SG10201509458RA - Wafer producing method - Google Patents

Wafer producing method

Info

Publication number
SG10201509458RA
SG10201509458RA SG10201509458RA SG10201509458RA SG10201509458RA SG 10201509458R A SG10201509458R A SG 10201509458RA SG 10201509458R A SG10201509458R A SG 10201509458RA SG 10201509458R A SG10201509458R A SG 10201509458RA SG 10201509458R A SG10201509458R A SG 10201509458RA
Authority
SG
Singapore
Prior art keywords
producing method
wafer producing
wafer
producing
Prior art date
Application number
SG10201509458RA
Inventor
Hirata Kazuya
Takahashi Kunimitsu
Nishino Yoko
Original Assignee
Disco Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Disco Corp filed Critical Disco Corp
Publication of SG10201509458RA publication Critical patent/SG10201509458RA/en

Links

SG10201509458RA 2014-12-04 2015-11-17 Wafer producing method SG10201509458RA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014246233A JP6300710B2 (en) 2014-12-04 2014-12-04 Change impact analysis apparatus, change impact analysis method and program

Publications (1)

Publication Number Publication Date
SG10201509458RA true SG10201509458RA (en) 2016-07-28

Family

ID=56124277

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10201509458RA SG10201509458RA (en) 2014-12-04 2015-11-17 Wafer producing method

Country Status (2)

Country Link
JP (1) JP6300710B2 (en)
SG (1) SG10201509458RA (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6310527B1 (en) * 2016-10-27 2018-04-11 株式会社Ｄｔｓインサイト Object analysis apparatus, object analysis method, and program
JP6824053B2 (en) * 2017-01-26 2021-02-03 三菱電機株式会社 Relationship analyzer and relationship analysis program
GB2573417B (en) 2017-02-16 2021-11-24 Mitsubishi Electric Corp Scale calculation apparatus and scale calculation program
JP7085938B2 (en) * 2018-08-03 2022-06-17 三菱電機株式会社 Change impact analyzer
JP7199555B2 (en) * 2019-09-19 2023-01-05 三菱電機株式会社 CHANGE IMPACT ANALYSIS DEVICE, CHANGE IMPACT ANALYSIS SYSTEM AND CHANGE IMPACT ANALYSIS METHOD
JP7370264B2 (en) 2020-01-30 2023-10-27 三菱電機株式会社 Traceability management device, traceability management method, and traceability management program
JP7391740B2 (en) * 2020-03-19 2023-12-05 株式会社日立製作所 Impact identification support device and impact identification support method
CN111580852B (en) * 2020-04-29 2023-05-23 北京广利核系统工程有限公司 Method and system for identifying software change influence range

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000112611A (en) * 1998-10-02 2000-04-21 Ricoh Co Ltd Method for displaying software development document and storage medium
JP2007122135A (en) * 2005-10-25 2007-05-17 Hitachi Ltd Development support device, development support method and development support program
WO2012036304A1 (en) * 2010-09-16 2012-03-22 日本電気株式会社 Operation verification support device, operation verification support method, and operation verification support program
JP2013125466A (en) * 2011-12-15 2013-06-24 Mitsubishi Electric Corp Influence degree analyzer, influence degree analysis method and program
JP2013246644A (en) * 2012-05-25 2013-12-09 Mitsubishi Electric Corp Software object correction support device, software object correction support method and program

Also Published As

Publication number Publication date
JP2016110330A (en) 2016-06-20
JP6300710B2 (en) 2018-03-28

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