KR20110105339A - 레이저 가공 방법 및 레이저 가공 장치 - Google Patents

레이저 가공 방법 및 레이저 가공 장치 Download PDF

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Publication number
KR20110105339A
KR20110105339A KR1020110021815A KR20110021815A KR20110105339A KR 20110105339 A KR20110105339 A KR 20110105339A KR 1020110021815 A KR1020110021815 A KR 1020110021815A KR 20110021815 A KR20110021815 A KR 20110021815A KR 20110105339 A KR20110105339 A KR 20110105339A
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KR
South Korea
Prior art keywords
area
defect
laser beam
irradiation
region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
KR1020110021815A
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English (en)
Korean (ko)
Inventor
다카유키 아카하네
Original Assignee
올림푸스 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 올림푸스 가부시키가이샤 filed Critical 올림푸스 가부시키가이샤
Publication of KR20110105339A publication Critical patent/KR20110105339A/ko
Withdrawn legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1306—Details
    • G02F1/1309—Repairing; Testing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/03—Observing, e.g. monitoring, the workpiece
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/08—Devices involving relative movement between laser beam and workpiece
    • B23K26/0869—Devices involving movement of the laser head in at least one axial direction

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Laser Beam Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Manufacturing Of Printed Wiring (AREA)
KR1020110021815A 2010-03-18 2011-03-11 레이저 가공 방법 및 레이저 가공 장치 Withdrawn KR20110105339A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2010-063312 2010-03-18
JP2010063312A JP5495875B2 (ja) 2010-03-18 2010-03-18 レーザ加工方法、及び、レーザ加工装置

Publications (1)

Publication Number Publication Date
KR20110105339A true KR20110105339A (ko) 2011-09-26

Family

ID=44598678

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020110021815A Withdrawn KR20110105339A (ko) 2010-03-18 2011-03-11 레이저 가공 방법 및 레이저 가공 장치

Country Status (4)

Country Link
JP (1) JP5495875B2 (enExample)
KR (1) KR20110105339A (enExample)
CN (1) CN102189332A (enExample)
TW (1) TW201134590A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101451007B1 (ko) * 2012-03-06 2014-10-17 스미도모쥬기가이고교 가부시키가이샤 레이저가공장치 및 레이저가공방법

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101821239B1 (ko) * 2015-09-04 2018-01-24 주식회사 이오테크닉스 접착제 제거장치 및 방법
CN115351426B (zh) * 2022-08-11 2025-04-25 莆田市雷腾激光数控设备有限公司 一种鞋底激光打标方法及系统
WO2025002322A1 (zh) 2023-06-28 2025-01-02 广州童心制物科技有限公司 加工元素的限位方法、装置、设备、程序介质和数控机器

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58138588A (ja) * 1982-02-12 1983-08-17 Hitachi Ltd 光照射加工装置
JPH02241686A (ja) * 1989-03-14 1990-09-26 Nec Corp レーザ加工装置用結像光学系
JPH0542381A (ja) * 1991-08-09 1993-02-23 Nec Corp レーザ加工装置を用いた欠陥修正方法
JP3042155B2 (ja) * 1992-03-05 2000-05-15 日本電気株式会社 フォトマスク修正装置およびフォトマスク修正方法
JP2809134B2 (ja) * 1995-06-20 1998-10-08 日本電気株式会社 液晶表示用カラーフィルタの欠陥修正方法および装置
JP3858571B2 (ja) * 2000-07-27 2006-12-13 株式会社日立製作所 パターン欠陥検査方法及びその装置
JP4335422B2 (ja) * 2000-07-31 2009-09-30 Ｎｔｎ株式会社 パターン修正装置
KR100457565B1 (ko) * 2002-07-29 2004-11-18 엘지전자 주식회사 레이저 수리 장치 및 방법
TWI325495B (en) * 2003-05-09 2010-06-01 Olympus Corp Defect repair system and method of repairing defect
JP2005103581A (ja) * 2003-09-29 2005-04-21 Olympus Corp リペア方法及びその装置
JP4688525B2 (ja) * 2004-09-27 2011-05-25 株式会社 日立ディスプレイズ パターン修正装置および表示装置の製造方法
KR101120531B1 (ko) * 2005-03-24 2012-03-06 올림푸스 가부시키가이샤 리페어 방법 및 그 장치
JP5036144B2 (ja) * 2005-06-28 2012-09-26 オリンパス株式会社 レーザ加工装置
JP4947933B2 (ja) * 2005-07-26 2012-06-06 オリンパス株式会社 レーザリペア装置
TWI408358B (zh) * 2006-07-03 2013-09-11 Olympus Corp 缺陷修正裝置
JP4951323B2 (ja) * 2006-12-08 2012-06-13 オリンパス株式会社 欠陥修正方法及び欠陥修正装置
JP5064778B2 (ja) * 2006-12-11 2012-10-31 オリンパス株式会社 レーザ加工装置
JP2008153024A (ja) * 2006-12-15 2008-07-03 Ntn Corp 微細パターン修正方法
JP5114943B2 (ja) * 2006-12-25 2013-01-09 ソニー株式会社 欠陥修正装置及び欠陥修正方法
JP5110894B2 (ja) * 2007-02-05 2012-12-26 株式会社ジャパンディスプレイウェスト 欠陥修正装置、配線基板の製造方法、ディスプレイ装置の製造方法
JP4955425B2 (ja) * 2007-03-08 2012-06-20 オリンパス株式会社 レーザ加工装置
JP4937185B2 (ja) * 2008-05-15 2012-05-23 Ｎｔｎ株式会社 パターン修正方法
JP5331421B2 (ja) * 2008-09-12 2013-10-30 オリンパス株式会社 レーザリペア装置およびレーザリペア方法
JP5730528B2 (ja) * 2010-03-05 2015-06-10 オリンパス株式会社 欠陥修正装置および欠陥追跡方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101451007B1 (ko) * 2012-03-06 2014-10-17 스미도모쥬기가이고교 가부시키가이샤 레이저가공장치 및 레이저가공방법

Also Published As

Publication number Publication date
TW201134590A (en) 2011-10-16
JP5495875B2 (ja) 2014-05-21
JP2011194432A (ja) 2011-10-06
CN102189332A (zh) 2011-09-21

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Legal Events

Date Code Title Description
PA0109 Patent application

Patent event code: PA01091R01D

Comment text: Patent Application

Patent event date: 20110311

PG1501 Laying open of application
PC1203 Withdrawal of no request for examination
WITN Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid