SG128574A1 - Method and apparatus for manufacturing magnetic recording media - Google Patents
Method and apparatus for manufacturing magnetic recording mediaInfo
- Publication number
- SG128574A1 SG128574A1 SG200603823A SG200603823A SG128574A1 SG 128574 A1 SG128574 A1 SG 128574A1 SG 200603823 A SG200603823 A SG 200603823A SG 200603823 A SG200603823 A SG 200603823A SG 128574 A1 SG128574 A1 SG 128574A1
- Authority
- SG
- Singapore
- Prior art keywords
- ferromagnetic material
- magnetic recording
- onto
- flattening film
- recording media
- Prior art date
Links
- 230000005291 magnetic effect Effects 0.000 title abstract 2
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 238000000034 method Methods 0.000 title abstract 2
- 239000003302 ferromagnetic material Substances 0.000 abstract 4
- 238000005530 etching Methods 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- 238000010884 ion-beam technique Methods 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 239000002245 particle Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F4/00—Processes for removing metallic material from surfaces, not provided for in group C23F1/00 or C23F3/00
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/012—Recording on, or reproducing or erasing from, magnetic disks
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/74—Record carriers characterised by the form, e.g. sheet shaped to wrap around a drum
- G11B5/743—Patterned record carriers, wherein the magnetic recording layer is patterned into magnetic isolated data islands, e.g. discrete tracks
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/74—Record carriers characterised by the form, e.g. sheet shaped to wrap around a drum
- G11B5/82—Disk carriers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/855—Coating only part of a support with a magnetic layer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/304—Controlling tubes
- H01J2237/30466—Detecting endpoint of process
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/317—Processing objects on a microscale
- H01J2237/3174—Etching microareas
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005188388A JP4634874B2 (ja) | 2005-06-28 | 2005-06-28 | 磁気記録媒体の製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
SG128574A1 true SG128574A1 (en) | 2007-01-30 |
Family
ID=37588216
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200603823A SG128574A1 (en) | 2005-06-28 | 2006-06-09 | Method and apparatus for manufacturing magnetic recording media |
Country Status (4)
Country | Link |
---|---|
US (2) | US7771602B2 (ja) |
JP (1) | JP4634874B2 (ja) |
CN (1) | CN100446090C (ja) |
SG (1) | SG128574A1 (ja) |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4076889B2 (ja) * | 2003-03-26 | 2008-04-16 | Tdk株式会社 | 磁気記録媒体の製造方法 |
JP4626611B2 (ja) * | 2006-02-22 | 2011-02-09 | Tdk株式会社 | 磁気記録媒体の製造方法 |
CN100511431C (zh) | 2006-02-22 | 2009-07-08 | Tdk股份有限公司 | 磁记录介质的制造方法 |
JP4626612B2 (ja) * | 2006-02-23 | 2011-02-09 | Tdk株式会社 | 磁気記録媒体の製造方法 |
CN100545914C (zh) * | 2006-02-23 | 2009-09-30 | Tdk股份有限公司 | 磁记录介质的制造方法 |
JP4296204B2 (ja) * | 2007-03-26 | 2009-07-15 | 株式会社東芝 | 磁気記録媒体 |
JP2008282512A (ja) * | 2007-05-14 | 2008-11-20 | Toshiba Corp | 磁気記録媒体及び磁気記録再生装置 |
JP2008299964A (ja) * | 2007-05-31 | 2008-12-11 | Hitachi Ltd | 磁気ディスク及びその製造方法 |
JP4703608B2 (ja) * | 2007-06-28 | 2011-06-15 | 株式会社東芝 | ディスクリートトラック媒体の製造方法 |
JP2009009652A (ja) * | 2007-06-28 | 2009-01-15 | Toshiba Corp | 磁気記録媒体の製造方法 |
JP2009016375A (ja) * | 2007-06-29 | 2009-01-22 | Oki Electric Ind Co Ltd | 半導体装置の製造方法及び装置 |
JP4703609B2 (ja) | 2007-06-29 | 2011-06-15 | 株式会社東芝 | 磁気記録媒体の製造方法 |
JP4382843B2 (ja) * | 2007-09-26 | 2009-12-16 | 株式会社東芝 | 磁気記録媒体およびその製造方法 |
JP5464753B2 (ja) | 2007-12-06 | 2014-04-09 | インテバック・インコーポレイテッド | 基板を両面スパッタエッチングするシステム及び方法 |
US7898755B2 (en) | 2008-04-16 | 2011-03-01 | Hitachi High-Technologies Corporation | Method for measuring write width and/or read width of a composite magnetic head and a measuring device using the method |
JP5302806B2 (ja) | 2008-07-23 | 2013-10-02 | 株式会社日立ハイテクノロジーズ | 複合磁気ヘッドにおけるヘッド間のオフセット量測定方法および測定装置 |
JP2010049784A (ja) | 2008-07-23 | 2010-03-04 | Hitachi High-Technologies Corp | 複合磁気ヘッドの書込/読出幅測定方法および測定装置 |
US7969679B2 (en) | 2009-02-03 | 2011-06-28 | Hitachi High-Technologies Corporation | Servo area test method of a magnetic recording medium and a test device |
JP5457871B2 (ja) | 2009-02-23 | 2014-04-02 | 株式会社日立ハイテクノロジーズ | 偏心したトラックに対するヘッド位置決め方法およびヘッド位置決め制御装置 |
US8492009B1 (en) | 2009-08-25 | 2013-07-23 | Wd Media, Inc. | Electrochemical etching of magnetic recording layer |
JP5121902B2 (ja) * | 2010-09-10 | 2013-01-16 | 株式会社東芝 | 磁気記録媒体 |
US10084032B2 (en) * | 2017-01-13 | 2018-09-25 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor structure and method |
CN107123433A (zh) * | 2017-04-03 | 2017-09-01 | 复旦大学 | 一种交换耦合复合磁记录介质及其制备方法 |
Family Cites Families (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5996643A (ja) | 1982-11-24 | 1984-06-04 | Hitachi Ltd | 質量分析装置 |
US4662985A (en) | 1985-03-27 | 1987-05-05 | Fuji Photo Film Co., Ltd. | Method of smoothing out an irregular surface of an electronic device |
JP2919899B2 (ja) * | 1990-02-28 | 1999-07-19 | 株式会社日立製作所 | 終点検出方法およびその装置 |
US5516031A (en) | 1991-02-19 | 1996-05-14 | Hitachi, Ltd. | Soldering method and apparatus for use in connecting electronic circuit devices |
US5412224A (en) | 1992-06-08 | 1995-05-02 | Motorola, Inc. | Field effect transistor with non-linear transfer characteristic |
JPH06244150A (ja) * | 1993-02-15 | 1994-09-02 | Sharp Corp | エッチング終点検出方法 |
JPH07221441A (ja) | 1994-02-03 | 1995-08-18 | Hitachi Ltd | はんだ付け前処理装置 |
JPH10209128A (ja) | 1997-01-23 | 1998-08-07 | Sony Corp | 平坦化終点検出方法 |
JPH11265878A (ja) * | 1998-01-27 | 1999-09-28 | Internatl Business Mach Corp <Ibm> | 残留ガス分析により終点検出を提供する方法及び装置 |
JP3719026B2 (ja) * | 1998-12-28 | 2005-11-24 | 富士通株式会社 | 磁気記録媒体とその製造方法 |
JP2000285409A (ja) * | 1999-03-29 | 2000-10-13 | Toshiba Corp | 磁気ヘッドの製造方法および磁気ヘッド |
US6238582B1 (en) | 1999-03-30 | 2001-05-29 | Veeco Instruments, Inc. | Reactive ion beam etching method and a thin film head fabricated using the method |
KR100463616B1 (ko) * | 2000-08-31 | 2004-12-29 | 가부시끼가이샤 도시바 | 요크형 자기 헤드 및 자기 디스크 유닛 |
JP2005527101A (ja) | 2001-08-21 | 2005-09-08 | シーゲイト テクノロジー エルエルシー | 炭素ベースのガスを用いる磁気薄膜のイオンビームエッチング選択性の向上 |
JP2003075378A (ja) * | 2001-09-06 | 2003-03-12 | Nagoya Industrial Science Research Inst | 二次イオン分析装置及びイオンビームスパッタ装置 |
JP4109475B2 (ja) * | 2002-03-26 | 2008-07-02 | パイオニア株式会社 | 誘電体記録媒体とその製造方法及びその製造装置 |
US7147790B2 (en) * | 2002-11-27 | 2006-12-12 | Komag, Inc. | Perpendicular magnetic discrete track recording disk |
US7300595B2 (en) * | 2003-12-25 | 2007-11-27 | Tdk Corporation | Method for filling concave portions of concavo-convex pattern and method for manufacturing magnetic recording medium |
JP4775806B2 (ja) * | 2004-02-10 | 2011-09-21 | Tdk株式会社 | 磁気記録媒体の製造方法 |
US7159302B2 (en) * | 2004-03-31 | 2007-01-09 | Hitachi Global Storage Technologies Netherlands B.V. | Method for manufacturing a perpendicular write head |
US7320170B2 (en) * | 2004-04-20 | 2008-01-22 | Headway Technologies, Inc. | Xenon ion beam to improve track width definition |
JP2006012332A (ja) * | 2004-06-28 | 2006-01-12 | Tdk Corp | ドライエッチング方法、磁気記録媒体の製造方法及び磁気記録媒体 |
US7186348B2 (en) * | 2004-06-30 | 2007-03-06 | Hitachi Global Storage Technologies Netherlands B.V. | Method for fabricating a pole tip in a magnetic transducer |
US7623325B2 (en) * | 2005-09-29 | 2009-11-24 | Hitachi Global Storage Technologies Netherlands B.V. | Method for providing an endpoint layer for ion milling of top of read sensor having top lead connection and sensor formed thereby |
US7562437B2 (en) * | 2006-04-25 | 2009-07-21 | Hitachi Global Storage Technologies Netherlands B.V. | Method of manufacturing a wrap around shield for a perpendicular write pole using a laminated mask |
-
2005
- 2005-06-28 JP JP2005188388A patent/JP4634874B2/ja active Active
-
2006
- 2006-06-09 SG SG200603823A patent/SG128574A1/en unknown
- 2006-06-27 CN CNB2006100942304A patent/CN100446090C/zh not_active Expired - Fee Related
- 2006-06-28 US US11/475,873 patent/US7771602B2/en not_active Expired - Fee Related
-
2010
- 2010-07-02 US US12/829,450 patent/US8221637B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US8221637B2 (en) | 2012-07-17 |
JP4634874B2 (ja) | 2011-02-16 |
US20100264019A1 (en) | 2010-10-21 |
CN100446090C (zh) | 2008-12-24 |
JP2007012119A (ja) | 2007-01-18 |
CN1892833A (zh) | 2007-01-10 |
US20070000861A1 (en) | 2007-01-04 |
US7771602B2 (en) | 2010-08-10 |
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