KR960009822A - 대전방지방법 및 대전방지용 이온 빔장치 - Google Patents

대전방지방법 및 대전방지용 이온 빔장치 Download PDF

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KR960009822A
KR960009822A KR1019940016157A KR19940016157A KR960009822A KR 960009822 A KR960009822 A KR 960009822A KR 1019940016157 A KR1019940016157 A KR 1019940016157A KR 19940016157 A KR19940016157 A KR 19940016157A KR 960009822 A KR960009822 A KR 960009822A
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South Korea
Prior art keywords
ion beam
irradiated object
antistatic
irradiating
generating means
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KR1019940016157A
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English (en)
Inventor
신이찌 다찌
사다유끼 오꾸다이라
가즈노리 쯔지모또
기이찌로 무까이
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미다 가쓰시게
가부시끼가이샤 히다찌세이사꾸쇼
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Priority claimed from JP61018017A external-priority patent/JPH088234B2/ja
Priority claimed from JP61102028A external-priority patent/JPS62260327A/ja
Priority claimed from JP61133651A external-priority patent/JPS62291030A/ja
Application filed by 미다 가쓰시게, 가부시끼가이샤 히다찌세이사꾸쇼 filed Critical 미다 가쓰시게
Publication of KR960009822A publication Critical patent/KR960009822A/ko

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    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
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Abstract

반도체물질의 표면의 고정밀도 에칭, 표면의 개질 또는 박막퇴적에 적합한 대전방지방법 및 대전방지용 이온빔 장치로서, 피가공물의 대전에 의한 표면의 파괴나 전하등을 방지헤서 각종 처리를 실행하기 위해, 이온발생 수단에서 인출한 이온빔을 피조사물에 조사하고 전자발생수단에 의해 발생된 전자를 피조사물에 조사하는 공정을 마련하고 피조사물에 있어서의 이온빔이 조사에 의한 대전을 전자의 대전에 의해서 방지하며. 또한 이온발생수단, 이온발생수단에 의해서 발생된 이온을 이온빔으로서 인출해서 피조사물에 조사하는 수단 및 피조사물에 전자를 조사하는 수단을 구비한다.
상기와 같은 구성에 의해, 절연용박막의 특성의 저하등과 같은 표면의 손상을 방지하고, 피가공물의 대전에 의한 표면의 파괴나 저하 등을 방지할 수 있다.
선택도 : 제4도

Description

대전방지방법 및 대전방지용 이온 빔장치
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제4도는 본 발명의 다른 실시예를 도시한 모식도.

Claims (2)

  1. 이온발생수단에 인출한 이온빔을 피조사물에 조사하는 공정과 전자발생수단에 의해 발생된 전자를 상기 피조사물에 조사하는 공정을 포함하고, 상기 피조사물에 있어서의 상기 이온빔의 조사에 의한 대전을 상기 전자의 조사에 의해서 방지하는 것을 특징으로 하는 대전방지방법.
  2. 이온발생수단, 상기 이온발생수단에 의해서 발생된 이온을 이온 빔으로서 인출해서 피조사물에 조사하는 수단 및 상기 피조사물에 전자를 조사하는 수단을 구비하는 것을 특징으로 하는 대전장지용 이온빔장치.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019940016157A 1986-01-31 1994-07-06 대전방지방법 및 대전방지용 이온 빔장치 KR960009822A (ko)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP86-18017 1986-01-31
JP61018017A JPH088234B2 (ja) 1986-01-31 1986-01-31 表面処理方法
JP86-102028 1986-05-06
JP61102028A JPS62260327A (ja) 1986-05-06 1986-05-06 表面処理装置および表面処理方法
JP61133651A JPS62291030A (ja) 1986-06-11 1986-06-11 表面処理装置
JP96-133651 1986-06-11

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR1019870000364A Division KR940000915B1 (ko) 1986-01-31 1987-01-19 표면 처리방법

Publications (1)

Publication Number Publication Date
KR960009822A true KR960009822A (ko) 1996-03-22

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ID=27282052

Family Applications (3)

Application Number Title Priority Date Filing Date
KR1019870000364A KR940000915B1 (ko) 1986-01-31 1987-01-19 표면 처리방법
KR1019940016157A KR960009822A (ko) 1986-01-31 1994-07-06 대전방지방법 및 대전방지용 이온 빔장치
KR1019940016158A KR960009823A (ko) 1986-01-31 1994-07-06 에칭방법

Family Applications Before (1)

Application Number Title Priority Date Filing Date
KR1019870000364A KR940000915B1 (ko) 1986-01-31 1987-01-19 표면 처리방법

Family Applications After (1)

Application Number Title Priority Date Filing Date
KR1019940016158A KR960009823A (ko) 1986-01-31 1994-07-06 에칭방법

Country Status (2)

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US (1) US4857137A (ko)
KR (3) KR940000915B1 (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100515888B1 (ko) * 2002-11-04 2005-09-21 한국원자력연구소 이온빔조사에 의한 대전방지용 진공성형용기 제조방법

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US4857137A (en) 1989-08-15
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