TWI429673B - A method for producing a hardening agent having an acidic substituent and an unsaturated maleimide group, and a thermosetting resin composition, a prepreg and a laminate - Google Patents
A method for producing a hardening agent having an acidic substituent and an unsaturated maleimide group, and a thermosetting resin composition, a prepreg and a laminate Download PDFInfo
- Publication number
- TWI429673B TWI429673B TW96120163A TW96120163A TWI429673B TW I429673 B TWI429673 B TW I429673B TW 96120163 A TW96120163 A TW 96120163A TW 96120163 A TW96120163 A TW 96120163A TW I429673 B TWI429673 B TW I429673B
- Authority
- TW
- Taiwan
- Prior art keywords
- group
- resin composition
- thermosetting resin
- compound
- hardener
- Prior art date
Links
- 229920001187 thermosetting polymer Polymers 0.000 title claims description 56
- 239000011342 resin composition Substances 0.000 title claims description 53
- 238000004519 manufacturing process Methods 0.000 title claims description 38
- 230000002378 acidificating effect Effects 0.000 title claims description 20
- 125000001424 substituent group Chemical group 0.000 title claims description 19
- 125000005439 maleimidyl group Chemical group C1(C=CC(N1*)=O)=O 0.000 title description 3
- -1 amine compound Chemical class 0.000 claims description 50
- 239000003960 organic solvent Substances 0.000 claims description 37
- 239000004848 polyfunctional curative Substances 0.000 claims description 34
- 239000003795 chemical substances by application Substances 0.000 claims description 30
- 239000003822 epoxy resin Substances 0.000 claims description 27
- 229920000647 polyepoxide Polymers 0.000 claims description 27
- 150000001875 compounds Chemical class 0.000 claims description 14
- 238000000034 method Methods 0.000 claims description 14
- 239000002253 acid Substances 0.000 claims description 10
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 10
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 claims description 9
- 125000001931 aliphatic group Chemical group 0.000 claims description 9
- 125000004432 carbon atom Chemical group C* 0.000 claims description 9
- 125000005843 halogen group Chemical group 0.000 claims description 9
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 9
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 claims description 8
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 claims description 8
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 8
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical group CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 7
- 238000010494 dissociation reaction Methods 0.000 claims description 7
- 230000005593 dissociations Effects 0.000 claims description 7
- 230000009477 glass transition Effects 0.000 claims description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 claims description 6
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 6
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 claims description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 6
- 125000002947 alkylene group Chemical group 0.000 claims description 6
- 239000007864 aqueous solution Substances 0.000 claims description 6
- 239000011256 inorganic filler Substances 0.000 claims description 6
- 229910003475 inorganic filler Inorganic materials 0.000 claims description 6
- 150000007513 acids Chemical class 0.000 claims description 5
- 239000000463 material Substances 0.000 claims description 5
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical compound O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 claims description 4
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 claims description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 claims description 4
- 125000003700 epoxy group Chemical group 0.000 claims description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 4
- 125000000879 imine group Chemical group 0.000 claims description 4
- 125000000542 sulfonic acid group Chemical group 0.000 claims description 4
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 claims description 3
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 claims description 3
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 claims description 3
- 125000000051 benzyloxy group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])O* 0.000 claims description 3
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 3
- 125000001033 ether group Chemical group 0.000 claims description 3
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 claims description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 3
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 claims description 3
- 239000008096 xylene Substances 0.000 claims description 3
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 claims description 2
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 claims description 2
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 claims description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 claims description 2
- 239000011248 coating agent Substances 0.000 claims description 2
- 238000000576 coating method Methods 0.000 claims description 2
- AUHZEENZYGFFBQ-UHFFFAOYSA-N mesitylene Substances CC1=CC(C)=CC(C)=C1 AUHZEENZYGFFBQ-UHFFFAOYSA-N 0.000 claims description 2
- 125000001827 mesitylenyl group Chemical group [H]C1=C(C(*)=C(C([H])=C1C([H])([H])[H])C([H])([H])[H])C([H])([H])[H] 0.000 claims description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 claims description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 claims description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 claims 2
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 38
- 239000000758 substrate Substances 0.000 description 21
- 229920005989 resin Polymers 0.000 description 20
- 239000011347 resin Substances 0.000 description 20
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 19
- 229910052802 copper Inorganic materials 0.000 description 19
- 239000010949 copper Substances 0.000 description 19
- 239000011889 copper foil Substances 0.000 description 19
- 229920003986 novolac Polymers 0.000 description 17
- 238000011156 evaluation Methods 0.000 description 16
- 238000006243 chemical reaction Methods 0.000 description 14
- CWLKGDAVCFYWJK-UHFFFAOYSA-N 3-aminophenol Chemical compound NC1=CC=CC(O)=C1 CWLKGDAVCFYWJK-UHFFFAOYSA-N 0.000 description 12
- PLIKAWJENQZMHA-UHFFFAOYSA-N 4-aminophenol Chemical compound NC1=CC=C(O)C=C1 PLIKAWJENQZMHA-UHFFFAOYSA-N 0.000 description 12
- 230000000052 comparative effect Effects 0.000 description 10
- 239000003063 flame retardant Substances 0.000 description 10
- 238000010438 heat treatment Methods 0.000 description 10
- 239000000243 solution Substances 0.000 description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 9
- 238000010992 reflux Methods 0.000 description 9
- 229910000679 solder Inorganic materials 0.000 description 9
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 8
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 8
- 229930003836 cresol Natural products 0.000 description 8
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 8
- 229920003192 poly(bis maleimide) Polymers 0.000 description 8
- XQUPVDVFXZDTLT-UHFFFAOYSA-N 1-[4-[[4-(2,5-dioxopyrrol-1-yl)phenyl]methyl]phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C(C=C1)=CC=C1CC1=CC=C(N2C(C=CC2=O)=O)C=C1 XQUPVDVFXZDTLT-UHFFFAOYSA-N 0.000 description 7
- 239000011521 glass Substances 0.000 description 7
- 239000002904 solvent Substances 0.000 description 7
- 238000003756 stirring Methods 0.000 description 7
- ALYNCZNDIQEVRV-UHFFFAOYSA-N 4-aminobenzoic acid Chemical compound NC1=CC=C(C(O)=O)C=C1 ALYNCZNDIQEVRV-UHFFFAOYSA-N 0.000 description 6
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 6
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 6
- 150000001412 amines Chemical class 0.000 description 6
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 6
- 238000005530 etching Methods 0.000 description 6
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 6
- 239000000843 powder Substances 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 229940018563 3-aminophenol Drugs 0.000 description 5
- GZVHEAJQGPRDLQ-UHFFFAOYSA-N 6-phenyl-1,3,5-triazine-2,4-diamine Chemical compound NC1=NC(N)=NC(C=2C=CC=CC=2)=N1 GZVHEAJQGPRDLQ-UHFFFAOYSA-N 0.000 description 5
- 239000004305 biphenyl Substances 0.000 description 5
- 235000010290 biphenyl Nutrition 0.000 description 5
- 239000011810 insulating material Substances 0.000 description 5
- 239000007787 solid Substances 0.000 description 5
- CDAWCLOXVUBKRW-UHFFFAOYSA-N 2-aminophenol Chemical compound NC1=CC=CC=C1O CDAWCLOXVUBKRW-UHFFFAOYSA-N 0.000 description 4
- FJKROLUGYXJWQN-UHFFFAOYSA-M 4-hydroxybenzoate Chemical compound OC1=CC=C(C([O-])=O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-M 0.000 description 4
- ZVNPWFOVUDMGRP-UHFFFAOYSA-N 4-methylaminophenol sulfate Chemical compound OS(O)(=O)=O.CNC1=CC=C(O)C=C1.CNC1=CC=C(O)C=C1 ZVNPWFOVUDMGRP-UHFFFAOYSA-N 0.000 description 4
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 4
- 239000004593 Epoxy Substances 0.000 description 4
- 229920000877 Melamine resin Polymers 0.000 description 4
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 4
- 239000005062 Polybutadiene Substances 0.000 description 4
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 4
- 229960004050 aminobenzoic acid Drugs 0.000 description 4
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Chemical compound O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 4
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 4
- 229910000420 cerium oxide Inorganic materials 0.000 description 4
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 4
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 4
- 239000011888 foil Substances 0.000 description 4
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 4
- 150000002466 imines Chemical class 0.000 description 4
- KQNPFQTWMSNSAP-UHFFFAOYSA-N isobutyric acid Chemical compound CC(C)C(O)=O KQNPFQTWMSNSAP-UHFFFAOYSA-N 0.000 description 4
- 239000010410 layer Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 4
- 229920002857 polybutadiene Polymers 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- XFDUHJPVQKIXHO-UHFFFAOYSA-N 3-aminobenzoic acid Chemical compound NC1=CC=CC(C(O)=O)=C1 XFDUHJPVQKIXHO-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- 239000004640 Melamine resin Substances 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 3
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 3
- 239000000835 fiber Substances 0.000 description 3
- 239000011229 interlayer Substances 0.000 description 3
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 3
- 239000000347 magnesium hydroxide Substances 0.000 description 3
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 3
- 150000002989 phenols Chemical class 0.000 description 3
- 229910052698 phosphorus Inorganic materials 0.000 description 3
- 239000011574 phosphorus Substances 0.000 description 3
- 239000004810 polytetrafluoroethylene Substances 0.000 description 3
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 3
- 239000001294 propane Substances 0.000 description 3
- 239000002966 varnish Substances 0.000 description 3
- RTBFRGCFXZNCOE-UHFFFAOYSA-N 1-methylsulfonylpiperidin-4-one Chemical compound CS(=O)(=O)N1CCC(=O)CC1 RTBFRGCFXZNCOE-UHFFFAOYSA-N 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- WLJVXDMOQOGPHL-PPJXEINESA-N 2-phenylacetic acid Chemical compound O[14C](=O)CC1=CC=CC=C1 WLJVXDMOQOGPHL-PPJXEINESA-N 0.000 description 2
- BBYDXOIZLAWGSL-UHFFFAOYSA-N 4-fluorobenzoic acid Chemical compound OC(=O)C1=CC=C(F)C=C1 BBYDXOIZLAWGSL-UHFFFAOYSA-N 0.000 description 2
- ZEYHEAKUIGZSGI-UHFFFAOYSA-N 4-methoxybenzoic acid Chemical compound COC1=CC=C(C(O)=O)C=C1 ZEYHEAKUIGZSGI-UHFFFAOYSA-N 0.000 description 2
- PDCMTKJRBAZZHL-UHFFFAOYSA-N 5-aminobenzene-1,3-diol Chemical compound NC1=CC(O)=CC(O)=C1 PDCMTKJRBAZZHL-UHFFFAOYSA-N 0.000 description 2
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 description 2
- 239000005711 Benzoic acid Substances 0.000 description 2
- RKJCCXAHKAMKIL-UHFFFAOYSA-N C1(C=CC(N1C1=CC=C(C=C1)NNC1=CC=C(C=C1)N1C(C=CC1=O)=O)=O)=O Chemical compound C1(C=CC(N1C1=CC=C(C=C1)NNC1=CC=C(C=C1)N1C(C=CC1=O)=O)=O)=O RKJCCXAHKAMKIL-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- AHLPHDHHMVZTML-UHFFFAOYSA-N Orn-delta-NH2 Natural products NCCCC(N)C(O)=O AHLPHDHHMVZTML-UHFFFAOYSA-N 0.000 description 2
- UTJLXEIPEHZYQJ-UHFFFAOYSA-N Ornithine Natural products OC(=O)C(C)CCCN UTJLXEIPEHZYQJ-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 239000001361 adipic acid Substances 0.000 description 2
- 235000011037 adipic acid Nutrition 0.000 description 2
- JFCQEDHGNNZCLN-UHFFFAOYSA-N anhydrous glutaric acid Natural products OC(=O)CCCC(O)=O JFCQEDHGNNZCLN-UHFFFAOYSA-N 0.000 description 2
- RJGDLRCDCYRQOQ-UHFFFAOYSA-N anthrone Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3CC2=C1 RJGDLRCDCYRQOQ-UHFFFAOYSA-N 0.000 description 2
- 150000004982 aromatic amines Chemical class 0.000 description 2
- 235000010233 benzoic acid Nutrition 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000007809 chemical reaction catalyst Substances 0.000 description 2
- 239000007822 coupling agent Substances 0.000 description 2
- NZNMSOFKMUBTKW-UHFFFAOYSA-N cyclohexanecarboxylic acid Chemical compound OC(=O)C1CCCCC1 NZNMSOFKMUBTKW-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 229920001971 elastomer Polymers 0.000 description 2
- 239000000806 elastomer Substances 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- BTCSSZJGUNDROE-UHFFFAOYSA-N gamma-aminobutyric acid Chemical compound NCCCC(O)=O BTCSSZJGUNDROE-UHFFFAOYSA-N 0.000 description 2
- UYTPUPDQBNUYGX-UHFFFAOYSA-N guanine Chemical compound O=C1NC(N)=NC2=C1N=CN2 UYTPUPDQBNUYGX-UHFFFAOYSA-N 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- MNWFXJYAOYHMED-UHFFFAOYSA-N heptanoic acid Chemical compound CCCCCCC(O)=O MNWFXJYAOYHMED-UHFFFAOYSA-N 0.000 description 2
- 150000002460 imidazoles Chemical class 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- 238000004898 kneading Methods 0.000 description 2
- 231100000053 low toxicity Toxicity 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- DNIAPMSPPWPWGF-UHFFFAOYSA-N monopropylene glycol Natural products CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 125000004433 nitrogen atom Chemical group N* 0.000 description 2
- 229960003104 ornithine Drugs 0.000 description 2
- 239000005011 phenolic resin Substances 0.000 description 2
- WLJVNTCWHIRURA-UHFFFAOYSA-N pimelic acid Chemical compound OC(=O)CCCCCC(O)=O WLJVNTCWHIRURA-UHFFFAOYSA-N 0.000 description 2
- 229920002239 polyacrylonitrile Polymers 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229920001955 polyphenylene ether Polymers 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 150000003141 primary amines Chemical group 0.000 description 2
- 235000019260 propionic acid Nutrition 0.000 description 2
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 2
- CXMXRPHRNRROMY-UHFFFAOYSA-N sebacic acid Chemical compound OC(=O)CCCCCCCCC(O)=O CXMXRPHRNRROMY-UHFFFAOYSA-N 0.000 description 2
- 238000005979 thermal decomposition reaction Methods 0.000 description 2
- 229920005992 thermoplastic resin Polymers 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- RHUYHJGZWVXEHW-UHFFFAOYSA-N 1,1-Dimethyhydrazine Chemical compound CN(C)N RHUYHJGZWVXEHW-UHFFFAOYSA-N 0.000 description 1
- VZXTWGWHSMCWGA-UHFFFAOYSA-N 1,3,5-triazine-2,4-diamine Chemical compound NC1=NC=NC(N)=N1 VZXTWGWHSMCWGA-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- IPJGAEWUPXWFPL-UHFFFAOYSA-N 1-[3-(2,5-dioxopyrrol-1-yl)phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1=CC=CC(N2C(C=CC2=O)=O)=C1 IPJGAEWUPXWFPL-UHFFFAOYSA-N 0.000 description 1
- SEULWJSKCVACTH-UHFFFAOYSA-N 1-phenylimidazole Chemical compound C1=NC=CN1C1=CC=CC=C1 SEULWJSKCVACTH-UHFFFAOYSA-N 0.000 description 1
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 1
- VOZKAJLKRJDJLL-UHFFFAOYSA-N 2,4-diaminotoluene Chemical compound CC1=CC=C(N)C=C1N VOZKAJLKRJDJLL-UHFFFAOYSA-N 0.000 description 1
- UHIDYCYNRPVZCK-UHFFFAOYSA-N 2-amino-4-[2-(3-amino-4-hydroxyphenyl)propan-2-yl]phenol Chemical compound C=1C=C(O)C(N)=CC=1C(C)(C)C1=CC=C(O)C(N)=C1 UHIDYCYNRPVZCK-UHFFFAOYSA-N 0.000 description 1
- ZGDMDBHLKNQPSD-UHFFFAOYSA-N 2-amino-5-(4-amino-3-hydroxyphenyl)phenol Chemical compound C1=C(O)C(N)=CC=C1C1=CC=C(N)C(O)=C1 ZGDMDBHLKNQPSD-UHFFFAOYSA-N 0.000 description 1
- ZMCHBSMFKQYNKA-UHFFFAOYSA-N 2-aminobenzenesulfonic acid Chemical compound NC1=CC=CC=C1S(O)(=O)=O ZMCHBSMFKQYNKA-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- UOBYKYZJUGYBDK-UHFFFAOYSA-N 2-naphthoic acid Chemical compound C1=CC=CC2=CC(C(=O)O)=CC=C21 UOBYKYZJUGYBDK-UHFFFAOYSA-N 0.000 description 1
- UENRXLSRMCSUSN-UHFFFAOYSA-N 3,5-diaminobenzoic acid Chemical compound NC1=CC(N)=CC(C(O)=O)=C1 UENRXLSRMCSUSN-UHFFFAOYSA-N 0.000 description 1
- WFNVGXBEWXBZPL-UHFFFAOYSA-N 3,5-diaminophenol Chemical compound NC1=CC(N)=CC(O)=C1 WFNVGXBEWXBZPL-UHFFFAOYSA-N 0.000 description 1
- MOSSLXZUUKTULI-UHFFFAOYSA-N 3-[3-(2,5-dioxopyrrol-3-yl)-4-methylphenyl]pyrrole-2,5-dione Chemical compound CC1=CC=C(C=2C(NC(=O)C=2)=O)C=C1C1=CC(=O)NC1=O MOSSLXZUUKTULI-UHFFFAOYSA-N 0.000 description 1
- DKKYOQYISDAQER-UHFFFAOYSA-N 3-[3-(3-aminophenoxy)phenoxy]aniline Chemical compound NC1=CC=CC(OC=2C=C(OC=3C=C(N)C=CC=3)C=CC=2)=C1 DKKYOQYISDAQER-UHFFFAOYSA-N 0.000 description 1
- ZAJAQTYSTDTMCU-UHFFFAOYSA-N 3-aminobenzenesulfonic acid Chemical compound NC1=CC=CC(S(O)(=O)=O)=C1 ZAJAQTYSTDTMCU-UHFFFAOYSA-N 0.000 description 1
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 1
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 1
- WUPRYUDHUFLKFL-UHFFFAOYSA-N 4-[3-(4-aminophenoxy)phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=CC(OC=2C=CC(N)=CC=2)=C1 WUPRYUDHUFLKFL-UHFFFAOYSA-N 0.000 description 1
- JCRRFJIVUPSNTA-UHFFFAOYSA-N 4-[4-(4-aminophenoxy)phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC(C=C1)=CC=C1OC1=CC=C(N)C=C1 JCRRFJIVUPSNTA-UHFFFAOYSA-N 0.000 description 1
- KMKWGXGSGPYISJ-UHFFFAOYSA-N 4-[4-[2-[4-(4-aminophenoxy)phenyl]propan-2-yl]phenoxy]aniline Chemical compound C=1C=C(OC=2C=CC(N)=CC=2)C=CC=1C(C)(C)C(C=C1)=CC=C1OC1=CC=C(N)C=C1 KMKWGXGSGPYISJ-UHFFFAOYSA-N 0.000 description 1
- WJMQNPAEXWNWMD-UHFFFAOYSA-N 4-[9-(4-aminophenyl)-10h-anthracen-9-yl]aniline Chemical compound C1=CC(N)=CC=C1C1(C=2C=CC(N)=CC=2)C2=CC=CC=C2CC2=CC=CC=C21 WJMQNPAEXWNWMD-UHFFFAOYSA-N 0.000 description 1
- HVBSAKJJOYLTQU-UHFFFAOYSA-N 4-aminobenzenesulfonic acid Chemical compound NC1=CC=C(S(O)(=O)=O)C=C1 HVBSAKJJOYLTQU-UHFFFAOYSA-N 0.000 description 1
- ATHPNYQIYLPFFO-UHFFFAOYSA-N 4-methyl-1,3,5-triazin-2-amine Chemical compound CC1=NC=NC(N)=N1 ATHPNYQIYLPFFO-UHFFFAOYSA-N 0.000 description 1
- JOOXCMJARBKPKM-UHFFFAOYSA-N 4-oxopentanoic acid Chemical compound CC(=O)CCC(O)=O JOOXCMJARBKPKM-UHFFFAOYSA-N 0.000 description 1
- AWQSAIIDOMEEOD-UHFFFAOYSA-N 5,5-Dimethyl-4-(3-oxobutyl)dihydro-2(3H)-furanone Chemical compound CC(=O)CCC1CC(=O)OC1(C)C AWQSAIIDOMEEOD-UHFFFAOYSA-N 0.000 description 1
- FVCSARBUZVPSQF-UHFFFAOYSA-N 5-(2,4-dioxooxolan-3-yl)-7-methyl-3a,4,5,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C(C(OC2=O)=O)C2C(C)=CC1C1C(=O)COC1=O FVCSARBUZVPSQF-UHFFFAOYSA-N 0.000 description 1
- ZYUVGYBAPZYKSA-UHFFFAOYSA-N 5-(3-hydroxybutan-2-yl)-4-methylbenzene-1,3-diol Chemical compound CC(O)C(C)C1=CC(O)=CC(O)=C1C ZYUVGYBAPZYKSA-UHFFFAOYSA-N 0.000 description 1
- KBZFDRWPMZESDI-UHFFFAOYSA-N 5-aminobenzene-1,3-dicarboxylic acid Chemical compound NC1=CC(C(O)=O)=CC(C(O)=O)=C1 KBZFDRWPMZESDI-UHFFFAOYSA-N 0.000 description 1
- ZXLYUNPVVODNRE-UHFFFAOYSA-N 6-ethenyl-1,3,5-triazine-2,4-diamine Chemical compound NC1=NC(N)=NC(C=C)=N1 ZXLYUNPVVODNRE-UHFFFAOYSA-N 0.000 description 1
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- ZGYPLCYBYYHNAV-UHFFFAOYSA-N C1(C=CC(N1C1=CC=C(C=C1)C=1C2=CC=CC=C2C(=C2C=CC=CC12)C1=CC=C(C=C1)N1C(C=CC1=O)=O)=O)=O Chemical compound C1(C=CC(N1C1=CC=C(C=C1)C=1C2=CC=CC=C2C(=C2C=CC=CC12)C1=CC=C(C=C1)N1C(C=CC1=O)=O)=O)=O ZGYPLCYBYYHNAV-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- 240000006927 Foeniculum vulgare Species 0.000 description 1
- 235000004204 Foeniculum vulgare Nutrition 0.000 description 1
- SCECHYBTQMOHQK-UHFFFAOYSA-N NC=1C=C(OC2=CC=C(C=C2)C=2C3=CC=CC=C3C(=C3C=CC=CC23)C2=CC=C(C=C2)OC2=CC(=CC=C2)N)C=CC1 Chemical compound NC=1C=C(OC2=CC=C(C=C2)C=2C3=CC=CC=C3C(=C3C=CC=CC23)C2=CC=C(C=C2)OC2=CC(=CC=C2)N)C=CC1 SCECHYBTQMOHQK-UHFFFAOYSA-N 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- YSMRWXYRXBRSND-UHFFFAOYSA-N TOTP Chemical compound CC1=CC=CC=C1OP(=O)(OC=1C(=CC=CC=1)C)OC1=CC=CC=C1C YSMRWXYRXBRSND-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- MWPLVEDNUUSJAV-LSMJWXKXSA-N anthracene Chemical compound [13CH]1=[13CH][13CH]=[13CH][13C]2=CC3=CC=CC=C3C=[13C]21 MWPLVEDNUUSJAV-LSMJWXKXSA-N 0.000 description 1
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Natural products C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 1
- 150000001454 anthracenes Chemical class 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 239000003849 aromatic solvent Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- HFACYLZERDEVSX-UHFFFAOYSA-N benzidine Chemical compound C1=CC(N)=CC=C1C1=CC=C(N)C=C1 HFACYLZERDEVSX-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Chemical class 0.000 description 1
- 150000008366 benzophenones Chemical class 0.000 description 1
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 1
- 239000012964 benzotriazole Substances 0.000 description 1
- 125000001797 benzyl group Chemical class [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- HBNOEOCKGRBWOS-UHFFFAOYSA-N bis(3,3-dichloropropyl) hydrogen phosphate Chemical compound ClC(Cl)CCOP(=O)(O)OCCC(Cl)Cl HBNOEOCKGRBWOS-UHFFFAOYSA-N 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- YCGLLKBCDJTRBY-UHFFFAOYSA-N but-1-ene-1,1-diamine Chemical compound CCC=C(N)N YCGLLKBCDJTRBY-UHFFFAOYSA-N 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 238000003490 calendering Methods 0.000 description 1
- 239000004202 carbamide Substances 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- VZFUCHSFHOYXIS-UHFFFAOYSA-N cycloheptane carboxylic acid Natural products OC(=O)C1CCCCCC1 VZFUCHSFHOYXIS-UHFFFAOYSA-N 0.000 description 1
- LBDKAALDDAKVBS-UHFFFAOYSA-N decane urea Chemical compound NC(N)=O.CCCCCCCCCC LBDKAALDDAKVBS-UHFFFAOYSA-N 0.000 description 1
- NHADDZMCASKINP-HTRCEHHLSA-N decarboxydihydrocitrinin Natural products C1=C(O)C(C)=C2[C@H](C)[C@@H](C)OCC2=C1O NHADDZMCASKINP-HTRCEHHLSA-N 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 150000004985 diamines Chemical class 0.000 description 1
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 239000012772 electrical insulation material Substances 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- FPIQZBQZKBKLEI-UHFFFAOYSA-N ethyl 1-[[2-chloroethyl(nitroso)carbamoyl]amino]cyclohexane-1-carboxylate Chemical compound ClCCN(N=O)C(=O)NC1(C(=O)OCC)CCCCC1 FPIQZBQZKBKLEI-UHFFFAOYSA-N 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000006081 fluorescent whitening agent Substances 0.000 description 1
- 229960003692 gamma aminobutyric acid Drugs 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 239000012784 inorganic fiber Substances 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 1
- XLSZMDLNRCVEIJ-UHFFFAOYSA-N methylimidazole Natural products CC1=CNC=N1 XLSZMDLNRCVEIJ-UHFFFAOYSA-N 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- ZETYUTMSJWMKNQ-UHFFFAOYSA-N n,n',n'-trimethylhexane-1,6-diamine Chemical compound CNCCCCCCN(C)C ZETYUTMSJWMKNQ-UHFFFAOYSA-N 0.000 description 1
- GKTNLYAAZKKMTQ-UHFFFAOYSA-N n-[bis(dimethylamino)phosphinimyl]-n-methylmethanamine Chemical compound CN(C)P(=N)(N(C)C)N(C)C GKTNLYAAZKKMTQ-UHFFFAOYSA-N 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- AFEQENGXSMURHA-UHFFFAOYSA-N oxiran-2-ylmethanamine Chemical compound NCC1CO1 AFEQENGXSMURHA-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 229960005489 paracetamol Drugs 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- 239000013034 phenoxy resin Substances 0.000 description 1
- 229920006287 phenoxy resin Polymers 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000003134 recirculating effect Effects 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 239000013557 residual solvent Substances 0.000 description 1
- 230000000979 retarding effect Effects 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 229950000244 sulfanilic acid Drugs 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 239000002341 toxic gas Substances 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- XZZNDPSIHUTMOC-UHFFFAOYSA-N triphenyl phosphate Chemical compound C=1C=CC=CC=1OP(OC=1C=CC=CC=1)(=O)OC1=CC=CC=C1 XZZNDPSIHUTMOC-UHFFFAOYSA-N 0.000 description 1
- 239000002759 woven fabric Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
- C08L79/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C08L79/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08L79/085—Unsaturated polyimide precursors
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/12—Layered products comprising a layer of synthetic resin next to a fibrous or filamentary layer
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/28—Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/42—Layered products comprising a layer of synthetic resin comprising condensation resins of aldehydes, e.g. with phenols, ureas or melamines
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D207/00—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D207/02—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D207/44—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having three double bonds between ring members or between ring members and non-ring members
- C07D207/444—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having three double bonds between ring members or between ring members and non-ring members having two doubly-bound oxygen atoms directly attached in positions 2 and 5
- C07D207/448—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having three double bonds between ring members or between ring members and non-ring members having two doubly-bound oxygen atoms directly attached in positions 2 and 5 with only hydrogen atoms or radicals containing only hydrogen and carbon atoms directly attached to other ring carbon atoms, e.g. maleimide
- C07D207/452—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having three double bonds between ring members or between ring members and non-ring members having two doubly-bound oxygen atoms directly attached in positions 2 and 5 with only hydrogen atoms or radicals containing only hydrogen and carbon atoms directly attached to other ring carbon atoms, e.g. maleimide with hydrocarbon radicals, substituted by hetero atoms, directly attached to the ring nitrogen atom
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/44—Amides
- C08G59/46—Amides together with other curing agents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/12—Unsaturated polyimide precursors
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/24—Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/24—Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs
- C08J5/241—Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs using inorganic fibres
- C08J5/244—Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs using inorganic fibres using glass fibres
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/24—Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs
- C08J5/249—Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs characterised by the additives used in the prepolymer mixture
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/40—Glass
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D163/00—Coating compositions based on epoxy resins; Coating compositions based on derivatives of epoxy resins
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/30—Properties of the layers or laminate having particular thermal properties
- B32B2307/306—Resistant to heat
- B32B2307/3065—Flame resistant or retardant, fire resistant or retardant
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2457/00—Electrical equipment
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2363/00—Characterised by the use of epoxy resins; Derivatives of epoxy resins
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/17—Amines; Quaternary ammonium compounds
- C08K5/18—Amines; Quaternary ammonium compounds with aromatically bound amino groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
- C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
- C08K5/3477—Six-membered rings
- C08K5/3492—Triazines
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31511—Of epoxy ether
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Inorganic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- Reinforced Plastic Materials (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
- Organic Insulating Materials (AREA)
- Pyrrole Compounds (AREA)
Description
本發明係關於一種具有酸性取代基與不飽和馬來醯亞胺基之硬化劑(以下亦稱硬化劑)的製造方法及熱硬化性樹脂組成物、預浸體及層合板,詳細係關於該硬化劑之製造方法及使用以該法得到之硬化劑之熱硬化性樹脂組成物、預浸體及層合板,該硬化劑對有機溶劑之溶解性受到改善,該熱硬化性樹脂組成物是利用於電子機器用印刷配線板,且在銅箔接著性、耐熱性、耐濕性、難燃性、貼銅耐熱性、介電特性(介電常數、介電損耗角正切)之全部方面皆均衡。
熱硬化性樹脂,因熱硬化性樹脂之特有交聯構造展現高耐熱性及尺寸安定性,廣用於電子零件等要求高度信賴性之領域,特別於貼銅層合板及層間絕緣材料中,近年來要求高密度化,為形成微細配線,要求高銅箔接著性、藉由鑽頭或穿孔機開孔等加工時之加工性。又,因近年來環保問題,要求搭配無鉛焊料之電子零件及無鹵之難燃性,因此需求比以往之者有更高之耐熱性及難燃性。進一步,為提升製品安全性及作業環境,期望有僅以低毒性成分所構成、不產生毒性氣體等之熱硬化性樹脂組成物。
熱硬化性樹脂之雙馬來醯亞胺化合物,係為低介電特性、難燃性、耐熱性優之樹脂,但公知之雙馬來醯亞胺化
合物,因不具有與環氧樹脂之硬化反應性,於環氧硬化系之熱硬化性樹脂直接使用時,耐熱性不足。
因此,揭示了使用將雙馬來醯亞胺化合物與胺基苯酚之加成物藉由加熱混練製造用作於環氧硬化系之熱硬化性樹脂組成物中之硬化劑的方法(專利文獻1、2)。然而,此專利文獻1、2之方法,雙馬來醯亞胺化合物與胺基苯酚之加成物回收率低,將含此之熱硬化性樹脂組成物用作貼銅層合板及層間絕緣材料時,耐熱性及加工性不足。
又,已知使用三聚氰胺樹脂及鳥糞胺化合物之熱硬化性樹脂組成物(專利文獻3、4、5、6、7)。
然而,熱硬化性樹脂之三聚氰胺樹脂及鳥糞胺化合物,雖然係接著性、難燃性、耐熱性優之樹脂,但對有機溶劑之溶解性不足,如不多量使用毒性高之N,N-二甲基甲醯胺等之含N原子之有機溶劑,則有製作熱硬化性樹脂組成物困難,保存安定性不足等問題。
另外,使用此等之熱硬化性樹脂組成物之貼銅層合板及層間絕緣材料,於製造電子零件等時,有污染鍍金液等各種藥劑之問題。
使用將此三聚氰胺樹脂及鳥糞胺化合物用甲醛等之醛類使其縮合之熱硬化性樹脂之熱硬化性樹脂組成物,雖然對有機溶劑溶解性有改善,但是因熱分解溫度低,會產生毒性分解氣體,惡化作業環境,對近年來所要求之無鉛焊料之耐熱性及貼銅耐熱性不足。又,於微細之加工處理.
配線形成中,銅箔接著性、可撓性、韌性不足,電路圖案發生斷線或剝離、經鑽頭或穿孔機開孔等之加工時,會產生裂縫等不期望之情況。
又,也揭示有羥甲基化鳥糞胺樹脂(專利文獻8),但此亦與上述具有相同之耐熱性、接著性、加工性等問題。
另外,也揭示有使用雙馬來醯亞胺化合物及胺基安息香酸之加成物之熱硬化性樹脂組成物(專利文獻9),但該樹脂組成物之硬化物之熱分解溫度低,對於近年來所要求之無鉛焊料之耐熱性及貼銅耐熱性不足。又,該樹脂組成物有對有機溶劑溶解性低、加工性等之問題。
專利文獻1:特公昭63-034899號公報
專利文獻2:特開平06-032969號公報
專利文獻3:特公昭62-046584號公報
專利文獻4:特開平10-067942號公報
專利文獻5:特開2001-011672號公報
專利文獻6:特開平02-258820號公報
專利文獻7:特開平03-145476號公報
專利文獻8:特公昭62-061051號公報
專利文獻9:特公平06-008342號公報
本發明之目的,係有鑑於現況,提供一種硬化劑之製
造方法以及熱硬化性樹脂組成物、預浸體及層合板,該硬化劑對有機溶劑之溶解性受到改善,該熱硬化性樹脂組成物是利用於電子機器用印刷配線板,且在銅箔接著性、耐熱性、耐濕性、難燃性、貼銅耐熱性、介電特性(介電常數、介電損耗角正切)之全部方面皆均衡。
本發明者們,為達成該目的而努力研究,結果發現,藉由使一分子中至少具有2個N-取代馬來醯亞胺基之馬來醯亞胺化合物與具特定式之具有酸性取代基之胺化合物在有機溶劑中進行反應,則所得到之含有機溶劑之硬化劑對於有機溶劑之溶解性佳,且藉由使用此硬化劑,則可依照前述目的而得到可利用於電子機器用印刷配線板之熱硬化性樹脂組成物、預浸體及層合板。本發明係根據相關知識而完成者。
另外,本發明提供以下之硬化劑的製造法以及熱硬化性樹脂組成物、預浸體及層合板。
1、一種具有酸性取代基與不飽和馬來醯亞胺基之硬化劑的製造方法,其特徵為使(a)一分子中至少具有2個N-取代馬來醯亞胺基之馬來醯亞胺化合物與(b)以下述一般式(I)所示之具有酸性取代基之胺化合物,在有機溶劑中進行反應,
(式中,R1各自獨立,表示作為酸性取代基之羥基、羧基或磺酸基,R2係為各自獨立,表示氫原子、碳數1~5之脂肪族烴基或鹵原子,x為1~5之整數、y為0~4之整數,且x與y之和為5)。
2、如第1項之具有酸性取代基與不飽和馬來醯亞胺基之硬化劑的製造方法,其中具有酸性取代基與不飽和馬來醯亞胺基之硬化劑係如下一般式(II)或一般式(III)所示者,
(式中,R1、R2、x及y表示者與一般式(I)中相同,R3係各自獨立,表示氫原子、碳數1~5之脂肪族烴基或鹵原子),
(式中,R1、R2、x及y表示者與一般式(I)中相同,R4及R5係各自獨立,表示氫原子、碳數1~5之脂肪族烴基或鹵原子,A係為烷撐基、亞烷基、醚基、磺醯基或下述式(IV)所示之基),
3、一種熱硬化性樹脂組成物,其特徵為,含有(A)以如第1或2項之方法所製造之具有酸性取代基與不飽和馬來醯亞胺基之硬化劑及(B)與該硬化劑共同硬化之化合物,且該硬化物之玻璃轉移溫度係200℃以上。
4、一種如第3項之熱硬化性樹脂組成物,其中,(B)與該硬化劑共同硬化之化合物係為1分子中至少具有2個1級胺基之胺化合物。
5、一種如第3項之熱硬化性樹脂組成物,其中,(B)與硬化劑共同硬化之化合物係如下一般式(V)所示之6-取代鳥糞胺化合物,該樹脂組成物更含有(C)於25℃且無限稀釋之水溶液中之酸解離常數(pKa)為4.05以上之含羧基之酸性化合物,
(式中,R6表示苯基、甲基、烯丙基、丁基、甲氧基或芐氧基)。
6、如第3~5項中任一項之熱硬化性樹脂組成物,其中,更含有(D)1分子中至少具有2個環氧基之環氧樹脂。
7、如第3~6項中任一項之熱硬化性樹脂組成物,其中,更含有(E)無機填充劑。
8、一種預浸體,其特徵為將如第3~7項中任一項之熱硬化性樹脂組成物,於基材中含浸或塗佈後,B階段化所得。
9、一種層合板,其特徵係將如第8項之預浸體層合成形而得。
依本發明之方法製造之硬化劑,對有機溶劑之溶解性佳,可提供一種熱硬化性樹脂組成物,其金屬箔接著性、耐熱性、耐濕性、難燃性、貼銅耐熱性、低介電特性、低介電損耗角正切之全部方面皆優異。
因此,藉由本發明,可提供一種使用該硬化性樹脂組
成物而具優異性能之預浸體及層合板等。
以下,詳細說明關於本發明。又,以本發明之方法製造之硬化劑係包含有機溶劑者。另,(B)成分之熱硬化性樹脂可為單聚物或寡聚物。
首先,本發明之硬化劑之製造方法中,係使(a)一分子中至少具有2個N-取代馬來醯亞胺基之馬來醯亞胺化合物與(b)以下述一般式(I)所示之具有酸性取代基之胺化合物,在有機溶劑中進行反應。
(a)成分之一分子中至少具有2個N-取代馬來醯亞胺基之馬來醯亞胺化合物方面,可舉出有雙(4-馬來醯亞胺苯基)甲烷、雙(4-馬來醯亞胺苯基)醚、雙(4-馬來醯亞胺苯基)碸、3,3-二甲基-5,5-二乙基-4,4-二苯基甲烷雙馬來醯亞胺、4-甲基-1,3-伸苯基雙馬來醯亞胺、間伸苯基雙馬來醯亞胺、2,2-雙(4-(4-馬來醯亞胺苯氧基)苯基)丙烷等,此等中,以反應率高、更高耐熱性化之雙(4-馬來醯亞胺苯基)甲烷、間伸苯基雙馬來醯亞胺及雙(4-馬來醯亞胺苯基)碸為佳,以便宜觀點來看,則以間伸苯基雙馬來醯亞胺及雙(4-馬來醯亞胺苯基)甲烷更佳,由對溶劑之溶解性來看,特別以雙(4-馬來醯亞胺苯基)甲烷更佳。
(b)成分為以下述一般式(I)所示之胺化合物,係具有由羥基、羧基、磺酸基所選出之酸性取代基者。
(式中,R1各自獨立,表示作為酸性取代基之羥基、羧基或磺酸基,R2係為各自獨立,表示氫原子、碳數1~5之脂肪族烴基或鹵原子,x為1~5之整數、y為0~4之整數,且x與y之和為5)
此般(b)以一般式(I)所示之胺化合物方面,可舉出例如間胺基酚、對胺基酚、鄰胺基酚、對胺基安息香酸、間胺基安息香酸、鄰胺基安息香酸、鄰胺基苯磺酸、間胺基苯磺酸、對胺基苯磺酸、3,5-二羥基苯胺、3,5-二羧基苯胺等,此等中,由溶解性及合成回收率來看以間胺基酚、對胺基酚、對胺基安息香酸、間胺基安息香酸、3,5-二羥基苯胺為佳,由耐熱性來看,以間胺基酚及對胺基酚更佳,由低毒性來看,則特別以間胺基酚為佳。
此反應所使用之有機溶劑並未特別限制,可舉出例如乙醇、丙醇、丁醇、甲基溶纖劑、丁基溶纖劑、丙二醇單甲基醚等醇系溶劑,丙酮、甲基乙基酮、甲基異丁酮、環己酮等酮系溶劑,四氫呋喃等之醚系溶劑,甲苯、二甲苯、均三甲苯等之芳香族系溶劑,二甲基甲醯胺、二甲基乙醯胺、N-甲基吡咯烷酮等含氮原子溶劑,二甲基亞碸等之含硫原子溶劑等,可以1種或2種以上混合使用。
此等中,由溶解性來看,以環己酮、丙二醇單甲基醚
及甲基溶纖劑為佳,以低毒性來看,以環己酮、丙二醇單甲基醚更佳,而特別以揮發性高、於製造預浸體時不易成為殘留溶劑之丙二醇單甲基醚最佳。
於此,(a)成分之馬來醯亞胺化合物與(b)成分之胺化合物之使用量,對於(b)成分-NH2基當量(Tb)而言,(a)之馬來醯亞胺化合物之馬來醯亞胺基之當量(Ta)之當量比(Ta/Tb)以1.0~10.0之範圍為佳,該當量比(Ta/Tb)以2.0~10.0之範圍更佳。該當量比(Ta/Tb)在1.0以上可得到熱硬化性樹脂組成物之耐熱性,10.0以下則對硬化劑之有機溶劑的溶解性不會不足,可得到熱硬化性樹脂組成物之耐熱性。
又,有機溶劑之使用量,對於(a)成分與(b)成分之總和100質量份,以10~1000質量份為佳,100~500質量份更佳,200~500質量份又更佳。有機溶劑之搭配量比10質量份少時可能對硬化劑之有機溶劑之溶解性不足,而超過1000質量份時,合成上可能需要長時間。
(a)成分與(b)成分之反應溫度,以50~200℃為佳,以100~160℃更佳。反應時間,以0.1~10小時為佳,1~8小時更佳。如(a)成分與(b)成分在有機溶劑中,依必要邊加熱、保溫邊攪拌,經反應後製造具有酸性取代基與不飽和馬來醯亞胺基之硬化劑。
又,此反應可依必要使用反應觸媒。反應觸媒之例子如三乙基胺、吡啶、三丁基胺等之胺類,甲基咪唑、苯基咪唑等之咪唑類,三苯基膦等之磷系觸媒等,可混合此等
1種或2種以上使用。
經(a)成分與(b)成分反應之反應生成物,可例示如下述一般式(II)或一般式(III)表示者。
(式中,R1、R2、x及y表示者與一般式(I)中相同,R3係各自獨立,表示氫原子、碳數1~5之脂肪族烴基或鹵原子)
(式中,R1、R2、x及y表示者與一般式(I)中相同,R4及R5係各自獨立,表示氫原子、碳數1~5之脂肪族烴基或鹵原子,A係為烷撐基、亞烷基、醚基、磺醯基或下述式(IV)所示之基)
本發明之熱硬化性樹脂組成物,含有(A)以上述之方法所製造之硬化劑及(B)與該硬化劑共同硬化之化合物,該硬化物之玻璃轉移溫度係200℃以上。
本發明之熱硬化性樹脂組成物,因玻璃轉移溫度係200℃以上,可得到良好之焊接耐熱性,於製造電子零件時之加工性良好。
(B)成分之化合物,以1分子中至少有2個1級胺基之胺化合物為佳。
此1分子中至少有2個1級胺基之胺化合物,如間伸苯基二胺、對伸苯基二胺、3,5-二胺基酚、3,5-二胺基苯甲酸、4,4’-二胺基二苯基甲烷、4,4’-二胺基二苯基醚、4,4’-二胺基二苯基碸、3,3’-二胺基二苯基碸、4,4’-二胺基二苯基酮、聯苯胺、3,3’-二羥基聯苯胺、2,2-雙(3-胺基-4-羥基苯基)丙烷、3,3-二甲基-5,5-二乙基-4,4-二苯基甲烷二胺、4-甲基-1,3-伸苯基二胺、2,2-雙(4-胺基苯基)丙烷、2,2-雙(4-(4-胺基苯氧基)苯基)丙烷、1,3-雙(3-胺基苯氧基)苯、1,3-雙(4-胺基苯氧基)苯、1,4-雙(4-胺基苯氧基)苯、4,4’-雙(4-胺基苯氧基)雙酚、雙(4-(4-胺基苯氧基)苯基)碸、雙(4-(3-胺基苯氧基)苯基)碸、9,9-雙(4-胺基苯基)芴等
之芳香族胺類、乙烯二胺、n-丁烯二胺、n-六甲撐二胺、三甲基六甲撐二胺等之脂肪族胺類,三聚氰胺、苯并鳥糞胺、乙醯鳥糞胺、2,4-二胺基-6-乙烯-s-三吖嗪等之鳥糞胺化合物類。
(B)成分之化合物方面,此等中以反應之反應率高、可高耐熱性化之芳香族胺類及鳥糞胺化合物類為佳,由低介電特性、預浸體之保管時之熱安定來看,以下述一般式(V)所示之6-取代鳥糞胺化合物(亦稱『鳥糞胺化合物』)更佳。
(式中,R6表示苯基、甲基、烯丙基、丁基、甲氧基或芐氧基)
此之6-取代鳥糞胺化合物方面,有苯并鳥糞胺(2,4-二胺基-6-苯基-s-三吖嗪)、乙醯基鳥糞胺(2,4-二胺基-6-甲基-s-三吖嗪)、2,4-二胺基-6-乙烯基-s-三吖嗪等,因價廉以苯并鳥糞胺更佳。
本發明之熱硬化性樹脂組成物,以含有(A)成分之硬化劑及(B)成分之如上一般式(V)所示之6-取代鳥糞胺化合物,以及同時更含有(C)成分之於25℃且無限稀釋之水溶液中之酸解離常數(pKa)為4.05以上之含羧
基之酸性化合物為佳。
(C)成分之25℃且無限稀釋之水溶液中之酸解離常數(pKa)為4.05以上之含羧基之酸性化合物方面,如丙烯酸、己二酸、壬二酸、(鄰、間、對)茴香酸、4-胺基酪酸、異酪酸、異吉草酸、吉草酸、戊二酸、醋酸、環己烷羧酸、2-萘甲酸、(鄰、間、對)羥基安息香酸、庚二酸、苯基醋酸、對氟安息香酸、丙酸、己酸、庚酸、酪酸、乙醯丙酸等。
此等中,以對於鳥糞胺化合物之溶解性高且可高耐熱性化之丙烯酸、己二酸、(鄰、間、對)茴香酸、異酪酸、戊二酸、醋酸、環己烷羧酸、(鄰、間、對)羥基安息香酸、苯基醋酸、對氟安息香酸、丙酸、己酸、庚酸及酪酸為佳,由難燃性優異來看則以(鄰、間、對)羥基安息香酸更佳,由價廉、銅箔接著性優異來看則以對羥基安息香酸特別佳。
又,本發明中,25℃且無限稀釋之水溶液中之酸解離常數(pKa)係引用自化學便覽(改訂4版,基礎篇II,p317,丸善(股)平成5年發行)之數值。
本發明之熱硬化性樹脂組成物中,除(A)成分、(B)成分及(C)成分外,更以含(D)1分子中至少具有2個環氧基之環氧樹脂為佳。
(D)1分子中至少具有2個環氧基之環氧樹脂,只要是環氧樹脂,並未特別設限,如,雙酚A系、雙酚F系、聯苯系、酚醛清漆系、多官能酚系、萘系、脂環式
系、醇系等之縮水甘油醚、縮水甘油胺系及縮水甘油酯系等,可混合使用此等1種或2種以上。
(D)成分方面,於此等中,由介電特性、耐熱性、耐濕性及銅箔接著性來看,以雙酚F型環氧樹脂、二環戊二烯型環氧樹脂、雙酚A酚醛清漆型環氧樹脂、聯苯型環氧樹脂、聯苯芳烷基型環氧樹脂、苯酚酚醛清漆型環氧樹脂、及甲酚酚醛清漆型環氧樹脂等為佳,以難燃性及成形加工性來看,則以雙酚F型環氧樹脂、聯苯芳烷基型環氧樹脂、聯苯型環氧樹脂、苯酚酚醛清漆型環氧樹脂、及甲酚酚醛清漆型環氧樹脂更佳,以價廉來看,則以苯酚酚醛清漆型環氧樹脂及甲酚酚醛清漆型環氧樹脂特佳。
於本發明之熱硬化性樹脂組成物使用(D)成分時,可併用環氧樹脂之硬化劑及硬化促進劑,如馬來酸酐、馬來酸酐共聚物等之酸酐,二氰基二醯胺等之胺化合物,苯酚酚醛清漆、甲酚酚醛清漆等之酚化合物等。此等中,以耐熱良好之苯酚酚醛清漆、甲酚酚醛清漆等之酚化合物為佳,以提升難燃性及接著性之甲酚酚醛清漆型酚樹脂更佳。
環氧樹脂硬化促進劑之例子有咪唑類及其衍生物、第三級胺類、第四級銨鹽等。
含該(A)~(D)成分之熱硬化性樹脂組成物之組成,(A)成分之固形份、(B)成分、(C)成分及(D)成分之合計量100質量份中,比例如下。
(A)成分之固形份以1~97質量份為佳,以10~88
質量份更佳,以20~78質量份又更佳。(A)成分在1質量份以上則難燃性及接著性、可撓性不會不足,另外97質量份以下則耐熱性不會降低。
(B)成分以1~50質量份為佳,以1~30質量份更佳,以1~20質量份又更佳。(B)成分在1質量份以上則難燃性及接著性、介電特性不會不足,另外50質量份以下則不會降低耐熱性。
(C)成分以1~50質量份為佳,以1~30質量份更佳,以1~20質量份又更佳。(C)成分在1質量份以上則溶解性不會不足,另外50質量份以下則不會降低耐熱性。
(D)成分以1~97質量份為佳,以10~88質量份更佳,以20~78質量份又更佳。(D)成分在1質量份以上則難燃性及接著性、可撓性不會不足,另外97質量份以下則不會降低耐熱性。
又,(D)成分之質量份中除環氧樹脂以外,尚包含依需要而添加的環氧樹脂之硬化劑及硬化促進劑的質量份。
本發明之熱硬化性樹脂組成物中,以改善強度、耐久性等性質及低價化為目的,可任意地含有無機填充劑作為(E)成分。無機填充劑如二氧化矽、雲母、滑石、玻璃短纖維或微粉末及中空玻璃、三氧化銻、碳酸鈣、石英粉末、氫氧化鋁、氫氧化鎂等。此等中以介電特性、耐熱性、耐燃性來看以二氧化矽、氫氧化鋁及氫氧化鎂為佳,
以價廉來看以二氧化矽、氫氧化鋁更佳。
(E)成分之無機填充劑用量,相對於(A)成分之固形份、(B)成分、(C)成分及(D)成分之合計量100質量份而言,(E)成分以0~300質量份為佳,以20~200質量份更佳,以20~150質量份又更佳。(E)成分之搭配量超過300質量份時成形性及接著性變差。
另,本發明之熱硬化性樹脂組成物中,在不損及本發明之目的範圍內,可任意地含有公知之熱可塑性樹脂、彈性體、難燃劑、填充劑等。
熱可塑性樹脂的例子方面,有聚四氟乙烯、聚乙烯、聚丙烯、聚苯乙烯、聚苯撐醚樹脂、苯氧基樹脂、聚碳酸酯樹脂、聚酯樹脂、聚醯胺樹脂、聚亞胺樹脂、二甲苯樹脂、石油樹脂、矽酮樹脂等。
彈性體之例子,有聚丁二烯、聚丙烯腈、環氧改性聚丁二烯、馬來酸酐改性聚丁二烯、酚改性聚丁二烯、羧基改性聚丙烯腈等。
難燃劑的例子有含溴及氯之含鹵系難燃劑、磷酸三苯酯、磷酸三甲苯酯、磷酸參(二氯丙基)酯、磷腈、紅磷等之磷系難燃劑、三氧化銻、氫氧化鋁、氫氧化鎂等之無機物的難燃劑等。此等難燃劑中,因本發明之熱硬化性樹脂組成物有難燃效果高之優點,由環境觀點以非鹵系難燃劑之磷系難燃劑、無機物之難燃劑等為佳,由價廉而又兼顧到難燃性、耐熱性等其他特性之點來看以磷系難燃劑與氫氧化鋁等之無機物之難燃劑併用為佳。
填充劑方面的例子,有矽酮粉末、聚四氟乙烯、聚乙烯、聚丙烯、聚苯乙烯、聚苯撐醚等之有機物粉末等。
本發明中,對該熱硬化性樹脂組成物可任意地含有各種之添加劑。此等添加劑並未設限,如苯並三唑系等紫外線吸收劑、受阻酚系及苯乙烯化酚等之抗氧化劑,苯並苯酮類、芐基縮酮類、噻噸酮系等之光聚合起始劑,茋衍生物等之螢光增白劑,尿素矽烷等之尿素化合物,矽烷偶合劑等之密著性提升劑等。
本發明之預浸體,係將該熱硬化性樹脂組成物於基材中含浸或塗佈後,B階段化而成者。也就是,可將本發明之熱硬化性樹脂組成物含浸或塗佈於基材中後,經加熱等方式而半硬化(B階段化),以製造本發明之預浸體。以下詳述關於本發明之預浸體。
本發明之預浸體所用之基材中,可用各種為電氣絕緣材料用層合板所用之公知者。其材質方面,如,E玻璃、D玻璃、S玻璃及Q玻璃等之無機物纖維,聚亞胺、聚酯及聚四氟乙烯等之有機物之纖維,以及彼等之混合物等。此等之基材,如,雖具有織布、不織布、粗紗、短切氈及表面氈等之形狀,材質及形狀可依目的成形物之用途及性能而選擇,依必要,可單獨或組合2種以上之材質及形狀。
基材厚度無特別設限,如可用0.03~0.5mm之者,以矽烷偶合劑做表面處理者或機械性實施開纖處理者,由耐熱、耐濕、加工性之面來看係為合適使用的。對於該基
材,樹脂組成物之附著量,乾燥後之預浸體之樹脂含有率,使成20~90質量%,於基材中含浸或塗佈後,通常經100~200℃之溫度、1~30分鐘加熱乾燥,使半硬化(B階段化),可得到本發明之預浸體。
本發明之層合板,係使用本發明之預浸體層合成形後得到者。也就是,可藉由將本發明之預浸體,例如以下述構成:經1~20片疊合,並在其單面或雙面配置銅及鋁等金屬箔之構成,來進行層合成形而製造層合板。金屬箔只要適用於電氣絕緣材料用途者並無特別設限。又,成形條件,如,可適用電氣絕緣材料用層合板及多層板之手法,可使用如多段壓延、多斷真空壓延、連續成形、高壓釜成形機等,於溫度100~250℃、壓力0.2~10MPa、加熱時間0.1~5小時之範圍成形。另,亦可將本發明之預浸體與內層配線板組合並層合成形,來製造多層板。
實施例
接著,以下述實施例更詳細說明本發明,但此等實施例並不限制本發明。
又,將以下實施例所得之貼銅層合板以下述方法進行性能測定、評估。
(1)銅箔接著性之評估(銅箔剝離強度)
藉由將貼銅層合板浸漬於銅蝕刻液,留下1cm寬之帶狀部分後,製作除去銅箔之評估基板,以Autograph[島
津製作所(股)製AG-100C]測定帶狀部分之剝離強度而評估。
(2)玻璃轉移溫度(Tg)之測定
藉由將貼銅層合板浸漬於銅蝕刻液,製作除去銅箔之5mm方形之評估基板,以TMA試驗裝置[Du Pont(股)製TMA2940],根據評估基板之熱膨脹特性而測定。
(3)焊接耐熱性之評估
藉由將貼銅層合板浸漬於銅蝕刻液,製作除去銅箔之5mm方形之評估基板,以壓力鍋試驗裝置[平山製作所(股)製],121℃、0.2MPa之條件放置4小時候,於288℃之焊料中,浸漬評估基板20秒後,經觀察外觀評估焊接耐熱性。
(4)貼銅耐熱性(T-288)之評估
由貼銅層基板製作5mm方形之評估基板,以TMA試驗裝置[Du Pont(股)製TMA2940],經於288℃測定到評估基板膨脹產生之時間而評估。
(5)吸濕性(吸水率)之測定
藉由將貼銅層合板浸漬於銅蝕刻液,製作除去銅箔之評估基板,以壓力鍋試驗裝置[平山製作所(股)製],121℃、0.2MPa之條件放置4小時候,測定評估基板之吸水率。
(6)難燃性之評估
藉由從將貼銅層合板浸漬於銅蝕刻液,除去銅箔之評估基板,製作切出長127mm、寬12.7mm之評估基板,以
UL94之試驗法(V法)為準做評估。
(7)介電常數及介電損耗角正切之測定
藉由將所得之貼銅層合板浸漬於銅蝕刻液,製作除去銅箔之評估基板,使用介電常數測定裝置(Hewllet.Packerd公司製,HP4291B),測定於周波數1GHz之介電常數及介電損耗角正切。
製造例1:硬化劑(A-1)之製造
於配備溫度計、攪拌裝置、附迴流冷凝管水分定量器之可加熱及冷卻之容積2L的反應容器中,加入雙(4-馬來醯亞胺苯基)甲烷358.00g、間胺基酚54.50g及有機溶劑(丙二醇單甲基醚)412.50g,邊迴流邊進行反應5小時,得到含有機溶劑之硬化劑(A-1)。
製造例2:硬化劑(A-2)之製造
於配備溫度計、攪拌裝置、附迴流冷凝管水分定量器之可加熱及冷卻之容積2L的反應容器中,加入雙(4-馬來醯亞胺苯基)甲烷358.00g、對胺基酚54.50g及有機溶劑(丙二醇單甲基醚)412.50g,邊迴流邊進行反應5小時,得到含有機溶劑之硬化劑(A-2)。
製造例3:硬化劑(A-3)之製造
於配備溫度計、攪拌裝置、附迴流冷凝管水分定量器之可加熱及冷卻之容積2L的反應容器中,加入雙(4-馬
來醯亞胺苯基)甲烷358.00g、對胺基安息香酸68.50g及有機溶劑(N,N-二甲基乙醯胺)426.50g,於140℃進行反應5小時,得到含有機溶劑之硬化劑(A-3)。
製造例4:硬化劑(A-4)之製造
於配備溫度計、攪拌裝置、附迴流冷凝管水分定量器之可加熱及冷卻之容積1L的反應容器中,加入間苯撐雙馬來醯亞胺268.00g、間胺基酚54.50g及有機溶劑(N,N-二甲基乙醯胺)322.50g,於140℃進行反應5小時,得到含有機溶劑之硬化劑(A-4)。
製造例5:硬化劑(A-5)之製造
於配備溫度計、攪拌裝置、附迴流冷凝管水分定量器之可加熱及冷卻之容積2L的反應容器中,加入雙(4-馬來醯亞胺苯基)碸408.0g及對胺基酚54.50g及N,N-二甲基乙醯胺462.5g,於100℃進行反應2小時,得到含有機溶劑之硬化劑(A-5)之溶液。
製造例6:硬化劑(A-6)之製造
於配備溫度計、攪拌裝置、附迴流冷凝管水分定量器之可加熱及冷卻之容積2L的反應容器中,加入雙(4-馬來醯亞胺苯基)醚360.0g及對胺基酚54.50g及N,N-二甲基乙醯胺414.5g,於100℃進行反應2小時,得到含有機溶劑之硬化劑(A-6)之溶液。
製造例7:硬化劑(A-7)之製造
於配備溫度計、攪拌裝置、附迴流冷凝管水分定量器之可加熱及冷卻之容積2L的反應容器中,加入2,2’-雙[4-(4-馬來醯亞胺苯氧基)苯基]丙烷570.0g及對胺基酚54.50g及丙二醇單甲基醚624.5g,於120℃進行反應2小時,得到含有機溶劑之硬化劑(A-7)之溶液。
製造例8:硬化劑(A-8)之製造
於配備溫度計、攪拌裝置、附迴流冷凝管水分定量器之可加熱及冷卻之容積2L的反應容器中,加入4-甲基-1,3-苯撐雙馬來醯亞胺282.0g及對胺基酚54.50g及丙二醇單甲基醚336.5g,於120℃進行反應2小時,得到含有機溶劑之硬化劑(A-8)之溶液。
比較製造例1:硬化劑(A-9)之製造
參考該專利文獻1之實施例,於具有蒸汽加熱裝置之容積1L之捏和機中,添加雙(4-馬來醯亞胺基苯基)甲烷358.00g及間胺基酚54.50g,於135~140℃ 15分鐘加熱混練後冷卻,粉碎後得到硬化劑(A-9)之粉末。又,本比較製造例中因未使用有機溶劑,硬化劑(A-9)並非經本發明製造法所得者。
比較製造例2:硬化劑(A-10)之製造
參考該專利文獻9之實施例,於具有蒸汽加熱裝置之容積1L之捏和機中,添加雙(4-馬來醯亞胺基苯基)甲烷358.00g及間胺基安息香酸68.50g,於135~140℃ 15分鐘加熱混練後冷卻,粉碎後得到硬化劑(A-10)之粉末。又,本比較製造例中因未使用有機溶劑,硬化劑(A-10)並非經本發明製造法所得者。
實施例1~10、比較例1~6
使用製造例1~8及比較製造例1~2所得之(A)成分之硬化劑、(B)成分之6-取代鳥糞胺化合物之苯並鳥糞胺、(C)成分之含羧基酸性化合物及(D)成分之環氧樹脂或環氧硬化劑之苯酚酚醛清漆樹脂、(E)成分之無機填充劑之氫氧化鋁、碎二氧化矽、用作稀釋溶劑之甲基乙基酮,如表1~表3所示之搭配比例(質量份)混合,得到固形份70質量%之均一之清漆。
接著,將該清漆含浸塗佈於0.2mm之E玻璃布上,於160℃加熱10分鐘,熱乾燥後得到固形份含量55質量%之預浸體。將此預浸體4片重疊,配置於18μm之電解銅箔的上下,於壓力2.45MPa、溫度185℃、90分鐘進行壓延,得到貼銅層合板。
使用所得到之貼銅層合板,如前述方法測定評估其(1)銅箔接著性(銅箔剝離強度)、(2)玻璃轉移溫度、(3)焊接耐熱性、(4)貼銅耐熱性(T-288)、(5)吸濕性(吸水率)、(6)難燃性、(7)介電常數
(1GHz)、(8)介電損耗角正切(1GHz)。測定、評估之結果如表1及表2所示。
又,如上表1~表3中(C)含羧基酸性化合物之C1:對羥基安息香酸之25℃且無限稀釋之水溶液中之酸解離常數(pKa)為4.08(文獻值)、C2:安息香酸之25℃且無限稀釋之水溶液中之酸解離常數(pKa)為4.00(文獻值)。
又,使用(D)環氧樹脂之D1之苯酚酚醛清漆型環氧樹脂(大日本油墨化學工業股份有限公司製、商品名:Epiclon-770)、D2:甲酚酚醛清漆型環氧樹脂(大日本油墨化學工業股份有限公司製、商品名:EpiclonN-673),使用甲酚酚醛清漆型酚樹脂(大日本油墨化學工業股份有限公司製、商品名:KA-1165)作為環氧硬化劑。
比較例5及6中,熱硬化性樹脂無法得到均一溶解之清漆,不能製作預浸體。
由表1~表3可明白,由使用經本發明之製造法得到之(A)成分之硬化劑之熱硬化性樹脂組成物所製之預浸體的實施例中,銅箔剝離強度、耐熱性、耐濕性、難燃性、貼銅耐熱性(T-288)及介電特性(介電常數、介電損耗角正切)之全部都取得均衡性。
另外,在使用無有機溶劑下製造之含酸性取代基與不飽和馬來醯亞胺基之硬化劑時(比較例1、2、4、6)及無(C)成分時(比較例3)及熱硬化性樹脂組成物之玻璃轉移溫度(Tg)不滿足本發明要件時(比較例5),無法製作預浸體或是無法全部滿足銅箔剝離強度、耐熱性、
耐濕性、難燃性、貼銅耐熱性(T-288)及介電特性之全部,任一者之特性係不佳的。
將本發明之熱硬化性樹脂組成物於基材中含浸或塗佈後得到之預浸體,以及經將該預浸體層合成形而製造之層合板,其銅箔剝離強度、耐熱性、耐濕性、難燃性、貼銅耐熱性(T-288)及介電特性(介電常數、介電損耗角正切)之全部都取得均衡性,作為電子機器用印刷配線板極其有用。
[產業上的利用性]
經本發明之方法所製造之硬化劑,對有機溶劑之溶解性佳,可得到一種熱硬化性樹脂組成物,其金屬箔接著性、耐熱性、耐濕性、難燃性、貼銅耐熱性、低介電特性、低介電損耗角正切性之全部方面皆優異。
因此根據本發明,可得到使用該熱硬化性樹脂組成物而具有優異性能之預浸體及層合板,此等作為電子機器用印刷配線板等極其有用。
Claims (9)
- 一種具有酸性取代基與不飽和馬來醯亞胺基之硬化劑的製造方法,其特徵為使(a)一分子中至少具有2個N-取代馬來醯亞胺基之馬來醯亞胺化合物與(b)以下述一般式(I)所示之具有酸性取代基之胺化合物,在有機溶劑中進行反應,
(式中,R1各自獨立,表示作為酸性取代基之羥基、羧基或磺酸基,R2係為各自獨立,表示氫原子、碳數1~5之脂肪族烴基或鹵原子,x為1~5之整數、y為0~4之整數,且x與y之和為5),該具有酸性取代基與不飽和馬來醯亞胺基之硬化劑係如下一般式(II)或一般式(III)所示者, (式中,R1、R2、x及y表示者與一般式(I)中相同,R3係各自獨立,表示氫原子、碳數1~5之脂肪族烴基或鹵原子), (式中,R1、R2、x及y表示者與一般式(I)中相同,R4及R5係各自獨立,表示氫原子、碳數1~5之脂肪族烴基或鹵原子,A係為烷撐基、亞烷基、醚基、磺醯基或下述式(IV)所示之基), - 如申請專利範圍第1項之具有酸性取代基與不飽和馬來醯亞胺基之硬化劑的製造方法,其中該有機溶劑為乙醇、丙醇、丁醇、甲基溶纖劑、丁基溶纖劑、丙二醇單甲基醚、丙酮、甲基乙基酮、甲基異丁酮、環己酮、四氫呋喃、甲苯、二甲苯、均三甲苯、二甲基甲醯胺、二甲基乙醯胺、N-甲基吡咯烷酮、及二甲基亞碸之中至少任意一種。
- 一種熱硬化性樹脂組成物,其特徵為,含有(A)以如申請專利範圍第1或2項之方法所製造之具有酸性取代基與不飽和馬來醯亞胺基之硬化劑及(B)與該硬化劑共同硬化之化合物,且該硬化物之玻璃轉移溫度係200℃以上。
- 如申請專利範圍第3項之熱硬化性樹脂組成物,其中,(B)與該硬化劑共同硬化之化合物係為1分子中至少具有2個1級胺基之胺化合物。
- 如申請專利範圍第4項之熱硬化性樹脂組成物,其中,該1分子中至少具有2個1級胺基之胺化合物係如下一般式(V)所示之6-取代鳥糞胺化合物,該樹脂組成物更含有(C)於25℃且無限稀釋之水溶液中之酸解離常數(pKa)為4.05以上之含羧基之酸性化合物,
(式中,R6表示苯基、甲基、烯丙基、丁基、甲氧基或芐氧基)。 - 如申請專利範圍第3~5項中任一項之熱硬化性樹脂組成物,其中,更含有(D)1分子中至少具有2個環氧基之環氧樹脂。
- 如申請專利範圍第3~5項中任一項之熱硬化性樹脂組成物,其中,更含有(E)無機填充劑。
- 一種預浸體,其特徵為將如申請專利範圍第3~7項中任一項之熱硬化性樹脂組成物,含浸或塗佈於基材中後,B階段化所得。
- 一種層合板,其特徵係將如申請專利範圍第8項之預浸體層合成形而得。
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006157168 | 2006-06-06 | ||
| JP2006271950 | 2006-10-03 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200808857A TW200808857A (en) | 2008-02-16 |
| TWI429673B true TWI429673B (zh) | 2014-03-11 |
Family
ID=38801396
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW96120163A TWI429673B (zh) | 2006-06-06 | 2007-06-05 | A method for producing a hardening agent having an acidic substituent and an unsaturated maleimide group, and a thermosetting resin composition, a prepreg and a laminate |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US8796473B2 (zh) |
| EP (1) | EP2025696A1 (zh) |
| JP (1) | JP2013173933A (zh) |
| KR (2) | KR20140133892A (zh) |
| TW (1) | TWI429673B (zh) |
| WO (1) | WO2007142140A1 (zh) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5040548B2 (ja) * | 2006-11-21 | 2012-10-03 | 日立化成工業株式会社 | 熱硬化性樹脂組成物及びその製造方法並びにこれを用いたプリプレグ及び積層板 |
| JP2009155399A (ja) * | 2007-12-25 | 2009-07-16 | Hitachi Chem Co Ltd | 熱硬化性樹脂組成物並びにこれを用いたプリプレグ及び積層板 |
| BRPI0905387B1 (pt) | 2008-01-08 | 2019-08-06 | Dow Global Technologies Inc. | Composição curável e resina termofixa enrijecida |
| CN102365310B (zh) * | 2009-03-27 | 2013-11-20 | 日立化成工业株式会社 | 热固化性树脂组合物、以及使用了该组合物的预浸料、带支撑体的绝缘膜、层叠板及印刷布线板 |
| TWI531610B (zh) * | 2009-12-25 | 2016-05-01 | 日立化成股份有限公司 | 熱硬化性樹脂組成物、樹脂組成物清漆的製造方法、預浸體及積層板 |
| AU2010345325B2 (en) * | 2010-07-14 | 2013-09-26 | Guangdong Shengyi Sci. Tech Co., Ltd. | Composite material, high-frequency circuit substrate made therefrom and making method thereof |
| JP6022893B2 (ja) * | 2012-10-24 | 2016-11-09 | ナミックス株式会社 | カバーレイフィルム、及びそれを用いたフレキシブルプリント配線板、並びにそれらの製造方法 |
| JP5682664B2 (ja) * | 2013-07-01 | 2015-03-11 | 日立化成株式会社 | 熱硬化性樹脂組成物並びにこれを用いたプリプレグ及び積層板 |
| KR102038106B1 (ko) * | 2016-10-24 | 2019-10-29 | 주식회사 엘지화학 | 절연층 제조방법 및 다층인쇄회로기판 제조방법 |
| KR102040225B1 (ko) * | 2016-11-11 | 2019-11-06 | 주식회사 엘지화학 | 절연층 제조방법 및 다층인쇄회로기판 제조방법 |
| WO2018088754A1 (ko) * | 2016-11-11 | 2018-05-17 | 주식회사 엘지화학 | 절연층 제조방법 및 다층인쇄회로기판 제조방법 |
| JP7088031B2 (ja) * | 2017-02-17 | 2022-06-21 | 昭和電工マテリアルズ株式会社 | プリプレグ、積層板、プリント配線板、コアレス基板、半導体パッケージ及びコアレス基板の製造方法 |
| WO2019111416A1 (ja) * | 2017-12-08 | 2019-06-13 | 日立化成株式会社 | プリプレグ、積層板、及びそれらの製造方法、並びにプリント配線板及び半導体パッケージ |
| IL282356A (en) | 2021-04-14 | 2022-11-01 | Equashield Medical Ltd | Devices for use in drug delivery systems |
Family Cites Families (37)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5251499A (en) | 1975-10-23 | 1977-04-25 | Toshiba Chem Corp | Theremosetting resin compositions |
| JPS531298A (en) | 1976-06-25 | 1978-01-09 | Toshiba Chem Corp | Thermosettig resin compositions |
| JPS53124597A (en) | 1977-04-06 | 1978-10-31 | Toshiba Chem Corp | Heat-resistant polyimide resin |
| US4196109A (en) | 1978-08-17 | 1980-04-01 | Schenectady Chemicals, Inc. | Phenolic resin-triazine modifier for alkyd resins |
| EP0011049B1 (de) | 1978-10-04 | 1982-08-04 | Ciba-Geigy Ag | Aminoplastharz, die Herstellung desselben und seine Verwendung |
| JPS5659834A (en) | 1979-10-10 | 1981-05-23 | Toshiba Chem Corp | Thermosetting resin composition |
| JPS5655421A (en) | 1979-10-10 | 1981-05-16 | Toshiba Chem Corp | Thermosetting resin composition |
| JPS572328A (en) | 1980-06-05 | 1982-01-07 | Toshiba Chem Corp | Composition for adhesive |
| JPS5728129A (en) | 1980-07-26 | 1982-02-15 | Matsushita Electric Works Ltd | Curing agent for epoxy resin |
| JPS5738851A (en) | 1980-08-15 | 1982-03-03 | Toshiba Chem Corp | Thermosetting resin composition |
| JPS5856564B2 (ja) | 1980-11-08 | 1983-12-15 | 日立化成工業株式会社 | 耐熱性樹脂硬化物を与える熱硬化性組成物 |
| JPS5941358A (ja) | 1982-08-31 | 1984-03-07 | Toshiba Chem Corp | 耐熱接着剤用組成物 |
| JPS5941359A (ja) * | 1982-08-31 | 1984-03-07 | Toshiba Chem Corp | 耐熱性樹脂組成物 |
| JPS59187056A (ja) * | 1983-04-07 | 1984-10-24 | Toshiba Chem Corp | 熱硬化性樹脂組成物 |
| JPS6031521A (ja) | 1983-07-29 | 1985-02-18 | Toshiba Chem Corp | 成形用耐熱性樹脂組成物 |
| JPS60210685A (ja) | 1984-04-05 | 1985-10-23 | Toshiba Chem Corp | 耐熱接着剤用組成物 |
| JPS6172023A (ja) | 1984-09-17 | 1986-04-14 | Toshiba Chem Corp | 熱硬化性樹脂組成物 |
| JPH0644661B2 (ja) | 1985-08-23 | 1994-06-08 | 株式会社東芝 | 半導体レ−ザ装置 |
| DE3532141A1 (de) | 1985-09-10 | 1987-03-12 | Agfa Gevaert Ag | Waermeentwicklungsverfahren und hierfuer geeignetes bildempfangsblatt |
| JPH068342B2 (ja) | 1985-12-04 | 1994-02-02 | 東芝ケミカル株式会社 | 成形用耐熱性樹脂組成物 |
| JPS62177033A (ja) | 1986-01-30 | 1987-08-03 | Toshiba Chem Corp | 耐熱積層板の製造方法 |
| JPH0794606B2 (ja) * | 1986-04-14 | 1995-10-11 | 東芝ケミカル株式会社 | 熱硬化性樹脂組成物 |
| JPH0665188B2 (ja) | 1986-07-30 | 1994-08-22 | 株式会社日立メデイコ | X線装置の高電圧制御用真空管のフイラメント加熱回路 |
| JPS6381161A (ja) * | 1986-09-24 | 1988-04-12 | Toshiba Chem Corp | 耐熱性樹脂組成物 |
| JPH0742345B2 (ja) * | 1987-06-26 | 1995-05-10 | 東芝ケミカル株式会社 | 熱硬化性樹脂組成物 |
| JPH01123831A (ja) | 1987-11-09 | 1989-05-16 | Toshiba Chem Corp | 耐熱性樹脂組成物 |
| JPH0224324A (ja) | 1988-07-13 | 1990-01-26 | Hitachi Ltd | 組成物及びこの組成物から得られる重合体 |
| JPH02258820A (ja) | 1989-03-31 | 1990-10-19 | Mitsui Toatsu Chem Inc | 新規含フッ素グアナミン縮合物 |
| FR2645539B1 (fr) | 1989-04-10 | 1991-06-14 | Rhone Poulenc Chimie | Polymeres a groupements imides faits a partir de diamines encombrees |
| JP2823902B2 (ja) | 1989-10-31 | 1998-11-11 | 三井化学株式会社 | 含フッ素アリーグアナミン縮合物 |
| JP3181987B2 (ja) | 1992-06-25 | 2001-07-03 | 松下電工株式会社 | 三次元形状造形物の製造方法 |
| JPH0632969A (ja) | 1992-07-14 | 1994-02-08 | Toshiba Chem Corp | 成形用耐熱性樹脂組成物 |
| JP3653784B2 (ja) | 1995-04-27 | 2005-06-02 | 日立化成工業株式会社 | プリント配線板 |
| JP4090532B2 (ja) | 1996-04-26 | 2008-05-28 | 旭化成ケミカルズ株式会社 | 熱可塑性樹脂用添加剤とその樹脂組成物 |
| JP2001011672A (ja) | 1999-04-28 | 2001-01-16 | Nissha Printing Co Ltd | マグネシウム合金塗装物とその製造方法 |
| JP4735410B2 (ja) * | 2006-05-15 | 2011-07-27 | 日立化成工業株式会社 | 硬化剤の製造法,及びこれを用いた熱硬化性樹脂組成物 |
| JP5298462B2 (ja) * | 2006-06-06 | 2013-09-25 | 日立化成株式会社 | 酸性置換基と不飽和マレイミド基を有する硬化剤の製造法並びに熱硬化性樹脂組成物、プリプレグ及び積層板 |
-
2007
- 2007-06-01 EP EP20070744581 patent/EP2025696A1/en not_active Withdrawn
- 2007-06-01 US US12/303,627 patent/US8796473B2/en active Active
- 2007-06-01 KR KR1020147027278A patent/KR20140133892A/ko not_active Ceased
- 2007-06-01 WO PCT/JP2007/061193 patent/WO2007142140A1/ja not_active Ceased
- 2007-06-05 TW TW96120163A patent/TWI429673B/zh not_active IP Right Cessation
-
2008
- 2008-11-28 KR KR1020087029199A patent/KR101477304B1/ko not_active Expired - Fee Related
-
2012
- 2012-06-20 US US13/527,995 patent/US8461332B2/en not_active Expired - Fee Related
-
2013
- 2013-03-18 JP JP2013055012A patent/JP2013173933A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| US8461332B2 (en) | 2013-06-11 |
| US20100173163A1 (en) | 2010-07-08 |
| KR101477304B1 (ko) | 2014-12-29 |
| WO2007142140A1 (ja) | 2007-12-13 |
| US20120316263A1 (en) | 2012-12-13 |
| KR20140133892A (ko) | 2014-11-20 |
| US8796473B2 (en) | 2014-08-05 |
| JP2013173933A (ja) | 2013-09-05 |
| KR20090014362A (ko) | 2009-02-10 |
| EP2025696A1 (en) | 2009-02-18 |
| TW200808857A (en) | 2008-02-16 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI429673B (zh) | A method for producing a hardening agent having an acidic substituent and an unsaturated maleimide group, and a thermosetting resin composition, a prepreg and a laminate | |
| JP5298462B2 (ja) | 酸性置換基と不飽和マレイミド基を有する硬化剤の製造法並びに熱硬化性樹脂組成物、プリプレグ及び積層板 | |
| TWI434872B (zh) | A thermosetting resin composition, and a pre-absorbent body and a laminate using the same | |
| CN101910241B (zh) | 热固化性树脂组合物以及使用其的预浸料坯及层叠板 | |
| TWI501961B (zh) | 用於電子元件於高頻時具低介電損失之熱固性樹脂系統 | |
| JP4968044B2 (ja) | ポリイミド化合物の製造方法、熱硬化性樹脂組成物並びにこれを用いたプリプレグ及び積層板 | |
| JP2008111096A (ja) | 熱硬化性樹脂組成物並びにこれを用いたプリプレグ及び積層板 | |
| JP5540494B2 (ja) | 熱硬化性樹脂組成物、及びこれを用いたプリプレグ,積層板及びプリント配線板 | |
| CN101460539A (zh) | 具有酸性取代基和不饱和马来酰亚胺基的固化剂的制造方法以及热固化性树脂组合物、预浸料及层叠板 | |
| JP5736944B2 (ja) | 熱硬化性樹脂組成物、プリプレグ及び積層板 | |
| JP5266685B2 (ja) | 熱硬化性樹脂組成物並びにこれを用いたプリプレグ及び積層板 | |
| JP5417799B2 (ja) | 熱硬化性樹脂組成物、及びこれを用いたプリプレグ,積層板 | |
| JP5682664B2 (ja) | 熱硬化性樹脂組成物並びにこれを用いたプリプレグ及び積層板 | |
| JP2008133353A (ja) | 熱硬化性樹脂組成物、この樹脂組成物を用いたプリプレグ及び積層板 | |
| JP2013237844A (ja) | 熱硬化性樹脂組成物、及びこれを用いたプリプレグ、積層板 | |
| JP5028971B2 (ja) | (変性)グアナミン化合物溶液、熱硬化性樹脂組成物並びに、これを用いたプリプレグ及び積層板 | |
| JP5381016B2 (ja) | 熱硬化性樹脂組成物、及びこれを用いたプリプレグ,積層板 | |
| JP2014019773A (ja) | 熱硬化性樹脂組成物、及びこれを用いたプリプレグ、積層板 | |
| HK1131176B (zh) | 热固性树脂组合物及用其形成的预浸料及层叠板 | |
| HK1169428A (zh) | 热固性树脂组合物及用其形成的预浸料及层叠板 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |