CN103163746B8 - 一种具有温度探测功能的掩模对准探测器、光刻装置及对准探测方法 - Google Patents

一种具有温度探测功能的掩模对准探测器、光刻装置及对准探测方法 Download PDF

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CN103163746B8
CN103163746B8 CN201110404905.1A CN201110404905A CN103163746B8 CN 103163746 B8 CN103163746 B8 CN 103163746B8 CN 201110404905 A CN201110404905 A CN 201110404905A CN 103163746 B8 CN103163746 B8 CN 103163746B8
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signal
temperature
lithographic equipment
telecommunication
optical module
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CN103163746B (zh
CN103163746A (zh
Inventor
王海江
唐文力
程鹏
李运锋
宋海军
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Shanghai Micro Electronics Equipment Co Ltd
Shanghai Micro and High Precision Mechine Engineering Co Ltd
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Shanghai Micro Electronics Equipment Co Ltd
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Publication of CN103163746B publication Critical patent/CN103163746B/zh
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  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)

Abstract

本发明公开一种具有温度探测功能的掩模对准探测器，包括：一光学组件，用于对入射光束进行波长转换和/或滤波后形成一出射光；一传感器单元，包括一光电传感器，用于探测出射光并转化为电信号；一温度传感器，用于探测温度并将温度信号转化为电信号；固定组件，用于固定该光学组件和传感器单元；一基准板，用于承载该光学组件、传感器单元及固定组件；一处理单元，用于处理该电信号。本发明同时公开一种使用上述掩模对准探测器的光刻装置以及对准测量方法。
CN201110404905.1A 2011-12-08 2011-12-08 一种具有温度探测功能的掩模对准探测器、光刻装置及对准探测方法 Active CN103163746B8 (zh)

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CN201110404905.1A CN103163746B8 (zh) 2011-12-08 2011-12-08 一种具有温度探测功能的掩模对准探测器、光刻装置及对准探测方法

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CN201110404905.1A CN103163746B8 (zh) 2011-12-08 2011-12-08 一种具有温度探测功能的掩模对准探测器、光刻装置及对准探测方法

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CN103163746A CN103163746A (zh) 2013-06-19
CN103163746B CN103163746B (zh) 2015-09-30
CN103163746B8 true CN103163746B8 (zh) 2016-07-13

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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1521121A2 (en) * 2003-10-02 2005-04-06 Canon Kabushiki Kaisha Cooling technique
CN1808277A (zh) * 2006-03-28 2006-07-26 上海微电子装备有限公司 同轴对准信号采集和处理控制方法及其关键子系统
EP1736831A1 (en) * 2005-06-21 2006-12-27 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
CN101276150A (zh) * 2008-03-21 2008-10-01 上海微电子装备有限公司 一种步进重复曝光装置
CN101286011A (zh) * 2008-05-30 2008-10-15 上海微电子装备有限公司 光刻设备的探测装置、探测方法及制造方法
CN102162747A (zh) * 2010-12-26 2011-08-24 河海大学常州校区 一种光电传感器信号处理电路

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1521121A2 (en) * 2003-10-02 2005-04-06 Canon Kabushiki Kaisha Cooling technique
EP1736831A1 (en) * 2005-06-21 2006-12-27 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
CN1808277A (zh) * 2006-03-28 2006-07-26 上海微电子装备有限公司 同轴对准信号采集和处理控制方法及其关键子系统
CN101276150A (zh) * 2008-03-21 2008-10-01 上海微电子装备有限公司 一种步进重复曝光装置
CN101286011A (zh) * 2008-05-30 2008-10-15 上海微电子装备有限公司 光刻设备的探测装置、探测方法及制造方法
CN102162747A (zh) * 2010-12-26 2011-08-24 河海大学常州校区 一种光电传感器信号处理电路

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CN103163746B (zh) 2015-09-30
CN103163746A (zh) 2013-06-19

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C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
C53 Correction of patent for invention or patent application
CI01 Correction of invention patent gazette

Correction item: Patentee

Correct: Shanghai Micro Electronics Equipment Co., Ltd.|Shanghai Micro And High Precision Mechine Engineering Co., Ltd.

False: Shanghai Micro Electronics Equipment Co., Ltd.|Shanghai Nanpre Mechanics Technology Co., Ltd.

Number: 39

Volume: 31

CI03 Correction of invention patent

Correction item: Patentee

Correct: Shanghai Micro Electronics Equipment Co., Ltd.|Shanghai Micro And High Precision Mechine Engineering Co., Ltd.

False: Shanghai Micro Electronics Equipment Co., Ltd.|Shanghai Nanpre Mechanics Technology Co., Ltd.

Number: 39

Page: The title page

Volume: 31

ERR Gazette correction
CP01 Change in the name or title of a patent holder

Address after: 201203 Shanghai Zhangjiang High Tech Park of Pudong New Area Zhang Road No. 1525

Co-patentee after: Shanghai Micro And High Precision Mechine Engineering Co., Ltd.

Patentee after: Shanghai microelectronics equipment (Group) Limited by Share Ltd

Address before: 201203 Shanghai Zhangjiang High Tech Park of Pudong New Area Zhang Road No. 1525

Co-patentee before: Shanghai Micro And High Precision Mechine Engineering Co., Ltd.

Patentee before: Shanghai Micro Electronics Equipment Co., Ltd.

CP01 Change in the name or title of a patent holder