DE69029978T2 - Melamin enthaltende Fotowiderstände mit hoher Empfindlichkeit - Google Patents

Melamin enthaltende Fotowiderstände mit hoher Empfindlichkeit

Info

Publication number
DE69029978T2
DE69029978T2 DE69029978T DE69029978T DE69029978T2 DE 69029978 T2 DE69029978 T2 DE 69029978T2 DE 69029978 T DE69029978 T DE 69029978T DE 69029978 T DE69029978 T DE 69029978T DE 69029978 T2 DE69029978 T2 DE 69029978T2
Authority
DE
Germany
Prior art keywords
high sensitivity
containing melamine
photo resistors
photoresists
resistors containing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69029978T
Other languages
English (en)
Other versions
DE69029978D1 (de
Inventor
Karen Ann Graziano
Leonard Edward Bogan
Robert James Olsen
Mcilnay Susan Elizabe Anderson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rohm and Haas Co
Original Assignee
Rohm and Haas Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm and Haas Co filed Critical Rohm and Haas Co
Application granted granted Critical
Publication of DE69029978D1 publication Critical patent/DE69029978D1/de
Publication of DE69029978T2 publication Critical patent/DE69029978T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Light Receiving Elements (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Medicines Containing Antibodies Or Antigens For Use As Internal Diagnostic Agents (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
DE69029978T 1989-07-07 1990-06-27 Melamin enthaltende Fotowiderstände mit hoher Empfindlichkeit Expired - Fee Related DE69029978T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US37671389A 1989-07-07 1989-07-07

Publications (2)

Publication Number Publication Date
DE69029978D1 DE69029978D1 (de) 1997-04-03
DE69029978T2 true DE69029978T2 (de) 1997-08-21

Family

ID=23486159

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69029978T Expired - Fee Related DE69029978T2 (de) 1989-07-07 1990-06-27 Melamin enthaltende Fotowiderstände mit hoher Empfindlichkeit

Country Status (15)

Country Link
US (1) US5376504A (de)
EP (1) EP0407086B1 (de)
JP (1) JP2985968B2 (de)
KR (1) KR0171578B1 (de)
CN (1) CN1048605A (de)
AT (1) ATE149256T1 (de)
AU (1) AU640938B2 (de)
BR (1) BR9003219A (de)
CA (1) CA2019693A1 (de)
DE (1) DE69029978T2 (de)
FI (1) FI903451A0 (de)
IE (1) IE902473A1 (de)
IL (1) IL94984A0 (de)
NO (1) NO902957L (de)
ZA (1) ZA904993B (de)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AT500298A1 (de) * 2002-06-14 2005-11-15 Agrolinz Melamin Gmbh Verfahren zur härtung von aminoplasten
DE102010027239A1 (de) * 2010-07-15 2012-01-19 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur Beschichtung eines Substrates mit einer Schutzschicht, beschichtetes Substrat, elektronisches Bauteil sowie Verwendungszwecke

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4112974A1 (de) * 1991-04-20 1992-10-22 Hoechst Ag Negativ arbeitendes strahlungsempfindliches gemisch und damit hergestelltes strahlungsempfindliches aufzeichnungsmaterial
JPH0534921A (ja) * 1991-07-30 1993-02-12 Mitsubishi Kasei Corp ネガ型感光性組成物
JPH05181277A (ja) * 1991-11-11 1993-07-23 Mitsubishi Kasei Corp ネガ型感光性組成物
EP0551105A3 (en) * 1992-01-07 1993-09-15 Fujitsu Limited Negative type composition for chemically amplified resist and process and apparatus of chemically amplified resist pattern
US5389491A (en) * 1992-07-15 1995-02-14 Matsushita Electric Industrial Co., Ltd. Negative working resist composition
JPH0667413A (ja) * 1992-08-20 1994-03-11 Sumitomo Chem Co Ltd ネガ型フォトレジスト組成物
JPH0667431A (ja) * 1992-08-20 1994-03-11 Sumitomo Chem Co Ltd ネガ型フォトレジスト組成物
JP3114166B2 (ja) * 1992-10-22 2000-12-04 ジェイエスアール株式会社 マイクロレンズ用感放射線性樹脂組成物
TW288112B (de) * 1993-06-02 1996-10-11 Sumitomo Chemical Co
KR950001416A (ko) * 1993-06-04 1995-01-03 미야베 요시까즈 네가형 감광성 조성물 및 이것을 사용한 패턴의 형성방법
US5900346A (en) * 1995-04-06 1999-05-04 Shipley Company, L.L.C. Compositions comprising photoactivator, acid, generator and chain extender
JP3449664B2 (ja) * 1995-04-19 2003-09-22 東京応化工業株式会社 ネガ型レジスト組成物
US6030747A (en) * 1997-03-07 2000-02-29 Nec Corporation Chemically amplified resist large in transparency and sensitivity to exposure light less than 248 nanometer wavelength and process of forming mask
JPH1165118A (ja) * 1997-08-15 1999-03-05 Nippon Telegr & Teleph Corp <Ntt> レジスト材料
US6323287B1 (en) 1999-03-12 2001-11-27 Arch Specialty Chemicals, Inc. Hydroxy-amino thermally cured undercoat for 193 NM lithography
JP3929653B2 (ja) 1999-08-11 2007-06-13 富士フイルム株式会社 ネガ型レジスト組成物
EP1268592B1 (de) * 2000-02-15 2005-10-26 Cytec Surface Specialties, S.A. Alkoxymethylmelamin vernetzer
JP2003107707A (ja) * 2001-09-28 2003-04-09 Clariant (Japan) Kk 化学増幅型ポジ型感放射線性樹脂組成物
JP4213925B2 (ja) 2002-08-19 2009-01-28 富士フイルム株式会社 ネガ型レジスト組成物
JP4222850B2 (ja) * 2003-02-10 2009-02-12 Ｓｐａｎｓｉｏｎ Ｊａｐａｎ株式会社 感放射線性樹脂組成物、その製造法並びにそれを用いた半導体装置の製造方法
JP3963456B2 (ja) * 2003-06-16 2007-08-22 キヤノン株式会社 感光性樹脂組成物およびこれを用いたインクジェット記録ヘッドおよびその製造方法
EP2628755A1 (de) * 2012-02-14 2013-08-21 Cytec Technology Corp. Aminoplast-Vernetzerharz-Zusammensetzungen, Verfahren zu deren Herstellung, und deren Verwendung
WO2016084868A1 (ja) * 2014-11-26 2016-06-02 日立化成株式会社 感光性樹脂組成物、感光性エレメント、硬化物、半導体装置、レジストパターンの形成方法及び回路基材の製造方法

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3322762A (en) * 1964-04-08 1967-05-30 Pittsburgh Plate Glass Co Production of hexamethylol-melamine and hexakis (methoxy-methyl) melamine
US3744904A (en) * 1970-06-11 1973-07-10 Gaf Corp Transparent photographic masks
US4149888A (en) * 1972-06-26 1979-04-17 Gaf Corporation Transparent photographic masks
US4181526A (en) * 1978-06-16 1980-01-01 Eastman Kodak Company Interpolymer protective overcoats for electrophotographic elements
US4478932A (en) * 1980-09-23 1984-10-23 General Electric Company Process of making a printed circuit using dry film resists
US4341859A (en) * 1980-09-23 1982-07-27 General Electric Company Emulsion for making dry film resists
US4518676A (en) * 1982-09-18 1985-05-21 Ciba Geigy Corporation Photopolymerizable compositions containing diaryliodosyl salts
DE3246037A1 (de) * 1982-12-09 1984-06-14 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch, daraus hergestelltes lichtempfindliches kopiermaterial und verfahren zur herstellung einer druckform aus dem kopiermaterial
DE3325022A1 (de) * 1983-07-11 1985-01-24 Hoechst Ag, 6230 Frankfurt Verfahren zur herstellung negativer kopien mittels eines materials auf basis von 1,2-chinondiaziden
ATE68272T1 (de) * 1984-06-01 1991-10-15 Rohm & Haas Lichtempfindliche beschichtungszusammensetzung, aus diesem hergestellte thermisch stabile beschichtungen und verfahren zur herstellung von thermisch stabilen polymerbildern.
US5034304A (en) * 1986-01-13 1991-07-23 Rohm And Haas Company Photosensitive compounds and thermally stable and aqueous developable negative images
CA1307695C (en) * 1986-01-13 1992-09-22 Wayne Edmund Feely Photosensitive compounds and thermally stable and aqueous developablenegative images
DE3604580A1 (de) * 1986-02-14 1987-08-20 Basf Ag Haertbare mischungen, enthaltend n-sulfonylaminosulfoniumsalze als kationisch wirksame katalysatoren
DE3623984A1 (de) * 1986-07-16 1988-01-21 Hoechst Ag Zeichenmaterial
DE3784199D1 (de) * 1986-08-01 1993-03-25 Ciba Geigy Ag Titanocene und deren verwendung.
JPS63123929A (ja) * 1986-11-11 1988-05-27 Takenaka Komuten Co Ltd パ−ソナル作業スペ−スの暖房装置
US4875124A (en) * 1988-01-11 1989-10-17 International Business Machines Corporation Thin film magnetic heads with thermally crosslinked insulation
US5129681A (en) * 1990-11-30 1992-07-14 Yano Giken Co., Ltd. Method of rendering laid pipeline flexible and pipe joint suited for executing this method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AT500298A1 (de) * 2002-06-14 2005-11-15 Agrolinz Melamin Gmbh Verfahren zur härtung von aminoplasten
DE102010027239A1 (de) * 2010-07-15 2012-01-19 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur Beschichtung eines Substrates mit einer Schutzschicht, beschichtetes Substrat, elektronisches Bauteil sowie Verwendungszwecke
DE102010027239B4 (de) * 2010-07-15 2014-06-12 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur Beschichtung eines Substrates mit einer Schutzschicht, beschichtetes Substrat, elektronisches Bauteil sowie Verwendungszwecke

Also Published As

Publication number Publication date
CN1048605A (zh) 1991-01-16
JP2985968B2 (ja) 1999-12-06
IE902473A1 (en) 1991-02-13
AU640938B2 (en) 1993-09-09
JPH0375652A (ja) 1991-03-29
EP0407086A2 (de) 1991-01-09
CA2019693A1 (en) 1991-01-07
KR910003441A (ko) 1991-02-27
ATE149256T1 (de) 1997-03-15
EP0407086A3 (en) 1992-01-15
NO902957L (no) 1991-01-08
ZA904993B (en) 1991-03-27
US5376504A (en) 1994-12-27
IL94984A0 (en) 1991-06-10
FI903451A0 (fi) 1990-07-06
AU5865190A (en) 1991-01-10
NO902957D0 (no) 1990-07-03
KR0171578B1 (ko) 1999-03-20
BR9003219A (pt) 1991-08-27
DE69029978D1 (de) 1997-04-03
EP0407086B1 (de) 1997-02-26

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Legal Events

Date Code Title Description
8328 Change in the person/name/address of the agent

Free format text: DERZEIT KEIN VERTRETER BESTELLT

8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee