TW200636899A - Recovery processing method to be adopted in substrate processing apparatus, substrate processing apparatus and program - Google Patents

Recovery processing method to be adopted in substrate processing apparatus, substrate processing apparatus and program

Info

Publication number
TW200636899A
TW200636899A TW095102491A TW95102491A TW200636899A TW 200636899 A TW200636899 A TW 200636899A TW 095102491 A TW095102491 A TW 095102491A TW 95102491 A TW95102491 A TW 95102491A TW 200636899 A TW200636899 A TW 200636899A
Authority
TW
Taiwan
Prior art keywords
processing apparatus
substrate
substrate processing
adopted
program
Prior art date
Application number
TW095102491A
Other languages
English (en)
Other versions
TWI382482B (zh
Inventor
Noriaki Shimizu
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of TW200636899A publication Critical patent/TW200636899A/zh
Application granted granted Critical
Publication of TWI382482B publication Critical patent/TWI382482B/zh

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B60VEHICLES IN GENERAL
    • B60BVEHICLE WHEELS; CASTORS; AXLES FOR WHEELS OR CASTORS; INCREASING WHEEL ADHESION
    • B60B17/00Wheels characterised by rail-engaging elements
    • B60B17/0006Construction of wheel bodies, e.g. disc wheels
    • B60B17/0013Construction of wheel bodies, e.g. disc wheels formed by two or more axially spaced discs
    • B60B17/0017Construction of wheel bodies, e.g. disc wheels formed by two or more axially spaced discs with insonorisation means
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B60VEHICLES IN GENERAL
    • B60BVEHICLE WHEELS; CASTORS; AXLES FOR WHEELS OR CASTORS; INCREASING WHEEL ADHESION
    • B60B17/00Wheels characterised by rail-engaging elements
    • B60B17/0006Construction of wheel bodies, e.g. disc wheels
    • B60B17/0024Construction of wheel bodies, e.g. disc wheels with noise reducing means
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B61RAILWAYS
    • B61FRAIL VEHICLE SUSPENSIONS, e.g. UNDERFRAMES, BOGIES OR ARRANGEMENTS OF WHEEL AXLES; RAIL VEHICLES FOR USE ON TRACKS OF DIFFERENT WIDTH; PREVENTING DERAILING OF RAIL VEHICLES; WHEEL GUARDS, OBSTRUCTION REMOVERS OR THE LIKE FOR RAIL VEHICLES
    • B61F13/00Rail vehicles characterised by wheel arrangements, not otherwise provided for
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B60VEHICLES IN GENERAL
    • B60BVEHICLE WHEELS; CASTORS; AXLES FOR WHEELS OR CASTORS; INCREASING WHEEL ADHESION
    • B60B2900/00Purpose of invention
    • B60B2900/10Reduction of
    • B60B2900/133Noise
TW095102491A 2005-01-24 2006-01-23 A substrate processing apparatus, and a substrate processing apparatus TWI382482B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005016174A JP4569956B2 (ja) 2005-01-24 2005-01-24 基板処理装置の復旧処理方法,基板処理装置,プログラム

Publications (2)

Publication Number Publication Date
TW200636899A true TW200636899A (en) 2006-10-16
TWI382482B TWI382482B (zh) 2013-01-11

Family

ID=36919041

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095102491A TWI382482B (zh) 2005-01-24 2006-01-23 A substrate processing apparatus, and a substrate processing apparatus

Country Status (4)

Country Link
JP (1) JP4569956B2 (zh)
KR (1) KR100724173B1 (zh)
CN (1) CN100383919C (zh)
TW (1) TWI382482B (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI767617B (zh) * 2020-05-11 2022-06-11 大陸商中微半導體設備(上海)股份有限公司 半導體處理系統

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4388563B2 (ja) 2007-03-27 2009-12-24 東京エレクトロン株式会社 基板の処理方法、基板処理装置及びコンピュータ読み取り可能な記憶媒体
TWI533394B (zh) * 2007-06-21 2016-05-11 尼康股份有限公司 Conveying method and conveying device
JP4503088B2 (ja) * 2007-11-05 2010-07-14 株式会社日立国際電気 基板処理装置及び基板処理装置の表示方法
JP5511190B2 (ja) * 2008-01-23 2014-06-04 株式会社荏原製作所 基板処理装置の運転方法
JP5635270B2 (ja) * 2009-02-13 2014-12-03 株式会社日立国際電気 基板処理装置及び基板処理システム及び基板処理装置の表示方法及び基板処理装置のパラメータ設定方法及び記録媒体
WO2011078270A1 (ja) * 2009-12-24 2011-06-30 株式会社アルバック 真空処理装置の運用方法
CN103382554B (zh) * 2012-05-04 2015-08-19 无锡华润上华科技有限公司 常压化学气相沉积机台异常监控方法及系统
JP6169365B2 (ja) 2013-02-07 2017-07-26 株式会社日立国際電気 半導体装置の製造方法及び基板処理装置
JP6224359B2 (ja) 2013-06-20 2017-11-01 株式会社Screenホールディングス 基板処理装置のためのスケジュール作成方法およびスケジュール作成プログラム
CN104699019B (zh) * 2013-12-09 2019-09-17 中芯国际集成电路制造(上海)有限公司 机台恢复检验系统以及机台恢复检验方法
JP6165658B2 (ja) * 2014-03-20 2017-07-19 株式会社東芝 製造装置管理システム及び製造装置管理方法
JP6259698B2 (ja) 2014-03-28 2018-01-10 株式会社荏原製作所 基板処理方法
US10024825B2 (en) * 2014-12-26 2018-07-17 Axcelis Technologies, Inc. Wafer clamp detection based on vibration or acoustic characteristic analysis
KR102063322B1 (ko) 2016-05-27 2020-01-08 세메스 주식회사 기판 처리 장치 및 방법
JP6773497B2 (ja) * 2016-09-20 2020-10-21 株式会社Screenホールディングス 基板処理管理装置、基板処理管理方法および基板処理管理プログラム
CN106373913B (zh) * 2016-10-31 2019-02-19 北京北方华创微电子装备有限公司 一种半导体立式炉设备异常恢复的方法
CN107507788B (zh) * 2017-07-21 2019-11-08 志圣科技(广州)有限公司 晶圆加工机及其加工处理方法
JP6435388B2 (ja) * 2017-10-04 2018-12-05 株式会社Screenホールディングス 基板処理方法および基板処理装置
KR102204024B1 (ko) * 2018-03-15 2021-01-18 세메스 주식회사 기판 처리 장치 및 방법
JP7109287B2 (ja) * 2018-07-09 2022-07-29 東京エレクトロン株式会社 基板処理システム、基板処理方法、および制御プログラム
JP7113722B2 (ja) * 2018-11-05 2022-08-05 東京エレクトロン株式会社 基板処理装置、基板収容容器の蓋を開閉する方法、及びプログラム
JP7303678B2 (ja) 2019-07-08 2023-07-05 東京エレクトロン株式会社 基板処理システム及び基板処理方法
CN110983301B (zh) * 2019-12-23 2022-08-05 通威太阳能(安徽)有限公司 一种镀膜管p设备高频自动补镀方法
JP2021166275A (ja) 2020-04-08 2021-10-14 株式会社ディスコ 加工装置及び加工方法
CN113658885B (zh) * 2021-08-12 2023-09-08 长鑫存储技术有限公司 制备腔室的确定方法及装置
CN116159809A (zh) * 2022-12-28 2023-05-26 深圳市纳设智能装备有限公司 晶圆传输方法
KR102607442B1 (ko) 2023-06-19 2023-11-29 주식회사 유니온스틸코퍼레이션 개선된 압축 성능의 고철 압축 및 절단 장치

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4757459A (en) * 1986-05-29 1988-07-12 Cincinnati Milacron Inc. Apparatus and method for programming a computer operated robot arm using macro instructions
US4928221A (en) * 1988-04-11 1990-05-22 Westinghouse Electric Corp. Part program generating system
JP2600237Y2 (ja) * 1993-03-11 1999-10-04 日新電機株式会社 エアーロック室
JPH0729958A (ja) * 1993-07-14 1995-01-31 Hitachi Ltd 半導体製造装置
US5570990A (en) * 1993-11-05 1996-11-05 Asyst Technologies, Inc. Human guided mobile loader stocker
JP3328869B2 (ja) * 1995-06-27 2002-09-30 東京エレクトロン株式会社 処理方法及び処理装置
JP3936030B2 (ja) * 1997-06-23 2007-06-27 東京エレクトロン株式会社 被処理体の回収方法
US6216051B1 (en) * 1998-05-04 2001-04-10 Nec Electronics, Inc. Manufacturing backup system
JP3773355B2 (ja) * 1998-05-07 2006-05-10 松下電器産業株式会社 半導体装置の製造装置
WO2000023230A1 (en) * 1998-10-19 2000-04-27 Speedfam-Ipec Corporation Catastrophic error recovery apparatus and associated methods
JP2001093791A (ja) * 1999-09-20 2001-04-06 Hitachi Ltd 真空処理装置の運転方法及びウエハの処理方法
JP2001338964A (ja) * 2000-05-26 2001-12-07 Hitachi Ltd 試料処理装置および処理方法
US7054786B2 (en) * 2000-07-04 2006-05-30 Tokyo Electron Limited Operation monitoring method for treatment apparatus
JP2002261148A (ja) * 2001-03-05 2002-09-13 Tokyo Electron Ltd 処理システム及び被処理体の予熱方法
JP2002270481A (ja) * 2001-03-08 2002-09-20 Olympus Optical Co Ltd 試料自動回収システム
US6732006B2 (en) * 2002-02-06 2004-05-04 Asm International Nv Method and system to process semiconductor wafers
JP2004319961A (ja) * 2003-03-31 2004-11-11 Tokyo Electron Ltd 基板処理装置、基板処理方法、及び該方法を実行するプログラム

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI767617B (zh) * 2020-05-11 2022-06-11 大陸商中微半導體設備(上海)股份有限公司 半導體處理系統

Also Published As

Publication number Publication date
TWI382482B (zh) 2013-01-11
JP4569956B2 (ja) 2010-10-27
KR20060085590A (ko) 2006-07-27
JP2006203145A (ja) 2006-08-03
CN100383919C (zh) 2008-04-23
KR100724173B1 (ko) 2007-05-31
CN1819112A (zh) 2006-08-16

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