KR940009260A - 마이크로 렌즈용 감방사선성 수지 조성물 - Google Patents
마이크로 렌즈용 감방사선성 수지 조성물 Download PDFInfo
- Publication number
- KR940009260A KR940009260A KR1019930021909A KR930021909A KR940009260A KR 940009260 A KR940009260 A KR 940009260A KR 1019930021909 A KR1019930021909 A KR 1019930021909A KR 930021909 A KR930021909 A KR 930021909A KR 940009260 A KR940009260 A KR 940009260A
- Authority
- KR
- South Korea
- Prior art keywords
- group
- general formula
- represented
- alkyl
- resin composition
- Prior art date
Links
- 230000005855 radiation Effects 0.000 title abstract 2
- 239000011342 resin composition Substances 0.000 title abstract 2
- 229920000877 Melamine resin Polymers 0.000 claims abstract 2
- 150000001875 compounds Chemical class 0.000 claims abstract 2
- 125000003700 epoxy group Chemical group 0.000 claims abstract 2
- 150000007974 melamines Chemical class 0.000 claims abstract 2
- 229920005989 resin Polymers 0.000 claims abstract 2
- 239000011347 resin Substances 0.000 claims abstract 2
- 150000003839 salts Chemical class 0.000 claims abstract 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 3
- 125000000217 alkyl group Chemical group 0.000 claims 2
- 229910052736 halogen Inorganic materials 0.000 claims 2
- 150000002367 halogens Chemical group 0.000 claims 2
- 125000000008 (C1-C10) alkyl group Chemical group 0.000 claims 1
- 229910018286 SbF 6 Inorganic materials 0.000 claims 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims 1
- -1 Trihalomethyl triazine Chemical compound 0.000 claims 1
- 125000003545 alkoxy group Chemical group 0.000 claims 1
- 125000004453 alkoxycarbonyl group Chemical group 0.000 claims 1
- 125000005196 alkyl carbonyloxy group Chemical group 0.000 claims 1
- 125000004414 alkyl thio group Chemical group 0.000 claims 1
- 125000003118 aryl group Chemical group 0.000 claims 1
- 125000004104 aryloxy group Chemical group 0.000 claims 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims 1
- 125000004093 cyano group Chemical group *C#N 0.000 claims 1
- QEWYKACRFQMRMB-UHFFFAOYSA-N fluoroacetic acid Chemical compound OC(=O)CF QEWYKACRFQMRMB-UHFFFAOYSA-N 0.000 claims 1
- 229910052739 hydrogen Inorganic materials 0.000 claims 1
- 239000001257 hydrogen Substances 0.000 claims 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 claims 1
- IDBIFFKSXLYUOT-UHFFFAOYSA-N netropsin Chemical compound C1=C(C(=O)NCCC(N)=N)N(C)C=C1NC(=O)C1=CC(NC(=O)CN=C(N)N)=CN1C IDBIFFKSXLYUOT-UHFFFAOYSA-N 0.000 claims 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims 1
- 229910052717 sulfur Inorganic materials 0.000 claims 1
- 239000011593 sulfur Substances 0.000 claims 1
- 125000001302 tertiary amino group Chemical group 0.000 claims 1
- 125000005000 thioaryl group Chemical group 0.000 claims 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 claims 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-M triflate Chemical compound [O-]S(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-M 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- 230000035945 sensitivity Effects 0.000 abstract 1
- 239000002904 solvent Substances 0.000 abstract 1
- 125000004953 trihalomethyl group Chemical group 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L101/00—Compositions of unspecified macromolecular compounds
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Materials For Photolithography (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
Abstract
(구성) (a)알킬기 가용성 수지, (b) 1,2-퀴논디아지드 화합물, (c)에폭시기를 분자 내에 2개 이상 함유하는 화합물, (d)멜라민류 및 (e)트리할로메틸트리아진류 또는 오늄염류를 함유하는 마이크로 렌즈용 방사선 감응성 수지 조성물.
(효과) 렌즈 패턴 형성시에 고감도, 고해상도, 고잔막률이라는 우수한 성능을 나타내며, 또한, 마이크로 렌즈를 작성할 때의 가열 조건 의존성이 작고, 더 나아가 얻어진 마이크로 렌즈가 고굴절률이며, 서브 미크론 오더의 내열 변형성, 내용 제성, 투명성, 밑바탕과의 밀착성이 우수하다.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 레지스트 패턴의 단면 형상의 모식도.
Claims (1)
- (a)알칼리 가용성 수지, (b)1,2-퀴논디아지 화합물, (c)에폭시기를 분자내에 2개 이상 함유하는 화합물, (d)일반식(I)(식중, R1내지 R6은 동일하거나 상이해도 좋으며, 각각 수소 원자 또는 -CH2OR기를 나타내고, R은 수소 원자 또는 C1내지 C6의 알킬기를 나타낸다)로 나타내는 멜라민류 및 (e)일반식(II)(식중, X는 할로겐을 나타내고, A는 CX3또는 하기 일반식로 나타내는 기를 나타내고, B,D 및 E는 각각 독립적으로 수소, C1내지 C10의 알킬기, 아릴기 또는 알콕시기, 아릴옥시기, 티오알킬기, 티오아릴기, 할로겐, 시아노기, 니트로기, C1내지 C10알킬기를 갖는 3급 아미노기, 카르복실기, 수산기, C1내지 C10의 케토알킬기 또는 케토아릴기, C1내지 C20의 알콕시카르보닐기 또는 알킬카르보닐옥시기를 나타내고, m은 1 내지 5의 정수를 나타낸다)로 나타내는 트리할로메틸트리아진류 또는 일반식(III)(식중, A의 정의는 상기 식과 같으며, Z는 유황 또는 요오드를 나타내고, Y는 BF4, PF6, SbF6, A5F6, P-톨루엔 술포네이트, 트리플루오로메탄술포네이트 또는 트리플루오로아세테이트를 나타내고, n은 2또는 3을 나타낸다)로 나타내는 광산 발생제로서 기능하는 오늄염류를 함유하는 것을 특징으로 하는 마이크로 렌즈용 방사선 감응성 수지 조성물.※참고사항:최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP92-284585 | 1992-10-22 | ||
JP04284585A JP3114166B2 (ja) | 1992-10-22 | 1992-10-22 | マイクロレンズ用感放射線性樹脂組成物 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR940009260A true KR940009260A (ko) | 1994-05-20 |
KR100286879B1 KR100286879B1 (ko) | 2001-05-02 |
Family
ID=17680366
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019930021909A KR100286879B1 (ko) | 1992-10-22 | 1993-10-21 | 마이크로 렌즈용 감방사선성 수지 조성물 |
Country Status (5)
Country | Link |
---|---|
US (1) | US5432039A (ko) |
EP (1) | EP0594452B1 (ko) |
JP (1) | JP3114166B2 (ko) |
KR (1) | KR100286879B1 (ko) |
DE (1) | DE69307452T2 (ko) |
Families Citing this family (31)
Publication number | Priority date | Publication date | Assignee | Title |
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US6190833B1 (en) * | 1997-03-30 | 2001-02-20 | Jsr Corporation | Radiation-sensitive resin composition |
JP3650985B2 (ja) * | 1997-05-22 | 2005-05-25 | Jsr株式会社 | ネガ型感放射線性樹脂組成物およびパターン製造法 |
US5858615A (en) * | 1997-07-31 | 1999-01-12 | Morton International, Inc. | Hardenable photoimageable compositions |
US6168898B1 (en) * | 1998-02-17 | 2001-01-02 | Isola Laminate Systems Corp. | Positive acting photodielectric composition |
JP3796982B2 (ja) * | 1998-06-02 | 2006-07-12 | 住友化学株式会社 | ポジ型レジスト組成物 |
JP3952484B2 (ja) * | 1998-08-20 | 2007-08-01 | Jsr株式会社 | 表示パネルスペーサー用感放射線性樹脂組成物 |
US6617011B2 (en) * | 1999-05-07 | 2003-09-09 | Seagate Technology Llc | Elastomeric lubricants for magnetic recording media |
JP3931484B2 (ja) | 1999-06-03 | 2007-06-13 | 住友化学株式会社 | ポジ型フォトレジスト組成物 |
JP4678453B2 (ja) * | 2000-05-31 | 2011-04-27 | Dic株式会社 | 多価ヒドロキシ化合物とその製造方法、エポキシ樹脂組成物及びその硬化物 |
JP4678455B2 (ja) * | 2000-06-29 | 2011-04-27 | Dic株式会社 | 多価ヒドロキシ化合物とその製造方法、エポキシ樹脂組成物及びその硬化物 |
EP1312982A4 (en) * | 2000-07-27 | 2007-11-07 | Jsr Corp | RADIATION SENSITIVE COMPOSITION, INSULATING FILM AND ELECTROLUMINESCENCE SCREEN |
JP4042142B2 (ja) | 2000-09-08 | 2008-02-06 | Jsr株式会社 | El表示素子の隔壁形成用感放射線性樹脂組成物、隔壁およびel表示素子 |
TW555822B (en) * | 2001-03-15 | 2003-10-01 | Jsr Corp | Light diffuse reflecting film-forming composition, manufacturing method thereof, light diffuse reflecting film and liquid crystal display element |
JP3901997B2 (ja) * | 2001-11-27 | 2007-04-04 | 富士通株式会社 | レジスト材料、レジストパターン及びその製造方法、並びに、半導体装置及びその製造方法 |
JP3772733B2 (ja) * | 2001-11-28 | 2006-05-10 | Jsr株式会社 | 感放射線性樹脂組成物、それから形成された垂直配向型液晶表示素子の突起、およびそれを具備する液晶表示素子 |
US7022455B2 (en) * | 2001-12-28 | 2006-04-04 | Shipley Company, L.L.C. | Photoacid-labile polymers and photoresists comprising same |
KR100895364B1 (ko) * | 2002-01-23 | 2009-04-29 | 제이에스알 가부시끼가이샤 | 포지티브형 감광성 절연 수지 조성물 및 그의 경화물 |
CN100336137C (zh) * | 2002-01-28 | 2007-09-05 | 捷时雅株式会社 | 形成电介体的光敏组合物以及利用该组合物的电介体 |
AU2003227418A1 (en) | 2002-04-18 | 2003-10-27 | Nissan Chemical Industries, Ltd. | Positively photosensitive resin composition and method of pattern formation |
KR20040092550A (ko) * | 2003-04-24 | 2004-11-04 | 클라리언트 인터내셔널 리미티드 | 레지스트 조성물 및 레지스트 제거용 유기용제 |
JP4127150B2 (ja) * | 2003-07-31 | 2008-07-30 | Jsr株式会社 | 感放射線性樹脂組成物、層間絶縁膜およびマイクロレンズ、ならびにそれらの製造方法 |
JP2005179650A (ja) * | 2003-11-28 | 2005-07-07 | Sumitomo Chemical Co Ltd | 硬化性樹脂組成物および該組成物を用いて形成される保護膜 |
JP4322205B2 (ja) * | 2004-12-27 | 2009-08-26 | 東京応化工業株式会社 | レジスト保護膜形成用材料およびこれを用いたレジストパターン形成方法 |
JP2006251464A (ja) * | 2005-03-11 | 2006-09-21 | Tokyo Ohka Kogyo Co Ltd | レンズ形成用感光性樹脂組成物 |
JP4806988B2 (ja) * | 2005-07-26 | 2011-11-02 | Jnc株式会社 | ワニス組成物 |
JP5617275B2 (ja) * | 2009-02-26 | 2014-11-05 | 日本ゼオン株式会社 | 感放射線性樹脂組成物、樹脂膜、積層体及び電子部品 |
JP5676179B2 (ja) | 2010-08-20 | 2015-02-25 | 富士フイルム株式会社 | ポジ型感光性樹脂組成物、硬化膜の形成方法、硬化膜、有機el表示装置、及び、液晶表示装置 |
WO2012091817A1 (en) * | 2010-12-29 | 2012-07-05 | 3M Innovative Properties Company | Pressure-sensitive adhesives with triazine-epoxy crosslinking system |
KR102059430B1 (ko) * | 2011-08-09 | 2019-12-26 | 제이에스알 가부시끼가이샤 | 마이크로렌즈 어레이 및 입체 화상 표시 장치 |
DE102014208510A1 (de) | 2014-05-07 | 2015-11-12 | Bayerische Motoren Werke Aktiengesellschaft | Sensorring |
JP7450333B2 (ja) | 2018-12-21 | 2024-03-15 | Jsr株式会社 | 感放射線性樹脂組成物、及びマイクロレンズの形成方法 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3325022A1 (de) * | 1983-07-11 | 1985-01-24 | Hoechst Ag, 6230 Frankfurt | Verfahren zur herstellung negativer kopien mittels eines materials auf basis von 1,2-chinondiaziden |
CA2019693A1 (en) * | 1989-07-07 | 1991-01-07 | Karen Ann Graziano | Acid-hardening photoresists of improved sensitivity |
JPH03152543A (ja) * | 1989-10-23 | 1991-06-28 | Internatl Business Mach Corp <Ibm> | 塩基で現像可能なネガ階調ホトレジスト |
JP3092158B2 (ja) * | 1989-12-01 | 2000-09-25 | 東ソー株式会社 | レンズ形成用ポジ型感光材料 |
US5183722A (en) * | 1989-12-01 | 1993-02-02 | Tosoh Corporation | Positive photosensitive composition for forming lenses containing 1,2-naphthoquinone diazide sulfonate photosensitizer, alkali-soluble resin and thermosetting agent and process for producing the composition |
JP2583651B2 (ja) * | 1990-09-28 | 1997-02-19 | 東京応化工業株式会社 | ネガ型感放射線レジスト組成物 |
JP3003808B2 (ja) * | 1991-03-14 | 2000-01-31 | 東京応化工業株式会社 | マイクロレンズ及びその製造方法 |
US5362597A (en) * | 1991-05-30 | 1994-11-08 | Japan Synthetic Rubber Co., Ltd. | Radiation-sensitive resin composition comprising an epoxy-containing alkali-soluble resin and a naphthoquinone diazide sulfonic acid ester |
-
1992
- 1992-10-22 JP JP04284585A patent/JP3114166B2/ja not_active Expired - Lifetime
-
1993
- 1993-10-21 KR KR1019930021909A patent/KR100286879B1/ko not_active IP Right Cessation
- 1993-10-22 EP EP93308429A patent/EP0594452B1/en not_active Expired - Lifetime
- 1993-10-22 US US08/139,825 patent/US5432039A/en not_active Expired - Lifetime
- 1993-10-22 DE DE69307452T patent/DE69307452T2/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JP3114166B2 (ja) | 2000-12-04 |
KR100286879B1 (ko) | 2001-05-02 |
DE69307452T2 (de) | 1997-05-28 |
EP0594452B1 (en) | 1997-01-15 |
DE69307452D1 (de) | 1997-02-27 |
EP0594452A3 (en) | 1994-06-01 |
JPH06136239A (ja) | 1994-05-17 |
US5432039A (en) | 1995-07-11 |
EP0594452A2 (en) | 1994-04-27 |
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