SG128601A1 - Lithographic apparatus and device manufacturing method - Google Patents

Lithographic apparatus and device manufacturing method

Info

Publication number
SG128601A1
SG128601A1 SG200604016A SG200604016A SG128601A1 SG 128601 A1 SG128601 A1 SG 128601A1 SG 200604016 A SG200604016 A SG 200604016A SG 200604016 A SG200604016 A SG 200604016A SG 128601 A1 SG128601 A1 SG 128601A1
Authority
SG
Singapore
Prior art keywords
device manufacturing
lithographic apparatus
lithographic
manufacturing
Prior art date
Application number
SG200604016A
Other languages
English (en)
Inventor
Johannes Henricus Wilhe Jacobs
Ten Nicolaas Kate
Martinus Hendrikus An Leenders
Erik Roelof Loopstra
Martinus Cornelis Mar Verhagen
Herman Boom
Franciscus Johannes Jo Janssen
Igor Petrus Maria Bouchoms
Nicolaas Rudolf Kemper
Joost Jeroen Ottens
Yuecel Koek
Van Johannes Es
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG128601A1 publication Critical patent/SG128601A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G03F7/70875—Temperature, e.g. temperature control of masks or workpieces via control of stage temperature

Landscapes

  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Toxicology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
SG200604016A 2005-06-21 2006-06-13 Lithographic apparatus and device manufacturing method SG128601A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US69223405P 2005-06-21 2005-06-21
US11/319,217 US7652746B2 (en) 2005-06-21 2005-12-28 Lithographic apparatus and device manufacturing method

Publications (1)

Publication Number Publication Date
SG128601A1 true SG128601A1 (en) 2007-01-30

Family

ID=37027705

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200604016A SG128601A1 (en) 2005-06-21 2006-06-13 Lithographic apparatus and device manufacturing method

Country Status (7)

Country Link
US (2) US7652746B2 (ko)
EP (1) EP1736831A1 (ko)
JP (3) JP4417349B2 (ko)
KR (1) KR100797084B1 (ko)
CN (2) CN101819388B (ko)
SG (1) SG128601A1 (ko)
TW (2) TWI338198B (ko)

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JP6525567B2 (ja) * 2014-12-02 2019-06-05 キヤノン株式会社 インプリント装置及び物品の製造方法
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CN107168015B (zh) * 2016-02-29 2019-01-04 上海微电子装备（集团）股份有限公司 一种浸液限制机构及温度补偿方法
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CN110966916B (zh) * 2018-09-30 2021-10-15 上海微电子装备（集团）股份有限公司 一种气浴装置及光刻机
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CN101819388A (zh) 2010-09-01
US7652746B2 (en) 2010-01-26
US20060285096A1 (en) 2006-12-21
JP2010010707A (ja) 2010-01-14
TWI338198B (en) 2011-03-01
JP4417349B2 (ja) 2010-02-17
TW201109864A (en) 2011-03-16
EP1736831A1 (en) 2006-12-27
KR20060133917A (ko) 2006-12-27
CN1885171B (zh) 2010-07-07
TW200715064A (en) 2007-04-16
CN101819388B (zh) 2012-08-08
JP5536818B2 (ja) 2014-07-02
US20100245791A1 (en) 2010-09-30
JP2012124539A (ja) 2012-06-28
JP2007005795A (ja) 2007-01-11
US9268236B2 (en) 2016-02-23
JP5033854B2 (ja) 2012-09-26
KR100797084B1 (ko) 2008-01-22
CN1885171A (zh) 2006-12-27
TWI420258B (zh) 2013-12-21

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