 3 is a schematic view of a heat treatment apparatus according to a third embodiment of the present invention. In FIG. 3, the same members as those in FIG. 2 are denoted by the same reference numerals.

該熱處理裝置1C包括與第二實施例的氣體處理部20D不同的氣體處理部20C。即,氣體處理部20C包括氣體通道21C,該氣體通道21C具有用於將導入管22與氣體處理管24連通的連接管28。連接管28的一端部連接于氣體處理管24的設置有催化劑30、加熱器31及鼓風機32的位置與出氣側端24a之間。連接管28的另一端部連接于導入管22的中途部分。在這種氣體處理部20C中,將加熱器35和鼓風機34設置于導入管22中比連接管28所連接的部位靠近下游的位置上。此外,雖然在圖3中未示出前處理劑,但也可設置前處理劑。另外,可省略上述鼓風機32。This heat treatment apparatus 1C includes a gas treatment unit 20C that is different from the gas treatment unit 20D of the second embodiment. That is, the gas processing section 20C includes a gas passage 21C having a connecting pipe 28 for communicating the introduction pipe 22 and the gas processing pipe 24. One end portion of the connecting pipe 28 is connected between the position where the catalyst 30, the heater 31, and the blower 32 are disposed in the gas processing pipe 24 and the outlet side end 24a. The other end of the connecting pipe 28 is connected to a midway portion of the introduction pipe 22. In the gas processing unit 20C, the heater 35 and the blower 34 are disposed at positions downstream of the portion where the connection pipe 28 is connected to the introduction pipe 22. Further, although the pretreatment agent is not shown in FIG. 3, a pretreatment agent may be provided. In addition, the above-described blower 32 can be omitted.

在具有上述結構的熱處理裝置1C中的氣流如下所 示。即,從開放端22a流入導入管22中的空氣經加熱器35被加熱後,流入熱處理室11。該加熱後的空氣用於對工件W進行熱處理。進行熱處理後的空氣中含有昇華物,該進行熱處理後的空氣流入導出管23中後,被導入到氣體處理管24內。在氣體處理管24內,進行熱處理後的空氣通過催化劑30而使其中包含的昇華物發生氧化分解反應,然後從開放端24a排出,或通過連接管28及導入管22流回熱處理室11。此外,圖3中的16是與第二實施例相同的擋板。The air flow in the heat treatment apparatus 1C having the above structure is as follows Show. That is, the air that has flowed into the introduction pipe 22 from the open end 22a is heated by the heater 35, and then flows into the heat treatment chamber 11. This heated air is used to heat treat the workpiece W. The sublimate is contained in the air after the heat treatment, and the air after the heat treatment flows into the discharge pipe 23, and then introduced into the gas processing pipe 24. In the gas treatment tube 24, the air subjected to the heat treatment passes through the catalyst 30 to cause an oxidative decomposition reaction of the sublimate contained therein, and then is discharged from the open end 24a, or flows back to the heat treatment chamber 11 through the connection pipe 28 and the introduction pipe 22. Further, 16 in Fig. 3 is the same baffle as the second embodiment.

如上所述,在第三實施例的熱處理裝置1C中也由於將鼓風機32、34及加熱器31、35配置在與熱處理部10分開設置的(熱處理部10外側的)氣體通道21C中,因此可以在防止鼓風機32、34或加熱器31、35出現故障的狀態下清洗熱處理室11的內部。而且,由於利用包括連接用凸緣14、15、25、26及螺栓、螺母等的連接裝置,可拆卸地將氣體通道21C與熱處理部10的氣體導入部12及氣體導出部13相連接,因此可以從熱處理部10分開具有設置在氣體通道21C中的鼓風機32、34及加熱器31、35的氣體處理部20C。由此,能夠在確實地防止鼓風機32、34或加熱器31、35出現故障的狀態下清洗熱處理室11的內部,並且可實現只交換熱處理部10或只交換氣體處理部20C。As described above, in the heat treatment apparatus 1C of the third embodiment, since the blowers 32 and 34 and the heaters 31 and 35 are disposed in the gas passage 21C (outside the heat treatment portion 10) provided separately from the heat treatment portion 10, The inside of the heat treatment chamber 11 is cleaned in a state where the blowers 32, 34 or the heaters 31, 35 are prevented from malfunctioning. Further, since the gas passage 21C is detachably connected to the gas introduction portion 12 and the gas discharge portion 13 of the heat treatment portion 10 by the connection means including the connection flanges 14, 15, 25, 26, bolts, nuts, and the like, The gas processing unit 20C having the air blowers 32 and 34 and the heaters 31 and 35 provided in the gas passage 21C can be separated from the heat treatment unit 10. Thereby, it is possible to clean the inside of the heat treatment chamber 11 while surely preventing the blowers 32, 34 or the heaters 31, 35 from malfunctioning, and it is possible to exchange only the heat treatment portion 10 or only the gas treatment portion 20C.

此外,在熱處理裝置1C中,由於導入管22的進氣側端22a處於開放狀態,因此可將新鮮空氣導入到導入管22 中。並且,由於從熱處理室11導出的空氣被催化劑30淨化,且被加熱器31加熱後通過連接管28流入導入管22中,因此可減少熱損失。而且,由於將設置于導入管22內的氣體加熱用加熱器35用於熱處理室11的溫度控制,並將設置于氣體處理管24內的加熱器31用於催化劑30的溫度控制,因此可以分別專門性地利用加熱器35、31。由此,在不受到被熱處理物W的加熱溫度(設定溫度)的情況下,將催化劑30的溫度設定為可得到催化性能的最佳溫度。Further, in the heat treatment apparatus 1C, since the intake side end 22a of the introduction pipe 22 is in an open state, fresh air can be introduced into the introduction pipe 22 in. Further, since the air derived from the heat treatment chamber 11 is purified by the catalyst 30, heated by the heater 31, and then flows into the introduction pipe 22 through the connection pipe 28, heat loss can be reduced. Further, since the gas heating heater 35 provided in the introduction pipe 22 is used for the temperature control of the heat treatment chamber 11, and the heater 31 provided in the gas processing pipe 24 is used for the temperature control of the catalyst 30, it is possible to separately The heaters 35, 31 are exclusively utilized. Thereby, the temperature of the catalyst 30 is set to an optimum temperature at which catalytic performance can be obtained without receiving the heating temperature (set temperature) of the material W to be heat-treated.

(第四實施例)(Fourth embodiment)

圖4是本發明第四實施例所有關的熱處理裝置的簡圖。在圖4中,對與圖3相同的構件標注了相同的附圖標記。Figure 4 is a schematic view of a heat treatment apparatus according to a fourth embodiment of the present invention. In FIG. 4, the same members as those in FIG. 3 are denoted by the same reference numerals.

該熱處理裝置1B包括具有第二連接管27的氣體通道21B。第二連接管27的一端部連接于導入管22的比連接管28所連接的部位靠近下游、且比設置有氣體加熱用加熱器35和鼓風機34的位置靠近上游的位置上,以使第二連接管27和導入管22連通。第二連接管27的另一端部連接于導出管23的中途部分,以使第二連接管27和導出管23連通。第二連接管27由隔熱壁圍繞。The heat treatment apparatus 1B includes a gas passage 21B having a second connecting pipe 27. One end portion of the second connecting pipe 27 is connected to a position downstream of the inlet pipe 22 than the portion where the connecting pipe 28 is connected, and is located closer to the upstream than the position where the gas heating heater 35 and the blower 34 are provided, so that the second portion The connecting pipe 27 and the inlet pipe 22 are in communication. The other end portion of the second connecting pipe 27 is connected to a midway portion of the outlet pipe 23 so that the second connecting pipe 27 and the outlet pipe 23 communicate with each other. The second connecting pipe 27 is surrounded by a heat insulating wall.

氣體處理部20B的結構如下。氣體處理管24中設置有催化劑30、加熱器31及鼓風機32。如上所述,在導入管22中,比第二連接管27所連接的位置靠近下游的位置上設置有鼓風機34和加熱器35。加熱器35用於對要導入 到熱處理室11內的空氣進行加熱。另外,在熱處理室11的內部設置有上述擋板16。此外,雖然在圖4中未示出前處理劑,但也可設置前處理劑。The structure of the gas processing unit 20B is as follows. The gas processing tube 24 is provided with a catalyst 30, a heater 31, and a blower 32. As described above, in the introduction pipe 22, the blower 34 and the heater 35 are provided at a position closer to the downstream than the position at which the second connection pipe 27 is connected. Heater 35 is used to be imported The air in the heat treatment chamber 11 is heated. Further, the baffle 16 is provided inside the heat treatment chamber 11. Further, although the pretreatment agent is not shown in FIG. 4, a pretreatment agent may be provided.

具有上述結構的熱處理裝置1B中的氣流如下所示。即,從開放端22a流入導入管22中的空氣經加熱器35被加熱後,流入熱處理室11,在熱處理室11中用於進行熱處理。該進行熱處理後的空氣含有昇華物。該進行熱處理後的空氣導入到導出管23中後,向第二連接管27和氣體處理管24分流。導入到第二連接管27的空氣經加熱器35再次被加熱後,經導入管22流回熱處理室11。即,空氣在熱處理室11和第二連接管27之間迴圈。另一方面,導入到氣體處理管24中的含有昇華物的進行熱處理後的空氣通過催化劑30接觸而使其中包含的昇華物發生氧化分解反應後從開放端24a排出,或通過連接管28及導入管22流回熱處理室11。The gas flow in the heat treatment apparatus 1B having the above structure is as follows. That is, the air that has flowed into the introduction pipe 22 from the open end 22a is heated by the heater 35, flows into the heat treatment chamber 11, and is used for heat treatment in the heat treatment chamber 11. The air after the heat treatment contains a sublimate. The air after the heat treatment is introduced into the outlet pipe 23, and then branched to the second connecting pipe 27 and the gas processing pipe 24. The air introduced into the second connecting pipe 27 is again heated by the heater 35, and then flows back to the heat treatment chamber 11 through the introduction pipe 22. That is, the air is circulated between the heat treatment chamber 11 and the second connection pipe 27. On the other hand, the heat-treated air containing the sublimate introduced into the gas processing tube 24 is contacted by the catalyst 30 to cause the sublimate contained therein to undergo oxidative decomposition reaction, and then discharged from the open end 24a, or through the connecting pipe 28 and introduced. The tube 22 flows back to the heat treatment chamber 11.

如上所述,在熱處理裝置1B中也由於將鼓風機32、34及加熱器31、35配置在與熱處理部10分開設置的(熱處理部10外側的)氣體通道21B中,因此可以在防止鼓風機32、34或加熱器31、35出現故障的狀態下清洗熱處理室11的內部。並且,由於利用包括連接用凸緣14、15、25、26及螺栓、螺母等的連接裝置,可拆卸地將氣體通道21B與熱處理部10的氣體導入部12及氣體導出部13相連接,因此可以從熱處理部10分開具有設置在氣體通道21B中的鼓風機32、34及加熱器31、35的氣體處理部20B。 由此,能夠在確實地防止鼓風機32、34或加熱器31、35出現故障的狀態下清洗熱處理室11的內部,並且能實現只交換熱處理部10或只交換氣體處理部20B。As described above, in the heat treatment apparatus 1B, since the air blowers 32 and 34 and the heaters 31 and 35 are disposed in the gas passage 21B (outside the heat treatment portion 10) provided separately from the heat treatment portion 10, the blower 32 can be prevented. 34 or the inside of the heat treatment chamber 11 is cleaned in a state where the heaters 31, 35 are malfunctioning. Further, since the gas passage 21B is detachably connected to the gas introduction portion 12 and the gas discharge portion 13 of the heat treatment portion 10 by the connection means including the connection flanges 14, 15, 25, 26, bolts, nuts, and the like, The gas processing unit 20B having the air blowers 32 and 34 and the heaters 31 and 35 provided in the gas passage 21B can be separated from the heat treatment unit 10. Thereby, it is possible to clean the inside of the heat treatment chamber 11 while surely preventing the blowers 32, 34 or the heaters 31, 35 from malfunctioning, and it is possible to exchange only the heat treatment portion 10 or only the gas treatment portion 20B.

此外,在上述氣體處理部20B中,導入管22的進氣側端22a處於開放狀態,並且,空氣通過連接管28迴圈,因此可獲得與第三實施例相同的效果。而且,由於設置第二連接管27來形成比連接管28所形成的迴圈通道更靠近熱處理室11的迴圈通道,並且,在包括第二連接管27的迴圈通道中設置有氣體加熱用加熱器35,因此可實現重新利用溫度下降較小的空氣。Further, in the gas processing unit 20B described above, the intake side end 22a of the introduction pipe 22 is in an open state, and the air is circulated through the connection pipe 28, so that the same effects as those of the third embodiment can be obtained. Moreover, since the second connecting pipe 27 is provided to form a loop passage closer to the heat treatment chamber 11 than the loop passage formed by the connecting pipe 28, and the gas passage for heating is provided in the loop passage including the second connecting pipe 27. The heater 35 is thus capable of reusing air having a small temperature drop.

在上述第一~第四實施例中,用於將熱處理部10的氣體導入部12及氣體導出部13與氣體通道(21A~21D)相連接的連接裝置包括連接用凸緣14、25、15、26及螺栓、螺母,但本發明並不僅限於此。例如,也可利用將螺絲和螺母相組合來構成的連接裝置,也可以利用其他連接裝置。In the first to fourth embodiments described above, the connecting means for connecting the gas introduction portion 12 and the gas outlet portion 13 of the heat treatment portion 10 to the gas passages (21A to 21D) includes the connection flanges 14, 25, and 15 26, bolts and nuts, but the invention is not limited thereto. For example, a connecting device composed of a combination of a screw and a nut may be used, and other connecting devices may be used.

而且,在上述第一~第四實施例中,利用連接裝置(連接用凸緣14、15、25、26及螺栓、螺母),可拆卸地將熱處理部10的氣體導入部12及氣體導出部13與氣體通道(21A~21D)相連接,但本發明並不限於此。例如,也可以通過焊接等來連接氣體導入部12和導入管22,並通過焊接等連接氣體導出部13和導出管23。在採用此連接方法的情況下,也將鼓風機32等及加熱器31等配置在與熱處理部10分開設置的(熱處理部10外側的)氣體通道 (21A~21D)中,因此,清洗液等難以飛到鼓風機32等及加熱器31等,可以在防止鼓風機及加熱器出現故障的狀態下清洗熱處理室11,能夠達成本發明的目的。Further, in the above-described first to fourth embodiments, the gas introduction portion 12 and the gas discharge portion of the heat treatment portion 10 are detachably separated by the connection means (the connection flanges 14, 15, 25, 26 and the bolts and the nuts). 13 is connected to the gas passages (21A to 21D), but the present invention is not limited thereto. For example, the gas introduction portion 12 and the introduction tube 22 may be connected by welding or the like, and the gas discharge portion 13 and the discharge tube 23 may be connected by welding or the like. In the case of using this connection method, the air blower 32 and the like, the heater 31, and the like are also disposed in the gas passage (outside the heat treatment portion 10) provided separately from the heat treatment portion 10. In (21A to 21D), it is difficult for the cleaning liquid or the like to fly to the blower 32 or the like, the heater 31, and the like, and the heat treatment chamber 11 can be cleaned while preventing the blower and the heater from malfunctioning, and the object of the present invention can be attained.

並且,在上述第一~第四實施例中,在一個熱處理部10上設置了一個氣體處理部(20A~20D),但發明並不限於此,也可以在一個熱處理部10上設置兩個以上的氣體處理部。例如,參照圖5對在一個熱處理部10上設置兩個氣體處理部的情況進行說明。Further, in the above-described first to fourth embodiments, one gas processing unit (20A to 20D) is provided in one heat treatment unit 10. However, the invention is not limited thereto, and two or more heat treatment units 10 may be provided. Gas treatment department. For example, a case where two gas processing units are provided in one heat treatment unit 10 will be described with reference to Fig. 5 .

在圖5所示的熱處理部10中,除一個氣體導入部12和氣體導出部13之外,還設置有一個氣體導入部12a和氣體導出部13a。氣體導入部12和氣體導出部13與氣體處理部20A的氣體通道21A相連接,以使這些連通,並且,氣體導入部12a和氣體導出部13a與具有相同結構的氣體處理部20A的氣體通道21A相連接,以使這些連通。在這種結構中,在只使用一個氣體導入部12和氣體導出部13的情況下,如圖6所示,取下所追加的氣體通道21A,相對於氣體導入部12a和氣體導出部13a裝上頂蓋18就可以。In the heat treatment unit 10 shown in FIG. 5, in addition to one gas introduction portion 12 and the gas discharge portion 13, one gas introduction portion 12a and a gas introduction portion 13a are provided. The gas introduction portion 12 and the gas introduction portion 13 are connected to the gas passage 21A of the gas treatment portion 20A to connect these, and the gas introduction portion 12a and the gas discharge portion 13a are connected to the gas passage 21A of the gas treatment portion 20A having the same configuration. Connected to make these connected. In this configuration, when only one gas introduction portion 12 and the gas introduction portion 13 are used, as shown in Fig. 6, the additional gas passage 21A is removed, and the gas introduction portion 12a and the gas discharge portion 13a are attached. The upper top cover 18 is ok.

並且,在上述實施例中,只在氣體處理管24內設置催化劑30,但本發明並不限於此。例如圖7所示,也可以在熱處理室11的內部設置其他催化劑17。此時,在熱處理室11的內部,既可以設置擋板16也可以不設置擋板16。在採用這種結構的情況下,通過兩個催化劑30、17能高效率的使昇華物發生氧化分解反應。Further, in the above embodiment, the catalyst 30 is provided only in the gas processing tube 24, but the present invention is not limited thereto. For example, as shown in FIG. 7, another catalyst 17 may be provided inside the heat treatment chamber 11. At this time, the baffle 16 may or may not be provided inside the heat treatment chamber 11. In the case of adopting such a structure, the oxidative decomposition reaction of the sublimate can be efficiently performed by the two catalysts 30, 17.

(實施例概要)(Summary of Embodiment)

上述實施例總結為如下:(1)在本實施例的熱處理裝置中,由於將鼓風機及加熱器配置在與熱處理部分開設置的(熱處理部外側的)氣體通道中,因此可以在防止鼓風機或加熱器出現故障的狀態下清洗熱處理部的熱處理室內。The above embodiment is summarized as follows: (1) In the heat treatment apparatus of the present embodiment, since the blower and the heater are disposed in the gas passage (the outside of the heat treatment portion) provided in the heat treatment portion, the blower or the heating can be prevented. The heat treatment chamber of the heat treatment portion is cleaned in a state where the device malfunctions.

(2)在上述熱處理裝置中優選的是,上述氣體通道具有:導入管,通過連接單元可拆卸地與上述氣體導入部連接;以及導出管,通過連接單元可拆卸地與上述氣體導出部連接。採用該結構,由於利用連接裝置,可以從熱處理部分開氣體處理部的導入管和導出管。在從熱處理部分開氣體處理部的情況下,可以在確實地防止鼓風機或加熱器出現故障的狀態下清洗熱處理部的熱處理室內。而且,通過從熱處理部分開氣體處理部,可以實現只交換熱處理部或只交換氣體處理部。(2) In the above heat treatment apparatus, it is preferable that the gas passage has an introduction pipe that is detachably connected to the gas introduction portion by a connection unit, and a discharge pipe that is detachably connected to the gas discharge portion by a connection unit. According to this configuration, since the connecting means is used, the introduction pipe and the outlet pipe of the gas processing portion can be opened from the heat treatment portion. In the case where the gas processing portion is opened from the heat treatment portion, the heat treatment chamber of the heat treatment portion can be cleaned in a state where the blower or the heater is surely prevented from malfunctioning. Further, by opening the gas processing portion from the heat treatment portion, it is possible to exchange only the heat treatment portion or only the gas treatment portion.

(3)在上述熱處理裝置中,上述氣體通道具有氣體處理管,通過該氣體處理管,上述導入管的進氣側端和上述導出管的出氣側端可以連接,在上述氣體處理管中可以設置有上述催化劑和上述加熱器。在該結構中,形成有從熱處理室導出的氣體依次流經導出管、氣體處理管及導入管後,再次流回熱處理室這樣一種迴圈通道。由此,利用一個鼓風機就可以使氣體循環,並且利用氣體處理管的加熱器就可以加熱催化劑和氣體。(3) In the above heat treatment apparatus, the gas passage has a gas processing pipe through which an intake side end of the introduction pipe and an outlet side end of the outlet pipe are connectable, and the gas treatment pipe can be disposed There are the above catalysts and the above heaters. In this configuration, a gas which is discharged from the heat treatment chamber sequentially flows through the outlet pipe, the gas treatment pipe, and the introduction pipe, and then flows back to the heat treatment chamber. Thus, the gas can be circulated by means of a blower, and the catalyst and gas can be heated by the heater of the gas treatment tube.

(4)在上述熱處理裝置中,上述氣體通道具有氣體 處理管,上述導入管的進氣側端可以處於開放狀態,並且在該導入管中可以設置有氣體加熱用加熱器,在上述導出管的出氣側端上可以連接上述氣體處理管,該氣體處理管中設置有上述催化劑和上述加熱器,在上述導出管、上述氣體處理管及上述導入管的至少其中之一中可以設置有上述鼓風機。(4) in the above heat treatment apparatus, the gas passage has a gas a treatment tube, the inlet side end of the introduction tube may be in an open state, and a gas heating heater may be disposed in the introduction tube, and the gas treatment tube may be connected to an outlet side end of the outlet tube, the gas treatment The tube and the heater are disposed in the tube, and the blower may be disposed in at least one of the outlet tube, the gas treatment tube, and the introduction tube.

採用該結構,由於從導入管的所開放的進氣側端吸收的氣體經氣體加熱用加熱器被加熱後導入到熱處理室內,並經過導出管及氣體處理管被導出,因此導入到熱處理室內的氣體中不含有昇華物。因此,可以始終將新鮮氣體導入到熱處理室內,實現催化劑對昇華物的氧化分解反應性能難以降低。而且,採用該結構,由於氣體單向迴圈,因此在導入管、導出管及氣體處理管的至少其中之一中設置鼓風機,就可以將氣體導入到熱處理室內,並從熱處理室導出氣體。According to this configuration, since the gas absorbed from the open intake side end of the introduction pipe is heated by the gas heating heater and introduced into the heat treatment chamber, and is led out through the outlet pipe and the gas treatment pipe, it is introduced into the heat treatment chamber. The gas does not contain sublimates. Therefore, the fresh gas can always be introduced into the heat treatment chamber, and it is difficult to reduce the oxidative decomposition reaction performance of the catalyst on the sublimate. Further, with this configuration, since the gas is unidirectionally looped, a blower is provided in at least one of the introduction pipe, the outlet pipe, and the gas treatment pipe, so that the gas can be introduced into the heat treatment chamber, and the gas can be led out from the heat treatment chamber.

(5)在上述熱處理裝置中,上述氣體通道具有氣體處理管和連接管,上述導出管的出氣側端與設置有上述催化劑和上述加熱器的氣體處理管相連接的情況下,可以在上述導出管的出氣側端上連接氣體處理管,該氣體處理管中設置有上述催化劑和上述加熱器,上述氣體處理管的比設置有上述催化劑和上述加熱器的位置靠近下游的部分與上述導入管,可以通過上述連接管相連接,上述導入管的進氣側端可以處於開放狀態,並且,在上述導入管中,比上述連接管所連接的位置靠近下游的部分,可以設置有 氣體加熱用加熱器和上述鼓風機。(5) In the above heat treatment apparatus, the gas passage has a gas treatment pipe and a connection pipe, and when the outlet side end of the outlet pipe is connected to a gas treatment pipe provided with the catalyst and the heater, the above-described discharge can be performed a gas processing tube is disposed at an outlet side end of the tube, and the gas processing tube is provided with the catalyst and the heater, and the gas processing tube is disposed closer to a downstream portion of the catalyst and the heater than the inlet tube. The inlet side of the inlet pipe may be open, and the inlet pipe may be provided with a portion closer to the downstream than the pipe connected to the pipe. A gas heating heater and the above air blower.

採用該結構,由於導入管的進氣側端處於開放狀態,因此可以導入新鮮的氣體。而且,由於從熱處理室導出的氣體經催化劑被淨化,並被加熱器加熱之後通過連接管導入到導入管。因此,由於可以將從導入管的所開放的進氣側端吸收的氣體升溫並導入到熱處理室內,因此能夠減少熱損失。而且,由於可以將設置在導入管的氣體加熱用加熱器用於熱處理室的溫度管理,將設置在氣體處理管的加熱器用於催化劑的溫度管理,因此可以專門性地利用這些加熱器。由此,在不受到被熱處理物的加熱溫度的狀態下,可以將催化劑的溫度設定為可得到催化性能的最佳溫度。According to this configuration, since the intake side end of the introduction pipe is in an open state, fresh gas can be introduced. Further, since the gas derived from the heat treatment chamber is purified by the catalyst and heated by the heater, it is introduced into the introduction pipe through the connection pipe. Therefore, since the gas absorbed from the open intake side end of the introduction pipe can be heated and introduced into the heat treatment chamber, heat loss can be reduced. Further, since the gas heating heater provided in the introduction pipe can be used for temperature management of the heat treatment chamber, the heater provided in the gas treatment pipe is used for temperature management of the catalyst, and therefore these heaters can be utilized exclusively. Thereby, the temperature of the catalyst can be set to an optimum temperature at which catalytic performance can be obtained without being subjected to the heating temperature of the object to be heat-treated.

(6)在上述熱處理裝置中,上述氣體通道具有第二連接管,上述導入管的比上述連接管所連接的位置靠近下游、且比上述氣體加熱用加熱器及上述鼓風機靠近上游的位置與上述導出管,可以通過上述第二連接管相連接。採用該結構,由於導入管的進氣側端處於開放狀態,並且氣體經由連接管進行迴圈,因此可以獲得與上述熱處理裝置相同的效果。而且,由於設置第二連接管來形成比連接管所形成的迴圈通道更靠近熱處理室的迴圈通道,並且在迴圈通道中設置有氣體加熱用加熱器,因此,可以重新利用溫度降低較小的氣體。(6) In the above-described heat treatment apparatus, the gas passage has a second connecting pipe, and the position of the inlet pipe closer to the downstream than the position at which the connecting pipe is connected is closer to the upstream than the gas heating heater and the blower The outlet tubes can be connected by the second connecting tube described above. According to this configuration, since the intake side end of the introduction pipe is in an open state, and the gas is looped through the connection pipe, the same effect as the above heat treatment device can be obtained. Moreover, since the second connecting pipe is provided to form a loop passage closer to the heat treatment chamber than the loop passage formed by the connecting pipe, and the gas heating heater is provided in the loop passage, the temperature reduction can be reused Small gas.

(7)在上述熱處理裝置中,在上述熱處理部的上述熱處理室內也可以設置有催化劑。採用該結構,可以根據 熱處理室的容量或昇華物的產生量,選定並選擇氣體處理部的能力。(7) In the above heat treatment apparatus, a catalyst may be provided in the heat treatment chamber of the heat treatment unit. With this structure, it can be The capacity of the heat treatment chamber or the amount of sublimation produced, and the ability of the gas treatment unit is selected and selected.

1A‧‧‧該熱處理裝置1A‧‧‧The heat treatment unit

10‧‧‧熱處理部10‧‧‧ Heat Treatment Department

11‧‧‧熱處理室11‧‧‧ Heat treatment room

11a‧‧‧隔熱壁11a‧‧‧Insulation wall

12‧‧‧氣體導入部12‧‧‧Gas introduction department

13‧‧‧氣體導出部13‧‧‧Gas Derivation Department

14、15、25、26‧‧‧連接用凸緣14, 15, 25, 26‧‧‧ Connection flanges

20‧‧‧氣體處理部20‧‧‧Gas Handling Department

20A‧‧‧氣體處理部20A‧‧‧Gas Handling Department

21A‧‧‧氣體通道21A‧‧‧ gas passage

22‧‧‧導入管22‧‧‧Introduction tube

23‧‧‧導出管23‧‧‧Extraction tube

24‧‧‧氣體處理管24‧‧‧ gas treatment tube

30‧‧‧催化劑30‧‧‧ Catalyst

31‧‧‧加熱器31‧‧‧heater

32‧‧‧鼓風機32‧‧‧Blowers

33‧‧‧前處理劑33‧‧‧Pretreatment agent

W‧‧‧被熱處理物W‧‧‧ Heat treated material

圖1是本發明的第一實施例的熱處理裝置的簡圖。Fig. 1 is a schematic view of a heat treatment apparatus according to a first embodiment of the present invention.

圖2是本發明的第二實施例的熱處理裝置的簡圖。Fig. 2 is a schematic view of a heat treatment apparatus of a second embodiment of the present invention.

圖3是本發明的第三實施例的熱處理裝置的簡圖。Figure 3 is a schematic view of a heat treatment apparatus of a third embodiment of the present invention.

圖4是本發明的第四實施例的熱處理裝置的簡圖。Fig. 4 is a schematic view of a heat treatment apparatus of a fourth embodiment of the present invention.

圖5是本發明的其他實施例的熱處理裝置的簡圖。Fig. 5 is a schematic view of a heat treatment apparatus according to another embodiment of the present invention.

圖6是本發明另外實施例的熱處理裝置的簡圖。Figure 6 is a schematic view of a heat treatment apparatus according to another embodiment of the present invention.

圖7是本發明另一種實施例的熱處理裝置的簡圖。Figure 7 is a schematic view of a heat treatment apparatus according to another embodiment of the present invention.

1A‧‧‧該熱處理裝置1A‧‧‧The heat treatment unit

10‧‧‧熱處理部10‧‧‧ Heat Treatment Department

11‧‧‧熱處理室11‧‧‧ Heat treatment room

11a‧‧‧隔熱壁11a‧‧‧Insulation wall

12‧‧‧氣體導入部12‧‧‧Gas introduction department

13‧‧‧氣體導出部13‧‧‧Gas Derivation Department

14、15、25、26‧‧‧連接用凸緣14, 15, 25, 26‧‧‧ Connection flanges

20‧‧‧氣體處理部20‧‧‧Gas Handling Department

20A‧‧‧氣體處理部20A‧‧‧Gas Handling Department

21A‧‧‧氣體通道21A‧‧‧ gas passage

22‧‧‧導入管22‧‧‧Introduction tube

23‧‧‧導出管23‧‧‧Extraction tube

24‧‧‧氣體處理管24‧‧‧ gas treatment tube

30‧‧‧催化劑30‧‧‧ Catalyst

31‧‧‧加熱器31‧‧‧heater

32‧‧‧鼓風機32‧‧‧Blowers

33‧‧‧前處理劑33‧‧‧Pretreatment agent

W‧‧‧被熱處理物W‧‧‧ Heat treated material

Claims (6)

一種熱處理裝置,其特徵在於包括:熱處理部,具有分別與熱處理室連通的氣體導入部及氣體導出部,上述熱處理室用於收容被熱處理物,該所收容的被熱處理物可從上述熱處理室取出,其中,上述熱處理部並未設置有鼓風機以及加熱器;以及氣體處理部,具有氣體通道,該氣體通道用於將熱處理用氣體導入到上述氣體導入部,並從上述氣體導出部導出進行熱處理後的氣體;上述氣體通道具有:導入管,通過第一連接裝置與上述氣體導入部連接;導出管,通過第二連接裝置與上述氣體導出部連接;氣體處理管,與上述導出管的出氣側端相連接;其中,在上述氣體通道的上述氣體處理管中設置有:催化劑,分解在對上述被熱處理物進行熱處理時從該被熱處理物產生的昇華物;加熱器,至少加熱上述催化劑;上述第一連接裝置係,使上述導入管可拆卸地與上述氣體導入部連接;上述第二連接裝置係,使上述導出管可拆卸地與上述氣體導出部連接;上述導入管中設置有氣體加熱用加熱器,在上述導出管、上述氣體處理管及上述導入管的至少其中之一中設置有一個或兩個以上的鼓風機,將上述熱處理用氣體及上述進行熱處理後的氣體向規定方向引導。 A heat treatment apparatus comprising: a heat treatment portion having a gas introduction portion and a gas discharge portion that communicate with a heat treatment chamber, wherein the heat treatment chamber is for accommodating a material to be heat-treated, and the heat-treated material to be contained can be taken out from the heat treatment chamber The heat treatment unit is not provided with a blower and a heater; and the gas treatment unit has a gas passage for introducing a heat treatment gas into the gas introduction unit, and deriving from the gas discharge unit to perform heat treatment. The gas passage has: an introduction pipe connected to the gas introduction portion by a first connection device; a discharge pipe connected to the gas discharge portion by a second connection device; and a gas treatment pipe and an outlet side end of the outlet pipe Connecting the gas processing tube of the gas passage; the catalyst is disposed to decompose the sublimate generated from the heat-treated material when the heat-treated material is heat-treated; and the heater heats at least the catalyst; a connecting device for detaching the introduction tube And connecting to the gas introduction unit; the second connection device is configured to detachably connect the outlet tube to the gas outlet unit; the introduction tube is provided with a gas heating heater, and the outlet tube and the gas treatment tube One or two or more blowers are provided in at least one of the introduction pipes, and the gas for heat treatment and the gas after the heat treatment are guided in a predetermined direction. 如申請專利範圍第1項所述的熱處理裝置,其中,上述導入管的進氣端連結上述氣體處理管。 The heat treatment apparatus according to claim 1, wherein the inlet end of the introduction tube is connected to the gas treatment tube. 如申請專利範圍第1項所述的熱處理裝置,其中,上述導入管的進氣側端處於開放狀態。 The heat treatment apparatus according to claim 1, wherein the intake side end of the introduction pipe is in an open state. 如申請專利範圍第1項所述的熱處理裝置,其中,上述氣體通道具有連接管;上述氣體處理管中比設置有上述催化劑和上述加熱器的部分更下游側的位置處,與上述導入管通過上述連接管相連接;上述導入管的進氣側端處於開放狀態,並且,在上述導入管中,比上述連接管所連接的位置更下游側處,設置有上述氣體加熱用加熱器和上述鼓風機。 The heat treatment apparatus according to claim 1, wherein the gas passage has a connection pipe; and the gas treatment pipe passes through the introduction pipe at a position further downstream than a portion where the catalyst and the heater are provided The connection pipe is connected to each other; the intake side end of the introduction pipe is in an open state, and the gas heating heater and the air blower are provided at a downstream side of the introduction pipe at a position closer to the connection pipe. . 如申請專利範圍第4項所述的熱處理裝置,其中,上述氣體通道具有第二連接管;上述導入管中在上述連接管所連接的位置與設置有上述氣體加熱用加熱器及上述鼓風機的位置兩者之間處,與上述導出管通過上述第二連接管相連接。 The heat treatment apparatus according to claim 4, wherein the gas passage has a second connecting pipe; a position at which the connecting pipe is connected to the inlet pipe and a position where the gas heating heater and the blower are provided Between the two, the outlet tube is connected to the second connecting tube. 如申請專利範圍第1至5項中任一項所述的熱處理裝置,其中,在上述熱處理部的上述熱處理室內也設置有催化劑。 The heat treatment apparatus according to any one of claims 1 to 5, wherein a catalyst is also provided in the heat treatment chamber of the heat treatment unit.
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