JPS6344824Y2 - - Google Patents
Info
- Publication number
- JPS6344824Y2 JPS6344824Y2 JP1985028524U JP2852485U JPS6344824Y2 JP S6344824 Y2 JPS6344824 Y2 JP S6344824Y2 JP 1985028524 U JP1985028524 U JP 1985028524U JP 2852485 U JP2852485 U JP 2852485U JP S6344824 Y2 JPS6344824 Y2 JP S6344824Y2
- Authority
- JP
- Japan
- Prior art keywords
- pellicle
- reticle
- dust
- film
- rubber layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000010410 layer Substances 0.000 claims description 15
- 238000003780 insertion Methods 0.000 claims description 12
- 230000037431 insertion Effects 0.000 claims description 12
- 239000012790 adhesive layer Substances 0.000 claims description 6
- 239000000428 dust Substances 0.000 description 13
- 239000010408 film Substances 0.000 description 12
- 238000000034 method Methods 0.000 description 6
- 239000011651 chromium Substances 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 229910000838 Al alloy Inorganic materials 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 238000007689 inspection Methods 0.000 description 3
- 239000000020 Nitrocellulose Substances 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 230000002950 deficient Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229920001220 nitrocellulos Polymers 0.000 description 2
- 238000001259 photo etching Methods 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- QDOXWKRWXJOMAK-UHFFFAOYSA-N dichromium trioxide Chemical compound O=[Cr]O[Cr]=O QDOXWKRWXJOMAK-UHFFFAOYSA-N 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000010365 information processing Effects 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 238000011179 visual inspection Methods 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985028524U JPS6344824Y2 (fr) | 1985-02-28 | 1985-02-28 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985028524U JPS6344824Y2 (fr) | 1985-02-28 | 1985-02-28 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61145936U JPS61145936U (fr) | 1986-09-09 |
| JPS6344824Y2 true JPS6344824Y2 (fr) | 1988-11-21 |
Family
ID=30526478
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1985028524U Expired JPS6344824Y2 (fr) | 1985-02-28 | 1985-02-28 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6344824Y2 (fr) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103246157A (zh) * | 2013-05-21 | 2013-08-14 | 上海和辉光电有限公司 | 防尘薄膜框架、光学掩膜版及其安装方法 |
| SG11201701805QA (en) | 2014-09-19 | 2017-04-27 | Mitsui Chemicals Inc | Pellicle, production method thereof, exposure method |
| WO2016043301A1 (fr) * | 2014-09-19 | 2016-03-24 | 三井化学株式会社 | Pellicule, procédé de fabrication de cette pellicule et procédé d'exposition utilisant cette pellicule |
| JP6274079B2 (ja) * | 2014-11-04 | 2018-02-07 | 日本軽金属株式会社 | ペリクル用支持枠および製造方法 |
| KR20230146669A (ko) | 2014-11-17 | 2023-10-19 | 에이에스엠엘 네델란즈 비.브이. | 마스크 조립체 |
| CA2975806A1 (fr) * | 2015-02-03 | 2016-08-11 | Asml Netherlands B.V. | Ensemble a masque et procedes associes |
-
1985
- 1985-02-28 JP JP1985028524U patent/JPS6344824Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61145936U (fr) | 1986-09-09 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US8067132B2 (en) | Photomask and exposure method | |
| US4174219A (en) | Method of making a negative exposure mask | |
| KR100779956B1 (ko) | 포토마스크 블랭크 및 포토마스크 제조방법 | |
| TWI286795B (en) | Manufacturing method for semiconductor integrated circuit device | |
| JPS6344824Y2 (fr) | ||
| KR100526527B1 (ko) | 포토마스크와 그를 이용한 마스크 패턴 형성 방법 | |
| JP2555783B2 (ja) | レチクル・マスクの防塵方法 | |
| JPS6250758A (ja) | パタ−ン形成方法 | |
| JPH02269343A (ja) | 半導体集積回路装置の製造方法 | |
| JPH03179351A (ja) | フォトマスクの製造方法 | |
| JPH03271738A (ja) | フォトマスクの製造方法 | |
| JPH08114911A (ja) | フォトマスク用ペリクル及びフォトマスク | |
| JPH0440456A (ja) | フォトマスクの製造方法 | |
| JPS6053871B2 (ja) | 露光方法 | |
| JPS62128121A (ja) | 半導体装置の製造方法 | |
| JPH05188578A (ja) | フォトマスク、及び、半導体装置の製造方法 | |
| JPS60235422A (ja) | マスクパタ−ンの欠陥修正方法 | |
| JPS60159852A (ja) | フオト・マスク | |
| JPS6354722A (ja) | フオトリソグラフイ用ワ−キングマスクの製造方法 | |
| JPS6231855A (ja) | ペリクル付マスクブランク | |
| JPS6315249A (ja) | 光学マスクの製造方法 | |
| JPH02166448A (ja) | パターン修正方法 | |
| JPH05265179A (ja) | フォトマスク及びその製造方法 | |
| JPH04174846A (ja) | マスク保護部材 | |
| JPS60122946A (ja) | フォト・マスク |