SG11201701805QA - Pellicle, production method thereof, exposure method - Google Patents
Pellicle, production method thereof, exposure methodInfo
- Publication number
- SG11201701805QA SG11201701805QA SG11201701805QA SG11201701805QA SG11201701805QA SG 11201701805Q A SG11201701805Q A SG 11201701805QA SG 11201701805Q A SG11201701805Q A SG 11201701805QA SG 11201701805Q A SG11201701805Q A SG 11201701805QA SG 11201701805Q A SG11201701805Q A SG 11201701805QA
- Authority
- SG
- Singapore
- Prior art keywords
- pellicle
- exposure
- production method
- production
- exposure method
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
- G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2008—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective means used
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
- G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- Health & Medical Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014191930 | 2014-09-19 | ||
JP2014233128 | 2014-11-17 | ||
PCT/JP2015/076568 WO2016043292A1 (fr) | 2014-09-19 | 2015-09-17 | Pellicule, procédé de fabrication de cette pellicule et procédé d'exposition |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11201701805QA true SG11201701805QA (en) | 2017-04-27 |
Family
ID=55533328
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201701805QA SG11201701805QA (en) | 2014-09-19 | 2015-09-17 | Pellicle, production method thereof, exposure method |
Country Status (8)
Country | Link |
---|---|
US (1) | US10488751B2 (fr) |
EP (1) | EP3196699A4 (fr) |
JP (1) | JP6275270B2 (fr) |
KR (1) | KR101915912B1 (fr) |
CN (2) | CN113917783B (fr) |
SG (1) | SG11201701805QA (fr) |
TW (1) | TWI693467B (fr) |
WO (1) | WO2016043292A1 (fr) |
Families Citing this family (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2016043301A1 (fr) * | 2014-09-19 | 2016-03-24 | 三井化学株式会社 | Pellicule, procédé de fabrication de cette pellicule et procédé d'exposition utilisant cette pellicule |
SG11201701805QA (en) | 2014-09-19 | 2017-04-27 | Mitsui Chemicals Inc | Pellicle, production method thereof, exposure method |
CN108699687B (zh) * | 2016-02-19 | 2022-03-01 | 爱沃特株式会社 | 化合物半导体基板、表膜、和化合物半导体基板的制造方法 |
CN109416503B (zh) | 2016-07-05 | 2023-06-09 | 三井化学株式会社 | 防护膜、防护膜组件框体、防护膜组件、其制造方法、曝光原版、曝光装置、半导体装置的制造方法 |
US10001701B1 (en) * | 2016-12-15 | 2018-06-19 | Taiwan Semiconductor Manufacturing Co., Ltd. | Pellicle structures and methods of fabricating thereof |
WO2018151056A1 (fr) * | 2017-02-17 | 2018-08-23 | 三井化学株式会社 | Pellicule, plaque originale d'exposition, dispositif d'exposition et procédé de fabrication de dispositif semi-conducteur |
EP3404485B1 (fr) * | 2017-05-15 | 2019-07-03 | IMEC vzw | Système de réticule lithographique |
JP2018200380A (ja) * | 2017-05-26 | 2018-12-20 | 日本特殊陶業株式会社 | ペリクル枠及びその製造方法 |
JP7451442B2 (ja) * | 2017-10-10 | 2024-03-18 | 信越化学工業株式会社 | Euv用ペリクルフレームの通気構造、euv用ペリクル、euv用ペリクル付露光原版、露光方法及び半導体の製造方法 |
JP7357432B2 (ja) | 2017-10-10 | 2023-10-06 | 信越化学工業株式会社 | Euv用ペリクルフレーム、ペリクル、ペリクル付露光原版、露光方法、及び半導体の製造方法 |
US11314163B2 (en) | 2017-10-27 | 2022-04-26 | Asml Netherlands B.V. | Pellicle frame and pellicle assembly |
EP3764161A4 (fr) * | 2018-03-05 | 2021-12-01 | Mitsui Chemicals, Inc. | Pellicule, matrice d'exposition, dispositif d'exposition et procédé de fabrication de dispositif semi-conducteur |
JP7019472B2 (ja) * | 2018-03-22 | 2022-02-15 | 三井化学株式会社 | カーボンナノチューブ自立膜の製造方法、およびペリクルの製造方法 |
KR102465834B1 (ko) * | 2018-03-27 | 2022-11-11 | 미쯔이가가꾸가부시끼가이샤 | 펠리클용 지지 프레임, 펠리클 및 그의 제조 방법, 그리고 이것들을 사용한 노광 원판, 반도체 장치의 제조 방법 |
KR102459119B1 (ko) * | 2018-06-12 | 2022-10-26 | 미쯔이가가꾸가부시끼가이샤 | 펠리클용 지지 프레임, 펠리클 및 펠리클용 지지 프레임의 제조 방법, 그리고 펠리클을 사용한 노광 원판 및 노광 장치 |
TWI670562B (zh) * | 2018-06-21 | 2019-09-01 | 美商微相科技股份有限公司 | 光罩保護組件結構 |
WO2020009169A1 (fr) * | 2018-07-04 | 2020-01-09 | 日本特殊陶業株式会社 | Cadre de pellicule |
JP7111566B2 (ja) * | 2018-09-07 | 2022-08-02 | 日本特殊陶業株式会社 | ペリクル枠及びペリクル |
TWI687760B (zh) * | 2019-04-16 | 2020-03-11 | 家登精密工業股份有限公司 | 具有擾流結構的光罩盒 |
KR102207853B1 (ko) * | 2019-06-27 | 2021-01-27 | 주식회사 에프에스티 | 펠리클용 벤트 필터 및 이를 포함하는 펠리클 |
TWM621314U (zh) | 2020-05-14 | 2021-12-21 | 日商信越化學工業股份有限公司 | 防護薄膜框架、防護薄膜、帶防護薄膜的曝光原版、極紫外線曝光裝置、曝光裝置、曝光系統、半導體的製造系統及液晶顯示板的製造系統 |
CN117261271B (zh) * | 2023-11-20 | 2024-02-20 | 深圳市龙图光罩股份有限公司 | 掩模版贴膜方法、装置及存储介质 |
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WO2015166927A1 (fr) * | 2014-05-02 | 2015-11-05 | 三井化学株式会社 | Cadre de pellicule, pellicule et son procédé de fabrication, plaque originale d'exposition et son procédé de fabrication, dispositif d'exposition et procédé de fabrication de dispositif à semi-conducteur |
JP6423730B2 (ja) * | 2014-05-26 | 2018-11-14 | 三井化学株式会社 | ペリクル用の支持枠 |
SG11201701805QA (en) | 2014-09-19 | 2017-04-27 | Mitsui Chemicals Inc | Pellicle, production method thereof, exposure method |
WO2016043301A1 (fr) * | 2014-09-19 | 2016-03-24 | 三井化学株式会社 | Pellicule, procédé de fabrication de cette pellicule et procédé d'exposition utilisant cette pellicule |
SG11201705304PA (en) | 2015-02-24 | 2017-07-28 | Mitsui Chemicals Inc | Pellicle film, pellicle frame, and pellicle and method for producing same |
EP3079013B1 (fr) | 2015-03-30 | 2018-01-24 | Shin-Etsu Chemical Co., Ltd. | Pellicule |
EP3291006A4 (fr) * | 2015-04-27 | 2019-01-23 | Mitsui Chemicals, Inc. | Procédé de fabrication de pellicule et procédé de fabrication d'un photomasque au moyen d'une pellicule |
-
2015
- 2015-09-17 SG SG11201701805QA patent/SG11201701805QA/en unknown
- 2015-09-17 EP EP15841815.2A patent/EP3196699A4/fr not_active Withdrawn
- 2015-09-17 CN CN202111214914.4A patent/CN113917783B/zh active Active
- 2015-09-17 WO PCT/JP2015/076568 patent/WO2016043292A1/fr active Application Filing
- 2015-09-17 JP JP2016548957A patent/JP6275270B2/ja active Active
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JP6275270B2 (ja) | 2018-02-07 |
EP3196699A1 (fr) | 2017-07-26 |
CN106662806A (zh) | 2017-05-10 |
US10488751B2 (en) | 2019-11-26 |
US20170184956A1 (en) | 2017-06-29 |
EP3196699A4 (fr) | 2018-05-16 |
CN106662806B (zh) | 2021-11-05 |
WO2016043292A1 (fr) | 2016-03-24 |
KR101915912B1 (ko) | 2018-11-06 |
KR20170038907A (ko) | 2017-04-07 |
TWI693467B (zh) | 2020-05-11 |
JPWO2016043292A1 (ja) | 2017-06-29 |
CN113917783A (zh) | 2022-01-11 |
CN113917783B (zh) | 2023-12-19 |
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