TW201134590A - Laser processing method and laser processing device - Google Patents

Laser processing method and laser processing device Download PDF

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Publication number
TW201134590A
TW201134590A TW100105771A TW100105771A TW201134590A TW 201134590 A TW201134590 A TW 201134590A TW 100105771 A TW100105771 A TW 100105771A TW 100105771 A TW100105771 A TW 100105771A TW 201134590 A TW201134590 A TW 201134590A
Authority
TW
Taiwan
Prior art keywords
defect
irradiation
laser light
region
laser
Prior art date
Application number
TW100105771A
Other languages
English (en)
Chinese (zh)
Inventor
Takayuki Akahane
Original Assignee
Olympus Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Olympus Corp filed Critical Olympus Corp
Publication of TW201134590A publication Critical patent/TW201134590A/zh

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Classifications

    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1306Details
    • G02F1/1309Repairing; Testing
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/03Observing, e.g. monitoring, the workpiece
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/08Devices involving relative movement between laser beam and workpiece
    • B23K26/0869Devices involving movement of the laser head in at least one axial direction

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Laser Beam Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Manufacturing Of Printed Wiring (AREA)
TW100105771A 2010-03-18 2011-02-22 Laser processing method and laser processing device TW201134590A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010063312A JP5495875B2 (ja) 2010-03-18 2010-03-18 レーザ加工方法、及び、レーザ加工装置

Publications (1)

Publication Number Publication Date
TW201134590A true TW201134590A (en) 2011-10-16

Family

ID=44598678

Family Applications (1)

Application Number Title Priority Date Filing Date
TW100105771A TW201134590A (en) 2010-03-18 2011-02-22 Laser processing method and laser processing device

Country Status (4)

Country Link
JP (1) JP5495875B2 (enExample)
KR (1) KR20110105339A (enExample)
CN (1) CN102189332A (enExample)
TW (1) TW201134590A (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5818721B2 (ja) * 2012-03-06 2015-11-18 住友重機械工業株式会社 レーザ加工装置及びレーザ加工方法
KR101821239B1 (ko) 2015-09-04 2018-01-24 주식회사 이오테크닉스 접착제 제거장치 및 방법
CN115351426B (zh) * 2022-08-11 2025-04-25 莆田市雷腾激光数控设备有限公司 一种鞋底激光打标方法及系统
WO2025002322A1 (zh) 2023-06-28 2025-01-02 广州童心制物科技有限公司 加工元素的限位方法、装置、设备、程序介质和数控机器

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58138588A (ja) * 1982-02-12 1983-08-17 Hitachi Ltd 光照射加工装置
JPH02241686A (ja) * 1989-03-14 1990-09-26 Nec Corp レーザ加工装置用結像光学系
JPH0542381A (ja) * 1991-08-09 1993-02-23 Nec Corp レーザ加工装置を用いた欠陥修正方法
JP3042155B2 (ja) * 1992-03-05 2000-05-15 日本電気株式会社 フォトマスク修正装置およびフォトマスク修正方法
JP2809134B2 (ja) * 1995-06-20 1998-10-08 日本電気株式会社 液晶表示用カラーフィルタの欠陥修正方法および装置
JP3858571B2 (ja) * 2000-07-27 2006-12-13 株式会社日立製作所 パターン欠陥検査方法及びその装置
JP4335422B2 (ja) * 2000-07-31 2009-09-30 Ntn株式会社 パターン修正装置
KR100457565B1 (ko) * 2002-07-29 2004-11-18 엘지전자 주식회사 레이저 수리 장치 및 방법
JP4646805B2 (ja) * 2003-05-09 2011-03-09 オリンパス株式会社 欠陥修正装置及びその欠陥修正方法
JP2005103581A (ja) * 2003-09-29 2005-04-21 Olympus Corp リペア方法及びその装置
JP4688525B2 (ja) * 2004-09-27 2011-05-25 株式会社 日立ディスプレイズ パターン修正装置および表示装置の製造方法
CN101147093B (zh) * 2005-03-24 2011-10-05 奥林巴斯株式会社 维修方法及其装置
JP5036144B2 (ja) * 2005-06-28 2012-09-26 オリンパス株式会社 レーザ加工装置
JP4947933B2 (ja) * 2005-07-26 2012-06-06 オリンパス株式会社 レーザリペア装置
TWI408358B (zh) * 2006-07-03 2013-09-11 Olympus Corp 缺陷修正裝置
JP4951323B2 (ja) * 2006-12-08 2012-06-13 オリンパス株式会社 欠陥修正方法及び欠陥修正装置
JP5064778B2 (ja) * 2006-12-11 2012-10-31 オリンパス株式会社 レーザ加工装置
JP2008153024A (ja) * 2006-12-15 2008-07-03 Ntn Corp 微細パターン修正方法
JP5114943B2 (ja) * 2006-12-25 2013-01-09 ソニー株式会社 欠陥修正装置及び欠陥修正方法
JP5110894B2 (ja) * 2007-02-05 2012-12-26 株式会社ジャパンディスプレイウェスト 欠陥修正装置、配線基板の製造方法、ディスプレイ装置の製造方法
JP4955425B2 (ja) * 2007-03-08 2012-06-20 オリンパス株式会社 レーザ加工装置
JP4937185B2 (ja) * 2008-05-15 2012-05-23 Ntn株式会社 パターン修正方法
JP5331421B2 (ja) * 2008-09-12 2013-10-30 オリンパス株式会社 レーザリペア装置およびレーザリペア方法
JP5730528B2 (ja) * 2010-03-05 2015-06-10 オリンパス株式会社 欠陥修正装置および欠陥追跡方法

Also Published As

Publication number Publication date
JP5495875B2 (ja) 2014-05-21
JP2011194432A (ja) 2011-10-06
KR20110105339A (ko) 2011-09-26
CN102189332A (zh) 2011-09-21

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