JP5495875B2 - レーザ加工方法、及び、レーザ加工装置 - Google Patents

レーザ加工方法、及び、レーザ加工装置 Download PDF

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Publication number
JP5495875B2
JP5495875B2 JP2010063312A JP2010063312A JP5495875B2 JP 5495875 B2 JP5495875 B2 JP 5495875B2 JP 2010063312 A JP2010063312 A JP 2010063312A JP 2010063312 A JP2010063312 A JP 2010063312A JP 5495875 B2 JP5495875 B2 JP 5495875B2
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JP
Japan
Prior art keywords
region
irradiation
defect
laser beam
laser processing
Prior art date
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Expired - Fee Related
Application number
JP2010063312A
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English (en)
Japanese (ja)
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JP2011194432A (ja
JP2011194432A5 (enExample
Inventor
隆之 赤羽
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Olympus Corp
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Olympus Corp
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Filing date
Publication date
Application filed by Olympus Corp filed Critical Olympus Corp
Priority to JP2010063312A priority Critical patent/JP5495875B2/ja
Priority to TW100105771A priority patent/TW201134590A/zh
Priority to KR1020110021815A priority patent/KR20110105339A/ko
Priority to CN2011100598721A priority patent/CN102189332A/zh
Publication of JP2011194432A publication Critical patent/JP2011194432A/ja
Publication of JP2011194432A5 publication Critical patent/JP2011194432A5/ja
Application granted granted Critical
Publication of JP5495875B2 publication Critical patent/JP5495875B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1306Details
    • G02F1/1309Repairing; Testing
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/03Observing, e.g. monitoring, the workpiece
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/08Devices involving relative movement between laser beam and workpiece
    • B23K26/0869Devices involving movement of the laser head in at least one axial direction

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Laser Beam Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Manufacturing Of Printed Wiring (AREA)
JP2010063312A 2010-03-18 2010-03-18 レーザ加工方法、及び、レーザ加工装置 Expired - Fee Related JP5495875B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2010063312A JP5495875B2 (ja) 2010-03-18 2010-03-18 レーザ加工方法、及び、レーザ加工装置
TW100105771A TW201134590A (en) 2010-03-18 2011-02-22 Laser processing method and laser processing device
KR1020110021815A KR20110105339A (ko) 2010-03-18 2011-03-11 레이저 가공 방법 및 레이저 가공 장치
CN2011100598721A CN102189332A (zh) 2010-03-18 2011-03-11 激光加工方法及激光加工装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010063312A JP5495875B2 (ja) 2010-03-18 2010-03-18 レーザ加工方法、及び、レーザ加工装置

Publications (3)

Publication Number Publication Date
JP2011194432A JP2011194432A (ja) 2011-10-06
JP2011194432A5 JP2011194432A5 (enExample) 2013-05-02
JP5495875B2 true JP5495875B2 (ja) 2014-05-21

Family

ID=44598678

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010063312A Expired - Fee Related JP5495875B2 (ja) 2010-03-18 2010-03-18 レーザ加工方法、及び、レーザ加工装置

Country Status (4)

Country Link
JP (1) JP5495875B2 (enExample)
KR (1) KR20110105339A (enExample)
CN (1) CN102189332A (enExample)
TW (1) TW201134590A (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5818721B2 (ja) * 2012-03-06 2015-11-18 住友重機械工業株式会社 レーザ加工装置及びレーザ加工方法
KR101821239B1 (ko) 2015-09-04 2018-01-24 주식회사 이오테크닉스 접착제 제거장치 및 방법
CN115351426B (zh) * 2022-08-11 2025-04-25 莆田市雷腾激光数控设备有限公司 一种鞋底激光打标方法及系统
WO2025002322A1 (zh) 2023-06-28 2025-01-02 广州童心制物科技有限公司 加工元素的限位方法、装置、设备、程序介质和数控机器

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58138588A (ja) * 1982-02-12 1983-08-17 Hitachi Ltd 光照射加工装置
JPH02241686A (ja) * 1989-03-14 1990-09-26 Nec Corp レーザ加工装置用結像光学系
JPH0542381A (ja) * 1991-08-09 1993-02-23 Nec Corp レーザ加工装置を用いた欠陥修正方法
JP3042155B2 (ja) * 1992-03-05 2000-05-15 日本電気株式会社 フォトマスク修正装置およびフォトマスク修正方法
JP2809134B2 (ja) * 1995-06-20 1998-10-08 日本電気株式会社 液晶表示用カラーフィルタの欠陥修正方法および装置
JP3858571B2 (ja) * 2000-07-27 2006-12-13 株式会社日立製作所 パターン欠陥検査方法及びその装置
JP4335422B2 (ja) * 2000-07-31 2009-09-30 Ntn株式会社 パターン修正装置
KR100457565B1 (ko) * 2002-07-29 2004-11-18 엘지전자 주식회사 레이저 수리 장치 및 방법
JP4646805B2 (ja) * 2003-05-09 2011-03-09 オリンパス株式会社 欠陥修正装置及びその欠陥修正方法
JP2005103581A (ja) * 2003-09-29 2005-04-21 Olympus Corp リペア方法及びその装置
JP4688525B2 (ja) * 2004-09-27 2011-05-25 株式会社 日立ディスプレイズ パターン修正装置および表示装置の製造方法
CN101147093B (zh) * 2005-03-24 2011-10-05 奥林巴斯株式会社 维修方法及其装置
JP5036144B2 (ja) * 2005-06-28 2012-09-26 オリンパス株式会社 レーザ加工装置
JP4947933B2 (ja) * 2005-07-26 2012-06-06 オリンパス株式会社 レーザリペア装置
TWI408358B (zh) * 2006-07-03 2013-09-11 Olympus Corp 缺陷修正裝置
JP4951323B2 (ja) * 2006-12-08 2012-06-13 オリンパス株式会社 欠陥修正方法及び欠陥修正装置
JP5064778B2 (ja) * 2006-12-11 2012-10-31 オリンパス株式会社 レーザ加工装置
JP2008153024A (ja) * 2006-12-15 2008-07-03 Ntn Corp 微細パターン修正方法
JP5114943B2 (ja) * 2006-12-25 2013-01-09 ソニー株式会社 欠陥修正装置及び欠陥修正方法
JP5110894B2 (ja) * 2007-02-05 2012-12-26 株式会社ジャパンディスプレイウェスト 欠陥修正装置、配線基板の製造方法、ディスプレイ装置の製造方法
JP4955425B2 (ja) * 2007-03-08 2012-06-20 オリンパス株式会社 レーザ加工装置
JP4937185B2 (ja) * 2008-05-15 2012-05-23 Ntn株式会社 パターン修正方法
JP5331421B2 (ja) * 2008-09-12 2013-10-30 オリンパス株式会社 レーザリペア装置およびレーザリペア方法
JP5730528B2 (ja) * 2010-03-05 2015-06-10 オリンパス株式会社 欠陥修正装置および欠陥追跡方法

Also Published As

Publication number Publication date
JP2011194432A (ja) 2011-10-06
KR20110105339A (ko) 2011-09-26
CN102189332A (zh) 2011-09-21
TW201134590A (en) 2011-10-16

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